PL205573B1

Nanolayered coated cutting tool and method for making the same

Abstract

This record has no abstract on file.

PL205573B1, drawing sheet 1 — Sheet 1 of 4

Term

Term ended

Expired 6 March 2023, 3.6 years ago.

43 claims: 9 independent, 34 dependent

1
Człon pokryty nanowarstewkami, zawierający podłoże mające powierzchnię, i powłokę na powierzchni podłoża, przy czym powłoka składa się z wielu zestawów nanowarstewek, znamienny tym, że każdy zestaw nanowarstewek składa się z naprzemiennych nanowarstewek azotku metalu i azotku metalu-glinu, i powł oka (32) ma obszar wią zania (34) i obszar zewnę trzny (36), z których obszar wiązania (34) jest usytuowany bliżej podłoża (30) niż obszar zewnętrzny (36), przy czym obszar wiązania (34) zawiera szereg zestawów nanowarstewek z naprzemiennie usytuowanych nanowarstePL 205 573 B1 wek azotku metalu i azotku metalu-glinu, a grubość zestawów nanowarstewek obszaru wiązania (34) wzrasta w miarę oddalania się od powierzchni (38) podłoża (30).
2
Człon według zastrz. 1, znamienny tym, ż e metal nanowarstewek azotku metalu i azotku metalu-glinu jest wybrany z grupy obejmującej tytan, niob, hafn, wanad, tantal, molibden, cyrkon, chrom i wolfram, samodzielnie albo w połączeniu ze sobą albo w połączeniu z innymi metalami, natomiast podłoże jest wybrane z grupy obejmującej węglik spiekany, cermetal, ceramikę, stal szybkotnącą, diament, diament polikrystaliczny i polikrystaliczny regularny azotek boru.
3
Człon według zastrz. 1, znamienny tym, ż e metal w azotku metalu i w azotku metalu-glinu jest tytanem i w każdym zestawie nanowarstewek obszaru wiązania (34) nanowarstewka azotku tytanu-glinu ma pewną grubość i nanowarstewka azotku tytanu ma pewną grubość, przy czym grubość nanowarstewki azotku tytanu-glinu różni się od grubości nanowarstewki azotku tytanu.
4
Człon według zastrz. 1, znamienny tym, ż e metal w azotku metalu i w azotku metalu-glinu jest tytanem, a w każdym zestawie nanowarstewek obszaru wiązania (34) nanowarstewka azotku tytanu-glinu ma określoną grubość i nanowarstewka azotku tytanu ma określoną grubość, przy czym grubość nanowarstewki azotku tytanu-glinu jest większa niż grubość nanowarstewki azotku tytanu.
5
Człon według zastrz. 4, znamienny tym, ż e grubość nanowarstewek azotku tytanu obszaru wiązania (34) jest w zasadzie taka sama w miarę oddalania się od powierzchni podłoża (30).
6
Człon według zastrz. 1, znamienny tym, że w każ dym zestawie nanowarstewek obszaru wiązania (34) grubość nanowarstewki azotku metalu jest różna od grubości nanowarstewki azotku metalu-glinu.
7
Czł on wedł ug zastrz. 6, znamienny tym, ż e w ka ż dym zestawie nanowarstewek w obszarze wiązania (34) nanowarstewka azotku metalu-glinu ma grubość większą od grubości nanowarstewki azotku metalu.
8
Czł on wedł ug zastrz. 1, znamienny tym, ż e obszar zewnę trzny (36) zawiera zestawy nanowarstewek o przemiennych nanowarstewkach azotku metalu i azotku metalu-glinu, przy czym w każ dym zespole nanowarstewek obszaru zewnę trznego (36) grubość nanowarstewki azotku metalu różni się od grubości nanowarstewki azotku metalu-glinu.
9
Człon według zastrz. 8, znamienny tym, że w każ dym zestawie nanowarstewek obszaru zewnętrznego (36) nanowarstewka azotku metalu-glinu ma grubość większą niż grubość nanowarstewki azotku metalu.
10
Człon według zastrz. 1, znamienny tym, że pokryty człon stanowi jeden z następujących elementów:wkładka tnąca, podatna na okresowe przestawianie wkładka tnąca, wiertło, frez, frez walcowo-czołowy, rozwiertak i gwintownik.
11
Człon według zastrz. 1, znamienny tym, że obszar zewnętrzny (36) składa się z szeregu zestawów nanowarstewek zawierających azotek metalu i azotek metalu-glinu, przy czym grubości zestawów nanowarstewek są w przybliżeniu równe.
12
Człon według zastrz. 1, znamienny tym, że na zewnętrzną powierzchnię powłoki (32) jest nałożona warstwa wykańczająca (50), która składa się z jednej albo więcej warstewek jednego albo więcej następujących materiałów:tlenek glinowy i azotki, azotki glinu i węglikoazotki glinu, z jednym albo więcej metali z grupy obejmującej tytan, niob, hafn, wanad, tantal, cyrkon, chrom, samodzielnie albo w połączeniu ze sobą albo w połączeniu z innymi metalami.
13
Człon według zastrz. 12, znamienny tym, że na warstewce wykańczającej (50) jest nałożona warstewka poślizgowa (52).
14
Człon według zastrz. 1, znamienny tym, że metal w nanowarstewce azotku metalu-glinu każdego zestawu nanowarstewek stanowi tytan i stosunek atomowy glinu/tytanu wynosi od 0,2 do 2,5.
15
Człon według zastrz. 1, znamienny tym, że warstewka azotku metalu zawiera glin, a skład nanowarstewki azotku metalu zawierającej glin różni się od składu nanowarstewki azotku metalu-glinu.
16
Człon pokryty nanowarstewkami, zawierający podłoże mające powierzchnię, i powłokę na powierzchni podłoża, przy czym powłoka składa się z wielu zestawów nanowarstewek, znamienny tym, że każdy zestaw nanowarstewek składa się z naprzemiennych nanowarstewek azotku metaluglinu i węglikoazotku metalu-glinu, i powłoka (32) ma obszar wiązania (34) i obszar zewnętrzny (36), z których obszar wiązania (34) jest usytuowany bliżej podłoża (30) niż obszar zewnętrzny (36), przy czym obszar wiązania (34) zawiera szereg zestawów nanowarstewek z naprzemiennie usytuowanych nanowarstewek azotku metalu-glinu i węglikoazotku metalu-glinu, a grubość zestawów nanowarstewek obszaru wiązania (34) wzrasta w miarę oddalania się od powierzchni podłoża (30). PL 205 573 B1
17
Człon według zastrz. 16, znamienny tym, że metal w nanowarstewkach azotku metalu-glinu i węglikoazotku metalu-glinu jest wybrany z grupy obejmującej tytan, niob, hafn, wanad, tantal, molibden, cyrkon, chrom i wolfram, samodzielnie albo w połączeniu ze sobą albo w połączeniu z innymi metalami, a podłoże (30) jest wybrane z grupy obejmującej węglik spiekany, cermetal, ceramikę, stal szybkotnącą, diament, diament polikrystaliczny i polikrystaliczny, regularny bor.
18
Człon według zastrz. 16, znamienny tym, że w każdym zestawie nanowarstewek obszaru wiązania (34) grubość nanowarstewki azotku metalu-glinu różni się od grubości nanowarstewki węglikoazotku metalu-glinu, a obszar zewnętrzny zawiera szereg zestawów nanowarstewek przemiennych nanowarstewek azotku metalu-glinu i węglikoazotku metalu-glinu, zaś w każdym zestawie nanowarstewek w obszarze zewnętrznym (36) grubość nanowarstewki azotku metalu-glinu różni się od grubości nanowarstewki węglikoazotku metalu-glinu.
19
Człon według zastrz. 16, znamienny tym, że pokryty człon stanowi wkładka tnąca (20), przy czym wkładka tnąca (20) ma powierzchnię natarcia (22) i powierzchnię boczną (24), przy czym powierzchnia natarcia (22) i powierzchnia boczna (24) przecinają się tworząc krawędź tnącą (26).
20
Człon według zastrz. 16, znamienny tym, że metalem w azotku metalu-glinu i w węglikoazotku metalu-glinu jest tytan, a w każdym zestawie nanowarstewek obszaru wiązania (34) nanowarstewka azotku tytanu-glinu ma określoną grubość i warstewka węglikoazotku tytanu-glinu ma określoną grubość, przy czym grubość nanowarstewki azotku tytanu-glinu różni się od grubości nanowarstewki węglikoazotku tytanu-glinu.
21
Człon pokryty nanowarstewkami, zawierający podłoże mające powierzchnię, i powłokę na powierzchni podłoża, przy czym powłoka składa się z wielu zestawów nanowarstewek, znamienny tym, że każdy zestaw nanowarstewek składa się z naprzemiennych nanowarstewek azotku metalu i azotku metalu-glinu i węglikoazotku metalu-glinu, i powłoka (32) ma obszar wiązania (34) i obszar zewnętrzny (36), z których obszar wiązania (34) jest usytuowany bliżej podłoża (30) niż obszar zewnętrzny (36), przy czym obszar wiązania (34) zawiera szereg zestawów nanowarstewek z naprzemiennie usytuowanych nanowarstewek azotku metalu i azotku metalu-glinu i węglikoazotku metalu-glinu, a grubość zestawów nanowarstewek obszaru wiązania (34) wzrasta w miarę oddalania się od powierzchni podłoża (30).
22
Człon według zastrz. 21, znamienny tym, że metal w azotku metalu, azotku metalu-glinu i węglikoazotku metalu-glinu jest wybrany z grupy obejmującej tytan, niob, hafn, wanad, tantal, molibden, cyrkon, chrom i wolfram, samodzielnie albo w połączeniu ze sobą albo w połączeniu z innymi metalami, podłoże jest wybrane z grupy obejmującej węglik spiekany, cermetal, ceramikę, stal szybkotnącą, diament, diament polikrystaliczny i polikrystaliczny, regularny azotek boru.
23
Człon według zastrz. 21, znamienny tym, że w każdym zestawie nanowarstewek w obszarze wiązania (34) grubość nanowarstewki azotku metalu różni się od grubości nanowarstewki azotku metalu-glinu, grubość nanowarstewki azotku metalu różni się od grubości nanowarstewki węglikoazotku metalu-glinu, a grubość nanowarstewki azotku metalu-glinu różni się od grubości nanowarstewki węglikoazotku metalu-glinu, zaś obszar zewnętrzny (36) zawiera wiele zestawów nanowarstewek przemiennych nanowarstewek azotku metalu i azotku metalu-glinu i węglikoazotku metalu-glinu w każdym zestawie nanowarstewek w obszarze zewnętrznym (36) grubość nanowarstewki azotku metalu różni się od grubości nanowarstewki azotku metalu-glinu, grubość nanowarstewki azotku metalu różni się od grubości nanowarstewki węglikoazotku metalu-glinu, a grubość nanowarstewki azotku metalu-glinu różni się od grubości nanowarstewki węglikoazotku metalu-glinu.
24
Człon według zastrz. 21, znamienny tym, że pokryty człon stanowi jeden z następujących elementów:wkładka tnąca, podatna na okresowe przestawianie wkładka tnąca, wiertło, frez, frez walcowo-czołowy, rozwiertak i gwintownik.
25
Człon według zastrz. 52, znamienny tym, że metalem w nanowarstewce azotku metalu-glinu i nanowarstewce węglikoazotku metalu-glinu jest tytan i w nanowarstewce azotku metalu-glinu stosunek atomowy glinu/tytanu wynosi od 0,2 do 2,5 i w nanowarstewce węglikoazotku metalu-glinu stosunek atomowy glinu/tytanu wynosi od 0,2 do 2,5.
26
Człon pokryty nanowarstewkami, zawierający podłoże mające powierzchnię, i powłokę na powierzchni podłoża, przy czym powłoka składa się z wielu zestawów nanowarstewek, znamienny tym, że każdy zestaw nanowarstewek składa się z naprzemiennych nanowarstewek azotku tytanuglinu i węglikoazotku tytanu-glinu.
27
Człon według zastrz. 26, znamienny tym, że powłoka (32) ma obszar wiązania (34), który przylega do powierzchni podłoża (30). PL 205 573 B1
28
Człon według zastrz. 26, że obszar wiązania (34) zawiera szereg zestawów nanowarstewek, przy czym grubość każdego zestawu nanowarstewek zwiększa się w miarę oddalania się od powierzchni podłoża (30).
29
Człon według zastrz. 26, znamienny tym, że z obszarem wiązania (34) sąsiaduje obszar zewnętrzny (36) powłoki (32).
30
Człon według zastrz. 26, znamienny tym, że obszar zewnętrzny (36) zawiera szereg zestawów nanowarstewek, przy czym grubości wszystkich zestawów nanowarstewek są w przybliżeniu równe.
31
Sposób wytwarzania członu pokrytego nanowarstewkami, w którym przygotowuje się podłoże mające pewną powierzchnię i pokrywa się je powłoką zawierającą zestawy nanowarstewek za pomocą naparowywania z wykorzystaniem tarcz, znamienny tym, że przygotowuje się tarczę metalową I przygotowuje się tarczę metalowo-glinową, a następnie obraca się podłoże (30) pomiędzy tarczą metalową i tarczą metalowo-glinową i zasila się tarczę metalową energią elektryczną na pierwszym poziomie energetycznym tarczy metalowej oraz zasila się tarczę metalowo-glinową na pierwszym poziomie energetycznym tarczy metalowo-glinowej i naparowuje się na powierzchnię podłoża powłokę składającą się z zestawów naprzemiennych nanowarstewek, po czym zmienia się szybkość naparowywania naprzemiennych nanowarstewek w ciągu wybranego okresu czasu, w którym zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowej i zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowo-glinowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowej, a jednocześnie reguluje się szybkość naparowywania naprzemiennych nanowarstewek w ciągu pewnego czasu po osiągnięciu drugiego poziomu energetycznego tarczy metalowej i drugiego poziomu energetycznego tarczy metalowo-glinowej.
32
Sposób według zastrz. 31, znamienny tym, że naparowuje się naprzemiennie nanowarstewki azotku metalu i azotku metalu-glinu.
33
Sposób według zastrz. 32, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek azotku metalu i azotku metalu-glinu w czasie, gdy zmienia się zasilanie energią elektryczną tarczy metalowej od pierwszego poziomu energetycznego tarczy metalowej do drugiego poziomu energetycznego warstwy metalowej i zmienia się zasilanie energią elektryczną tarczy metalowo-glinowej od pierwszego poziomu energetycznego tarczy metalowo-glinowej do drugiego poziomu energetycznego warstwy metalowo-glinowej, tworząc obszar wiązania (34) powłoki (32).
34
Sposób według zastrz. 32, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek w czasie utrzymywania zasilania energią elektryczną tarczy metalowej na drugim poziomie energetycznym tarczy metalowej i w czasie utrzymywania zasilania energią elektryczną tarczy metalowo-glinowej na drugim poziomie energetycznym tarczy metalowo-glinowej tworząc zewnętrzny obszar (36) powłoki (32).
35
Sposób według zastrz. 32, znamienny tym, że stosuje się pierwszy poziom energetyczny tarczy metalowej niższy niż drugi poziom energetyczny tarczy metalowej i stosuje się pierwszy poziom energetyczny tarczy metalowo-glinowej niższy niż drugi poziom energetyczny tarczy metalowo-glinowej.
36
Sposób wytwarzania członu pokrytego nanowarstewkami, w którym przygotowuje się podłoże mające pewną powierzchnię i pokrywa się je powłoką zawierającą zestawy nanowarstewek za pomocą naparowywania z wykorzystaniem tarcz, znamienny tym, przygotowuje się tarczę metalowo-glinową i przygotowuje się tarczę metalowo-glinowo-węglową, a następnie obraca się podłoże (30) pomiędzy tarczą metalowo-glinową i tarczą metalowo-glinowo-węglową i zasila się tarczę metalowo-glinową energią elektryczną na pierwszym poziomie energetycznym tarczy metalowo-glinowej oraz zasila się tarczę metalowo-glinowo-węglową na pierwszym poziomie energetycznym tarczy metalowo-glinowo-węglowej i naparowuje się na powierzchnię podłoża powłokę składającą się z zestawów naprzemiennych nanowarstewek, po czym zmienia się szybkość naparowywania naprzemiennych nanowarstewek w ciągu wybranego okresu czasu, w którym zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowo-glinowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowej i zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowo-glinowo-węglowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowo-węglowej, a jednocześnie reguluje się szybkość naparowywania naprzemiennych nanowarstewek w ciągu pewnego czasu po osiągnięciu drugiego poziomu energetycznego tarczy metalowo-glinowej i drugiego poziomu energetycznego tarczy metalowo-glinowo-węglowej. PL 205 573 B1
37
Sposób według zastrz. 36, znamienny tym, że naparowuje się naprzemiennie nanowarstewki azotku metalu-glinu i węglikoazotku metalu-glinu.
38
Sposób według zastrz. 37, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek azotku metalu-glinu i węglikoazotku metalu-glinu w ciągu czasu, w którym zwiększa się zasilanie energią elektryczną tarczy metalowo-glinowej od pierwszego poziomu energetycznego do drugiego poziomu tarczy metalowo-glinowej i zwiększa się zasilanie energią elektryczną tarczy metalowo-glinowo-węglowej od pierwszego poziomu energetycznego do drugiego poziomu tarczy metalowo-glinowo-węglowej, tworząc obszar wiązania (34) powłoki (32).
39
Sposób według zastrz. 37, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek w czasie utrzymywania zasilania energią elektryczną tarczy metalowo-glinowej na drugim poziomie energetycznym tarczy metalowo-glinowej i w czasie utrzymywania zasilania energią elektryczną tarczy metalowo-glinowo-węglowej na drugim poziomie energetycznym tarczy metalowo-glinowo-węglowej tworząc zewnętrzny obszar (36) powłoki (32).
40
Sposób wytwarzania członu pokrytego nanowarstewkami, w którym przygotowuje się podłoże mające pewną powierzchnię i pokrywa się je powłoką zawierającą zestawy nanowarstewek za pomocą naparowywania z wykorzystaniem tarcz, znamienny tym, przygotowuje się tarczę metalową, tarczę metalowo-glinową i tarczę metalowo-glinowo-węglową, a następnie obraca się podłoże (30) pomiędzy tarczą metalową, tarczą metalowo-glinową i tarczą metalowo-glinowo-węglową i zasila się tarczę metalową energią elektryczną na pierwszym poziomie energetycznym tarczy metalowej, zasila się tarczę metalowo-glinową energią elektryczną na pierwszym poziomie energetycznym tarczy metalowo-glinowej oraz zasila się tarczę metalowo-glinowo-węglową na pierwszym poziomie energetycznym tarczy metalowo-glinowo-węglowej i naparowuje się na powierzchnię podłoża powłokę składającą się z zestawów naprzemiennych nanowarstewek, po czym zmienia się szybkość naparowywania naprzemiennych nanowarstewek w ciągu wybranego okresu czasu, w którym zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowej, zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowo-glinowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowej oraz zmienia się poziom energii elektrycznej doprowadzanej do tarczy metalowo-glinowo-węglowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowo-węglowej, a jednocześnie reguluje się szybkość naparowywania naprzemiennych nanowarstewek w ciągu pewnego czasu po osiągnięciu drugiego poziomu energetycznego tarczy metalowej, drugiego poziomu energetycznego tarczy metalowo-glinowej oraz drugiego poziomu energetycznego tarczy metalowo-glinowo-węglowej.
41
Sposób według zastrz. 40, znamienny tym, że naparowuje się naprzemiennie nanowarstewki azotku metalu, azotku metalu-glinu i węglikoazotku metalu-glinu.
42
Sposób według zastrz. 41, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek azotku metalu, azotku metalu-glinu i węglikoazotku metalu-glinu w ciągu czasu, w którym zwiększa się zasilanie energią elektryczną tarczy metalowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowej, zwiększa się zasilanie energią elektryczną tarczy metalowo-glinowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowej i zwiększa się zasilanie energią elektryczną tarczy metalowo-glinowowęglowej od pierwszego poziomu energetycznego do drugiego poziomu energetycznego tarczy metalowo-glinowo-węglowej, tworząc obszar wiązania (34) powłoki (32).
43
Sposób według zastrz. 41, znamienny tym, że naparowuje się szereg zestawów naprzemiennych nanowarstewek w czasie utrzymywania zasilania energią elektryczną tarczy metalowej na drugim poziomie energetycznym tarczy metalowej, zasilania energią elektryczną tarczy metalowo-glinowej na drugim poziomie energetycznym tarczy metalowo-glinowej i zasilania energią elektryczną tarczy metalowo-glinowo-węglowej na drugim poziomie energetycznym tarczy metalowo-glinowo-węglowej, tworząc zewnętrzny obszar (36) powłoki (32).

Independent claims43

167 paragraphs in 7 sections, as filed

Description of the invention

The present invention relates to a nano-coated cutting tool and a method for manufacturing a multilayer / coated cutting tool. The invention relates to a cutting tool coated with a nanolayer coating having a thickness of at most 100 nanometers.

Multi-film coated cutting tools exhibit excellent metal cutting properties under certain circumstances. A multi-film coated cutting tool has a substrate with multiple layers of coating vapor deposited thereon. In some instances, the oki coating films are a plurality of sets of alternating coating films. Accordingly, U.S. Patent No. 6,103,357 to Selinger et al., For a multi-film coated cutting tool is known to have a multi-layer, non-repetitive coating system in which the films are 0.1 to 30 nanometers thick. From publication no. WO 98/44163 of the patent application

PCT for Sjostrand et al. Is a known multilayer repeating coating system in which each repeating set has a thickness of between 3 and 100 nanometers.

Other exemplary coating systems consist of multiple layers of titanium nitride / titanium aluminum nitride coatings applied by physical vapor vapor deposition (PVD) techniques.

Other exemplary coating systems are titanium nitride / titanium aluminum nitride multilayer coatings applied by physical vapor vapor deposition (PVD) techniques. Such coating systems are described by C. Hsiech et al., Deposition and Characterization of TiAIN and multi-layered TiN / TiAIN coatings using unbalanced magnetron sputtering, Surface and Coatings Technology, 108-109 (1988), pp. 132-137, and by KN Andersen et al., Deposition, microstructure and mechanical and tribological properties of magnetron sputtered TiN / TiAIN multilayers, Surface and Coatings Technology 123 (2000), pp. 219-226.

Although even titanium nitride / titanium aluminum nitride multilayer coating systems exist, to be effective they must have some minimum adhesion to the substrate and must exhibit a certain minimum hardness. There has always been and still is the desire to improve the adhesion of the coating to the substrate coated with the cutting tool, and there has always been and still is the desire to optimize the hardness of the coated cutting tool. There has always been, and still is, a desire to improve and optimize the combination of the adhesion and hardness properties of a coated cutting tool.

From EP 0701982 a nano-coated member is known which comprises a substrate having a surface and a coating on the surface of the substrate, the coating consisting of a set of nanolayers each having a thickness of less than 100 nm. The layers may be repetitive and may include metal nitride, aluminum metal nitride, or aluminum metal carbonitride. The layers are applied by steaming with discs.

From US Patent No. 6,103,357 there is also known a nanolayer coated member which comprises a substrate having a surface and a coating on the surface of the substrate, the coating consisting of a set of nanolayers each having a thickness less than 100 nm. The layers may be repetitive and may include metal nitride and aluminum metal nitride. The layers are applied by steaming with discs.

The layer sets disclosed in the above publications are applied directly to the substrate without forming an intermediate tie layer, making their adhesion unsatisfactory for demanding applications.

Hence, it would be desirable to develop a nano-coated cutting tool as well as a method for manufacturing a coated cutting tool in which the coating has better adhesion and optimum hardness, as well as a better combination of adhesion and hardness.

It would also be desirable to develop a metal nitride / metal aluminum nitride cutting tool (e.g. a titanium nitride / titanium aluminum nitride nano-coated cutting tool) as well as a method of making a coated cutting tool where the coating has better adhesion and optimized hardness and better bonding. adhesion and hardness.

It would also be desirable to develop a metal-aluminum nitride / metal-aluminum carbonitride coated cutting tool (e.g., a titanium aluminum nitride / titanium aluminum carbonitride coated cutting tool) and a method of manufacturing a coated cutting tool where the coating has improved adhesion and optimized hardness, and better combination of grip and hardness.

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It would also be desirable to develop a metal nitride / metal-aluminum nitride /-metal-aluminum carbonitride-coated cutting tool (e.g., a nano-coated titanium nitride / titanium-aluminum nitride / metal-aluminum carbonitride cutting tool) and a method of making a coated cutting tool in which the coating would have better grip and optimized hardness, and a better combination of grip and hardness.

According to the invention, a nano-coated member comprising a substrate having a surface and a coating on the surface of the substrate, the coating consisting of a plurality of nanolayer sets, characterized in that each set of nanolayers is comprised of alternating nano-layers of metal nitride and metal-aluminum nitride, and the coating has a bond area and an outer area, the bond area of which is closer to the substrate than the outer area, wherein the bonding region comprises a plurality of nanolayer sets of alternating metal nitride and metal aluminum nitride nanolayers, and the thickness of the bonding region nanolayer sets increases as it moves away from the surface of the substrate.

Preferably, the metal of the metal nitride and metal aluminum nitride nano-layers is selected from the group consisting of titanium, niobium, hafnium, vanadium, tantalum, molybdenum, zirconium, chromium and tungsten, either alone or in combination with each other or in combination with other metals, while the substrate is selected from the group consisting of cemented carbide, cermet, ceramics, high speed steel, diamond, polycrystalline diamond and polycrystalline cubic boron nitride.

The metal in the metal nitride and in the metal-aluminum nitride may be titanium, and in each nanolayer set of the titanium-aluminum nitride bonding region nanolayer set has a certain thickness, and the titanium nitride nano-layer has a certain thickness, the thickness of the titanium aluminum nitride nano-layer differs from the thickness of the titanium nitride nano-layer.

The metal in the metal nitride and the metal aluminum nitride is preferably titanium, and in each set of nanolayers of the bonding region, the titanium aluminum nitride nano-layer has a specified thickness, and the titanium nitride nano-layer has a specified thickness, the thickness of the titanium-aluminum nitride nano-layer is greater than the thickness of the titanium-aluminum nitride nano-layer. .

The thickness of the titanium nitride nano-layers of the bonding region is substantially the same as they move away from the surface of the substrate.

In each set of bonding area nanolayers, the thickness of the metal nitride nanolayer is different from the thickness of the metal aluminum nitride nanolayer.

In each set of nano-layers, the metal-aluminum nitride nano-layer has a thickness greater than the thickness of the metal nitride nano-layer in the bonding region.

The outer area comprises nanolayer sets with alternating metal nitride and metal aluminum nitride nanolayers, wherein in each outer area nanolayer set, the thickness of the metal nitride nano-layer differs from the thickness of the metal aluminum nitride nanolayer.

In each set of nanolayers of the outer region, the metal clay nitride nanolayer has a thickness greater than the thickness of the metal nitride nanolayer.

The coated member may be one of the following: a cutting insert, an adjustable cutting insert, a drill, a milling cutter, an end mill, a reamer, and a tap.

The outer region preferably consists of a plurality of nanolayer sets comprising metal nitride and metal aluminum nitride, the thicknesses of the nano-layer sets being approximately equal.

A top coat is applied to the outer surface of the coating which consists of one or more layers of one or more of the following materials: alumina and nitrides, aluminum nitrides and aluminum carbonitrides, with one or more metals from the group consisting of titanium, niobium, hafnium, vanadium , tantalum, zirconium, chromium, alone or in combination with each other or in combination with other metals.

A slip film may be applied to the finish film.

The metal in the metal aluminum nitride nano-layer of each set of nano-layers is titanium and the aluminum / titanium atomic ratio is from 0.2 to 2.5.

The metal nitride layer may contain aluminum, and the composition of the aluminum-containing metal nitride nano-layer differs from that of the metal-aluminum nitride nano-layer.

In another embodiment of the invention, a nano-coated member comprising a substrate having a surface and a coating on the surface of the substrate, the coating being a plurality of sets of nanolayers, characterized in that each set of nano-layers consists of alternating metal nitride nanolayers. - aluminum and metal aluminum carbonitride, and the coating has a bond area

And an outer region, the bonding area of which is closer to the substrate than the outer area, the bonding area comprising a series of nano-layered sets of alternating metal-aluminum nitride and metal-aluminum carbonitride nano-layers, and the thickness of the nano-layer sets of the bonding region increases by measure away from the ground surface.

Preferably, the metal in the metal aluminum nitride and metal aluminum carbonitride nano-layers is selected from the group consisting of titanium, niobium, hafnium, vanadium, tantalum, molybdenum, zirconium, chromium and tungsten, either alone or in combination with each other or in combination with other metals. and the substrate is selected from the group consisting of sintered glycosyl, cermet, ceramics, high speed steel, diamond, polycrystalline diamond and polycrystalline cubic boron.

Preferably, also, in each set of bonding region nanolayers, the thickness of the metal-aluminum nitride nanolayer differs from that of the metal-aluminum carbonitride nano-layer, and the outer region comprises a plurality of nanolayers of alternating metal-aluminum nitride and metal-aluminum carbonitride nano-layers, and in each set of nano-layers in the outer region, the thickness of the metal-aluminum nitride nano-layer differs from the thickness of the metal-aluminum carbonitride nano-layer.

The coated member may be a cutting insert, the cutting insert having a rake surface and a side surface, the rake surface and the side surface intersecting to form a cutting edge.

The metal in metal-aluminum nitride and metal-aluminum carbonitride is titanium, and in each set of nanolayers of the bonding area, the titanium-aluminum nitride nano-layer has a specific thickness, and the titanium-aluminum carbonitride layer has a specific thickness, but the thickness of the titanium-aluminum nitride nano-layer differs from the thickness titanium-aluminum carbonitride nano-layers.

In a further embodiment of the invention, a nano-coated member comprising a substrate e having a surface and a coating on the surface of the substrate, the coating consisting of a plurality of sets of nanolayers, characterized in that each set of nano-layers consists of alternating nano-layers of metal nitride and metal aluminum nitride. and metal-aluminum carbonitride, and the coating has a bond area and an outer area, the bond area of which is closer to the substrate than the outer area, wherein the bonding region comprises a plurality of nanolayer sets of alternating metal nitride and metal aluminum nitride nano-layers, and metallocarbonitride, and the thickness of the bonding region nanolayer sets increases as it moves away from the surface of the substrate.

Preferably, the metal in the metal nitride, metal aluminum nitride and metal aluminum carbonitride is selected from the group consisting of titanium, niobium, hafnium, vanadium, tantalum, molybdenum, zirconium, chromium and tungsten, either alone or in combination with each other or in combination with others. metals, the substrate is selected from the group consisting of cemented carbide, cermet, ceramics, high speed steel, diamond, polycrystalline and polycrystalline diamond, cubic boron nitride.

Preferably, also, in each set of nanolayers in the bonding region, the thickness of the metal nitride nano-layer differs from the thickness of the metal-aluminum nitride nano-layer, the thickness of the metal nitride nano-layer differs from the thickness of the metal-aluminum carbonitride nano-layer, and the thickness of the metal-aluminum nitride nano-layer differs from the thickness of the nano-layer. metal-aluminum carbonitride, and the outer area contains a plurality of sets of alternating nano-layers of metal nitride and metal-aluminum nitride and metal-aluminum carbonitride in each set of nano-layers in the outer area the thickness of the metal nitride nano-layer is different from the thickness of the metal-aluminum nitride nano-layer, the thickness of the metal nitride nano-layer is different from the thickness metal-aluminum carbonitride nano-layers, and the thickness of the metal aluminum nitride nanolayer differs from the thickness of the metal aluminum carbonitride nano-layer.

The coated member may be one of the following: a cutting insert, an adjustable cutting insert, a drill, a milling cutter, an end mill, a reamer, and a tap.

The metal in the metal-aluminum nitride nano-layer and the metal-aluminum carbonitride nano-layer may be titanium, and in the aluminum-metal nitride nano-layer, the aluminum / titanium atomic ratio is 0.2 to 2.5, and in the metal-aluminum carbonitride nano-layer, the aluminum / titanium atomic ratio is from 0 , 2 to 2.5.

In a further embodiment of the invention, a nano-coated member comprising a substrate having a surface and a coating on the surface of the substrate, the coating being a plurality of nanolayer sets, characterized in that each nanolayer set is comprised of alternating titanium nitride nanolayers. - aluminum and titanium aluminum carbonitride.

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The coating may have a bond area that is adjacent to the surface of the substrate.

The bonding region comprises a plurality of sets of nanolayers, with the thickness of each set of nano-layers increasing as it moves away from the surface of the substrate.

The outer area of the shell may be adjacent to the bond area.

The outer region preferably comprises a plurality of nanolayer sets, with the thicknesses of all sets of nano-layers being approximately equal.

According to the invention, the method for producing a nano-coated member, in which a substrate having a certain surface is prepared and covered with a coating containing sets of nanolayers by means of vapor deposition with the use of targets, is characterized in that a metal target is prepared and a metal-aluminum target is prepared, and then the substrate is rotated between the metal target and the metal-aluminum target, and the metal target is supplied with electricity at the first energy level of the metal target, and the metal-aluminum target is energized at the first energy level of the metal-aluminum target, and a coating consisting of from sets of alternating nano-layers, and then the rate of evaporation of alternating nano-layers varies over a selected period of time, in which the level of electricity supplied to the metal target changes from the first energy level to the second energy level of the metal target and the level of electricity supplied to the metal-aluminum target changes from the first energy level to the second energy level of the metal-aluminum target, and at the same time, the vaporization rate of the alternating nanolayers is controlled over a period of time after the second energy level of the metal target and the second energy level of the metal-aluminum target are reached.

Preferably, metal nitride and metal aluminum nitride nanolayers are alternately vaporized.

Preferably, a series of alternating nano-layers of metal nitride and metal-aluminum nitride are also vaporized as the electric power supply of the metal target is changed from the first energy level of the metal target to the second energy level of the metal layer, and the electric energy supply of the metal-aluminum target is changed from the first. the energy level of the metal-aluminum target to the second energy level of the metal-aluminum layer, forming the coating bonding area.

A series of sets of alternating nano-layers are vaporized while maintaining the electrical power to the metal target at the second energy level of the metal target and while maintaining the electrical supply to the metal-aluminum target at the second energy level of the metal-aluminum target to form the outer area of the coating.

Preferably, a first energy level of the metal target is used that is lower than the second energy level of the metal target and a first energy level of the metal-aluminum target is used that is lower than the second energy level of the metal-aluminum target.

In another embodiment of the invention, a method for producing a nano-coated member in which a substrate is prepared having a surface and coated with a coating containing nanolayer assemblies by means of vapor deposition, characterized by preparing a metal-aluminum target, and preparing a metal-aluminum target. aluminum-carbon, and then the substrate is rotated between the metal-aluminum target and the metal-aluminum-carbon target, and the aluminum-metal target is energized at the first energy level of the metal-aluminum target and the metal-aluminum-carbon target is supplied to the first energy level of the metal-aluminum target. aluminum-carbon and a coating consisting of sets of alternating nano-layers is deposited on the surface of the substrate, then the evaporation rate of alternating nano-layers changes over the selected period of time in which the level of electrical energy supplied to the metal-aluminum target changes from the first energy level to the second energy level of the metal-aluminum target, and the level of electrical energy supplied to the metal-aluminum target changes. aluminum-carbon from the first energy level to the second energy level of the metal-aluminum-carbon shield, and at the same time the evaporation rate of the alternating nanolayers is controlled over a period of time after the second energy level of the metal-aluminum target and the second energy level of the metal-aluminum-carbon target are reached.

Preferably, metal aluminum nitride and metal aluminum carbonitride nano-layers are alternately vaporized.

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A series of alternating nano-layers of metal-aluminum nitride and metal-aluminum carbonitride is vaporized over a period of time as the electrical power supply to the metal-aluminum target is increased from the first energy level to the second level of the aluminum-metal target and the electrical power supply to the metal-aluminum-metal target is increased. carbon from the first energy level to the second level of the metal-aluminum-carbon target, forming the shell bonding area.

A series of alternating nano-layers is vaporized while maintaining the electric energy supply of the metal-aluminum target at the second energy level of the metal-aluminum target and while maintaining the electric energy supply of the metal-aluminum-carbon target j at the second energy level of the metal-aluminum-carbon target forming the outer area coatings.

In a further embodiment of the invention, a method for producing a nano-coated member in which a substrate having a surface is prepared and coated with a coating containing nanolayer sets by means of vapor deposition, characterized by preparing a metal target, a metal-aluminum target and a metal target. - aluminum-carbon, and then the substrate rotates between the metal disc, a metal-aluminum target and a metal-aluminum-carbon target and the metal target is supplied with electricity at the first energy level of the metal target, the metal-aluminum target is supplied with electricity at the first energy level of the metal-aluminum target and the metal-aluminum-carbon target is supplied at the first energy level of the metal-aluminum-carbon target j, a coating consisting of sets of alternating nano-layers is deposited on the surface of the substrate, then the evaporation rate of alternating nano-layers changes over the selected period of time, in which the level of electricity supplied to the metal target changes from the first energy level to the second energy level of the metal target, the level of electricity supplied to the metal-aluminum target changes from the first energy level to the second energy level of the metal-aluminum target and the level of electricity supplied to the metal-aluminum-carbon target changes from the first energy level to the second energy level of the metal-aluminum target coal, and at the same time, the evaporation rate of the alternating nanolayers is controlled over a period of time after the second energy level of the metal target, the second energy level of the metal-aluminum target, and the second energy level of the metal-aluminum-carbon target are reached.

Preferably, metal nitride, metal aluminum nitride and metal aluminum glyconitride nano-layers are alternately vaporized.

A series of alternating nano-layers of metal nitride, metal-aluminum nitride and metal-aluminum carbonitride are vaporized over a period of time as the electric power supply to the metal target is increased from the first energy level to the second energy level of the metal target. the electric energy supply to the metal-aluminum target increases from the first energy level to the second energy level of the metal-aluminum target and the electric energy supply to the metal-aluminum-carbon target increases from the first energy level to the second energy level of the metal-aluminum-carbon target, forming shell binding area.

Preferably, a series of alternating nano-layers is vaporized while maintaining the electric energy supply to the metal target at the second energy level of the metal target, supplying electricity to the metal-aluminum target at the second energy-level of the aluminum-metal target, and supplying electricity to the metal-aluminum-carbon target on the second the energy level of the metal-aluminum-carbon target, forming the outer area of the coating.

Preferably, the nano-layer metal nitride may contain carbon and optionally silicon in the oce coating, and the metal-aluminum nitride may contain carbon and optionally silicon. The aluminum metal carbonitride of the nano-layers may optionally contain silicon

Generally, the composition of the metal nitride layer differs from that of the metal-aluminum nitride layer and the metal-aluminum carbonitride layer.

In the process according to the invention, metal targets are preferably used, which may optionally contain carbon and optionally silicon, and metal-aluminum targets are used, which may optionally contain carbon and / or silicon, and metal-aluminum-carbon targets are used which may possibly contain silicon.

Generally, the composition of the metal target differs from that of the metal-aluminum target.

The subject of the invention is illustrated in the exemplary embodiments with reference to the drawing, Fig. 1 is an isometric view of a specific embodiment of a nano-coated cutting tool, Fig. 2 is a schematic, cross-sectional view of the cutting edge of the nano-coated cutting tool of Fig. 1, showing the substrate. with a nano-film coating consisting of a bond area and an outer area and also comprising a finish film and a skid film, Fig. 3 - transmission electron microscopy (TEM) photomicrograph of the interface between the coating and the substrate in the case of the cutting tool covered with the nano-layers of Example 276, Fig. 4 - photomicrograph made by Transmission Electron Microscopy (TEM) of the middle section of the coating in the case of the cutting tool coated with the nanolayers of Example 276, and Fig. 5 - micrograph, taken by Transmission Electron Microscopy (TEM), of the surface area of the cutting tool's coating coated with the nano-layers of Example 276.

Fig. 1 illustrates a specific design of a cutting tool designated generally at 20. The cutting tool 20 has an upper rake surface 22 and a relief surfaces 24. The upper rake surface 22 intersects with the relief surfaces 24 to form cutting edges 26 at their intersecting points.

As shown in Fig. 2, the cutting tool 20 comprises a substrate 30 that has a nano-film coating generally indicated at 32. The nano-film coating 32 has a bonding region, indicated at 34 in Fig. 2.

As described later, the bonding region 34 consists of one or more sets of nano-layers (and typically a plurality of sets of nano-layers). The nanolayer coating 32 also has an outer area, indicated at 36 in Fig. 2. As described later, the outer area 36 consists of a plurality of sets of nano-layers.

Figure 2 shows that the nano-film coating 32 has been applied to the rake face 38 and the relief face (s) 40 of the substrate 30, but it should be noted that there are circumstances in which the nano-film coating 32 may only be applied to one surface. from selected surfaces or selected parts of the substrate surface.

In one embodiment of the coating system, the nano-layer coating 32 may be comprised of two or more sets of alternating nano-layer materials, one material being a metal nitride and the other material being a metal-aluminum nitride (e.g., titanium nitride / nitride). titanium aluminum or titanium aluminum nitride / titanium nitride). That is, in one specific coating example, the metal nitride (e.g., titanium nitride) layer may be the layer closest to (or actually on) the surface of the substrate. In yet another specific example of the coating, the metal aluminum nitride (titanium aluminum nitride) layer may be the layer closest to (or actually on) the surface of the substrate. Metal nitrides and metal-aluminum nitrides of the following metals and their alloys would be acceptable for use in the nano-layer coating 32: titanium, niobium, hafnium, vanadium, tantalum, zirconium and optionally chromium, either alone or in combination with each other or in combination with other metals. The metal nitride layer may include aluminum as long as the composition of the metal nitride layer differs from that of the metal aluminum nitride layer. Each of the metal nitrides and metal aluminum nitrides may contain, as an optional component, carbon and optionally silicon.

In another example of the coating system, nano-film coating 32 can be comprised of two or more sets of alternating material films, one material being metal-aluminum nitride and the other material being metal-aluminum carbonitride (e.g., titanium-aluminum nitride / carbonitride). titanium aluminum or titanium aluminum carbonitride / titanium aluminum nitride). What this means is illustrated in one specific coating system where the metal aluminum nitride (e.g., titanium aluminum nitride) layer may be the layer closest to (or actually on) the surface of the substrate. In yet another specific coating system, the metal aluminum carbonitride (e.g., titanium aluminum carbonitride) layer may be the layer closest to (or actually on) the surface of the substrate. Along with the metal nitride / metal-aluminum nitride kits for use in the nanolayer coating, the following metals and their alloys are acceptable: titanium, niobium, hafnium, vanadium, tantalum, zirconium and possibly chromium, either alone or in combination with each other or in combination with other metals. The metal aluminum nitride may contain, as

Optional ingredients, carbon and optionally silicon. The metal aluminum carbonitride may contain, as an optional component, silicon.

In another example of the arrangement, the nano-film coating 32 may be comprised of alternating layers of metal nitride, metal-aluminum nitride, and metal-aluminum carbonitride. When the metal is titanium, the systems of these nano-layers can be the following: titanium nitride / titanium-aluminum nitride / titanium-aluminum carbonitride or titanium-aluminum carbonitride / titanium-aluminum nitride / titanium nitride or titanium-aluminum carbonitride / titanium nitride / titanium nitride- aluminum or titanium aluminum nitride / titanium aluminum carbonitride / titanium nitride or titanium nitride / titanium aluminum carbonitride / titanium aluminum nitride or titanium aluminum nitride / titanium nitride / titanium aluminum carbonitride.

In one group of these coatings with titanium as the metal, the titanium nitride layer may be closest to (and in fact on) the surface of the substrate. In this group, other layers include a titanium aluminum nitride layer and a titanium aluminum carbonitride layer.

In another group of these systems, the titanium aluminum nitride layer may be the layer closest to (or actually on) the surface of the substrate. In this group, other layers include the titanium nitride layer and the titanium aluminum carbonitride layer.

In yet another group of systems, the titanium aluminum carbonitride layer may be the layer closest to (actually on) the surface of the substrate. In this group, other layers include the titanium nitride layer and the titanium aluminum nitride layer.

While titanium nitride, titanium-aluminum nitride, and titanium-aluminum carbonitride are specific compounds for the nanolayer systems noted above, other metal nitrides, metal-aluminum nitrides, and metal-aluminum carbonitrides are acceptable. In this respect, other metals and their alloys to metal nitride, metal aluminum nitride and metal aluminum carbonitride include niobium, hafnium, vanadium, tantalum, zirconium and optionally chromium, either alone or in combination with each other or in combination with other metals. The metal nitride layer may contain aluminum as long as the composition of the metal nitride layer differs from that of the metal aluminum nitride layer and the metal aluminum carbonitride layer. In the above systems, each metal nitride (e.g., titanium nitride) and metal-aluminum nitride (e.g., titanium aluminum nitride) may contain, as an option, carbon and optionally silicon. The metal aluminum carbonitride (e.g., titanium aluminum carbonitride) may contain silicon as an optional component.

Referring again to the specific example of the coating system shown in Figure 2, the bonding region 34 has a plurality of nanolayer sets of alternating titanium nitride and titanium aluminum nitride nanolayers. The purpose of the bond zone 34 is to provide good adhesion between coating 32 and substrate 30 during use (e.g., metal cutting applications). The bond region 34 has a thickness of from 0.025 to 0.6 micrometers. Even more preferably, the bond area has a thickness of from 0.05 to 0.4 micrometers. Each nanolayer in the bond region 34 (whether it is a titanium nitride nano-layer or a titanium-aluminum nitride nanolayer) has a thickness that can be 0.5 to 5 nanometers, and especially can be 0.5 to 2 nanometers. .

The thickness of the titanium aluminum nitride layer typically differs from the thickness of the titanium nitride layer. Generally speaking, the thickness of the coating film varies due to one or more factors, these factors being set forth without limitation below.

The sets of nano-layers that make up the bonding region 34 vaporize during the so-called rising portion of the coating process. The ascending part of the process takes place during the initial part of the process where the evaporation rate increases from the first to the second energy level. While this depends on the completion time of the so-called ascending portion of the process, the number of nanolayer sets may be in the hundreds, since each set of nanolayers is nano-sized (i.e., less than about 100 nanometers thick).

As a result of this steadily increasing evaporation rate during the ascent period, the thickness of the nanolayer sets in bonding region 34 varies. Specifically, generally, as they move away from the substrate surface, the thickness of each nanolayer set increases (usually gradually) for as long as it moves away from the surface of the substrate. until the thickness of each nanolayer set reaches a point where the thickness of the nanolayer sets is generally consistent. In the process, the rate of evaporation increases during the ascent period, resulting in an increase in thickness. The increase in vaporization can be caused (without limitation) by one or more of the following factors: gas composition in the chamber, gas flow rate in the chamber, target spray rate, and possibly the level of electrical energy applied to the target.

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It should be understood that the increase in thickness of each nanolayer set may be due to an increase in the thickness of each nanolayer. Alternatively, an increase in the thickness of each set of nanolayers may occur when the thickness of one nanolayer remains substantially constant and the thickness of the other nanolayer increases.

In the method according to the invention, when, for example, the electrical energy supplied to the vaporization discs has already reached the second energy level, in the remainder of the coating process, in order to produce the outer skin region, the electrical energy to which at least one is supplied is preferably reduced. from shields, to a level greater than the first energy level. This lower energy level may be different for each target. Thus, the level of electrical energy applied to each target may be varied during part of the process to overlap the outer area.

In the bonding region 34, for example, the titanium nitride layer and the titanium carbonitride layer may have an aluminum content of from 0 to a higher level, as long as the amount of aluminum is less than the amount of aluminum contained in the titanium aluminum nitride layers and the titanium aluminum carbonitride films.

Referring still to Fig. 2, the plurality of nanolayer assemblies that make up the outer region 36 are an array of alternating titanium nitride and titanium aluminum nitride nano-layers. The outer area has a thickness of 1 to 20 micrometers provided there is good adhesion between the coating and the substrate in metalworking applications. Even more preferably, the outer region has a thickness of from 1 to 10 micrometers. Each nano-layer (whether it is a titanium nitride or titanium aluminum nitride film) has a thickness of between 0.5 and 20 nanometers. More preferably, the thickness of each such nanolayer is from about 0.5 to about 10 nanometers, and most preferably, the thickness of each such nanolayer is from 0.5 to 2 nanometers.

The thickness of each set of nanolayers in the outer region 36 may be substantially equal or the thicknesses may vary. In those situations where the coating compositions are of substantially equal thickness, the thickness of the nano-layers that make up the nano-film set, i.e. the titanium nitride nano-layers and the titanium-aluminum nitride nanolayers, need not necessarily be equal. In connection with how it will be seen from the following description of the nanolayer system in Fig. 3, the thickness of the titanium nitride nano-layer is from about 1 to about 2 nanometers and the thickness of the titanium-aluminum nitride nano-layer is from about 10 to about 11 nanometers. Accordingly, the thickness of the titanium nitride nanolayers in the bonding region also ranges from about 1 to about 2 nanometers, while the thickness of the titanium aluminum nitride nanolayers increases as the coating assemblies move away from the substrate. The titanium nitride nano-layer may preferably be from 0.5 to about 2 nanometers thick. The titanium aluminum nitride nano-layer may preferably be from about 0.5 to about 11 nanometers thick.

As mentioned above, since the spray rate of the titanium aluminum target is greater than the spray rate of the titanium target, generally speaking, the thickness of each titanium aluminum nitride nanolayer may be greater than the thickness of each titanium nitride nanolayer.

Fig. 2 shows a finishing layer 50 which may consist of titanium nitride or titanium aluminum nitride. The finishing layer 50 has a thickness of from about 0.1 to about 3 microns. As the finish layer 50 may include metal nitrides, metal aluminum nitrides, and metal aluminum carbonitrides. With respect to this, other metals and their alloys to metal nitrides, metal-aluminum nitrides, and metal-aluminum carbonitrides include titanium, niobium, hafnium, vanadium, tantalum, zirconium and possibly chromium, either alone or in combination with each other or in combination with other metals. . Finishing layer 50, alternatively or in addition to the foregoing finishing layers, may be an alumina layer. The finish layer 50 is typically applied by physical vapor deposition (PVD) techniques. The finish layer 50 is provided with a slip layer 52 which may include a material such as molybdenum disulfide. The total thickness of the finish 50 and the overlay 52 is from about 0.1 to about 3 micrometers. Each finish and overlay are optional layers for the coating system.

The substrate 30 shown in Fig. 2 is typically a hard material such as cemented carbide. A typical exemplary composition of Substrate 30 which is Substrate A is a sintered tungsten carbide (cobalt) based material that contains up to 0.1 wt% tantalum, up to 0.1 wt% niobium, up to 0.1 wt% titanium, from 0 , 3 to 0.5 wt.% Chromium, 5.7 to 6.3 wt.% Cobalt, the balance being tungsten and carbon, most of which is in the form of tungsten carbide. The substrate has a hardness of 92.6 to 93.4 according to Rockwell A, a coercive strength (Hc) of 198.8 to

PL 205 573 B1

254.4 A / m, specific gravity from about 14.80 to about 15.00 grams per cubic centimeter, tungsten carbide grain size 1-5 micrometers and magnetic saturation from 167.7 to 191.9 microtesla per cubic meter per kilogram cobalt . As will be discussed later, the coated cutting inserts used in the rolling tests had a substrate of the same composition as substrate A.

Another exemplary substrate composition which is substrate B is a sintered tungsten carbide (cobalt) based material that comprises 1.2 to 2.5 wt% tantalum, 0.3 to 0.6 wt% niobium, up to 0, 4 wt.% Titanium, 11 to 12 wt.% Cobalt, the balance being tungsten and carbon, most of which is in the form of tungsten carbide. The substrate has a nominal Rockwell A hardness of about 89.8, a coercive strength (Hc) of about 115.3 to about 147.1 A / m, a specific gravity of 14.1 to 14.5 grams per cubic centimeter, tungsten carbide grain size 1-6 micrometers and a magnetic saturation of 167.7 to 187.9 microtesla per cubic meter per kilogram of cobalt. As will be discussed later, the coated cutting inserts used in the milling trials had a substrate of the same composition as substrate B.

The substrate may also be a cermet, ceramic or high speed steel, polycrystalline cubic boron nitride, polycrystalline diamond or diamond sheet, or a thin diamond film. The substrate may be in the form of an intermittent cutting insert, cutting insert, drill, milling cutter, end mill, reamer, or tap made of any of the foregoing substrate materials.

The preferred adhesion strength of the coating to the substrate surface is at least 45 kilograms (kg). Even more preferably the adhesion force is at least 60 kg, more preferably the adhesion force is at least 100 kg. The test to determine the adhesion force is the insertion test of the probe used in the Rockwell A hardness test.

The preferred thickness of the entire nanolayer coating 32, except for the finish layer 50 and the overlay 52, is from about 1 to about 21 micrometers, preferably from about 1 to about 11 micrometers, and more preferably from about 2 to about 2 micrometers thick. about 6 microns.

Generally speaking, the method of producing the coatings is a physical vapor deposition technique such as magnetron sputtering. In the following examples, the coating apparatus was a Cemecon CC800 / 8 magnetron sputtering reactor. The coating reactor was configured such that the cutting insert substrates were rotated between the two sets of targets. Each set of targets was positioned 180 ° from the other set. One of the disc sets consisted of two titanium discs and the other set of discs consisted of two titanium-aluminum discs. The substrate table was rotated at 0.8 revolutions per minute. The substrates were mounted on rotating planetary rod holders on the substrate table.

In these examples, the process has two basic parts. The first portion is the so-called rising portion in which the power applied to the targets increases in about 45 minutes from 500 watts to a target power such as, for example, around 8,000 watts. When the energy reached its target value, it was then set to remain constant (and the energy power level was, for example, 8,000 watts or less) while the coating process was evened out. In another variant, the energy power may vary with the smoothing of the coating process. The nature of the variation may be, for example, a sine wave, a square wave, or a sawtooth wave.

The following examples were prepared in a manner generally consistent with the coating process described above. Each of the examples in Table I includes substrates that had a composition similar to that of substrate A, and substrates that had a composition similar to that of substrate B. The titanium wheel was solid titanium metal. The titanium aluminum target was a titanium metallic target that contained forty-eight aluminum pins. The process parameters for each of these examples are listed in Table 1 below.

PL 205 573 B1

Table I.

Process parameters for examples of titanium nitride / titanium aluminum nitride nanolayer coatings

<td>Example</td><td>Power shield Ti (kW)</td><td>Power shield TiAl (kW)</td><td>Speed flow argon (scm3)</td><td>Speed flow nitrogen (scm3)</td><td>Time overlapping (h)</td><td>Electricity polarity (amps)</td><td>Participation speed flow nitrogen</td>

In each of these examples, the flow rate of the krypton was as high as 80 standard cubic centimeters per minute (scm3). In table I, the scm designation3 for argon and nitrogen flow rate it is standard cubic centimeters per minute. In Table I, the nitrogen flow rate share equals the nitrogen flow rate (scm3) divided by the sum of the flow rates of nitrogen, argon and krypton (scm3). In the case of Example 281, in Table I, the argon flow rate was 175 scm3 occurred at the beginning of the ascent period and decreased during the ascent period to a flow rate of 100 scm3which was held during the remainder of the coating process.

There is control of the aluminum content of the titanium aluminum nitride in the machining depending on the specific metal cutting application. For some applications it is generally preferred that the aluminum / titanium atomic ratio (Al / Ti atomic ratio) is less than 1.0. In these applications, the preferred range for the Al / Ti atomic ratio is from about 0.2 to about 0.9. For other applications, it is generally preferred that the Al / Ti atomic ratio is greater than or equal to 1.0, with an even more preferred range for the Al / Ti atomic ratio being from 1.0 to about 2.5. The limitation of the higher end range is based on the ability of the coated cutting insert to have adequate hardness in metal cutting applications.

In order to increase the Al / Ti atomic ratio, the level of electrical power applied to the aluminum-containing target (s) may be increased and, optionally, the nitrogen flow rate share can be adjusted. In order to obtain the maximum aluminum content with a constant electrical power delivered to the aluminum-containing target (s), the nitrogen flow rate proportion can be lowered. One of the preferred nitrogen flow rates is less than 0.5. An even more preferred proportion of the nitrogen flow rate is less than 0.4, and an even more preferred proportion of the nitrogen flow rate is less than 0.35. If the nitrogen flow rate share is less than 0.2, then the adhesion and hardness of the films are reduced. The preferred range for the nitrogen flow rate proportion is generally from 0.2 to 0.35.

Table II below shows the processing parameters for Example 449. The rise for Example 449 was the same as the previous examples except that the titanium wheels were replaced with titanium aluminum carbon wheels. Each titanium-aluminum-carbon wheel contained twelve aluminum pins and twelve graphite pins in a metallic titanium target.

Table II

Process parameters for example 449 (Nano-film coatings: titanium aluminum carbonitride / titanium aluminum nitride)

<td>Example</td><td>Power shield TiAlC (kW)</td><td>Power shield TiAl (kW)</td><td>Speed flow argon (scm3)</td><td>Speed flow nitrogen (scm3)</td><td>Time overlapping (hours)</td><td>Electricity polarity (amps)</td><td>Participation speed flow nitrogen</td>

For the treatment in Example 449, the flow of krypton gas remained constant at 3 speeds of 80 standard cubic centimeters per minute. In table II, the scm designation3 for argon and nitrogen flow rate it is standard cubic centimeters per minute.

PL 205 573 B1

Table III below shows the processing parameters for Example 394. The climb for Example 394 was the same as the climb for Example 449 except that the titanium aluminum wheels were replaced with titanium wheels. Each titanium-aluminum-carbon wheel contained twelve aluminum pins and in the metallic titanium target twelve graphite pins.

Table III

Process parameters for example 394 (Nano-film coatings: titanium aluminum carbonitride / titanium nitride)

<td>Example</td><td>Power shield TiAlC (kW)</td><td>Power shield TiAl (kW)</td><td>Speed flow argon (scm3)</td><td>Speed flow nitrogen (scm3)</td><td>Time overlapping (h)</td><td>Electricity polarity (amps)</td><td>Participation speed flow nitrogen</td>

For the treatment of Example 394, the flow of krypton gas remained constant at 80 milliliters per minute. In table III, the scm designation3 for argon and nitrogen flow rate it is standard cubic centimeters per minute.

Selected properties of the resulting coated cutting tool are shown in Table IV below. These properties include the aluminum / titanium atomic ratio, overall coating thickness in micrometers, microhardness of the cutting tool in kilograms per square millimeter (kg / mm2) as measured by the standard Vickers test with a load of 25 grams and the adhesion force at the incision of the coated cutting tool, measured in kilograms.

Regarding the analysis of nanolayer films, a JEOL 6400 scanning electron microscope (SEM) with Oxford Industries INCA Energy 400 (EDS) dispersive X-ray spectroscopy was used to collect information on the composition of the coatings (i.e. titanium aluminum nitride coatings). Oxford Industries is headquartered at 130A Baker Avenue Ex, Concord, MA 01742, and JEOL USA, Inc. is based at 11 Dearborn, Peabody, MA 01960.

The coating was analyzed in the vapor state without additional sample preparation or application of a conductive coating. X-rays were collected using an accelerating voltage of 15 kV.

The coating must be a minimum thickness of about 3 micrometers in order to prevent the excitation of the substrate by the electron beam (thicker coatings would be necessary if a higher accelerating voltage was used). A minimum of 5 spectra are collected and the results are quantified. The apparent concentration of each element is equal to the intensity of that element in the sample multiplied by the percentage weight of that element in the standard and divided by the intensity of that element in the standard. The result must then be corrected for interactions between the elements so that the percentage weight of the element is equal to the apparent concentration divided by the corrected intensity. Atomic percentages are then calculated by dividing the weight percent by the atomic weight of the element. There are several ways to calculate the corrected intensities and the Phi-Rho-Z approach is used for this particular analytical scheme. Since the correction factors depend on the composition of the sample, the true concentrations are derived using iterative calculus.

Table IV

Selected properties of examples using the substrate A

<td>Example</td><td>Al / Ti atomic ratio (%)</td><td>Thickness (μ ™)</td><td>Average values of microhardness according to Vickers (kg / mm2)</td><td>Adhesion strength during stamping (kg)</td>

PL 205 573 B1 cont. table IV

<td> 394</td><td>0.24 [content 4.9% carbon atomic]</td><td> 4,2/4,1/4,0</td><td> 3016 ±133</td><td> > 60</td>

<td> 449</td><td>0.36 [content 2.9% carbon atomic]</td><td> 4,4/4,2/3,9</td><td> 2899 ± 60</td><td> > 60</td>

In the examples given in Table IV, substrates having a composition similar to that of substrate A were used. For the properties listed in Table IV, applicants would expect that coated cutting inserts using a substrate having a composition such as substrate B would exhibit such a composition. same or substantially similar properties.

Some examples were tested in turning applications, the turning parameters were as follows: workpiece material was 304 stainless steel, turning speed was 152 meters per minute, feed rate was 0.3 millimeters per revolution, cut depth was 2 millimeters, and cast coolant. The cutting tool was a CNGP432 cutting tool with a rake angle of minus 5 degrees and a sharp cutting edge. The results of the rolling tests are shown in Table 5 below.

The criteria for the service life of the tool are as follows: uniform abrasive wear of the side surface - 0.3 millimeters, maximum abrasive wear of the side surface - 0.4 millimeters, abrasive wear of the tip - 0.4 millimeters, abrasive wear of the crater - 0.100 millimeters, chip width on rake angle - 0.5 millimeters and the notch depth - 0.4 millimeters.

Table V

Tool life (minutes) when turning 304 stainless steel

<td>Example</td><td>Attempt 1</td><td>Attempt 2</td><td>Average</td><td>Standard deviation</td>

<td>KC5010 (comparative example)</td><td> 14,00</td><td> 16,00</td><td> 15,00</td><td> 1,41</td>

For Comparative KC5010, the substrate had the same composition as substrate A. The coating was a single layer of titanium aluminum nitride with a nominal thickness of about 4.0 micrometers. As for the still comparative example KC5010, the Al / Ti atomic ratio was about 1.0 and the microhardness was about 2500 kg / mm.2. The KC5010 cutting tool is a prior art cutting tool available from Kennametal Inc., Latrobe, Pennsylvania.

With respect to the photomicrograph of Figure 3, the bond area and the outer area of the coating system of Example 276 are shown. For each bond and outer area, there are alternating titanium nitride and titanium aluminum nitride nano-layers. The dark nano-layers are titanium nitride, while the light nano-layers are titanium-aluminum nitride.

In the case of Figures 3 and 4 and 5 it should be noted that applicants believe that the contrast observed in the dark between the nanolayers indicates either no aluminum in the titanium nitride nanolayers or a significantly lower amount of aluminum contained therein. than in titanium aluminum nitride nano-layers. It should be noted that the titanium nitride nanolayers are not necessarily pure titanium nitride as they may contain aluminum. To the extent that aluminum is contained in the titanium nitride nanolayers, this aluminum content may vary between the titanium nitride nanolayers. Applicants believe that the stained areas in the figures, and in particular in Figure 3, are TEM sample preparation artifacts.

Regarding the bond area, the titanium nitride nanolayers are from about 1 to 2 nanometers thick. The thickness of the titanium nitride nanolayers remains substantially constant in the bonding region. The thickness of the titanium aluminum nitride nanolayers starts in the range of about 1 to about 2 nanometers at and near the interface between the coating and the substrate. The substrate is the black area in the upper right corner of the photomicrograph. The thickness of the titanium aluminum nitride layers increased 14

PL 205 573 B1 moves away from the surface of the substrate. The thickness of the titanium aluminum nitride nanolayers is increased to a range of about 10 to about 11 nanometers.

Regarding the photomicrograph of Figure 4, a large area of the coating system is shown. The area consists of alternating titanium nitride and titanium aluminum nitride nano-layers, with one titanium nitride nano-layer and one titanium aluminum nitride nano-layer forming the nano-layer set. The thickness of each titanium nitride nano-layer is approximately equal, ranging from about 1 to about 2 nanometers. The thickness of each titanium aluminum nitride nano-layer is approximately equal, ranging from about 10 nanometers to about 11 nanometers.

With regard to the photomicrograph in Fig. 5, it shows the area of the coating that constitutes its outer area. This coating area consists of alternating titanium nitride and titanium aluminum nitride nano-layers, with one titanium nitride nano-layer and one titanium aluminum nitride nano-layer constituting a set of nano-layers. The thickness of each titanium nitride nano-layer is approximately equal, ranging from about 1 to about 2 nanometers. The thickness of each titanium aluminum nitride nanolayer is approximately equal, ranging from about 10 nanometers to about 11 nanometers.

The examples were tested in a milling application. The milling parameters were as follows: workpiece material was 4140 steel, speed was 183 meters per minute, feed rate was 0.3 millimeters per revolution, axial cut depth was 2.5 millimeters, radial cut depth was 75 millimeters and flood coolant. The cutting tool was a cutting tool of the SEHW43A6T type with a rake angle of 45 degrees and a T area of 0.2 millimeters and 20 degrees. The results of the milling trials are summarized in Table VI below.

The tool life criteria are as follows: homogeneous flank wear - 0.3 millimeters, maximum flank wear - 0.4 millimeters, tip wear - 0.4 millimeters, crater wear - 0.100 millimeters, chip width on the corner rake - 0.75 millimeters. In the examples given in Table VI, a substrate was used which had the same composition as substrate B. A comparative example of a KC525M is a cutting tool that has a substrate with a composition similar to that of substrate B and a titanium aluminum nitride coating, the coating having a nominal thickness of about 4.0 micrometers.

Table VI

Tool life (minutes) for milling 4140 steel

<td>Example</td><td>Attempt 1</td><td>Attempt 2</td><td>Attempt 3</td><td>Average Tool Life / Standard Deviation</td>

<td>KC525M (comparative example)</td><td> 4,97</td><td> 4,97</td><td> 6,62</td><td> 5,52/0,96</td>

The patents and other documents identified herein are incorporated herein by reference.

Other embodiments of the invention will be apparent to those skilled in the art from reading the description or practice of the invention described herein. The description and examples are intended to be illustrative only and are not intended to limit the scope of the invention. The true scope and idea of the invention is pointed out in the following claims.

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EP1485520B2	European Patent Office (EPO)	B2	2020-11-04

Nanolayered coated cutting tool and method for making the same

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PL 205 573 B1

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