Nova Patents
ZA201106933B

Multipurpose acidic,organic solvent based microelectronic cleaning composition

Abstract

A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and wherein said cleaning composition is free of amines, bases and other salts.

Term

5 yearsleft in the term

Expires 22 September 2031.

  1. Priority
  2. Filed
  3. Granted
  4. Today
  5. Expires

26 members in 16 offices

This recordMember, by publication datePriority claim6 more offices are in the list below

Priority claims3

Priority claims
DocumentOfficeKindDate
61155309United States of America–
15530909United States of AmericaP
2010020974United States of AmericaW

Members26

Family members, oldest first
DocumentOfficeKind
CA2753399A1CanadaA1
WO2010098899A1World Intellectual Property Organization (WIPO)A1
TW201035308ATaiwan Province of ChinaA
MX2011008787AMexicoA
SG173834A1SingaporeA1
AU2010218426A1AustraliaA1
IL214728A0IsraelA0
IL214728D0IsraelD0
US2011306534A1United States of AmericaA1
KR20110136820ARepublic of KoreaA
EP2401655A1European Patent Office (EPO)A1
CN102334069AChinaA
ZA201106933BThis recordSouth AfricaB
JP2012518715AJapanA
RU2011139104ARussian FederationA
RU2011139104ARussian FederationA
CN102334069BChinaB
US8557757B2United States of AmericaB2
EP2401655B1European Patent Office (EPO)B1
JP2014132094AJapanA
MY152051AMalaysiaA
JP5730790B2JapanB2
TWI500760BTaiwan Province of ChinaB
IL214728AIsraelA
BRPI1007989A2BrazilA2
KR101831452B1Republic of KoreaB1