Low-e coating with high visible transmission

Description of the invention

This invention relates to a coated article having a coating deposited on a glass substrate and to its uses. In particular, the above coated articles can be used to make insulating glass windows or other types of windows.

Background and abstract of the invention

Reference Patent Application No. US09 / 794,224 discloses coated articles having the following stack of layers, such as that shown in Figure 1 of this patent application, facing the glass to the outside:

Table 1:

Exemplary materials / thicknesses in the above referenced patent application

<td>Layer</td><td>Favorable range (nm)</td><td>More favorable range (nm)</td><td>Example (nm)</td>

<td>substrate (1-10 nm)</td><td></td><td></td><td></td>

<td>TiO2</td><td>0-40 nm</td><td>5-25 nm</td><td>10 nm</td>

<td>Si_XNy</td><td>0-40 nm</td><td>5-25 nm</td><td>17 nm</td>

<td>NiCrOx</td><td>0.5-10 nm</td><td>1-5 nm</td><td>1.8 nm</td>

<td>Ag</td><td>5-25 nm</td><td>8-12 nm</td><td>10.5 nm</td>

<td>NiCrOx</td><td>0.5-10 nm</td><td>1-5 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>0-80 nm</td><td>50-85 nm</td><td>65 nm</td>

<td>Si_XNy</td><td>0-80 nm</td><td>5-25 nm</td><td>17 nm</td>

<td>NiCrO_x</td><td>0.5-10 nm</td><td>1-5 nm</td><td>1.8 nm</td>

<td>Ag</td><td>5-25 nm</td><td>8-12 nm</td><td>10.5 nm</td>

<td>NiCrOx</td><td>0.5-10 nm</td><td>1-5 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>0-50 nm</td><td>10-30 nm</td><td>15 nm</td>

<td>Si3N4</td><td>0-50 nm</td><td>10-30 nm</td><td>25 nm</td>

In other embodiments of the above patent application which is referenced in the present application, the lower titanium oxide layer may be removed or replaced with a silicon nitride layer.

While the aforementioned coated articles described in the related (related) patent application provide good color, and good ultraviolet (UV) and / or infrared (IR) reflection, sometimes increased visible transmission and / or reduced reflection are desirable. visible.

A neutral color for coated articles is also desirable for some applications. Many common methods of making a more neutral color coated article result in decreased visible transmission and / or increased visible reflection. Hitherto, it has been difficult to increase visible transmission and reduce visible reflection while providing or maintaining a fairly neutral color and satisfactory solar control and thermal performance characteristics. Determining whether a color is "neutral or not" is subjective and depends on personal taste. However, generally speaking, a color that moves towards a neutral color target (e.g. a * = 0, b * = 0, or some other neutral color target such as transmissive a * = -2 and transmissive b * = -3.4), however, such objectives need not be met in all embodiments of this invention.

From the above point of view, it is an object of certain embodiments of this invention to provide a solar control coated article (i.e., an article comprising at least one and preferably two or more layers such as Ag for reflecting IR and / or UV rays) exhibiting increased transmittance in visible and / or reduced visible reflectance. In certain example and non-limiting embodiments of this invention, an object is to combine such high visible and / or high transmittance.

Reduced visible reflectance with the natural color of the coated article. Alternatively, the use of an improved antireflection layer (s) arrangement (s) may allow the coatings to have or use a stronger contact layer (s) (e.g. thinner for better durability) and / or thinner silver (Ag) layer (s) (i.e., improved thermal performance) while maintaining similar transmission characteristics if increased transmission is not the most desirable characteristic (e.g. durability is the most desirable characteristic).

Another object of the present invention is to meet one or more of the above-mentioned purposes and / or needs.

The invention relates to a coated article comprising a coating deposited on a glass substrate, the coating comprising:

first and second reflective layers (IR), comprising silver (Ag);

a first dielectric layer showing a refractive index n &lt;= 3.0, sandwiched between the IR reflecting layer and the glass substrate, characterized by having a second dielectric layer showing a refractive index of 1.8 &lt;= n &lt;= 2.2 placed between the first and second IR reflecting layers, wherein the second dielectric layer has a refractive index n less than the refractive index n of the first dielectric layer;

a third dielectric layer comprising silicon oxynitride disposed over the first and second IR reflecting layers, the third dielectric layer comprising silicon oxynitride having a refractive index n less than the refractive index n of the second dielectric layer; and wherein the coated article has a visible transmission of at least 70%.

A preferred coated article comprises a third dielectric layer comprising silicon oxynitride having a refractive index of 1.45 &lt;= n &lt;= 2.0, even more preferably having a refractive index of 1.6 &lt;= n &lt;= 1.9.

According to a preferred embodiment of the coated article of the invention, the first and second IR reflecting layers including Ag are each interposed between and in contact with a pair of contact layers, and at least one of the contact layers adjacent to each IR reflecting layer comprises at least one of NiCr, NiCrOx, and NiCrNx.

Preferably at least one of the contact layers comprises Ni and Cr, and the first dielectric layer preferably comprises titanium oxide, in which case the coated article of the invention further comprises a silicon nitride inclusive layer interposed between the first IR reflecting layer and the first dielectric layer comprising titanium oxide.

It is also preferred that the second dielectric layer comprises tin oxide, the more preferred coated article of the invention further comprising another dielectric layer including silicon nitride sandwiched between the first IR reflecting layer and the second dielectric layer including tin oxide.

In another preferred embodiment, the coated article further comprises another dielectric layer including tin oxide sandwiched between the third dielectric layer containing silicon oxynitride and the second IR reflecting layer, or alternatively the article further includes another dielectric layer including silicon nitride sandwiched between the third dielectric layer containing silicon oxynitride. and a layer reflecting IR rays.

Preferably, the coated article of the invention is defined by a visible transmission value of at least 75%, a sheet resistance (R_s) no greater than 10 Ω / ϋ, and glass side visible reflectance &lt;= 9%, more preferably has a visible transmission of at least 76.5%.

According to an alternative embodiment of the coated article of the invention, a preferred article comprises a third dielectric layer comprising silicon oxynitride at least gradually oxidized and gradually nitrided such that the refractive index n of the third dielectric layer containing silicon oxynitride varies from the first value in the first portion of the third dielectric layer to lower, second value in the second part of the third dielectric layer, wherein the second portion of the third dielectric layer comprising silicon oxynitride having a lower refractive index n is farther from the IR reflecting layers than the first portion of the third dielectric layer.

According to a further preferred embodiment of the coated article of the invention, the coating comprises, from the glass substrate outwardly: a first dielectric layer comprising titanium oxide;

A first contact layer comprising at least one of NiCr, NiCrOx, and NiCrNx;

a first IR reflecting layer comprising Ag;

a second contact layer comprising at least one of NiCr, NiCrOx, and NiCrNx;

a second dielectric layer comprising tin oxide;

a third contact layer comprising at least one of NiCr, NiCrOx, and NiCrNx;

a second IR reflecting layer comprising Ag;

a fourth contact layer comprising at least one of NiCr, NiCrOx, and NiCrNx;

a third dielectric layer containing silicon oxynitride; and wherein the coated article exhibits a sheet resistance (R._s) no greater than 10 Ω / ϋ, and more preferably the article further comprises another dielectric layer containing silicon nitride interposed between and in contact with the first dielectric layer comprising titanium oxide and the first contact layer. Alternatively, the above even more preferred coated article further comprises another dielectric layer comprising silicon nitride interposed between the second dielectric layer comprising tin oxide and the third contact layer, or a still more preferred article further comprises another dielectric layer comprising tin oxide interposed between and abutting the third dielectric layer. , containing silicon oxynitride, and a fourth contact layer, or it further comprises another dielectric layer containing silicon nitride sandwiched between the third dielectric layer containing silicon oxynitride and the fourth contact layer.

It is also preferred that in the article according to the invention at least one of the contact layers comprises Ni and Cr and the third dielectric layer containing silicon oxynitride is at least gradually oxidized and gradually nitrided such that the refractive index n of the third dielectric layer containing silicon oxynitride varies from the first value in the first part of the third dielectric layer to the lower one, a second value in the second portion of the third dielectric layer, the second portion of the third dielectric layer containing silicon oxynitride with a lower refractive index n is further from the IR reflecting layers than the first portion of the third dielectric layer.

The invention also relates to the use of a coated article according to the invention for the production of an insulated glass or other type of window.

Brief description of the drawings

Fig. 1 is a cross sectional view of a coated article outside the scope of the invention as disclosed in the related patent application.

Fig. 2 is a cross sectional view of a coated article outside the scope of the invention.

Fig. 3 is a cross sectional view of a coated article according to another embodiment of this invention.

Fig. 4 is a cross sectional view of a coated article according to another embodiment of this invention.

Fig. 5 is a cross sectional view of a coated article outside the scope of the invention.

Fig. 6 is a cross sectional view of a coated article according to another embodiment of this invention.

Detailed Description of Exemplary Embodiments of the Invention

The present invention relates to coated articles that can be used in applications including, but not limited to, IG windows, other types of building windows, skylights, and / or other types of windows. Coated articles of the present invention include an improved antireflection layer (s) arrangement to reduce visible reflectance and / or increase visible transmission in coated articles that provide solar control functionality (e.g., IR and / or UV reflection). Surprisingly, in certain example embodiments, it has been found that certain antireflection layer (s) arrangements of the present invention can both: (a) increase visible transmittance and / or reduce visible reflectance while simultaneously (b) achieving an acceptably neutral color. the resulting coated article.

Fig. 2 is a cross sectional view of a coated article outside the claimed scope. The coated article of Fig. 2, as well as other coated articles herein, can be used in the above-mentioned applications (e.g., building windows, etc.). On the side of the glass substrate, the coated article of FIG. 2 comprises on the outside (all refractive indices "n are given for 550 nm):

Glass (n = 1.51) titanium oxide (e.g. TiO2) (n = 2.1 to 2.7) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon oxide (e.g. SiO3) (n = 1.4 to 1.7; preferably n = 1.45) air (n = 1.0)

As shown in Fig. 2, contact layers (i.e., NiCrOx layers) surround and contact the IR reflecting layers made of Ag. The NiCrOx layers in this patent application are referred to as "contact layers because each is in contact with the IR reflecting layer (i.e., Ag layer). The NiCrOx contact layers provide the most direct chemical protection for the Ag layer, and also serve as adhesive and / or nucleation layers. In various embodiments, the contact layers may or may not be oxidized gradually as described in the referenced patent application. In addition, in place of NiCrOx, one or more of the contact layers may be made of or include other material (s) including, but not limited to, NiCr, NiCrNx, NiCrOxNy, ZnO, Al2O3, TiO2, ZnAlOx, Ni, Cr, CrNx, NiOx. , NbOx, any combination thereof, or the like. Exemplary thicknesses of the contact layers, and other layers in this patent application, are considered above in the "background and summary" section of this application.

Instead of Ag, other IR reflecting materials (e.g., Au, Ag alloys, Au alloys, etc.) may be used in the IR reflecting layer (s) (this applies to all embodiments of this invention). The thickness of the metallic Ag layers (IR reflecting layers) is selected to achieve the desired thermal performance (see the above example thickness ranges). For example, the Ag layer may have a thickness from 5-25 nm (50-250 A) to achieve a sheet resistance (Rs) (before and / or after heat treatment) less than or equal to 10.0 Ω / ϋ, more preferably less than or equal to equal to 8.0 Ω /, and even more preferably less than or equal to 5.0 Ω /, and most preferably less than or equal to 4.0 Ω /. Similarly, the thickness (s) of the Ag layer (s) is selected such that the coating (or coated article) has a normal emissivity (En) of no greater than 0.08, more preferably no greater than 0.06, and most preferably no greater than 0. 05 (before and / or after heat treatment).

The lower ten layers (10) of the coating of Fig. 2 (and of the coatings of Figs. 3-4) are contemplated in the related patent application (incorporated herein by reference), and for convenience are not contemplated in this application. In this regard, see thicknesses / substances described in the relevant application. The focus of this patent application is to provide the upper two layers as shown in Fig. 2 that provide increased visible transmission and / or reduced visible reflection (glass and / or film side reflection) of the coated article. In particular, with reference to the embodiment of Fig. 2, it will be shown below that the replacement of the upper silicon nitride layer (see reference application or Fig. 1 in this patent application) with a silicon oxide layer (see Fig. 2) results in a significant increase in the visible transmission. Of course, this is beneficial.

By using silicon oxide (i.e., stoichiometric SiO2, or non-stoichiometric form) over the top tin oxide layer, the coating (layer system) can be characterized by an upper dielectric portion T, showing an effective refractive index n less than the central dielectric portion M, which in turn has an effective refractive index n less than the lower dielectric portion B (see Fig. 2). In other words, nT &lt;nM &lt;nB, where nT is the effective refractive index of the upper dielectric portion T, nM is the effective refractive index of the middle dielectric portion M, and nB is the effective refractive index of the lower dielectric portion B. As shown in Fig. 2 , respectively

Each of the top, middle and bottom dielectric portions T, M, and B may contain a variety of different dielectric layers, however, in other embodiments, any or all of the portions need only include a single dielectric layer. By gradually decreasing the respective refractive indices "n from the closest to the center or lower part B, to the middle dielectric part M, and to the upper dielectric part T towards the air, the antireflection system of Fig. 2 makes it possible to achieve increased visible transmittance and / or reduced visible reflection. Surprisingly, as will be shown below in Examples of this embodiment, the antireflection system also makes it possible to obtain a fairly neutral color of the coated article. Further, in certain exemplary embodiments, n_T. is &lt;= 2.0. The silicon oxide layer may be from about 1-70 nm (10-700 Å) thick in certain example embodiments of this invention, more preferably from 2-60 nm (20-600 Å) thick, and most preferably from 5-50 nm (5-50 nm) thick. nm (50 - 500 A) thick.

For all of the embodiments herein, the illustrated layers are preferably deposited / formed by sputtering (see Examples in the related patent application), however other deposition techniques may of course be used with other embodiments of this invention.

Example (s) of the embodiment according to Fig. 2

The following Tables illustrate Examples 1-7 according to the embodiment of Fig. 2 to be compared with a Comparative Example (s) similar to Fig. 1 outside the claimed scope of the invention. Thus, CE relates to a coating that is similar to that illustrated in the related application. For these simulation examples in the Tables below, the following indices of refraction were assumed at 550 nm: for glass, n = 1.51; for Si3N4, n = 2.0; for SiOxNy, n = 1.72; for SiO2, n = 1.45; for SnO2, n = 2.0 and for TiO2, n = 2.57. The thicknesses for each of the layers in the First Table below are given in nanometers (nm). The Second Table below gives the optical characteristics (e.g. visible transmission, color, etc.) for the Examples and CE for annealed form and monolithic form. All glass substrates are the same in thickness and color. None of these simulation examples were heat treated. Moreover, all optical data below were determined by method I11. C, 2 steps.

It is noted that the Comparative Examples (CEs) in this patent application use more oxidized NiCrOx layers than the examples in the related patent application (this explains why these comparative examples, in monolithic untreated form, exhibit higher visible transmittance than monolithic products not heat treated in the related patent application). However, this distinction is irrelevant as it is assumed that all the NiCrOx layers in this patent application have the same oxidation, so the comparisons in this patent application between the CEs and the Examples are consistent. It is also noted that the coefficients for all Ag and NiCrO x are assumed to be the same for all layers in the present Examples and CEs.

First table: layer structure - thicknesses (embodiment according to Fig. 2)

<td></td><td>CE</td><td>Ex. 1</td><td>Ex. 2</td><td>Ex. 3</td><td>Ex. 4</td><td>Ex. 5</td><td>Ex. 6</td><td>Ex. 7</td>

<td> 1</td><td> 2</td><td> 3</td><td> 4</td><td> 5</td><td> 6</td><td> 7</td><td> 8</td><td> 9</td>

<td>glass</td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td>

<td>TiO2</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td>

<td>S13N4</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>15.3 nm</td><td>15.7 nm</td><td>15.3 nm</td>

<td>NiCrO_x</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>67.2 nm</td><td>67.2 nm</td><td>67.2 nm</td><td>67.2 nm</td><td>67.2 nm</td><td>70.5 nm</td><td>72.4 nm</td><td>67.4 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrOx</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td>

PL 204 049 B1 cont. table 1

<td> 1</td><td> 2</td><td> 3</td><td> 4</td><td> 5</td><td> 6</td><td> 7</td><td> 8</td><td> 9</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrO_x</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO₂</td><td>22.7 nm</td><td>22.7 nm</td><td>22.7 nm</td><td>22.7 nm</td><td>22.7 nm</td><td>25.2 nm</td><td>31.4 nm</td><td>23.4 nm</td>

<td>Si3N4</td><td>22.5 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td>

<td>SiO2</td><td>0 nm</td><td>55 nm</td><td>45 nm</td><td>40 nm</td><td>35.3 nm</td><td>46 nm</td><td>28.6 nm</td><td>43.5 nm</td>

Table Two:

optical characteristic (embodiment according to fig. 2: monolithic)

<td></td><td>^T.VIS</td><td>about* a * T</td><td>b * T</td><td>R on the glass side (g)</td><td>^and* g</td><td>b * b * g</td><td>R from p. Layer (f)</td><td>a * f</td><td>b * f</td>

<td>Ex. 1:</td><td> 77,3%</td><td> -2,8</td><td> 2,1</td><td> 4,5%</td><td> 7,9</td><td> -11,9</td><td> 3,0%</td><td> 11,7</td><td> -18,2</td>

<td>Ex. 2:</td><td> 76,9%</td><td> -1,9</td><td> 0,8</td><td> 4,5%</td><td> 5,3</td><td> -5,3</td><td> 3,6%</td><td> 2,7</td><td> -7,8</td>

<td>Ex. 3:</td><td> 76,4%</td><td> -0,2</td><td> -0,7</td><td> 4,7%</td><td> 4,0</td><td> -2,5</td><td> 4,1%</td><td> -0,6</td><td> -4,5</td>

<td>Ex. 4:</td><td> 75,9%</td><td> -1,1</td><td> 0,2</td><td> 5,0%</td><td> 1,9</td><td> 0,6</td><td> 4,8%</td><td> -3,7</td><td> -2,2</td>

<td>Ex. 5:</td><td> 77,5%</td><td> -2,6</td><td> 1,9</td><td> 4,6%</td><td> 8,2</td><td> -11,4</td><td> 3,4%</td><td> 8,2</td><td> -12,5</td>

<td>Ex. 6:</td><td> 77,1%</td><td> -2,4</td><td> 1,0</td><td> 4,8%</td><td> 10,2</td><td> -10,1</td><td> 4,2%</td><td> 4,8</td><td> -2,6</td>

<td>Ex. 7:</td><td> 76,8%</td><td> -1,8</td><td> 0,7</td><td> 4,6%</td><td> 5,2</td><td> -4,7</td><td> 3,6%</td><td> 2,0</td><td> -5,3</td>

<td>CE:</td><td> 75,5%</td><td> -2,1</td><td> 0,2</td><td> 5,9%</td><td> 9,2</td><td> -10,6</td><td> 5,2%</td><td> 3,2</td><td> -1,0</td>

From the above Tables for embodiments outside the claimed scope of the invention according to Fig. 2, it can be seen that the antireflection system allows not only better visible transmission characteristics (i.e., increased TViS% transmittance), but also reduced reflectance (e.g. lower coefficient). reflections on the glass side and / or the layer side). In addition, a fairly neutral transmissive color is also provided. In particular, each of Examples 1-7 (see Fig. 2) showed better visible transmission (higher TViS) and better glass and / or film side reflectance (lower Rg and / or Rf) than the Comparative Example (CE). . Furthermore, Example 7 illustrates that the thicknesses of certain layers in the stack can be adjusted to achieve very neutral color (i.e., very low a * and / or b * values) while still achieving high visible transmission.

Fig. 3 is a cross sectional view of a coated article according to an embodiment of this invention. The embodiment according to FIG. 3 differs from the embodiment according to FIG. 2 in that the upper tin oxide and silicon oxide layer is, in FIG. 3, replaced by a silicon oxynitride layer. The Fig. 3 embodiment differs from that of Fig. 1 (i.e. CE) in that the tin oxide and silicon nitride layers are replaced with a silicon oxynitride layer. The silicon oxynitride layer is useful in that, in various embodiments of this invention, its refractive index n (at 550 nm) may range from 1.45 to 2.0, more preferably from 1.6 to 1.9, and most preferably from 1. 65 to 1.85. The n factor of the silicon oxynitride layer can be varied, for example, by adjusting the oxygen and / or nitrogen gas flows used when sputtering the layer. The silicon oxynitride layer may have a constant (or approximately constant, i.e., constant plus / minus about 5%) refractive index n across its thickness in certain embodiments of this invention, but may otherwise be gradually oxidized and / or nitrided so as to exhibit a refractive index n that varies along the thickness of the layer (e.g., the index n may gradually decrease towards air along the thickness of the silicon oxynitride layer). From the glass substrate to the outside of the coated article of Figure 3 (all factors are at 550 nm):

glass (n = 1.51) titanium oxide (e.g. TiO2) (n = 2.1 to 2.7) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0 ) nickel-chromium oxide (NiCrOx)

Silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) silicon oxynitride (e.g. SiOxNy) (n = 1.45 - 2.0 , preferably n = 1.6 - 1.9) air (n = 1.0)

By using silicon oxynitride above the upper contact layer, the layer arrangement can be described by an upper dielectric portion T having an effective refractive index n less than that of the middle dielectric portion M, which in turn has an effective refractive index n less than that of the lower portion. dielectric B. In other words, nT &amp; lt; nM &amp; lt; nB, where nT is the effective refractive index of the upper dielectric T, NM is the effective refractive index of the middle dielectric M, and nB is the effective refractive index of the lower dielectric B. As shown in Fig. 3, each of the top, middle and bottom dielectric portions, T, M, and B, respectively, may contain a variety of different dielectric layers, however, in other embodiments, any or all of these portions only need to include a single dielectric layer. By gradually decreasing the respective refractive indices "n" from the closest to the center or lower part of B, to the middle dielectric part M, and to the upper dielectric part T towards the air, the anti-reflection system according to Fig. 3 enables an increased transmittance in the range of visible. The term "effective" means the total effective n factor in particular parts of B, T, or M, regardless of how many layers are placed therein. The antireflection system may also provide a fairly neutral color to a coated article in certain example embodiments. The silicon oxynitride layer may be from about 10-90 nm (100-900 A) thick in certain example embodiments of this invention, more preferably from 2-60 nm (20-600 A) thick, and most preferably from 5-50 (50-500 A) thick. A) thickness.

Example (s) of the embodiment according to Fig. 3

The following tables illustrate Example 1 according to the claimed embodiment of Fig. 3 as compared to Comparative Example (s) (CE) similar to Fig. 1. Thus, CE refers to a coating which is similar to that illustrated in the related application. For these simulation examples in the Tables below, the following indices of refraction were assumed at 550 nm: for glass, n = 1.51; for Si3N4, n = 2.0; for SiOxNy, n = 1.72; for SiO2, n = 1.45; for SnO2, n = 2.0 and for TiO2, n = 2.57. The thicknesses for each of the layers in the First Table below are expressed in nanometers (nm). The Second Table below lists the optical characteristics (e.g., visible transmission, color, etc.) for Example 1 and CE in an annealed and monolithic form.

First TABLE:

layer structure - thicknesses (embodiment according to Fig. 3)

<td></td><td>CE</td><td>Ex. 1</td>

<td> 1</td><td> 2</td><td> 3</td>

<td>glass</td><td></td><td></td>

<td>TiO2</td><td>12.5 nm</td><td>12.5 nm</td>

<td>S13N4</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrOx</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO₂</td><td>67.2 nm</td><td>67.2 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrO_x</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrO_x</td><td>1.6 nm</td><td>1.6 nm</td>

PL 204 049 B1 cont. table 1

<td> 1</td><td> 2</td><td> 3</td>

<td>SnO2</td><td>22.7 nm</td><td>0 nm</td>

<td>Si3N4</td><td>25.2 nm</td><td>0 nm</td>

<td>SiO_xN_y</td><td>0 nm</td><td>56.6 nm</td>

Table Two:

optical characteristic (embodiment according to Fig. 3, monolithic)

<td></td><td>^T.VIS</td><td>about* a * T</td><td>b * T</td><td>R from the side glass (g)</td><td>^and* g</td><td>b * b * g</td><td>R from p. layers (f)</td><td>a * f</td><td>b * f</td>

<td>Ex. 1:</td><td> 77,1%</td><td> -2,4</td><td> 1,6</td><td> 4,4%</td><td> 7,8</td><td> -11,4</td><td> 3,1%</td><td> 8,1</td><td> -13,9</td>

<td>CE:</td><td> 75,5%</td><td> -2,1</td><td> 0,2</td><td> 5,9%</td><td> 9,2</td><td> -10, 6</td><td> 5,2%</td><td> 3,2</td><td> -1,0</td>

From the above Tables relating to the embodiments of the present invention of Fig. 3, it can be seen that the antireflection system of the present invention allows not only improved visible transmission characteristics (i.e., increased TViS% transmittance), but also reduced reflection (e.g., lower reflectance). glass side and / or layer side reflectance). In particular, Example 1 (see Fig. 3) shows better visible transmission (higher Tvis) and better glass and / or film side reflection (lower Rg and / or Rf) than the Comparative Example (CE - see Fig. 1).

Fig. 4 is a cross sectional view of a coated article according to another embodiment of this invention. The embodiment according to FIG. 4 differs from the embodiment according to FIG. 2 in that the silicon layer, in FIG. 4, is replaced by a silicon oxynitride layer. The Fig. 4 embodiment differs from that of Fig. 1 (i.e., from CE) in that the upper silicon nitride layer is replaced with a silicon oxynitride layer. The silicon oxynitride layer is useful in that its refractive index n (at 550 nm) can vary from 1.45 to 2.0, more preferably from 1.6 to 1.9, and most preferably from 1.65 to 1.85 , in various embodiments of the present invention. In this and all other embodiments herein including a silicon oxynitride layer, the silicon oxynitride layer may have a constant (or approximately constant, i.e., constant plus or minus about 5% constant) refractive index n along its entire thickness in certain embodiments of this invention. but may otherwise be gradually oxidized and / or nitrided so as to exhibit a refractive index n which varies along the thickness of the layer (e.g. the n-factor may gradually decrease towards the air along the thickness of the silicon oxynitride layer). From the glass substrate to the outside of the coated article of Figure 4 (all factors are at 550 nm):

glass (n = 1.51) titanium oxide (e.g. TiO2) (n = 2.1 to 2.7) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0 ) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon nitride (e.g. Si3N4 ) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon oxynitride (e.g. SiOxNy) (n = 1.45-2.0, preferably n = 1.6-1.9) air (n = 1.0)

By using silicon oxynitride above the upper tin oxide layer and above the upper contact layer, the layer arrangement can be defined by an upper dielectric portion T having an effective refractive index n less than that of the middle dielectric portion M, which in turn has an effective refractive index n less than that for the lower part of die10

PL 204 049 B1 of electrical B. In other words, nT &lt;nM &lt;nB. The silicon oxynitride and tin oxide layers have the thicknesses described above.

Example (s) of the embodiment according to Fig. 4

The following Tables illustrate Examples 1-5 according to the embodiment of Fig. 4 in comparison with a Comparative Example (s) (CE), similar to Fig. 1 outside the claimed scope of the invention. Thus, CE relates to a coating that is similar to that illustrated in the related application. For these simulation examples in the Tables below, the following indices of refraction were assumed at 550 nm: for glass, n = 1.51; for Si3N4, n = 2.0; for SiOxNy, n = 1.72; for SiO2, n = 1.45; for SnO2, n = 2.0 and for TiO2, n = 2.57. The thicknesses for each of the layers in the First Table below are expressed in nanometers (nm). The second table below gives the optical characteristics (e.g. visible transmission, color, etc.) for the Examples and CE based on annealed and monolithic form.

First TABLE:

layer structure - thicknesses (embodiment according to Fig. 4)

<td></td><td>CE</td><td>Ex. 1</td><td>Ex. 2</td><td>Ex. 3</td><td>Ex. 4</td><td>Ex. 5</td>

<td>glass</td><td></td><td></td><td></td><td></td><td></td><td></td>

<td>TiO2</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td><td>12.5 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>13.3 nm</td><td>15.8 nm</td>

<td>NiCrOx</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>67.2 nm</td><td>67.2 nm</td><td>67.2 nm</td><td>73.1 nm</td><td>70.8 nm</td><td>67.1 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrO_x</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>22.7 nm</td><td>22.7 nm</td><td>22.7 nm</td><td>26.2 nm</td><td>21.7 nm</td><td>11.0 nm</td>

<td>Si3N4</td><td>25.2 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td><td>0 nm</td>

<td>SiO_XNy</td><td>0 nm</td><td>35 nm</td><td>29.8 nm</td><td>24.6 nm</td><td>31.5 nm</td><td>40.9 nm</td>

Table Two:

optical characteristic (embodiment according to Fig. 4, monolithic)

<td></td><td>^T.VIS</td><td>a * T</td><td>b * T</td><td>R on the glass side (g)</td><td>^and* g</td><td>b * b * g</td><td>R from p. layers (f)</td><td>a * f</td><td>b * f</td>

<td>Ex. 1:</td><td> 76,6%</td><td> -2,4</td><td> 0,6</td><td> 4,9%</td><td> 8,6</td><td> -9,4</td><td> 3,8%</td><td> 5,0</td><td> -4,3</td>

<td>Ex. 2:</td><td> 76,3%</td><td> -1,5</td><td> -0,2</td><td> 4,9%</td><td> 6,1</td><td> -4,0</td><td> 4,1%</td><td> -1,1</td><td> 2,2</td>

<td>Ex. 3:</td><td> 77,0%</td><td> -2,5</td><td> 1,2</td><td> 4,8%</td><td> 11,2</td><td> -11,1</td><td> 4,4%</td><td> 5,1</td><td> -2,6</td>

<td>Ex. 4:</td><td> 76,9%</td><td> -2,3</td><td> 1,0</td><td> 4,8%</td><td> 9,7</td><td> -10,1</td><td> 3,9%</td><td> 5,2</td><td> -1,8</td>

<td>Ex. 5:</td><td> 76,4%</td><td> -1,5</td><td> 0,3</td><td> 4,7%</td><td> 4,7</td><td> -3,3</td><td> 3,9%</td><td> -0,5</td><td> -2,0</td>

<td>CE:</td><td> 75,5%</td><td> -2,1</td><td> 0,2</td><td> 5,9%</td><td> 9,2</td><td> -10,6</td><td> 5,2%</td><td> 3,2</td><td> -1,0</td>

From the above Tables relating to embodiments of the present invention of Fig. 4, it can be seen that the antireflection system of the inventive article allows not only improved visible transmission characteristics (i.e., increased Tvis% transmittance), but also reduced reflectance (e.g., lower reflectance). glass side and / or layer side reflectance). In addition, a fairly neutral color can also be achieved. In particular, Examples 1-5 (see Fig. 4) show better visible transmission (higher Tvis)

PL 204 049 B1 and better glass and / or layer side reflection (lower Rg and / or Rf) than the Comparative Example (CE see Fig. 1).

Fig. 5 is a cross sectional view of a coated article outside the claimed scope of the invention. In this embodiment, the upper dielectric portion T comprises a silicon nitride layer (stoichiometric or non-stoichiometric, such as in all embodiments) and a silicon oxide layer (stoichiometric or non-stoichiometric, such as in all embodiments). The coated article of Fig. 5 includes from the glass substrate outwards (all factors are given for 550 nm):

glass (n = 1.51) titanium oxide (e.g. TiO2) (n = 2.1 to 2.7) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0 ) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon nitride (e.g. Si3N4 ) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) silicon nitride (e.g. Si3N4) (n = 1.8 -2.2, preferably n = 2.0) silicon oxide (e.g. SiO2) (n = 1.4 to 1.7, preferably n = 1.45) air (n = 1.0)

By applying silicon oxide and silicon nitride over the upper contact layer, the coating (layer arrangement) can be defined by an upper dielectric portion T having an effective refractive index n less than that of the middle dielectric portion M, which in turn has an effective refractive index n less than that for the lower dielectric part B. In other words, nT &lt;nM &lt;nB. The silicon oxide and silicon nitride layers may have thicknesses as described above. The embodiment according to Fig. 5 is also advantageous because the upper silicon oxide layer and the upper silicon nitride layer can be sputtered cathodically from the same Si target or the same type of Si target, with the difference in sputtering including the difference in gas flow (i.e. gas flow). oxygen vs. nitrogen gas).

Example (s) of the embodiment according to Fig. 5

The following Tables illustrate Example 1 according to the embodiment of Fig. 5 as compared with Comparative Example (s) (CE) similar to Fig. 1. Thus, CE refers to a coating which is similar to that illustrated in the related application. For these simulation examples in the following

In the tables, the following indices of refraction were assumed for 550 nm: for glass, n = 1.51; for Si3N4, n = 2.0; for SiOxNy, n = 1.72; for SiO2, n = 1.45; for SnO2, n = 2.0 and for TiO2, n = 2.57. The thicknesses for each of the layers in the First Table below are expressed in nanometers (nm). The Second Table below lists the optical characteristics (e.g., visible transmission, color, etc.) for the Example and CE in its expressed (non-HT) and monolithic form.

First TABLE:

layer structure - thicknesses (embodiment according to Fig. 5)

<td></td><td>CE</td><td>Ex. 1</td>

<td> 1</td><td> 2</td><td> 3</td>

<td>glass</td><td></td><td></td>

<td>TiO2</td><td>12.5 nm</td><td>12.5 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>15.2 nm</td>

<td>NiCrOx</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>67.2 nm</td><td>70.7 nm</td>

PL 204 049 B1 cont. table 1

<td> 1</td><td> 2</td><td> 3</td>

<td>SI3N4</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrO_x</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>22.7 nm</td><td>0 nm</td>

<td>Si3N4</td><td>25.2 nm</td><td>25.3 nm</td>

<td>SiO2</td><td>0 nm</td><td>45.7 nm</td>

Table Two:

optical characteristic (embodiment according to Fig. 5, monolithic)

<td></td><td>^T.VIS</td><td>a * T</td><td>b * T</td><td>R from the side glass (g)</td><td>^and* g</td><td>b * b * g</td><td>R from p. Layer (f)</td><td>a * f</td><td>b * f</td>

<td>Ex. 1:</td><td> 77,4%</td><td> -2,6</td><td> 1,9</td><td> 4,6%</td><td> 8,4</td><td> -11,5</td><td> 3,5%</td><td> 8,8</td><td> -12,8</td>

<td>CE:</td><td> 75,5%</td><td> -2,1</td><td> 0,2</td><td> 5,9%</td><td> 9,2</td><td> -10,6</td><td> 5,2%</td><td> 3,2</td><td> -1,0</td>

From the above Tables of the Embodiments of Figure 5, it can be seen that the antireflection system allows not only improved visible transmission characteristics (i.e., increased TViS% transmittance), but also reduced reflectance (e.g., lower glass side reflectance). and / or on the layer side). A fairly neutral color is also provided. Example 1 (see Fig. 5) shows better visible transmission (higher Tvis) and better glass and / or film side reflection (lower Rg and / or Rf) than the Comparative Example (CE - see Fig. 1).

Fig. 6 is a cross sectional view of a coated article according to another embodiment of this invention. In this embodiment, the upper dielectric surface comprises a silicon nitride layer (stoichiometric or non-stoichiometric) and a silicon oxynitride layer. From the glass substrate to the outside of the coated article of Figure 6 (all factors are at 550 nm):

glass (n = 1.51) titanium oxide (e.g. TiO2) (n = 2.1 to 2.7) silicon nitride (e.g. Si3N4) (n = 1.8 to 2.2, preferably n = 2.0 ) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) tin oxide (e.g. SnO2) (n = 1.8 to 2.2, preferably n = 2.0) silicon nitride (e.g. Si3N4 ) (n = 1.8 to 2.2, preferably n = 2.0) nickel-chromium oxide (NiCrOx) silver (Ag) nickel-chromium oxide (NiCrOx) silicon nitride (e.g. Si3N4) (n = 1.8 -2.2, preferably n = 2.0) silicon oxynitride (e.g. SiOxNy) (n = 1.45-2.0, preferably n = 1.6-1.9) air (n = 1.0)

By applying silicon oxynitride and silicon nitride over the upper contact layer, the coating (layer system) can be defined by an upper dielectric portion T having an effective refractive index n less than that of the middle dielectric M, which in turn has an effective refractive index n less than that for the lower dielectric part B. In other words, nT &lt;nM &lt;nB. The silicon oxide and silicon nitride layers may have thicknesses as described above.

Example (s) of the embodiment according to Fig. 6

The following Tables illustrate Example 1 according to the embodiment of Fig. 6 as compared to Comparative Example (s) (CE) similar to Fig. 1. Thus, CE refers to a coating which is similar to that illustrated in the related application. For these simulation examples

In the Tables below, the following indices of refraction were assumed at 550 nm: for glass, n = 1.51; for Si3N4, n = 2.0; for SiOxNy, n = 1.72; for SiO2, n = 1.45; for SnO2, n = 2.0 and for TiO2, n = 2.57. The thicknesses for each of the layers in the First Table below are expressed in nm (nanometers). The Second Table below gives the optical characteristics (e.g. visible transmission, color, etc.) for the Examples based on annealed form and monolithic form.

First TABLE:

layer structure - thicknesses (embodiment according to Fig. 6)

<td></td><td>CE</td><td>Ex. 1</td>

<td>glass</td><td></td><td></td>

<td>TiO2</td><td>12.5 nm</td><td>12.5 nm</td>

<td>S13N4</td><td>16.5 nm</td><td>15.4 nm</td>

<td>NiCrOx</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>67.2 nm</td><td>72.2 nm</td>

<td>Si3N4</td><td>16.5 nm</td><td>16.5 nm</td>

<td>NiCrO_x</td><td>1.8 nm</td><td>1.8 nm</td>

<td>Ag</td><td>9.8 nm</td><td>9.8 nm</td>

<td>NiCrOx</td><td>1.6 nm</td><td>1.6 nm</td>

<td>SnO2</td><td>22.7 nm</td><td>0 nm</td>

<td>Si3N4</td><td>25.2 nm</td><td>19.8nm</td>

<td>SiO_XNy</td><td>0 nm</td><td>33.6 nm</td>

Table Two:

optical characteristic (embodiment according to Fig. 6, monolithic)

<td></td><td>^T.VIS</td><td>a * T</td><td>b * T</td><td>R on the glass side (g)</td><td>^and* g</td><td>b * b * g</td><td>R from p. Layer (f)</td><td>a * f</td><td>b * f</td>

<td>Ex. 1:</td><td> 77,0%</td><td> -2,5</td><td> 1,3</td><td> 4,7%</td><td> 10,2</td><td> -10,1</td><td> 4,0%</td><td> 6,4</td><td> -5,4</td>

<td>CE:</td><td> 75,5%</td><td> -2,1</td><td> 0,2</td><td> 5,9%</td><td> 9,2</td><td> -10,6</td><td> 5,2%</td><td> 3,2</td><td> -1,0</td>

From the above Tables relating to embodiments of the present invention of Fig. 6, it can be seen that the antireflection system of the present invention allows not only improved visible transmission characteristics (i.e., increased Tvis% transmittance), but also reduced reflectance (e.g., lower reflectance). glass side and / or layer side reflectance). In addition, a fairly neutral color is also provided. Example 1 (see fig. 6) shows better visible transmission (higher TViS) and better glass and / or film side reflection (lower Rg and / or Rf) than the Comparative Example (CE - see Fig. 1).

Accordingly, coated articles according to certain embodiments of this invention are defined by one or more of the following parameters:

<td>Characteristic</td><td>generally</td><td>more preferably</td><td>most preferably</td>

<td>Tvis (I11. C, 2 degrees):</td><td> &gt;= 70%</td><td> &gt;= 75%</td><td> &gt;= 76,5%</td>

<td>RgY (I11. C, 2 degrees):</td><td> &lt;= 11%</td><td> &lt;= 9%</td><td> &lt;= 5,0%</td>

<td>RfY (I11. C, 2 degrees):</td><td> &lt;= 11%</td><td> &lt;= 9%</td><td> &lt;= 5,0%</td>

<td>^T.elephant.</td><td> &lt;= 50%</td><td> &lt;= 48%</td><td></td>

While the invention has been described in conjunction with what is presently contemplated as the most practical and preferred embodiment, it should be understood that the invention is not limited to

The disclosed embodiment, on the contrary, is intended to cover the various variations and equivalent arrangements contained in the spirit and scope of the appended claims. For example and non-limitingly, substances other than those described above may be used in other embodiments of the present invention without departing from the spirit of the invention.