Multi-tray film precursor evaporation system and thin film deposition system incorporating same

By increasing the exposed surface area of ​​the solid precursor 350 as to increase the deposition rate, the conductance is coupled to the high vapor transport device (40, 140), the solid precursor vaporization apparatus for conductance is a higher plurality of trays ( 50, 150, 300, and 300 ') is described. Solid precursor vaporization apparatus having a plurality of trays and (50, 150, 300, 300 ') includes a base tray 330 with one or more upper trays 340. Each tray 330 and 340 is, for example, adapted to support a film precursor has 350 of a solid phase in powder form or solid tablet form. Additionally, each of the trays 330 and 340 is a film precursor 350 is the conductance in the upper film precursor 350 is heated during intended to provide a high carrier gas flow. For example, the carrier gas is within the stackable tray 340, the film precursor 350 to the inside direction of the upper, and flows vertically upward through the flow channel 318, the solid precursor evaporator (50, 150, 300, 300 ' ) flows through an outlet 322 of the.