Nova Patents
AT205017T

Wet chemical treatment installation

Abstract

The invention relates to in comprises a processing fluid (23) trough time chemical wet processing to the substrate the device (20). The equipment (20) comprises with a induct and emigrate at least substrate carrier (17) and substrate (25) lifting device. The invention, wherein (25) and a first transmission and (17) and a second transmission is realized with continuous and emigration operation wherein a substrate carrier for lifting mechanism substrate.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

21 members in 11 offices

This recordMember, by publication datePriority claim1 more office is in the list below

Priority claims3

Priority claims
DocumentOfficeKindDate
19500239GermanyA
19546990GermanyA
9505153European Patent Office (EPO)W

Members21

Family members, oldest first
DocumentOfficeKind
CA2209339A1CanadaA1
DE19546990A1GermanyA1
WO9621241A1World Intellectual Property Organization (WIPO)A1
FI972733AFinlandA
DE19546990C2GermanyC2
EP0801814A1European Patent Office (EPO)A1
CN1171858AChinaA
JPH10503327AJapanA
KR980701133ARepublic of KoreaA
US5902402AUnited States of AmericaA
TW399224BTaiwan Province of ChinaB
JP3088463B2JapanB2
DE19549487C2GermanyC2
KR100275166B1Republic of KoreaB1
DE19549490C2GermanyC2
DE19549488C2GermanyC2
EP0801814B1European Patent Office (EPO)B1
AT205017TThis recordAustriaT
ATE205017T1AustriaT1
DE59509568D1GermanyD1
CN1084048CChinaC