WO0246242A3

Volatile organometallic complexes of lowered reactivity suitable for use in chemical vapor deposition of metal oxide films

Abstract

Novel ligated compounds of tin, titanium, and zinc are useful as matal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Published
  4. Today

Every citation, both ways

Citations
DocumentRelationOfficeCited during
US4751149ACitesUnited States of AmericaInternational search
WO9806675A1CitesWorld Intellectual Property Organization (WIPO)International search