Nova Patents
WO2013019285A3

Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus

Abstract

The invention relates to an apparatus for depositing thin film coatings on a substrate. The deposition apparatus is designed to keep gaseous reactant materials to be deposited apart from one another in the deposition apparatus, by one or more separation devices and/or methods, but nevertheless, to allow the chemical reactants to mix and react at or near the substrate surface, rapidly enough to create a uniform film at commercially viable deposition rates.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Published
  4. Today

Every citation, both ways

Citations
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WO2013136052A2CitesWorld Intellectual Property Organization (WIPO)EInternational search1-11
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