PL337531A1

Compositions for and methods of inhibiting photo-ageing of skin

Abstract

Compositions and methods are provided for ameliorating various effects of UVA and UVB radiation from the sun. The compositions including an ingredient that prevents photoaging from MED and subMED radiation, such as a retinoid, certain other compounds (such as N-acetylcysteine, 2-furildioxime, and vitamin C) and optionally other MMP inhibitors such as tetracyclines and/or compounds that inhibit the P-450-mediated metabolism of retinoids such as ketoconazole and other azole compounds. In the method, the composition is applied prior to exposure to the sun; depending upon the ingredients used in the composition, application should be from 7 to 48 hours prior to exposure. Compounds that prevent erythema (skin reddening, sunburn) do not necessarily protect against UV-mediated elevation of MMP levels and activity, and similarly compounds that prevent UV-mediated elevation of MMP levels and activity are not necessarily effective against UV-induced erythema.

Term

Term ended

Projected expiry passed 3 June 2018, 8.3 years ago.

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101 members in 51 offices

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Priority claims
DocumentOfficeKindDate
4852097United States of AmericaP
4852097United States of AmericaP
5797697United States of AmericaP
5797697United States of AmericaP
60048520
60057976
US19970048520P
US19970057976P

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CA2292600A1CanadaA1
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ID20400AIndonesiaA
WO9855075A2World Intellectual Property Organization (WIPO)A2
AU8057398AAustraliaA
MA24560A1MoroccoA1
ZA984791BSouth AfricaB
WO9855075A3World Intellectual Property Organization (WIPO)A3
NO995768D0NorwayD0
NO995768LNorwayL
CA2343760A1CanadaA1
WO0015198A1World Intellectual Property Organization (WIPO)A1
ZA995839BSouth AfricaB
UY25710A1UruguayA1
AU1779499AAustraliaA
EP0998251A2European Patent Office (EPO)A2
PA8452401A1PanamaA1
PA8458701A1PanamaA1
EA199901115A1Eurasian Patent Organization (EAPO)A1
SV1999000152AEl SalvadorA
CN1259040AChinaA
CO4940361A1ColombiaA1
PL337531A1This recordPolandA1
EP0998251A4European Patent Office (EPO)A4
PE20001058A1PeruA1
US6130254AUnited States of AmericaA
BR9809969ABrazilA
KR20010013415ARepublic of KoreaA
GT199900151AGuatemalaA
HN1999000158AHondurasA
IS5885AIcelandA
NO20011276D0NorwayD0
AR014877A1ArgentinaA1
NO20011276LNorwayL
EP1107741A1European Patent Office (EPO)A1
TR200100731T2TürkiyeT2
IN186245BIndiaB
IN186250BIndiaB
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SK3472001A3SlovakiaA3
BR9913696ABrazilA
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EA200100346A1Eurasian Patent Organization (EAPO)A1
JP2001520677AJapanA
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NZ510487ANew ZealandA
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EP1107741B1European Patent Office (EPO)B1
ATE245414T1AustriaT1
DE69909801D1GermanyD1
DK1107741T3DenmarkT3
EA200300847A1Eurasian Patent Organization (EAPO)A1
PT1107741EPortugalE
SI1107741T1SloveniaT1
ES2204098T3SpainT3
GEP20043216BGeorgiaB
EA004443B1Eurasian Patent Organization (EAPO)B1
HRP20010187B1CroatiaB1
NZ523747ANew ZealandA
DE69909801T2GermanyT2
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OA11652AAfrican Intellectual Property Organization (OAPI)A
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TNSN98077A1TunisiaA1
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CU23040A3CubaA3
TWI234467BTaiwan Province of ChinaB
HU0103632A3HungaryA3
HUP0103632A3HungaryA3
EA005767B1Eurasian Patent Organization (EAPO)B1
UA73287C2UkraineC2
US6942870B2United States of AmericaB2
US6960356B1United States of AmericaB1
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