Multilayer printed wiring board and manufacturing method of the multilayer printed wiring board

CROSS-REFERENCE TO RELATED APPLICATIONS

0001This is a division of and claims the benefit of priority under 35 U.S.C. §120 from U.S. application Ser. No. 11/250,531, filed on Oct. 17, 2005, the entire contents of which are incorporated herein by reference, and which is based upon and claims the benefit of priority from prior Japanese Application No. 2004-312791, filed on Oct. 27, 2004.

BACKGROUND OF THE INVENTION

00021. Field of the Invention

0003The present invention relates to a multilayer printed wiring board in which electronic components, semiconductor device and the like are mounted on the front face of a board thereof and a manufacturing method thereof and more particularly a multilayer printed wiring board preferably used for portable telephone, portable electronic appliance, electronic package and the like and a manufacturing method thereof.

00042. Description of the Related Art

0005A unit of the circuit board is formed by drilling via holes in an insulation hard base material having a conductive circuit on at least one face and then forming conductive layer in their openings with metallic paste or plating. A multilayer circuit board (multilayer printed wiring board) can be obtained by preparing two or more pieces of these circuit boards and bonding those boards successively or collectively such that they are overlaid into multi-layers. At this time, because a via hole or a land of the via hole of one circuit board is connected to a conductive circuit or a land of the other circuit board, these two circuit boards are electrically connected. In other region in which no electrical connection is performed, circuit boards are fitted to each other with an adhesive layer composed of thermoplastic resin or prepreg. As a conventional art relating to these, Japanese Patent Application Laid-Open No. 10-13028 can be mentioned.

0006A solder resist layer for protecting the conductive circuit is formed on the front face of the board or a general printed wiring board and solder pads are formed by opening part of the solder resist layer. By exposing the conductive circuit through that opening, a corrosion resistant layer such as nickel-gold is formed on its front layer. The corrosion-resistant layer is formed on all the solder pads and solder is formed on a conductive circuit covered with the corrosion-resistant layer and then an electronic component is mounted thereon.

0007In case of portable electronic appliances such as portable telephone, digital camera in recent years, with intensified desires for higher function and higher density and reduction in size of components to be mounted, the wiring density (line/space) in a mounting board or the size of the solder pad has been reduced so as to correspond to such desires for higher density of the components. On the formed board, solder pads of an electronic component (passive component such as semiconductor, capacitor, resistor, inductor), display devices such as liquid crystal display and digital display, operation devices such as key pad and switch, and external terminals of USB, ear phone and the like are mixed and these components are mounted on the solder pad via solder. Another solder pad allows an electronic appliance to be operated by making such an operation device as a switch into contact with the pad.

0008In case of a package board in which an IC chip is mounted on a printed wiring board as a bare chip as well, with intensified desire for higher function, higher density and enhanced reduction in size of a component to be mounted, desires for higher density of components have been met by decreasing wiring density (line/space) or decreasing the solder pad. The size of the board has been desired to be of chip size package (CSP) which is similar to the size of the IC chip. As a result, the package mounting region when it is mounted on a mother board decreases so that the mounting region for other components is obtained thereby making it possible to obtain a higher density mounting board. Further, by loading such an electronic component as capacitor and resistor on the package board, the high frequency of the IC chip can be met so as to obtain the function and performance of the package board.

0009Further, by mixing the IC chip and electronic components on a same package board, high frequency and high functional properties are obtained so as to exert the function and performance of the package board effectively.

0010An object of the present invention is to provide a multiplayer printed wiring board and a manufacturing method thereof, which capable of obtaining functionality and securing electric connectivity.

0011A multilayer printed wiring board in which a conductive circuit is formed on the front face thereof; solder-resist layer covering the conductive circuit is formed; a plurality of solder pads is formed through a plurality of openings in the solder resist which exposes part of the conductive circuit; and a corrosion resistant layer is formed on the front face of the conductive circuit, wherein

0000a corrosion resistant layer formation pad in which the corrosion resistant layer is formed and a corrosion resistant layer non-formation pad in which no corrosion resistant layer is formed coexist as said solder pad.

0012A multilayer printed wiring board in which interlayer connection is achieved through a via hole; at least two layers are overlaid with the via hole filled with a conductive layer; a solder resistant layer is formed on the front face; a plurality of solder pads is formed through a plurality of openings in the solder resist which expose part of the conductive circuit; and corrosion resistant layer is formed on the front face of the conductive circuit, wherein

0000the corrosion resistant layer formation pad in which corrosion resistant layer is formed and corrosion resistant layer non-formation pad in which no corrosion resistant layer is formed coexist as said solder pad.

0013The multilayer printed wiring board including a portion in which a corrosion resistant layer is formed and a portion in which no corrosion resistant layer is formed mixedly in its conductive layer exposed on the front face thereof can obtain reliability more easily than a conventional multilayer printed wiring board in which the corrosion resistant layer is formed on all conductive portions exposed on the front face. When an IC chip is installed or under heat cycle condition or under high temperature at high humidity, its board is elongated/contracted due to an influence of temperature. Because the surface of the board is under the same condition in the conventional multilayer printed wiring board in which the corrosion resistant layer is formed on all conductive portions exposed on the front face, stress generated by elongation/contraction is transmitted easily. Thus, the stress is difficult to buffer. However, in the multilayer printed wiring board having solder pads in which the corrosion resistant layer is formed partially, the generated stress is difficult to transmit. As a consequence, the stress is easy to buffer. For the reason, the multilayer printed wiring board of the present invention can obtain reliability more easily for a long term as compared to the conventional printed wiring board.

0014Because stress is buffered more as compared to the conventional printed wiring board in evaluating its electric connectivity and reliability upon drop test, the degree of deterioration decreases. As a result, reliability can be obtained more easily.

0015Because stress is buffered according to the present invention, warping is more difficult to generate in the multilayer printed wiring board, so that flatness of the surface of the board is obtained. Therefore, in a package board in which an IC chip is mounted as a bare chip, connectivity with the IC chip and connectivity with an external board are easy to obtain. Further, in a package board in which the IC chip and an electronic component such as a capacitor are mounted mixedly on the front face, connectivity between the IC chip and the electronic component can be obtained easily.

0016In a portion in which the corrosion resistant layer is formed, stiffness of the board is obtained more than a portion in which no corrosion resistant layer is formed. Because stiffness is obtained, fault of the printed wiring board like the warping of the board can be suppressed and when a component is mounted, contact failure or non-connection is difficult to generate between a conductive portion of the solder pad and an external terminal of any component. Because any mounting component is disposed on the corrosion resistant layer having stiffness, it is stabilized. Further, because an operation component such as a key pad makes contact with a land portion in which the corrosion resistant layer is formed, contact failure is difficult to occur despite repeated contacts.

0017Conversely, the portion in which no corrosion resistant layer is formed is more flexible than a portion in which the corrosion resistant layer is formed. Because of the flexibility, stress generated due to elongation/contraction is buffered and reliability against fault such as crack in the conductive circuit, the solder and insulation layer is easier to obtain than the conventional printed wiring board. Even if an impact is received from outside, a portion in which no corrosion resistant layer is formed can buffer that impact. Thus, any mounted component turn unlikely to receive the impact, so that faults such as drop of component become unlikely to occur.

0018On heating process at the time of manufacturing of the printed wiring board by hardening or reflow, the printed wiring board accompanies elongation/contraction due to heat (as an example, elongated as temperature rises and contracted when it returns from a high temperature to the normal temperature) and the portion in which no corrosion resistant layer is formed more unlikely undergoes a fault such as crack in a conductive circuit or the insulation layer as compared to the portion in which the corrosion resistant layer is formed. A fault such as crack in the solder layer is more difficult to occur. The reason is estimated to be that with elongation/contraction, the generated stress is buffered or the generated stress is more difficult to concentrate locally so that a fault such as crack is more difficult to occur. The same inclination was seen in the size (meaning vertical and horizontal sizes), thickness, quantity of layers, and material of a printed board.

0019The area of the portion in which the corrosion resistant layer is formed is desired to be larger than the portion in which no corrosion resistant layer is formed. The reason is that the stiffness of the board itself is easier to obtain if the area of the portion in which the corrosion resistant layer is formed is increased.

0020The corrosion resistant layer refers to a layer composed of one or more layers with one or more metals selected from gold, silver, platinum and the like or a layer composed of one or more layers each in which noble metals and other metals are combined. More specifically, nickel-gold, nickel-silver, nickel-platinum, gold (single layer), silver (single layer), nickel-palladium-gold, nickel-palladium-silver and the like can be mentioned.

0021The conductive circuit exposed from the solder pad portion may be a flat circuit, a circuit having a concavity, a circuit having a protrusion, a circuit having a roughened layer on its front face or the like.

0022In a condition in which such a printed wiring board is incorporated in a casing of a portable electronic appliance, a plurality of startup and driving components like semiconductor component such as MPU, capacitor and resistor, display devices such as a liquid crystal display and a digital display, an operation device such as a key pad, a switch and an external terminals such as USB, ear phone are mounted, thereby executing a role of the electronic appliance. These electronic appliances are intended to be carried with and it is supposed that it may be dropped on the ground.

0023The present invention can be applied to a printed wiring board in which interlayer connection is achieved through via holes, a board manufactured according to a subtractive method, a board manufactured according to an additive method and other various type printed wiring boards. Additionally, it is applicable to a board manufactured according to a conformal processing method.

0024The solder pad in this case includes not only a conductive circuit exposed from an opening in the solder-resist layer but also a dummy conductive layer not electrically connected, an alignment mark, a conductive layer formed to recognize a product and a terminal conductive layer for switch.

0025The solder pad in which the corrosion resistant layer is formed is desired to be an external terminal mainly. As a result, in the portion in which the corrosion resistant layer is formed, stiffness of the board is obtained more as compared to the portion in which no corrosion resistant layer is formed. Because stiffness is obtained, a fault of the printed wiring board such as warping of a board can be suppressed and if an external terminal is mounted, contact failure or non connection is unlikely to occur between a conductive portion of the solder pad and an external terminal of a component. Further, because the external terminal is disposed on a pad in which the corrosion resistant layer is formed, its installation is stabilized. In case of an operation component having a movable contact point which is an external terminal, like a key pad, its strength is intensified by the stiffness of that pad portion to allow repeated contact to the solder pad. Contact failure is difficult to be induced even if such an external terminal contacts repeatedly.

0026The solder pad in which no corrosion resistant layer is formed is desired to be an electronic component mounting terminal.

0027The solder pad portion in which no corrosion resistant layer is formed is more flexible than the portion in which the corrosion resistant layer is formed. When an impact is received from outside, the portion in which no corrosion resistant layer is formed can buffer that impact because it has flexibility. When an impact is received from outside due to the solder pad in which no corrosion resistant layer is formed is used at an electronic component mounting terminal, removal is difficult to occur between a conductive circuit exposed from the solder pad and an electronic component. Particularly, because the impact is buffered by the solder layer for joining them as well, crack is unlikely to occur in the solder layer so that removal is difficult to occur.

0028Because connectivity of the component is obtained as a result, electric connectivity or functionality as a product is not lowered and the reliability is no lower than the conventional printed wiring board. The electronic component for use at an electronic component mounting terminal includes an active component such as semiconductor and a passive component such as a capacitor, a resistor and an inductor.

0029The solder pad in which the corrosion resistant layer is formed is desired to be a connection pad to which the IC chip is to be connected as a bare chip mainly. Particularly, it is desired to be a wire-bonding pad or a connection solder pad for mounting the IC chip by flip chip bonding.

0030Because the connecting pad for the IC chip in which the corrosion resistant layer is formed is formed in a connecting region with the IC chip, stiffness of a board is obtained. Because stiffness is obtained, any fault of the printed wiring board such as warping of its board can be suppressed and even if any component is mounted, contact failure or no connection is unlikely to occur between the conductive portion of the solder pad and the external terminal of a component.

0031In wire bonding, formation of the corrosion resistant layer is desirable to add bonding resistance of the pad portion and metal junction. Further, because flatness of a bonding pad is held by the corrosion resistant layer, any fault is unlikely to occur at the time of bonding. Because flatness of the bonding pad is obtained, connectivity and reliability are obtained.

0032By forming the corrosion resistant layer upon installing the IC chip as a bare chip by flip chip bonding, the configuration and the quantity of solder bumps or metal bumps for IC chip connection formed on the pad are stabilized, thereby stabilizing connection at the time of reflow. Additionally, connectivity and reliability are obtained.

0033The solder pad in which no corrosion resistant layer is formed is desired to be an electronic component mounting terminal.

0034Conversely, the portion in which no corrosion resistant is formed is more flexible than the portion in which the corrosion resistant layer is formed. Because of the flexibility, stress generated due to elongation/contraction by heat is buffered and reliability against a fault such as crack in the conductive circuit or the insulation layer is kept for a longer term than the conventional printed wiring board. When an impact is received from outside, the portion in which no corrosion resistant layer is formed can buffer that impact. Thus, any mounted component becomes unlikely to receive the impact, so that a fault such as drop of component becomes unlikely to occur.

0035If a solder pad for IC chip connection and a solder pad for electronic component connection are formed on a same face of a package board, it is desirable that corrosion resistant layer is formed on the solder pad for IC chip connection while no corrosion resistant layer is formed on the solder pad for electronic component connection. As a result, if warping of a board is suppressed, an influence of the impact from outside can be buffered as compared with the conventional package board. Thus, connection with the IC chip or the electronic component mounted on the front face of the package board is obtained to protect connectivity and reliability from dropping.

0036An external terminal (for example, pin terminal as PGA or ball terminal as BGA) for connecting to an external board is disposed on the package board and in this case, it is desirable that no corrosion resistant layer is formed on the solder pad of that external connecting terminal. As a consequence, stress such as thermal stress generated when the external terminal is installed is buffered so that generation of a fault such as crack in the conductive material of solder for connection is suppressed, thereby obtaining connection between the connecting terminal and the board. Further, connectivity with the external board and reliability about that are easy to obtain.

0037The external terminals of the present invention may be disposed on a same plane as the IC chip to be mounted or on an opposite face side to the IC chip. In this case, it is permissible to dispose a region in which corrosion resistant layer is formed and a region in which no corrosion resistant layer is formed on the same plane or dispose the region in which the corrosion resistant layer is formed and the area in which no corrosion resistant layer is formed each on opposite side face. Depending on a case, it is permissible to dispose these regions mixedly.

0038It is desirable to provide an organic solderability preservative (OSP)(pre-flux) layer on a solder pad in which no corrosion resistant layer is formed. As a result, oxidation and the like of the conductive circuit and conductive layer is prevented until solder is installed. When solder is installed, the OSP layer is removed thereby not hampering electric connectivity. Other covering layer than the OSP layer may be applied. As an example of the OSP layer, it is permissible to use substances composed of mainly imidazole compound (for example, alkyl benz-imidazol, benz-imidazol). Metallic ion (for example, copper ion, silver ion, nickel) or organic acid may be contained. By dipping a printed wiring board whose solder pads are exposed in this solution kept between the normal temperature and heating temperature (for example, 80° C.), an organic film is applied on a copper circuit exposed from the solder pads. Solderability is obtained with this organic film. Other organic film may be used as long as it is formed on a conductor and can be removed by heating.

0039A manufacturing method of a multilayer printed wiring board in which a solder-resist layer covering the conductive circuit on the front face thereof is formed; a plurality of solder pads is formed through a plurality of openings in the solder resist which expose part of the conductive circuit; and a corrosion resistant layer is formed on the front face of the conductive circuit, comprising at least steps (a) to (e):

0000step (a) of forming a solder resist on the front face of printed wiring having a conductive circuit; <br /> step (b) of forming a solder pads by exposing/developing the solder resist or an opening with laser; <br /> step (c) of forming a mask layer for covering the solder pad on the solder resist layer in which the solder pads are formed; <br /> step (d) of forming a corrosion resistant layer on the solder pads in a non-formation portion of said mask layer; and <br /> step (e) of obtaining a plurality of solder pads including a corrosion resistant layer formation solder pads in which corrosion resistant layer is formed and corrosion resistant layer non-formation solder pads in which no corrosion resistant layer is formed mixedly by removing the mask resist layer.

0040According to the above-described manufacturing method, a multilayer printed wiring board in which a portion including the corrosion resistant layer and a portion including no corrosion resistant layer coexist in a conductive layer whose face is exposed can be manufactured. According to the printed wiring board obtained by the manufacturing method of the invention, its reliability is easier to obtain as compared with the conventional multilayer printed wiring board in which the corrosion resistant layer is formed on all the conductive portion exposed on the face.

0041Because stress is buffered, which is testified by evaluating the electric connectivity and reliability through a drop test, the degree of deterioration can be reduced. As a result, the reliability is hard to drop.

0042In the process (C), the solder pad to be covered with mask layer is desired to be an electronic component mounting pad or an external terminal connecting pad.

0043By covering with the mask layer, a corrosion resistant layer non-formation solder pad portion in which no corrosion resistant layer is formed can be formed. That corrosion resistant layer non-formation solder pad portion is more flexible than a portion in which the corrosion resistant layer is formed. When an impact is received from outside, the portion in which no corrosion resistant layer is formed can buffer that impact because it has flexibility. By using the solder pad in which no corrosion resistant layer is formed for an electronic component mounting terminal, an electronic component is protected from dropping from a conductive circuit exposed from the solder pad when an impact is received from outside.

0044Particularly, because the impact is buffered by the solder layer for joining those, a crack in the solder layer is hard to occur so that the electronic component or the external terminal is protected from dropping.

0045As a consequence, connectivity with a component or external terminal is obtained, thus, electric connectivity and functionality as a product are obtained and reliability is easy obtained.

0046The mask layer can cover the solder pad in which no corrosion resistant layer is formed, through exposure/development or drilling by laser. That is, a portion in which the mask layer is to be formed and a portion in which the mask layer is not to be formed are formed on the front face of a board covered with the solder resist layer and a plating film is applied to the mask layer non-formation portion. The mask layer is formed by coating with resin whose viscosity is adjusted preliminarily or bonding dry film. The mask layer is formed in a region in which no corrosion resistant layer is formed and no corrosion resistant layer is formed on a solder pad located under the mask layer. An opening is made in the mask layer by exposure/development or by laser in other solder pad region.

0047As a consequence, the mask layer non-formation portion is formed on the solder resist layer and corrosion resistant layer is formed on the solder pad in the non-formation area. As a consequence, the portion in which the corrosion resistant layer is formed and the portion in which no corrosion resistant layer is formed can be formed on the solder pad.

0048After the process (e), it is permissible to form the OSP layer on the solder pad in which no corrosion resistant layer is formed.

0049It is desirable to provide organic solderability preservative (OSP) (pre-flux) layer on the solder pad in which no corrosion resistant layer is formed. As a consequence, oxidation and the like of the conductive circuit and the conductive layer is inhibited until the solder is installed. Then, when the solder is installed, the OSP layer is removed not to hamper electric connectivity.

0050The above-described manufacturing method enables the multilayer printed wiring board for package board to be manufactured. As an example, the corrosion resistant layer is formed on a solder pad for mounting a bare chip for the IC chip and the corrosion resistant layer is not formed on a solder pad for an electronic component such as a capacitor. These portions may be provided on a same face.

0051Thus, the mask layer is applied to the solder pad for electronic component mainly. As a consequence, no corrosion resistant layer is formed on that given solder pad.

0052Each of the following processes will be described in detail. Process (a) for forming solder resist on the front layer of a printed wiring board having a conductive circuit and process (b) for forming solder pad by exposing/developing on the solder resist or drilling by laser will be described. The solder resist layer is formed on a printed wiring board in which a dummy conductive layer not connected electrically with a land containing a conductive circuit or a conductive layer for recognizing an alignment mark, product is formed on a single face or both faces. If it is needed, blackening or roughening may be executed on the conductive circuit and the conductive layer. The printed wiring board mentioned here refers to a printed wiring board in which interlayer connection is achieved through via holes, a board manufactured according to the subtractive method, a board manufactured according to the additive method and other various type printed wiring boards.

0053Solder resist is formed by applying resin whose viscosity is adjusted preliminary or bonding dry-film-like film or pressing that film by heat. The thickness of the formed solder resist is 10-50 μm and the thickness of the solder resist after completely hardened is 5-50 μm. As the solder resist, heat hardening resin, thermoplastic resin, photopolymerizing polymer, resin produced by converting part of heat hardening resin to (meta) acrylic and compound of these resins are used and of them, it is desirable to use epoxy resin, polyimide resin, phenol resin, polyolefin resin, phenoxy resin and the like. If it is needed, formed solder resist layer may be dried at 80 to 100° C. As a consequence, the solder resist layer is turned to semi-hardened (B stage) state.

0054After that, with a mask on which solder pads are drawn placed on the solder resist layer, ultraviolet ray or the like is irradiated and openings of the solder pads are made in the solder resist layer by development with chemical such as alkali solution. Alternatively, the openings of the solder pads are made in the solder resist layer by laser.

0055As laser in use for drilling the openings at this time, carbon dioxide gas laser, excimer laser, YAG laser and the like may be used. To provide the solder pads with the openings by carbon dioxide gas laser, it is desirable that its pulse energy is 0.5 to 100 mJ, the pulse width is 1 to 100 μs, the pulse interval is 0.5 ms or more and the frequency is 1000 to 6000 Hz. Further, the via hole may be formed by abrasion. After the openings are made with laser beam, it is permissible to carry out a desmear treatment by physical treatment such as chemical treatment with acid or oxidizing agent, plasma treatment, corona treatment with oxygen, nitrogen or the like.

0056After that, by hardening at 100 to 200° C. for at least 30 minutes, the solder resist layer is hardened completely. The solder pad of this case includes not only a conductive circuit but also a dummy conductive layer not connected electrically, an alignment mark and a conductive layer formed for recognizing a product.

0057As a result, a printed wiring board having solder resist with openings for the solder pads on the conductive circuit and conductive layer can be obtained.

0058(c) The process for forming the mask layer for covering the solder pads on the solder resist layer on which the solder pads are formed will be described. The mask layer is formed on a printed wiring board in which the solder pads are formed in the solder resist layer.

0059The mask layer is formed by applying resin whose viscosity is adjusted preliminarily or bonding dry-film like film or pressing that film by heat. The thickness of the mask layer is 5 to 30 μm. As the mask, heat hardening resin, thermoplastic resin, photopolymerizing polymer, resin produced by converting part of heat hardening resin to (meta) acrylic and compound of these resins are used, and of them, it is desirable to use epoxy resin, polyimide resin, phenol resin, polyolefin resin, phenoxy resin and the like. If it is needed, formed mask layer may be dried at 80 to 100° C. As a consequence, the mask layer may be turned to semi-hardened (B stage) state. A film processed in this B-stage may be bonded. Depending on the case, this may be done by exposure to draw directly.

0060After that, with a mask on which a non-formation region of the solder pads is drawn placed on the mask layer, ultraviolet ray is irradiated and openings of the non-formation region of the corrosion resistant layer are made by development with chemical such as alkali solution or by irradiation with laser beam. As a result, a mask non-formation portion and a mask formation portion are formed.

0061As laser in use for providing the mask layer with openings at this time, carbon dioxide gas laser, excimer laser, YAG laser and the like may be used. To provide the mask layer with the openings using carbon dioxide gas laser, it is desirable that its pulse energy is 0.5 to 100 ml, the pulse width is 1 to 100 μs, the pulse interval is 0.5 ms or more and the frequency is 1000 to 6000 Hz. Further, the via hole may be formed by abrasion. After the openings are made with laser beam, it is permissible to carry out desmear treatment by physical treatment such as chemical treatment with acid or oxidizing agent, plasma treatment, corona treatment with oxygen, nitrogen or the like. The corrosion resistant layer is formed on the solder pad in the mask layer non-formation region.

0062(d) The process of forming the corrosion resistant layer on the solder pad in the mask layer non-formation portion and process (e) of obtaining a plurality of solder pads including solder pads in which the corrosion resistant layer is formed and solder pads in which no corrosion resistant layer is formed mixedly by peeling the mask resist layer will be described.

0063The corrosion resistant layer is formed in the mask layer non-formation portion of the solder resist layer. In this case, the corrosion resistant layer refers to a layer composed of one or more layers with one or more metals selected from gold, silver, platinum, and noble metal. More specifically, nickel-gold, nickel-silver, nickel-platinum, gold (single layer), silver (single layer), nickel-palladium-gold, nickel-palladium-silver and the like can be mentioned.

0064These corrosion resistant layers may be formed by plating (electrolytic plating, electroless plating, displacement plating.) Alternatively, it may be formed by vapor deposition like sputtering. The corrosion resistant layer may be formed of a single layer or two or more layers.

0065Consequently, the corrosion resistant layer is formed on the solder pad corresponding to the mask layer non-formation portion. After that, a printed wiring board including the corrosion resistant layer formation solder pads in which the corrosion resistant layer is formed and the corrosion resistant layer non-formation solder pads in which no corrosion resistant layer is formed mixedly can be obtained by peeling the mask layer with alikali solution and likes.

0066It is desirable to provide an organic solderability preservative (OSP) (pre-flux) layer on the solder pad in which no corrosion resistant layer is formed by printing or spraying and likes. As a consequence, oxidation of the conductive circuit and the conductive layer can be inhibited until the solder is installed. Then, when the solder is installed, the OSP layer is removed not to hamper electric connectivity.

0067After that, by disposing solders of Sn—Pb, Sn—Ag—Cu or the like on each pad by printing, a printed wiring board in which solder layer is formed in the form of pads, constituted of conductive circuits (including lands) is obtained. Electronic components such as MPU, capacitor and resistor, display devices such as the liquid crystal display and the digital display, the operation device such as the key pad, the switch and the external terminals of USB, the ear phone and other external terminal are mounted on this board.

0068More desirably, the solder pad in which no corrosion resistant layer is formed is used as an electronic component mounting terminal and the solder pad in which the corrosion resistant layer is formed is used for an external terminal.

0069With this structure, reliability is more unlikely to drop as compared to a conventional multilayer printed wiring board in which the corrosion resistant layer is formed on all conductive portions exposed on the front face.

0070Particularly, as evident from evaluation of electric connectivity and reliability upon drop test, the degree of deterioration can be reduced as compared to the conventional printed wiring board and as a consequence, reliability for a long term is easy to maintain thereby the reliability is unlikely to drop.

0071Hereinafter an example of the manufacturing method of the multilayer printed wiring board of the present invention will be described with reference to the accompanying drawings.

0072(1) For manufacturing the multilayer printed wiring board of the present invention, as a circuit board serving as a basic unit constituting it, an insulation base material <b>30</b> whose one face or both faces are equipped with copper foil <b>32</b> is used as its starting material (<figref idref="DRAWINGS">FIG. 1(A)</figref>).

0073Although as this insulation base material for example, hard lamination base material selected from glass fabric epoxy resin base material, glass fabric bismaleimide triazine base material, glass fabric polyphenylene ether resin base material, aramide nonwoven fabric-epoxy resin base material, aramide unwoven-polyimde resin base material may be used, the glass fabric epoxy resin base material is the most desirable.

0074Preferably the thickness of the insulation base material is 20-600 μm. The reason is that if the thickness is less than 20 μm, its strength drops so that it is difficult to handle and at the same time, reliability to the electric insulation property drops, so that formation of the via hole may be difficult. Conversely, if the thickness is over 600 μm, formation of a fine via hole or depending on a case, filling with conductive paste is difficult and at the same time, the board itself turns thick.

0075Preferably, the thickness of the copper foil is 5-18 μm. To form the via holes in a circuit board with laser beam, a direct laser method of making the via hole in the copper foil and the insulation base material at the same time and the conformal method of removing a portion corresponding to the via hole in the copper foil by etching are available and any one may be used.

0076If the thickness of the copper foil is less than 5 μm, an end face of the via hole in the copper foil can be deformed when an opening for formation of the via hole is formed in the insulation base material by using a laser processing described later, so that a conductive circuit is difficult to form. If the thickness of the copper foil is over 18 μm, a conductive circuit pattern of fine lines is difficult to form by etching.

0077The copper foil <b>32</b> may be adjusted in thickness by half etching (<figref idref="DRAWINGS">FIG. 1(B)</figref>). In this case, as the copper foil <b>32</b>, the one having a thickness larger than the above mentioned value (5 to 18 μm) is used. After half etching, the thickness of the copper foil is adjusted to 5 to 18 μm. In case of double sided copper clad lamination, the thicknesses of both faces are permitted to be different if the thicknesses of the copper foil are in the above-mentioned range. As a consequence, the strength can be intensified thereby executing following steps smoothly.

0078If the conductive circuit is formed on a single face by etching, it is easy to form.

0079As the insulation base material and the copper foil, preferably, a single sided or double sided copper clad lamination obtained by overlaying prepreg as B-stage produced by impregnating glass fabric with epoxy resin and copper foil and pressing them with heat is used. The reason is that the position of wiring pattern or via hole is not deflected during handling after the copper foil is etched and its positional accuracy is excellent.

0080(2) Next, an opening <b>34</b> is formed so that it reaches from the front face of the insulation base material <b>30</b> to the copper foil (or conductive circuit pattern) <b>32</b> on the rear face by irradiating the front face of the insulation base material <b>30</b> with the copper foil <b>32</b> with carbon dioxide gas laser (<figref idref="DRAWINGS">FIG. 1(C)</figref>.

0081This laser processing is carried out with a pulse oscillation type carbon dioxide gas laser processing unit and preferably, its processing condition is that pulse energy is 0.5 to 100 mJ, pulse width is 1 to 100 μs, pulse interval is 0.5 ms or more and the quantity of shots is in a range of 1 to 50.

0082The diameter of a via formation opening <b>34</b> which can be formed under such condition is preferred to be 50 to 250 μm.

0083(3) A desmear treatment is carried out to remove residual resin left on a side face and bottom of an opening formed in the step (2).

0084This desmear treatment is carried out according to wet processing such as chemical treatment with acid or oxidizing agent (for example, chromic acid, permanganic acid), or dry processing such as an oxide-plasma discharge treatment, a corona discharge treatment, an ultraviolet laser treatment and an excimer laser treatment. Such a desmear treatment is selected corresponding to the quantity of smear estimated to be left depending on the type and thickness of insulation base material, the diameter of opening for the via hole, laser condition and the like.

0085(4) Electrolytic copper plating treatment, the copper foil <b>32</b> as lead plating, is carried out to the copper foil face of a board undergoing the desmear treatment to fill the openings with electrolytic copper plating <b>36</b> thereby producing via holes <b>46</b> filled like a field. (<figref idref="DRAWINGS">FIG. 1(D)</figref>)

0086Depending on a case, electrolytic copper plating swollen on the top of the via hole opening on the board may be flattened by removing by belt sander polishing, buffing, etching or the like after the electrolytic copper plating treatment is finished.

0087Further, electrolytic plating may be formed through electroless plating. In this case, as electroless plating film, copper, nickel, silver or the like may be used.

0088(5) A resist layer <b>38</b> is formed on the electrolytic copper plating <b>36</b> (<figref idref="DRAWINGS">FIG. 2(A)</figref>). This resist layer may be formed by coating or bonding film-like material. An etching resist layer is formed by exposure/development with a mask on which a circuit is drawn preliminary placed on this resist film and a metallic layer of an etching resist non-formation portion is etched to form conductive circuit patterns <b>44</b> and <b>42</b> including the conductive circuit and the land (<figref idref="DRAWINGS">FIG. 2(B)</figref>).

0089As this etching solution, preferably, at least an aqueous solution selected from sulfuric acid—hydrogen peroxide, persulfate, copper (II) chloride and ferric (II) chloride is used. As pre-treatment for forming a conductive circuit by etching the copper foil, the thickness of the copper foil may be adjusted by etching the entire surface thereof to facilitate formation of a fine pattern. Although the inside diameter of the land as part of the conductive circuit is substantially the same as the diameter of the via hole, preferably, the outside diameter is in a range of 50 to 250 μm.

0090The single sided circuit board <b>30</b> manufactured through the steps (1) to (5) is a unit of circuit board having the copper foil as a conductive layer on one surface of the insulation base material and filled via holes in openings reaching from the other face to the copper foil. A multilayer circuit board is formed by overlaying a plurality of the circuit boards. Upon this overlaying, the multilayer circuit board may be formed by pressing all overlaid circuit boards collectively with heat. Alternatively, the multilayer circuit board may be formed by overlaying at least one circuit board successively into a multilayer structure. As the circuit board, the double sided circuit board may be used or the single sided circuit board may be used or both of them may be used mixedly.

0091(6) A plurality of the circuit boards is overlaid (<figref idref="DRAWINGS">FIG. 3(A)</figref>) and pressed with heat under a condition that heating temperature is 150 to 250° C. and pressure is 1 to 10 MPa to integrate into a multilayer structure (<figref idref="DRAWINGS">FIG. 3(B)</figref>). Preferably, this hot press is carried out under a reduced pressure. As a consequence, adhesion of the boards is obtained.

0092Further by etching the copper foil of a single sided circuit board of the topmost layer of the circuit boards integrated in the (6) and the copper foil of a single sided circuit board on the outermost side, conductive circuits (including via holes land) may be formed. In this etching process, after photosensitive dry film resist is bonded to the surface of the overlaid and pressed copper foil, the conductive circuits including the via hole land are formed by forming etching resist through exposure and development according to a predetermined circuit pattern and then etching the metallic layer of an etching resist non-formation portion.

0093(7) Next, a solder resist layer <b>90</b> is formed each on the surface of a circuit board on the outermost side (<figref idref="DRAWINGS">FIG. 4(A)</figref>). In this case, solder resist compound is applied to the entire outside surface of the circuit board and its coating film is dried. Then, this film is exposed to light and developed with a photo mask film on which openings for the solder pads are drawn placed on this coating film, so that conductive pad portions located just above the via holes of the conductive circuit are exposed outside to form a solder pad openings <b>90</b><i>a. </i>In this case, the openings may be formed by bonding a dry-film like solder resist layer and exposing/developing or using laser.

0094(8) A mask layer <b>50</b><i>a </i>is formed by coating or bonding a film on a board in which solder pads are opened in the solder resist layer <b>90</b>. Then, a non-formation portion of the mask layer <b>50</b> is formed by exposure and development with an exposure mask <b>50</b> on which a formation portion <b>52</b><i>a </i>of the mask layer is drawn placed on the mask layer <b>50</b><i>a </i>(<figref idref="DRAWINGS">FIG. 4(C)</figref>). As a consequence, the solder pads <b>60</b>B formed on the solder resist layer <b>60</b> are covered with the mask layer <b>50</b>.

0095The corrosion resistant layer is formed nickel <b>54</b>-gold <b>56</b> on the solder pads <b>60</b>A exposed from the non-formation portion of the mask layer <b>20</b> (<figref idref="DRAWINGS">FIG. 5(A)</figref> and (B<b>1</b>)). At this time, the thickness of the nickel layer <b>54</b> is desired to be 1 to 7 μm and the thickness of the gold layer <b>56</b> is desired to be 0.01 to 0.1 μm. Additionally, it is permissible to form the corrosion resistant layer of nickel-palladium-gold, gold (single layer), silver (single layer) or the like.

0096After the corrosion resistant layer is formed, the mask layer <b>50</b> is broken away. As a consequence, the corrosion resistant layer formation solder pads <b>60</b>A in which the corrosion resistant layer is formed and the corrosion resistant layer non-formation solder pads <b>60</b>B in which no corrosion resistant layer is formed come to exist on the printed wiring board (<figref idref="DRAWINGS">FIG. 5(C)</figref>).

0097In case of a portable electronic appliance, the solder pads exposed from the solder resist layer, the portion in which the corrosion resistant layer is formed is used for mainly an external terminal and the corrosion resistant layer non-formation portion is used for mainly an electronic component mounting terminal.

0098In case of a package board, the solder pads exposed from the solder resist layer, the portion in which the corrosion resistant layer is formed is used for mainly the terminal of an IC chip mounted as a bare chip and the corrosion resistant layer non-formation portion is used for mainly the electronic componet mounting terminal or as the pad for the external terminal.

0099(9) By supplying a solder body to the solder pad portions exposed just above the via hole from an opening in the solder resist obtained in the (8), solder bumps <b>96</b>U, <b>96</b>D are formed by melting/solidification of this solder body (<figref idref="DRAWINGS">FIG. 6</figref>). Alternatively, by connecting a conductive ball or a conductive pin to the pad portion with a conductive adhesive agent or a solder layer, the multilayer circuit board is formed. Additionally, a capacitor, resistor or the like may be mounted on the formed solder layer. Further, an external terminal such as a key pad may be mounted on the solder layer.

0100As a supply method for the solder body and the solder layer, a solder transfer method or a print method may be used.

0101According to the solder transfer method, a solder foil is bonded to prepreg and this solder foil is etched leaving only portions corresponding to the opening portions to form a solder pattern as the solder carrier film. After flux is applied to the solder resist opening portion of the board, this solder carrier film is overlaid so that the solder pattern makes contact with the pads and transferred by heating.

0102On the other hand, according to the print method, a print mask (metal mask) provided with openings at portions corresponding to the pads is placed on a board and solder paste is printed and treated with heat. As solder for forming such a solder bump, Sn/Ag solder, Sn/In solder, Sn/Zn solder, Sn/Bi solder and the like may be used.

0103Consequently, a printed wiring board for a portable electronic appliance is obtained.

0104If a bare chip is mounted for the package board by flip chip bonding, the external terminals are disposed on a same plane as the IC chip or on a face on an opposite side to the IC chip.

0105If the IC chip, an electronic component and external terminals are provided on the package board by solder, the melting point of solder to be connected to the IC chip is desired to be equal to or lower than the melting point of the solder to be connected to the external terminal. As a consequence, connectivity between a connection terminal and board is obtained easily.

0106If the bare chip is mounted for the package board by wire bonding, the external terminals are disposed on a same plane as the IC chip or on a face on an opposite side to the IC chip.

0107In addition to the manufacturing method described above, the subtractive method, a semi additive method, a full additive method or a combination of these two or more methods can be applied for manufacturing the board. Although a board having the via holes (non through hole) is represented in the drawings, a board whose interlayer connection is achieved by through holes which go through all layers of the board may be used.

BRIEF DESCRIPTION OF THE DRAWINGS

0108<figref idref="DRAWINGS">FIG. 1</figref> is a process diagram showing a manufacturing method of a multilayer printed wiring board according to an example 1 of the present invention;

0109<figref idref="DRAWINGS">FIG. 2</figref> is a process diagram showing the manufacturing method of the multilayer printed wiring board according to the example 1;

0110<figref idref="DRAWINGS">FIG. 3</figref> is a process diagram showing the manufacturing method of the multilayer printed wiring board according to the example 1;

0111<figref idref="DRAWINGS">FIG. 4</figref> is a process diagram showing the manufacturing method of the multilayer printed wiring board according to the example 1;

0112<figref idref="DRAWINGS">FIG. 5</figref> is a process diagram showing the manufacturing method of the multilayer printed wiring board according to the example 1;

0113<figref idref="DRAWINGS">FIG. 6</figref> is a sectional view of the multilayer printed wiring board according to the example 1;

0114<figref idref="DRAWINGS">FIG. 7</figref> is a sectional view of the multilayer printed wiring board of <figref idref="DRAWINGS">FIG. 6</figref> indicating a condition in which components are mounted;

0115<figref idref="DRAWINGS">FIG. 8</figref> is a plan view showing a manufacturing method of the multilayer printed wiring board according to the example 1;

0116<figref idref="DRAWINGS">FIG. 9</figref> is a plan view of the printed wiring board applied to a portable telephone of the example 1;

0117<figref idref="DRAWINGS">FIG. 10</figref> is a table showing an evaluation result of the example 1 and a comparative example 1;

0118<figref idref="DRAWINGS">FIG. 11(A)</figref> is a perspective view of a package board according to example 2-1-1 before an IC chip is mounted, <figref idref="DRAWINGS">FIG. 11(B)</figref> is a sectional view taken along the line B-B of <figref idref="DRAWINGS">FIG. 11(A)</figref>, <figref idref="DRAWINGS">FIG. 11(C)</figref> is a perspective view of a package board after the IC chip is mounted and <figref idref="DRAWINGS">FIG. 11(D)</figref> is a sectional view taken along the line D-D of <figref idref="DRAWINGS">FIG. 11(C)</figref>;

0119FIG. <b>12</b>(A<b>1</b>) is a plan view of a package board according to example 2-1-1 before an IC chip is mounted, FIG. <b>12</b>(B<b>1</b>) is a rear view thereof, FIG. <b>12</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted and FIG. <b>12</b>(B<b>2</b>) is a rear view thereof;

0120FIG. <b>13</b>(A<b>1</b>) is a plan view of the package board according to example 2-2-1 before the IC chip is mounted, FIG. <b>13</b>(B<b>1</b>) is a rear view thereof, FIG. <b>13</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted, and FIG. <b>13</b>(B<b>2</b>) is a rear view thereof;

0121FIG. <b>14</b>(A<b>1</b>) is a plan view of a package board according to example 2-3-1 before an IC chip is mounted, FIG. <b>14</b>(B<b>1</b>) is a rear view thereof, FIG. <b>14</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted and FIG. <b>14</b>(B<b>2</b>) is a rear view thereof;

0122FIG. <b>15</b>(A<b>1</b>) is a plan view of a package board according to example 2-4-1 before an IC chip is mounted, FIG. <b>15</b>(B<b>1</b>) is a rear view thereof, FIG. <b>15</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted and FIG. <b>15</b>(B<b>2</b>) is a rear view thereof;

0123FIG. <b>16</b>(A<b>1</b>) is a plan view of a package board according to example 2-5-1 before an IC chip is mounted, FIG. <b>16</b>(B<b>1</b>) is a rear view thereof, FIG. <b>16</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted and FIG. <b>16</b>(B<b>2</b>) is a rear view thereof;

0124FIG. <b>17</b>(A<b>1</b>) is a plan view of a package board according to example 2-6-1 before an IC chip is mounted, FIG. <b>17</b>(B<b>1</b>) is a rear view thereof, FIG. <b>17</b>(A<b>2</b>) is a plan view of the package board after the IC chip is mounted and FIG. <b>17</b>(B<b>2</b>) is a rear view thereof; and

0125<figref idref="DRAWINGS">FIG. 18</figref> is a table showing an evaluation result of the example 2 and comparative example 2.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

First Embodiment

Example 1-1

0126(1) First, a double sided circuit board intended to constitute a multilayer circuit board is manufactured. This circuit board utilizes a double sided copper-clad lamination obtained by overlaying prepreg <b>30</b> as B-stage created by impregnating glass fabric with expoxy resin and copper foil <b>32</b> and pressing with heat as a starting material (<figref idref="DRAWINGS">FIG. 1(A)</figref>).

0127The thickness of this insulation base material was 75 μm and the thickness of the copper foil was 12 μm. It is permissible to use a copper foil thicker than 12 μm as this layered board and then adjust the thickness of the copper foil to 12 μm by etching treatment (<figref idref="DRAWINGS">FIG. 1(B)</figref>).

0128(2) The copper foil <b>32</b> and the insulation base material <b>30</b> were drilled by irradiating the double sided circuit board having the copper foil <b>32</b> with carbon dioxide gas laser and a via hole formation opening <b>34</b> reaching the copper foil <b>32</b> on an opposite side was formed (<figref idref="DRAWINGS">FIG. 1(C)</figref>). Further, the desmear treatment was performed within the opening by chemical treatment with permanganic acid.

0129To form the opening for via hole formation in this example, HITACHI VIA ENGINEERING LTD. manufactured high peak short pulse oscillation type carbon dioxide gas laser processor machine was used. Then, openings <b>34</b> with 80 μm in diameter for via hole formation were formed in glass fabric epoxy resin base material whose base material was 75 μm thick at a speed of 100 holes/second by irradiating directory to the copper foil with laser beam.

0130(3) Electrolytic copper plating treatment with copper foil as plating lead was carried out under a following condition on the copper foil face after the via holes were drilled in the insulation base material subjected to the desmear treatment. <ul id="ul0001" list-style="none"><li id="ul0001-0001" num="0131">[Electrolytic plating solution]</li><li id="ul0001-0002" num="0132">Sulfuric acid: 2.24 mol/l</li><li id="ul0001-0003" num="0133">Copper sulfate: 0.26 mol/l</li><li id="ul0001-0004" num="0134">Additive A (reaction accelerator): 10.0 ml/l</li><li id="ul0001-0005" num="0135">Additive B (reaction inhibitor): 10.0 ml/l</li><li id="ul0001-0006" num="0136">[Electrolytic plating condition]</li><li id="ul0001-0007" num="0137">Current density: 1 A/dm²</li><li id="ul0001-0008" num="0138">Time: 65 minutes</li><li id="ul0001-0009" num="0139">Temperature: 22±2° C.</li></ul>

0140Formation of electrolytic copper plating film within the via hole was accelerated by the additive A and conversely, the additive B adheres to mainly the copper foil portion so as to inhibit formation of the plating film. When the via hole is filled with the electrolytic copper plating so that the height thereof turns substantially equal to the height of the copper foil, the additive B adheres thereby inhibiting the formation of the plating film like the copper foil portion. As a consequence, the opening <b>34</b> was filled with an electrolytic copper plating <b>36</b> so as to form a via hole <b>46</b> in which its via hole portion and the copper foil were flattened to the same level (<figref idref="DRAWINGS">FIG. 1(D)</figref>).

0141The thickness may be adjusted by etching the conductive layer comprising the copper foil and the electrolytic plating film. Depending on a case, it is permissible to adjust the thickness of the conductive layer according to the physical method of sander belt polishing and buffing.

0142(4) Photosensitive dry film etching resist <b>38</b> was formed on the copper foil <b>32</b> and the copper plating <b>36</b> as the insulation base material passing the aforementioned process (3) (<figref idref="DRAWINGS">FIG. 2(A)</figref>). The resist <b>38</b> was formed in the thickness of 15 to 20 μm and resist non-formation portion was formed on the copper foil through the process of the conductive circuit, the land of the via hole and exposure/development. Then, the copper plating film and the copper foil corresponding to the non-formation portion are removed by etching the resist non-formation portion with etching solution composed of hydrogen peroxide solution/sulfuric acid.

0143(5) After that, the resist <b>38</b> is broken away with alkali solution so as to form conductive circuits <b>42</b> and <b>44</b> and a via hole <b>46</b> (<figref idref="DRAWINGS">FIG. 2(B)</figref>). As a consequence, a circuit board in which the via hole <b>46</b> for connecting the front and rear faces exists and that via hole and the copper foil portion serving as a conductive circuit are flattened to the same level is obtained. After that, it is permissible to provide a blackened layer <b>44</b>B on the conductive circuits <b>42</b> and <b>44</b> by blackening (<figref idref="DRAWINGS">FIG. 2(C)</figref>).

0144With the circuit board <b>30</b> obtained through the processes (1) to (5) as a unit (FIG. <b>3</b>(A)), the boards <b>30</b> were overlaid with an adhesive material layer <b>48</b> like prepreg sandwiched therebetween and pressed with heat under a condition in which the temperature was 80 to 250° C. and the pressure was 1.0 to 5.0 kgf/cm²so as to form the multilayer wiring board <b>10</b> (<figref idref="DRAWINGS">FIG. 3(B)</figref>).

0145(10) The solder resist layer was formed on the surface of the circuit board located at the topmost layer and bottommost layer of the multilayer board <b>10</b>. The solder resist layer was formed in the thickness of 20 to 30 μm by bonding a film solder resist layer or applying varnish whose viscosity was adjusted preliminarily.

0146Next, drying treatment was carried out at 70° C. for 20 minutes and 100° C. for 30 minutes and then, by using soda lime glass board of 5 mm in thick on which a circular pattern (mask pattern) was drawn with a chrome layer for a solder resist opening with a side on which the chrome layer was formed fitted to the solder resist layer, ultraviolet ray of 1000 mJ/cm²was irradiated and then DMTG development was executed. Further, this multilayer board <b>10</b> was heat treated at 120° C. for an hour and 150° C. for three hours so as to form the solder resist layer of 20 μm in thick having an opening <b>90</b><i>a </i>corresponding to a pad portion (diameter of the opening: 200 μm) (<figref idref="DRAWINGS">FIG. 4(A)</figref>). <figref idref="DRAWINGS">FIG. 8(A)</figref> shows a plan view of this multilayer printed wiring board <b>10</b>. <figref idref="DRAWINGS">FIG. 4(A)</figref> corresponds to a section taken along the line a-a in <figref idref="DRAWINGS">FIG. 8(A)</figref>.

0147Before the solder resist layer is formed, a roughened layer is provided on the surface of a circuit board located at the topmost layer and, if it is needed, the bottommost layer of the multilayer board.

0148(11) A dry film like mask layer is formed of photosensitive resin on the solder resist layer. The mask layer was formed in the thickness of 10 to 20 μm on the solder resist layer by bonding a film-like mask layer or applying varnish whose viscosity was adjusted preliminarily.

0149Next, drying treatment was carried out at 80° C. for 30 minutes and with a soda lime glass board <b>52</b> of 5 mm in thick on which a mask layer non-formation pattern (mask pattern) <b>52</b><i>a </i>was drawn fitted to the mask layer <b>50</b><i>a, </i>ultraviolet ray of 800 mJ/cm²was irradiated (<figref idref="DRAWINGS">FIG. 4(B)</figref>) and DMTG development was carried out. Further, this multilayer board was heat treated at 120° C. for an hour so as to form a mask layer formation portion whose solder pad <b>60</b>B is covered in a region in which no corrosion resistant layer is formed, and a mask layer <b>50</b> (15 μm in thick) composed of a mask layer non-formation portion whose solder pad <b>60</b>A is exposed in a region in which corrosion resistant layer is formed. <figref idref="DRAWINGS">FIG. 8(B)</figref> shows a plan view of this multilayer printed wiring board <b>10</b>. A section taken along the line b-b in <figref idref="DRAWINGS">FIG. 8(B)</figref> corresponds to <figref idref="DRAWINGS">FIG. 4(C)</figref>.

0150(12) Next, after the solder resist layer is formed, the board was dipped in electroless nickel plating solution having pH=5 composed of nickel sulfate of 6.0 g/l and sodium hypophosphite of 25 g/l for 40 minutes so as to form a nickel plating layer <b>54</b> of 4 μm in thick in the opening <b>90</b><i>a </i>(solder pad <b>60</b>A) (<figref idref="DRAWINGS">FIG. 5(A)</figref>).

0151Further, the board was dipped in electroless gold plating solution composed of potassium gold cyanide of 1.5 g/l and citric acid of 80 g/l for 600 seconds so as to form a gold plating layer 56 of 0.05 μm in thick on the nickel plating layer <b>54</b> so that a corrosion resistant metallic layer was formed of the nickel plating layer <b>54</b> and the gold plating layer <b>56</b> (<figref idref="DRAWINGS">FIG. 5(B)</figref>). <figref idref="DRAWINGS">FIG. 8(C)</figref> shows a plan view of this multilayer printed wiring board <b>10</b>. A section taken along the line c-c in <figref idref="DRAWINGS">FIG. 8(C)</figref> corresponds to <figref idref="DRAWINGS">FIG. 5(B)</figref>.

0152As a consequence, the corrosion resistant layer was formed composed of nickel <b>54</b>-gold <b>56</b> in the solder pad <b>60</b>A corresponding to the non-formation portion of the mask layer <b>50</b>. After that, by peeling the mask layer <b>50</b> with alkali solution and the like, a multilayer printed wiring board <b>10</b>, in which the corrosion resistant layer formation solder pad <b>60</b>A including a corrosion resistant layer and the corrosion resistant non-formation solder pad <b>60</b>B including no corrosion resistant layer coexist, was obtained. An OPS layer <b>58</b> was formed in the corrosion resistant non-formation solder pad <b>60</b>B (<figref idref="DRAWINGS">FIG. 5(C)</figref>). <figref idref="DRAWINGS">FIG. 8(D)</figref> shows a plan view of this multilayer printed wiring board <b>10</b>. A section taken along the line d-d in <figref idref="DRAWINGS">FIG. 8(D)</figref> corresponds to <figref idref="DRAWINGS">FIG. 5(C)</figref>.

0153(13) Then, solder paste composed of Sn/Pb solder whose melting point T2 was about 183° C. was printed to the solder pads <b>60</b>A and <b>60</b>B exposed through an opening in the solder resist layer covering the multilayer circuit board on the topmost layer and reflowed at 183° C., so as to form solder layers <b>96</b>U and <b>96</b>D (<figref idref="DRAWINGS">FIG. 6</figref>).

0154An electronic component <b>82</b>B, mainly a capacitor and a resistor is mounted on the solder layers <b>96</b>U and <b>96</b>D on the corrosion resistant non-formation solder pad <b>60</b>B in which no corrosion resistant layer is formed and an external terminal <b>92</b>A, mainly, a key pad is mounted in a region in which the solder layers <b>96</b>U and <b>96</b>D are formed on the corrosion resistant formation solder pad <b>60</b>A (<figref idref="DRAWINGS">FIG. 7</figref>).

0155<figref idref="DRAWINGS">FIG. 9</figref> is a plan view of a multilayer printed wiring board for a portable telephone manufactured according to the manufacturing method of the example 1.

0156The solder pad <b>60</b>B on which a component is to be mounted via solder and the land <b>60</b>A, which corrosion resistant layer is formed of nickel layer-gold layer, constituting the terminal of a key pad, are provided on the opening <b>90</b><i>a </i>of the solder-resist layer <b>90</b> of the multilayer printed wiring board. The land <b>60</b>A is comprised of a central portion <b>6</b>OAc and a ring portion <b>6</b>OAr located around it. A carbon pillar (conductive member) held by a holding member having plasticity is disposed above the land <b>60</b>A and when a key is operated, the carbon pillar connects electrically the central portion <b>6</b>OAc with the ring portion <b>6</b>OAr.

Example 1-2

0157This example is the same as the example 1-1 except that no OPS layer was formed on a solder pad in which the corrosion resistant layer of the example 1-1 is not formed.

Example 1-3

0158This example is the same as the example 1-1 except that corrosion resistant layer of nickel-palladium-gold was formed on the solder pad in which the corrosion resistant layer of the example 1-1 was formed.

Example 1-4

0159This example is the same as the example 1-1 except that corrosion resistant layer was formed of single layer gold on the solder pad in which the corrosion resistant layer of the example 1-1 was formed.

Comparative Example 1-1

0160In the comparative example 1-1, the corrosion resistant layer (nickel-gold) was formed on all solder pads. Other matters are the same as the example 1-1.

0161In a group of the example 1 and the comparative example 1, manufactured printed wiring boards were evaluated according to an item A and after the manufactured printed wiring board was accommodated into a casing, evaluation on items B and C was performed. This evaluation result is indicated in <figref idref="DRAWINGS">FIG. 10</figref>.

01621-A. Reliability Test

0163Under the heat cycle condition (130° C./3 min and 55° C./3 min as a cycle), this cycle test was repeated up to 5,000 cycles and every other 500 cycles, a test piece was left for 2 hours after the test ended and a continuity test was carried out. The number of cycles up to when circuits whose resistance change ratio exceeded ±10% exceeded 50% measured circuits were compared.

01641-B. Startup Test

0165As for a casing equipped with power supply, whether or not the test piece was started up smoothly when it was powered was judged.

0000Started within two seconds after the power was turned on: ◯ <br /> Started within <b>10</b> seconds after the power was turned on: Δ <br /> Did not start: X

01661-C. Drop Test

0167A test piece was dropped naturally from a base fixed at a height of 1 m with its liquid crystal portion facing downward. This test was executed once, three times and five times and each time, startup test of B was carried out.

Second Embodiment

0168In the first embodiment described above with reference to <figref idref="DRAWINGS">FIGS. 1-10</figref>, an example that the multilayer printed wiring board of the present invention was applied to the multilayer printed wiring board of a portable phone has been picked up. Contrary to this, according to the second embodiment, the printed wiring board of the present invention is applied to a package board loaded with an IC chip.

Example 2-1-1

0169Although the manufacturing process is the same as the example 1-1, the example 2-1-1 is used as a package board. <figref idref="DRAWINGS">FIG. 11(A)</figref> shows a perspective view of a package board <b>70</b> before the IC chip is mounted. <figref idref="DRAWINGS">FIG. 11(B)</figref> shows a sectional view taken along the line B-B of <figref idref="DRAWINGS">FIG. 11(A)</figref>. <figref idref="DRAWINGS">FIG. 11(C)</figref> shows a perspective view of the package board after the IC chip is mounted. <figref idref="DRAWINGS">FIG. 11(D)</figref> shows a sectional view taken along the line D-D of <figref idref="DRAWINGS">FIG. 11(C)</figref>. FIG. <b>12</b>(A<b>1</b>) shows a plan view of the package board <b>70</b> before the IC chip is mounted. FIG. <b>12</b>(B<b>1</b>) shows a rear view and FIG. <b>12</b>(A<b>2</b>) shows a plan view of the package board <b>70</b> after the IC chip is mounted. FIG. <b>12</b>(B<b>2</b>) shows a rear view.

0170As shown in FIGS. <b>11</b>(A) and <b>12</b>(A<b>1</b>), a cavity <b>74</b> is provided in the face of the package board <b>70</b> and a bonding pads <b>72</b> extend in the cavity <b>74</b>. As shown in <figref idref="DRAWINGS">FIG. 11(B)</figref>, the package board <b>70</b> is produced by overlaying the boards <b>30</b> each in which the via holes <b>46</b> are formed. The corrosion resistant layer composed of the nickel layer <b>54</b> and the gold layer <b>56</b> are formed on the bonding pads <b>72</b> on the front face. The OPS layer <b>58</b> is provided on a pad <b>80</b> on the rear face. As shown in FIGS. <b>11</b>(C) and <b>12</b>(A<b>2</b>), an IC chip <b>76</b> is incorporated in the cavity <b>74</b> and the IC chip <b>76</b> and the bonding pad <b>72</b> are connected with wire (gold wire) <b>78</b>. As shown in <figref idref="DRAWINGS">FIG. 11(D)</figref> and FIG. <b>12</b>(B<b>2</b>), a connecting pins <b>82</b> are attached to a bump (corrosion resistant non-formation) <b>80</b>, which is an external terminal on the rear face, via solder <b>83</b>.

Example 2-1-2

0171Although like the example 2-1-1, the wire bonding pads (corrosion resistant layer formed) <b>72</b> are formed on the front face and the connection pin pad (corrosion resistant layer not formed) <b>80</b>, which is an external terminal, is disposed on the rear face, no OSP layer is formed on the pad <b>80</b>.

Example 2-1-3

0172Although like the example 2-1-1, the wire bonding pads (corrosion resistant layer formed) <b>72</b> are formed on the front face, the connection pin pads (corrosion resistant layer not formed) <b>80</b>, which are external terminals, are disposed on the rear face and the OSP layer is formed on the pad <b>80</b>, nickel-gold or nickel-palladium-gold is formed on the bonding pad (corrosion resistant layer) <b>72</b>.

Example 2-2-1

0173Like the example 2-1-1, as shown in FIG. <b>13</b>(A<b>1</b>), the wire bonding pads (corrosion resistant layer formed) <b>72</b> and electronic component mounting pads (corrosion resistant layer not formed) <b>86</b> are provided on the front face, the connection pin pads (corrosion resistant layer not formed) <b>80</b>, which are an external terminal, are formed on the rear face and the OSP layer is formed on the electronic component mounting pad <b>86</b> and the connection pin pad <b>80</b>. As shown in FIG. <b>13</b>(A<b>2</b>), an electronic component (chip capacitor) <b>90</b> is mounted on the electronic component mounting pad <b>86</b> on the front face and the connecting pin <b>82</b> is attached to the pad <b>80</b> on the rear face.

Example 2-3-1

0174Like the example 2-1-1, as shown in FIG. <b>14</b>(A<b>1</b>), the wire bonding pads (corrosion resistant layer formed) <b>72</b> and the connection pin pads (corrosion resistant layer not formed) <b>80</b> are disposed on the front face and the OSP layer is formed on the connecting pin pad <b>80</b>. As shown in FIG. <b>14</b>(A<b>1</b>), the IC chip <b>76</b> is mounted on the front face and the connecting pin <b>82</b> is attached to the pad <b>80</b>.

Example 2-4-1

0175Like the example 2-1-1, as shown in FIG. <b>15</b>(A<b>1</b>), the flip chip bonding pads (corrosion resistant layer formed) <b>88</b> are formed on the front face and as shown in FIG. <b>15</b>(B<b>1</b>), BGA pads (corrosion resistant layer not formed) <b>80</b>, which are an external terminal, are disposed on the rear face and the OSP layer is formed on the BGA pad <b>80</b>. As shown in FIG. <b>15</b>(A<b>2</b>), the IC chip <b>76</b> is mounted on the front face via the flip chip bonding pad <b>88</b> and as shown in FIG. <b>15</b>(B<b>2</b>), BGAs <b>84</b> are formed on the BGA pads <b>80</b>.

Example 2-4-2

0176Although like the example 2-4-1, the flip chip bonding pads (corrosion resistant layer formed) <b>88</b> are formed on the front face and the BGA pads (corrosion resistant layer not formed) <b>80</b>, which are an external terminal, are disposed on the rear face, no OSP layer is formed on the pad <b>80</b>.

Example 2-4-3

0177Although like the example 2-1-1, the flip chip bonding pads (corrosion resistant layer formed) <b>88</b> are formed on the front face and the BGA pads (corrosion resistant layer not formed) <b>80</b>, which are an external terminal, are disposed on the rear face and the OSP layer is formed on the pad <b>80</b>, nickel-gold or nickel-palladium-gold is formed on the flip chip bonding pad (corrosion resistant layer formed) <b>88</b>.

Example 2-5-1

0178Like the example 2-1-1, as shown in FIG. <b>15</b>(A<b>1</b>), the flip chip bonding pads (corrosion resistant layer formed) <b>88</b> and the electronic component mounting pads (corrosion resistant layer not formed) <b>86</b> are provided on the front face and the BGA pads (corrosion resistant layer formed) <b>80</b> are disposed on the rear face and the OSP layer is formed on the electronic component mounting pads <b>86</b> and the BGA pads (corrosion resistant layer not formed) <b>80</b>. As shown in FIG. <b>15</b>(A<b>2</b>), an electronic component (chip capacitor) <b>90</b> is mounted on the electronic component mounting pad <b>86</b> on the front face and the BGA <b>84</b> is formed on the BGA pad <b>80</b> on the rear face.

Example 2-6-1

0179Like the example 2-1-1, as shown in FIG. <b>17</b>(A<b>1</b>), the flip chip bonding pads (corrosion resistant layer formed) <b>88</b> and the BGA pads (corrosion resistant layer not formed) <b>80</b> are disposed on the front face and the OSP layer is formed on the BGA pad (corrosion resistant layer not formed) <b>80</b>. As shown in FIG. <b>17</b>(A<b>1</b>), the IC chip <b>76</b> is mounted on the front face and the BGA <b>84</b> is formed on the BGA pad <b>80</b> of the front face.

Comparative Example 2-1

0180According to the comparative example 2-1, the corrosion resistant layer (nickel-gold) was formed on all the pads <b>80</b>. Other matters were set equal to the example 2-1-1.

Comparative Example 2-2

0181According to the comparative example 2-2, the corrosion resistant layer (nickel-gold) was formed on all the pads <b>80</b>. Other matters were set equal to the example 2-4-1.

0182In a group of the example 2 and the comparative example 2, manufactured printed wiring boards were evaluated according to an item 2-A and printed wiring boards mounted with the IC chip were evaluated according to items 2-B and 2-C.

01832-A. Reliability Test

0184Under the heat cycle condition (130° C./3 min and 55° C./3 min as a cycle), this cycle test was repeated up to 5,000 cycles and every other 500 cycles, a test piece was left for <b>2</b> hours after the test ended and the continuity test was carried out to verify whether or not continuity was obtained. Then, the number of cycles in which no continuity was verified were compared.

01852-B. Continuity Test After Mounting

0186After a bare chip was mounted and an external terminal was disposed, the continuity test was carried out at 20 places at random and whether or there was any terminal whose resistance change ratio exceeded ±10% was verified. A test piece whose resistance change ratio exceeded ±10% was cut near its external connecting terminal to obtain a cross section and by observing a given pad with a microscope (×200), whether or not any crack existed on its conductive circuit or solder layer was verified.

01872-C. Reliability Test After Mounting a Bare Chip

0188Under the heat cycle condition (130° C./3 min and 55° C./3 min as a cycle), this cycle test was repeated up to 5,000 cycles and every other 500 cycles, a test piece was left for 2 hours after the test ended and the continuity test was carried out at 10 places. Whether or not five or more circuits whose resistance change ratio exceeded ±10% existed was verified and the number of cycles in which there existed five or more such circuits was compared.

0189Although the invention has been disclosed in the context of a certain preferred embodiments, it will be understood that the present invention extends beyond the specifically disclosed embodiments to other alternative embodiments of the invention. Thus, it is intended that the scope of the invention should not be limited by the disclosed embodiments but should be determined by reference to the claims that follow.