AT496388T
Magnetic mirror plasma source
Abstract
A dipole ion source (Fig. 1) substrate [the two cathode surfaces and] (1) Reaches, and contains (3) very much. A gap is demarcated between a substrate and a pole and an asymmetrical mirror magnetic field includes a compression end. A substrate is arranged at the low compression end of a magnetic field, and an anode (4) confines an electron in the loop of the hole current which continued while forming the electric field which penetrates a magnetic field. An asymmetrical magnetic field assists the ion beam on a substrate.
Term
Term ended
Expired 10 April 2022, 4.5 years ago.
- Priority
- Filed
- Granted
- Expired
- Today
33 members in 6 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 28536001 | United States of America | P | |
| 28536101 | United States of America | P | |
| 28536401 | United States of America | P | |
| 0211473 | United States of America | W |
Members33
| Document | Office | Kind | |
|---|---|---|---|
| WO02086185A1 | World Intellectual Property Organization (WIPO) | A1 | |
| WO02086932A1 | World Intellectual Property Organization (WIPO) | A1 | |
| WO02086937A1 | World Intellectual Property Organization (WIPO) | A1 | |
| WO02086937B1 | World Intellectual Property Organization (WIPO) | B1 | |
| WO02086932B1 | World Intellectual Property Organization (WIPO) | B1 | |
| EP1388159A1 | European Patent Office (EPO) | A1 | |
| EP1390558A1 | European Patent Office (EPO) | A1 | |
| EP1390964A1 | European Patent Office (EPO) | A1 | |
| US2004135485A1 | United States of America | A1 | |
| US2004149574A1 | United States of America | A1 | |
| US2004155592A1 | United States of America | A1 | |
| JP2004537825A | Japan | A | |
| JP2005504880A | Japan | A | |
| JP2005505891A | Japan | A | |
| US6911779B2 | United States of America | B2 | |
| US7023128B2 | United States of America | B2 | |
| US7294283B2 | United States of America | B2 | |
| JP4264474B2 | Japan | B2 | |
| JP4264475B2 | Japan | B2 | |
| JP4339597B2 | Japan | B2 | |
| EP1388159A4 | European Patent Office (EPO) | A4 | |
| EP1390558A4 | European Patent Office (EPO) | A4 | |
| EP1390964A4 | European Patent Office (EPO) | A4 | |
| EP1390558B1 | European Patent Office (EPO) | B1 | |
| AT496388TThis record | Austria | T | |
| ATE496388T1 | Austria | T1 | |
| DE60238979D1 | Germany | D1 | |
| EP1388159B1 | European Patent Office (EPO) | B1 | |
| EP1390964B1 | European Patent Office (EPO) | B1 | |
| AT536627T | Austria | T | |
| AT536628T | Austria | T | |
| ATE536627T1 | Austria | T1 | |
| ATE536628T1 | Austria | T1 |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Ceased as to paragraph 5 lit. 3 law introducing patent treatiesCeasedRER | RER |
Numbers
- Application
- 2764187
Titles2
- German
- PENNINGENTLADUNGSPLASMAQUELLE
- English
- PENNING DISCHARGE PLASMA SOURCE
Classification
- CPC, 8
- H01J27/14
- C23C16/50
- C23C16/505
- C23C16/545
- H01J37/32623
- H01J37/3266
- H01J37/3277
- H05H1/14
- IPC, 16
- C23C14 28
- C23C14 30
- C23C14 35
- C23C16 50
- C23C16 503
- C23C16 505
- C23C16 54
- C23F4 00
- H01J27 00
- H01J37 32
- H01J49 42
- H01L21 205
- H01L21 3065
- H05H1 14
- H05H1 24
- H05H1 46