Nova Patents
PL3140047T4

Method for forming regular polymer thin films using atmospheric plasma deposition

Abstract

This record has no abstract on file.

Term

8.6 yearsto projected expiry

Projected expiry 6 May 2035, counted from filing; an application has no term until it is granted.

  1. Priority
  2. Filed
  3. Published
  4. Today
  5. Projected expiry

13 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims2

Priority claims
DocumentOfficeKindDate
92445LuxembourgA
2015059979European Patent Office (EPO)W

Members13

Family members, oldest first
DocumentOfficeKind
LU92445B1LuxembourgB1
WO2015169864A1World Intellectual Property Organization (WIPO)A1
KR20170017890ARepublic of KoreaA
US2017050214A1United States of AmericaA1
EP3140047A1European Patent Office (EPO)A1
JP2017526518AJapanA
EP3140047B1European Patent Office (EPO)B1
JP6527885B2JapanB2
US10471465B2United States of AmericaB2
ES2738584T3SpainT3
PL3140047T3PolandT3
PL3140047T4This recordPolandT4
KR102496134B1Republic of KoreaB1