IL196080B

Projection optical system and exposure apparatus, method of manufacture thereof and method of use thereof to effect exposure of a pattern on a substrate

Abstract

This record has no abstract on file.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Published
  4. Today

80 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims4

Priority claims
DocumentOfficeKindDate
2003128154JapanA
2003350647JapanA
2003364596JapanA
2004006417JapanW

Members80

Family members, oldest first
DocumentOfficeKind
JP2004333761AJapanA
WO2004107011A1World Intellectual Property Organization (WIPO)A1
JP2005115127AJapanA
JP2005129775AJapanA
KR20060009891ARepublic of KoreaA
EP1630585A1European Patent Office (EPO)A1
CN1784623AChinaA
US2006121364A1United States of AmericaA1
US2007024960A1United States of AmericaA1
US2007037079A1United States of AmericaA1
US2007037080A1United States of AmericaA1
US7309870B2United States of AmericaB2
US7312463B2United States of AmericaB2
US2007297072A1United States of AmericaA1
US7348575B2United States of AmericaB2
CN101216598AChinaA
CN101216599AChinaA
CN101216600AChinaA
CN101216682AChinaA
CN100405119CChinaC
CN101295140AChinaA
US2009168189A1United States of AmericaA1
SG160223A1SingaporeA1
IL171745AIsraelA
EP1630585A4European Patent Office (EPO)A4
CN101216599BChinaB
CN101216598BChinaB
CN101216600BChinaB
CN101295140BChinaB
US2011002032A1United States of AmericaA1
JP4706171B2JapanB2
KR20110111540ARepublic of KoreaA
US2012092760A1United States of AmericaA1
KR20120050531ARepublic of KoreaA
KR101194449B1Republic of KoreaB1
KR20130010084ARepublic of KoreaA
KR20130024957ARepublic of KoreaA
KR101273713B1Republic of KoreaB1
KR20130119991ARepublic of KoreaA
US2013314679A1United States of AmericaA1
EP2672307A2European Patent Office (EPO)A2
KR101384037B1Republic of KoreaB1
KR101383984B1Republic of KoreaB1
EP2722702A2European Patent Office (EPO)A2
EP2722703A2European Patent Office (EPO)A2
EP2722704A2European Patent Office (EPO)A2
EP2672307A3European Patent Office (EPO)A3
EP2722702A3European Patent Office (EPO)A3
EP2722703A3European Patent Office (EPO)A3
EP2722704A3European Patent Office (EPO)A3
US2014211180A1United States of AmericaA1
US2014211182A1United States of AmericaA1
US2014211183A1United States of AmericaA1
KR20140097575ARepublic of KoreaA
KR20140097576ARepublic of KoreaA
KR20140097577ARepublic of KoreaA
SG10201405231YASingaporeA
KR20140133950ARepublic of KoreaA
KR101481935B1Republic of KoreaB1
KR20150034817ARepublic of KoreaA
KR101516140B1Republic of KoreaB1
KR101516141B1Republic of KoreaB1
KR101516142B1Republic of KoreaB1
KR101521407B1Republic of KoreaB1
US9081295B2United States of AmericaB2
US9086635B2United States of AmericaB2
KR101647934B1Republic of KoreaB1
KR20160097384ARepublic of KoreaA
US9500943B2United States of AmericaB2
US9606443B2United States of AmericaB2
KR101790914B1Republic of KoreaB1
KR20170119737ARepublic of KoreaA
US9846366B2United States of AmericaB2
US9933705B2United States of AmericaB2
IL196080AIsraelA
IL196080BThis recordIsraelB
IL258355AIsraelA
US2018299785A1United States of AmericaA1
US10156792B2United States of AmericaB2
CN101216682BChinaB