IL177221A0 - STAGE DRIVE METHOD AND STAGE UNIT, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

180 members in 12 offices

This recordMember, by publication datePriority claim2 more offices are in the list below

Priority claims3

Priority claims
Document	Office	Kind	Date
2004025837	Japan	A	2004-02-02
2004300566	Japan	A	2004-10-14
2005001076	Japan	W	2005-01-27

Members180

Family members, oldest first
Document	Office	Kind
WO2005074014A1	World Intellectual Property Organization (WIPO)	A1	2005-08-11
TW200537254A	Taiwan Province of China	A	2005-11-16
EP1713113A1	European Patent Office (EPO)	A1	2006-10-18
KR20060120693A	Republic of Korea	A	2006-11-27
IL177221A0This record	Israel	A0	2006-12-10
CN1918695A	China	A	2007-02-21
HK1093606A	Hong Kong, China	A	2007-03-02
HK1093606A1	Hong Kong, China	A1	2007-03-02
EP1713113A4	European Patent Office (EPO)	A4	2007-05-02
US2007127006A1	United States of America	A1	2007-06-07
JPWO2005074014A1	Japan	A1	2007-09-13
US2007211235A1	United States of America	A1	2007-09-13
US2007247607A1	United States of America	A1	2007-10-25
SG152291A1	Singapore	A1	2009-05-29
SG152294A1	Singapore	A1	2009-05-29
US7589822B2	United States of America	B2	2009-09-15
US2009231564A1	United States of America	A1	2009-09-17
CN100552879C	China	C	2009-10-21
TW200944960A	Taiwan Province of China	A	2009-11-01
TW200944961A	Taiwan Province of China	A	2009-11-01
TW200944962A	Taiwan Province of China	A	2009-11-01
TW200944963A	Taiwan Province of China	A	2009-11-01
TW200944964A	Taiwan Province of China	A	2009-11-01
US2009296067A1	United States of America	A1	2009-12-03
US2009296069A1	United States of America	A1	2009-12-03
CN101685263A	China	A	2010-03-31
JP2010098332A	Japan	A	2010-04-30
JP2010098333A	Japan	A	2010-04-30
US2010182584A1	United States of America	A1	2010-07-22
HK1139469A	Hong Kong, China	A	2010-09-17
HK1139469A1	Hong Kong, China	A1	2010-09-17
EP1713113B1	European Patent Office (EPO)	B1	2010-12-29
EP2267759A2	European Patent Office (EPO)	A2	2010-12-29
AT493753T	Austria	T	2011-01-15
ATE493753T1	Austria	T1	2011-01-15
US2011025998A1	United States of America	A1	2011-02-03
DE602005025596D1	Germany	D1	2011-02-10
EP2284866A2	European Patent Office (EPO)	A2	2011-02-16
EP2287893A2	European Patent Office (EPO)	A2	2011-02-23
EP2287894A2	European Patent Office (EPO)	A2	2011-02-23
US2011051104A1	United States of America	A1	2011-03-03
US2011051105A1	United States of America	A1	2011-03-03
US2011058149A1	United States of America	A1	2011-03-10
KR20110025884A	Republic of Korea	A	2011-03-11
KR20110036121A	Republic of Korea	A	2011-04-06
KR20110036122A	Republic of Korea	A	2011-04-06
KR20110038140A	Republic of Korea	A	2011-04-13
KR20110038141A	Republic of Korea	A	2011-04-13
JP2011097112A	Japan	A	2011-05-12
JP2011124606A	Japan	A	2011-06-23
JP2011211222A	Japan	A	2011-10-20
US8045136B2	United States of America	B2	2011-10-25
KR20110137389A	Republic of Korea	A	2011-12-22
HK1151144A	Hong Kong, China	A	2012-01-20
HK1151144A1	Hong Kong, China	A1	2012-01-20
HK1151630A	Hong Kong, China	A	2012-02-03
HK1151630A1	Hong Kong, China	A1	2012-02-03
HK1151631A	Hong Kong, China	A	2012-02-03
HK1151631A1	Hong Kong, China	A1	2012-02-03
JP4910394B2	Japan	B2	2012-04-04
JP4952802B2	Japan	B2	2012-06-13
JP4952803B2	Japan	B2	2012-06-13
TW201229689A	Taiwan Province of China	A	2012-07-16
TW201229690A	Taiwan Province of China	A	2012-07-16
JP2012142603A	Japan	A	2012-07-26
JP2012142604A	Japan	A	2012-07-26
KR20120092676A	Republic of Korea	A	2012-08-21
US2012212713A1	United States of America	A1	2012-08-23
KR20120099508A	Republic of Korea	A	2012-09-10
KR20120099792A	Republic of Korea	A	2012-09-11
KR101187616B1	Republic of Korea	B1	2012-10-05
KR101187614B1	Republic of Korea	B1	2012-10-08
KR101187615B1	Republic of Korea	B1	2012-10-08
KR101187618B1	Republic of Korea	B1	2012-10-08
KR101191061B1	Republic of Korea	B1	2012-10-15
EP2267759A3	European Patent Office (EPO)	A3	2012-10-31
EP2287893A3	European Patent Office (EPO)	A3	2012-10-31
EP2284866A3	European Patent Office (EPO)	A3	2012-11-07
EP2287894A3	European Patent Office (EPO)	A3	2012-11-07
SG185342A1	Singapore	A1	2012-11-29
SG185343A1	Singapore	A1	2012-11-29
KR101235523B1	Republic of Korea	B1	2013-02-20
TWI390358B	Taiwan Province of China	B	2013-03-21
TW201316142A	Taiwan Province of China	A	2013-04-16
CN101685263B	China	B	2013-04-17
KR101276423B1	Republic of Korea	B1	2013-06-19
KR101276512B1	Republic of Korea	B1	2013-06-24
KR101288139B1	Republic of Korea	B1	2013-07-19
JP2013145918A	Japan	A	2013-07-25
IL177221A	Israel	A	2013-07-31
IL226838A0	Israel	A0	2013-07-31
IL226839A0	Israel	A0	2013-07-31
IL226840A0	Israel	A0	2013-07-31
IL226841A0	Israel	A0	2013-07-31
JP5287896B2	Japan	B2	2013-09-11
JP5287897B2	Japan	B2	2013-09-11
JP5287932B2	Japan	B2	2013-09-11
US8547528B2	United States of America	B2	2013-10-01
US8553203B2	United States of America	B2	2013-10-08
JP5333622B2	Japan	B2	2013-11-06

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Events

Legal events, newest first
	Event	Code
2019-01-31	Patent renewedKB	KB
2014-12-31	Patent renewedKB	KB
2014-01-30	Patent renewedKB	KB
2013-11-28	Patent grantedGrantedFF	FF

Numbers

Application: 17722106

Titles

English: STAGE DRIVE METHOD AND STAGE UNIT, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Classification

CPC, 9: G03F7/70725
G03F7/70733
G03F7/70341
Y10T29/49155
G03F7/70666
G03F7/70775
G03F7/70758
G03F7/70833
G03F7/70908
Filled: the office’s first classification
IPC, 1: G03F7 20

Stage drive method and stage unit, exposure apparatus, and device manufacturing method

Abstract

Term