Nova Patents
PL326679A1

Cosmetic compositions resistant to handling

Abstract

The present invention is for cosmetic compositions applied to the lips providing significant benefits to the user. These compositions comprise the combination of organosiloxane resins and fluid diorganosiloxane resins with a volatile carrier.

Term

Term ended

Projected expiry passed 25 October 2016, 9.9 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

113 members in 22 offices

This recordMember, by publication datePriority claim12 more offices are in the list below

Priority claims8

Priority claims
DocumentOfficeKindDate
627395United States of AmericaP
627395United States of AmericaP
855295United States of AmericaP
855295United States of AmericaP
60006273–––
60008552–––
US19950006273P–––
US19950008552P–––

Members113

Family members, oldest first
DocumentOfficeKind
CA2236790A1CanadaA1
CA2236942A1CanadaA1
CA2236974A1CanadaA1
WO9717057A1World Intellectual Property Organization (WIPO)A1
WO9717058A1World Intellectual Property Organization (WIPO)A1
WO9717059A1World Intellectual Property Organization (WIPO)A1
AU7476096AAustraliaA
AU7476196AAustraliaA
AU7522096AAustraliaA
CA2269207A1CanadaA1
WO9816196A1World Intellectual Property Organization (WIPO)A1
NO982033D0NorwayD0
NO982034D0NorwayD0
NO982035D0NorwayD0
AU5149098AAustraliaA
US5772696AUnited States of AmericaA
NO982033LNorwayL
NO982034LNorwayL
NO982035LNorwayL
TR199800812T2TürkiyeT2
EP0862411A1European Patent Office (EPO)A1
EP0862412A1European Patent Office (EPO)A1
CZ140898A3CzechiaA3
TR199800809T2TürkiyeT2
TR199800810T2TürkiyeT2
EP0868169A1European Patent Office (EPO)A1
PL326676A1PolandA1
PL326679A1This recordPolandA1
CZ140498A3CzechiaA3
CZ140698A3CzechiaA3
PL326705A1PolandA1
MX9803647AMexicoA
MX9803648AMexicoA
SK59298A3SlovakiaA3
SK59398A3SlovakiaA3
SK59498A3SlovakiaA3
MX9803649AMexicoA
CN1204252AChinaA
CN1204253AChinaA
CN1206345AChinaA
BR9611420ABrazilA
BR9611421ABrazilA
BR9611431ABrazilA
IL124324D0IsraelD0
CO4770943A1ColombiaA1
CO4770944A1ColombiaA1
IL124325D0IsraelD0
IL124326D0IsraelD0
HU9900113A2HungaryA2
HUP9900113A2HungaryA2
EP0930871A1European Patent Office (EPO)A1
KR19990067343ARepublic of KoreaA
KR19990067382ARepublic of KoreaA
KR19990067383ARepublic of KoreaA
CZ134799A3CzechiaA3
NZ321430ANew ZealandA
NZ321800ANew ZealandA
HU9901986A2HungaryA2
HUP9901986A2HungaryA2
NZ321429ANew ZealandA
CN1237101AChinaA
HU9902048A2HungaryA2
HUP9902048A2HungaryA2
JP2000500135AJapanA
HU9900113A3HungaryA3
HU9901986A3HungaryA3
HUP9900113A3HungaryA3
HUP9901986A3HungaryA3
US6019962AUnited States of AmericaA
JP2000501074AJapanA
JP2000501075AJapanA
HU9902048A3HungaryA3
HUP9902048A3HungaryA3
JP2000503682AJapanA
CO4910119A1ColombiaA1
AU719603B2AustraliaB2
US6071503AUnited States of AmericaA
US6074654AUnited States of AmericaA
AU721752B2AustraliaB2
AU721756B2AustraliaB2
CO4940381A1ColombiaA1
KR20000049178ARepublic of KoreaA
AU724071B2AustraliaB2
US6139823AUnited States of AmericaA
KR100316433B1Republic of KoreaB1
CA2236974CCanadaC
US6340466B1United States of AmericaB1
CA2236790CCanadaC
US6406683B1United States of AmericaB1
KR100331214B1Republic of KoreaB1
CA2236942CCanadaC
EP0862411B1European Patent Office (EPO)B1
AT225643TAustriaT
ATE225643T1AustriaT1
DE69624255D1GermanyD1
KR100355518B1Republic of KoreaB1
CN1098064CChinaC
ES2180804T3SpainT3
CN1104885CChinaC
US6555097B1United States of AmericaB1
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