Low emissivity film for high temperature processing.

A method for manufacturing a product coated with multiple layers of low emissivity comprising the steps of: a. placing a transparent non-metallic substrate in a sputtering chamber; b. spraying a metal cathode in a reactive atmosphere comprising oxygen to deposit a first film of transparent and anti-reflective metal oxide on a surface of said substrate; c. depositing a first primer layer on said transparent metal oxide film comprising a metal selected from titanium and zirconium; d. spraying a metal cathode emission surface in an inert atmosphere to deposit an infrared reflective metal film on said first primer layer; and. depositing a second layer of primer containing metal on said infrared reflective metal film comprising a metal selected from titanium and zirconium; F. spraying a metal cathode in a reactive atmosphere comprising oxygen to deposit a second film of transparent and antireflective metal oxide, characterized in that the deposition step of the first primer layer comprises, first, spraying said metal in an oxidizing atmosphere to deposit the oxide of said metal and then pulverize the same metal in an inert atmosphere to deposit said metal.