AU2002320488B2

Photoactive coating, coated article, and method of making same

Abstract

A method of forming a photocatalytic coating includes depositing a precursor composition over at least a portion of a substrate surface by a coating device. The precursor composition includes a titania precursor material and at least one other precursor material having a metal selected from boron, strontium, zirconium, lead, barium, calcium, hafnium, lanthanum, and mixtures thereof. Sufficient other precursor material is added to the composition such that a molar ratio of the selected metal to titanium in the applied photocatalytic coating is in the range of about 0.001 to about 0.05.

AU2002320488B2, drawing sheet 1
Sheet 1 of 2

Term

Term ended

Expired 12 July 2022, 4.2 years ago.

  1. Priority and filed
  2. Granted
  3. Expired
  4. Today

55 claims: 8 independent, 47 dependent

  1. 1
    THE CLAIMS DEFINING THE INVENTION ARE AS FOLLOWS:1. A method of forming a photoactive coating, comprising the step of: depositing a precursor composition by chemical vapor deposition over at least a portion of a float glass ribbon in a molten metal bath, the 5 precursor composition comprising: a photoactive coating precursor material;and at least one other precursor material comprising a dopant that increases photoactivity of the photoactive coating over that of the photoactive coating without the dopant;10 wherein the at least one other precursor material comprises an organometallic alkoxide having a boiling point of less than 200°C;and wherein the molar ratio of dopant to photoactive precursor coating material is between 0.001 and 0.05.
  2. 10
    A method of forming a photoactive coating, comprising the step of:depositing a precursor composition over at least a portion of a substrate surface, the precursor composition comprising: 10 at least one other precursor being a titania precursor material comprising a dopant that increases photoactivity of the photoactive coating over that of the photoactive coating without the dopant;wherein the at least one other precursor material comprises an organometallic alkoxide having a boiling point of less than 200°C;and wherein the molar ratio of dopant to photoactive precursor coating material is between 0.001 and 0.05.
  3. 14
    A method of forming a photoactive coating, comprising the steps of:depositing a precursor composition over at least a portion of a substrate surface, the precursor composition comprising: a photoactive titania precursor material;and at least one other precursor material having a metal selected from 2002320488 31 Oct 2005 boron, strontium, zirconium, lead, barium, calcium, hafnium, lanthanum, and mixtures thereof having a boiling point of less than 200°C;and adding sufficient other precursor material to the composition such that a molar ratio ofthe selected metal to titanium in the applied 5 photoactive coating is in the range of about 0.001 to about 0.05.
  4. 23
    24. The method of claim 23, wherein the intermediate layer is an antireflective layer.
  5. 24
    25. The method of claim 24, wherein the antireflective layer comprises at least one of aluminum oxide, tin oxide, indium oxide, silicon oxide, silicon oxycarbide, and silicon oxynitride. 15
  6. 26
    27. The method of claim 26 , wherein the barrier layer includes at least one of silicon oxide, silicon nitride, silicon oxynitride, silicon oxycarbide, aluminum oxide, fluorine doped aluminum oxide, and aluminum nitride. 20
  7. 27
    28. A method of forming a photocataiytic coating, comprising the steps of:depositing a precursor composition over at least a portion of a substrate surface, the precursor composition comprising titanium isopropoxide and at least one other organometallic precursor material selected from triethyl borate, strontium isopropoxide, tetra-n-butyl lead, 25 zirconium 2- methyl-2- butoxide, and lanthanum isopropoxide.
  8. 28
    29. The method of claim 28, including adding sufficient other organometallic precursor material to the composition such that a molar ratio of the metal of the organometallic precursor material to titanium in the applied photocataiytic coating is in the range of about 0.001 to about 0.05. 2002320488 31 Oct 2005
  9. 29
    30. A method of depositing a photocatalytic coating over a substrate, comprising the steps of:positioning a chemical vapor deposition coating device over a float glass ribbon in a float chamber;5 directing a precursor composition from the coating device onto the ribbon, the precursor composition comprising a titania precursor material and at least one other precursor material having a metal selected from boron, strontium, lead, barium, calcium, hafnium, lanthanum, and mixtures thereof;10 adding sufficient other precursor material to the composition such that a molar ratio ofthe selected metal to titanium in the applied photocatalytic coating is in the range of about 0.001 to about 0.05;and heating the substrate to a temperature sufficient to decompose the precursor materials to form the photocatalytic coating. 15
  10. 30
    31. A method of increasing the photocatalytic activity of a titania coating, comprising the steps of:adding to the titania coating at least one metal selected from boron, strontium, zirconium, lead, barium, calcium, hafnium, and lanthanum, such that a molar ratio of the selected metal to titanium in the photocatalytic 20 coating is in the range of about 0.001 to about 0.05.
  11. 31
    32. A method of forming a photocatalytic coating, comprising the steps of:depositing a precursor composition over at least a portion of a substrate, the precursor composition comprising a photoactive coating precursor material being titanium tetrachloride, and further including a 25 dopant, that increases photoactivity of the photoactive coating over that of the photoactive coating without the dopant, being at least a source of organic oxygen, and a boron containing precursor material having a boiling point of less than 200°C;and wherein the molar ratio of dopant to photocatalytic precursor 30 coating material is between 0.001 and 0.05.
  12. 32
    33. The method of claim 32, wherein the source of organic oxygen is an alkyl ester having a C 2 to C10 alkyl group. 2002320488 31 Oct 2005
  13. 36
    37. The method of claim 36, wherein the intermediate coating comprises at least one of tin oxide, aluminum oxide, and zirconium oxide.
  14. 37
    38. An article, comprising, a substrate having at least one surface;and 10 a photocatalytic coating deposited over at least a portion of the substrate surface, wherein the photocatalytic coating comprises titania and at least one additional material, being a dopant, comprising at least one metal selected from boron, strontium, zirconium, lead, barium, calcium, hafnium, 15 and lanthanum, having a boiling point of less than 200°C;and wherein the additional material is present in the coating in an amount such that a molar ratio of the selected metal to titanium in the photocatalytic coating is in the range of about 0.001 to about 0.05.
  15. 38
    39. The article of claim 38, wherein the substrate is selected from glass, 20 plastic, and ceramic.
  16. 52
    53. The article of claim 52, wherein the intermediate layer is an anti reflective 20 layer.