WO0246242A3
Volatile organometallic complexes of lowered reactivity suitable for use in chemical vapor deposition of metal oxide films
Abstract
Novel ligated compounds of tin, titanium, and zinc are useful as matal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.
Term
No projected expiry on record.
- Priority
- Filed
- Published
- Today
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| US4751149A | Cites | United States of America | International search |
| WO9806675A1 | Cites | World Intellectual Property Organization (WIPO) | International search |
3 priority claims, no other members on record
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 73223300 | United States of America | A | |
| 09732233 | – | – | – |
| US20000732233 | – | – | – |
Numbers
- Publication
- 02/46242
- Publication, DOCDB
- 0246242
- Publication, EPODOC
- WO0246242
- Application
- 144903
- Application, DOCDB
- 0144903
- Application, EPODOC
- WO2001US44903
Titles2
- English
- VOLATILE ORGANOMETALLIC COMPLEXES OF LOWERED REACTIVITY SUITABLE FOR USE IN CHEMICAL VAPOR DEPOSITION OF METAL OXIDE FILMS
- French
- COMPLEXES ORGANOMETALLIQUES VOLATILES A REACTIVITE REDUITE POUR DEPOT EN PHASE VAPEUR DE FILMS D'OXYDE METALLIQUE
Classification
- CPC, 7
- C03C17/2456
- C03C17/245
- C03C17/2453
- C03C2217/211
- C03C2217/212
- C03C2217/216
- C03C2218/152
- IPC, 1
- C03C17 245
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