TWM346607U

Vacuum sputtering apparatus forming gradient thickness thin-film

Abstract

A vacuum coating device for forming a gradient film thickness, comprising: a sputtering chamber, a transmission system and a sputtering source, wherein the transmission system is disposed inside the sputtering chamber and includes a carrier, The carrier can be linearly advanced inside the sputtering chamber, and the top surface of the carrier is provided with more than one support member, and the one or more support members are provided with a holding portion, and the sputtering source is disposed on the An inner side of the sputtering chamber has a target material, and the plane of the target material is in a unequal distance with the plane drawn by the holding portion of the one or more support members, thereby When the holding portion sandwiches and fixes a to-be-plated object to perform plating of the target material, a gradient-independent film can be formed on the surface of the object to be plated.

TWM346607U, drawing sheet 1
Sheet 1 of 6

Term

No projected expiry on record.

  1. Priority and filed
  2. Granted
  3. Today

11 claims: 9 independent, 2 dependent

  1. 1
    A vacuum coating device for forming a gradient film thickness, comprising:a sputtering cavity;a transmission system disposed inside the sputtering cavity and including a carrier, the carrier is splatable The inside of the plating chamber is linearly advanced, and the top surface of the carrier is provided with more than one support member, the one or more support members are provided with a holding portion;and a sputtering source is disposed on the sputtering chamber On the inner side, the sputtering source has a target material, and the target material has a surface, and the surface of the target material is linearly advanced when the surface of the target material is linearly advanced from the holding portion of the one or more support members. The configuration of the distance. M346607 九、申請專利範圍: 括: 種形成漸層薄膜厚度之真空 錢膜裝置,其係包 一濺鍍腔體; 一傳動糸統,盆你母罢认# v 又置於该濺鍍腔體之内部並包含一 载具,該載具係可於矽:路雜 於°亥焱鍍腔體之内部直線前進,該載且 之頂面係設有~個以上 * 八 古 支撐件’該-個以上之支撐件俜 5又有一固持部;以及 午係 濺鍍源’其係設置於該濺鍍腔體之 =:一料,材料係具有-表面二= 平面❹::上之支撑件的固持部直線前進時所晝出之 面係呈一不寺距離的配置。 2如巾請專㈣項所述之形成漸層 置…該一個以上之支樓件的固持部直線 τ斤旦出之平面係垂直於該載具之頂面,該 表面係傾斜於該載具之頂面。 枓之 請專利範圍第Μ所述之形成漸層薄膜厚度 ^鍍膜m中該—個以上之支揮件的 :進時所晝出之平面係傾斜於該載具之w材料: 表面係垂直於該載具之頂面。 柯卄之 4.如申請專利範圍第1至3項其中任—項所述之形 :斤:缚膜厚度之真空鍍膜裝置,其中該傳動系統係進一 V :含兩輪軸固定座、複數輪軸以及-傳動馬it,該兩輪 轴固定座係分別設置於該㈣腔體内部之兩側,該複數^ 12 M346607 軸係可轉動地間隔設置於該兩 抽係以'结合件相互連接,各輪二’且相鄰之輪 輪,該傳動馬達係與其中一輪…:“別設有-滾 動,該載具係設置於各輪轴之滚:二而可驅動各輪㈣ 5 ·如申請專·圍第4項所述之形 之真空鐘膜裝置,其中該結合件係為—鏈條。 度 6 .如申請專利範圍第4項所述之 之真空鍍膜裝置,其中該結合件係為-皮帶。居度 括:7.—種形成漸層薄膜厚度之真空鑛膜裝置,其係包 一濺鍍腔體; 傳動系統’其係設置於該濺鍍腔體之内勺人一 載具,該載具係可於該_腔體之㈣直線前進,·、以^一 一錢鐘源,JL将#罢μ a 及 八係a又置於该濺鍍腔體之内部— 鍍源係具有一乾材料’該乾材料係具有一表面,今乾二 表面與該載具之頂面係呈-不等距離的配置。 之直:二::專ΓΓ第7項所述之形成漸層薄膜厚度 面:、二鐘膜…中該乾材料表面係傾斜於該裁具之頂 9.如巾請專利範圍第7或8項所述之 厚度之真空鑛膜農置,其中該傳動系統係進—牛t 軸固定座、複數輪轴以及—傳動馬達,該兩輪d: 分別設置於該賤鍍腔體内部之兩側,該複數輪軸仓二:、 地間隔設置於該兩輪軸固定座上,且相鄰之輪車由=結 13 M346607 合件相互連接,各輪軸之兩端分別設有一滾輪,該傳動馬 達係與其中一輪軸結合而可驅動各輪軸轉動,該載具係設 置於各輪軸之滾輪上。 1 0 ·如申請專利範圍第9項所述之形成漸層薄膜厚 度之真空鍍膜裝置,其中該結合件係為一鏈條。 1 1 ·如申請專利範圍第9項所述之形成漸層薄膜厚 度之真空鍍膜裝置,其中該結合件係為一皮帶。 十、圖式: 如次頁 14 一種形成漸層薄膜厚度之真空鍍膜裝置,其係包括:一濺鍍腔體;一傳動系統,其係設置於該濺鍍腔體之內部並包含一載具,該載具係可於該濺鍍腔體之內部直線前進,該載具之頂面係設有一個以上之支撐件,該一個以上之支撐件係設有一固持部;以及一濺鍍源,其係設置於該濺鍍腔體之內部一側,該濺鍍源係具有一靶材料,該靶材料係具有一表面,該靶材料表面與該一個以上之支撐件的固持部直線前進時所畫出之平面係呈一不等距離的配置。
  2. 2
    The vacuum coating apparatus for forming a gradient film thickness according to the first aspect of the invention, wherein the plane drawn by the holding portion of the one or more support members is perpendicular to the top surface of the carrier, the target The surface of the material is inclined to the top surface of the carrier. 如申請專利範圍第1項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該一個以上之支撐件的固持部直線前進時所畫出之平面係垂直於該載具之頂面,該靶材料之表面係傾斜於該載具之頂面。
  3. 3
    The vacuum coating apparatus for forming a gradient film thickness according to the first aspect of the invention, wherein the plane drawn by the holding portion of the one or more support members is inclined obliquely to the top surface of the carrier, the target The surface of the material is perpendicular to the top surface of the carrier. 如申請專利範圍第1項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該一個以上之支撐件的固持部直線前進時所畫出之平面係傾斜於該載具之頂面,該靶材料之表面係垂直於該載具之頂面。
  4. 5
    A vacuum coating apparatus for forming a gradient film thickness as described in claim 4, wherein the bonding member is a chain. 如申請專利範圍第4項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該結合件係為一鏈條。
  5. 6
    A vacuum coating apparatus for forming a gradient film thickness as described in claim 4, wherein the bonding member is a belt. 如申請專利範圍第4項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該結合件係為一皮帶。
  6. 7
    A vacuum coating device for forming a gradient film thickness, comprising:a sputtering cavity;a transmission system disposed inside the sputtering cavity and including a carrier, the carrier is splatable The inside of the plating chamber is linearly advanced;and a sputtering source is disposed on an inner side of the sputtering chamber, the sputtering source having a target material, the target material having a surface, the surface of the target material A configuration that is unequal to the top surface of the carrier. 一種形成漸層薄膜厚度之真空鍍膜裝置,其係包括:一濺鍍腔體;一傳動系統,其係設置於該濺鍍腔體之內部並包含一載具,該載具係可於該濺鍍腔體之內部直線前進;以及一濺鍍源,其係設置於該濺鍍腔體之內部一側,該濺鍍源係具有一靶材料,該靶材料係具有一表面,該靶材料表面與該載具之頂面係呈一不等距離的配置。
  7. 8
    A vacuum coating apparatus for forming a gradient film thickness as described in claim 7 wherein the surface of the target material is inclined to a top surface of the carrier. 如申請專利範圍第7項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該靶材料表面係傾斜於該載具之頂面。
  8. 10
    A vacuum coating apparatus for forming a gradient film thickness as described in claim 9 wherein the bonding member is a chain. 如申請專利範圍第9項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該結合件係為一鏈條。
  9. 11
    A vacuum coating apparatus for forming a gradient film thickness as described in claim 9 wherein the bonding member is a belt. 如申請專利範圍第9項所述之形成漸層薄膜厚度之真空鍍膜裝置,其中該結合件係為一皮帶。