Diamond field effect transistor and process for producing the same
Abstract
A diamond semiconductor element is disclosed which has a gate electrode, a source electrode and a drain electrode formed on a diamond single-crystal thin-film at a distance from each other, characterized in that said source electrode includes a first area close to said diamond single-crystal thin-film and a second area except the first area, where a first distance between a first end face of said first area close to said gate electrode and said gate electrode is no more than a second distance between a second end face of said second area close to said gate electrode and said gate electrode. Further, said drain electrode includes a third area close to said diamond single-crystal thin-film and a fourth area except the third area, where a third distance between a third end face of said third area close to said gate electrode and said gate electrode is no more than a fourth distance between a fourth end face of said fourth area close to said gate electrode and said gate electrode.

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Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0439114A1 | Cites | European Patent Office (EPO) | A | Search report | 1-14 |
| EP0702413A2 | Cites | European Patent Office (EPO) | A | Search report | 1-14 |
| GB2258760A | Cites | United Kingdom | XYI | Search report | 1,6 |
| JPH03222436A | Cites | Japan | Y | Search report | 13,14 |
| HIROSHI KAWARADA ET AL: "ENHANCEMENT MODE METAL-SEMICONDUCTOR FIELD EFFECT TRANSISTORS USINGHOMOEPITAXIAL DIAMONDS", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 65, no. 12, 19 September 1994 (1994-09-19), pages 1563 - 1565, XP000470284, ISSN: 0003-6951, DOI: 10.1063/1.112915 | Non-patent | – | – | Search report | – |
| YUHONG CAI ET AL: "Ti/Ni/Au/diamond MIS field effect transistors with TiO2 gate dielectri", vol. 744, 1 January 2003 (2003-01-01), pages M8.8.1 - M8.8.6, XP008146375, ISBN: 978-1-55899-681-6, Retrieved from the Internet <URL:http://journals.cambridge.org/abstract_S1946427400154703> DOI: 10.1557/PROC-744-M8.8 | Non-patent | – | – | Search report | – |
45 members in 6 offices
Priority claims10
| Document | Office | Kind | Date |
|---|---|---|---|
| 2005179751 | Japan | – | |
| 2005179751 | Japan | A | |
| 2005270541 | Japan | – | |
| 2005270541 | Japan | A | |
| 2005307231 | Japan | – | |
| 2005307231 | Japan | A | |
| 2006061838 | Japan | – | |
| 2006061838 | Japan | A | |
| 06766995 | European Patent Office (EPO) | A | |
| 2006312334 | Japan | W |
Members45
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| WO2006137401A1 | World Intellectual Property Organization (WIPO) | A1 | |
| KR20070083755A | Republic of Korea | A | |
| CN101053075A | China | A | |
| EP1895579A1 | European Patent Office (EPO) | A1 | |
| US2008134959A1 | United States of America | A1 | |
| US2008134960A1 | United States of America | A1 | |
| US2008217626A1 | United States of America | A1 | |
| JPWO2006137401A1 | Japan | A1 | |
| EP1895579A4 | European Patent Office (EPO) | A4 | |
| CN100508144C | China | C | |
| KR100913401B1 | Republic of Korea | B1 | |
| US2009261347A1 | United States of America | A1 | |
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| JP2011176335A | Japan | A | |
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| JP2011225440A | Japan | A | |
| EP2400530A2 | European Patent Office (EPO) | A2 | |
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| EP2400532A2 | European Patent Office (EPO) | A2 | |
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| US2012034737A1 | United States of America | A1 | |
| EP2400533A3This record | European Patent Office (EPO) | A3 | |
| EP2400531A3 | European Patent Office (EPO) | A3 | |
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| JP4908409B2 | Japan | B2 | |
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| US8221548B2 | United States of America | B2 | |
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| EP2816588A3 | European Patent Office (EPO) | A3 | |
| EP2790207B1 | European Patent Office (EPO) | B1 | |
| EP1895579B1 | European Patent Office (EPO) | B1 | |
| EP2816588B1 | European Patent Office (EPO) | B1 | |
| EP2400533B1 | European Patent Office (EPO) | B1 |
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Numbers
- Publication
- 2400533
- Application
- 111824637
Titles3
- German
- Diamant Feldeffekttransistor und Verfahren zur Herstellung
- English
- Diamond field effect transistor and process for producing the same
- French
- Transistor à effet de champ en diamant et procédé pour sa fabrication
Classification
- CPC, 33
- H10P95/90
- H10P10/00
- C23C16/274
- C23C16/278
- C30B25/105
- C30B29/04
- C30B33/02
- C30B33/06
- H10H20/014
- H10D62/405
- H10D62/8303
- H10D64/62
- H10D48/031
- H10D30/01
- H10D30/031
- H10D30/061
- H10D10/40
- H10D30/60
- H10D30/6741
- H10D30/87
- H10P90/123
- H10P90/14
- H10P14/2903
- H10P14/2926
- H10P14/3406
- H10P14/3444
- H10P14/3466
- H10P30/2044
- H10P14/24
- H10P30/28
- H10P30/21
- C23C16/27
- H10D10/00
- IPC, 17
- H01L21 338
- H01L29 812
- H01L29 45
- H10D30 01
- H01L33 00
- H10D62 815
- H10D10 00
- H10D10 40
- H10D30 67
- H10D30 87
- H10D62 40
- H10D62 50
- H10D62 83
- H10D62 834
- H10D64 20
- H10D64 23
- H10D64 62
Designated states1
- Contracting states, 1
- United Kingdom