AT477515T
Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
Abstract
The invention relates to setting other liquid volume to substrate on the method, wherein the method comprises: The bubble for plurality of first resistor, which is connected with a substrate's area, the bubbles provided with a storage unit volume, wherein the area of the bubble collects the volume along change probably the pattern volume of the region; and forceAnd a on.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
59 members in 10 offices
Priority claims8
| Document | Office | Kind | Date |
|---|---|---|---|
| 57687804 | United States of America | P | |
| 57687804 | United States of America | P | |
| 2005019509 | United States of America | W | |
| 2005019509 | United States of America | W | |
| 576878P | – | – | – |
| 0519509 | – | – | – |
| US20040576878P | – | – | – |
| WO2005US19509 | – | – | – |
Members59
| Document | Office | Kind | |
|---|---|---|---|
| US2005270312A1 | United States of America | A1 | |
| WO2005120834A2 | World Intellectual Property Organization (WIPO) | A2 | |
| TW200643654A | Taiwan Province of China | A | |
| WO2005120834A3 | World Intellectual Property Organization (WIPO) | A3 | |
| EP1768846A2 | European Patent Office (EPO) | A2 | |
| KR20070038987A | Republic of Korea | A | |
| US2007132152A1 | United States of America | A1 | |
| WO2007067488A2 | World Intellectual Property Organization (WIPO) | A2 | |
| US2007170617A1 | United States of America | A1 | |
| WO2007084774A2 | World Intellectual Property Organization (WIPO) | A2 | |
| CN101019066A | China | A | |
| TW200730325A | Taiwan Province of China | A | |
| TW200734706A | Taiwan Province of China | A | |
| US2007228593A1 | United States of America | A1 | |
| TWI290665B | Taiwan Province of China | B | |
| TW200746256A | Taiwan Province of China | A | |
| WO2007084774A3 | World Intellectual Property Organization (WIPO) | A3 | |
| JP2008502157A | Japan | A | |
| EP1768846A4 | European Patent Office (EPO) | A4 | |
| WO2008066562A2 | World Intellectual Property Organization (WIPO) | A2 | |
| WO2008066562A3 | World Intellectual Property Organization (WIPO) | A3 | |
| EP1957249A2 | European Patent Office (EPO) | A2 | |
| KR20080080338A | Republic of Korea | A | |
| EP1973719A2 | European Patent Office (EPO) | A2 | |
| KR20080093414A | Republic of Korea | A | |
| WO2007067488A3 | World Intellectual Property Organization (WIPO) | A3 | |
| JP2009518863A | Japan | A | |
| TWI310726B | Taiwan Province of China | B | |
| JP2009524249A | Japan | A | |
| CN101535021A | China | A | |
| CN100570445C | China | C | |
| US7670529B2 | United States of America | B2 | |
| US7670530B2 | United States of America | B2 | |
| US2010112116A1 | United States of America | A1 | |
| US2010129486A1 | United States of America | A1 | |
| JP4472011B2 | Japan | B2 | |
| EP1768846B1 | European Patent Office (EPO) | B1 | |
| AT477515TThis record | Austria | T | |
| ATE477515T1 | Austria | T1 | |
| DE602005022874D1 | Germany | D1 | |
| US2010286811A1 | United States of America | A1 | |
| TWI341935B | Taiwan Province of China | B | |
| MY144018A | Malaysia | A | |
| JP2011171747A | Japan | A | |
| JP4792028B2 | Japan | B2 | |
| MY144847A | Malaysia | A | |
| US8109753B2 | United States of America | B2 | |
| US8109754B2 | United States of America | B2 | |
| TWI360835B | Taiwan Province of China | B | |
| EP1957249A4 | European Patent Office (EPO) | A4 | |
| EP1973719A4 | European Patent Office (EPO) | A4 | |
| JP4987012B2 | Japan | B2 | |
| KR101193918B1 | Republic of Korea | B1 | |
| MY147830A | Malaysia | A | |
| KR101324544B1 | Republic of Korea | B1 | |
| KR101324549B1 | Republic of Korea | B1 | |
| US8647554B2 | United States of America | B2 | |
| EP1957249B1 | European Patent Office (EPO) | B1 | |
| CN104317161A | China | A |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Publication of translation of european patent specificationUEP | UEP |
Numbers
- Publication, DOCDB
- 477515
- Publication, EPODOC
- AT477515T
- Application
- 5757163
- Application, DOCDB
- 05757163
- Application, EPODOC
- AT20050757163T
Titles2
- German
- FLUIDAUSGABE UND TROPFENAUSGABE NACH BEDARF FÜR DIE HERSTELLUNG IM NANOBEREICH
- English
- FLUID AND DROP EXPOSURE AS REQUIRED FOR MANUFACTURE IN THE NANO AREA
Classification
- CPC, 7
- B82Y10/00
- G03F7/0002
- H10K10/00
- B41J3/28
- B82Y40/00
- H10K71/13
- B41J2/01
- IPC, 6
- G02F1 1333
- B41J2 01
- B41J3 28
- B41J3 407
- G03F7 00
- H01L51 40