Scanning electron microscope
Abstract
A scanning microscope is provided for producing a scan image at high spatial resolution and in a low acceleration voltage area. An acceleration tube 9 is located in an electron beam path of an objective lens 8 for applying a post-acceleration voltage 10 of the primary electron beam. The application of an overlapping voltage 13 onto a sample 12 allows a retarding electric field against the primary electron beam to be formed between the acceleration tube 9 and the sample 12. The secondary electrons generated from the sample 12 and the secondary signals 23 such as reflected electrons are extracted into the acceleration tube 9 through the effect of an electric field (retarding electric field) immediately before the sample. The signals are detected by secondary signal detectors 24 to 27 located upwardly than the acceleration tube 9.

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Every citation, both waysCites: the store holds 10 of 11
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0592899A1 | Cites | European Patent Office (EPO) | Y | Search report | 1 |
| EP0594084A1 | Cites | European Patent Office (EPO) | XY | Search report | 17-19 |
| EP0661727A2 | Cites | European Patent Office (EPO) | Y | Search report | 1,8 |
| US4308457A | Cites | United States of America | Y | Search report | 2,10 |
| US4587425A | Cites | United States of America | Y | Search report | 2,10 |
| US4785176A | Cites | United States of America | Y | Search report | 8 |
| US4831266A | Cites | United States of America | Y | Search report | 1,3-5,7,8,12 |
| US4926054A | Cites | United States of America | Y | Search report | 1,10 |
| US5146090A | Cites | United States of America | A | Search report | 8 |
| US5422486A | Cites | United States of America | Y | Search report | 1,2,10,11,14-16 |
| PLIES E: "SECONDARY ELECTRON ENERGY ANALYZERS FOR ELECTRON-BEAM TESTING", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. A298, no. 1 / 3, 1 December 1990 (1990-12-01), pages 142 - 155, XP000174955, ISSN: 0168-9002 | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 013, no. 371 (E - 807) 17 August 1989 (1989-08-17) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 012, no. 030 (E - 578) 28 January 1988 (1988-01-28) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 013, no. 016 (E - 703) 13 January 1989 (1989-01-13) | Non-patent | – | – | Search report | – |
| FROSIEN J ET AL: "High precision electron optical system for absolute and CD-measurements on large substrates", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. A363, no. 1, 1 September 1995 (1995-09-01), pages 25 - 30, XP004009617, ISSN: 0168-9002 | Non-patent | – | – | Search report | – |
| BECK S ET AL: "Low-voltage probe forming columns for electrons", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. A363, no. 1, 1 September 1995 (1995-09-01), pages 31 - 42, XP004009618, ISSN: 0168-9002 | Non-patent | – | – | Search report | – |
55 members in 8 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 27146095 | Japan | A | |
| 27146095 | Japan | A | |
| 27146095 | Japan | – | |
| 27146095 | – | – | – |
| JP19950271460 | – | – | – |
Members55
| Document | Office | Kind | |
|---|---|---|---|
| EP0769799A2 | European Patent Office (EPO) | A2 | |
| EP0770891A2 | European Patent Office (EPO) | A2 | |
| EP0770971A2 | European Patent Office (EPO) | A2 | |
| JPH09113892A | Japan | A | |
| EP0772069A1 | European Patent Office (EPO) | A1 | |
| JPH09138323A | Japan | A | |
| KR970022383A | Republic of Korea | A | |
| KR970022383A | Republic of Korea | A | |
| KR970022392A | Republic of Korea | A | |
| KR970022404A | Republic of Korea | A | |
| KR970022405A | Republic of Korea | A | |
| KR970022436A | Republic of Korea | A | |
| CN1152134A | China | A | |
| JPH09171791A | Japan | A | |
| JPH09179126A | Japan | A | |
| JPH09212298A | Japan | A | |
| SG47185A1 | Singapore | A1 | |
| EP0770971A3 | European Patent Office (EPO) | A3 | |
| US5835652A | United States of America | A | |
| US5847690A | United States of America | A | |
| EP0770891A3 | European Patent Office (EPO) | A3 | |
| US5872358A | United States of America | A | |
| US5900629A | United States of America | A | |
| US5903330A | United States of America | A | |
| KR100203524B1 | Republic of Korea | B1 | |
| TW373117B | Taiwan Province of China | B | |
| US6028288A | United States of America | A | |
| KR100244417B1 | Republic of Korea | B1 | |
| KR100244417B1 | Republic of Korea | B1 | |
| US6060684A | United States of America | A | |
| US6069356A | United States of America | A | |
| US6084238A | United States of America | A | |
| JP3120361B2 | Japan | B2 | |
| SG79925A1 | Singapore | A1 | |
| JP3159906B2 | Japan | B2 | |
| JP2001243904A | Japan | A | |
| CN1127673C | China | C | |
| JP3494152B2 | Japan | B2 | |
| JP2004247321A | Japan | A | |
| EP0769799A3This record | European Patent Office (EPO) | A3 | |
| KR100474131B1 | Republic of Korea | B1 | |
| JP2006093161A | Japan | A | |
| JP3774953B2 | Japan | B2 | |
| JP2007005327A | Japan | A | |
| JP3889464B2 | Japan | B2 | |
| JP2007102236A | Japan | A | |
| KR100711198B1 | Republic of Korea | B1 | |
| JP3966350B2 | Japan | B2 | |
| JP2007250560A | Japan | A | |
| JP3992021B2 | Japan | B2 | |
| JP4179369B2 | Japan | B2 | |
| JP4179390B2 | Japan | B2 | |
| EP0769799B1 | European Patent Office (EPO) | B1 | |
| DE69638126D1 | Germany | D1 | |
| EP0772069B1 | European Patent Office (EPO) | B1 |
24 legal events, as 4 offices reported them to INPADOC
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| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Notification of lapseLapsedST | ST | FR | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
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| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
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| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Corresponds to:REF | REF | EP | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 0769799
- Publication, DOCDB
- 0769799
- Publication, EPODOC
- EP0769799
- Application
- 96116508
- Application, DOCDB
- 96116508
- Application, EPODOC
- EP19960116508
Titles3
- German
- Rasterelektronenmikroskop
- English
- Scanning electron microscope
- French
- Microscope életronique à balayage
Classification
- CPC, 7
- H01J37/244
- H01J37/145
- H01J37/268
- H01J37/28
- H01J2237/04
- H01J2237/04756
- H01J2237/2449
- IPC, 4
- H01J37 244
- H01J37 256
- H01J37 28
- H01J37 285
Designated states1
- Contracting states, 1
- United Kingdom