Nova Patents
ES2129403T3

Stripping compositions and method of stripping resists from substrates.

Abstract

A DETACHING COMPOSITION IS DESCRIBED FOR REMOVING RESISTANTS FROM SUBSTRATES CONTAINING HYDROXYLAMINE AND AT LEAST ONE ALKANOLAMINE. OPTIONALLY, ONE OR MORE POLAR SOLVENTS MAY ALSO BE INCLUDED IN THE DETACHING COMPOSITION. THE DETACHING COMPOSITION IS ESPECIALLY USEFUL FOR REMOVING PHOTORESISTENTS FROM A SUBSTRATE DURING THE MANUFACTURE OF INTEGRAL SEMICONDUCTING CIRCUITS AND FOR REMOVING CURED POLYMER COATINGS, SUCH AS POLYIMIDE COATINGS.

Term

Term ended

Projected expiry passed 5 November 2011, 14.9 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

112 members in 14 offices

This recordMember, by publication datePriority claim4 more offices are in the list below

Priority claims2

Priority claims
DocumentOfficeKindDate
19900610044United States of America–
61004490United States of AmericaA

Members112

Family members, oldest first
DocumentOfficeKind
EP0485161A1European Patent Office (EPO)A1
JPH04289866AJapanA
EP0578507A2European Patent Office (EPO)A2
US5279771AUnited States of AmericaA
KR940005789ARepublic of KoreaA
US5334332AUnited States of AmericaA
JPH06266119AJapanA
US5381807AUnited States of AmericaA
EP0578507A3European Patent Office (EPO)A3
US5482566AUnited States of AmericaA
KR970007328B1Republic of KoreaB1
US5672577AUnited States of AmericaA
JPH09296200AJapanA
JP2691952B2JapanB2
WO9836045A1World Intellectual Property Organization (WIPO)A1
WO9840453A1World Intellectual Property Organization (WIPO)A1
AU6697998AAustraliaA
WO9845399A1World Intellectual Property Organization (WIPO)A1
EP0485161B1European Patent Office (EPO)B1
AT176337TAustriaT
ATE176337T1AustriaT1
DE69130823D1GermanyD1
EP0909311A1European Patent Office (EPO)A1
US5902780AUnited States of AmericaA
US5911835AUnited States of AmericaA
ES2129403T3This recordSpainT3
JPH11194505AJapanA
GR3030070T3GreeceT3
DE69130823T2GermanyT2
DK0485161T3DenmarkT3
US5981454AUnited States of AmericaA
US6000411AUnited States of AmericaA
EP0975731A1European Patent Office (EPO)A1
JP3048207B2JapanB2
TW396202BTaiwan Province of ChinaB
US6110881AUnited States of AmericaA
US6121217AUnited States of AmericaA
US6140287AUnited States of AmericaA
KR20000064914ARepublic of KoreaA
US6156661AUnited States of AmericaA
TW416984BTaiwan Province of ChinaB
KR20010006024ARepublic of KoreaA
JP2001500922AJapanA
EP0975731A4European Patent Office (EPO)A4
US6187730B1United States of AmericaB1
EP0909311A4European Patent Office (EPO)A4
TW426816BTaiwan Province of ChinaB
JP3150306B2JapanB2
US6221818B1United States of AmericaB1
US6242400B1United States of AmericaB1
US2001006936A1United States of AmericaA1
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US6367486B1United States of AmericaB1
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KR100355212B1Republic of KoreaB1
US2003032567A1United States of AmericaA1
US6546939B1United States of AmericaB1
US6564812B2United States of AmericaB2
KR100386137B1Republic of KoreaB1
EP0909311B1European Patent Office (EPO)B1
AT244751TAustriaT
ATE244751T1AustriaT1
DE69816219D1GermanyD1
US2003228990A1United States of AmericaA1
WO03104185A1World Intellectual Property Organization (WIPO)A1
AU2002315510A1AustraliaA1
CN1465687AChinaA
US2004018949A1United States of AmericaA1
US2004067860A1United States of AmericaA1
DE69816219T2GermanyT2
US2004147420A1United States of AmericaA1
US2004198621A1United States of AmericaA1
US6825156B2United States of AmericaB2
EP1509490A1European Patent Office (EPO)A1
KR20050037511ARepublic of KoreaA
US2005090416A1United States of AmericaA1
JP2005528660AJapanA
EP0578507B1European Patent Office (EPO)B1
US2006003909A1United States of AmericaA1
CN1721516AChinaA
DE69333877D1GermanyD1
SG120055A1SingaporeA1
US7051742B2United States of AmericaB2
DE69333877T2GermanyT2
EP0975731B1European Patent Office (EPO)B1
AT340243TAustriaT
ATE340243T1AustriaT1
DE69835951D1GermanyD1
JP3850039B2JapanB2
US7144848B2United States of AmericaB2
US7144849B2United States of AmericaB2
US2007078074A1United States of AmericaA1
US7205265B2United States of AmericaB2
DE69835951T2GermanyT2
US2007207938A1United States of AmericaA1
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