Method and apparatus for accurately applying structures to a substrate
Abstract
A method wherein a substrate is provided, wherein, in a scanning step, structures already applied to the substrate are detected by at least one scanning provision of a processing head, wherein the processing head is provided with at least one lighting provision, which lighting provision locally lights the applied lacquer structure in a lighting step by using the information obtained with the scanning step. Further, an apparatus for carrying out the method is described, which apparatus is provided with a processing head which is which is movable relative to a substrate carrier, wherein the processing head comprises at least one scanning provision and at least one lighting provision.

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Projected expiry passed 22 April 2025, 1.4 years ago.
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19 claims: 12 independent, 7 dependent
- 1A method including:• providing a substrate having structures that are already applied to the substrate;• providing a processing head that is movably arranged relative to the substrate and that has: ○ an inkjet printing provision;○ at least one scanning provision including a first scanning provision that is provided on the upstream side of the inkjet printing provision, viewed in the relative direction of movement of the processing head with respect to the substrate;○ at least one lighting provision configured to locally light the applied lacquer structure;• a scanning step in which the structures already applied to the substrate are detected by the at least one scanning provision of the processing head, • an inkjet printing step in which lacquer is applied locally for forming a lacquer structure to the substrate using the inkjet printing provision of the processing head, wherein the information obtained with the scanning step is also used for depositing the lacquer structure at a desired position;• a lighting step in which the lighting provision locally lights the applied lacquer structure by using the information obtained with the scanning step;• carrying out a first scanning step with the first scanning provision immediately prior to the inkjet printing step.
- 4A method according to any one of the preceding claims, wherein a said scanning step is carried out immediately prior to the lighting step in that a first scanning provision is provided on the processing head, and that on the upstream side of the lighting provision, viewed in the relative direction of movement of the processing head with respect to the substrate.
- 7A method according to at least claim 2, wherein the information obtained with the second scanning provision is also fed back to a measuring system with the aid of which the position of the processing head is controlled.
- 8A method according to any one of the preceding claims, wherein the lacquer structure is applied for the purpose of creating a structure in a material layer applied or to be applied to the substrate.
- 10A method according to any one of the preceding claims, wherein, in the application of the successive structures, an overlay accuracy is achieved of at least 0.7 micron, more particularly at least 0.4 micron.
- 11A method according to any one of the preceding claims, wherein, in the scanning step, an interferometric measurement or a triangulation measurement or image recognition is carried out.
- 12A method according to at least claim 1, wherein the local lighting is carried out using an array of individually controllable lasers, LEDs or similar lighting means which can quickly be switched on and off or modulated, with the aid of which a respective lacquer can be lighted.
- 13An apparatus for carrying out the method according to any one of the preceding claims, wherein the apparatus comprises:• a substrate carrier;• a processing head which is movable relative to the substrate carrier, the processing head including: ○ an inkjet printing provision;○ at least one scanning provision including a first scanning provision that is provided on the upstream side of the inkjet printing provision, viewed in the relative direction of movement of the processing head with respect to the substrate and configured to detect structures already applied to the substrate in a scanning step;○ at least one lighting provision configured to locally light the applied lacquer structure;• a controller configured to control: ○ a scanning step in which the structures already applied to the substrate are detected by the at least one scanning provision of the processing head;○ an inkjet printing step in which lacquer is applied locally for forming a lacquer structure to the substrate using the inkjet printing provision of the processing head, wherein the information obtained with the scanning step is also used for depositing the lacquer structure at a desired position;○ a lighting step in which the lighting provision locally lights the applied lacquer structure by using the information obtained with the scanning step;○ carrying out a first scanning step with the first scanning provision immediately prior to the inkjet printing step.
- 15An apparatus according to any one of claims 13-14, wherein the processing head is provided with two scanning provisions, wherein a second scanning provision is provided downstream of the inkjet printing provision, viewed in the relative direction of movement of the substrate with respect to the processing head.
- 16An apparatus according to any one of claims 15, wherein the first scanning provision is provided upstream and the second scanning provision is provided downstream of the at least one lighting provision, viewed in the relative direction of movement of the substrate with respect to the processing head.
Independent claims12
52 paragraphs, as filed
0001The invention relates to a method and an apparatus for accurately applying lacquer structures to a substrate.
0002To date, use is often made of masks to locally screen a lacquer, which is used for forming the structures, from lighting. The use of such masks is laborious and expensive. Moreover, for each new structure, a new mask needs to be manufactured. Another problem in applying structures to a substrate is formed by the large amount of lacquer and solvents used therein. Another problem one is faced with is providing structures with sharp outlines. The relative positioning of the structures in the various layers is also an important problem for accurately applying structures to a substrate.
0003Applications of the method may, for instance, be a method for manufacturing electronic components, such as for instance an OLED, a solar cell, a TFT structure on a display or the like. With these components, it is very important that, in a large number of layers of material which are applied successively, the structures therein are very accurately positioned with respect to one another. Here, a so-called overlay accuracy of at least 2 microns and preferably at least 1 micron is desired.
0004The invention contemplates a method for applying lacquer structures to a substrate with which at least a number of the above-described problems are solved.
0005For this purpose, the invention provides a method according to claim 1.
0006Using the scanning provision of the processing head, positions of already applied structures can be determined very accurately, so that the applied lacquer structure can very accurately be lighted locally. Preferably, the processing head forms a direct mechanical coupling between the scanning and the lighting provision, which is strongly favorable to the positioning accuracy.
0007In this context, the term "lighting" is to be understood in a broad sense. "Lighting" is not only understood to mean treatment with visible light, but also with UV radiation, IR radiation, ion beam and E beam. The lighting results in a change of the structure of the lacquer, for instance in that the lacquer cross-links or in that the solvent is removed from the lacquer. The term "lacquer" is also to be understood in a broad sense. Possibilities are photoresist, UV-curing lacquer, PPV and PDOT for the purpose of manufacturing OLEDs, and the like.
0008Through the lighting step, carried out by the lighting provision, structures with fine, sharp boundaries can be obtained. A local lighting step is not understood to mean a lighting step using a mask, but locally lighting the lacquer with the aid of one narrow beam or with an array of narrow beams, which are each individually controllable. With such a narrow beam or array of individually controllable narrow beams - which may for instance be laser beams, infrared beams, visible-light beams, UV beams, ion beams or E beams - the desired structure can be written in the lacquer, as it were. The lighting can take place in those areas where the lacquer needs to be removed or, conversely, in those areas where the lacquer needs to remain present, depending on the lacquer used.
0009According to an aspect of the invention, the information obtained with the scanning step is also used for depositing the lacquer structure at a desired position. In this manner, the new lacquer structure can accurately be positioned with respect to the existing structure.
0010The depositing of the lacquer is effected by means of an advantageous printing technique. Because the inkjet printing is used, instead of completely covering the substrate with lacquer, the lacquer can be used in a much less wasteful manner. This is because the lacquer only needs to be applied where the forming of structures is desired. Incidentally, the invention does not preclude the possibility that, with the inkjet printing provision, a complete lacquer layer is applied to the substrate instead of a lacquer structure.
0011Further, in this manner, the processing head is provided with both the inkjet printing provision and with the lighting provision. In that case, in one movement of the processing head with respect to the substrate, both the delivery of lacquer and the lighting of the lacquer just applied can be realized. In this manner, the position of the lighting provision is, moreover, directly mechanically coupled to the position of the processing head. As a result, after the application of the lacquer, it can be determined with great accuracy where this lacquer is then lighted using the lighting provision. The direct coupling of the position of the processing head with the lighting provision practically excludes the possibility of the lighting provision carrying out a lighting operation at wrong positions on the substrate. With the local lighting step, the relatively inaccurate outlines of the lacquer applied with the inkjet technique can be "cut off", so that lighted structures with fine, sharp boundaries are obtained.
0012By virtue of the a scanning step, it is known where the already applied structures are located on the substrate, so that, directly after the scanning step - in the printing step - new structures can accurately be positioned with respect to these structures already present on the substrate.
0013However, it would further be advantageous to immediately check the structure just applied and lighted, for instance to determine whether the lacquer has been applied everywhere in the right manner. For this purpose, according to a further elaboration of the invention, a scanning step can be carried out immediately after the inkjet printing step in that a second scanning provision is provided on the processing head, and that on the downstream side of the inkjet printing provision, viewed in the relative direction of movement of the processing head with respect to the substrate.
0014Here, using the information obtained with the second scanning provision, it can be determined whether printing has taken place where it should have and, if this is not the case, the lacquer can still be printed at the desired positions in a second printing step. For this purpose, the head can go through a forward and backward movement over the same area of the substrate. If it is detected with the second scanning provision that to some areas the lacquer has not yet been applied, lacquer can still be deposited and lighted in those areas in the backward movement.
0015According to an aspect of the invention, a scanning step is carried out immediately prior to the lighting step in that a first scanning provision is provided on the processing head, and that on the upstream side of the lighting provision, viewed in the relative direction of movement of the processing head with respect to the substrate.
0016In this manner, in one movement of the processing head with respect to the substrate, it can be determined where the applied lacquer structure is to be lighted locally, while the lighting of the lacquer can be carried out in the same movement of the processing head. It is then advantageous according to the invention if a scanning step is carried out immediately after the lighting step in that a second scanning provision is provided on the processing head, and that on the downstream side of the lighting provision, viewed in the relative direction of movement of the processing head with respect to the substrate. Thus, using the information obtained with the second scanning provision, it can determined whether lighting has taken place where it should have and, if this is not the case, the lacquer is still lighted at the desired positions in a second lighting step. Also in this case, for this purpose, the head can go through a forward and a backward movement over the same area of the substrate. If it is detected with the second scanning provision that the lacquer has not yet been lighted in some areas, lacquer can still be lighted in those areas in the backward movement. Detecting a desired lighting may, for instance, take place on the basis of an expected change of the lacquer, which change is realized under the influence of the lighting. Such a change may, for instance, be a change in color, structure and/or shape of the lacquer.
0017Detecting in a second scanning step whether lacquer has been lighted at a desired position can of course be combined with detecting whether lacquer has been deposited at a desired position, at least if a lacquer deposition step has also been carried out before this second scanning step. In this manner, the lacquer can relatively rapidly and accurately be deposited as well as lighted, preferably during the forward and backward movements of the processing head.
0018Further, information obtained with the second scanning provision can also be fed back to a measuring system with the aid of which the position of the processing head is controlled. When new structures in a next layer are far removed from a previously applied structure, such a feedback to a measuring system is important because no direct reference can be made to the previously applied structures during the movement of the head over the substrate.
0019According to a further embodiment of the invention, the lacquer structure can be applied for the purpose of creating a structure in a material layer applied or to be applied to the substrate.
0020Such processes are known per se and may, for instance, comprise etching away a material layer which is partly covered with the lacquer structure. Applying material layers to and/or between the lacquer structures as for instance described in <patcit id="pcit0001" dnum="US3832176A"><text>US 3,832,176</text></patcit> (a fill-in process) and <patcit id="pcit0002" dnum="US4674174A"><text>US 4,674,174</text></patcit> (a lift-off process) is also one of the possibilities.
0021Here, the material layer may, for instance, be a metal, such as for instance molybdenum, chromium, etc., a semiconductor, a dielectric layer, such as for instance SiO<sub>x</sub>, SiN<sub>x</sub>, or ITO. However, a plurality of different substances are also possible.
0022The steps of the method according to the invention may be part of a method for manufacturing an electronic component, such as for instance a TFT structure, an OLED, a solar cell or the like.
0023The lacquer structure may be formed by a photoresist structure or by a lacquer curing rapidly under the influence of a lighting operation, such as for instance a UV-curing lacquer. It is also possible that the structure of the lacquer is changed by removing a solvent from the lacquer using the lighting, for instance using IR lighting.
0024Preferably, in the application of the successive structures, an overlay accuracy is achieved of at least 0.7 micron, more particularly at least 0.4 micron.
0025For this purpose, the measurements in the scanning step may, for instance, be based on an interferometric measurement, a triangulation measurement or image recognition.
0026A very accurate local lighting can be carried out using an array of individually controllable lasers, LEDs or similar lighting means which can quickly be switched on and off or modulated with the aid whereof a respective lacquer can be lighted.
0027The invention further relates to an apparatus according to claim 13.
0028Using the processing head, a desired structure may, for instance, be written in a lacquer applied immediately before that. In order to accurately position the processing head with the lighting provision with respect to already applied structures, the processing head comprises at least one scanning provision. Using this at least one scanning provision, already applied structures can be detected, so that an accurate lacquer lighting can be carried out by the lighting provision.
0029The lighting provision needs to generate at least one, but preferably an array of individually controllable narrow beams, such as for instance laser beams, infrared beams, visible-light beams, UV beams, E beams or ion beams, so that very fine structures can be positioned and formed in the lacquer with great accuracy.
0030With the inkjet printing provision, instead of a complete lacquer layer, lacquer structures can be formed, which results in a saving on the lacquer use.
0031Here, it is more particularly preferred if the processing head is provided with two lighting provisions, while a first lighting provision is arranged upstream and a second lighting provision is arranged downstream of the inkjet printing provision, viewed in the relative direction of movement of the substrate with respect to the processing head. With such a head, in two directions of movement, lacquer can be applied and be lighted immediately afterwards.
0032Further, the processing head is preferably provided with two scanning provisions, while a first scanning provision is arranged upstream and a second scanning provision is arranged downstream of the inkjet printing provision, viewed in the relative direction of movement of the substrate with respect to the processing head. With such a head, both prior to applying the lacquer and immediately afterwards, scanning can take place during the relative movement of the head with respect to the substrate. The measurements carried out during scanning can be used for regulating the delivery of lacquer with the aid of the processing head in a backward movement of the processing head. In addition, the measurements can be used for positioning the structures in the lacquer with the aid of the lighting provision.
0033According to an aspect of the invention, for this purpose, the processing head is provided with two scanning provisions, while a first scanning provision is arranged upstream and a second scanning provision is arranged downstream of the at least one lighting provision, viewed in the relative direction of movement of the substrate with respect to the processing head.
0034As a result, both prior to lighting the lacquer and immediately afterwards, scanning can take place during the relative movement of the head with respect to the substrate. In this case, the measurements carried out during scanning can be used for regulating the lacquer lighting with the aid of the processing head in a backward movement of the processing head. In this manner, it can be determined whether lighting has taken place where it should have and, if this is not the case, the lacquer can still be lighted at the desired positions in a second lighting step.
0035Because the head is provided with two scanning provisions, lacquer can moreover be lighted accurately in two directions of movement of the head.
0036In order to expose the substrate to vibrations and similar conditions causing inaccuracy as little as possible, it is preferred to arrange the processing head so as to be movable relative to the fixed world, while the substrate carrier is stationary, at least during the carrying out of the inkjet printing step and the lighting step of the method.
0037It will be clear that the apparatus is provided with a controller arranged for processing information obtained with the at least one scanning provision, which controller is further arranged for controlling the movement of the processing head, and controlling the at least one lighting provision. Further, the controller may also be arranged for controlling the various nozzles of the inkjet printing provision.
0038The scanning provision may be arranged for carrying out, for instance, an interferometric measurement, a triangulation measurement or image recognition. Such measurements provide a very high accuracy.
0039The at least one lighting provision for creating the at least one narrow beam may comprise an array of individually controllable lasers, LEDs or similar lighting means which can quickly be switched on and off or modulated, with the aid of which a respective lacquer can be lighted locally.
0040The invention will now be explained in more detail on the basis of an exemplary embodiment, with reference to the drawing, in which: <ul id="ul0001" list-style="none" compact="compact"><li><figref idref="f0001">Fig. 1</figref> shows a diagrammatic perspective view of a combined inkjet printhead with double lighting provision and double scanning provision;</li><li><figref idref="f0002 f0003 f0004 f0005 f0006 f0007">Figs. 2-14</figref> each show, in a left part, a cross-sectional view and, in a right part, a corresponding perspective view of a substrate undergoing a number of method steps; and finally</li><li><figref idref="f0001">Fig. 15</figref> diagrammatically shows the various process steps gone through for applying a structure in a layer of material applied to a substrate.</li></ul>
0041<figref idref="f0001">Fig. 1</figref> shows a substrate S and an inkjet printhead 1 comprising a rod-shaped array of nozzles. On both sides of the inkjet printhead 1, a rod-shaped lighting provision 2, 3 and a rod-shaped scanning provision 4, 5 are fixedly connected with the inkjet printhead 1. Each rod-shaped lighting provision 2, 3 comprises an array of LEDs, lasers or the like which can be modulated individually for intensity, for instance in that they can be switched on and off individually. Each rod-shaped scanning provision 4, 5 comprises an array of sensors. The head as a whole is bearing-mounted with guides 6, 7 and provided with a drive 8 with the aid of which the head can be moved over the substrate S. In a movement of the head over the substrate S, using a scanning rod 4, 5, structures already applied to the substrate S can be detected and, depending thereon, using the inkjet printhead 1, the lacquer can be deposited on the substrate at the desired moment, such that the position of the lacquer is adjusted to the positions of the previously applied structures. Further, in the same movement, the lacquer can be lighted directly using the lighting rods 2, 3, while use can also be made of the positions of the already applied structures detected with the scanning rods 4, 5. Because lighting rods 2, 3 and scanning rods 4, 5 are provided on both sides of the inkjet printhead 1, the steps of scanning, printing and lighting can be carried out both in a forward and a backward movement. In addition, as a result of the double scanning rod 4, 5, the printed and lighted structure can be measured directly and, optionally, on the basis of the measurements, a second printing, lighting and a second scanning step can be gone through for correcting possibly incomplete structures applied in the first printing and lighting step.
0042<figref idref="f0002 f0003 f0004 f0005 f0006 f0007">Figs. 2-14</figref> show an example of a process of which the method according to the invention is part. The process shown is exclusively an example and is particularly suitable for manufacturing, for instance, a TFT structure on a substrate. The method for applying lacquer structures may also be used in different processes, for instance in processes as described in <patcit id="pcit0003" dnum="US3832176A"><text>US 3,832,176</text></patcit> and <patcit id="pcit0004" dnum="US4674174A"><text>US 4,674,174</text></patcit>. Further, the method may also be used for accurately applying PDOT and PPV or similar organic lacquers to a substrate for manufacturing an OLED or for manufacturing electronic components, such as for instance solar cells.
0043<figref idref="f0002">Fig. 2</figref> shows a substrate S. <figref idref="f0002">Fig. 3</figref> shows the same substrate after the deposition of a layer of material 9 on the substrate S over the whole surface of the substrate S (step (a)). <figref idref="f0003">Fig. 4</figref> then shows the substrate S after the inkjet printing step (step (b)) of the method has been gone through. With some overmeasure, using inkjet printing, the desired structure has been applied to the substrate S in the form of a lacquer 10, such as for instance photoresist or a different lacquer changing its structure under the influence of electromagnetic radiation (UV, visible, IR), E beam or ion beam. Instead of local application of the lacquer, full-surface printing of the lacquer could also be used. <figref idref="f0003">Fig. 5</figref> shows the substrate S after it has gone through the lighting step (step (c)). Clearly visible are the sharp boundaries 11a of the structures 11 which have been applied using the lighting. <figref idref="f0004">Fig. 6</figref> then shows the substrate S after a developing step (step (d)) has been gone through, i.e. after the lacquer has been developed and the lighted lacquer has been preserved and the non-lighted lacquer parts have been removed or vice versa. <figref idref="f0004">Fig. 6</figref> clearly shows that the layer of material 9 in which the structure is to be provided is still completely present. Then, an etching step (step (e)) is gone through of which the result is shown in <figref idref="f0004">Fig. 7</figref>. It is clearly visible that the material layer 9 has now substantially been removed with the exception of the structure areas where the lacquer structure 11 is still present. Then, using an incineration step, the cured lacquer 11 which is still present is removed (step (f)). The result thereof is shown in <figref idref="f0005">Fig. 8</figref>. Removing the cured lacquer which is still present can also be carried out using solvents.
0044In <figref idref="f0005 f0006 f0007">Figs. 9-14</figref>, the respective steps (a)-(f) are again repeated for applying a structure in a second material layer 12 which has been deposited on the previous material layer 9 and the substrate S. It goes without saying that the process can be repeated a further number of times for applying an accumulation of different structures applied in successive material layers.
0045Finally, <figref idref="f0001">Fig. 15</figref> diagrammatically shows a number of blocks which each represent a processing station in which the various steps carried out per processing station are shown.
0046In block a1, deposition of the material 9 on the substrate S takes place; in block a2, the deposited material is cleaned (this step is not necessary for all materials); in block bc, the printing, lighting and scanning takes place; in block d, the lacquer is developed, whereby the lighted lacquer structure is preserved and the non-lighted lacquer parts are removed or vice versa; in block d2, the remaining lacquer structure is baked to cure it further; in block e, the excess material is etched away. Only under the lacquer structures which are still present, the material remains present during the etching treatment, which is intended; in block f, the remaining cured lacquer structure is then removed using, for instance, an incineration step or using solvents.
0047It will be clear that the invention is not limited to the exemplary embodiment described.
0048The description of the figures each time refers to an inkjet printhead because, in the exemplary embodiment, the head is provided with an inkjet printing provision 1. It already appears from the claims that one main provision on the head is the at least one lighting provision, while another main provision is the scanning provision; this is why the term processing head is used in the claims. Therefore, the invention also comprises an embodiment in which the head is not provided with an inkjet printing provision but only with at least one lighting provision, supplemented with at least one scanning provision. In the latter case, the head may, for instance, be referred to as a lighting head.
0049Further, for instance, processing steps may be added between the processing steps described. Here, possibilities are cleaning steps for, for instance, removing waste created after the incineration step. Also, instead of horizontal, the orientation of the substrate could, for instance, be vertical. Further, instead of the inkjet printhead, the substrate could move and the inkjet printhead could be stationary. As already indicated hereinabove, the method may also be used in completely different processes, namely processes in which the accurate application of a lacquer locally undergoing a structure change due to lighting with electromagnetic radiation (IR, visible and/or UV), E beam or ion beam plays a role.
0050In order to calibrate the apparatus, use may be made of a calibration grid placed in the apparatus instead of a substrate.
0051Further, a substrate may already have been provided with a lacquer layer in different manners, for instance by spin coating, spraying or immersion.
0052The original claims of the mother application are repeated hereunder as clauses: <ol id="ol0001" compact="compact"><li>1. A method wherein a substrate is provided, wherein, in a scanning step, structures already applied to the substrate are detected by at least one scanning provision of a processing head, wherein the processing head is provided with at least one lighting provision, which lighting provision locally lights the applied lacquer structure in a lighting step by using the information obtained with the scanning step.</li><li>2. A method according to clause 1, wherein the information obtained with the scanning step is also used for depositing the lacquer structure at a desired position.</li><li>3. A method according to clause 1 or 2, wherein the processing head is further provided with an inkjet printing provision, wherein, in an inkjet printing step, a complete lacquer layer or a lacquer structure is applied to the substrate using the inkjet printing provision of the processing head, wherein, in the inkjet printing step, the lacquer is preferably applied locally for forming a lacquer structure.</li><li>4. A method according to clause 3, wherein a said scanning step is carried out immediately prior to the inkjet printing step in that a first scanning provision is provided on the processing head, and that on the upstream side of the inkjet printing provision, viewed in the relative direction of movement of the processing head with respect to the substrate.</li><li>5. A method according to clause 3 or 4, wherein a said scanning step is carried out immediately after the inkjet printing step in that a second scanning provision is provided on the processing head, and that on the downstream side of the inkjet printing provision, viewed in the relative direction of movement of the processing head with respect to the substrate.</li><li>6. A method according to clause 5, wherein, using the information obtained with the second scanning provision, it is determined whether printing has taken place where it should have and wherein, if this is not the case, the lacquer is still printed at the desired positions in a second printing step.</li><li>7. A method according to any one of the preceding clauses, wherein a said scanning step is carried out immediately prior to the lighting step in that a first scanning provision is provided on the processing head, and that on the upstream side of the lighting provision, viewed in the relative direction of movement of the processing head with respect to the substrate.</li><li>8. A method according to clause 7, wherein a said scanning step is carried out immediately after the lighting step in that a second scanning provision is provided on the processing head, and that on the downstream side of the lighting provision, viewed in the relative direction of movement of the processing head with respect to the substrate.</li><li>9. A method according to clause 8, wherein, using the information obtained with the second scanning provision, it is determined whether lighting has taken place where it should have and wherein, if this is not the case, the lacquer is still lighted at the desired positions in a second lighting step.</li><li>10. A method according to at least one of clauses 5, 6, 8 or 9, wherein the information obtained with the second scanning provision is also fed back to a measuring system with the aid of which the position of the processing head is controlled.</li><li>11. A method according to any one of the preceding clauses, wherein the lacquer structure is applied for the purpose of creating a structure in a material layer applied or to be applied to the substrate.</li><li>12. A method according to clause 11, wherein the material layer is a metal, such as for instance molybdenum, chromium, etc., a semiconductor, a dielectric layer, such as for instance SiO<sub>x</sub>, SiN<sub>x</sub>, or ITO.</li><li>13. A method according to any one of the preceding clauses, wherein the said steps are part of a method for manufacturing an electronic component, such as for instance a TFT structure, an OLED, a solar cell or the like.</li><li>14. A method according to any one of the preceding clauses, wherein the lacquer structure is formed by a photoresist structure.</li><li>15. A method according to any one of the preceding clauses, wherein the lacquer structure is formed by a lacquer changing its structure or composition under the influence of a lighting treatment.</li><li>16. A method according to any one of the preceding clauses, wherein, in the application of the successive structures, an overlay accuracy is achieved of at least 0.7 micron, more particularly at least 0.4 micron.</li><li>17. A method according to any one of the preceding clauses, wherein, in the scanning step, an interferometric measurement or a triangulation measurement or image recognition is carried out.</li><li>18. A method according to at least clause 1, wherein the local lighting is carried out using an array of individually controllable lasers, LEDs or similar lighting means which can quickly be switched on and off or modulated, with the aid of which a respective lacquer can be lighted.</li><li>19. An apparatus for carrying out the method according to any one of the preceding clauses, wherein the apparatus is provided with a processing head which is movable relative to a substrate carrier, wherein the processing head comprises at least one scanning provision and at least one lighting provision.</li><li>20. An apparatus according to clause 19, wherein the processing head is further provided with an inkjet printing provision.</li><li>21. An apparatus according to clause 20, wherein the processing head is provided with two lighting provisions, wherein a first lighting provision is provided upstream and a second lighting provision is provided downstream of the inkjet printing provision, viewed in the relative direction of movement of the substrate with respect to the processing head.</li><li>22. An apparatus according to any one of clauses 20-21, wherein the processing head is provided with two scanning provisions, wherein a first scanning provision is provided upstream and a second scanning provision is provided downstream of the inkjet printing provision, viewed in the relative direction of movement of the substrate with respect to the processing head.</li><li>23. An apparatus according to any one of clauses 19-22, wherein the processing head is provided with two scanning provisions, wherein a first scanning provision is provided upstream and a second scanning provision is provided downstream of the at least one lighting provision, viewed in the relative direction of movement of the substrate with respect to the processing head.</li><li>24. An apparatus according to any one of clauses 19-23, wherein the processing head is arranged so as to be movable relative to the fixed world and wherein the substrate carrier is stationary, at least during the carrying out of the lighting step.</li><li>25. An apparatus according to any one of clauses 19-24, provided with a control arranged for processing information obtained with the at least one scanning provision, which control is further arranged for controlling the movement of the processing head, and controlling the at least one lighting provision.</li><li>26. An apparatus according to clause 25 and at least one of clauses 20-22, wherein the control is further arranged for controlling the various nozzles of the inkjet printing provision.</li><li>27. An apparatus according to any one of clauses 19-26, wherein the scanning provision is arranged for carrying out an interferometric measurement, a triangulation measurement or image recognition.</li><li>28. An apparatus according to any one of clauses 19-27, wherein the lighting provision comprises an array of individually controllable lasers, LEDs or similar lighting means which can quickly be switched on and off or modulated, with the aid of which the respective lacquer can be lighted locally.</li></ol>
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Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| US11173723B2 | Cited by | United States of America | Search report |
| WO2018197531A1 | Cited by | World Intellectual Property Organization (WIPO) | International search |
| US11173723B2 | Cited by | United States of America | Applicant |
| CN110582406A | Cited by | China | Search report |
| WO02098576A1 | Cites | World Intellectual Property Organization (WIPO) | Search report |
| WO03061357A1 | Cites | World Intellectual Property Organization (WIPO) | Search report |
| US3832176A | Cites | United States of America | Applicant |
| US4674174A | Cites | United States of America | Applicant |
51 members in 11 offices
Priority claims14
| Document | Office | Kind | Date |
|---|---|---|---|
| 1026013 | Netherlands (Kingdom of the) | A | |
| 1026013 | Netherlands (Kingdom of the) | A | |
| 1026013 | Netherlands (Kingdom of the) | – | |
| 1026880 | Netherlands (Kingdom of the) | A | |
| 1026880 | Netherlands (Kingdom of the) | A | |
| 1026880 | Netherlands (Kingdom of the) | – | |
| 05736360 | European Patent Office (EPO) | A | |
| 05736360 | European Patent Office (EPO) | A | |
| 05736360 | – | – | – |
| 1026013 | – | – | – |
| 1026880 | – | – | – |
| EP20050736360 | – | – | – |
| NL20041026013 | – | – | – |
| NL20041026880 | – | – | – |
Members51
| Document | Office | Kind | |
|---|---|---|---|
| NL1026013C2 | Netherlands (Kingdom of the) | C2 | |
| NL1026013C2 | Netherlands (Kingdom of the) | C2 | |
| NL1026880C1 | Netherlands (Kingdom of the) | C1 | |
| WO2005104637A1 | World Intellectual Property Organization (WIPO) | A1 | |
| US2006046326A1 | United States of America | A1 | |
| WO2006021568A1 | World Intellectual Property Organization (WIPO) | A1 | |
| WO2006021568A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW200610465A | Taiwan Province of China | A | |
| TW200618308A | Taiwan Province of China | A | |
| TW200618308A | Taiwan Province of China | A | |
| EP1757175A1 | European Patent Office (EPO) | A1 | |
| CN1947479A | China | A | |
| CN1947479A | China | A | |
| KR20070046026A | Republic of Korea | A | |
| KR20070051341A | Republic of Korea | A | |
| KR20070051341A | Republic of Korea | A | |
| EP1789996A1 | European Patent Office (EPO) | A1 | |
| EP1789996A1 | European Patent Office (EPO) | A1 | |
| US2007238054A1 | United States of America | A1 | |
| US2007238054A1 | United States of America | A1 | |
| JP2007534170A | Japan | A | |
| CN101088141A | China | A | |
| US7354845B2 | United States of America | B2 | |
| JP2008511146A | Japan | A | |
| JP2008511146A | Japan | A | |
| US2008158282A1 | United States of America | A1 | |
| EP1757175B1 | European Patent Office (EPO) | B1 | |
| AT458388T | Austria | T | |
| ATE458388T1 | Austria | T1 | |
| DE602005019403D1 | Germany | D1 | |
| EP2178352A2This record | European Patent Office (EPO) | A2 | |
| ES2339572T3 | Spain | T3 | |
| EP2178352A3 | European Patent Office (EPO) | A3 | |
| TW201038160A | Taiwan Province of China | A | |
| TWI332811B | Taiwan Province of China | B | |
| TWI347811B | Taiwan Province of China | B | |
| EP2178352B1 | European Patent Office (EPO) | B1 | |
| AT533340T | Austria | T | |
| ATE533340T1 | Austria | T1 | |
| US8080366B2 | United States of America | B2 | |
| US8080366B2 | United States of America | B2 | |
| KR101157286B1 | Republic of Korea | B1 | |
| US8231931B2 | United States of America | B2 | |
| CN102933038A | China | A | |
| KR101236460B1 | Republic of Korea | B1 | |
| KR101236460B1 | Republic of Korea | B1 | |
| TWI389315B | Taiwan Province of China | B | |
| TWI389315B | Taiwan Province of China | B | |
| CN1947479B | China | B | |
| CN1947479B | China | B | |
| CN102933038B | China | B |
67 legal events, as 8 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed because of non-payment of the annual feeLapsedMM | MM | NL | |
| Patent ceasedCeasedPL | PL | CH | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Change of applicant/patenteeR081 | R081 | DE | |
| Change of representativeR082 | R082 | DE | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Notification of lapseLapsedST | ST | FR | |
| Patent lapsedLapsedMM4A | MM4A | IE | |
| No opposition filed against granted patent, or epo opposition proceedings concluded without decisionGrantedR097 | R097 | DE | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| Deletion acc. to par. 5 (withdrawal of the translation of the ep patent)MK05 | MK05 | AT | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lt: invalidation of european patent or patent extensionLTIE | LTIE | EP | |
| New agentNV | NV | CH | |
| Translation filed for an european patent granted for nl, confirming art. 52 par. 1 or 6 of the patents act 1995GrantedT3 | T3 | NL | |
| Dpma publication of mentioned ep patent grantGrantedR096 | R096 | DE | |
| European patents granted designating irelandGrantedFG4D | FG4D | IE | |
| European patent takes effect as a national patent in ch/liEP | EP | CH | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| Designated contracting statesAK | AK | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Request for examination filed17P | 17P | EP | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 2178352
- Publication, DOCDB
- 2178352
- Publication, EPODOC
- EP2178352
- Application
- 10152312
- Application, DOCDB
- 10152312
- Application, EPODOC
- EP20100152312
Titles3
- German
- Verfahren und Vorrichtung zur akkuraten Auftragung von Strukturen auf ein Substrat
- English
- Method and apparatus for accurately applying structures to a substrate
- French
- Procédé et appareil pur appliquer des structures sur un substrat avec précision
Classification
- CPC, 11
- H05K3/125
- H05K1/0269
- H05K2203/013
- H05K2203/163
- Y02E10/549
- Y02P70/50
- B41J11/0015
- H05K3/0079
- H05K3/0082
- H10K71/13
- H10K71/611
- IPC, 7
- H05K3 12
- B41J11 00
- H01L21 027
- G03F7 20
- H05K1 02
- H05K3 00
- H10K99 00
Designated states1
- Contracting states, 1
- Türkiye