Substrate with photocatalytic film
Abstract
The present invention relates to a substrate provided on at least a portion of one of its sides with a coating having photocatalytic properties containing photocatalytic titanium oxide, in particular crystallized in the anatase form, in an essentially mineral binder comprising at least a semiconductor metal oxide, particularly zirconium oxide or aluminium oxide.

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Expired 15 May 2022, 4.4 years ago.
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18 claims: 15 independent, 3 dependent
- 1PATENTOVÉ NÁROKY 1. Substrát opatřený na alespoň části alespoň jedné z jeho stran povlakem s fotokatalytickými vlastnostmi, vyznačující se tím, že tento povlak obsahuje fotokatalytický oxid titaničitý, zejména vykrystalizovaný ve formě anatasu, ve v podstatě minerálním pojivu obsahujícím alespoň jeden polovodičový oxid kovu vybraný z oxidu antimonu, zejména Sb 2 O3 a/nebo Sb 2 O 5 , oxidu kobaltu CO3O4, oxidu niklu NiO, směsného oxidu kobaltu a niklu N1CO2O4, F:ZrO 2 , F:Sb 2 O5, F:ZnO, směsných oxidů obsahujících mangan nebo kobalt, jakou jsou manganity nebo kobaltity.
- 2Substrát podle nároku 1, vyznačující se tím, že alespoň část fotokatalytického oxidu titaničitého je zabudována v povlaku ve formě předběžně vytvořených částic, majících zejména nanometrickou velikost.
- 3Substrát podle některého z předcházejících nároků, vyznačující se tím, že alespoň část fotokatalytického oxidu titaničitého je vytvořena při tvorbě povlaku, zejména tepelným rozkladem prekurzorů.
- 4Substrát podle některého z předcházejících nároků, vyznačující se tím, že polovodičový oxid kovu nebo alespoň jeden z polovodičových oxidů kovů pojivá má elektrický měrný odpor nižší nebo rovný 10 8 ohm. cm.
- 5Substrát podle některého z předcházejících nároků, vyznačující se tím, že polovodičový oxid kovu nebo alespoň jeden z polovodičových oxidů kovů pojívaje katalyticky účinný při redukci kyslíku.
- 6Substrát podle některého z předcházejících nároků, vyznačující se tím, že polovodičový oxid kovu nebo alespoň jeden z polovodičových oxidů kovů pojívaje dopován, zejména kovem nebo halogenem.
- 7Substrát podle některého z předcházejících nároků, vyznačující se tím, že polovodičový oxid kovu nebo alespoň jeden z polovodičových oxidů kovů pojivá:- má nejnižší energetickou hladinu svého pásma vodivosti, která je nižší nebo rovná nejnižší energetické hladině pásma vodivosti fotokatalytického oxidu titaničitého, -je blízká nejpravděpodobnější elektronové energetické hladině kyslíku v redox-článku O 2 /H 2 O 2 nebo/a O 2 /H 2 O.
- 8Substrát podle některého z předcházejících nároků, vyznačující se tím, že pojivo obsahuje také elektricky izolační sloučeninu, zejména derivát křemíku, jako je oxid křemičitý, oxynitrid křemíku, oxykarbid křemíku nebo nitrid křemíku.
- 9Substrát podle některého z předcházejících nároků, vyznačující se tím, že obsah polovodičového oxidu kovů nebo polovodičových oxidů kovů v pojivu činí alespoň 25 % hmotnosti, zejména alespoň 50 % hmotnosti, až 100 % hmotnosti.
- 10Substrát podle některého z předcházejících nároků, vyznačující se tím, že hmotnostní poměr fotokatalytického oxidu titaničitého k pojivu Rtío2/ poj ívo se pohybuje mezi 10:90 a 60:40, zejména mezi 10:90 a 50:50.
- 11Substrát podle některého z předcházejících nároků, vyznačující se tím, že množství oxidu titaničitého přítomné v povlaku činí 5 až 100 pg/cm 2 , zejména 10 až 50 pg/cm 2 . -14CZ 305891 B6
- 12Substrát podle některého z předcházejících nároků, vyznačující se tím, že fotokatalytická účinnost povlaku je alespoň rovna 2 nm/h/(pg/cm 2 ), zejména alespoň 5 nebo 10 nebo 20 nm/h/(pg/cm 2 ), vztaženo na celkové množství oxidu titaničitého přítomné v povlaku.
- 13Substrát podle některého z předcházejících nároků, vyznačující se tím, že mezi uvedeným substrátem a povlakem s fotokatalytickými vlastnostmi je uspořádána alespoň jedna tenká vrstva s optickou nebo tepelnou funkcí nebo vrstva tvořící bariéru proti migraci subjektů ze substrátu.
- 14Substrát podle některého z předcházejících nároků, vyznačující se tím, že se jedná o architektonický materiál, zejména vitráž, střešní krytinu, obkladový materiál, podlahovou krytinu, stropní podhled nebo materiál tvořící výbavu dopravních vozidel, zejména vitráž pro automobily, vlaky, letadla a lodě, nebo materiál určený pro domácí elektrické spotřebiče, zejména pro příčky trub nebo stěny ledniček/chladniček.
- 15Substrát podle některého z předcházejících nároků, vyznačující se tím, že je na bázi transparentního materiálu typu skla nebo polymeru nebo na bázi keramiky nebo na bázi střešních tašek nebo cihel nebo na bázi dřeva, betonu, kamene, nátěru nebo na bázi vláknitého materiálu typu izolační skelné vlny nebo sestav vyztužovacích skleněných vláken.
- 16Způsob získáni substrátu podle některého z předcházejících nároků, vyznačující se tím, že se deponuje povlak s fotokatalytickými vlastnostmi technikou zahrnující tepelný rozklad alespoň jednoho prekurzoru organokovového typu nebo typu halogenidu kovu, techniku solgel, práškovou pyrolýzu, pyrolýzu v kapalné fázi a pyrolýzu v plynné fázi.
- 17Způsob podle nároku 16, v y z n a č u j í c í se tím, že za účelem usnadnění zabudování halogenu do povlaku v případě, že se povlak získá z alespoň jednoho prekurzoru typu halogenidu kovu, se provede tepelné zpracování uvedeného povlaku pod substechiometrickou kyslíkovou atmosférou.
- 18Způsob získání substrátu podle některého z nároků 1 až 15, vyznačující se tím, že se deponuje povlak s fotokatalytickými vlastnostmi technikou depozice za vakua, zejména katodovým rozprašováním.
Independent claims18
181 paragraphs in 6 sections, as filed
Substrate with photocatalytic coating
Field of technology
The invention relates to substrates provided with a photocatalytic coating, to a process for obtaining such a coating and to various uses of such a coating. In particular, the invention relates to coatings of semiconductor materials based on metal oxides, in particular titanium dioxide, which coatings are capable of initiating radical reactions inducing the oxidation of organic products when exposed to radiation of the appropriate wavelength.
Said coatings thus make it possible to impart to the materials which cover the new properties, in particular non-soiling, fungicidal and bactericidal properties, optionally in combination with hydrophilic, demisting, optical and other properties.
Various substrates can be considered, in particular substrates used in vehicle production or construction, such as stained glass, facade materials, cladding materials, roofing and floor coverings, in particular roofing tiles, slate roofing, tiles, and in particular any material used in construction . These materials can thus be glass, metal, glass-ceramics, ceramics, concrete, bricks, wood, stone or materials reconstituted from the latter two materials, plastics or mineral wool-type fibrous materials, intended in particular for filtration and other purposes.
These materials can also be classified as transparent materials used in particular as stained glass, such as flexible or rigid, glass or plastic substrates, such as polyester or acrylate substrates, such as polymethyl methacrylate (PMMA) substrates. Said substrates can also be classified in the category of non-porous materials or low porous materials (glass) or in the category of (relatively) porous materials, such as roofing tiles and ceramic materials in general.
It is also possible to consider "single-material" substrates, such as glass substrates, or substrates formed by superimposed layers of materials, such as facade materials, which are provided with a plaster-type coating.
Prior art
International applications WO97 / 10 186 and WO97 / 10 185 already disclose coatings containing titanium dioxide crystallized in the crystalline modification of anatase and having photocatalytic properties, these coatings being obtained by thermal decomposition of the respective organometallic precursors and / or from precrystallized titanium dioxide particles encapsulated in mineral or organic binder.
It is also known from International Application WO99 / 44954 to improve these types of coatings by using pre-crystallized titanium dioxide cleaners which are encapsulated in a binder which itself also contains partially crystallized titanium dioxide: the binder thus participates in the realization. photocatalytic effect and thus increases the effectiveness of the coating in terms of its photocatalytic properties and its durability.
Otherwise, coatings are known from patent applications EP 1 036 826 and EP 1 081 108 in which titanium dioxide particles are used in a binder containing zirconia.
The object of the invention is to improve the known photocatalytic coatings in terms of their photocatalytic activity, the durability of their photocatalytic effects over time and / or their mechanical / chemical durability.
~ 1 ~
The essence of the invention
The invention relates in particular to a substrate provided on at least part of at least one of its sides with a coating with photocatalytic properties, characterized in that said coating comprises photocatalytic titanium dioxide, in particular crystallized in the form of anatase, in a substantially mineral binder comprising at least one semiconductor metal oxide selected from antimony oxide, especially Sb<sub>2</sub>O3 and / or Sb<sub>2</sub>O<sub>5</sub>, cobalt oxide CO3O4, nickel oxide NiO, mixed cobalt oxide and nickel NiCo<sub>2</sub>O<sub>4</sub>, F: ZrO<sub>2</sub>, F: Sb<sub>2</sub>O<sub>5</sub>, F: ZnO, mixed oxides containing manganese or cobalt, such as manganites or cobaltites.
Preferably, a semiconductor oxide is selected which is substantially free of photocatalytic activity when irradiated with the sun (i.e., whose photocatalytic activity is significantly lower than the photocatalytic activity of titanium dioxide), and significant electronic conductivity. Its resistivity is preferably less than or equal to 10<sup>8</sup> ohm.cm, especially less than or equal to 10<sup>7</sup> or 10<sup>8</sup> ohm.cm. This resistivity can be even lower, for example equal to 10 ohm.cm (in a broader sense, this resistivity can be the resistivity of the binder as a whole if it contains several semiconductor oxides and possibly other non-binder compounds).
In fact, it has been shown and will be described in more detail below that semiconductor oxides having a certain level of electron conductivity allow, in the form of a binder in combination with photocatalytic titanium dioxide, an increase in photocatalysis process compared to a binder which would be an electrical insulator. silica. Surprisingly, it has been found that the use of such a "conductive" binder according to the invention makes it possible to increase the photocatalytic activity of the coating as a whole and also to increase the durability of this photocatalytic activity over time.
Thus, this application differs from the instructions provided in International Application WO99 / 44954. The invention does not seek to make the coating more photocatalytic by using a binder which is partially crystalline and in itself photocatalytic. This is not a summation of the significant photocatalytic activity of the crystalline titanium dioxide particles and the weaker photocatalytic activity derived from the binder. In particular, the invention seeks to utilize only the electronic conductivity properties of the binder, which may otherwise be completely amorphous in itself and completely free of photocatalytic activity.
In fact, within the scope of the invention, a cooperative effect has been found and thus a synergy between the photocatalytic material and the material with which this photocatalytic material is closely associated, i.e. its binder.
In a first variant of the invention, at least part of the photocatalytic titanium dioxide (in particular all or most of the titanium dioxide) is incorporated in the coating in the form of preformed particles. Preferably, particles having a nanometric size are selected. These particles are generally formed by agglomerates of crystallites, these agglomerates having a mean size of about 5 to 80 nm (for example 30 to 60 nm), while the crystallites themselves have a mean size of about 5 to 20 nm (especially 5 to 10 nm). These particles are generally treated in the form of a dispersion in the liquid phase, in particular in the form of a colloidal suspension in an aqueous medium or in the form of a dispersion in one or more organic solvents. These mean sizes correspond to particle diameters where the particle shape approximates the spherical shape of the particles (even when the particle shapes p differ substantially from the spherical shape, such as in the case of particles having the shape of lenses or rods). In the first approximation, it can be assumed that the same agglomerates can be found in the final coating as in the primary particles, i.e. agglomerates which have undergone only a small structural and dimensional modification. In fact, it can be observed that when the method of manufacturing the coating involves heat treatment, it generally results in a noticeable increase in crystallinities, for example a 1.5- to 2.5-fold increase, as described in detail in the above-mentioned International Application WO 99 / 44 954.
In a second variant of the invention, at least part of the photocatalytic titanium dioxide is formed during the formation of the coating, in particular by the thermal decomposition of organometallic-type precursors or metal halides or metal salts. As explained in International Application WO97 / 10186, sol-gel or precursor pyrolysis coating deposition techniques (described in more detail below) allow in situ "particles" of photocatalytic titanium dioxide to be formed in situ (either by hot deposition or by heat treatment after coating). In this case, there are also crystalline regions of titanium dioxide (anatase) distributed in the binder, which can be compared to the preformed particles described in the first variant, recognizing that amorphous regions of titanium dioxide may also be present.
Both variants are alternative or cumulative.
In order to increase the effect of the "conductive" binder according to the invention (this term will mean the presence of one or more semiconductor metal oxides in the remainder of the application), its electronic conductivity can be increased by doping the semiconductor oxide or semiconductor oxides with metal or halogen. This doping, in particular halogen doping, can be carried out using the above-mentioned deposition technique by thermal decomposition of halogenated precursors (which are also precursors of one of the coating oxides or which are precursors whose sole function is to supply halogen). In order to facilitate the incorporation of halogen into the coating, especially when derived from metal halide precursors, the coating may be subjected to a heat treatment under a substoichiometric oxygen atmosphere during or after its formation.
In fact, the term "doping" is to be understood in a broad sense to mean that the dopant is integrated into the coating without being exclusively localized in the binder or on any of the compounds forming the coating.
The inventors have wondered why increased photocatalytic efficiency is achieved in the isquantity of photocatalytic titanium dioxide using a conductive binder. In fact, when exposed to adequate radiation with a center in the ultraviolet region, electron-hole pairs are formed in the photocatalytic titanium dioxide particles. Holes initiate radical reactions causing the oxidation of organic substances, while electrons should carry out electrochemical reduction. The presence of a conductive binder would allow for two things:
- on the one hand, the binder could take up the photoelectrons generated in the photocatalytic titanium dioxide and enable these electrons to realize their electrochemical effect here, i.e. essentially oxygen reduction; thus, there is a cooperation between the photocatalytic particles and their binder, wherein the photocatalytic particles are the site of oxidation reactions caused by photodires, while the binder is the site of reduction reactions caused by photoelectrons which are converted into binder from the photocatalytic particles; thus, the redox cycle induced by the phenomenon of photocatalysis is optimized, where electrons are allowed to use them efficiently;
- on the one hand, the "evacuation" of electrons is made difficult by the spontaneous recombination of the electro-hole pairs generated by the particles, which further results in an increased efficiency of the particles.
In a non-limiting manner, two cases can occur:
- in the first case, the semiconductor metal oxide or at least one of the semiconductor metal oxides binders the lowest energy level of its conductivity band, which is:
(1) less than or equal to the lowest energy level of the conductivity band of photocatalytic titanium dioxide, (2) close to the electron energy level (most likely) of oxygen E °<sub>ox</sub> in the redox-article O<sub>2</sub>/ H<sub>2</sub>O<sub>2</sub>or O<sub>2</sub>/ H<sub>2</sub>O;
1) the relative position of the conductive bands of the binder and the photocatalytic oxide is important: if the conductive binder needs to have a sufficient level of electron conductivity to bring electrons to the binder surface, then the conductive band of the binder must also be energetically close,
- 3 EN 305891 B6 much lower than the conductivity band of photocatalytic titanium dioxide so that electrons can pass from one material to another;
2) as regards the energy level E °<sub>ox</sub> redox-article O<sub>2</sub>/ H<sub>2</sub>O2 or O<sub>2</sub>/ H<sub>2</sub>O, then if this level is similar to the energy level of the conductivity band of the conductive binder, both the reduction reaction (on the binder) and the oxidation reaction (on titanium dioxide) will be promoted, and the electrons will be able to effect the desired electrochemical reduction.
A number of oxides meet the two conditions 1) and 2).
These are mainly titanium dioxide TiO<sub>2</sub>, tin dioxide SnO<sub>2</sub>, antimony oxide (especially antimony oxide Sb<sub>2</sub>O<sub>3</sub> and / or antimony oxide Sb<sub>2</sub>O<sub>5</sub>) zinc oxide ZnO, tungsten oxide WO<sub>3</sub>, cobalt oxide-cobaltite Co<sub>3</sub>O<sub>4</sub>, nickel oxide NiO and mixed oxide of cobalt and nickel NiCo<sub>2</sub>O<sub>4</sub>. Each of these oxides can be doped (such as ZnO: Al, SnO<sub>2</sub>: Sb, SnO<sub>2</sub>: F, ZrO<sub>2</sub>: F, Sb<sub>2</sub>O<sub>3</sub>: F, ZnO: F). These can be mixed oxides containing manganese (manganite group) and mixed oxides containing cobalt (cobaltite group).
The above-mentioned oxides containing Co, Ni or Mn have been found to have an additional advantage: they are compounds which are catalytically active against oxygen reduction. The above redox reaction is promoted by the catalytic effect of such oxides. The catalytic effects of mixed oxides of nickel and cobalt have been studied in the literature; in this respect, mention may be made in particular of the publication "Surf aces properties of Ni and Co mixed oxides: a study by X eays, XPS, BET and PZC", LA De Ratia, JF Koenig, P. Chartier, and S. Trasati (Electrochemica Acta 44 (1998) 1481-1489). The publications describe methods for obtaining nickel and / or cobalt oxides by the sol-gel method; in this regard, mention may be made in particular of: F. Svegl et al., Electrochemica Acta 45 (2000) 4359-1711, G. Spinolo et al. Journal of Electroanalytical Chemistry 423 (1997) 49-57 and JG Kim et al., Applied Surface Science 165 (2000) 70-84.
A preferred embodiment of the invention consists in that the "conductive" binder is not only electronically conductive, but is also catalytically effective in reducing oxygen (it can be at least one such oxide if more oxides are present in the binder).
In the latter case, the semiconductor metal oxide or at least one of the semiconductor metal oxides in the binder has:
(1) the lowest energy level of its conductivity band, which is higher than the energy level of photocatalytic titanium dioxide, (2) electronic states in the band gap, in particular related to structural defects and / or unrealized bonds. These are mainly alumina A1<sub>2</sub>O<sub>3</sub> and zirconia ZrO<sub>2</sub> (which are possibly doped). Despite their unfavorable position in their conduction bands, this type of oxide has proven to be advantageous, as these oxides have such intermediate energy states located in their forbidden band that they can receive electrons (and approach E® levels).<sub>ox</sub> articles by<sub>2</sub>/ H<sub>2</sub>O<sub>2</sub> or O<sub>2</sub>/ H<sub>2</sub>O).
In a second variant of the invention, the binder according to the invention may additionally comprise at least one electrically insulating compound, in particular a silicon derivative, such as silica, silicon oxynitride, silicon oxycarbide or silicon nitride.
The term "insulator" as used herein means substances which in particular have a resistivity of more than 10<sup>10</sup> ohm.cm, especially higher than 10<sup>12</sup> ohm.cm.
An extremely advantageous consequence of the invention is that it is possible to choose the content of photocatalytic titanium dioxide in the coating much more freely: even relatively low contents still allow a sufficient photocatalytic level to be achieved, thanks to the reinforcing effect of the conductive binder. Particularly in the variant where preformed photocatalytic titanium dioxide particles are used, this can be of considerable importance, since the high content of preformed particles in
-4CZ 305891 B6 coating generally tends to reduce the durability of the coating and / or the adhesion of the coating to the substrate on which the coating is deposited; the invention thus makes it possible to achieve a better efficiency / durability trade-off, in particular within this variant.
Thus, for example, the ratio Rt, o2 /<sub>P</sub>ojívo, which is the weight ratio of the photocatalytic titanium dioxide binder, ranging between 10:90 and 60:40, in particular between 10:90 and 50:50 or between 20:80 and 40:60.
With regard to the composition of the binder, it is preferred that the content of semiconductor metal oxides in the binder is 25% by weight, in particular at least 50 to 100% by weight. It may be appropriate, as already mentioned above, to add a non-conductive material such as S1O2, especially from an optical point of view: the presence of silica can thus reduce the overall refractive index of the coating, allowing the light reflectance of the coating to be reduced if desired.
Preferably, the amount of titanium dioxide present in the coating is 5 to 100 pg / cm 3<sup>2</sup>, in particular 10 to 50 pg / cm 3<sup>2</sup> or 15 to 35 pg / cm<sup>2</sup>. This is the total amount of titanium dioxide, including both photocatalytic crystalline titanium dioxide and, optionally, (amorphous) photocatalytic titanium dioxide if the latter titanium dioxide is present in the binder.
Preferred embodiments of the invention consist in coatings in which the binder is zirconia or titanium dioxide, optionally combined with silica.
In particular, the coatings according to the invention have a photocatalytic activity of the coating, based on the total amount of titanium dioxide, of at least 2 nm / h / (pg / cm<sup>2</sup>), in particular at least 5, 10 or 20 nm / h / (pg / cm<sup>2</sup>). The fact that this efficiency is related to the total amount of titanium dioxide makes it possible to better evaluate the effect of the binder on the efficiency of the coating, as will be seen from the examples below.
The coatings according to the invention, in particular when intended for coating glass or transparent substrates in order to obtain stained glass, preferably have an interference thickness (at most equal to 1 [mu] m, generally equal to about 10 to 300 nm).
One variant of the invention consists in that said coating is combined with at least one further layer having an interference layer. In particular, it can be a layer with thermal properties (low-emission layer), with an optical function (reducing the amount of light reflection or modifying the color by the interference mechanism) or a layer forming a barrier against diffusion of subjects diffusing from the substrate: this layer is thus inserted between the substrate and the coating. This is particularly useful when the substrate is glass, where the diffusion of alkali from the glass into the coating is blocked. The barrier interlayer may be a silicon derivative such as silica or oxycarbide, oxynitride or silicon nitride, or a layer based on a metal oxide which is optionally doped (for example SnO 1: F, SiO 2: Sb). The coating may also form the last layer, for example a heat reflective layer / low emission layer assembly.
The fields of application of the coated substrate according to the invention have already been mentioned in the introduction to the application. In fact, it can be any architectural material, in particular stained glass, roofing material, cladding material, floor covering material or ceiling material. They can also be materials used in means of transport (cars, trains, planes, ships) and especially as stained glass windows for household appliances (oven walls or glass partitions for refrigerators / freezers).
The usable substrates are therefore very different: transparent material of the glass or polymer type, ceramics, glass-ceramics, wood, metal, concrete, stone, facade paint, material reconstituted from natural materials and other similar materials.
-5CZ 305891 B6
Said coating can also be deposited, for example, on fibrous materials of the thermally and / or acoustically insulating mineral wool type or also on any set of reinforcing fibers and on fibers for use in the field of filter materials.
In the case of the coating according to the invention, which is also hydrophilic, its non-soiling function and / or bactericidal / fungicidal function and / or defogging function can also be used as required in the individual applications.
The invention also relates to a process for obtaining the coated substrate described above. In a first variant, a technique comprising the thermal decomposition of at least one organometallic precursor or precursor in the form of a metal halide or a metal salt can be used. The deposition phase itself may optionally be followed by a post-deposition heat treatment, such as heating to 350-550 ° C for about 30 minutes to several hours (sol-gel cold deposition or pyrolysis type hot deposition).
In a second variant, a vacuum deposition technique can be used, in particular by sputtering, preferably carried out in a magnetic field. This deposition technique can be reactive (from a target formed by metal or metals, alloys when deposited in the presence of an oxidizing agent) or non-reactive (from a ceramic target of suitable composition).
Explanation of drawings
In the following part of the description, the invention will be described in more detail and in a non-limiting manner by means of examples and the accompanying drawings, in which:
Figures 1 to 3 show in detail the mechanisms of interaction of the conductive binder according to the invention in the level of photocatalytic activity of the coating, and
Fig. 4 is a graph showing the photocatalytic activity of coatings according to the invention.
Giant. 1 illustrates the above-mentioned first case, i.e., a case where the conductive binder contains a semiconductor oxide whose lowest level of its conductivity band lies below the level of the conductivity band of photocatalytic titanium dioxide. The x-axis represents the increasing electron energy level, with the solid line C 1 corresponds to the lowest level of the conductivity band of photocatalytic titanium dioxide and the dotted line C<sub>2</sub> corresponds to the level of, for example, tin oxide, antimony trioxide or zinc oxide (binder) and line C<sub>3</sub> corresponds to the lowest energy level of the valence band of photocatalytic titanium dioxide. The x-axis is the boundary between the thickness of the coating (left) and its outer surface (right). The horizontal line indicates the Fermi level.
By exposure to light, the electrons symbolically designated as e ~ thus pass from the conductivity band of titanium dioxide to the energetically lower conductivity band of, for example, tin dioxide. The electron then tends to transition to the surface of the coating.
Giant. 3 shows, along the ordinate axis, the energy (at pH = 7, in eV) of the lower limits of the conductivity band of the various oxides, as well as the levels of E °<sub>ox</sub> oxygen in articles O<sub>2</sub>/ H<sub>2</sub>O<sub>2</sub> and O<sub>2</sub>/ H<sub>2</sub>O (E °<sub>ox</sub> is the most likely level at the center of the Gaussian curve with a width close to 0.8 eV). It can be verified, for example, that tin dioxide, which is located between the two levels of the O cells<sub>2</sub>/ H<sub>2</sub>O<sub>2</sub> and O<sub>2</sub>/ H<sub>2</sub>O, is well placed to carry out the electrochemical reduction of oxygen in H<sub>2</sub>O<sub>2</sub> or H<sub>2</sub>About electrons obtained from photocatalytic particles. TiO oxides<sub>2</sub>, Sb<sub>2</sub>O<sub>3</sub>, ZnO, NiO are also suitably located; WO<sub>3</sub> and what<sub>3</sub>O<sub>4 </sub>are somewhat lower, but may also be suitable because they differ by less than 0.5 eV, in particular by less than 0.4 eV from the redox potential of Article O<sub>2</sub>/ H<sub>2</sub>O, and Co<sub>3</sub>O4 is an oxide known to be catalytically effective in oxygen reduction.
-6CZ 305891 B6
The second example above is illustrated in FIG. 2. In this case, it is clear from the indications given in connection with FIG. 1 that the conductivity band of a conductive binder, for example zirconia or alumina, is below the conductivity band of photocatalytic titanium dioxide. Their position in Fig. 3 does not theoretically appear to be favorable. In fact, these two oxides also make it possible to accept electrons originating from the photocatalytic material, since they have intermediate energy states in their forbidden bands (symbolically indicated in FIG. 2 by a shaded area along the x-axis).
Examples of embodiments of the invention
Examples 1 to 5
These five examples relate to a clear 3 mm thick silica-calcium glass substrate covered with a first layer of SiOC deposited by the known known CVD (Chemical Vapor Deposition) technique and then with a photocatalytic coating consisting of a mixed SiO binder.<sub>2</sub> + TiO<sub>2</sub>which encapsulates the preformed titanium dioxide particles.
The deposition of the coating is carried out by the sol-gel technique by dip-coating, described in the already mentioned international application WO99 / 44954, from a solution (1) containing binder precursors, using:
-as solvent: ethanol and ethylene glycol in a weight ratio of 75:25,
-as a stabilizing agent: acetylacetonate,
-as a titanium dioxide precursor: titanium tetrabutoxide (TBT),
-as a silica precursor: tetraethylorosilicate (TEOS), and a dispersion (2) which is:
- a liquid phase of ethylene glycol containing crystalline photocatalytic particles, having the following properties:
- specific surface area of the particles: higher than 350 m<sup>2</sup>/G,
- particle size: about 40 nm,
- particle size of crystallites: 7 nm,
- crystalline phase: anatase, more than 80%.
The solution (1) and the dispersion (2) are then mixed in the above-mentioned concentrations / proportions in order to obtain the desired TiO contents in the coating.<sub>2</sub> and SiO<sub>2</sub> and nanoparticles in a binder. The photocatalytic activity is measured as follows using palmitic acid. The palmitic acid layer is deposited by sputtering from a solution in chloroform on the surface of the test board. The amount applied is then determined by weighing. The board is then placed under a source of ultraviolet radiation (about 30 W / m<sup>2</sup>) and the haze induced by the presence of palmitic acid are measured over time. This makes it possible to determine the rate of disappearance of palmitic acid, expressed in nm / h. This rate can also be related to the total amount of titanium dioxide present in the stained glass tested (corresponding to the layer thickness) and thus expressed in (nm / h) / (gg / cm<sup>2</sup>).
The coatings according to the five examples all contain 50% by weight of preformed titanium dioxide nanoparticles and 50% of a binder formed by equal parts of silica and titanium dioxide. After deposition, the coatings were heated to 500 ° C.
The following Table 1 gives the following data for each example (Example 1 has a binder made of 100% silica and is therefore a comparative example):
- TiO content<sub>2</sub> related to SiO<sub>2</sub> in binder in moles%:
„% TiO<sub>2</sub> binder ',
-7 CZ 305891 B6
- the degree of photocatalytic efficiency of the 'AP' coatings, determined by the method described above in nm / h / (pg / cm<sup>2</sup>) and based on the total titanium dioxide content of the coating.
Table 1
<td>Example</td><td colspan="2">% TiO<sub>2</sub> binder AP</td>
<td>1 (comparative)</td><td>0 (100% SiO<sub>2</sub>)</td><td> 1,1</td>
<td> 2</td><td> 14</td><td> 1,5</td>
<td> 3</td><td> 25</td><td> 2,2</td>
<td> 4</td><td> 50</td><td> 6,8</td>
<td> 5</td><td> 75</td><td> 7,8</td>
Example 6
This example relates to a coating deposited on the same substrate by a technique called "dipcoating" and containing 50% by weight of nanoparticles of preformed titanium dioxide (which were also used in the previous examples) and 50% of a binder based on 100% zirconia.
The procedure is as follows: zirconium isopropoxide is added to isopropanol. Acetylacetone is then added and diluted with ethanol. The solution obtained is then mixed with a dispersion of nanoparticles in a colloidal suspension in water acidified with nitric acid. After application, the coating is heated to a temperature of 500 ° C, the photocatalytic activity AP of the coating thus obtained under the conditions of the previous examples being 2.5 nm / h / (pg / cm<sup>2</sup>).
Examples 7 and 8
These examples relate to coatings containing (by weight) only 10% of preformed nanoparticles.
Example 7 is a comparative example comprising a binder consisting of 100% SiO 2<sub>2</sub>, the deposition of the coating being carried out by the dip-coating technique.
In Example 8, a binder consisting of 100% SnO is used<sub>2</sub> doped antimony.
In Example 7, a colloidal suspension of titanium dioxide nanoparticles as in Example 6 and a TEOS-based solution are used.
In the case of Example 8, the following procedure is used: stannous chloride SnCl<sub>2</sub> is dissolved in dimethylformamide. Separately, the antimony chloride is also dissolved in dimethylformamide, and the second solution thus obtained is added to the first stannous chloride solution. Colloidal su is then added
-8EN 305891 B6 suspension of titanium dioxide nanoparticles, the concentration of which was adjusted as before. The coating is applied by dip-coating. The applied coating is then heated to 500 ° C.
For Example 7, the photocatalytic efficiency of AP was measured at 0.1 nm / h / (pg / cm<sup>2</sup>).
For Example 7, the photocatalytic efficiency of AP was measured at 3 nm / h / (pg / cm<sup>2</sup>).
In a number of Examples 1 to 8, it can be seen that at the titanium dioxide iso-quantity, the binder directly affects the photocatalytic efficiency of the coating, although it is not (or almost is not) photocatalytic in itself.
This is particularly evident in Example 8, where very few photocatalytic titanium dioxide nanoparticles are used.
Thus, the importance of semiconductor properties and electronic conductivity of the binder was demonstrated.
It should be noted that the following electrical resistances of semiconductor oxides may be used in the present invention as compared to the electrical resistivities of glass and silica:
ZnO: Al10 '
SnO<sub>2</sub>: Sb10 '
SnO<sub>2</sub>5
ZrO<sub>2</sub>10
TiO<sub>2</sub>10 glass10 '
SiO<sub>2</sub>10
Subsequently, three series of Examples A, B and C were performed using a mixed TiO binder<sub>2</sub> + SiO<sub>2</sub> and titanium dioxide nanoparticles in a manner similar to the method of the series of Examples 1 to 5 (same deposition technique, same precursors).
The following Table 2 lists for each example of each series (percentages are percentages by weight):
- percentage content of titanium dioxide nanoparticles,
- percentage of titanium dioxide contained in the binder,
- the percentage of silica contained in the binder as well as the value of the photocatalytic efficiency of the coating as a whole AP 'expressed in nm / h, the value of the photocatalytic efficiency of the coating relative to the total amount of titanium dioxide in the coating AP expressed in nm / h / (pg / cm<sup>2</sup>) and the amount Q of titanium dioxide (contained in nanoparticles and in the binder) in the coating expressed in pg / cm<sup>2</sup>.
-9CZ 305891 B6
Table 2
<td>rr m O \ o Η- PJ Η Ω Η (V Ο Η- Ω <Ο PJ ' Ω 1</td><td>% TiO<sub>2 </sub>in insurance vu</td><td>% SiO<sub>2 </sub>in insurance vu</td><td>AP ' (nm / h)</td><td>Q = quantity TiO<sub>2</sub> (nanoparticles προ j ivo) (gg. cm<sup>2</sup>)</td><td>AP, „,, 2.. (nm / h / (gg. cm))</td>
<td colspan="6">Series A</td>
<td> 0</td><td> 100</td><td> 0</td><td> 18</td><td> 22,3</td><td> 0,81</td>
<td> 20</td><td> 100</td><td> 0</td><td> 128</td><td> 23,7</td><td> 5,40</td>
<td> 35</td><td> 100</td><td> 0</td><td> 159</td><td> 22,9</td><td> 6,94</td>
<td> 50</td><td> 100</td><td> 0</td><td> 231</td><td> 24,8</td><td> 9,30</td>
<td> 65</td><td> 100</td><td> 0</td><td> 210</td><td> 24,1</td><td> 8,71</td>
<td> 80</td><td> 100</td><td> 0</td><td> 167</td><td> 18,5</td><td> 9,03</td>
<td> 100</td><td> 100</td><td> 0</td><td> 222</td><td> 22,7</td><td> 9,78</td>
<td colspan="6">Series Β</td>
<td> 0</td><td> 14</td><td> 86</td><td> 0</td><td> 1</td><td> 0</td>
<td> 10</td><td> 14</td><td> 88</td><td> 0</td><td> 8,3</td><td> 0</td>
<td> 25</td><td> 14</td><td> 86</td><td> 0</td><td> 17,6</td><td> 0</td>
<td> 50</td><td> 14</td><td> 86</td><td> 58</td><td> 32,7</td><td> 1,77</td>
-10GB 305891 B6
Table 2 (continued)
<td>% TiO<sub>2 </sub>nanoparticles</td><td>% TiO<sub>2 </sub>in insurance vu</td><td>% SiO<sub>2 </sub>in insurance vu</td><td>AP ' (nm / h)</td><td>Q = amount of TiO<sub>2</sub> (nanoparticles + binder) (gg.cm<sup>2</sup>)</td><td>AP (nm / h) (gg.cm<sup>2</sup>))</td>
<td> 75</td><td> 14</td><td> 86</td><td> 233</td><td> 42,1</td><td> 5,53</td>
<td> 90</td><td> 14</td><td> 86</td><td> 535</td><td> 49,7</td><td> 10,77</td>
<td colspan="6">Series C</td>
<td> 50</td><td> 14</td><td> 86</td><td> 15</td><td> 9,7</td><td> 1,55</td>
<td> 50</td><td> 25</td><td> 75</td><td> 25</td><td> 11,3</td><td> 2,21</td>
<td> 50</td><td> 50</td><td> 50</td><td> 88</td><td> 12,9</td><td> 6,82</td>
<td> 50</td><td> 75</td><td> 25</td><td> 137</td><td> 17,5</td><td> 7,83</td>
Giant. 4 shows in graph form the photocatalytic activity of these coatings: the line axis shows the weight percentage of nanoparticles in the coating, while the ordinate axis shows the AP value: the graph shows that the higher the titanium dioxide content in the binder, the higher the photocatalytic efficiency (series C). A comparison of series B and series C clearly shows that the amount of electronically conductive material in the binder has an effect on the photocatalytic efficiency of the coating, which is as pronounced as the effect of the amount of nanoparticles on this efficiency.
Examples according to series D
The last series of examples relates to a variant in which the photocatalytic titanium dioxide is generated in situ by thermal decomposition of the precursors and at least partially converted into a crystalline form (which may require heat treatment performed after deposition of the coating).
In these examples, different types of binders with a titanium dioxide content are used. Titanium dioxide derived from the thermal decomposition of precursors is partly in the crystalline modification of anatase (photocatalytic TiO2) and partly in the amorphous form. The deposition is carried out by liquid pyrolysis on a glass substrate, which has already been used in the previous examples.
The following Table 3 lists for each of the examples in this series:
- type of binder (formula SbjOx means that it is either antimony oxide SbjOi or antimony oxide Sb2O<sub>5</sub>, while the stoichiometry of oxygen was not measured),
the amount of titanium dioxide in the coatings (measured by X - fluorescence: expressed in gg / cm<sup>2</sup>: QtiO2, - value of AP, which is defined above and is expressed in nm / h / (μ§ / οηι<sup>2</sup>),
-11EN 305891 B6
- the amount of total coating mass also expressed in μg / cm<sup>2</sup> : Qtot ·
In all examples, the TiO ratio corresponds to<sub>2</sub> (which is either crystalline or amorphous) to the other components of the coating (binder) 90 mol% of titanium dioxide on 10 mol% of Si or another metal, depending on the metal used in each example.
Table 3
<td>Example</td><td>^ TiO2</td><td>Qtot</td><td>Binder</td><td>AP</td>
<td>D-10</td><td> 15,4</td><td> 15,4</td><td>TiO<sub>2</sub></td><td> 19,4</td>
<td>D-ll</td><td> 12,1</td><td> 14,6</td><td>SnO<sub>2</sub></td><td> 11,5</td>
<td>D-12</td><td> 12,4</td><td> 15,0</td><td>SnO<sub>2</sub>:F</td><td> 12,5</td>
<td>D-13</td><td>n, i</td><td> 12,7</td><td>ai<sub>2</sub>O<sub>3</sub></td><td> 4,8</td>
<td>D-14</td><td> 11,8</td><td> 13, 5</td><td>A1<sub>2</sub>O<sub>3</sub>:F</td><td> 4,7</td>
<td>D-15</td><td> 15,8</td><td> 18,5</td><td>ZrO<sub>2</sub></td><td> 17,8</td>
<td>D-16</td><td> 16,0</td><td> 18,7</td><td>ZrO<sub>2</sub>:F</td><td> 20,0</td>
<td>D-17</td><td> 19,5</td><td> 25,0</td><td>Sb<sub>2</sub>O<sub>x</sub></td><td> 3,0</td>
<td>D-18</td><td> 17,0</td><td> 21,8</td><td>^^ 2 ° x '<sup>F</sup></td><td> 1,5</td>
<td>D-19</td><td> 19, 6</td><td> 21,8</td><td>ZnO</td><td> 1,8</td>
<td>D-20</td><td> 20,3</td><td> 22,6</td><td>ZnO: F</td><td> 2,2</td>
The precursors used in each of these examples are precursors of the organometallic type or of the halide or metal salt type, which are known from the literature. In Example D-10, where only TiO is used<sub>2</sub>, is the same precursor as used in Examples 1 to 5.
In Table 4 below, the light transmission values T are given for the individual examples<sub>L</sub> measured by illuminant D<sub>65</sub> glasses so coated, as well as the values of the light reflection R<sub>l</sub> (same illuminant). The values of light diffusion transmittance T are also given here<sub>d</sub> in% and Delta T values<sub>d</sub>, which correspond to the change in the light diffusion transmittance of the coatings after they have been subjected to the following mechanical abrasion test: the coating is subjected to dry friction in a reciprocating motion combined with the rotation of a loaded roller. The roller load is 390 g / cm<sup>2</sup>, the speed of the back and forth movement is 50 cycles of back and forth / revolutions per minute and the actual speed of rotation of the cylinder is 6 revolutions per minute. The value of T<sub>d</sub> is measured after 500 cycles back and forth.
. and? CZ 305891 B6
Table 4
<td>Example</td><td>T<sub>L</sub></td><td>r<sub>l</sub></td><td>T<sub>d</sub></td><td>Delta T<sub>d</sub></td>
<td>D-10</td><td> 83, 3</td><td> 16,2</td><td> 0, 5</td><td> 0,6</td>
<td>D-ll</td><td> 86,7</td><td> 13,1</td><td> 0,2</td><td> 0,9</td>
<td>D-12</td><td> 86,3</td><td> 13,4</td><td> 0,3</td><td> 0,5</td>
<td>D-13</td><td> 87,3</td><td> 12,5</td><td> 0,2</td><td> 3,5</td>
<td>D-14</td><td> 86,3</td><td> 13,5</td><td> 0,2</td><td> 2,6</td>
<td>D-15</td><td> 81,2</td><td> 18,5</td><td> 0,3</td><td> 1,2</td>
<td>D-16</td><td> 80,9</td><td> 18,8</td><td> 0,3</td><td> 0,6</td>
<td>D-17</td><td> 81,9</td><td> 17,6</td><td> 0,5</td><td> 0,3</td>
<td>D-18</td><td> 83,2</td><td> 15,1</td><td> 1,7</td><td> 1,2</td>
<td>D-19</td><td> 81, 9</td><td> 17,4</td><td> 0,7</td><td> 0,4</td>
<td>D-20</td><td> 81,3</td><td> 18,3</td><td> 0,4</td><td> 1,3</td>
These results confirm the above findings: conductive binders make it possible to significantly improve the effectiveness of photocatalytic coatings, while obtaining coatings which are abrasion-resistant and have good optical quality.
In conclusion, the summary of the above results shows that conductive binders can be chosen very well within the scope of the invention, which make it possible to remove light-generated electrons from the photocatalytic crystalline particles / regions and to carry out advantageous redox reactions in the coating.
Contents6
3 sheets
Sheet 1 Sheet 2 Sheet 3
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| EP1066878A1 | Cites | European Patent Office (EPO) | Search report |
| EP1081108A1 | Cites | European Patent Office (EPO) | Search report |
| CA2233876A1 | Cites | Canada | Search report |
| CZ297518B6 | Cites | Czechia | Search report |
| WO9944954A1 | Cites | World Intellectual Property Organization (WIPO) | Search report |
| JPH1143759A | Cites | Japan | Search report |
26 members in 15 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 0106432 | France | A | |
| 0106432 | France | A | |
| 20010106432 | – | – | – |
| FR20010006432 | – | – | – |
Members26
| Document | Office | Kind | |
|---|---|---|---|
| CA2446791A1 | Canada | A1 | |
| WO02092879A1 | World Intellectual Property Organization (WIPO) | A1 | |
| FR2824846A1 | France | A1 | |
| KR20040000457A | Republic of Korea | A | |
| EP1390563A1 | European Patent Office (EPO) | A1 | |
| MXPA03010489A | Mexico | A | |
| FR2824846B1 | France | B1 | |
| CZ20033094A3 | Czechia | A3 | |
| BR0209674A | Brazil | A | |
| CN1529768A | China | A | |
| US2004180220A1 | United States of America | A1 | |
| JP2004532113A | Japan | A | |
| PL367092A1 | Poland | A1 | |
| US7387839B2 | United States of America | B2 | |
| KR100861708B1 | Republic of Korea | B1 | |
| EP1390563B1 | European Patent Office (EPO) | B1 | |
| AT420223T | Austria | T | |
| ATE420223T1 | Austria | T1 | |
| DE60230741D1 | Germany | D1 | |
| ES2320423T3 | Spain | T3 | |
| JP4316894B2 | Japan | B2 | |
| CN100557080C | China | C | |
| CA2446791C | Canada | C | |
| PL206113B1 | Poland | B1 | |
| BRPI0209674B1 | Brazil | B1 | |
| CZ305891B6This record | Czechia | B6 |
1 legal event, as the office reported them to INPADOC
Events
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| Patent lapsed due to non-payment of feeLapsedMM4A | MM4A |
Numbers
- Publication
- 305891
- Publication, DOCDB
- 305891
- Publication, EPODOC
- CZ305891
- Application
- 20033094
- Application, DOCDB
- 20033094
- Application, EPODOC
- CZ20030003094
Titles2
- Czech
- Substrát s fotokatalytickým povlakem
- English
- Substrate with photocatalytic film
Classification
- CPC, 12
- C23C18/1216
- C03C17/36
- C03C17/007
- C03C2217/45
- C03C2217/477
- C03C2217/71
- C23C18/1254
- C23C18/127
- C23C18/1279
- B82B3/00
- B82Y30/00
- Y02T50/60
- IPC, 18
- C23C18 12
- E04B1 72
- B01J21 06
- B01J21 08
- B01J23 06
- B01J23 18
- B01J35 00
- B01J37 02
- B01J37 08
- C03C17 00
- C03C17 245
- C03C17 34
- C04B41 65
- C04B41 85
- C23C4 11
- C23C14 08
- C23C20 00
- G02B1 11