Nova Patents
IL258355A

Projection optical system and exposure apparatus, method of manufacture thereof and method of use thereof to effect exposure of a pattern on a substrate

Abstract

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Term

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80 members in 8 offices

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DocumentOfficeKindDate
2003128154JapanA
2003350647JapanA
2003364596JapanA
2004006417JapanW

Members80

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JP2004333761AJapanA
WO2004107011A1World Intellectual Property Organization (WIPO)A1
JP2005115127AJapanA
JP2005129775AJapanA
KR20060009891ARepublic of KoreaA
EP1630585A1European Patent Office (EPO)A1
CN1784623AChinaA
US2006121364A1United States of AmericaA1
US2007024960A1United States of AmericaA1
US2007037079A1United States of AmericaA1
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CN101216598AChinaA
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CN101216600AChinaA
CN101216682AChinaA
CN100405119CChinaC
CN101295140AChinaA
US2009168189A1United States of AmericaA1
SG160223A1SingaporeA1
IL171745AIsraelA
EP1630585A4European Patent Office (EPO)A4
CN101216599BChinaB
CN101216598BChinaB
CN101216600BChinaB
CN101295140BChinaB
US2011002032A1United States of AmericaA1
JP4706171B2JapanB2
KR20110111540ARepublic of KoreaA
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EP2672307A2European Patent Office (EPO)A2
KR101384037B1Republic of KoreaB1
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EP2722702A2European Patent Office (EPO)A2
EP2722703A2European Patent Office (EPO)A2
EP2722704A2European Patent Office (EPO)A2
EP2672307A3European Patent Office (EPO)A3
EP2722702A3European Patent Office (EPO)A3
EP2722703A3European Patent Office (EPO)A3
EP2722704A3European Patent Office (EPO)A3
US2014211180A1United States of AmericaA1
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KR20160097384ARepublic of KoreaA
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KR101790914B1Republic of KoreaB1
KR20170119737ARepublic of KoreaA
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IL196080AIsraelA
IL196080BIsraelB
IL258355AThis recordIsraelA
US2018299785A1United States of AmericaA1
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CN101216682BChinaB