EP0803755A3

Projection optical system and exposure apparatus with the same

Abstract

The present invention relates to a both-side telecentric projection optical system and an exposure apparatus equipped with this projection optical system. In particular, the projection optical system has a structure for quite favorably correcting various kinds of aberration such as distortion in particular, while securing a relatively broad exposure area and a large numerical aperture.

EP0803755A3, drawing sheet 1
Sheet 1 of 1

Term

Term ended

Projected expiry passed 31 May 2016, 10.3 years ago.

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