Nova Patents
ATE77808T1

Low emissivity film for high temperature processing.

Abstract

This record has no abstract on file.

Term

Term ended

Projected expiry passed 12 December 2007, 18.8 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

36 members in 11 offices

This recordMember, by publication datePriority claim1 more office is in the list below

Priority claims2

Priority claims
DocumentOfficeKindDate
94779786United States of AmericaA
94779986United States of AmericaA

Members36

Family members, oldest first
DocumentOfficeKind
EP0275474A1European Patent Office (EPO)A1
JPS63183164AJapanA
BR8707076ABrazilA
KR880007793ARepublic of KoreaA
CN87105971AChinaA
US4806220AUnited States of AmericaA
EP0335309A1European Patent Office (EPO)A1
BR8901510ABrazilA
KR890015969ARepublic of KoreaA
JPH01301537AJapanA
US4898790AUnited States of AmericaA
KR910001774B1Republic of KoreaB1
US5028759AUnited States of AmericaA
US5059295AUnited States of AmericaA
CN1015006BChinaB
EP0275474B1European Patent Office (EPO)B1
KR920005471B1Republic of KoreaB1
AT77808TAustriaT
ATE77808T1This recordAustriaT1
DE3780148D1GermanyD1
DE3780148T2GermanyT2
ES2032807T3SpainT3
GR3005637T3GreeceT3
US5270517AUnited States of AmericaA
EP0335309B1European Patent Office (EPO)B1
DE68915042D1GermanyD1
CA1331867CCanadaC
ES2056136T3SpainT3
DE68915042T2GermanyT2
JPH0715143B2JapanB2
CA1337483CCanadaC
JP2505278B2JapanB2
JPH08336923AJapanA
JP2000192227AJapanA
JP3330281B2JapanB2
JP3389108B2JapanB2