EP0592017A3
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
Abstract
The invention describes an apparatus used for chemical vapor deposition of materials on substrates such as semi conductor wafers, comprising: a circular, substantially planar susceptor having an upper surface for centrally receiving a substrate for chemical deposition purposes; and a susceptor ring structure separate from said susceptor having an inner diameter slightly larger than the outer diameter of said susceptor to enable the positioning of said ring structure in substantially concentric relation with the susceptor and to enable said susceptor to be rotated while the ring structure is fixed, including a passage for supporting one or more sensors close to the periphery of the susceptor to monitor the temperature adjacent the periphery of the susceptor.
Term
Term ended
Projected expiry passed 30 March 2008, 18.5 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0150878A2 | Cites | European Patent Office (EPO) | A | Search report | 1 |
| "rotatable wafer chuck for testing", IBM TECHNICAL DISCLOSURE BULLETIN., vol. 21, no. 10, March 1979 (1979-03-01), NEW YORK US, pages 4086 - 4087 | Non-patent | – | – | Search report | – |
29 members in 8 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 32474 | United States of America | – | |
| 3247487 | United States of America | A | |
| 88904757 | European Patent Office (EPO) | A |
Members29
| Document | Office | Kind | |
|---|---|---|---|
| WO8807487A1 | World Intellectual Property Organization (WIPO) | A1 | |
| US4821674A | United States of America | A | |
| KR890700532A | Republic of Korea | A | |
| EP0353254A1 | European Patent Office (EPO) | A1 | |
| JPH02503930A | Japan | A | |
| US4993355A | United States of America | A | |
| US4996942A | United States of America | A | |
| EP0353254A4 | European Patent Office (EPO) | A4 | |
| US5117769A | United States of America | A | |
| US5198034A | United States of America | A | |
| EP0592017A2 | European Patent Office (EPO) | A2 | |
| EP0592017A3This record | European Patent Office (EPO) | A3 | |
| US5318634A | United States of America | A | |
| EP0353254B1 | European Patent Office (EPO) | B1 | |
| AT112533T | Austria | T | |
| ATE112533T1 | Austria | T1 | |
| DE3851752D1 | Germany | D1 | |
| US5374315A | United States of America | A | |
| DE3851752T2 | Germany | T2 | |
| US5427620A | United States of America | A | |
| JP2544794B2 | Japan | B2 | |
| KR0135884B1 | Republic of Korea | B1 | |
| US5902407A | United States of America | A | |
| SG70976A1 | Singapore | A1 | |
| EP0592017B1 | European Patent Office (EPO) | B1 | |
| AT205635T | Austria | T | |
| ATE205635T1 | Austria | T1 | |
| DE3856489D1 | Germany | D1 | |
| DE3856489T2 | Germany | T2 |
38 legal events, as 3 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Patent expired after termination of 20 yearsExpiredPE20 | PE20 | GB | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Patent ceasedCeasedPL | PL | CH | |
| Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents actLapsedNLV1 | NLV1 | EP | |
| European patent in force as of 2002-01-01IF02 | IF02 | GB | |
| Fr: translation filedET | ET | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Corresponds to:REF | REF | EP | |
| European patent takes effect as a national patent in ch/liEP | EP | CH | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Corresponds to:REF | REF | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOS IGRAGRAH | GRAH | EP | |
| Despatch of communication of intention to grantORIGINAL CODE: EPIDOS AGRAGRAG | GRAG | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOS IGRAGRAH | GRAH | EP | |
| Title (correction)USE OF ROTATABLE SUBSTRATE SUPPORTING MECHANISM WITH TEMPERATURE SENSING DEVICE IN CHEMICAL VAPOR DEPOSITION EQUIPMENTRTI1 | RTI1 | EP | |
| Despatch of communication of intention to grantORIGINAL CODE: EPIDOS AGRAGRAG | GRAG | EP | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for examination filed17P | 17P | EP | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 0592017
- Application
- 931205371
Titles3
- German
- Drehbarer Mechanismus als Substratträger mit Vorrichtung für Temperaturmessung und bestimmt für chemische Bedampfungseinrichtungen
- English
- Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
- French
- Mécanisme rotatif de support d'un substrat pourvu d'un dispositif de mesure de température et destiné aux équipements de déposition en phase vapeur
Classification
- CPC, 10
- C23C16/45521
- B65G11/00
- B05C11/08
- C23C16/4584
- H10P72/0436
- H10P72/0602
- H10P72/50
- H10P72/7626
- H10P72/7624
- B05C11/00
- IPC, 10
- B05C11 08
- C23C16 44
- C23C16 455
- C23C16 458
- C23C16 46
- H10P14 24
- H10P14 60
- H10P72 50
- H10P72 76
- H10P95 00
Designated states1
- Contracting states, 1
- Sweden