Method for preparing vaporized reactants for chemical vapor deposition

The present invention relates to a method of preparing vaporized reagents, for chemical vapor deposition, which includes providing a coating precursor at a temperature above its melting point, but substantially below its standard vaporization temperature, thereby causing so that the coating precursor is in the form of a liquid, characterized in that it comprises the steps of: a) performing simultaneously and continuously, the steps of: i) injecting the liquid coating precursor into a vaporization chamber, defined in part by at least one peripheral pred, where the liquid coating precursor produces a vapor; ii) admitting into the vaporization chamber a gas mixture in an amount sufficient to increase the mass transport of the vapor from the coating precursor, and therefore cause accelerated vaporization of the liquid coating precursor; iii) mixing the liquid coating, the vapor from the coating precursor and the gas mixture, including applying the liquid precursor as a thin film along the chamber wall; whereby the liquid coating precursor is completely vaporized at a temperature below its standard vaporization temperature, to prepare a vaporized reactive gas stream having a uniform high concentration of the coating precursor; and b) transporting the reagent gas stream away from the vaporization chamber.