Method for preparing vaporized reactants for chemical vapor deposition

The preparation of wherein the chemical vapour phase deposition device for coating step of heating the substrate surface, the first liquid coated substrate by heating, fuels into the liquid coated substrate material is the evaporator; and mixing the air inlet to the evaporator; heating the liquid and mixed gas, wherein the liquid is lower than the volatilization wherein the temperature vaporizes, the intensive is coated by a steam and mixed gas, from the producing the thermal decomposing the vaporizing the air flow of the substrate surface. A horizontal thin layer or the preceding claims is specifically suitable for the evaporator method.