US6896850B2

Silicon nitride window for microsampling device and method of construction

Summary by NHIP

Etched silicon nitride window

The method constructs a window by etching depressions on opposing surfaces of a silicon substrate to expose a deposited silicon nitride film. The film thickness ranges from about 0.01 to 5 micrometers, and an optional magnesium fluoride antireflective coating may be applied.

Claim Score by NHIP

Read claim 11, the broadest

Abstract

A silicon nitride cuvette window for a microsampling device and method of construction are provided. The sample to be analyzed is drawn into the cuvette of the microsampling device. The silicon nitride window permits optical measurements to be made on analytes contained within the cuvette.

US6896850B2, drawing sheet 1
Sheet 1 of 4

Term

Term ended

Expired 8 January 2022, 4.7 years ago.

  1. Priority and filed
  2. Granted
  3. Expired
  4. Today

11 claims: 3 independent, 8 dependent

  1. 1
    Method of constructing a window in a silicon cuvette, comprising the steps of:providing a silicon substrate having a top surface and a bottom surface;etching a depression in the top surface of the silicon substrate defining a microsample chamber;depositing a silicon nitride film on the top surface of the silicon substrate and in the chamber;and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the window.
  2. 4
    Method of constructing a chamber window in a microsample chamber, comprising the steps of:providing a silicon substrate having a sampling side and a viewing side;etching a depression in the sampling side of the silicon substrate defining a microsample chamber, a needle bore, and a vent;depositing a silicon nitride film in at least the microsample chamber;and etching a depression in the viewing side of the silicon substrate in registration with the microsample chamber in the sampling side for exposing the silicon nitride film within the microsample chamber to form the chamber window.
  3. 11
    Broadest claimClaim Score 78, broad(NHIP)Method of constructing a window in a silicon cuvette, comprising the steps of:providing a silicon substrate having a top surface and a bottom surface;etching a depression in the top surface of the silicon substrate defining a microsample chamber;depositing a silicon nitride film in at least the chamber;and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the chamber window.