Nova Patents
DE69033908D1

High density plasma deposition and etching apparatus

Abstract

This record has no abstract on file.

Term

Term ended

Expired 12 June 2010, 16.3 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

28 members in 9 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
36553389United States of AmericaA

Members28

Family members, oldest first
DocumentOfficeKind
EP0403418A2European Patent Office (EPO)A2
US4990229AUnited States of AmericaA
JPH0368773AJapanA
EP0403418A3European Patent Office (EPO)A3
US5091049AUnited States of AmericaA
US5122251AUnited States of AmericaA
WO9214258A1World Intellectual Property Organization (WIPO)A1
AU1352192AAustraliaA
EP0570484A1European Patent Office (EPO)A1
KR930703694ARepublic of KoreaA
WO9409179A1World Intellectual Property Organization (WIPO)A1
JPH06506084AJapanA
US5421891AUnited States of AmericaA
US5429070AUnited States of AmericaA
JPH0814026B2JapanB2
EP0570484B1European Patent Office (EPO)B1
AT151569TAustriaT
ATE151569T1AustriaT1
DE69218924D1GermanyD1
ES2102497T3SpainT3
DE69218924T2GermanyT2
KR100231221B1Republic of KoreaB1
EP0403418B1European Patent Office (EPO)B1
AT212779TAustriaT
ATE212779T1AustriaT1
DE69033908D1This recordGermanyD1
JP3271765B2JapanB2
DE69033908T2GermanyT2