US9620243B2

Test system simultaneously testing semiconductor devices

Summary by NHIP

Simultaneous semiconductor stress testing

The test system uses a tester to generate a test mode register set signal that triggers individual memory chips to provide failure attribute information. Subsequently, built-in self-stress circuitry within each chip simultaneously applies distinct stress tests corresponding to the received failure attributes.

Claim Score by NHIP

Read claim 15, the broadest

Abstract

Individual memory chips are simultaneously tested by a tester using selectively enabled stress modules that apply a corresponding stress test to memory cells, wherein each stress test is associated with a corresponding failure attribute for the memory cells. Built-in self-test (BIST)/built-in self-stress (BISS) circuitry is provided in each stress module and may configured to selectively apply one or more stress test(s) during the simultaneous testing of a plurality of memory chips.

US9620243B2, drawing sheet 1
Sheet 1 of 12

Term

8.7 yearsleft in the term

Expires 5 June 2035.

  1. Priority
  2. Filed
  3. Granted
  4. Today
  5. Expires

18 claims: 3 independent, 15 dependent

  1. 1
    A test system comprising:a plurality of memory chips and a tester external to the plurality of memory chips and configured to generate a test mode register set (TMRS) signal,wherein the plurality of memory chips comprises a first memory chip and a second memory chip, the first memory chip includes a first memory cell array including memory cells susceptible to a first failure attribute, a first storage unit that stores first failure attribute information, and first built-in self-test (BIST)/built-in self-stress (BISS) circuitry, and the second memory chip includes a second memory cell array including memory cells susceptible to a second failure attribute different from the first failure attribute, a second storage unit that stores second failure attribute information, and second BIST/BISS circuitry,in response to the TMRS signal, the first storage unit provides the first failure attribute information to the tester and the second storage unit provides the second failure attribute information to the tester, and thereafter,the first BIST/BISS circuitry, the second BIST/BISS circuitry and tester are collectively configured in response to the first failure attribute information and second failure attribute information to simultaneously apply a first stress test associated with the first failure attribute to the first memory chip, and a second stress test associated with the second failure attribute and different from the first stress test to the second memory cell chip.
  2. 10
    A method of simultaneously testing a plurality of memory chips arranged on a wafer and including a first memory chip and a second memory chip using a tester external to the wafer, wherein the first memory chip includes a first memory cell array and a first stress module including a first storage unit and first built-in self-test (BIST)/built-in self-stress (BISS) circuitry and the second memory chip includes a second memory cell array and a second stress module including a second storage unit and second BIST/BISS circuitry, the method comprising:communicating first failure attribute information stored in the first storage unit from the first memory chip to the tester, and communicating second failure attribute information stored in the second storage unit from the second memory chip to the tester;and thereafter,configuring the first BIST/BISS circuitry to selectively apply a first stress test associated with a first failure attribute to the first memory cell array;andconfiguring the second BIST/BISS circuitry to selectively apply a second stress test associated with a second failure attribute different from the first failure attribute to the second memory cell array,wherein the first stress test is defined at least in part from the first failure attribute information, the second stress test is different from the first stress test and is defined at least in part from the second failure attribute information, and the first and second stress tests are simultaneously and respectively applied to the first memory cell array and the second memory cell array.
  3. 15
    Broadest claimClaim Score 30, narrow(NHIP)A method of simultaneously testing a plurality of memory chips arranged on a wafer and including a first memory chip and a second memory chip using a tester external to the wafer, the method comprising:performing a wafer-level test on the plurality of memory chips during which repair information associated with the first memory chip including a first memory cell array and second memory chip including a second memory cell array is acquired by the tester;generating in the tester first failure attribute information associated with a first failure attribute for memory cells in the first memory cell array from repair information associated with the first memory chip, and storing the first failure attribute information in a first storage unit disposed on the first memory chip;generating in the tester second failure attribute information associated with a second failure attribute, different from the first failure attribute, for memory cells in the second memory cell array from repair information associated with the second memory chip, and storing the second failure attribute information in a second storage unit disposed on the second memory chip;and thereafter,simultaneously testing the plurality of memory chips by applying a first stress test defined at least in part by the first failure attribute information to the first memory chip, while applying a second stress test different from the first stress test and defined at least in part by the second failure attribute information to the second memory chip.