Nova Patents
EP2177239A2

Hemostatic Implant

Abstract

The present disclosure relates to hemostatic implants including a porous substrate having a first hydrogel precursor and a second hydrogel precursor applied thereto in a manner such that the first hydrogel precursor and second hydrogel precursor do not react with each other until the implant is placed at the site of implantation and exposed to the physiological fluids of a patient.

EP2177239A2, drawing sheet 1
Sheet 1 of 13

Term

3.1 yearsto projected expiry

Projected expiry 15 October 2029, counted from filing; an application has no term until it is granted.

  1. Priority
  2. Filed
  3. Published
  4. Today
  5. Projected expiry

13 claims: 7 independent, 6 dependent

  1. 1
    An implant comprising a porous substrate having a first hydrogel precursor applied to a first portion of the porous substrate and a second hydrogel precursor applied to a second portion of the porous substrate, the first portion of the substrate being spatially separated from the second portion of the porous substrate.
  2. 4
    The implant of any one of claims 1 to 3, wherein at least one of the first or the second hydrogel precursors comprises particles.
  3. 5
    The implant of any one of claims 1 to 3, wherein at least one of the first or the second hydrogel precursors comprises a foam.
  4. 6
    The implant of any one of claims 1 to 3, wherein at least one of the first or the second hydrogel precursors comprises a film.
  5. 8
    A method comprising applying a first hydrogel precursor to a first portion of a porous substrate;applying a second hydrogel precursor to a second portion of the porous substrate, the first portion of the substrate being spatially separated from the second portion of the porous substrate.
  6. 12
    A method as in any one of claims 8 to 11, wherein applying the first hydrogel precursor to the porous substrate comprises contacting the porous substrate with a film-forming composition containing the first hydrogel precursor and a solvent;and evaporating the solvent to deposit a film containing the first hydrogel precursor on the first portion of the porous substrate.
  7. 13
    A method as in any one of claims 8 to 12, wherein applying the first hydrogel precursor to the porous substrate comprises simultaneously lypholizing a first and a second composition, the first composition forming the porous substrate and the second composition containing the first hydrogel precursor and a solvent forming a foam containing the first hydrogel precursor.