IL256753B
Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
Abstract
This record has no abstract on file.
Term
No projected expiry on record.
- Priority
- Filed
- Published
- Today
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO0227288A1 | Cites | World Intellectual Property Organization (WIPO) | Y | Search report | 1-8,11-18,24-25 |
| US2005200859A1 | Cites | United States of America | Y | Search report | 1-8,11-18,24-25 |
| US5963329A | Cites | United States of America | Y | Search report | 1-8,11-18,24-25 |
18 members in 8 offices
Priority claims2
| Document | Office | Kind | Date |
|---|---|---|---|
| 15177294 | European Patent Office (EPO) | A | |
| 2016065258 | European Patent Office (EPO) | W |
Members18
| Document | Office | Kind | |
|---|---|---|---|
| NL2017074A | Netherlands (Kingdom of the) | A | |
| US2017017738A1 | United States of America | A1 | |
| WO2017012840A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW201712437A | Taiwan Province of China | A | |
| TWI606312B | Taiwan Province of China | B | |
| KR20180030162A | Republic of Korea | A | |
| IL256753A | Israel | A | |
| CN107924142A | China | A | |
| JP2018522279A | Japan | A | |
| US10592618B2 | United States of America | B2 | |
| KR102099283B1 | Republic of Korea | B1 | |
| US2020202054A1 | United States of America | A1 | |
| JP6810734B2 | Japan | B2 | |
| IL256753BThis record | Israel | B | |
| IL280148A | Israel | A | |
| CN107924142B | China | B | |
| IL280148B | Israel | B | |
| US11429763B2 | United States of America | B2 |
2 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Patent renewedKB | KB | |
| Patent grantedGrantedFF | FF |
Numbers
- Publication
- 256753
- Application
- 25675318
Titles2
- English
- Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
- Hebrew
- שיטות ומכשיר לסימולציה של אינטראקציה של קרינה עם מבנים, שיטות מטרולוגיות ומכשיר, שיטה להכנת התקן
Classification
- CPC, 10
- G03F7/705
- G03F7/70058
- G06F30/20
- G03F7/70625
- H10P50/691
- H10P50/242
- H10P74/23
- G03F7/706839
- G03F7/706849
- G03F7/706851