Contact structures and methods for making same
Abstract
This case is a combination of interconnected contact structures, including an electronic component provided with a surface, and a conductive contact element carried by the electronic component and accessible from the aforementioned surface. The contact structure includes an inner soft elongated member having a first end and a second end, and the first end can form a first tight bond with the surface of the aforementioned conductive contact terminal without using other bonding materials. Another conductive shell is formed by at least one layer of conductive material, and encloses the elongated element and forms a second tight joint with the conductive contact terminal at least the part immediately adjacent to the first tight joint.
Term
No projected expiry on record.
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86 claims: 86 independent, 0 dependent
- 1一種互聯接觸結構組合,包括一個設有一表面的電子組件,一個由這電子組件承載並可經由前述表面接近的導電接觸端子,一個具有第一和第二端、且這第一端不需另行使用其它結合材料便能與前述導電接觸端子形成第一緊密結合的內軟質細長元件,以及由至少一層導電材料所形成的導電殼,且這至少一層的導電材料包封住前述細長元件並與前述導電接觸端子至少緊鄰第一緊密結合處的那部份形成第二緊密結合。
- 2如申請專利範圍第1項所述之結構,其中所稱第一和第二緊密結合的特徽在於若以拉力、剪力和/或彎折力來量測時,第二緊密結合的強度大於第一緊密結合。
- 3如申請專利範圍第2項所述之結構,其中所稱第二緊密結合的強度至少是第一緊密接合的二倍。
- 4如申請專利範圍第1項所述之結構,其中所稱至少一層是用壓縮方式對其施以應力。
- 5如申請專利範圍第1項所述之結構,其中所稱內軟質細長元件與至少一層的導電殼設有一懸臂,以便可將強性特性傳給所稱互聯接觸結構。
- 6如申請專利範圍第1項所述之結構,其中所稱導電殼具有一外層,而這外層是一銲料合金層。
- 7一種可當作一互聯件而用於一含有半導體之組合的接觸結構,該組合包括一個設有一表面、且這表面上具有至少一個接觸片、而該接觸片又另具有一表面的電子組件,至於前述接觸結構則包括至少一個具有第一和第二端的導電軟質細長元件,將這第一端結合到接觸片表面以形成第一緊密結合的裝置,一個實質能把全部軟質細長元件和導電接觸片表面上至少與前述軟質細長元件第一端及接觸片的結合裝置緊鄰那一部份包封住,以便提供第二緊密結合的導電殼,致使這第二緊密結合的強度大於第一緊密結合的強度。
- 8如申請專利範圍第7項所述之結構,其中所稱導電殼是由至少一層的某種導電材料所形成。
- 9如申請專利範圍第8項所述之結構,其中所稱軟質細長元件設有至少一個可供形成一彎頭的懸臂部。
- 10如申請專利範圍第9項所述之結構,其中所稱導電殼具有高彎曲變形強度。
- 11如申請專利範圍第10項所述之結構,其中所稱導電殼的導電材料主要是選自鎳、鈷、鐵、磷、硼、銅、鎢、鉬、銠、鉻、釕、銀、鈀、及其合金構成之群組中選出的一種材料所形成。
- 12如申請專利範圍第8項所述之結構,其中所稱導電殼包括一層能提供內壓縮應力的鍍層。
- 13如申請專利範圍第7項所述之結構,其中所稱第二端是個自由端。
- 14如申請專利範園第13項所述之結構,其中所稱自由端具有球形形狀。
- 15如申請專利範圍第7項所述之結構,具有一層可黏附到屬於導電材料製成之導電殼上的外導電層,該外導電層是由一種可構成良好通電接觸的材科所形成。
- 16如申請專利範圍第7項所述之結構,其中所稱導電殼具有一外表面,該外表面之中另設有微凸起部。
- 17如申請專利範園第9項所述之結構,具有一個從所稱接觸片表延伸而佈滿彎頭之上的導電軟質材料塊,以便使這彎頭的感應特性減至最低,並使其能彎曲。
- 18如申請專利範圍第13項所述之結構,其中所稱自由端是延伸到電子組件表面的上方。
- 19如申請專利範圍第13項所述之結構,其中所稱自由端是向下延伸到電子組件表面的下方。
- 20如申請專利範圍第7項所述之結構,具有一層位在導電殼上的介質材料層,與另一層位在這介質材料層上的導電材料層,以便提供一種屏蔽接觸結構。
- 21如申請專利範圍第10項所述之結構,其中所稱第二端為自由端,以便使這第二端可當作一彈性探針狀接觸件,而以彈性方式與接觸端子接合。
- 22如申請專利範圍第20項所述之結構,其中所稱接觸結構包括一個能當作通電接觸件的懸垂部。
- 23如申請專利範圍第13項所述之結構,其中所稱自由端設有一片由其承載的接觸片,並具有至少一層其上設有若干分隔之凸起部的鍍層。
- 24如申請專利範圍第23項所述之結構,其中所稱具有凸起部的鍍層是由一種硬導電材科所形成。
- 25如申請專利範圍第24項所述之結構,其中所稱硬導電材料是由鎳、鈷、銠、鐵、鉻、鎢、鉬、碳、及其合金構成之群組。
- 26如申請專利範圍第10項所述之結構,其中所稱探針端設有一個與自由端鄰接的懸臂部。
- 27如申請專利範圍第7項所述之結構,具有能將第二端結合到與第一端所結合之相同接觸片上的裝置,另有能將所稱接觸結構包封住而形成一銲料凸起部的銲料。
- 28如申請專利範圍第27項所述之結構,其中所稱導電殼具有主要是由銲料所形成的外層。
- 29如申請專利範圍第27項所述之結構,其中所稱軟質細長元件可形成若干從接觸片上延伸的迴圈,並以這軟質細長元件上所形成的導電殼與固設在這軟質細長元件處的銲料用具包封住迴圈之間的平表面區域,以形成一個覆蓋住這被包封之平面區的銲料凸起部。
- 30一種可供用於一半導體組合的嵌插件,以某種絕緣材料形成的一片基片設有分隔第一和第二表面,並在前述分隔表面的至少其中之一上設有若干分隔的接觸片,另在前述至少其中之一表面之接觸片上設有若干接觸結構,各該接觸表面包括至少一個具有第一和第二端的軟質細長元件,將第一端結合到一接觸片上的用具設有一個在軟質細長元件上以絕緣材料所形成並被結合到前述接觸片上的導電殼,而第二端則為延伸到基片上方的自由端。
- 31如申請專利範圍第30項所述之嵌插件,其中所稱基片設有若干貫通孔,固設在接觸片上的附加軟質細長元件可穿過該等孔洞,另在這些附加軟質細長元件上設有一個由某種導電材料形成的導電殼。
- 32如申請專利範圍第31項所述之嵌插件,其中所稱軟質細長元件形成一個具有懸臂部的彎頭,所稱導電殼的形成材科具有至少每平方吋達三萬磅的高彎曲變形強度。
- 33如申請專利範圍第31項所述之嵌插件,其中所稱孔洞具有彼此偏位的部位,該等部位穿過第一和第二表面而提供從該等表面凹入的肩部,使接觸片能位在該等肩部上,而所稱接觸結構則被固設在位於此等肩部之上的接觸片處,具有從所稱孔洞朝外延伸而超過第一及第二表面,據以提供可位在分隔之平行面上的自由端。
- 34如申請專利範圍第31項所述之嵌插件,其中所稱孔洞具有穿過其間的導電體。
- 35如申請專利範園第31項所述之嵌插件,其中所稱孔洞是屬於電鍍貫通孔的形式,所稱接觸結構則位在第一和第二表面其中之一處的接觸片上,使附加接觸結構延伸越過此等電鍍貫通孔而被結合到基片另一邊的接觸片上,所稱附加接觸結構包括若干軟質細長元件及一個在該等軟質細長元件上所形成的導電殼。
- 36如申請專利範圍第35項所述之嵌插件,其中所稱附加接觸結構的立面實質為迴圈形狀,且該等附加接觸結構上設有銲料,據以提供一銲料凸起部。
- 37一種半導體裝置組合,包括一個具有表面的活性半導體裝置,其上設有若干接觸片,且在該等接觸片上裝有若干接觸結構,前述接觸結構各包括一個具有第一和第二端的軟質細長元件,將這第一端結合到前述接觸片上而使第二端保持自由的用具,以及一個在這軟質細長元件上以導電材料形成的導電殼,該導電殼是延伸覆蓋在所稱軟質細長元件上且至少固設在接觸片的一部份上,所稱飲質細長元件具有一個可形成一彎頭的懸臂部,而所稱接觸片則是按照預定距離予以分隔,同時所稱接觸結構之自由第二端的分隔距離比結合到該等接觸結構之軟質細長元件第一端之間的間隔大。
- 38如申請專利範圍第37項所述之組合,其中所稱軟質細長元件的自由第二端是與第一端交錯。
- 39如申請專利範圍第37項所述之組合,具有固設及安裝在半導體裝置之表面上的對準插銷,該等對準插銷是由一個軟質細長元件及設在這軟質細長元件上的導電殼所形成。
- 40如申請專利範圍第39項所述之組合,其中所稱對準插銷之軟質細長元件及導電殼的形成材料與接觸結構相同。
- 41一種半導體封裝總成,包括一片由絕緣材科形成並具有第一和第二表面、且在這第一和第二表面至少其中之一上設有若干接觸片的基片,至少一個具有第一表面並具有若干接觸片和互聯彈性接觸結構的活性半導體裝置,該等互聯彈性接觸結構設有第一和第二端,使這第一端可跟基片之一表面所承載的接觸面或半導體裝置所承載的接觸片結合,另使第二端可跟半導體裝置的接觸片或基片上未結合那一表面上所承載的接觸片接觸,此外,前述互聯接觸結構各包括一個軟質細長元件,該細長元件具有一個其上設有彎頭的懸臂部,和一個位在這軟質細長元件上而由具有每平方吋達三萬磅之高彎曲變形強度導電材料所製成的導電殼,以便對此等互聯接觸結構提供彈簧狀的特性,而用彈性方式將活性矽裝置固設到基片上。
- 42如申請專利範國第41項所述之組合,至少另有一個具有若干接觸片的活性半導體裝置,以及將這活性半導體裝置之接觸片與基片另一表面之接觸片相接的用具。
- 43如申請專利範圍第42項所述之組合,其中所稱能將至少另一半導個裝置之接觸片與基片另一表面之接觸片相接的用具,包括構造與所稱第一互聯接觸結構相同的互聯接觸結構。
- 44如申請專利範圍第41項所述之組合,其中由導電材料形成的導電殼係被緊密結合到接觸片上,以便增強能將接觸結構固設到該接觸片的剝離強度。
- 45如申請專利範圍第41項所述之組合,其中所稱基片是一印刷電路板,該印刷電路板設有若干層的金屬鍍層與穿過這印刷電路板的縱向中間導體,而所稱接觸片則與該等縱向中間導體接觸。
- 46如申請專利範圍第42項所述之組合,具有固設在基片上並延伸到半導體裝置上方的彈簧夾用具,以便把所稱至少一個活性半導體裝置保持在相對於基片的一個預定位置,並對所稱互聯彈性接觸結構施以壓縮力。
- 47如申請專利範圍第46項所述之組合,其中所稱彈簧夾用具的形成材料與互聯彈性接觸結構相同。
- 48如申請專利範圍第45項所述之組合,其中所稱互聯接觸結構具有第二自由端,該等第二自由端穿過印刷電路板上的縱向中間導體並與這些中間導體摩擦接合而形成接電狀況,同時可用來把所稱半導體裝置保持在相對於基片的一個預定位置。
- 49如申請專利範圍第41項所述之組合,其中所稱基片設有若干孔洞,以及固設在所稱半導體裝置上並穿過該等孔洞而與印刷電路板接合的彈簧夾用具,使這半導體裝置能保持在相對於基片的一個預定位置,並對能將這基片上之接觸片與半導體裝置上之接觸片相接的彈性接觸結構施以壓縮力。
- 50如申請專利範圍第41項所述之組合,其中所稱基片設有若干對準孔,若干安裝在所稱半導體裝置之上並穿過這基片上之對準孔的對準插銷,以便使所稱半導體裝置與基片對準,同時在這半導體裝置與基片之間設有黏附裝置,可讓半導體裝置保持在相對於基片的一個由對準插銷所決定對準的預定位置。
- 51如申請專利範圍第50項所述之組合,其中所稱對準插銷是由細長元件所形成,該等細長元件之上設有導電殼,以便對這些軟質細長元件提供額外的結構支承。
- 52如申請專利範圍第41項所述之組合,具有一個位在所稱第一半導體裝置與基片之間的電容器,該電容器則設有若干接觸端子以及能將這些接觸端子耦合到這第一半導體裝置之接觸片上的用具。
- 53如申請專利範圍第52項所述之組合,其中所稱基片之上形成一凹口,而所稱電容器即設於其內。
- 54如申請專利範圍第52項所述之組合,其中所稱能將接觸端子與第一活性半導體裝置之接觸片耦合的裝置,包括設在所稱凹口鄰接處的若干接觸片。
- 55如申請專利範圍第41項所述之組合,其中所稱基片設有第二表面,該第二表面具有若干位在不同高度處的階梯部,在此等階梯部上設有若干接觸片,而所稱接觸結構即位在此等階梯部的接觸片上,並具有伸入同一水平面內的自由端。
- 56如申請專利範圍第41項所述之組合,其中所稱基片設有一個穿過第一表面的凹口,在這凹口中置人一電容器,這電容器又轉而承載其它的接觸結構,使該等其它的接觸結構之結束位置與所稱半導體裝置的接觸片處於同一平面,並被固設在這半導體裝置上以便與其接觸通電。
- 57如申請專利範圍第41項所述之組合,具有一片其上設有若干接觸片的積體基片,另有其它的彈性接觸結構能將所稱基片的接觸片與這積體基片的接觸片予以互聯。
- 58如申請專利範圍第57項所述之組合,具有若干被安裝在所稱積體基片上的其它基片,以及將該等其它基片與這積體基片相接的接觸結構。
- 59如申請專利範圍第58項所述之組合,其中所稱能將基片與積體基片予以互聯的接觸結構包括一個具有第一和第二邊、另具有若干能在這第一和第二邊之上至少某些接觸片之間形成通電互聯之接觸片的嵌插件,所稱接觸結構能與這嵌插件的接觸片以及所稱基片上的接觸片接觸,另有銲料裝置能在這嵌插件的接觸片與所稱積體基片的接觸片之間形成連接。
- 60如申請專利範圍第59項所述之組合,其中所稱彈性接觸結構能經彎曲變形而與嵌插件、基片或積體基片的接觸片接合,限制用具則可將基片互聯到積體基片上,以便對接觸結構施以壓縮力,致使接觸結構與接觸片保持通電接觸。
- 61如申請專利範圍第60項所述之組合,其中所稱限制裝置是屬於可拆卸式扣具的形式。
- 62一種半導體封裝總成,包括一片由絕緣材料形成並具有第一和第二表面、且在這第一和第二表面上設有若干接觸片的基片,若干半導體裝置具有與這基片第一及第二表面上之接觸片面對的接觸片以及能將此等半導體裝置之接觸裝置與這基片所承載之接觸片通電互聯的彈性接觸結構,以供把此等半導體裝置支承在與這基片表面分隔的位置處,致使此等半導體裝置位在這基片相對兩邊的第一和第二平行面上,且這基片還承載有接觸裝置,以便經由接觸結構而與此等半導體裝置通電接觸。
- 63如申請專利範圍第62項所述之組合,其中所稱接觸裝置是設在一平面上並排成一列。
- 64一種提供一結構性接觸件而與一電子組件所承載之一接觸片接合的方法,此法是利用一具有第一和第二端的軟質細長導電元件,將第一端固設到接觸片上而形成第一緊密結合,並在軟質細長元件上鍍以導電材料而形成一導電殼,這導電殼是在軟質細長元件之上延伸而提供結構性接觸件,並在結合處與接觸片之上延伸而黏附於其上,以致增加接觸片與結構性接觸件之間的強度。
- 65如申請專利範圍第64項所述之方法,具有在軟質細長元件第一和第二端之間形成一彎頭,並在這彎頭上形成導電殼,致使接觸結構具有可彎曲變形彈簧狀性質的步驟。
- 66如申請專利範圍第65項所述之方法,具有設置另一電子組件並在其上設有一接觸片的步驟,也具有使軟質細長元件第二端與這另一電子組件上之接觸片接觸,致使二者間建立起通電相接的步驟。
- 67如申請專利範圍第66項所述之方法,具有在電子組件與另一電子組件之間施以壓縮力,致使該等壓縮力被維持在接觸結構之上的步驟。
- 68如申請專利範圍第64項所述之方法,具有能將第二端固設在同一接觸片上而形成第二結合的步驟。
- 69一種可將一凸起導電接觸件安裝到電子組件上一導電端子處的方法,此方法依序包括如下步驟:先提供一條具有連續進給端並與端子之進給端緊密結合的引線,再從經結合的進給端形成一支從端子處凸起並於該處設有第一桿柄端的桿柄,接著將第二桿柄端結合到一片安裝在電子組件上但與其保持分隔關係的保護構件內,等從這第二桿柄端處切斷桿柄而界定出骨架後,再電鍍積附一層導電材料,把這骨架與電子組件上至少與這骨架鄰接的表面包封住,最後將保護構件去除。
- 70如申請專利範圍第69項所述之方法,其中在所稱保護構件的去除期間,是將第二桿柄端從這保護構件上切斷。
- 71如申請專利範圍第69項所述之方法,其中所稱導電材料的表面上設有許多微凸起部。
- 72如申請專利範圍第69項所述之方法,其中所稱電鍍積附步驟是積附若干彼此各不相同的鍍層。
- 73如申請專利範圍第73項所述之方法,其中所稱由導電材料構成的鍍層中,至少其中之一屬於鋸齒狀形貌,以便在凸起導電接觸件與對應的端子搭配時,能減低接觸阻力。
- 74一種可將一凸起導電接觸件安裝到一電子組件上一導電端子處的方法,此方該依序包括如下步驟:先提供一條具有能通往端子處之連續進給端的引線,將這進給端緊密結合到端子上,再從這進給端形成一支從端子處凸起並於該處設有第一桿柄端的桿柄,等從第二桿柄端處切斷桿柄而界定出骨架後,再電鍍積附一層導電材料,把這骨架與電子組件上至少與這骨架鄰接的表面包封住,接著對至少一個電子組件上位於不同平面處的若干端子進行同樣步驟,結果此等成型步驟便會製成若干獨立的凸起桿柄,然後再對位在共同平面上各個桿柄進行切斷步驟。
- 75如申請專利範圍第74項所述之方法,其中所稱端子是位在不同平面上,而成型步驟則是在該等不同平面上進行。
- 76一種能利用一片其上設有預定佈局之若干接觸片的個別試驗或預燒基片,而對一個其上設有若干彈性接觸結構之半導體裝置進行試驗和/或預燒程序的方法,該方法包括先讓設有若干彈性接觸結構的半導體裝置接受與試驗或預燒基片有關的壓縮力,以便經彎曲變形而迫使這半導煙裝置的彈性接觸結構與試驗或預燒基片之接觸片接合並通電,然後在該等彈性接觸裝置與試驗或預燒基片的接觸片接合之際,對這半導體裝置進行試驗,並在完成試驗或預燒後,將這帶有若干彈性接觸結構的半導鹽裝置與試驗或預燒基片的接觸片脫離。
- 77如申請專利範圍第76項所述之方該,可供用於一片其上設有預定佈局之若干接觸片的積體基片,並在完成試驗或預燒程序後,可另進行其它步驟而使半導體裝置的彈性接觸構造與這積體基片上的接觸片接合,致使此等接觸結構與積體基片的接觸片之間形成永久的連接。
- 78如申請專利範圍第76項所述之方該,其中所稱接觸結構具有底端和自由端,並有可將該等自由端之間的間隔加以改變的步驟,致使這間隔與底端不同,而與基片之接觸片彼此間的間隔對應。
- 79一種可將一凸起導電接觸件安裝到一電子組件上一導電端子處的方法,此方法依序包括如下步驟:先提供一條具有連續進給端的引線,將這進給端緊密結合到端子上,再從這進給端形成一支從端子處凸起並於該處設有第一桿柄端的桿柄,等從第二桿柄端處切斷桿柄而界定出骨架後,再電鍍積附一層導電材料,把這骨架和端子上與這骨架鄰接的表面包封住。
- 80如申請專利範圍第79項所述之方法,其中所稱的成型與切斷步驟是由一具引線接合器予以進行,並在完成切斷步驟之後但在電鍍積附步驟之前,利用在這引線接合器之外的一項工具塑成骨架的形狀。
- 81如申請專利範圍第79項所述之方法,其中所稱導電材料的表面設有許多微凸起部。
- 82如申請專利範圍第79項所述之方法,其中所稱電鍍積附步驟包括積附若干彼此各不相同的鍍層。
- 83如申請專利範圍第79項所述之方法,其中所稱電鍍積附步驟包括積附若干彼此各不相同的鍍層。
- 84如申請專利範圍第79項所述之方法,是實施在若干端子上,其中所稱成型步驟最後能形成若干獨立的凸起桿柄,反之切斷步驟則是對全在一共同平面上的各個桿柄進行。
- 85如申請專利範圍第79項所述之方法,是實施在至少一電子元件上的若干端子上,其中該等端子係處於不同平面上,所稱成型步驟最後能形成若干獨立的凸起桿柄,反之切斷步驟則是對全在一共同平面上的各個桿柄進行。
- 86如申請專利範圍第79項所述之方法,是實施在一電子組件上的至少一個端子上,其中所稱引線主要是選自金、銅、鋁、銀、銦、及其合金構成之群組中所製成,所稱骨架則塗覆一道選自鎳、鈷、硼、磷、銅、鎢、鈦、鉻、及其合金構成之群組導電材料所形成的第一鍍層,而這導電材料的頂層則是選自銦、鉍、銻、金、銀、鎘、及其合金構成之一種銲料。
Independent claims86
98 paragraphs, as filed
Contact structure device and method for interconnection, embedding, semiconductor, assembling and packaging
This application is a partial continuation of the U.S. Patent Application No. 08/152,812 filed on November 16, 1993. The present invention refers to an interconnected contact structure, an insert, semiconductor assembly and packaging using the interconnected contact structure, and a manufacturing method thereof.
There are many types of conventional interconnectors that can be used on semiconductor devices, but all of them have more than one disadvantage, which limits their wide application in the semiconductor industry. Therefore, there is a need for new and improved interconnection contact structures that can overcome these shortcomings, making them particularly suitable for semiconductor assembly and packaging, and can be widely used in the entire semiconductor industry.
Generally speaking, the object of the present invention is to provide a contact structure using the interposer, semiconductor assembly and packaging of the interconnected contact structure, and the manufacturing method thereof, so that the contact structure, especially the elastic contact structure can be directly attached to Active silicon device.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics so as to temporarily resist the burn-in contact sheet on the test substrate.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so as to make good use of the different intervals between the start point and the end point of the contact structures.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so as to make good use of the staggered contact structure that can form a three-dimensional fan-shaped expansion.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so that the contact structure can be connected to the area array, periphery, edge or midline expansion area (pad out) Contact the piece.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so that the edge of one side is raised, so that the contact piece can be formed into a shape with a closely spaced edge, so that the chip can be mounted on the SIMM (Single-row memory module, commonly known as "gold finger") or other interface cards.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so that the contacts can be mounted on a wafer or monolithic device.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, wherein the contact attachment can be made with automated equipment.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so that the bottom chip capacitor can save space.
Another object of the present invention is to provide a structure, insert, combination and method with the aforementioned characteristics, so that it can be used to provide more than one substrate precursor with silicon with cards on both sides, which can be selective and flexible The contacts are interconnected.
The other objectives and features of the present invention will be described in detail below with examples and accompanying drawings. Among them: Figure 1 is a partial isometric view of a "skeleton and muscle" contact structure in the form of an independent latch according to the present invention. Figure 2 is a partial isometric view similar to Figure 1, but shown is an elastic contact structure with elbows; Figure 3 is a side sectional view showing a multi-elbow and a multilayer conductive The contact structure of the shell; Figure 4 is a side sectional view of another embodiment of the contact structure of the present invention, in which the conductive shell is provided with a number of protrusions; Figure 5 is another embodiment of the contact structure of the present invention Side sectional view, where the elbows of the contact structure are filled with a conductive flexible elastic layer to make them closer together; Figure 6 is another contact that can be used with through holes on a printed circuit board according to the present invention An isometric cross-sectional view of the structure; Figure 7 is an isometric cross-sectional view of another embodiment of a contact structure that can be used with through holes on a printed circuit board according to the present invention, in which an elastic contact structure is provided on one side of the printed circuit board , The other side is provided with a contact structure that does not have to be elastic; Figure 8 is a side sectional view of another contact structure according to the present invention, in which a number of rod handles of the type shown in Figure 1 have been bridged together by a solder layer , According to the structure of a solder column; Figure 9 is a side isometric cross-sectional view of the contact structure of the present invention, wherein each contact terminal is provided with two spare elastic and flexible contact structures; Figure 10 is the present invention The side isometric cross-sectional view of another contact structure of the invention, in which the uppermost and lowermost ends of the three contact structures are bridged together by a layer of solder, and the middle elbow part is free of solder, so as to provide a flexible Solder column; Figure 11 is a side cross-sectional view of another embodiment of the contact structure according to the invention, in which the contact structure extends beyond an edge of the substrate to form a probe-type contact; Figure 12 is the present invention The side cross-sectional view of the other contact structure shows that the one used is a shielded contact probe; FIG. 13 is a side cross-sectional view of the other contact structure of the present invention, and a part of the contact structure is in cross-section. The contact can be started from one side of the contact carrier substrate such as a printed circuit board, and one of the contacts passes through a hole to the other side, and there is another contact structure extending from the same side; Figure 14 is the description of the present invention A side isometric cross-sectional view of an embodiment of another contact structure, in which a distal end of the probe has a topography that can minimize the contact resistance when it is engaged with another contact terminal; FIG. 15 is the same as FIG. 14 Similar view, but showing that the one used is a cantilever contact; Figure 16 is an isometric view of a contact structure of the present invention, and a part of it is a cross-section, in which the contact structure is formed in a loopFigure 17 is a view similar to Figure 16, but shows that each contact has two loops, and a solder layer is bridged between the loops to form a solder column; Figure 18 is a contact according to the present invention An isometric view of the structure, and a part of it is in section, in which the contact structure is arranged to form a fence so that it can be used, for example, as a dike for a large solder column of a thermal interconnection; Figure 19 is a first class An angle view, and one part is a cross-section, showing an insert according to the present invention; Figure 20 is an isometric view with a part of a cross section showing a double-sided insert; Figure 21 is another according to the present invention An isometric view of an insert, and one part is in section. One side of the insert is provided with an elastic contact structure, and the other side is provided with a weldable contact; Figure 22 is an implementation of another insert according to the present invention An isometric view of the example, and a part of it is a cross-section, in which a double-sided elastic and flexible contact structure and holder are used; Figure 23 is an isometric view of an active semiconductor assembly according to the present invention, and there is a part Part is a cross-section; Figure 24 is a side cross-sectional view showing the staggered contact structure and alignment pins; Figure 25 is a side cross-sectional view of a semiconductor package according to the present invention, showing a double-sided flip chip type Accessories; Figure 26 is a side cross-sectional view of a semiconductor package according to the present invention; Figure 27 is a side cross-sectional view of another semiconductor package embodiment of the present invention, which uses a detachable contact structure; Figure 28 is the present invention A side cross-sectional view of another semiconductor package using a detachable interconnected elastic contact structure and a plated through hole according to the present invention; Figure 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; Figure 30 Is a side cross-sectional view of another semiconductor package using alignment pins according to the present invention; FIG. 31 is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface according to the present invention; The side cross-sectional view of the other semiconductor package, showing that a number of capacitors are installed; FIG. 33 is a side cross-sectional view of another semiconductor package using decoupling capacitors according to the present invention; A side cross-sectional view of the semiconductor package of the motherboard; FIG. 35 is a side cross-sectional view of another semiconductor package using an interposer according to the present invention; FIG. 36 is another semiconductor package using an interconnection substrate according to the present invention, etc. The corners are round, and a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package, containing four layers of semiconductor devices in the form of a double-sided precursor; and FIG. 38 is a side-view cross-section of a semiconductor package according to the present invention The figure shows the silicon wafers stacked vertically.A solder layer is bridged between the loops to form a solder column; FIG. 18 is an isometric view of a contact structure according to the present invention, and part of it is a cross-section, in which the contact structure is arranged to form a fence , So that it can be used as, for example, as a dike for a large solder column of a thermal interconnection; Figure 19 is an isometric view, and part of it is a cross-section, showing an insert according to the present invention; Figure 20 is a Part of it is a cross-sectional isometric view showing a double-sided insert; Figure 21 is an isometric view of another insert according to the present invention, and a part is a cross-section, and one side of the insert is provided with an elastic contact structure , The other side is provided with a solderable contact; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and a part of it is a cross-section, of which the double-sided elastic and flexible Contact structure and holder; FIG. 23 is an isometric view of an active semiconductor assembly according to the present invention, and part of it is in cross-section; FIG. 24 is a side cross-sectional view showing the staggered contact structure and alignment pins; 25 is a side cross-sectional view of a semiconductor package according to the present invention, showing a double-sided flip chip type accessory; FIG. 26 is a side cross-sectional view of a semiconductor package according to the present invention; FIG. 27 is a side view of the present invention A side sectional view of another semiconductor package embodiment, in which a detachable contact structure is used; FIG. 28 is a side sectional view of another semiconductor package using a detachable interconnected elastic contact structure and plated through holes according to the present invention Figure 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; Figure 30 is a side cross-sectional view of another semiconductor package using an alignment pin according to the present invention; Figure 31 is the present invention A side cross-sectional view of the other semiconductor package carrying a capacitor under the surface; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is a view of the present invention Another side cross-sectional view of a semiconductor package using decoupling capacitors; FIG. 34 is a side cross-sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another semiconductor package using an embedded plug according to the present invention The side cross-sectional view of the package; Figure 36 is the equiangular circle of another semiconductor package using the interconnect substrate according to the present invention, and one part is a cross-section; Figure 37 is a side cross-sectional view of a semiconductor package, containing four layers It is a semiconductor device in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing silicon wafers stacked vertically.A solder layer is bridged between the loops to form a solder column; FIG. 18 is an isometric view of a contact structure according to the present invention, and part of it is a cross-section, in which the contact structure is arranged to form a fence , So that it can be used as, for example, a dike for a large solder column of a thermal interconnection; Figure 19 is an isometric view, and part of it is a cross-section, showing an insert according to the present invention; Figure 20 is a Part of it is a cross-sectional isometric view showing a double-sided insert; Figure 21 is an isometric view of another insert according to the present invention, and a part is a cross-section, and one side of the insert is provided with an elastic contact structure , The other side is provided with a solderable contact; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and part of it is a cross-section, of which the double-sided elastic and flexible Contact structure and holder; FIG. 23 is an isometric view of an active semiconductor assembly according to the present invention, and part of it is in cross-section; FIG. 24 is a side cross-sectional view showing the staggered contact structure and alignment pins; 25 is a side cross-sectional view of a semiconductor package according to the present invention, showing a double-sided flip chip type accessory; FIG. 26 is a side cross-sectional view of a semiconductor package according to the present invention; FIG. 27 is a side view of the present invention A side sectional view of another semiconductor package embodiment, in which a detachable contact structure is used; FIG. 28 is a side sectional view of another semiconductor package using a detachable interconnected elastic contact structure and plated through holes according to the present invention Figure 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; Figure 30 is a side cross-sectional view of another semiconductor package using an alignment pin according to the present invention; Figure 31 is the present invention A side cross-sectional view of the other semiconductor package carrying a capacitor under the surface; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is a view of the present invention Another side cross-sectional view of a semiconductor package using decoupling capacitors; FIG. 34 is a side cross-sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another semiconductor package using an embedded plug according to the present invention The side cross-sectional view of the package; Figure 36 is the equiangular circle of another semiconductor package using the interconnect substrate according to the present invention, and one part is a cross-section; Figure 37 is a side cross-sectional view of a semiconductor package, containing four layers It is a semiconductor device in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing silicon wafers stacked vertically.A fence, so as to be used, for example, as a dike for the bulk solder pillars of a thermal interconnection; Figure 19 is an isometric view, with a part of it in section, showing an insert according to the present invention; 20 is a partial isometric view of a cross-section showing a double-sided insert; Figure 21 is an isometric view of another insert of the present invention, and a part of it is a cross-section, and one side of the insert is provided with Elastic contact structure, the other side is provided with a weldable contact; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and part of it is in cross-section, and the one used is double-sided with elastic And flexible contact structure and holder; FIG. 23 is an isometric view of an active semiconductor assembly of the present invention, and part of it is in cross-section; FIG. 24 is a side cross-sectional view showing the staggered contact structure and alignment Pin; Figure 25 is a side cross-sectional view of a semiconductor package according to the present invention, showing a double-sided flip chip accessory; Figure 26 is a side cross-sectional view of a semiconductor package according to the present invention; Figure 27 is the present invention A side cross-sectional view of another embodiment of the semiconductor package according to the present invention, in which a detachable contact structure is used; FIG. 28 is another example of a semiconductor package using a detachable interconnected elastic contact structure and a plated through hole according to the present invention Side sectional view; Fig. 29 is a side sectional view of another semiconductor package using a locking spring according to the present invention; Fig. 30 is a side sectional view of another semiconductor package using an alignment pin according to the present invention; Fig. 31 Is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface according to the present invention; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is the present invention The side sectional view of another semiconductor package using a decoupling capacitor according to the present invention; FIG. 34 is a side sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another using embedded semiconductor package according to the present invention A side cross-sectional view of a semiconductor package of a plug-in; FIG. 36 is an isometric circle of another semiconductor package using an interconnection substrate according to the present invention, and a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package, A semiconductor device in the form of a double-sided precursor containing four layers; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing silicon wafers stacked vertically.A fence, so as to be used, for example, as a dike for the bulk solder pillars of a thermal interconnection; Figure 19 is an isometric view, with a part of it in section, showing an insert according to the present invention; 20 is a partial isometric view of a cross-section showing a double-sided insert; Figure 21 is an isometric view of another insert of the present invention, and a part of it is a cross-section, and one side of the insert is provided with Elastic contact structure, the other side is provided with a weldable contact; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and part of it is in cross-section, and the one used is double-sided with elastic And flexible contact structure and holder; FIG. 23 is an isometric view of an active semiconductor assembly of the present invention, and part of it is in cross-section; FIG. 24 is a side cross-sectional view showing the staggered contact structure and alignment Pin; Figure 25 is a side cross-sectional view of a semiconductor package according to the present invention, showing a double-sided flip chip accessory; Figure 26 is a side cross-sectional view of a semiconductor package according to the present invention; Figure 27 is the present invention A side cross-sectional view of another embodiment of the semiconductor package according to the present invention, in which a detachable contact structure is used; FIG. 28 is another example of a semiconductor package using a detachable interconnected elastic contact structure and a plated through hole according to the present invention Side sectional view; Fig. 29 is a side sectional view of another semiconductor package using a locking spring according to the present invention; Fig. 30 is a side sectional view of another semiconductor package using an alignment pin according to the present invention; Fig. 31 Is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface according to the present invention; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is the present invention The side sectional view of another semiconductor package using a decoupling capacitor according to the present invention; FIG. 34 is a side sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another using embedded semiconductor package according to the present invention The side cross-sectional view of the semiconductor package of the plug-in unit; FIG. 36 is the equiangular circle of another semiconductor package using the interconnect substrate according to the present invention, and a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package, A semiconductor device in the form of a double-sided precursor containing four layers; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing silicon wafers stacked vertically.There is an elastic contact structure, and the other side is provided with a weldable contact piece; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and a part of it is a cross-section, which is a double-sided tool Elastic and flexible contact structure and holder; Figure 23 is an isometric view of an active semiconductor assembly according to the present invention, and part of it is a cross-section; Figure 24 is a side cross-sectional view showing the staggered contact structure and the opposite Quasi-plug; Figure 25 is a side cross-sectional view of a semiconductor package of the present invention, showing a double-sided flip chip accessory; Figure 26 is a side cross-sectional view of a semiconductor package of the present invention; Figure 27 is A side cross-sectional view of another semiconductor package embodiment of the present invention, in which a detachable contact structure is used; FIG. 28 is another semiconductor package using a detachable interconnection elastic contact structure and plated through holes according to the present invention Figure 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; Figure 30 is a side cross-sectional view of another semiconductor package using an alignment pin according to the present invention; 31 is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface according to the present invention; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is A side cross-sectional view of another semiconductor package using a decoupling capacitor according to the present invention; FIG. 34 is a side cross-sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another use according to the present invention A side cross-sectional view of a semiconductor package with an embedded plug; FIG. 36 is an isometric circle of another semiconductor package using an interconnect substrate according to the present invention, and a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package , Containing four layers of semiconductor devices in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing vertically stacked silicon wafers.There is an elastic contact structure, and the other side is provided with a weldable contact piece; Figure 22 is an isometric view of another embodiment of the insert according to the present invention, and a part of it is a cross-section, which is a double-sided tool Elastic and flexible contact structure and holder; Figure 23 is an isometric view of an active semiconductor assembly according to the present invention, and part of it is a cross-section; Figure 24 is a side cross-sectional view showing the staggered contact structure and the opposite Quasi-plug; Figure 25 is a side cross-sectional view of a semiconductor package of the present invention, showing a double-sided flip chip accessory; Figure 26 is a side cross-sectional view of a semiconductor package of the present invention; Figure 27 is A side cross-sectional view of another semiconductor package embodiment of the present invention, in which a detachable contact structure is used; FIG. 28 is another semiconductor package using a detachable interconnection elastic contact structure and plated through holes according to the present invention Figure 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; Figure 30 is a side cross-sectional view of another semiconductor package using an alignment pin according to the present invention; 31 is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface according to the present invention; FIG. 32 is a side cross-sectional view of another semiconductor package according to the present invention, showing that several capacitors are installed; FIG. 33 is A side cross-sectional view of another semiconductor package using a decoupling capacitor according to the present invention; FIG. 34 is a side cross-sectional view of another semiconductor package using a motherboard according to the present invention; FIG. 35 is another use according to the present invention A side cross-sectional view of a semiconductor package with an embedded plug; FIG. 36 is an isometric circle of another semiconductor package using an interconnection substrate according to the present invention, and a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package , Containing four layers of semiconductor devices in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing vertically stacked silicon wafers.Another side cross-sectional view of a semiconductor package using a detachable interconnected elastic contact structure and plated through holes; FIG. 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; FIG. 30 is the present invention A side cross-sectional view of the other semiconductor package using alignment pins; FIG. 31 is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface of the present invention; FIG. 32 is another semiconductor package of the present invention A side cross-sectional view of a semiconductor package showing several capacitors installed; FIG. 33 is a side cross-sectional view of another semiconductor package using decoupling capacitors according to the present invention; FIG. 34 is a side view of another semiconductor package using a motherboard according to the present invention A side cross-sectional view of a semiconductor package; FIG. 35 is a side cross-sectional view of another semiconductor package using an interposer according to the present invention; FIG. 36 is an isometric circle of another semiconductor package using an interconnection substrate according to the present invention, And a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package containing four layers of semiconductor devices in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing The silicon wafers stacked vertically are produced.Another side cross-sectional view of a semiconductor package using a detachable interconnected elastic contact structure and plated through holes; FIG. 29 is a side cross-sectional view of another semiconductor package using a locking spring according to the present invention; FIG. 30 is the present invention A side cross-sectional view of the other semiconductor package using alignment pins; FIG. 31 is a side cross-sectional view of another semiconductor package carrying a capacitor under the surface of the present invention; FIG. 32 is another semiconductor package of the present invention A side cross-sectional view of a semiconductor package showing several capacitors installed; FIG. 33 is a side cross-sectional view of another semiconductor package using decoupling capacitors according to the present invention; FIG. 34 is a side view of another semiconductor package using a motherboard according to the present invention A side cross-sectional view of a semiconductor package; FIG. 35 is a side cross-sectional view of another semiconductor package using an interposer according to the present invention; FIG. 36 is an isometric circle of another semiconductor package using an interconnection substrate according to the present invention, And a part is a cross-section; FIG. 37 is a side cross-sectional view of a semiconductor package containing four layers of semiconductor devices in the form of a double-sided precursor; and FIG. 38 is a side cross-sectional view of a semiconductor package according to the present invention, showing The silicon wafers stacked vertically are produced.
In general, the contact structure of the present invention is used in a device containing an electronic component. The electronic component is provided with a surface and a conductive contact piece, and the contact piece is accessible from the surface of the electronic component and also has a surface. A flexible elongated element is provided with first and second ends. There is also a tool capable of connecting the first end to the contact piece for forming a first tight connection with the free second end. This soft and elongated element, and at least the part of the surface of the contact piece that is immediately adjacent to the first end and the contact piece bonding tool, is encapsulated by a conductive shell to provide a second tight bond, so that the contact piece is electrically conductive. The bonding strength between the shells is greater than the bonding strength between the contact piece and the soft elongated element.
Please refer to the diagram for details. The contact structure 101 shown in FIG. 1 is used to contact an electronic component 102, and the electronic component can be, for example, a plastic laminated chip active or passive semiconductor device, ceramic or ceramics carrying more than one semiconductor device Silicon package. It can also be an interconnected component like a connector. Or, it can be a production, test, or burn-in jack for semiconductor packaging or semiconductor devices. In any case, this item can also be referred to as the electronic component 102 of the supporting structure , which is used to carry the contact structure 101. The electronic component is provided with more than one conductive contact strip 103. The contact strips are usually located on the same plane of a surface 104, or are located in different places and on various planes with different angles. The surface 104 of the electronic component 102 is close. These contact pieces 103 can be arranged around the periphery of the electronic component 102. In addition, they can also be arranged in an area array, near an edge, or in a pad-out in a manner that is easy for those skilled in the art, or the aforementioned various configurations can be combined and used. Generally, each contact piece 103 has its own electrical function. However, in some applications, the contact pieces 103 may actually be located on different planes or pressed on the edge of a component. In addition, the contact piece 103 can have any desired shape, for example, it can be a flat circle or a rectangle, and have an exposed surface 105. The contact strip 103 shown in the embodiment can be of any size, but it is usually between 2 and 50 mils.
The contact structure 101 includes an elongated element 106. Due to the small diameter and the need for flexibility for easy molding, the elongated element is usually soft and is provided with first and second ends 107 and 108. It can also be called core wire or "skeleton". The elongated element 106 is formed of a suitable conductive material, such as gold, aluminum, or steel, plus a small amount of other metals selected to obtain the desired physical properties, such as beryllium, cadmium, silicon, and magnesium. In addition, metals or alloys such as platinum can also be used. Alternatively, the elongated element can also be formed using lead, tin, indium or alloys thereof. The diameter of the elongated element 106 can be between 0.25 and 10 mils, but is preferably between 0.5 and 3 mils. The elongated element 106 can also be of any desired length, but its length usually matches its related use in small semiconductor devices and packages, and is between 10 and 500 mils.
Between the first end 107 of the conductive elongated element 106 and a certain contact piece 103, a tool for forming a first tight bond is provided. Any suitable tool that can achieve this connection can be used. For example, using a capillary tube (not shown) to allow the elongated element 106 to pass therethrough, and usually provided with a round ball at the first end of the wire bonding member to make it bond with the contact strip 103, and then apply pressure and temperature or Ultrasound. The formed wire bonding member is usually a spherical bonding member 111 that can connect the first end 107 of the elongated element 106 with the contact strip 103. After the desired wire bonding member 111 is formed, the capillary tube can be lifted so that the elongated element 106 protrudes from the capillary for a desired length, and then the elongated element 106 can be cut by partially melting the wire, resulting in the elongated element The second end 108 of 106 forms a round sphere 112, and a corresponding round sphere is also formed on the elongated element 106 remaining in the capillary, so that when you want to make the connection of the spherical joint, you can contact the next one. The chip uses the same wire bonding machine to make the next contact structure. Alternatively, a wedge-shaped joint can also be used.
According to the present invention, a conductive shell 116, which can also be called a "muscle" to cover the "skeleton", is formed on the elongated element 106, which connects the elongated element 106 and the contact piece 103 to the surface surrounding the wire bond 111 The area 105 is completely enclosed, and at the same time, it is better to extend above the contact piece 103, by directly bonding with the entire exposed surface of the contact piece, so as to form a second tight bond of the contact piece 103. Therefore, the first and second close combination can be used to fix the contact structure 101 on the contact piece 103. In addition to conductive properties, the conductive shell 116 also has other mechanical properties desired by the composite contact structure 101 described later.
The conductive shell 116 is formed of a material that can provide various mechanical properties to the contact structure. The material should basically belong to a material with a high bending strength of at least 30,000 pounds per square inch. As far as the contact structure of the present invention is concerned, the adhesion strength between the contact structure 103 and the contact sheet 103 must be at least 50% due to the adhesion between the conductive shell 111 and the contact sheet 103. The wall thickness of the conductive shell 116 is usually between 0.20 and 20 mils, but preferably between 0.25 and 10 mils. According to the present invention, the conductive shell 116 is adhered to the elongated element or frame 106 along its entire length, and adheres to the surface of the contact sheet 103, so as to actually form a single structure. Compared with the material of the conductive shell, the rigidity of the elongated element or skeleton 106 is lower. If you want to have a plastically deformable contact structure, you can use copper or conductive materials such as lead-tin solder to form a conductive shell. If the conductive shell 116 is desired to have elastic properties, nickel, iron, cobalt, or alloys thereof can be used. As for other materials that allow the conductive shell 116 to have desired properties in some applications, they are copper, nickel, cobalt, tin, boron, phosphorus, chromium, tungsten, molybdenum, bismuth, indium, cesium, antimony, and gold. , Silver, rhodium, palladium, platinum, ruthenium, and their alloys. Generally, the top layer containing the conductive shell may be made of gold, silver, platinum type metals or alloys, or various solder alloys when necessary. In addition, certain materials, such as nickel, will form internal compressive stress when electroplated on the elongated element 106 under certain electroplating bath conditions, thereby increasing the stress required to cause deformation or fracture of the related contact structure . Certain materials, such as nickel, can provide tensile strength of more than 80,000 pounds per square inch.
The conductive shell or "muscle" 116 made of more than one of the aforementioned materials can usually be formed on the soft slender element or "frame" by the conventional water electroplating technique. The slender element 106 can be encapsulated by the physical or chemical vapor deposition technology used in the conventional thin film process, and the conductive shell 116 can also be formed. At the same time, it can include the decomposition process using gaseous, liquid or solid precursors, as well as evaporation or sputtering, etc. .
Therefore, it can be seen that all the final properties that the contact structure 101 intends to possess can be easily designed into the contact structure 101 composed of the skeleton 106 and the muscle 116, and at the same time, the first sum formed by the contact piece 103 can be easily designed. The second tight bond achieves the desired conductivity and other physical properties, such as the desired peel strength or adhesion. The conductive shell or muscle 116 that completely encloses the elongated element or skeleton 106 is located above the contact sheet 103 to form a second adhesive bond with it.
The foregoing is the description of the single contact structure 101. However, during the process of electroplating or accumulating a single electronic component or several of these electronic components, it is known that hundreds of contact structures 101 can be created.
The total length of the conductive shell 116 and the thickness pressed on the contact piece 103 are substantially the same. Or, as long as the properties of each plating layer of the conductive shell are adjusted, or various accumulation parameters are changed, the thickness of the conductive shell can be changed. The sphere 112 is usually arranged on the second or free end of the elongated element 106 below the conductive shell 116, and the uppermost free end of the contact structure or the plug 101 can be made slightly larger to reflect its shape. It should be understood that if the melting technique is changed to use other methods to cut the continuous core wire, the sphere 112 provided on the second end of the elongated element 106 can be omitted when necessary. At that time, the second end will be a substantially cylindrical member with the same diameter as the elongated element 106.
If you want to make the contact structure flexible, you can use the contact structure shown in Figure 2. The flexible elongated conductive element 122 of the contact structure 121 can be formed of the same conductive material as the elongated element 106 shown in FIG. 1. The element is provided with first and second ends 123 and 124, and on the first end 123 is provided with a spherical connecting member 126, which is adhered to the contact sheet 103 in the same manner as the spherical connecting member 111. When the elongated conductive element 122 is sent out through the capillary tube of the wire bond, a cantilever or cantilever portion 122a forms an elbow. Therefore, an elbow capable of forming at least one cantilever portion is provided. The elbow can give the contact structure 121 elasticity according to the details as described later. After the elbow 122a is formed, a sharp tip 127 is provided on the second end 124 by appropriate cutting operation. Subsequently, in the same manner as the aforementioned conductive shell 116, a conductive shell 131 is formed on the elongated conductive element 122 so as to enclose the elongated conductive element 122 and adhere and press on the contact sheet 103. It can be understood here that in addition to the shape shown in FIG. 2, various other shapes may also be adopted.
In order to increase the strength of the contact structure 121, the conductive shell 131 needs to be made of a material with high bending deformation strength, for example, a hard conductive material of the aforementioned thickness matched with FIG. 1. The conductive material can be selected from the group consisting of nickel, cobalt, iron, phosphorus, boron, copper, tungsten, phosphorus, chromium, tungsten, molybdenum, rhodium, chromium, ruthenium, lead, tin, and alloys thereof.
In the contact structure 121, it can be seen that the trace or shape of the contact structure 121 is defined by the elongated conductive element 122. The mechanical and physical properties of the contact structure are defined by the conductive shell 131, such as the elasticity of the contact structure and the precious metal The top layer has low resistance spring load contact capability. It can be seen from FIG. 2 that when the second or free end of the contact structure 121 moves up and down, the cantilever or elbow 122a can easily cooperate with the position change of the second free end to prompt the second end of the contact structure 121 to return to its original position. It rebounds within the range of the specific design of the position and provides a substantially constant flexural force. For the force applied to the surface of the electronic component 102 at an angle, the shape of the spring can be designed to respond in an elastic manner.
Figure 3 shows another contact structure 136 of the present invention, in which the soft and elongated conductive element 137 is provided with two elbows 137a and 137b, and is provided with a spherical joint 138 at one end and a circle at the other end.Sphere139. As shown, the elbows 137a and 137b face each other in opposite directions. In addition, there is also a type of conductive shell 141 as described above, but it is composed of a first or inner layer 142 and a second or outer layer 143. For example, the form of the first or inner layer 142 may be a nickel or nickel alloy plating layer with a suitable thickness, such as 1 to 3 mils thick, so as to make the contact structure have the desired elasticity and/or bending deformation strength. Assuming that it is desired to provide a certain type of outer surface for the contact structure 136, the second or outer layer 143 can be formed of gold or other suitable conductive materials. In some applications, it may be desirable to use the first or inner layer 142 as a barrier, in order to prevent the interaction of gold and solder, for example, when the contact structure 136 is used in conjunction with a solder contact. In such applications, it may also be desirable to first coat the soft and elongated conductive element 137 with a thin layer of copper or nickel, and then apply 1 to 1.5 mils of solder such as lead-tin alloy. Therefore, it can be seen that if a conductive shell with more than two layers is formed, the contact structure can obtain other desired characteristics. In addition, it should be noted that in some applications, several more layers can be provided as necessary as part of the conductive shell.
FIG. 4 shows another contact structure 146 of the present invention, in which the soft elongated conductive element 147 is provided with an elbow 147a facing outward, and the conductive shell 148 encloses the soft elongated conductive element 147. However, in this embodiment, the conductive shell 148 is formed by providing a number of micro-protrusions 149 longitudinally spaced along its entire length on its outer surface. There are many ways to form these protrusions or irregularities. For example, the processing conditions of the electroplating bath can be adjusted to form sharp nodes in the conductive shell 48.
The one shown in FIG. 5 is another contact structure 151 of the present invention, which includes a soft and elongated conductive element 152 having a conductive shell 153 thereon and a cantilever portion 152a in the form of a U-shaped elbow. In order to reduce the electrical induction generated by the conductive period of the contact structure 151, the elbow 152a is embedded in an appropriate type of conductive polymer block 154, such as silicon rubber filled with silver particles. However, the flexible conductive elastic body 154 does not substantially limit the movement of the elastic part of the contact structure 152. At the same time, the conductivity of this material 154 can usually be in the range of 10 to 10 ohm cm.
The contact structure 155 shown in FIG. 6 is similar in type to that shown in FIG. 2 and is provided for an electronic component like the conventional printed circuit board 156. The printed circuit board 156 is provided with conventional longitudinal intermediate conductors (via conductors) in the form of plated through holes 157, in which a plated layer structure 158 passes through the through holes to form loops arranged on the opposite surface of the printed circuit board 156 158, so that one side of the circuit board 156 can be energized with the other side. As shown in the figure, a contact structure 155 is provided on both sides of the printed circuit board 156, and both of them are in contact with the electroplating layer structure 158 that serves as a contact piece and forms a ring 159. Therefore, for the circuit board 156 provided on the opposite sides of the plated through hole 157, the electronic components facing each side are energized by the contact structure 155. It can be seen from the figure that the conductive shell 131 as a part of the contact structure 155 can also pass through the plated through hole 157 and be placed on the annular plated layer 158 on both sides of the plated through hole 157. During the attaching process of the flexible and elongated conductive elements of the contact structure 155, this structure can be easily manufactured by turning the printed circuit board 156 over. As described later, this type of construction can be used on inserts. Using this contact structure 155, the opposite sides of the printed circuit board have flexibility, so that the mating contact pieces on the electronic component can be face-to-face joined with the insert with the contact structure shown in FIG. 6.
If only one side needs to be flexible, the structure shown in Figure 7 can be used. In this embodiment, the contact structure 161 arranged on one side, for example, on the bottom side from the viewing angle of FIG. 7, includes a soft and elongated conductive element 162, and this element has a spherical joint In the form of a first coupling member 163 fixed on the metal plating layer 158. This contact structure 161 forms a loop spanning the through hole 157, and uses appropriate tools, such as a second bonding member 164 in the form of a wedge-shaped bonding member known to those skilled in the art, and a wire bonding machine used in the semiconductor industry. Glue it to the other side of the ring 159. As for the soft and elongated conductive element 162, it is covered with the same material as the conductive shell 166 mentioned above. It should be understood here that since the underside of the electronic component 156 does not have to be flexible, the contact structure 161 can be replaced by a straight pin-shaped contact structure 101 as shown in FIG. 1.
The contact structure 171 shown in FIG. 8 is another embodiment of the present invention that can be used to form a solder pillar. This contact structure 171 is a composite contact structure consisting of three types of "skeleton" structures 106 that are substantially separated from each other by 120 degrees as shown in FIG. 1 and are mounted on the same contact sheet 103. After the three "framework" structures 106 are completed, the first continuous conductive shell layer 172 is deposited on the elongated frame and the conductive contact sheet 103 to form a contact structure similar to the conductive contact structure 101. Then a layer of solder layer 174 is plated between them to make the contact structure into a solder pillar. The solder may be a suitable type such as a lead-tin alloy, which is used to bridge between the pin-shaped contact structure and the coating surface of the terminal 103 to form the solder column-shaped contact structure 171. Depending on the purpose of the solder column, its size has different changes. For example, its diameter can range from 10 to 50 mils, but it is usually 10 to 20 mils, otherwise its height can be 10 to 200 mils. Between 20 and 150 mils. As mentioned above, if a non-melting cutting operation is used, the sphere 112 of the contact structure 101 can be omitted if necessary.
A composite contact structure 176 shown in FIG. 9 is provided with two contact structures 177 mounted on the same contact piece 103. They respectively have cantilever portions 177a and 177b facing in different directions, so as to provide two contact pieces for each contact piece. Spare elastic and flexible contact structure 177.
The one shown in Figure 10 is another composite contact structure 181, in which the upper and lower ends of the contact structure 177 are bridged by solder 182, but the part 121 of the contact structure with elbows 177a and 177b is not bridged, so that it can still be held. Flexible. It should be understood from this arrangement that there can be three contact structures 177 of this type that are separated by 120 degrees from each other with solder 182 interposed therebetween, and the contact structure 177 does not need to be elastic in order to form a solderable contact.
Figure 11 shows another embodiment of the contact structure of the present invention. It belongs to a probe-shaped contact structure 186, which includes a soft and elongated conductive element 187, and one end of this element is fixed to the contact piece 103 Place. The flexible elongated element 187 is provided with a curved cantilever portion 187a. The other part 187b extends downward over an edge of the electronic component 102, or passes through a feed through hole of the type described above, and is bonded to a protective metal plating layer 188 with a suitable tool such as a wedge-shaped bonding piece. For example, a thick photoresist 189 with a spacer function is used to fix the aluminum layer on the device 102. After that step is completed, the aluminum layer 188 can be etched away with an appropriate etching, such as sodium hydroxide. Then, the flexible elongated element 187 is plated with a conductive shell 190 formed of the aforementioned nickel-cobalt alloy or other suitable materials in the manner described above to provide an independent spring-like contact structure 186 and bend it farther. The end is located at a certain position below the electronic component 102. The material used in the conductive shell 190 can control the deflection characteristics of the probe-shaped contact structure. Alternatively, the conductive shell 190 may be completed first, and then the protective layer 188 may be etched away. It should also be understood that the combination of the elongated element and the terminal 103 may be a wedge-shaped type, while the combination with the protective structure 188 may be a spherical combination.
The one shown in FIG. 12 is another probe-shaped contact structure 191 that is provided with a soft elongated element 192 and is coupled to the contact sheet 103 by a coupling piece 193. As in the previous embodiment, the flexible elongated element 192 is provided with a cantilever or elbow 192a and another part 192b. The other part 192b extends beyond the edge 194 of the electronic component 102 or passes through a hole provided in the component. The conductive shell 195 is arranged on the flexible elongated element 192. An additional plating layer is provided on the conductive shell 94, including a plating layer 196 formed by a dielectric material and a metal layer 197 coated thereafter. If the metal layer 197 is grounded, the probe-shaped contact structure 191 provided provides a shielding contact that controls impedance. Therefore, the probe-shaped contact structure can be used in a system where shielding is desired or necessary to improve the electrical performance of the probe-shaped structure 191. As shown in FIG. 12, the most distal part of the probe-shaped contact structure 191 can be left uncoated with the dielectric layer 196 and the metal layer 197 so as to be in direct contact with another contact piece or another structure.
Figure 13 shows a contact structure 201 according to another embodiment of the present invention, in which an electronic component 202 in the form of a printed circuit board can be used as an insert as described later. As in the previous embodiments, this electronic component is provided with a through hole 203, and a plating layer is provided around the through hole to provide a contact sheet 204. The contact structure 201 is of the aforementioned type, and has a part 206 extending upward from one side of the electronic component 202 and another part 207 extending downward through the through hole 203 to the other side of the electronic component 202. The other part 207 is temporarily bonded to a protective substrate (not shown) that will be subsequently removed by etching as described above. It can be seen from this structure that both sides of the electronic component 202 can be energized.
Figure 14 is another embodiment of the contact structure 211 of the present invention, in which the protective aluminum layer 212 is applied during construction. Where a contact sheet is to be formed on the aluminum layer 212, a number of recesses or holes 213 are first formed on the surface of the aluminum layer 212. As shown in the figure, the form of these recesses or holes 213 may be an inverted pyramid shape with the apex at the bottom. Then, the recess or hole 213 of the aluminum layer is filled with a conductive material 214 such as gold or rhodium. However, a nickel plating layer 216 and a gold plating layer 217 are plated again. The flexible elongated conductive element 218 formed of a suitable material such as gold or aluminum is then bonded to the gold-plated layer 217 by a suitable tool such as a bonding member 219. The flexible elongated element 218 first extends through an elbow 218a, and then above one side of the electronic component 102, and extends to the top of the contact piece 103, and is joined to the contact piece 103 in a suitable manner, for example, using a joining member 220. superior. Subsequently, a conductive shell 221 made of the aforementioned spring alloy material is deposited on the flexible elongated element 218 and extends to cover the contact piece 103 and the gold-plated layer 217 to complete the contact structure. As long as the properties of the conductive shell 221 and the track of the connecting member or the bent portion 218 are appropriately combined, the desired elasticity can be obtained.
During electroplating, a suitable resist can be used to cover the protective aluminum layer 212 in a manner known to those skilled in the art. After the contact structure is completed, the resist can be removed, and the protective aluminum layer 212 can be dissolved in the aforementioned manner, so that the free end of the contact structure 211 provides a contact piece 224. In this way, it can be seen that the contact piece can be made into a controlled geometric shape, such as a shape with several sharp points, so that these sharp points can be used to exert local high-voltage force in order to contact another piece on the semiconductor device. When a contact piece, such as an aluminum piece, is in contact, it can break the oxides remaining on the aluminum piece and deform the aluminum piece around the sharp point, thereby generating a good energizing effect with it. When a relatively low overall force is applied to the contact piece 224 at that time, this high contact force can be generated.
FIG. 15 shows another contact structure of the present invention, which shows that the contact piece 227 is carried by the free end of the contact structure 226. One end of the rectangular contact piece 227 carries a probe 228 in a hanging shape. The contact piece 227 is made in a similar manner to the contact piece 224, and can be provided with, for example, a nickel or rhodium tip or probe 228 and a plating layer 229 also made of nickel or rhodium. The plating layer 229 covers a nickel alloy isolation layer 231, otherwise the isolation layer 231 covers a gold plating layer 232. The soft and elongated material 236 made of conductive material is connected to the contact piece 103 by a bonding member 237, and extends above the edge of the semiconductor structure 102 through a cantilever or elbow 236a, and in an appropriate manner, such as a bonding The member 238 is bonded to the gold plating layer 232. A conductive shell 239 is plated on the flexible elongated element 236 and the connecting members 237 and 238. The conductive shell 239 is a solid alloy of the type described above, and extends over the contact piece 103 and the entire gold-plated layer 232. It can be seen from this type of contact structure 226 that a curved arm probe 228 is provided to improve the control ability of the deflection of the contact structure 226 to the load behavior.
Figure 16 shows another contact structure 241 of the present invention. The contact structure shown is bent into a loop. The way to achieve this is to explore the soft elongated element 242 made of conductive material, join it to one side of the contact piece 103 in an appropriate manner, for example, with a spherical joint 243, and then form the soft elongated element into a substantially integrated shape. The U"-shaped top-down loop 242a is then used to join the other end of the soft elongated element to the other side of the contact piece 243 with a suitable tool, such as a wedge color joint 244. Then, a conductive shell 246 can be formed on the flexible elongated element 242 by the aforementioned method of depositing on the edges of the bonding members 244 and 246 and the contact sheet 103. Using this method, a relatively rigid contact structure 241 can be provided. It should also be understood that, if necessary, more than one loop-shaped contact structure 241 can be formed on the same contact sheet 103. For example, two such structures can be separately provided on the same contact piece 103.
Figure 17 shows another contact structure 251 of the present invention, which is composed of two contact structures 241 separately installed on the same contact sheet 103 as described above, wherein a line is formed on these contact structures 241 The solder layer 252 bridges the U-shaped spaces provided between the contact structures 241 accordingly. In addition, as shown in the figure, the solder can bridge two separate contact structures 241 to provide a solder bump 253. However, it should be understood that the two contact structures 241 can be separated if necessary, so that the solder will not cause bridges between the two contact structures 241, but only between the bridges formed on the contact structures. They are bridged in between, so as to provide separate solder bumps on the contact sheet 103.
FIG. 18 shows another contact structure 256, in which a large contact piece 103 is provided on the semiconductor component 102 or other electronic components. The contact structures 241 described above are arranged around the outer periphery of the contact piece 103. The inner slender element or skeleton is initially combined with a spherical joint 243, and the subsequent loops are combined with a wedge-shaped joint 244, so as to actually form a rectangular fence that can enclose a certain range. Then, a layer of conductive shell (not shown) is coated on the inner elongated element in the same pattern as the aforementioned conductive shell (not shown). The rectangular fence can then be filled with solder (not shown) to provide a free-standing solder contact or protrusion that can be used as a heat sink when necessary.
The insert 301 shown in FIG. 19 includes a substrate 302 having first and second flat surfaces 303 and 304. The appropriate thickness of the substrate 302 can be, for example, between 5 and 200 mils, but is preferably between 20 and 100 mils. The substrate 302 can be formed of a suitable material, such as molded plastic that can be used as an insulator, and is provided with a plurality of holes 306 separated and passed through the first flat surface 303, and a plurality of holes separated and passed through the second flat surface 304 307. The cross-sectional shape of the holes 306 and 307 can be any desired shape, such as a circle. As shown in the figure, the holes 306 and 307 are eccentric. Therefore, each of the holes 306 and 307 is provided with a straight wall portion 308 extending perpendicular to the surface through which it passes, and may include an inclined wall portion 309 that slopes inwardly and downwardly into the hole. It can be seen from Figure 19 that the holes 306 and 307 are arranged in pairs, in which the paired holes are slightly offset from each other and are interconnected by a channel 311 passing between them, thus actually becoming a through hole. The single hole of the substrate 302 is offset by a portion of the hole located on one side of the corresponding portion passing through the other side of the substrate. Therefore, it is actually equivalent to providing a composite hole 311, which can be electroplated by conventional methods, such as the method used in printed circuit boards, to provide electroplated through holes, with electroplated layers formed of materials such as copper, or even on them. Choose to paint with gold. Due to the offset between the pairs of holes 306 and 307, a flat shoulder 316 is provided at the bottom of each of the holes 306 and 307, and an electroplating layer 313 is plated thereon. The shoulder 316 on which the electroplating layer 313 is plated forms an area where the flexible contact structure 121 of the aforementioned type and shown in FIG. 2 can be placed. The material of the conductive shell 131 forming the contact structures also extends from above the electroplating layer 313 that is electroplated through the composite hole 312 so as to form a good bond between the contact structure 121 and the electroplating layer 313.
It can be seen from FIG. 19 that the contact structure has an appropriate length such that its free ends protrude from the flat surfaces 303 and 304 on the opposite sides of the substrate 302 to contact the electronic components as described later. The appropriate distance between the free ends of the interconnection structure 121 may be, for example, 200 mils, but is preferably between 20 and 100 mils. The substrate 302 can be made of various types of plastics. For example, they can also be polyetherimide, polysulfone, or liquid crystal polymer-based plastic molding materials.
In the configuration shown in Figure 19, the electrodes of each pair are insulated from each other. However, it is obviously known that, if necessary, as long as the conductive parts of the electroplating layer 313 are arranged on the flat surfaces 303 and 304, proper interconnection can be achieved. For example, the common plated parts of the flat surfaces 303 and 304 can be used as power and ground planes for proper interconnection with power and ground contacts.
The one shown in FIG. 20 is a double-sided insert 321, which includes a plastic substrate 322 in the form of a thin plastic plate made of a suitable material such as polyimide. A number of spaced holes 323 can be drilled or molded in the substrate 322. The substrate may also be in the form of an epoxy resin reinforced laminate, such as epoxy resin reinforced with glass fiber, with holes 323 drilled therebetween. The electroplating layer 324 of the same type as the foregoing is used as a plating layer for the entire hole 323, and metal plating layers 326 and 327 are provided on the top and bottom sides of the substrate 322 as shown in FIG. 20. However, as far as the present invention is concerned, it can be understood that the metal plating layer 327 provided on the bottom side of the substrate 322 can be omitted when necessary. A contact structure 201 similar to that shown in FIG. 13 may be installed on the conductive layer 326 adjacent to the plated through hole 323. The contact structure 210 includes a contact structure 121 extending from one side of the substrate 322 in an elastic manner. On the other hand, another contact structure 201 extends from the other side through a hole 323 so as to become a probe-type contact piece on that side. . It can also be understood that, if necessary, a circuit system can be provided on the substrate 322 to connect with the contact structures 121 and 201. In addition, pins (not shown) can also be provided on the substrate 322 to align the insert 321 with other electronic components as described later.
The one shown in FIG. 21 is another insert 331 of the present invention, in which the elastic contact structure 121 is provided on one side of the substrate 332, and the solderable contact 334 is provided on the other side. Plated through holes or vertical intermediate conductors 336 are provided in the substrate 332. The type of standoff 161 described in conjunction with FIG. 7 is set on the opposite side of the substrate and connected to the electroplated layer 337 on which the contact structure 121 and the standoff 161 can be installed. Therefore, it can be seen that the insert 331 can form elastic contact with the solder holder or solderable joint on the other side from one side.
The insert 341 shown in FIG. 22 is provided with double-sided elastic contact structures 121 which are located on opposite sides of a substrate 342 with a plated through hole 343 and a holder 346. The holder 346 has a loop shape and is installed on the metal plating layer 347 carried by the substrate 342 and can be located anywhere on the substrate 342. It can be seen from FIG. 22 that the height of the holder 346 is lower than that of the contact structure 121, so that if the electronic component in contact with the contact structure 121 is subjected to improper pressure, it will resist the bending deformation force of the contact structure 121. The retraction movement is prevented by the anchor 346. The holder 346 can be made in the same way as the aforementioned contact structure 121, that is, a conductive shell covering the frame. However, it should be understood that the combination of the two ends of the soft and elongated element inside the fixture can be explored with a wedge-shaped combination when necessary.
The one shown in FIG. 23 is an active semiconductor device assembly 351 related to the present invention. The combination 351 includes a semiconductor device 352 in the form of a silicon body, which is made in a manner known to those skilled in the art, and has a plurality of metal plating layers and connections inside. It is provided with an aluminum alloy metal plating layer 353 covered with a pure layer 354 on the top. The contact structure 355 passes through the holes 356 provided in the purification layer 354 and is connected to the aluminum metal plating layer 353 as described above. It can be seen from FIG. 23 that the top tips of the contact structure 355 are aligned in two rows, and the staggered contact structures 355 in each row are offset from the top tips of the other contact structures 355, so as to provide a three-dimensional fan expansion (fan -outs) interleaved configuration. The distance between the aluminum sheets on the semiconductor device 352 may be a certain distance represented by the letter D, for example, 5 mils. As for the distance between the staggered free ends of the contact structure 355, it can be a larger distance as represented by the letter mD in FIG. 23, such as 10 or 15 mils. As long as the free ends of the contact structure 355 are provided with different offsets, the result of different distances between the free ends can be easily achieved. Therefore, for a group of contact structures 355 composed of interlaced contact structures 355, the elbows provided can be larger than those of other contact structures 121 in the same row, so that the free ends of the contact structures 121 can be offset as desired. Using this method, it can be seen that the contact pads can be arranged in a relatively dense geometric arrangement with larger separations on the semiconductor device for interconnection with another device.
If necessary, an encapsulation member 357 extending from above the bottom of the contact structure 355 and above the surface of the semiconductor device 352 and pressed onto the purification layer 354 can be optionally added (see FIG. 23). In addition, if necessary, an encapsulating member 357 can be added to the lower end of the contact structure 355 as shown in FIG. 23 to encapsulate the lower part of the contact structure 355. When necessary, all of these contact structures 355 can be provided with these encapsulation members 357. The applied encapsulation 357 helps prevent or at least mitigate handling damage that the semiconductor device may suffer during assembly operations.
The one shown in FIG. 24 is an active semiconductor device assembly 366 according to another embodiment of the present invention, which includes a semiconductor device 367 in which a contact pad or region 368 is formed with aluminum metal plating. For example, the active semiconductor device can be a memory chip or a microprocessor. Most of the surface of the semiconductor device 367 is covered by a purification layer 369. On the purification layer 369, the holes 371 can be etched in a manner known to those skilled in the art, such as using photoresist or a suitable etching. After the hole 371 is formed, a continuous short-circuit layer (not shown) is deposited on the pure layer 369 and the aluminum alloy contact sheet 368. Next, a photoresist layer (not shown) is formed, and then formed in the photoresist layer to align with the hole 371, but the diameter can be 0.5 to 5 mils more, but preferably 1-3 Mill's hole (not shown). After that, a metal plating layer 376 is formed in the larger hole of the hole 371 and the photoresist layer in the form of a suitable material, such as a layer of nickel and a layer of gold, and then the photoresist layer is peeled off by a conventional method. So that only the metal plating layer 376 is left, and the short-circuit layer is etched away outside of the place below the metal plating layer 376. As shown in FIG. 24, the thickness of the deposited metal plating is 1-3 mils, and an annular protrusion 376a is provided.
As shown in the figure, a contact structure 381 similar to the contact structure 121 is set in the cup-shaped metal plating layer 376, and the soft elongated element or skeleton 382 is bonded to the cup-shaped metal plating layer 376 with a spherical joint, and the conductive shell 383 It is plated on the entire top of the annular protrusion 376a so as to actually provide a cap with a larger diameter. Alternatively, the framework can be combined in the holes 371 first, and then the conductive shell or muscles can be deposited to build the contact structure 381 in these holes, and then the photoresist layer can be peeled off, and the short-circuit metal layer can be etched Lose.
As shown in FIG. 24, the contact structure 381 can have different shapes, some of which have larger elbows, others have smaller elbows, and those with larger elbows have longer cantilevers. The extension directions of every other contact structure 381 are opposite, so that the distance mD between the adjacent independent ends and the distance D between the cap 376 are different. It can be seen from this that as long as the contact structure 381 is set with different angles and shapes, these independent ends can be positioned on a plane parallel to the plane where the active semiconductor device 367 is located, but the spacing between the free ends can be the same as The spacing between the bottoms of the contact structures is quite different in order to provide the desired spacing at the independent ends. In other words, it can be seen from the combination of semiconductor devices shown in FIG. 24 that the contacts can be provided on a semiconductor device at a certain interval. On the contrary, the independent ends of the contact structure provided on the device can be separated from each other. Keep the same or different intervals.
In addition, FIG. 24 also shows that in order to make the semiconductor device assembly 366 easy to align with other electronic components, such as a printed circuit board, an alignment pin 386 may be formed at the same time as the contact structure 381 is formed. Although only one alignment pin 386 is shown in FIG. 24, it should be understood that several such alignment pins 386 can also be provided on the semiconductor device assembly 366. In order to facilitate the formation of these alignment pins 386, when the metal plating layer 376 is provided on the purification layer 369, the metal plating contact piece 387 is set at an appropriate place, usually on the purification layer 369. Therefore, while forming other contact structures 381, a frame 388 and a conductive shell 389 can be used to form the alignment pins. It can be seen from this that, without a significant increase in the assembly cost of the semiconductor device assembly 366, it is very easy to fit the contact structure 381 to provide a desired number of alignment pins.
The active semiconductor device 367 is usually made of, for example, a wafer having a diameter of 8 mm. Although it is currently possible to provide a semiconductor device assembly with a thickness of only 10 mils, the thickness of the wafer is preferably between 15 and 30 mils, and more preferably between 15 and 25 mils. With the structure shown in FIG. 24, it is impossible to provide an elastic contact structure 381 that can protrude from the edge or outer boundary of each chip on a wafer. Therefore, the semiconductor device in the wafer can be contacted before the die-cutting of the wafer. This die cutting or dicing operation is generally called singulation, in which the wafer is cut into singulation of semiconductor devices. In order to cooperate with the design of the semiconductor device assembly 366, the contact device 381 is preferably positioned in the manner shown in FIG. 23 so as to minimize the surface area required for singulation die cutting. These areas that will be cut are commonly known as scribe streets. If the contact structures 381 capable of offsetting as shown in FIG. 24 are alternately arranged on those contact pieces, the interconnection interval with other electronic components can be increased.
It can be seen that the process of the present invention is suitable for semiconductor devices in the form of wafers and single-chips. In addition, it can also be seen from the configuration shown in FIG. 24 that the contact structure 381 can be aligned with the matching electronic component by the alignment pin 386, and these contact structures can also be interconnected.
The type of semiconductor device assembly 366 shown in Figure 24 can be tested under full-speed function. The method is to make the top tip of the contact structure 381 bend and deform, forcing it to interact with a matching contact terminal (not shown) provided on a test substrate. ) Form a compression joint. No special probes need to be carried on the test substrate to perform this test. In order to ensure good contact between the contact terminals on the test substrate, the conductive shell 383 can be plated with an outer layer of noble metal such as gold, rhodium or silver, and the contact piece of the test substrate can be plated with the same material. Promote the reduction of contact resistance. Prior to this, test probes usually had to be bonded to aluminum contacts that were prone to oxidation, resulting in high contact resistance.
The structure shown in FIG. 24 not only facilitates the test procedure, but also can be used to perform a burn-in test of a semiconductor device. Using the same method, the contact structure 381 of the semiconductor device assembly 367 was bent and deformed to be bonded to the matching contact pads provided on the pre-fired test substrate (not shown), and the forming materials of these contact pads were the same as those provided above. The contact pads on the test substrate are the same. When the device 367 is in contact with the pre-fired test substrate, it can be subjected to a long-term test and exposed to high and low temperature environments alternately. For this kind of burn-in test, it should be understood that a plurality of semiconductor devices 367 can be placed on a burn-in substrate capable of accommodating a plurality of such semiconductor devices 367, and the spring clamps as described in FIGS. 26 and 27 can be used. Keep it engaged. The alignment pins 386 can be used to easily align the semiconductor device assembly 367 with the burn-in test substrate. The fan-shaped expansion capability of the semiconductor structure 381 arranged in the method shown in FIG. 24 can make the contact pieces of the semiconductor device assembly 367 have a smaller interval, and allow the contact structure 381 to have a larger interval between the top tips. Therefore, it is possible to simplify the alignment between the semiconductor devices and the test or burn-in substrate at a larger but possibly standard interval, so that the cost of these test and burn-in substrates can be reduced.
After completing the test and burn-in procedures for these semiconductor devices 367, and confirm their performance, you can remove the spring clips to remove them from the test and/or burn-in substrate, and then let the free end of the contact structure 381 and the set The matching contact pieces on the interconnection substrate are connected in a pattern as described later, so as to provide a permanent interconnection. When the spacing between the contact pads carried by the interconnection substrate is different from the spacing between the contact pads on the semiconductor device 367, the fan-out capability of the contact structure 381 shown in FIG. 24 also enables it to use this spacing. In addition, the alignment pin 386 also helps to achieve the required alignment and simplifies the permanent interconnection operation.
The one shown in FIG. 25 is a semiconductor package assembly 401. Installed in the package assembly 401 is a printed circuit board with a circuit system on one side, and a plurality of contact sheets 412 are provided on one side, and a plurality of contact sheets 413 are also provided on the other side. On the opposite sides of the printed circuit board, there are also semiconductor devices 416 and 417. At the same time, these devices carry a number of elastic contact structures 418 installed on them in the aforementioned manner, so that solderable terminals can be used to print this The circuit board provides a double-sided flip chip connection. The package assembly is passed through a suitable furnace, so that the solder carried by the elastic contact structure 418 and the contact sheets 412 and 413 form a solder joint, and the elastic contact structure 418 can be combined with the contact sheets 412 and 413. If a reflowable soldering flux is applied to the contact pads 412 and 413 in a method well known to those skilled in surface adhesion technology, it will be more helpful to this process. Next, an encapsulation made of a suitable insulating material is placed between the printed circuit board 411 and the semiconductor devices 416 and 417 to complete the packaging operation.
The one shown in FIG. 26 is another semiconductor package assembly 421 of the present invention, which includes a laminated printed circuit board 423 with contact sheets 424 and 426 on opposite sides thereof. The semiconductor devices 427 and 428 are arranged on opposite sides of the printed circuit board 423, and carry the contact structure 429 of the aforementioned type. The spring clips 431 fixed on the printed circuit board are used to clamp the edges of the semiconductor devices 427 and 428, and the contact structures 429 can be forced to bend and deform, so that they are joined to the contact pieces 424 and 426. These spring clips 431 can be arranged around the periphery of the semiconductor device. Taking a rectangular semiconductor device as an example, there can be at least four such spring clips 431, two on each side of the semiconductor device. The spring clip 431 as shown in the figure is coupled to the contact piece 432 carried by the printed circuit board 423. Each of these spring clips 431 is provided with a type of soft elongated element or frame 433 as described above, and the frame is combined with the contact piece 433 in an appropriate manner, for example, a spherical coupling member. As shown in FIG. 26, the frame 433 is provided with two elbows 433a and 433b for forming a spring clip extending from one side of the semiconductor device. The conductive shell 434 is used to provide an appropriate reinforcement or muscle to the spring clip 431, and to increase the spring-like or clip-like characteristics of the elbows 433a and 433b, so as to keep the semiconductor devices 427 and 428 in position. It can be seen from this configuration that the semiconductor devices 427 and 428 and the contact structure 429 are kept in close contact with the contact pads 424 and 426. With this configuration, the contact structure 429 can be aligned with the contact pieces 424 and 426. If you want to remove the semiconductor devices 424 and 428, you only need to push the spring clip 431 outwards to release the semiconductor devices 427 and 428 carrying the contact structure 429 so as to separate them from the contact pieces 424 and 426.
On the free end of the contact structure or on the contact piece to be joined, solder can be applied, and then the combination is passed through a furnace. The solder will form a joint block that tightly encloses the free end of the contact structure and the surface of the contact piece , Leaving only an optional thin coating on the entire contact structure to provide connections in the three directions of X, Y and Z.
The one shown in FIG. 27 is yet another semiconductor package assembly 441, which includes a printed circuit board 442 or other suitable substrate. On one surface of the printed circuit board 442, spaced contact strips 443 and 444 are provided. The contact structure 446 is installed on the contact piece 443 and is composed of a skeleton 447 and a conductive shell 448 as shown in the mouth, so as to provide an elastic contact structure. The spring clip 451 of the type shown in FIG. 27 is fixed on the contact piece 444. As shown in FIG. 27, the semiconductor device 452 is sandwiched between the uppermost ends of the contact structure 446, and can be moved to be joined with the metalized cup-shaped terminal 453 carried by the semiconductor device 452 in the same type as described above. It can be seen from this structure that since the distal end or free end of the contact structure 446 and the contact terminal 453 of the semiconductor device 452 are not connected by welding, the semiconductor device 452 can be removed by pushing the spring clip 451 to the side. In addition to the configuration shown in FIG. 27, it should be understood that the contact structure 446 can be installed in the wall surface 453 of the semiconductor device 452 if necessary, so that the free end of the contact structure 446 can move and contact the printed circuit board. The pieces 443 are joined to achieve substantially the same result as the configuration shown in FIG. 27 can achieve. It should be understood that the spring clip 451 can be replaced by an external spring element (not shown), so as to apply a spring load to the contact structure 446 against the metalized wall 453.
The one shown in FIG. 28 is another semiconductor package 461, which is particularly suitable for a printed circuit board 463 having a longitudinal intermediate conductor or a plated through hole 463 passing therethrough. The provided semiconductor device 466 carries the same type of elastic contact structure 467 as described above. The contact structure 467 as shown in the figure is provided with a number of elbows 467a and 467b, especially at its free end, a diameter facing the elbows is larger than the diameter of the plated through hole 463 provided in the printed circuit board. Therefore, as shown in FIG. 28, when the semiconductor device is at a position where the contact structure 467 can be aligned with the plated through hole, the contact structure 467 can be pushed into the plated through hole, so that the contact structure 467 and the plated through hole 463 A spring-loaded fit is formed between them, so that the semiconductor device 466 can be mounted on the printed circuit board 462 in a detachable or movable manner, so that it can be energized with the plated through holes, so that the printed circuit board can be in contact with the outside world.
The one shown in FIG. 29 is another package assembly 471 of the present invention, in which a printed circuit board 472 is provided with a plurality of spaced apart holes 473. In addition, separate contact pieces 476 are also provided on opposite sides of the printed circuit board. The semiconductor devices 477 and 478 are arranged on two opposite sides, and carry the elastic contact structure 481 of the same type as the foregoing and having a free end that can be joined with the contact piece 476. The type is also the same as the aforementioned spring clip 486 is installed on the semiconductor device in the aforementioned manner, and it is positioned on the semiconductor device so as to be aligned with the hole 473 provided in the printed circuit board 472. As shown in FIG. 29, as long as the spring clip 486 is inserted through the hole 473 and the portion 486a is joined to the opposite sides of the printed circuit board, the semiconductor devices 477 and 478 can be clipped to the printed circuit board 472. In addition, the free end of the contact structure 481 and the contact piece 476 may also be joined by welding. Or, as mentioned above, the free ends can be set to be movable to be in elastic contact with the contact piece 476. As long as the free end is made to be frictionally engaged with the contact piece 476 by the spring load, this structure can be easily completed.
The one shown in FIG. 30 is a semiconductor package assembly 491 according to another embodiment of the present invention, in which a printed circuit board 492 is provided with a plurality of holes 493 penetrating and spaced apart. The semiconductor devices 494 and 496 are of the same type as the aforementioned semiconductor devices 494 and 496, and the contact structure 497 is provided thereon. Similarly, the semiconductor devices 494 and 496 are also provided with alignment pins 498 of the aforementioned type.
When assembling the semiconductor package assembly 491, the semiconductor device 496 in the form of a semiconductor chip can be installed on a carrier (not shown) that can be processed automatically, and then the chips are picked and brought to the top of the printed circuit board. The hole 493 is aligned with the alignment pin 498. Thereafter, as shown in the figure, the upper end of the alignment pin 498 is bent to keep the printed circuit board and the semiconductor device 496 joined. Then reverse the intermediate combination of the semiconductor device 496 and the printed circuit board 492, and then bring the second piece of semiconductor 494 to the top of the printed circuit board 492 and turn it over so that the alignment pins 498 are aligned with the rest of the printed circuit board. The holes 493 are aligned, and then these holes 493 are inserted, so that the contact structure 497 carried by the hole 493 is connected to the contact piece 499 on the printed circuit board. In order to maintain the alignment of these components more accurately, an appropriate type of adhesive 501 can be selected, such as an appropriate solvent that can shrink during curing due to evaporation, placed between the printed circuit board 492 and the semiconductor device 494. From this, it can be seen that when an adhesive is to be used, the free end of the alignment plug 498 carried by the semiconductor device 496 does not need to be bent as shown in the figure.
31 is another semiconductor package assembly 506 of the present invention, which includes a printed circuit board 507 provided with a large plated through hole 508. A capacitor 511 is provided in the large plated through hole 508, and the capacitor includes first and second electrode plates 512 and 513 separated by a dielectric material section 514. The free extension portion 512a of the electrode plate 512 is a plating portion 508a that is coupled to the plating layer of the electroplating through hole 508, while the free extension portion 513a of the electrode plate 513 is coupled to the plating portion 508b of the plating layer of the electroplating through hole 508. Using this method, it can be seen that the capacitor 511 is suspended in the plated through hole 508. On the upper and lower surfaces of the substrate or printed circuit board 507, a number of contact pieces 516 separated from the plated through holes 508 are respectively provided. The printed circuit board is additionally provided with a contact piece 517 which is in contact with the plated portion 508b of the plated through hole 508. The semiconductor device 521 of the aforementioned type carries the type of the aforementioned contact structure 523, and is soldered to the contact pads 516 and 517 as shown in the figure.
Figure 32 shows another semiconductor package assembly 526 of the present invention, which includes a printed circuit board 507 on which a number of spaced contact pieces 528 are mounted on the opposite side of the rain. The contact pieces 528 are combined into a pattern like As mentioned above, it is installed on the elastic contact structure 529 on the semiconductor devices 531 and 532. The two opposite sides of the printed circuit board 527 are also provided with capacitors 511 of the aforementioned type. The electrode plates 512 and 513 of the capacitors 511 are connected to the contact pieces 533 provided on opposite sides of the printed circuit board 527. It can be seen that the capacitor 511 is located in the gap between the semiconductor devices 531 and 532 and the opposite sides of the printed circuit board 527, respectively. The necessary suitable space is also provided between the capacitors and the semiconductor devices 531 and 532. Just adjust the height of the elastic contact structure 529. That is, a proper space is provided between the capacitor 511 and the printed circuit board 527 and the semiconductor devices 531 and 532.
Figure 33 shows another semiconductor device assembly 536 of the present invention. As shown in the figure, it includes a multilayer printed circuit board or substrate 537 provided with first and second surfaces 538 and 539. The printed circuit board 537 is provided with a rectangular recess 541 in which the first surface 538 is cut out. There are also a number of separate steps 542 accessible from the side where the surface 532 is located, and compared with the surface 539, they are located at various heights, thus actually forming a surface 539 with notches. As shown in the figure, the printed circuit board 537 is provided with at least three different metal plating layers 546, and is also provided with a number of longitudinal intermediate conductors or longitudinal pipes 549. As shown in Figure 33, the direction in which the longitudinal pipes extend is perpendicular to the surfaces 538 and 539, and they are interconnected in various ways. These longitudinal pipes 559 can be formed of a suitable material such as molybdenum or tungsten in a ceramic substrate, or can be in the form of plated through holes provided in the laminated printed circuit board. A number of contact pieces 551 are provided on the side carrying the second surface 539. As shown in the figure, these contact pieces 551 are located on the stepped portion 542 and the surface 539, so they are directly connected with several metal plating layers. As shown in FIG. 33, the elastic contact structure 552, which is the same as the aforementioned elastic contact structure, is coupled to each corresponding contact piece 551, and it has various lengths, so that its free end can be substantially positioned at a level that is substantially in line with the surface 539 and the stepped portion. The surface of 542 remains on a parallel plane.
The provided through-hole decoupling capacitor 556 includes a multiple capacitor formed by a number of parallel conductive plates 557. These conductive plates 557 are set in a dielectric material 558 of a type that is well known to those skilled in the art, and are connected to the longitudinal pipe. 559 meets. The longitudinal pipe 559 located on one side is in contact with the contact piece 561 provided in the recess 541 and is in contact with the longitudinal pipe 549 carried by the printed circuit board 537.
It can be seen from FIG. 33 that the upper surface of the decoupling capacitor 556 is only slightly higher than the surface 538 of the printed circuit board 537. The metal plating provided on the surface 538 of the printed circuit board provides contact strips 562. The other contact pieces 563 provided on the decoupling capacitor 556 are in contact with the longitudinal pipe 559. The semiconductor device or chip 566 provided has a number of contact pads 567. The elastic contact structure 568 of the type described here is installed on the contact pieces 562 and 563, and the end position of its highest point is substantially on a common horizontal plane, so that the free ends of these contact structures 568 are joined to the contact pieces 562 and 563. Bulk semiconductor device 566 above the contact pad 567. Therefore, if the flat surface of each layer of the decoupling capacitor 556 is inconsistent with the surface of the printed circuit board 537, the elastic contact structure 568 is also easy to cooperate. This allows the flat surface of the wafer 566 to be bonded to the surfaces shown in FIG. 33 that may not be flat.
This type of configuration can provide extremely low inductive coupling to the decoupling capacitor 556, which is a very important parameter that defines the performance of the microprocessor. As mentioned above, not all the contact structures on the other side of the printed circuit board 537 come from the same plane, so it is easy to directly connect with the contact pads located on different planes as shown in the figure. This allows the number of pipes and conductors required for interconnection within the substrate to be reduced.
Although the external package after the semiconductor package assembly 536 is assembled is not shown here, those skilled in the art can easily understand that the applicable type is the same as the aforementioned package. Alternatively, the bottom wafer 566 as shown in FIG. 33 can be encapsulated (not shown) in a suitable polymer or epoxy compound.
It should be understood that the printed circuit board 537 can be made larger if necessary, so that using the same principle as shown in FIG. 33, a number of semiconductor wafers connected face down can be mounted on the surface 538. Therefore, if necessary, the flip chips 566 can be arranged adjacent to each other and arranged in rows extending along the X and Y directions.
Figure 34 shows another semi-conducting package assembly 571 of the present invention. As shown in the figure, it is in the form of a composite structure, which can include a type of the aforementioned semiconductor package assembly 536 related to FIG. 33, and shows that it can be mounted on another chip that can be used as a motherboard or a substrate On the printed circuit board 576. As shown in the figure, opposite sides of the main board 576 are provided with first and second surfaces 577 and 578 provided by a solder layer 579 commonly known as a solder encapsulation. This motherboard also has multiple metal plating layers 581, and a number of longitudinally plated through holes 578 that extend along the direction perpendicular to the surfaces 577 and 578 and are separated. The plated through holes 583 are provided with a contact surface 586 that can be accessed through an opening 587 provided on the surface 577. In addition, there is also a contact surface 591 accessible through a through hole 592 on the solder layer 579 that passes through the surface 578. As shown in FIG. 34, the contact surface 586 is connected by the free ends of the elastic contact structure 552, and is combined with a suitable tool such as solder or conductive epoxy to complete the combination.
It should be understood that when the motherboard is large enough, several semiconductor package combinations 536 of the type shown in FIG. 33 can be mounted on the same motherboard or integrated substrate. Similarly, the semiconductor package assembly 536 can also be mounted on the other side of the motherboard manufactured in the foregoing manner.
If you want to change the direct soldering shown in FIG. 34 to mount the semiconductor package assembly 536 on a motherboard, it should be understood that the contact structure 552 can be made into a detachable form when necessary, so that it can be replaced as shown in FIG. 28 The illustrated contact structure 467 maintains energized and spring-loaded contact with the conductive terminals connected to the plated through holes 583 on the motherboard. In this way, a spring-loaded fit can be formed between the motherboard 576 and the semiconductor package assembly 536. This structure is very desirable because the semiconductor package can be replaced in the field. Therefore, if such a spring-loaded contact structure is used, the semiconductor package assembly 536 can be removed and replaced with another one with a larger capacity. Taking the microprocessor of a notebook computer as an example, this method can be used to upgrade it. In this case, the methodology of using the integrated elastic contact structure includes the pre-fired and test of the combination 536. The method is to put the elastic contact structure against the contact sheet on the appropriate test or pre-fired substrate, and then proceed as described above. The assembly is mounted on the main board 576 by the spring load method.
The one shown in FIG. 35 is another compound semiconductor package assembly 601 of the present invention, showing a printed circuit board 537 on which a semiconductor device 566 is provided, and a type of motherboard 576 like the aforementioned motherboard, where the printed circuit board 537 and Between the motherboard 576, there is an insert 602 shown in FIG. 21. The contact structure 121 of the insert 602 is bonded to the contact surface 586 by solder. Similarly, the contact structure 121 of the insert 602 can be bent and deformed to maintain engagement with the contact piece 551, and use appropriate tools, such as through the printed circuit 537, the motherboard 576, and the insert 602, and have a screw cap. The bolts 606 are penetrated to maintain engagement with them to form a composite combination, in which the contact structure 121 is constantly pressed, so as to form a good electrical connection with the contact strip 551 carried by the printed circuit board 537.
It should be understood that the bolt 606 can be replaced by other fixing tools, for example, a spring clip can be used to press the contact structure 121, and the aforementioned printed circuit board and the motherboard can be fixed together. The insert 602 shown in FIG. 21 can also be replaced with the insert 602 shown in FIG. 20, so that the two sides of the insert are provided with detachable electrode contacts, and the contact structure 121 can be bent and deformed to interact with each other. The contact piece 551 is joined, so that the contact structure 201 can be bent and deformed to join with the surface 586. It can be seen from this structure that the compound semiconductor package combination can be easily changed by removing the bolts and using some other components and inserts when necessary. This plug-in is detachable to facilitate such changes.
The one shown in FIG. 36 is another compound semiconductor package assembly of the present invention. This combination 611 discloses a method for encapsulating silicon on an interface card, and it includes an interconnection substrate made of a suitable insulating material and provided with first and second surfaces 613 and 614. The interconnection substrate can be in the form of the aforementioned printed circuit board, and can be provided with several layers of metal plating (not shown) and through-hole conductors or intermediate conductors that contact the contact pieces 617 provided on the surfaces 613 and 614 616.
The semiconductor device 621 in the form of a face-down mounted chip is set to be located on opposite sides of the interconnect substrate 612. As mentioned above, these semiconductor devices are provided with a number of contact pieces 622, on which are mounted the same type of elastic contact structure 626 as mentioned above, and are tilted up and down so as to contact and energize the contact pieces 617 provided on the interconnection substrate 612. . The gap between the flip chip 621 and the interconnect substrate 612 can be filled with a suitable encapsulant 631 as shown in the figure.
All the electrical connections provided in this flip chip can be brought out to the several contacts 636 provided on one edge of the combination 611 as shown in FIG. 36, as a precursor, so that the semiconductor package combination 611 can The person being installed, for example, in a conventional socket on a desktop computer or similar object. It can be seen from this structure that the silicon wafers can be mounted on both sides of the interconnect substrate 612 face down.
FIG. 37 shows another semiconductor package assembly 651 of the present invention, which shows that the semiconductor package assembly 611 shown in FIG. 36 can be stacked vertically so that the assembly 611 forms a so-called dual-stacked card method. As shown in FIG. 37, two of these double-sided silicon precursors have been stacked vertically with each other and have an additional contact structure 652 to interconnect the two interconnection substrates 612 of the precursors 611. The entire combination can also be encapsulated with polymer or epoxy materials to increase its rigidity and enhance protection.
Figure 38 shows another semiconductor package assembly 661 of the present invention, in which a piece of substrate 662 can be provided in the same type as the aforementioned substrate 662, for example, a piece of plastic/laminated material, or ceramic or silicon material, and the substrate 662 A printed circuit board on a flat surface. At the separation position of the substrate 662, a number of silicon wafers or semiconductor devices 663 extending in a direction substantially perpendicular to the plane of the substrate 662 are vertically stacked. A flat surface 666 of the substrate 662 is provided with a contact piece 667 that can be connected to the circuit system of the substrate 662. Similarly, the silicon wafer 668 also has parallel separating surfaces 668 and 669, and a contact 671 exposed from the surface 668. The contact structure 672 described above can form a contact between the contact 671 of the silicon semiconductor device 663 and the contact 667 carried by the substrate 662. Therefore, as shown in the figure, each silicon chip 663 is provided with a contact structure 672. The contact structure 672 can be of an elastic type and is provided with an elbow 672a.
The additional contact structure 676 provided is also an elastic form, and has first and second elbows 676a and 676b. The sizes of the elbows 676a and 676b are made so that when the contact structure 676 is fixed to the other contact piece 678 provided on the surface 666 of the substrate 662, it can buckle the opposite surface of the silicon wafer 663 so as to face each other. On the substrate 662, the wafer 663 can be elastically supported longitudinally.
It should be understood from the foregoing that the single contact structure 676 between each pair of silicon wafers can be replaced by two separate elastic contact structures, with one facing one side and the other facing the opposite direction, so as to provide a single elasticity. The support provided by the contact structure.
It can be seen from the foregoing that the semiconductor package assembly 661 shown in FIG. 38 is suitable as, for example, a mass production technology for stacking memory chips.
With regard to the description of the contact structure, the interposer, the semiconductor assembly and the interconnection of the package, the manufacturing method has been roughly described. Take the soft and slender components used as the frame of the contact structure and the interconnection as an example. Any automated wire bonding equipment designed to be able to bond wires by ultrasonic, thermal or compression energy, or their combination can be used to make the For slender components, the method is to use this equipment to provide a lead with a continuous feed end, and then use the combination of thermal compression energy or ultrasonic energy to tightly bond the feed end to a contact piece or terminal, and then from the freedom of combination The end forms a pin or shank extending from the terminal and having a first shank end. If necessary, the second rod shank end can be combined to the same or a different contact piece or terminal. Then, the bolt or the shaft can be cut from the second shaft end to define a skeleton. Thereafter, a conductive material is deposited on the frame to form a conductive shell as described above, and is deposited on a portion immediately adjacent to the contact piece or terminal. Repeat this procedure to make other contact structures.
These are all used to form the contact structure for the basic steps of the aforementioned interconnection method, and the ability to form protruding conductive contacts is also another feature. These contact structures or protruding conductive contacts can be incorporated and used in many conventional semiconductor processes for manufacturing semiconductor wafers. As mentioned earlier, the use of oxide, nitride, or polymer dielectric layers can purify the wafer. In addition, a short-circuit layer made of suitable materials, such as aluminum, steel, titanium, tungsten, gold, or a combination thereof, can also be used. Wire bonding equipment can be used for the short-circuit layer to use high-voltage discharge to perform cutting operations. If the short-circuit layer is selected to be grounded, it can prevent the risk of accidental damage to the active semiconductor device. Usually, the short-circuit layer can be coated with a resist layer first, and then the skeleton is installed on the contact piece defined by the aperture of the resist layer. Then the skeleton is plated with a layer of conductive material to form a conductive shell or muscle. After that, the resist and short-circuit layer can be removed as described above. Then the wafer can be singulated or diced. Thereafter, the diced wafer can be selectively coated with a layer of protective polymer to cover the area bonded to the contact sheet.
For this method, the size of the aperture of the resist layer can be made larger than that of the contact piece. Afterwards, the hole of the resist layer can be plated with a metal layer to provide a larger size contact piece or contact well. Then, except under the larger area of the contact piece, the resist layer and the short-circuit layer can be removed.
Providing such a larger area for the contact piece will have a larger surface for easier adhesion to the contact structure manufactured in accordance with the present invention. The enlarged contact piece can be of any desired shape, such as circle, ellipse, rectangle and so on. There is another advantage of electroplated metal contact pieces, that is, it can be used to seal the contact pieces, which are usually aluminum, and isolate them from the atmosphere.
The foregoing is a method of providing contact sheets for the free ends of the contact structures. A protective layer on the contact structures is removed after the muscle surface layer or the conductive shell is deposited. However, it should be understood that this protective layer can be removed when necessary before depositing the surface layer or conductive shell, and then use CVD (chemical vapor phase electrodeposition), chemical coating, or the short-circuit layer of the contact. In the electroplating method, a surface layer or conductive shell is deposited on it.
The foregoing is also a method of manufacturing a probe-shaped contact structure using protective members such as aluminum or steel. This method can also be used to gang transfer a number of contacts to a package first, and then place the semiconductor chip in the package. At that time, if the package fails, the cost of the semiconductor chip can be saved, and as a result, only the package and its contacts are lost. Therefore, according to the present invention, a number of contacts can be formed on the transfer/protection substrate according to any of the aforementioned methods, and then attached to the package in rows, and then the transfer/protection substrate can be removed. As long as a software data file is used to generate the required layout on the transfer substrate, a number of contacts can be easily attached to a protective substrate carrier without the use of special molds.
When using the elastic contact structure carried by the aforementioned semiconductor device, and using the contact structure and the contact piece carried by the test and pre-fired substrate for flexible and detachable contact, this test and preliminary test can be easily achieved. Afterwards, the semiconductor device can be removed from the test and burn-in substrate to determine whether it is consistent with the desired performance characteristics, and multiple semiconductor devices can be placed on a common substrate without change to form a The aforementioned permanent packaging does not require the first-level semiconductor packaging. Therefore, according to the present invention, the semiconductor device can be tested when it is not packaged or after it has been packaged into a permanent package combination.
It can be seen from the foregoing that the present invention has provided a contact structure that can be interconnected with an insert, a semiconductor assembly, and a package, and a manufacturing method thereof. As mentioned earlier, this contact structure has a wide range of uses and can be used in many different applications in the semiconductor industry to facilitate the mass production of semiconductor assembly and packaging. This contact structure improves reliability and has a high degree of structural integration, so the semiconductor assembly and package containing this contact structure can be used in a rather unfavorable environment. Since the contact structure of the present invention has a wide range of uses and reliable performance, it can be used in many different semiconductor combinations and packaging configurations, and contact at different heights and at different intervals. This contact structure is also applicable to contacts of various configurations that allow semiconductor chips to be mounted on SIMM (single in-line memory modules, commonly known as "golden fingers") and other interface cards. The contact structure and method disclosed in the present invention can be used to manufacture a card-type device with an elastic contact piece directly installed. This method is applicable regardless of the contact semiconductor device in wafer or monolithic form. The micromechanical hardware used in the equipment for implementing the method is the same as the conventional wire bonder used in the industry.
597 members in 10 offices
Priority claims1
| Document | Office | Kind | Date |
|---|---|---|---|
| 15281293 | United States of America | A |
Members597
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| JPH08186400A | Japan | A | |
| EP0729652A1 | European Patent Office (EPO) | A1 | |
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| US5772451A | United States of America | A | |
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| EP0859686A1 | European Patent Office (EPO) | A1 | |
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| WO9850953A1 | World Intellectual Property Organization (WIPO) | A1 | |
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| WO9852224A1 | World Intellectual Property Organization (WIPO) | A1 | |
| AU7294298A | Australia | A |
Numbers
- Publication
- 275706
- Application
- 84104698
Titles4
- Chinese
- 用以互聯、嵌插、半導體、組立包裝之接觸結構裝置及其方法
- English
- CONTACT STRUCTURE DEVICE FOR INTERCONNECTIONS, INTERPOSER, SEMICONDUCTOR ASSEMBLY AND PACKAGE USING THE SAME AND METHOD
- Unlabeled
- 用以互聯、嵌插、半導體、組立包裝之接觸結構裝置及其方法
- Unlabeled
- Contact structure device and method for interconnection, embedding, semiconductor, assembling and packaging
Classification
- CPC, 88
- H05K7/1069
- H10W70/093
- B23K1/0016
- C23C18/161
- C25D7/12
- G01R1/0466
- G01R1/06711
- G01R1/06761
- G01R1/07307
- G01R3/00
- G01R31/2884
- G01R31/2886
- H05K1/141
- H05K3/308
- H05K3/326
- H05K3/3421
- H05K3/3426
- H05K3/368
- H05K3/4015
- H05K3/4092
- H05K2201/0397
- H05K2201/068
- H05K2201/1031
- H05K2201/10318
- H05K2201/10378
- H05K2201/10719
- H05K2201/10734
- H05K2201/10757
- H05K2201/10878
- H05K2201/10909
- H05K2201/10946
- H01R12/52
- B23K2101/40
- Y10T29/49224
- Y10T29/49147
- Y10T29/49144
- Y10T29/49151
- Y10T29/49179
- Y10T29/49174
- Y10T29/49204
- Y10T29/49222
- Y10T29/49155
- Y10T29/49609
- Y10T29/49149
- Y02P70/50
- C25D7/123
- H10P72/0448
- H10P74/23
- H10W74/012
- H10W74/15
- H10W20/069
- H10W90/701
- H10W90/734
- H10W72/287
- H10W72/283
- H10W72/01225
- H10W72/252
- H10W72/251
- H10W72/07141
- H10W72/07233
- H10W72/07236
- H10W72/07511
- H10W72/01551
- H10W72/07532
- H10W72/07533
- H10W72/20
- H10W72/00
- H10W72/30
- H10W90/00
- H10W72/07553
- H10W72/531
- H10W72/5453
- H10W72/07554
- H10W72/547
- H10W90/754
- H10W72/856
- H10W72/536
- H10W72/5363
- H10W72/884
- H10W70/685
- H10W70/682
- H10W72/5522
- H10W72/552
- H10W72/5524
- H10W72/522
- H10W72/543
- H10W72/555
- H10W72/5525
- IPC, 24
- H01L23 28
- B23K1 00
- C23C18 16
- C25D7 12
- G01R1 04
- G01R1 067
- G01R1 073
- G01R3 00
- G01R31 28
- H01L23 48
- H01L23 485
- H01L23 49
- H01L23 498
- H01L25 065
- H01L25 16
- H05K1 14
- H05K3 30
- H05K3 32
- H05K3 34
- H05K3 36
- H05K3 40
- H05K7 10
- H10P95 00
- H10W74 01