Nova Patents
ZA948817B

Multi-layered polymer based film structure for medical grade products

Abstract

A multiple layer structure comprising a skin layer composed of a polypropylene copolymer with styrene ethylene-butene styrene block copolymer within a range of 0-20% by weight skin layer, and, a radio frequency ("RF") susceptible layer adhered to the skin layer. The RF layer has a first component of a propylene based polymer, a second component of a nonpropylene polyolefin, a third component of a radio frequency susceptible polymer, and a fourth component of a polymeric compatibilizing agent.

Term

Term ended

Expired 8 November 2014, 11.9 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

142 members in 31 offices

This recordMember, by publication datePriority claim21 more offices are in the list below

Priority claims3

Priority claims
DocumentOfficeKindDate
15360293United States of AmericaA
15360293United States of AmericaA
US19930153602–––

Members142

Family members, oldest first
DocumentOfficeKind
IL111486D0IsraelD0
IL111487D0IsraelD0
CA2153481A1CanadaA1
WO9513918A1World Intellectual Property Organization (WIPO)A1
CA2153483A1CanadaA1
WO9514739A2World Intellectual Property Organization (WIPO)A2
AU1182395AAustraliaA
AU1099895AAustraliaA
ZA948816BSouth AfricaB
ZA948817BThis recordSouth AfricaB
NO952801D0NorwayD0
NO952802D0NorwayD0
WO9514739A3World Intellectual Property Organization (WIPO)A3
NO952802LNorwayL
NO952801LNorwayL
HU9502135D0HungaryD0
HU9502136D0HungaryD0
EP0679124A1European Patent Office (EPO)A1
EP0679170A1European Patent Office (EPO)A1
TR27954ATürkiyeA
PL309919A1PolandA1
TW264498BTaiwan Province of ChinaB
PL310403A1PolandA1
BR9405785ABrazilA
CZ174595A3CzechiaA3
CZ174695A3CzechiaA3
KR960700150ARepublic of KoreaA
KR960700305ARepublic of KoreaA
CN1117718AChinaA
CN1118604AChinaA
BR9405786ABrazilA
CO4290439A1ColombiaA1
CO4290440A1ColombiaA1
GT199400077AGuatemalaA
HUT72715AHungaryA
HUT73212AHungaryA
JPH08506068AJapanA
JPH08506380AJapanA
CA2195628A1CanadaA1
WO9640512A1World Intellectual Property Organization (WIPO)A1
EP0775052A1European Patent Office (EPO)A1
RU95117094ARussian FederationA
NZ276644ANew ZealandA
CN1159167AChinaA
US5686527AUnited States of AmericaA
US5693387AUnited States of AmericaA
AU686285B2AustraliaB2
AU686697B2AustraliaB2
JPH10503982AJapanA
NZ276958ANew ZealandA
NO302870B1NorwayB1
TW335373BTaiwan Province of ChinaB
HK1002389A1Hong Kong, ChinaA1
HK1002393A1Hong Kong, ChinaA1
IL111486AIsraelA
US5849843AUnited States of AmericaA
US5854347AUnited States of AmericaA
EP0679124B1European Patent Office (EPO)B1
AT175383TAustriaT
ATE175383T1AustriaT1
DE69415792D1GermanyD1
GR3029456T3GreeceT3
ES2129189T3SpainT3
SG65537A1SingaporeA1
DE69415792T2GermanyT2
DK0679124T3DenmarkT3
US5993949AUnited States of AmericaA
US5998019AUnited States of AmericaA
EP1008357A2European Patent Office (EPO)A2
EP1008357A3European Patent Office (EPO)A3
EP0679170B1European Patent Office (EPO)B1
AT195754TAustriaT
ATE195754T1AustriaT1
DK0679170T3DenmarkT3
DE69425649D1GermanyD1
US6168862B1United States of AmericaB1
SG77527A1SingaporeA1
DE69425649T2GermanyT2
CN1066757CChinaC
US6261655B1United States of AmericaB1
CA2395063A1CanadaA1
WO0156783A1World Intellectual Property Organization (WIPO)A1
AU3675601AAustraliaA
EP0775052B1European Patent Office (EPO)B1
DE69615505D1GermanyD1
KR100311884B1Republic of KoreaB1
CN1077028CChinaC
CN1082889CChinaC
DE69615505T2GermanyT2
US6399704B1United States of AmericaB1
US6461696B1United States of AmericaB1
KR20020076288ARepublic of KoreaA
BR0107948ABrazilA
US2002164492A1United States of AmericaA1
WO0156783A8World Intellectual Property Organization (WIPO)A8
EP1259374A1European Patent Office (EPO)A1
MXPA02007585AMexicoA
CO5241317A1ColombiaA1
CN1396862AChinaA
AR027378A1ArgentinaA1
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