US8405035B1

Continuously variable phoswich detectors and methods

Summary by NHIP

Phoswich Detector Fabrication

The method fabricates radiation detectors by evaporating dopant and main scintillator materials from separate boats within a chamber. A temperature relationship of T wall T source T substrate is maintained while varying boat distances or evaporation rates to create films with axially varying dopant concentrations.

Claim Score by NHIP

Read claim 25, the broadest

Abstract

Phoswich scintillator detectors, related devices and methods, as well as evaporation-based methods and structures for fabricating phoswich scintillators.

US8405035B1, drawing sheet 1
Sheet 1 of 20

Term

3.5 yearsleft in the term

Expires 10 March 2030.

  1. Priority and filed
  2. Granted
  3. Today
  4. Expires

44 claims: 5 independent, 39 dependent

  1. 1
    A method of fabricating a radiation detector, comprising:providing an evaporation apparatus comprising an evaporation chamber having a first end portion with a substrate positioned in a holder, and a second end portion with a first source boat laterally spaced from a second source boat, and one or more chamber walls at least partially disposed between the first and second end portions;positioning a dopant charge in the first source boat and a main scintillator component charge in the second source boat;and depositing a scintillator film on a surface of the stationarily positioned substrate, the scintillator film having a dopant concentration varying along a length or thickness of the deposited material, wherein the first source boat and second source boat are positioned in the evaporation chamber so as to allow deposition of the scintillator film having a dopant concentration varying along a length or thickness of the deposited material, and wherein the film is deposited by a process comprising applying heat to the evaporation chamber so as to vaporize dopant and main scintillator material for film deposition while maintaining a temperature relationship of T wall T source T substrate for at least a portion of the deposition process.
  2. 13
    An evaporation apparatus for depositing scintillator material on a surface of a substrate, the apparatus comprising:an evaporation chamber having a first end portion with a substrate holder, and a second end portion having a first dopant charge boat laterally spaced from a second main scintillator component charge boat, and one or more chamber walls at least partially disposed between the first and second end portions;and a control system comprising a heating system coupled to the evaporation chamber and configured to apply heating to the chamber so as to vaporize scintillator source materials positioned in the first and second boats for deposition of scintillator material on a surface of a substrate stationarily positioned in the holder, wherein the first boat is shaped and laterally spaced from the second boat such that vaporization of scintillator source materials from the first and second boats deposits scintillator material having a uniform dopant concentration along a first lateral dimension of the scintillator material and a dopant concentration varying along a second lateral dimension of the scintillator material deposited on the substrate, wherein the heating system is configured to apply heating comprising a temperature relationship of T wall T source T substrate .
  3. 18
    An evaporation apparatus for depositing scintillator material on a surface of a substrate, the apparatus comprising:an evaporation chamber having a first end portion with a substrate holder, and a second end portion having a first dopant charge boat and a second main scintillator component charge boat, and one or more chamber walls at least partially disposed between the first and second end portions;and a material deposition control system coupled to the evaporation chamber and configured to apply heating to the chamber so as to vaporize scintillator source materials positioned in the first and second boats for deposition of scintillator material on a surface of a substrate stationarily positioned in the holder, the deposited scintillator material having a dopant concentration varying axially along a thickness of the deposited scintillator material, wherein the first dopant charge boat and the second main scintillator component charge boat are positioned in the evaporation chamber so as to allow deposition of the scintillator material having a dopant concentration varying axially along the thickness of the deposited material, and wherein the material deposition control system is configured to apply heating comprising a temperature relationship of T wall T source T substrate .
  4. 25
    Broadest claimClaim Score 52, average(NHIP)A radiation detector, comprising:a monolithic scintillator comprising a doped scintillator composition, the scintillator having a length and a dopant concentration varying along only the length, only the thickness, or both the length and the thickness, the scintillator formed by a process comprising evaporating a dopant source material and a main scintillator source material from different source boats disposed in an evaporation chamber, the evaporation chamber having one or more heated walls during vapor deposition of the scintillator on a substrate such that a temperature relationship of T wall T source T substrate is maintained for at least a portion of the deposition process, wherein the different source boats are positioned in the evaporation chamber so as to allow deposition of a dopant concentration varying along only the length, only the thickness, or both the length and the thickness of the scintillator.
  5. 40
    A radiation detector, comprising:an assembly comprising a plurality of scintillator segments, at least one scintillator segment of the assembly forming a single-piece, continuous structure having a length and a thickness and a dopant concentration varying along only the length, only the thickness, or both the length and the thickness, the at least one scintillator segment formed by a process comprising evaporating a dopant source material and a main scintillator source material from different source boats disposed in an evaporation chamber, the evaporation chamber having one or more heated walls during vapor deposition of the scintillator on a substrate such that a temperature relationship of T wall T source T substrate is maintained for at least a portion of the deposition process, wherein the different source boats are positioned in the evaporation chamber so as to allow deposition of a dopant concentration varying along only the length, only the thickness, or both the length and the thickness of the at least one scintillator segment.