Method for preparing vaporized reactants for chemical vapor deposition

VAPORIZED REACTANTS USEFUL FOR CHEMICAL VAPOR DEPOSITION OF A COATING ON THE SURFACE OF A HOT SUBSTRATE, ARE PREPARED BY HEATING INITIALLY A LIQUID COATING PRESSURE (10), INJECTING THE FLOOR COATING (10) SIMULTANEOUSLY A MIXING GAS (19, 20) IN THE VAPORIZATION CHAMBER, HEATING THE LIQUID AND THE MIXING GAS TO MAKE THE LIQUID VAPORIZE TO A TEMPERATURE LOWER THAN THE STANDARD VAPORIZATION TEMPERATURE, AND COMPLETELY MIXING THE COATING PRECURSOR VAPOR AND A MIXING GAS, FOR BURNING FOR THE PYROLYTIC DECOMPOSITION ON THE SURFACE OF THE HOT SUBSTRATE. A HORIZONTAL THIN FILM EVAPORATOR PROVIDES A VAPORIZATION CHAMBER (12) ESPECIALLY SUITABLE FOR THIS PROCESS.