EP1520892A3
Polishing composition
Abstract
A polishing composition of the present invention, to be used in polishing for forming wiring in a semiconductor device, includes: a specific surfactant; a silicon oxide; at least one selected from the group consisting of carboxylic acid and alpha-amino acid; a corrosion inhibitor; an oxidant; and water. This polishing composition is capable of suppressing the occurrence of the dishing.

Term
Term ended
Projected expiry passed 30 September 2024, 2 years ago.
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1 sheet
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Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| US2002095874A1 | Cites | United States of America | A | Search report | 1 |
| US2003170991A1 | Cites | United States of America | A | Search report | 1 |
35 members in 8 offices; this record represents the family
Priority claims10
| Document | Office | Kind | Date |
|---|---|---|---|
| 2003342530 | Japan | – | |
| 2003342531 | Japan | – | |
| 2003342530 | Japan | A | |
| 2003342531 | Japan | A | |
| 2003352952 | Japan | – | |
| 2003352952 | Japan | A | |
| 2003394593 | Japan | – | |
| 2003394593 | Japan | A | |
| 2003396171 | Japan | – | |
| 2003396171 | Japan | A |
Members35
| Document | Office | Kind | |
|---|---|---|---|
| EP1520892A2 | European Patent Office (EPO) | A2 | |
| KR20050031992A | Republic of Korea | A | |
| JP2005109256A | Japan | A | |
| JP2005116987A | Japan | A | |
| SG110211A1 | Singapore | A1 | |
| CN1616575A | China | A | |
| JP2005129880A | Japan | A | |
| US2005108949A1 | United States of America | A1 | |
| JP2005158970A | Japan | A | |
| TW200532007A | Taiwan Province of China | A | |
| EP1520892A3This record | European Patent Office (EPO) | A3 | |
| CN101177592A | China | A | |
| CN101186784A | China | A | |
| CN100393833C | China | C | |
| CN101215447A | China | A | |
| US7485162B2 | United States of America | B2 | |
| JP4406554B2 | Japan | B2 | |
| JP4608196B2 | Japan | B2 | |
| CN101186784B | China | B | |
| KR20110084481A | Republic of Korea | A | |
| KR20110084482A | Republic of Korea | A | |
| CN101177592B | China | B | |
| JP4759219B2 | Japan | B2 | |
| TWI347969B | Taiwan Province of China | B | |
| CN101215447B | China | B | |
| KR101074875B1 | Republic of Korea | B1 | |
| EP1520892B1 | European Patent Office (EPO) | B1 | |
| AT538188T | Austria | T | |
| ATE538188T1 | Austria | T1 | |
| EP2418259A1 | European Patent Office (EPO) | A1 | |
| EP2418260A1 | European Patent Office (EPO) | A1 | |
| KR101110707B1 | Republic of Korea | B1 | |
| KR101216514B1 | Republic of Korea | B1 | |
| EP2418259B1 | European Patent Office (EPO) | B1 | |
| EP2418260B1 | European Patent Office (EPO) | B1 |
61 legal events, as 8 offices reported them to INPADOC
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| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent lapsedLapsedMM4A | MM4A | IE | |
| Notification of lapseLapsedST | ST | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent ceasedCeasedPL | PL | CH | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filed against granted patent, or epo opposition proceedings concluded without decisionGrantedR097 | R097 | DE | |
| No opposition filedOpposition26N | 26N | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Deletion acc. to par. 5 (withdrawal of the translation of the ep patent)MK05 | MK05 | AT | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Discontinued in the netherlands as no translation has been filedVDEP | VDEP | NL | |
| Dpma publication of mentioned ep patent grantGrantedR096 | R096 | DE | |
| European patents granted designating irelandGrantedFG4D | FG4D | IE | |
| Reference to at number (ep patent enters austrian national phase)REF | REF | AT | |
| European patent takes effect as a national patent in ch/liEP | EP | CH | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Designation fees paidAKX | AKX | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1520892
- Application
- 40233637
Titles3
- German
- Polierzusammensetzung
- English
- Polishing composition
- French
- Composition de polissage
Classification
- CPC, 10
- C09G1/02
- H10W20/062
- C09K3/1463
- C23F3/04
- H10P52/403
- C09K8/528
- H10P52/402
- H10P52/00
- C01B33/023
- C11D1/00
- IPC, 5
- C09G1 02
- C09K3 14
- H01L21 321
- H01L21 768
- H01L21 3105
Designated states33
- Contracting states, 28
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Italy
- Liechtenstein
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Poland
- Portugal
- Romania
and 4 moreShow fewer
- Sweden
- Slovenia
- Slovakia
- Türkiye
- Extension states, 5
- Albania
- Croatia
- Lithuania
- Latvia
- North Macedonia