Heat treatable low-e coated articles and methods of making same by sputtering ag in oxygen inclusive atmosphere
11 claims: 1 independent, 10 dependent
- 1Zastrzeżenia patentowe 1. Sposób wytwarzania wyrobu powlekanego zawierającego powłokę osadzoną na podłożu szklanym, w którym:- napyla się na podłoże szklane pierwszą warstwę dielektryczną;- rozpyla się tarczę zawierającą metal lub stop metaliczny w atmosferze zawierającej co najmniej tlen gazowy, dla utworzenia na podłożu, nad pierwszą warstwą dielektryczną, pierwszej warstwy kontaktowej zawierającej tlenek metalu;znamienny tym, że: - rozpyla się tarczę zawierającą Ag w atmosferze zawierającej co najmniej tlen gazowy dla utworzenia warstwy odbijającej promieniowanie podczerwone (IR) zawierającej tlenek srebra, umieszczonej nad pierwszą warstwą kontaktową i kontaktującej się z nią;- rozpyla się tarczę zawierającą metal lub stop metalu w atmosferze zawierającej co najmniej tlen gazowy dla utworzenia na podłożu drugiej warstwy kontaktowej zawierającej tlenek metalu tak, że ta druga warstwa kontaktowa znajduje się nad warstwą odbijającą IR zawierającą tlenek srebra i kontaktuje się z nią;przy czym do każdej odnośnej atmosfery w pobliżu tarcz użytych do napylenia pierwszej i drugiej warstwy kontaktowej wprowadza się więcej tlenu niż do atmosfery bliskiej tarczy zawierającej Ag użytej do napylenia odbijającej IR warstwy zawierającej tlenek srebra;oraz - poddaje się obróbce cieplnej podłoże szklane z naniesioną na nie powłoką dla termicznego jej zahartowania, przy czym w wyniku wspomnianej obróbki cieplnej przepuszczanie światła wyrobu powlekanego nie ulega zmniejszeniu.
- 2Sposób według zastrz. 1, znamienny tym, że stosunek ilości (a) gazowego tlenu wprowadzanego do atmosfery bliskiej tarczy zawierającej Ag użytej do napylenia warstwy odbijającej IR do (b) gazowego tlenu wprowadzanego do atmosfery bliskiej jednej z tarcz użytych do napylenia, odpowiednio, jednej z warstw kontaktowych, mieści się w zakresie od około 1 :1,3 do 1 : 10 tak, że w pobliżu tarczy użytej do napylenia warstwy kontaktowej jest więcej tlenu niż w pobliżu tarczy zawierającej Ag użytej do napylenia warstwy odbijającej IR.
- 3Sposób według zastrz. 2, znamienny tym, że wspomniany stosunek mieści się w zakresie od około 1 :1,5 do 1 : 8.
- 4Sposób według zastrz. 2, znamienny tym, że wspomniany stosunek mieści się w zakresie od około 1:2 do 1 : 5.
- 5Sposób według zastrz. 1, znamienny tym, że do atmosfery bliskiej tarczy zawierającej Ag wprowadza się tlen gazowy w ilości mieszczącej się w zakresie od około 20 do 100 cm 3 (sccm), przy czym co najmniej jedna z warstw kontaktowych zawiera NiCrOx.
- 6Sposób według zastrz. 1, znamienny tym, że do atmosfery bliskiej tarczy zawierającej Ag wprowadza się tlen gazowy w ilości mieszczącej się w zakresie od około 20 do 60 cm 3 (sccm).
- 7Sposób według zastrz. 1, znamienny tym, że do atmosfery bliskiej tarczy zawierającej Ag wprowadza się tak tlen gazowy jak i argon gazowy, przy czym do atmosfery bliskiej tarczy zawierającej Ag wprowadza się więcej argonu gazowego niż tlenu gazowego.
- 8Sposób według zastrz. 1, znamienny tym, że co najmniej jedna z warstw kontaktowych zawiera NiCrOx, a utlenianie odbywa się w sposób stopniowany tak, że pierwsza część wspomnianej warstwy kontaktowej, znajdująca się przy wspomnianej warstwie odbijającej promieniowanie podczerwone (IR) utlenia się w mniejszym stopniu niż druga część wspomnianej warstwy kontaktowej, która znajduje się dalej od wspomnianej warstwy odbijającej promieniowanie podczerwone (IR) i która znajduje się w środkowej części wspomnianej warstwy kontaktowej.
- 9Sposób według zastrz. 1, znamienny tym, że w kierunku od podłoża szklanego wyrobu powlekanego do warstwy zewnętrznej wprowadza się:- pierwszą warstwę dielektryczną, a następnie - pierwszą warstwę kontaktową zawierającą NiCrOx;- warstwę odbijającą IR zawierającą tlenek srebra;- drugą warstwę kontaktową zawierającą NiCrOx;- co najmniej jedną dodatkową warstwę dielektryczną;- trzecią warstwę zawierającą NiCrOx;- drugą warstwę odbijającą IR;- czwartą warstwę zawierającą NiCrOx;oraz - co najmniej jedną dodatkową warstwę dielektryczną. PL 205 140 B1
- 10Sposób według zastrz. 1, znamienny tym, że wyrobowi powlekanemu nadaje się transmitancję światła wynoszącą co najmniej około 65% i rezystancję powierzchniową (Rs) nie większą niż 8,0 Ω/kwadrat (Ω/ο).
- 11Sposób według zastrz. 1, znamienny tym, że do co najmniej jednej spośród warstw kontaktowych wprowadza się NiCrOx.
Independent claims11
184 paragraphs in 6 sections, as filed
Description of the invention
The invention relates to a method of making a coated article having a coating deposited on a glass substrate. Such coated articles can be used in the manufacture of vehicle windshields, insulating glass (IG) components, other types of windows in buildings and / or vehicles, and in other suitable applications.
Background and abstract of the invention
Sandwich coatings intended for devices associated with solar radiation are known in the art. A search is often made for this type of coating capable of reflecting a greater amount of infrared (IR) radiation while transmitting a large amount of visible radiation. Often a high value of transmittance (transmittance) of visible radiation (light) is desired, and this need often conflicts with the need for good IR reflection. Obtaining both of these properties at the same time is often difficult. In some cases, it is also desirable that such coatings be heat treatable so that they can be used in vehicle windows for which heat bending is necessary, toughened windows in buildings and vehicles, and / or the like.
WO 02/04375 discloses a low emissivity coating comprising the following layers: glass / TiOx / SixNy / NiCrOx / Ag / NiCrOx / SnOx / SixNy / NiCrOx / Ag / NiCrOx / SnOx / SixNy.
The metallic Ag layers are sputtered under an argon (Ar) gas atmosphere as is conventionally used in the art. Such a low emissivity coating provides excellent solar radiation efficiency and is generally a good coating. However, it has been found that such a coating is prone to scratching / scratching during, for example, after-treatment of the product (for example, prior to heat treatment).
Considering the foregoing, it will be apparent to those skilled in the art that there is a need for a coating that is low emissivity, mechanically more durable and thus less prone to scratching etc. and / or which is more thermostable (i.e. drastically reducing light transmittance after carrying out heat treatment such as quenching).
An object of some embodiments of the present invention is a more durable coating that is less susceptible to scratching and / or other types of mechanical damage and / or has improved thermal stability.
It has surprisingly been found that the sputtering of the Ag-containing layers in the above-mentioned coating, carried out in an atmosphere containing not only argon gas itself, but also gaseous oxygen, gives the resulting coating (a) greater mechanical durability and less susceptibility to scratching and / or (b) acceptable thermal stability. For example, it has been found that sputtering at least one Ag-containing layer in the above-mentioned coating formed in an atmosphere containing a combination of argon gas and oxygen gas leads to a more durable coating without sacrificing its thermal stability.
US Patent No. 5,584,902 discloses a low-emissivity window system comprising, from the glass substrate to the outer layer, the following sequenced layer system forming the coating: Si3N4 / NiCr / Ag / NiCr / Si3N4. Similar to most of the prior art, the Ag layer of the above patent is preferably sputtered under an argon gas atmosphere (see, for example, column 16 lines 33-45). However, in the above patent (column 12, lines 59-63) it is noted that each of the three metallic layers, namely NiCr / Ag / NiCr, may be sputtered optionally in an atmosphere containing a small amount of O2 (for example example, an amount ranging from 5 to 10%), but this fact means that all three layers (NiCr, Ag and NiCr) were sprayed in the same atmosphere and that each atmosphere contains the same amount of oxygen, which in some cases is undesirable. Although the coating of the above patent is heat treatable and inherently has a low E value, it has rather high emissivity and / or surface resistance values leading to rather low Rsolar (total solar energy reflectance) values. , in the range of about 22-24%. For example, one of the coatings described in the above-cited patent exhibited a sheet resistance (Rs) value of 14.4
Ω / square (Ω / ο) and normal emissivity (E<sub>n</sub>) of 0.15 before heat treatment, and Rs = 10.5 Ω / square (Ω / ο) and E<sub>n</sub> = 0.11 after heat treatment. Moreover, there is no disclosure or suggestion in this document that spraying an Ag-containing target in an oxygen-containing atmosphere may lead to improved mechanical stability and / or thermal stability.
PL 205 140 B1
As already explained above, it is an object of some embodiments of the present invention to provide a more durable, low emissivity coating that is less prone to scratching and / or other types of mechanical damage and / or improved thermal stability. This object can be achieved by sputtering at least one Ag-containing layer in an atmosphere containing O2 gas (for example, a combination of argon gas and oxygen gas can be used). The use of gaseous oxygen in the vicinity of an Ag sputtering target proves to be particularly advantageous in this respect when one or more immediately adjacent contact layers are highly oxidized (for example, when one or both adjacent contact layers consist of NiCrO x).
Another object of certain example embodiments of this invention is to provide a low emissivity coating with two Ag inclusive layers which is heat treatable and mechanically and / or chemically stable.
Another object of certain example embodiments of this invention is to provide a heat treatable low emissivity coating exhibiting high (light) transmittance (e.g., of about 65%) combined with a normal emissivity (En) of no greater than 0.08 (more preferably no greater than or equal to). than 0.06) before heat treatment and / or an En not greater than 0.07 (more preferably not greater than 0.05) after heat treatment (HT).
Another object of certain example embodiments of this invention is to provide a low emissivity heat treatable coating exhibiting high light transmittance combined with sheet resistance (R<sub>s</sub>) no greater than 10.0 Ω / square (Ω / ό), (more preferably no greater than 8.0 Ω / square (Ω / ο), most preferably no greater than about 5.0 Ω / square (Ω / ο) before heat treatment, and / or a R value<sub>s</sub> no greater than 8.0 Ω / square (Ω / ο), (more preferably no greater than 6.0 Ω / square (Ω / ο), most preferably no greater than about 4.0 Ω / square (Ω / ο) after treatment thermal.
The present invention relates to a method of producing a coated article having a coating deposited on a glass substrate, wherein:
- the first dielectric layer is sprayed onto the glass substrate;
- sputtering a target comprising a metal or a metallic alloy in an atmosphere containing at least oxygen gas to form on the substrate, over the first dielectric layer, a first contact layer comprising a metal oxide; consisting in the fact that:
- sputtering the Ag-containing target in an atmosphere containing at least oxygen gas to form an infrared (IR) reflecting layer comprising silver oxide placed over and in contact with the first contact layer;
- sputtering the target containing the metal or metal alloy in an atmosphere containing at least oxygen gas to form on the substrate a second contact layer comprising metal oxide such that the second contact layer is positioned over and in contact with the IR reflecting layer comprising silver oxide;
wherein each relevant atmosphere in the vicinity of the targets used to sputter the first and second contact layers is fed with more oxygen than the atmosphere in the vicinity of the Ag-containing target target used to sputter the IR reflecting layer comprising silver oxide; and
- heat-treating a glass substrate with a coating thereon to thermally temper it, without reducing the transmission of light of the coated article by said heat treatment.
Preferably, in the method according to the invention, the ratio of the amount of (a) oxygen gas introduced into the atmosphere close to the Ag-containing target used for sputtering the IR reflecting layer to (b) oxygen gas introduced into the atmosphere close to one of the targets used to sputter one of the contact layers, respectively, is ranges from about 1: 1.3 to 1: 10 such that there is more oxygen in the vicinity of the target used to sputter the contact layer than in the vicinity of the Ag-containing target used to sputter the IR reflection layer, the ratio being in the range of about 1: 1.5 to 1: 8, or preferably in the range of in the range of about 1: 2 to 1: 5.
Preferably, in the method of the invention, oxygen gas is introduced into the atmosphere close to the Ag-containing target in an amount ranging from about 20 to 100 (cm<sup>3</sup> (sccm)), with at least one of the contact layers containing NiCrOx, or oxygen gas is introduced in an amount ranging from about 20 to 60 (cm<sup>3</sup> (sccm)), or both gaseous oxygen and argon gas are introduced, with more argon gas than gaseous oxygen being introduced into the atmosphere close to the Ag-containing target.
PL 205 140 B1
According to a preferred variant of the method according to the invention, at least one of the contact layers comprises NiCrO x and the oxidation takes place in a staged manner such that the first portion of said contact layer adjacent to said infrared (IR) reflecting layer oxidizes less than the other portion. said contact layer, which is further away from said infrared (IR) reflecting layer and which is at a central portion of said contact layer.
Preferably in the process of the invention, in a direction from the glass substrate of the coated article to the outer layer:
- the first dielectric layer and then;
- a first contact layer containing NiCrO x;
an IR reflecting layer comprising silver oxide;
- a second contact layer comprising NiCrO x;
- at least one additional dielectric layer;
- a third layer containing NiCrOx;
- a second IR reflecting layer;
- a fourth layer containing NiCrOx; and
- at least one additional dielectric layer, the coated article having a light transmittance of at least about 65% and a sheet resistance (Rs) of no more than 8.0 (Ω / square (Ω / η)), and up to at least NiCrO x is introduced into one of the contact layers.
Certain other example embodiments of this invention accomplish one or more of the objectives enumerated above by providing a method of making a coated article including a coating deposited on a glass substrate which includes:
- a first dielectric layer deposited on a glass substrate;
an optionally present first metal oxide-inclusive contact layer provided on the substrate over the first dielectric layer, a portion of the first contact layer being at least about 40% oxidized;
- an IR reflecting layer, comprising silver oxide and in contact with the first contact layer or the lower dielectric layer, optionally present contact layer over the IR reflecting layer; and
- at least one dielectric layer disposed on the substrate above the IR reflecting layer in direct contact with either the IR reflecting layer or an optionally present contact layer.
The invention will now be described with reference to some embodiments thereof as explained in the following drawings.
Drawings
Fig. 1 is a cross sectional side view of a coated article made according to an example embodiment of this invention.
Fig. 2 is a schematic partial cross sectional view of a multi-layer vehicle windshield according to an exemplary embodiment of this invention, for which method coatings according to any embodiment of this invention may be used.
Fig. 3 (a) is a cross-sectional view of a portion of a coating fabricated according to an optional embodiment of this invention showing a pair of oxidation graded contact layers (e.g., NiCrOx layers) surrounding the IR reflecting layer.
Fig. 3 (b) is a cross-sectional view of a portion of a coating made according to another possible embodiment of this invention showing an IR reflecting layer surrounded by a pair of contact layers (e.g., NiCrOx layers), only one of which is an oxidation graded layer.
Fig. 4 is a schematic and partial cross-sectional view showing how an optionally stepped contact layer (e.g., a NiCrOx layer) is sputter-deposited, according to an example embodiment of this invention.
Fig. 5 is a cross-sectional view of an array of successively superimposed layers according to an exemplary embodiment of this invention.
PL 205 140 B1
Fig. 6 is a cross sectional view of a coated article according to another embodiment of this invention.
Detailed description of some exemplary embodiments of the invention
Referring in more detail to the accompanying drawings, numbers are set forth in the following description to indicate the relevant parts or layers shown in the figures representing a number of different views.
Some embodiments of the present invention provide a low-emissivity coating or layer system that can be used in applications such as vehicle windshields, other vehicle windows, skylights, glass doors, IG elements, other types of windows in buildings or apartments, etc. Preferably, the coatings made according to some embodiments of the present invention exhibit low emissivity (E) values as well as high light transmittance values, and are therefore amenable to heat treatment. Preferably, coatings made in accordance with some of the embodiments of the invention described herein are mechanically stable and before and / or after the heat treatment (HT) has been performed, and HT does not cause a major jump in sheet resistance (Rs) and / or haze. As is known from the prior art, such HT often forces the coated substrate to be heated to a temperature ranging from 560 ° C to 800 ° C for a sufficient time to achieve the desired result (e.g., toughened, bent and / or heat strengthened). ).
By some embodiments of the present invention, unexpectedly improved mechanical durability (e.g. even before HT) is achieved by sputtering at least one layer containing Ag (9 and / or 19) carried out in an atmosphere containing at least O2 gas. For example, in certain example embodiments of this invention, an Ag-containing target may be sprayed into an atmosphere containing a combination of Ar (or other inert gas) and O2 gas. As a result, a layer consisting of or including silver oxide is formed. The term "silver oxide" as used herein means that the Ag-containing layer (9 and / or 19) formed under conditions where at least some oxygen is present in a sputtering chamber in which an Ag-containing target is placed such that the resulting layer (a) is at least partially oxidized and / or (b) is constituted by metallic Ag mixed with oxygen atoms or contains the so oxidized Ag. It has surprisingly been found that the use of oxygen in an Ag spray chamber improves the adhesion existing between the silver oxide layer (9 and / or 19) and at least one of the directly adjacent contact layers (7, 11, 17 and / or 21) (e.g. which may be formed of (or include) NiCrOx, or may be formed of (or may include) any other suitable material as long as it is in contact with the Ag-containing layer). It has been found that the benefit of the presence of oxygen in an Ag spray chamber is particularly evident when the contact layer (s) (7, 11, 17 and / or 21) are oxidized to a large extent, i.e. the contact layer (s) is at least partially oxidized, and at least a portion of the contact layer is oxidized to at least about 40%, more preferably at least about 50%, most preferably at least about 60%. In certain embodiments of this invention, transmission of light through a coated article is not reduced after the heat treatment performed to thermally temper the article, and the like. In some embodiments, transmission starts low (e.g., in the range of 60 to 65%). such as 63%) and then increases with heating in the range of about 1-10%.
Fig 1 is a cross sectional side view of a coated article according to an embodiment of this invention. The coated article includes:
- substrate 1 (e.g. glass substrate, transparent, green, brown or blue-green in color, with a thickness ranging from about 1.0 to 10.0 mm, more preferably from about 1.8 mm to 4 mm );
- a first dielectric antireflection layer 3;
- the second dielectric layer 5;
- a first lower contact layer 7 (which is in contact with the layer 9);
- a first conductive layer 9 comprising silver oxide reflecting infrared (IR) radiation;
- a first upper contact layer 11 (which is in contact with the silver oxide-containing layer 9);
- a third dielectric layer 13 (which may be deposited in one or more steps according to various embodiments of the present invention);
PL 205 140 B1
- fourth dielectric layer 15;
- a second lower contact layer 17 (which is in contact with layer 19);
- a second conductive layer comprising silver oxide or Ag, an IR reflecting layer 19;
- a second upper contact layer 21 (which is in contact with layer 19);
- the fifth dielectric layer 23 and finally,
- the sixth protective dielectric layer 25.
All "contact" layers contact at least one IR reflecting layer 9 or 19. The above-mentioned layers 3 - 25 form a heat treatable low E (i.e. low emissivity) coating which is disposed on a glass substrate or made of plastic 1.
In accordance with certain embodiments of the present invention, the first dielectric layer 3 may be formed of (or include) the following materials (materials):
- titanium dioxide (TiO<sub>x</sub>) with x being in the range from 1.7 to 2.3 and preferably being 2.0;
- silicon nitride (SixNy (where x / y may be about 0.75 (i.e. Si3N4), or, alternatively, x / y may range from about 0.76 to 1.5 in high Si-content embodiments );
silicon oxide (SiOx) where x is in the range from 1.7 to 2.3, most preferably about 2.0);
- niobium oxide (for example Nb2O3);
- zirconium silicon nitride;
- tin oxide;
- zinc oxide;
- silicon oxynitride; or any other suitable material that is a dielectric.
In some embodiments of this invention, the first dielectric layer 3 functions as an anti-reflection layer.
In accordance with certain embodiments of the present invention, the second dielectric layer 5 may contribute to reducing haze. Preferably, it is made of silicon nitride (i.e. Si<sub>3</sub>N<sub>4</sub>) (or may include it) or, alternatively, high silicon nitride (SixNy), ... wherein x / y is in the range from 0.76 to 1.5, more preferably in the range from 0.85 to 1.2, for the purpose of reducing haze. In the case of sputtering the silicon nitride layer (s), an Si containing target may be used, or alternatively a Si containing target mixed with not more than 3-20% by weight of aluminum and / or stainless steel (e.g. SS # 316), the so formed layer being (in layers) approximately this amount of aluminum and / or steel will appear. Other materials, including (but not limited to) SiZrN, can also be used to form the haze-reducing layer.
Preferably, the infrared (IR) reflecting layers 9 and 19 include silver (Ag) as the IR reflecting material. Either one or both of the IR reflecting layers 9 and 19 may be formed of or may contain silver oxide as described above (thus may be formed by sputtering an Ag-containing target in an oxygen-containing atmosphere). In case only one of the layers 9 and 19 is formed of or includes silver oxide, the second IR reflecting layer may be formed of or include Ag, or may be formed of or include any other suitable IR reflecting material. These IR reflecting layers 9 and 19 are helpful in allowing the coating 27 to exhibit a low emissivity property.
In accordance with certain embodiments of this invention, the contact layers 7, 11, 17, and 21 are formed of (or include) nickel oxide or a nickel alloy oxide such as nickel chromium (nichrome) oxide (NiCrO x). In accordance with some embodiments of the present invention, NiCrO layers<sub>x</sub> 7, 11, 17 and / or 21 may be fully oxidized (i.e., fully stoichiometric) or, in accordance with other embodiments of this invention, may be at least about 75% oxidized. Although NiCrO<sub>x</sub> are preferred materials for the formation of layers 7, 11, 17 and / or 21, however, those skilled in the art will recognize that other materials may be used instead of them, and that one or more contact layers may be formed of metal oxide such as Ni oxides, Ni alloy oxides, Cr oxides, Cr alloy oxides, NiCrOxNy or any other suitable material. Thus, when the contact layer is said to be constituted by a "metal oxide", it is understood that the term also encompasses metal alloy oxides such as NiCr, and also includes partially nitrided layers (in addition to oxidation). Optionally, one or both of the contact layers adjacent to one or both of the IR reflecting layers can be removed.
PL 205 140 B1
It has been found that in any event, whatever metal (s) are in the contact layer (s) 7, 11, 17 and 21, the benefit of using oxygen in the Ag sputtering chamber (s) becomes particularly beneficial when one or more of the contact layers (7, 11, 17 and / or 21) adjacent the silver oxide layer (9 or 19) is substantially oxidized. Thus, at least one contact layer (and preferably two) adjacent the silver oxide layer has a central portion partially oxidized, and at least a portion of the contact layer is oxidized at least about 40%, more preferably at least about 50%. most preferably at least about 60%. It should be noted that in accordance with various embodiments of the present invention, the contact layers 7, 11, 17 and / or 21 may, optionally, not be continuous.
Where, according to some embodiments of the invention, layers 7, 11, 17 and / or 21 contain NiCrO<sub>x</sub>, Ni and Cr can be present in various amounts, such as in the case of nichrome in an amount ranging from 0 to 90 wt% (Ni) and from 10 to 90 wt% Cr. An exemplary sputtering target used to deposit such layers includes not only SS-316 (composed essentially of 10% Ni and 90% other components, mainly Fe and Cr), but also Haynes 214 alloy.
In accordance with certain embodiments of this invention, one or more contact layers 7, 11, 17, and / or 21 (e.g., formed of NiCrO<sub>x</sub> or containing it), may be oxidized in a staged manner such that the degree of oxidation of such layer (s) varies with increasing thickness of the layer (s). The use of oxidation staging is optional and not adopted in some embodiments of the present invention. When used, one or more of the contact layers (7, 11, 17 and / or 21) can be oxidized in a stepwise manner such that that at the surface in contact with the immediately adjacent IR reflecting layer (9 or 19) they will be oxidized to a lesser extent than in the part of the contact layer (s) further or further / farthest from the immediately adjacent IR reflecting layer (in each case the center of the contact layer is oxidized at least partially). It is believed that the oxidation staging of one or more of the contact layers 7, 11, 17 and / or 21 can help the low emissivity coating 27 become heat treatable combined with high light transmission.
Figures 3 (a) and 3 (b) illustrate various types of staged oxidation of the contact layer (s) performed according to one example embodiment of this invention. These figures are given by way of example only. Further details relating to the gradation of oxidation of the contact layer (s) can be found in US Patent Application Serial No. 09/794224 (filed February 28, 2001), the disclosure of which is hereby incorporated by reference in its entirety.
Fig. 4 illustrates a method of depositing on a substrate an oxidation graded contact layer as part of a coating according to an exemplary embodiment of the present invention which involves introducing gaseous oxygen asymmetrically into the space containing the target. The substrate 1 with a portion of the layer system thereon advances in the direction D through the sputter coating apparatus. As substrate 1 moves in the D direction underneath disk 51 (in shield 53), gas is introduced around the target on both sides (57 and 59). Thus, on the one hand 57 of wheel 51, at least gaseous oxygen is fed to the coating zone below and / or near the target [(e.g.<sub>2</sub>) (for example, at a flow rate in the range of about 30 to 60 ml / min at 4.1 kW)] and, optionally, a mixture of oxygen and an inert gas such as argon (Ar). Conversely, on the other side 59 of wheel 51, a smaller amount of gaseous oxygen and a larger amount of other gas, such as Ar, are fed to the coating zone below and / or near the target. Again, further details relating to oxidation staging can be found in US Patent Application 09/794224.
Referring to Fig. 1, the third dielectric layer 13 acts as a coupling layer between the two halves of the coating 27, and is formed of or includes tin oxide in some embodiments of this invention.
However, other dielectric materials may also be used to form layer 13, including, but not limited to, silicon nitride, titanium dioxide, niobium oxide, silicon oxynitride, zinc oxide, etc. In certain embodiments of this invention, the fourth dielectric layer 15 functions as a haze reducing layer and preferably is formed of or includes silicon nitride (Si3N4 or, alternatively, the high silicon nitride discussed above). Nevertheless, in alternative embodiments of this
According to the invention, other materials (for example SiZrN) can also be used instead to form the dielectric layer 15.
In accordance with certain embodiments of this invention, the fifth dielectric layer 23 may be or include tin oxide. However, other dielectric materials may be used instead to form layer 23, including, but not limited to, silicon nitride, titanium dioxide, niobium oxide, silicon oxynitride, zinc oxide, etc. According to some embodiments of the present invention, the protective covering dielectric layer 25 is provided for at least durability and may be composed of silicon nitride (e.g., Si<sub>3</sub>N<sub>4</sub>) or contain it. However, other dielectric materials may be used instead to form layer 25, including, but not limited to, titanium dioxide, silicon oxynitride, tin oxide, zinc oxide, niobium oxide, SiZrN, etc.
Another layer (s) may also be introduced below and above the coating 27 shown in the drawing. Thus, although the layer system or coating 27 is "on" or "deposited on" substrate 1 (directly or indirectly), there may be another layer (s). Thus, for example, the coating 27 of Fig 1 can be considered "on" or "deposited on" substrate 1 even when another layer has been provided between the layer 3 and the substrate (other layers have been placed).
Moreover, in accordance with some embodiments of the invention, certain layers of the coating 27 may be removed and (in accordance with other embodiments of the present invention) other layers added, without departing from the general idea of certain embodiments of the present invention.
Further details relating to the above-mentioned layers 3 - 7, 11 - 17 and 21 - 25 can be found in U.S. Patent Application No. 09 / 794,224 (filed February 28, 2001), the disclosure of which is hereby incorporated by reference in its entirety (see : also WO 02/04375).
Fig. 2 illustrates a laminated product (e.g., vehicle windshield) made according to an embodiment of the present invention including the coating 27 of Fig. 1. As shown in Fig. 2, a laminate (e.g., vehicle windshield) includes a first substrate. glass 1 onto which the coating 27 is disposed, and a second glass substrate 31. A layer 33 of PVB [poly (vinyl butyral)] (or other polymeric material) has been positioned, in a known manner, between the substrates so as to contact one side of the coating 27. In the embodiment of the invention shown in FIG. 2, the coating 27 has been placed between the substrates. is at / on the second (or # 2) surface 37 of the laminate. The first surface 35 is on the outside of the laminate and is exposed to the outside of the vehicle. The second surface 37 is on the inside or inside of the substrate 1. The third surface 39 is on the inside of the inner substrate 31, the fourth surface 41 is on the inside of the vehicle. Preferably, the coatings 27 are provided here either on the second 37 or the third 39 surface of such laminates (the same also applies to the IG elements).
Referring to Fig. 1, while different thicknesses may be used in accordance with one or more of the objects of the invention discussed herein, there are examples of preferred thicknesses and materials for the respective layers deposited on a glass substrate 1 according to the embodiment shown in Fig. 1, are the following thicknesses and materials.
Table 1
Sample plastics / thicknesses; the embodiment according to Fig. 1
<td rowspan="2">Layer</td><td colspan="2">Thickness range (A) *</td><td rowspan="2">Example</td>
<td>Favorable range (A)</td><td>More favorable (A)</td>
<td> 1</td><td> 2</td><td> 3</td><td> 4</td>
<td>TiOx (layer 3)</td><td>0 - 400 (A)</td><td>40 - 200 (A)</td><td>80 (A)</td>
<td>SixNy (layer 5)</td><td>0 - 400 (A)</td><td>50 - 250 (A)</td><td>165 (A)</td>
<td>NiCrO<sub>x</sub> (layer 7)</td><td>5 - 100 (A)</td><td>10 - 50 (A)</td><td>26 (A)</td>
<td>AgO<sub>x</sub> (layer (9)</td><td>50 - 250 (A)</td><td>80 - 120 (A)</td><td>103 (A)</td>
<td>NiCrOx (layer 11)</td><td>5 - 100 (A)</td><td>10 - 50 (A)</td><td>26 (A)</td>
<td>SnO2 (layer 13)</td><td>0 - 800 (A)</td><td>450 - 800 (A)</td><td>550 (A)</td>
<td>SixNy (layer 15)</td><td>0 - 800 (A)</td><td>50 - 250 (A)</td><td>165 (A)</td>
PL 205 140 B1 cont. table 1
<td> 1</td><td> 2</td><td> 3</td><td> 4</td>
<td>NiCrO<sub>x</sub> (layer 17)</td><td>5 - 100 (A)</td><td>10 - 50 (A)</td><td>26 (A)</td>
<td>Ag (layer 19)</td><td>50 - 250 (A)</td><td>80 - 150 (A)</td><td>130 (A)</td>
<td>NiCrOx (layer 21)</td><td>5 - 100 (A)</td><td>10 - 50 (A)</td><td>26 (A)</td>
<td>SnO2 (layer 23)</td><td>0 - 500 (A)</td><td>50 - 250 (A)</td><td>100 (A)</td>
<td>Si3N4 (layer 25)</td><td>0 - 500 (A)</td><td>100 - 300 (A)</td><td>205 (A)</td>
* converter: 1 A = 10<sup>-1</sup> nm
Fig. 6 illustrates the heat treatable low emissivity coating 27 made according to another embodiment of the present invention. The coating 27 shown in Fig. 6 is the same as the coating of Fig. 1 described above, except that either (i) the dielectric layer 3 is removed or (ii) layers 3 and 5 are replaced with a single layer of silicon nitride 40. In accordance with some embodiments of the present invention, silicon nitride layer 40 may be formed from Si<sub>3</sub>N<sub>4</sub>, or it may contain it. In accordance with other embodiments of the invention, silicon nitride layer 40 may be formed of or include SixNy, wherein x / y may range from about 0.65 to 0.80, or alternatively from about 0. , 76 to 1.5 (in high silicon embodiments). In other embodiments of the particular embodiment shown in Fig. 6, layer 40 may be or include SiZrN. The nitride layer 40 is advantageous in that it acts to reduce haze, and its thickness is preferably in the range of about 1-50 nm (10 to 500 (A)). As with all of the embodiments of the invention described herein, high silicon nitride exhibits improved (compared to Si3N4) performance in reducing haze.
According to certain example embodiments of this invention, the layer systems of coating 27 in monolithic form exhibit the following low emissivity characteristics before / after heat treatment (HT). These characteristics are presented in Table 2 below.
Table 2
<td>Characteristic</td><td>Generally</td><td>More advantageously</td><td>Most preferably</td>
<td>Rs [Ω / square (Ω / π)] (before HT)</td><td> <= 10,0</td><td> <= 8,0</td><td> <= 5,0</td>
<td>Rs [Ω / square (Ω / π)] (after HT)</td><td> <= 8,0</td><td> <= 6,0</td><td> <= 4,0</td>
<td>En (before HT)</td><td> <= 0,08</td><td> <= 0,06</td><td>on</td>
<td>En (after HT)</td><td> <= 0,07</td><td> <= 0,05</td><td>on</td>
<td>Tvis (before and after HT)</td><td> >= 60%</td><td> >= 70%</td><td> >= 75%</td>
<td>Haze (after HT)</td><td> <= 0,40</td><td> <= 0,30</td><td> <= 0,28</td>
Note: in the table above and in the following tables, "n / a" means no data.
As can be seen from the text above, in certain embodiments of this invention, coated articles exhibit high light transmission (Tvis) both before and after HT when monolithic is used.
Coatings 27, prepared in accordance with certain example embodiments of this invention (for example, shown in FIG. 1-6) exhibit the following color / transmission / reflection / haze characteristics when deposited on a clear soda lime silicate glass substrate (for example with a thickness ranging from 2 to 4 mm), laminated or IG with Another similar clear soda lime silicate glass substrate (for example in the form of a laminated PVB vehicle windshield or index oil (with a known refractive index) between the two substrates, as shown in Fig. 2 or in the form of a typical IG element) as shown in Table 3 below. In Table 3 below, RgY means the reflection of light from the outside of the vehicle / building,
As shown in Fig. 2, and RfY means the reflection of light from another side of the laminate, such as the inside of the vehicle / building in Fig. 2, where a * and b * also relate to these relevant reflection parameters, to the glass side (g) and to the coating side (f) respectively.
TABLE 3 Color / transmission after HT;
Laminated form or IG element form
<td>Characters touches</td><td>Generally</td><td>More advantageously</td>
<td>Tvis (III.A, 2deg.):</td><td> >= 60%</td><td> >= 70%</td>
<td>Tvis (III.C, 2deg.):</td><td> >= 60%</td><td> >= 70%</td>
<td>RgY (III.AC; 2deg.):</td><td> <= 13%</td><td> <= 11%</td>
<td>a * g (III.C; 2 °):</td><td>-3.0 to + 5.0</td><td>-2.0 to + 2.0</td>
<td>b * g (III.C; 2 °):</td><td>-10.0 to + 10.0</td><td>-8.00 to -2.0</td>
<td>RfY (III.A, C; 2 deg.):</td><td> <= 14 %</td><td> <= 12%</td>
<td>a * f (III.C; 2 °):</td><td>-5.0 to + 5.0</td><td>-2.0 to 2.0</td>
<td>b * f (III.C; 2 °):</td><td>-10.0 to 10.0</td><td>- 5.0 to 5.0</td>
<td><sup>R</sup>solar:</td><td> >= 26%</td><td> >= 28%</td>
<td>Haze:</td><td> <= 0,4</td><td> <= 0,3</td>
<td><sup>T.</sup>solar:</td><td> <= 50%</td><td> <= 48%</td>
<td><sup>T.</sup> ultraviolet:</td><td> <= 0,45</td><td> <= 0,36</td>
<td>SHGC:</td><td> <= 0,50</td><td> <= 0,40</td>
Example
According to an exemplary embodiment of the present invention (method given to explain the invention but not limit its scope), the following coating was produced (for example, see Fig. 5). The layer system of coating 27 shown in Fig. 5 is believed to be deposited on a 3.3 mm thick, transparent substrate 1, made of smoothed soda-lime-silicate glass. A seven-chamber Leybold Terra-G sputter coating apparatus was used to dust the coatings 27 onto the substrates 1. A total of 27 cathodes were used. The cathode numbering uses the first digit referring to the chamber of the sputtering apparatus and the second one referring to the cathode position in this chamber. For example, cathode # 32 was the second cathode (second digit) in the third (first digit) sputtering chamber. Thus, it can be seen from this that, for example, the cathodes used to sputter the Ag-containing layers (i.e., cathodes # 31, # 32 and # 62, # 63) are located in different sputtering chambers than the cathodes used to sputter the NiCrO x contact layers. (i.e., cathodes # 25, # 33, # 61 and # 64). The sign "*" indicates an A1 content of approximately 10%. The line speed was about 4.99 m / min and the setting parameters for the coating process are shown in Table 4 below. All gas flows (e.g., oxygen, argon, nitrogen) are given in units (cm<sup>3</sup> (sccm)). "Volts (V)" refers to cathode volts and "amp (A)" refers to cathode amperes. Pressure is measured in hectopascals. "Trim gas" refers to the individual adjustment (tuning) of gas flows along the cathode for correction for thickness or stoichiometric layer uniformity; flows are given in units (cm<sup>3</sup> (sccm)). The nichrome (NiCr) targets were composed of 80/20 NiCr. The pressure for each spray chamber ranged from 3.7 to 7 E-3 hPa.
PL 205 140 B1
Table 4
Exemplary setting of processes in the coating apparatus
<td>Cathode</td><td>Shield</td><td>Volts (V)</td><td>Power (kW)</td><td>Ar (cm<sup>3</sup> (sccm))</td><td>O2 (cm<sup>3</sup> (sccm))</td><td>N2 (cm<sup>3</sup> (sccm))</td><td>Trim Gas</td>
<td> #11</td><td>Ti</td><td> 552</td><td> 12,9</td><td> 350</td><td> 11</td><td> 0</td><td>29.7 O2</td>
<td> #12</td><td>Ti</td><td> 549</td><td> 40,8</td><td> 350</td><td> 11</td><td> 0</td><td>29.8 O2</td>
<td> #13</td><td>Ti</td><td> 534</td><td> 0,6</td><td> 350</td><td> 11</td><td> 0</td><td>29.8 O2</td>
<td> #14</td><td>Ti</td><td> 263</td><td> 39,2</td><td> 350</td><td> 11</td><td> 0</td><td>29.8 O2</td>
<td> #15</td><td>Ti</td><td> 25</td><td> 0</td><td> 350</td><td> 0</td><td> 0</td><td> 0</td>
<td> #23</td><td>Si *</td><td> 658</td><td> 71,7</td><td> 250</td><td> 0</td><td> 299</td><td>124 N2</td>
<td> #25</td><td>NiCr</td><td> 507</td><td> 18</td><td> 250</td><td> 193</td><td> 0</td><td> 0</td>
<td> #31</td><td>Ag</td><td>on</td><td>on</td><td> 250</td><td> 0</td><td> 0</td><td> 0</td>
<td> #32</td><td>Ag</td><td>on</td><td>on</td><td> 225</td><td> 30</td><td> 0</td><td> 0</td>
<td> #33</td><td>NiCr</td><td> 479</td><td> 13,5</td><td> 250</td><td> 72</td><td> 0</td><td> 0</td>
<td> #35</td><td>Sn</td><td> 10,3</td><td> 0</td><td> 225</td><td> 72</td><td> 0</td><td> 0</td>
<td> #41</td><td>Sn</td><td> 479,5</td><td> 33,8</td><td> 200</td><td> 389</td><td> 75</td><td>159 O2</td>
<td> #42</td><td>Sn</td><td> 480</td><td> 33,2</td><td> 200</td><td> 360</td><td> 75</td><td>166 O2</td>
<td> #43</td><td>Sn</td><td> 494</td><td> 30,5</td><td> 200</td><td> 360</td><td> 75</td><td>166 O2</td>
<td> #44</td><td>Sn</td><td> 472</td><td> 33,9</td><td> 200</td><td> 360</td><td> 75</td><td>166 O2</td>
<td> #45</td><td>Sn</td><td> 477</td><td> 31,1</td><td> 200</td><td> 360</td><td> 75</td><td>166 O2</td>
<td> #51</td><td>Sn</td><td> 243</td><td> 40,6</td><td> 200</td><td> 389</td><td> 75</td><td>166 O2</td>
<td> #52</td><td>Sn</td><td> 2,1</td><td> 0</td><td> 200</td><td> 0</td><td> 75</td><td> 0</td>
<td> #54</td><td>Si *</td><td> 651</td><td> 56</td><td> 250</td><td> 0</td><td> 280</td><td>124 N2</td>
<td> #61</td><td>NiCr</td><td> 507</td><td> 18</td><td> 250</td><td> 128</td><td> 0</td><td> 0</td>
<td> #62</td><td>Ag</td><td>on</td><td>on</td><td> 275</td><td> 0</td><td> 0</td><td> 0</td>
<td> #63</td><td>Ag</td><td> 473</td><td> 8</td><td> 300</td><td> 0</td><td> 0</td><td> 0</td>
<td> #64</td><td>NiCr</td><td> 499</td><td> 13,4</td><td> 250</td><td> 59</td><td> 0</td><td> 0</td>
<td> #71</td><td>Sn</td><td> 505,6</td><td> 42</td><td> 200</td><td> 555</td><td> 62</td><td>195 O2</td>
<td> #73</td><td>Si *</td><td> 488</td><td> 61</td><td> 250</td><td> 0</td><td> 500</td><td>220 N2</td>
<td> #74</td><td>Si *</td><td> 498</td><td> 61</td><td> 250</td><td> 0</td><td> 500</td><td>220 N2</td>
<td> #75</td><td>Si *</td><td> 497</td><td> 61</td><td> 250</td><td> 0</td><td> 500</td><td>220 N2</td>
Taking into account the above set of parameters for the coater operation, it can be concluded that the lower IR reflecting layer 9 was sputtered in an oxygen-containing atmosphere, but that the upper IR reflecting layer 19 (see cathodes # 62-63) was sputtered in a pure Ar atmosphere. Thus, the lower IR reflecting layer (see cathodes # 31-32) was made of or contained silver oxide, while the upper IR reflecting layer 19 was metallic Ag. According to another method of making the present invention, both layers 9 and 19 (or, alternatively, the higher IR reflecting layer 19) may be formed of or contain silver oxide. The coating of the above example has the solar / optical / thickness properties shown in Tables 1-3 above.
With regard to the lower IR reflecting layer 9, where both oxygen and argon gas were used to sputter the Ag target, it can be stated that for a corresponding atmosphere close to the targets used for sputtering the first and second contact layers 7, 11 (or in the intermediate, no
In the compartment / chamber), more oxygen can be introduced than is introduced into the atmosphere close to the Ag-containing target used to sputter the IR reflecting layer containing silver oxide 9. In the above example, 30 cm are introduced into an atmosphere close to the Ag-containing targets.<sup>3</sup> (sccm) of gaseous oxygen, while the corresponding atmosphere used to sputter the adjacent contact layers 7 and 11, is introduced with 193 cm, respectively<sup>3</sup> (sccm) and 72 cm<sup>3</sup> (sccm) oxygen. Hence, the respective contact layers 7 and 11 can be oxidized to a greater degree than the IR-reflecting layer 9. This relative oxidation of the layer is a complex function of the sputtering process parameters. This also, there may be situations where the relative oxidation of the contact layers to the adjacent IR reflecting layer may not directly correlate with the relative flows of oxygen gas in the respective intervals. The scope of the invention is not limited to the relative oxidation levels between the contact (or dielectric) layers and the IR reflecting layers, unless specified in the claims.
In certain embodiments of the present invention, the ratio of (a) gaseous oxygen introduced into the atmosphere in the vicinity of the Ag-containing target to be sputtering the IR reflecting layer to (b) gaseous oxygen introduced into the proximal atmosphere of the target intended to sputter the adjacent contact layer is in the range of from about 1: 1.3 to 1: 10, more preferably in the range of from about 1: 1.5 to 1: 8, most preferably in the range of from about 1: 2 to 1: 5. In various embodiments of this invention, oxygen gas may be introduced into the atmosphere near the Ag-containing target in an amount ranging from about 10 to 250 cm.<sup>3</sup> (sccm), more preferably from about 20 to 100 cm<sup>3</sup> (sccm) most preferably from about 20 to 60 cm<sup>3</sup> (sccm) (e.g., independent of the relative gas flow in adjacent cathode compartments, or the oxidation levels of adjacent layers in the array). Additionally, oxygen for the contact layer (s) and / or the adjacent IR reflecting layer may be provided in all or only a portion of the adjacent compartments. In such a method, it will be possible to rely on diffusion in a sputtering apparatus to supply oxygen to the contact layer (s) and / or the IR reflecting layer (s).
After the coated article described in the above-mentioned example has been produced, it is heat treated to temper it. It was surprisingly found that when oxygen was supplied to the atmosphere in the vicinity of the Ag-containing target for at least one of the Ag-containing targets, it was possible to maintain high light transmission for a long duration HT (at least about 65%, more preferably at least about 70%). %, most preferably around 75%). The toughened coated article may be used either monolithically or in combination with another substrate in a variety of window manufacturing applications.
Certain terms are commonly used in the field of glass coating technology, in particular when defining the properties of coated glass and its solar radiation characteristics. These terms are used herein with their well-known meanings. For example, for the given meaning of these terms see US Patent Application No. 09/794224, incorporated herein by reference (see also WO 02/04375).
Numerous other characteristics, modifications, and improvements will become apparent to those skilled in the art upon presentation of the above disclosure. For example, without limiting the scope, the use of oxygen in sputtering the Ag-containing layer may be used with or without a staged oxidized contact layer (s) and / or layer (s) made of high silicon nitride. silicon. This can be used for layer systems sequentially superimposed with a single silver layer as well as the above explained layer systems successively superimposed with two or more silver layers. Thereby, the abovementioned dielectric materials for dielectric layers are given by way of example and the scope of the present invention is not limited thereto unless specified in the claims. Additionally, as used herein, the term "sputtering" encompasses any and all sputter coating methods, including (but not limited to) magnetron sputtering, sputtering, etc. Such other characteristics are considered to be characterized, modifications and improvements form part of the present invention, the scope of which is defined by the following claims.
Contents6
9 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9
14 members in 6 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 40768702 | United States of America | P | |
| 24395202 | United States of America | A | |
| 60407687 | – | – | – |
| US20020243952 | – | – | – |
| US20020407687P | – | – | – |
Members14
| Document | Office | Kind | |
|---|---|---|---|
| US2004043226A1 | United States of America | A1 | |
| CA2495703A1 | Canada | A1 | |
| WO2004022499A1 | World Intellectual Property Organization (WIPO) | A1 | |
| AU2003265497A1 | Australia | A1 | |
| AU2003265497A8 | Australia | A8 | |
| US6787005B2 | United States of America | B2 | |
| US2004180214A1 | United States of America | A1 | |
| EP1546055A1 | European Patent Office (EPO) | A1 | |
| PL374429A1 | Poland | A1 | |
| US7226528B2 | United States of America | B2 | |
| US2007163872A1 | United States of America | A1 | |
| CA2495703C | Canada | C | |
| PL205140B1This record | Poland | B1 | |
| US7771571B2 | United States of America | B2 |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Rectifications of patent specificationRECP | RECP |
Numbers
- Publication
- 205140
- Publication, DOCDB
- 205140
- Publication, EPODOC
- PL205140B
- Application
- 374429
- Application, DOCDB
- 37442903
- Application, EPODOC
- PL20030374429
Titles2
- English
- HEAT TREATABLE LOW-E COATED ARTICLES AND METHODS OF MAKING SAME BY SPUTTERING AG IN OXYGEN INCLUSIVE ATMOSPHERE
- Polish
- Sposób wytwarzania wyrobu powlekanego zawierającego powłokę osadzoną na podłożu szklanym
Classification
- CPC, 17
- C03C17/3423
- B32B17/10036
- B32B17/10174
- B32B17/10761
- B32B27/34
- C03C17/36
- C03C17/3618
- C03C17/3639
- C03C17/3644
- C03C17/3652
- C03C17/366
- C03C17/3681
- C03C2217/78
- C23C14/0063
- C23C14/0084
- C23C14/08
- C23C14/185
- IPC, 7
- C03C17 34
- B32B17 10
- B32B27 34
- C03C17 36
- C23C14 00
- C23C14 08
- C23C14 18
