Assembly comprising a plurality of mask containers, manufacturing system for manufacturing semiconductor devices, and method

System and method for manufacturing semiconductor device including assembly of multiple photomask containers

Field of invention

The present invention is related to the manufacture of semiconductor devices, and more specifically to the components used for the use of photomask containers used in the manufacture of semiconductor integrated circuits.

Background of the invention

The manufacture of semiconductor integrated circuits includes a series of stages. Many of these stages include plating a semiconductor wafer with photoresist and exposing the plated wafer to light passing through the photomask (which is also called a reticle). The exposure of the wafer in this way is performed using an exposure tool, usually a part of the photolithographic etching compartment, and therefore the photomask can be referred to as a photolithographic etching photomask.

The same exposure tool can be used with different masks at different stages in the production sequence or the exposure tool can be dedicated to a specific stage in the production sequence, and only a single mask is used. In any case, the mask can usually be removed from the exposure tool.

In an integrated circuit manufacturing plant, and particularly in a plant processing 300 mm wafers, there are usually many exposure tools operating at the same time. A photomask must be used in more than one exposure tool, and the photomask must therefore be transferred from one exposure tool to another.

The photomask is usually transported by a human operator between different exposure tools or between the exposure tools and the storage area. When being transported or stored, the photomask will be held in a photomask container (also called a photomask holder) to protect it from damage and airborne particles. Usually the container is made of plastic.

Because in a typical integrated circuit factory, a large number of photomasks are in circulation, it is difficult to coordinate the use of these photomasks to reduce the amount of time the exposure tool must wait for the required photomask to arrive.

Dealing with these problems is the purpose of the present invention.

Fig. 1 shows a simplified block diagram of a first manufacturing system for manufacturing semiconductor devices according to the present invention; Fig. 2 shows a rail transporting a stacked container in a specific embodiment; Fig. 3 shows individual mask containers; Fig. 4 shows manufacturing A simplified block diagram of a second manufacturing system of a semiconductor device, wherein the manufacturing system has a tracking device; and FIG. 5 shows a simplified block diagram of the tracking device of FIG. 1 in more detail.

Detailed description of preferred embodiments

According to one aspect of the present invention, there is provided an assembly including a plurality of photomask containers, each for holding one or more lithographic etching photomasks, wherein each photomask has a bonding device, which is adapted to The corresponding engagement device on the other container is engaged, so that two or more containers can be stacked together in a fixed relationship with the other, and each of the reticle containers has an electronic tracking device that has a receiver unit , For receiving lithographic etching data, a memory for storing the lithographic etching data, a processor unit for reading or writing the lithographic etching data from the memory to the memory, and a The transmitter unit is used to transmit the lithographic etching data read from the memory.

It will be understood that the term "lithographic etching data" can include any form of data that can be generated, used, or transferred in the manufacture of semiconductor devices.

Mask containers containing masks that are used sequentially as a group or otherwise related can be joined together or fixed in a stack. The stack of photomask containers can be transported to the lithography chamber with exposure tools. A stack of photomask containers can be placed in the lithography compartment and each photomask can be removed from the container one at a time for loading in an exposure tool. The stack of containers does not need to be disassembled, thereby making it easy to return the photomask to its correct container and reducing the chance that the photomask will become separated from other photomasks in the group.

Once the photomask in the stack has been used by the exposure tool, the stack can be returned to the storage area, or if another exposure tool requires the same set of photomasks, the stack can be transferred to the exposure tool. Because the photomask container is joined together in a stack, it can be transported more easily, making it less likely that the photomask will become out of order or be lost.

Because each container has an electronic tracking device, the data corresponding to the mask in the container can be obtained without opening the box.

The joining device may include a latch mechanism, wherein one side of the container has a spring bolt and the opposite side of the container has a buckle, so that two or more photomasks can be joined by the buckle of one photomask and another photomask The latch is engaged. The latching mechanism will preferably allow the two boxes to snap fit. The latch mechanism can be a push-pull type and can be released by a lever.

The container will preferably be stacked so that its sides are aligned with the others, but the container can be stacked in a stepped manner.

The lithographic etching data stored in the tracking device can include specifications such as type, version, or other specifications of the photomask held in the container, information on the alignment mark of the photomask, unique code for identifying the photomask, and photomask. The processing conditions in which the mask is used (for example, exposure time, wavelength), and other types of exposure tools and processing steps suitable for the mask. The lithography data may include status data, such as the history of the processing steps that the photomask has been used, the details of the exposure tool that the photomask has been used or will be used in, the known defects of the photomask or the use of the photomask problem.

The receiver unit and the transmitter unit may each be a wireless device, for example operating under radio frequency. Alternatively, the receiving unit may be an infrared light detector and the transmitter unit may be an infrared diode. In a preferred embodiment, the receiver unit and the transmitter unit transmit data via electrical conductors, and each includes electrical contacts for contacting the electrical conductors.

In the beginning, when the photomask is first placed in the container, the data on the specifications of the photomask will be written into the tracking device.

The data can be read from the tracking device by a handheld device with a receiver for receiving lithographic etching data from the handheld device.

The exposure tools preferably each have a reading device for downloading the lithographic etching data from the tracking device in each reticle container. The downloaded data can then be used by the exposure tool to set exposure and other parameters to a particular stage in the processing sequence where the mask will be used.

In addition, the exposure tools preferably each have a communication device for transmitting the lithographic etching data to the tracking device. If the photomask container is used for the first time, or if there is a new photomask, the communication device on the exposure tool can be used to transmit the data about the photomask to the tracking device. Otherwise, if the tracking device already has specification data, the transmission device associated with the exposure tool can transmit the status data to the tracking device, which can be used by the next exposure tool to which the mask will be brought. The status data transmitted to the tracking device is preferably added to or updated any existing status data already held by the tracking device.

Preferably, a rail system with at least one transport rail is provided for transporting the lithographic etching container between different lithographic etching compartments. The containers preferably each have a rail engaging device for movably engaging with the rail, and the device may include a sliding seat, a bearing or a wheel. Preferably, the rail engaging device on each photomask container will be releasable so that the container can be removed from the rail and stored or placed in a position ready to be loaded into the exposure tool.

Preferably, a traction device for moving the container along the rail is also provided. The traction device includes a moving belt or a cable that can be connected to the light shield container on the rail. Alternatively, the traction device may include a plurality of individual engines, which are arranged so that each engine can independently move a single stacked reticle container (or a single reticle container).

When a group of containers are joined together as a stack, only one container in the stack can be joined to the rail (ie, physically connected to the rail).

The rail system preferably includes a processing device for automatically loading or unloading the mask container from the rail to the rail, rather than performing these tasks by hand by a human operator. The processing device also includes transporting the photomask container into engagement with another stack and releasing a container from one stack. The processing device is preferably controlled by a central computer adapted to exchange lithographic etching data with the mask container.

A node on-orbit system can be provided, in which the stack of reticle containers can be put together or separated, whether by a human operator or a processing device. The photomask that is added or removed from the stack can be transported along the track towards the node.

When the photomask contained therein is not in use, the photomask container is preferably kept in the storage compartment. When a group of photomasks are to be used in the manufacturing sequence, the processing device can select corresponding photomask containers from storage and join these photomasks together into a stack. This stack can then be transported on the track to an appropriate exposure tool. When another exposure tool requires the same set of photomasks, the stack can be easily transferred to the tool without re-disassembling the stack.

The tracking device of the reticle containers in the stack can be adapted to transmit lithographic etching data to each other. In one embodiment, the processor of the tracking device in each container will be programmed to identify other containers in the stack and select a tracking device in between to transmit lithographic etching data representing all containers in the stack, by This reduces duplication of data transmission.

If a set of photomasks needs to be modified, photomask containers can be added or removed from the stack on the rail node, or a new stack can be formed by selecting photomask containers from the storage compartment.

Each photomask container preferably includes only a single photomask, but some photomask containers can be adapted to include two or more photomasks, for example, where two or more photomasks are always used one after the other.

According to another aspect of the present invention, a manufacturing system for manufacturing a semiconductor device is provided, which includes:

A plurality of reticle containers, each holding one or more lithographic etching reticles, each container is adapted to engage with a locking device on another container, so that two or more containers can be fixed with other Ship together under the relationship;

Multiple lithographic etching compartments;

A transport rail, the transport container is between different lithographic etching compartments;

Each of the lithographic etching compartments has a transmitter unit and a receiver unit, which respectively transmit and receive lithographic etching data, and each photomask container has an electronic tracking device, which has a receiver unit for etching from the lithography The compartment receives lithographic etching data, a memory for storing lithographic etching data, a processor unit for reading lithographic etching data from the memory or writing to the memory, and a transmitter unit , It is used to transfer the lithographic etching data read from the memory to the same lithographic etching compartment or another lithographic etching compartment.

According to another aspect of the present invention, a manufacturing system for manufacturing a semiconductor device is provided, which includes:

Multiple photomask containers, each holding one or more photolithographic photomasks;

Multiple lithographic etching compartments;

A conveying rail system, the conveying container is between different lithographic etching compartments, the conveying rail system has a carrier and a photomask container, each with a joining device, which is used to engage with the carrier so that the photomask container can be held by the rail system Transmit

Each of the lithographic etching compartments has a transmitter unit and a receiver unit, which respectively transmit and receive lithographic etching data, and each photomask container has an electronic tracking device, which has a receiver unit for etching from the lithography The compartment receives lithographic etching data, a memory for storing lithographic etching data, a processor unit for reading lithographic etching data from the memory or writing to the memory, and a transmitter unit , Which transmits the lithographic etching data read from the memory to the same lithographic etching compartment or another lithographic etching compartment.

Preferably, the rail system transports the mask container, for example, by a stack or a frame with slots (for example, a slot in a container). In the stacked version, only the container in the outer position can be removed or added; in the framed version, arbitrary access to the container is possible. As those familiar with the art understand without further explanation, a "smart" stack can be provided so that the rail system picks up the containers in the opposite order of the rail system releasing the containers from the stack. In other words, the order in which the containers are stacked (in terms of order) pre-considers the order in which the containers are released from the stack (in terms of time).

According to yet another aspect of the present invention, there is provided an assembly including a plurality of photomask containers, each holding one or more photolithographic photomasks, wherein each container has a joining device that is adapted to be compatible with another container The upper joining device is joined so that two or more containers can be stacked together in a fixed relationship with each other, and each of the reticle containers has an electronic tracking device, and the tracking device has a receiver unit that receives the first Lithographic etching data, a memory for temporarily storing the first lithographic etching data, a processor unit for processing the first lithographic etching data and providing the second lithographic etching data, and a transmitter unit , Which is used to transmit the second lithographic etching data.

In FIG. 1, a manufacturing system 100 for the manufacture of semiconductor devices using lithography is shown. The manufacturing system 100 has a plurality of lithographic etching compartments 110 (L1-L4). Each has exposure tools (not shown).

A plurality of photomask containers 200 (C1-C4) are joined together in the stack 206 by a joining device, generally referred to as 102. Each container 200 includes a photomask 201 for the exposure tool used in one of the lithographic etching compartments 110. Although only four reticle containers are shown in Figure 1, there are usually 12 containers gathered together in the stack.

The stack 206 of the container 200 is shown in FIG. The rail system has a plurality of rails 161 connected to at least one node 162. The rail system also has a traction device 151 (T) to move the container along the rail 161.

The rail joining device 152 is provided to movably engage with the rail or more of the at least one container 200 and the rail system 101 (shown as C4 here). The container 200 can be transported as a stack 206 or individually between different lithographic etching compartments 110 or between the lithographic etching compartment 110 and the storage area 207.

Provide each lithographic etching compartment 110 and storage area 207, which has a processing device 119 (H0-H4) to automatically place the photomask container 200 on the rail system 101 and remove the photomask container when it has reached its The destination, either when the stack is partially assembled or disassembled at node 162.

Each lithographic etching compartment 110 has a data transmitter and receiver 170 (D1-D4) for transmitting and receiving lithographic etching data, and each container 200 has an electronic tracking device 205 (circled symbol, compare Figure 2-3 ) Is used to receive and store the lithographic etching data from any one of the lithographic etching compartments 110 and to transmit the data. Therefore, when the stack 206 of the photomask container 200 is transferred to the lithographic etching compartment 110, the lithographic etching information about the photomask in the stack can be transferred to the lithographic etching tool in the lithographic etching compartment and the lithographic etching tool The exposure and other variables can be set as a function of the transferred lithography data.

The lithographic etching data can also be exchanged between the lithographic etching compartment 110, the tracking device 205, and the central computer 105 (CIM). In addition, the central computer 105 can control the traction device 151 to manage the movement of the mask container 200. Because the container can be transported in the stack 206, the transport workload that needs to be controlled by the central computer can be reduced.

The lithographic etching data is transmitted or received by the tracking device using wireless devices such as microwave or infrared radiation. Alternatively, the rail system 161 can be used to provide a wire connection to the tracking device 205, and a rail joint device 152 can be provided with a brush or transmission The other sliding contacts of the rail create movable electrical contacts between the rail system and the rail 161. The power to the rail device can also be provided via the rail 161 or each tracking device can have a power supply.

FIGS. 2-3 illustrate further details; among them, FIG. 2 shows the joining device 102 in more detail, the shipping container 200 of which is a stack 206; and FIG. 3 shows an individual container 200. In this example, the rail system 101 utilizes the upper rail 161 (only a short area of which is shown in FIG. 2), and the container 200 travels in a suspended position under the rail 161.

The container 200 is held on each side between a pair of vertical fixing members 153, which is shown here in the form of a rod. Each fixing member 153 is suspended from the rail 161 at its upper end by the traveling mechanism 152, which allows the fixing member to travel together on the rail 161 in the direction shown by the arrow 157.

The container 200 is connected to a fixing member 153 at each end 141 by a lockable sliding mechanism 158, which can be placed in a vertically locked state in which it fixes the vertical position of the container 200, for example, when it is transported, or It is in an unlocked state, in which it allows the container 200 to be moved in a vertical direction on the stack or unloaded from the stack.

The lockable sliding mechanism 158 has a locked horizontally locked state in which it prevents relative horizontal movement between the fixed member 153 and the container 200, and an unlocked horizontally locked state in which the container can be horizontally locked. The sliding engages or does not engage with the fixed member 153 (in the direction of arrow 157). The sliding mechanism is normally in a horizontally locked state to prevent the container 200 from becoming separated from the fixing member 153 when the container 200 is transferred. However, when the container is loaded or unloaded on the rail system 101, the lockable sliding mechanism 158 will be locked at the unlocked level.

In order to reduce the relative horizontal movement between the containers 200 when stacked, a plurality of protrusions 143 are located on the top surface 142 of each container 200, and the protrusions engage with opposite recesses in the lower surface of each container. The protrusion 143 allows the container to engage with one another when stacked. Preferably, the protrusions are in the shape of a pyramid, but other thin-pointed ones can also be used (for example, circular).

Preferably, each container has an electrical contact 204 on its top surface and a corresponding contact 271 on its lower surface. Each contact is placed so that when two or more containers are correctly stacked, a The lower contact of the container is electrically connected to the upper contact 204 of the container below it to close an electronic circuit. When the circuit is closed, the container is assumed to have been correctly stacked. As shown by the circular symbol (compare with Figure 1), the device 205 (described in detail in Figures 2-3) is loaded with the container 200.

Preferably, the container 200 has a side surface 179 which can be opened to access the light shield in the container 200.

Optionally, each container 200 may have individual engaging devices 148, 149 on its upper and lower surfaces, respectively, to allow the container to directly engage with others.

The present invention allows modification of the container that is specific to each tool supplier. The modification does not conflict with the basic functions of the container for transporting and accessing the mask. Access can be from the side (as widely used), or in another way from the top of the container.

4 is a simplified block diagram of a further simplified embodiment of the semiconductor wafer manufacturing system 100, which has a first station 110, a second station 120, a photomask container 200, and an electronic tracking device 205 according to an embodiment of the present invention. After that, it is a device). The device 205 associated with the mask container 200 includes: a receiver unit 210, which receives the first data 111 (arrow), a memory unit 220, which temporarily stores the first data 111, a processor unit 230, which processes the first data 111 The data 111 and the second data 122 (arrow) are provided, and the transmitter unit 240, which transmits the second data 122.

The photomask container 200 (hereafter a container) is any suitable enclosure that protects the lithography photomask 201 from contamination (for example, by particles). The container 200 may also be empty, for example, for the container 200 to be cleaned.

The photomask container 200 has a photolithographic etching photomask 201 between the first photolithographic etching compartment 110 (hereafter the first stage) and the second photolithographic etching compartment (hereafter the second stage) 120. The stage 110 uses the mask 201 (or the container 200) in the first process and at a later point in time, the stage 120 uses the mask 201 in the second process.

Preferably, the first lithographic etching data 111 indicates how the station 120 has used the photomask 201 in the first process, and the second lithographic etching data 122 indicates how the station 120 uses the photomask 201 in the second process. Preferably, the transmitting unit 240 transmits the second data 122 to the station 120 before the station 120 uses the photomask 201 in the second process.

Preferably, the processor unit 230 processes the first data 111 by combining the first data 111 and the instruction 131. Preferably, the instruction 131 is a set of computer executable program codes. Preferably, the instruction 131 also instructs how to use the photomask 201 in the second manufacturing process. The receiver unit 210 receives an instruction 131 from a host computer, for example. It is convenient for the receiver unit 210 to receive the first data 111 at the first time point and to receive the instruction 131 at the second time point thereafter. The agreement to ensure reception and transmission to the receiver unit 210 and the slave transmitter unit 240 is known in the art. Optionally, the processor unit 230 receives the first data 111 from the sensor 270 located in the mask container 200.

The term "operating a lithography tool (and its language variation)" means to include at least one of the following actions:

Remove the mask 201 from the container 200; Insert the mask 201 into the container 200; Remove the mask 201, return the mask to the container and then remove the other mask from a different container; Remove the stack 206 Recompose a stack; Add data to the mask 201 electronically (that is, write to the electronic device 205), -optionally-also physically (for example, by adding a barcode label); Read data from the mask 201 (for example, read the barcode label); Expose semiconductor wafers (not shown) or any other work products through the mask 201 by transmitting electromagnetic radiation; Store the mask 201; Manufacturing mask 210; Maintaining the mask 210 (for example, clean); Monitoring the transmission properties of the mask (for example, because of repeated exposure, the mask transmits less radiation); Injury mask 201, processing mask 201 , Recycling the mask 201, or removing the mask 201 from the factory; Test and measure the properties of the mask 201, either directly (for example, to identify exposed photos) or indirectly (for example, to identify (Was exposed to radiation by a photomask); assign identifiers to the photomask 201; assign identifiers to a plurality of photomasks 201 (for example, type classification); and transmit from the first electronic device in the first container Information about the photomask 201 to the further electronic device in the further container. The action registration will be referred to after being associated with the method.

For example, and without limiting intent, the station 110/120 may have or be the following: a photomask sorter, which inserts the photomask to the container, removes the photomask from the container, inserts multiple photomasks into and removes from the container; A shadow etching exposure tool that exposes a semiconductor wafer (not shown) or any other work product (the main purpose of a photomask) by transmitting electromagnetic radiation through a photomask; a tool that writes data to or reads from the photomask Get data; a manufacturing tool, which manufactures the mask or assigns a single identifier to a single mask or a single identifier to a plurality of masks; a metrology tool, which tests and measures the properties of the mask; a clean tool, which changes from light The hood removes contamination.

It is convenient to use the term mask together with the aforementioned actions; however, those familiar with the art can implement the present invention and the actions with the mask container 200 based on what is disclosed herein, independently of whether the container transmits the mask or Yes no.

FIG. 5 is a simplified block diagram of the electronic device 205 of FIG. 4 in more detail. The electronic device 205 shows that it has a receiver unit 210, a memory unit 220, a processor unit 230, a transmitter unit 240, and a bus 250 connected to it. Preferably, the processor unit 230 and the memory unit 220 are implemented on a single chip (embedded microprocessor, dashed line 208).

Preferably, the receiver unit 210 and the transmitter unit 240 are combined to the transceiver unit 260. Conveniently, the transceiver unit 260 is a wireless transceiver operating such as a radio frequency transceiver (compared to the antenna 261), or an infrared transceiver (compared to the optical interface 262 with a light emitting diode (LED) and a light diode symbol). ). Those familiar with this technique can use other wireless transceivers without further explanation here. For example, the transceiver may include an induction coil. In the case of a wired transceiver, an environment of direct electrical contact to the device 205 is established.

Preferably, the memory unit 220 is a non-volatile memory, such as ERPROM or SRAM. Volatile memory (e.g., DRAM) can also be used. Conveniently, the instructions 131 stored in the memory unit 220 also include information about further processing.

The power supply 280 of the units 210/240, 220, 230 can be provided by long and long-lasting small batteries, by photovoltaic elements, by thermal converters, by inductive power converters, which rely on externally applied electromagnetic energy or Performed by any other suitable power supply device.

Preferably, the device 205 remains permanently attached to the container 200; that is, the same is true when the container 200 is cleaned. A convenient attachment device is the adhesive 209, or a mechanical coupling device (for example, a press-fit installation or a spring-installed coupling), or a combination thereof. Preferably, the device 205 is located in the factory 100 at the same position in all the containers 200. The attachment device 209 on the outside of the container, for example, is conveniently attached to the outside of its plastic enclosure.

Further modifications are possible. For example, the container 200 may have a barcode label; an operator interface (for example, display, buzzer, key) may also be provided with the device 205.

From the above description, it will be understood that the present invention provides an efficient method to transfer the photomask in the semiconductor device factory, resulting in fewer lithographic etching exposure tools because there is no correct photomask in the required time to rest.

Schematic element symbol description

100 Manufacturing system 158 Lockable sliding mechanism 101 Rail system 161 Rail 102 Joint device 162 Node 105 Central computer 170 Data transmitter and receiver 110 Lithography compartment or first station 179 Side surface 111 First data 200 Mask container 119 Processing device 201 Mask 120 Second station 204 Electrical contacts 122 Second data 205 Electronic tracking device 131 Command 206 Stack 141 End 207 Storage area 142 Top surface 208 Embedded microprocessor 143 Protrusion 209 Attachment device 148 Bonding device 210 Receiver unit 149 Joint device 220 Memory unit 151 Traction device 230 Processor unit 152 Rail joint device or travel mechanism 240 Transmitter unit 153 Fixing member 250 Bus bar 157 Arrow 260 Transceiver 261 Antenna 262 Optical interface 270 Sensor 271 Contact 280 power supply