NO844985L

Inverted positive vertical flow chemical vapor deposition reactor chamber.

Abstract

This record has no abstract on file.

Term

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15 members in 11 offices

This recordMember, by publication datePriority claim1 more office is in the list below

Priority claims4

Priority claims
DocumentOfficeKindDate
48991983United States of AmericaA
48991983United States of AmericaA
489919
US19830489919

Members15

Family members, oldest first
DocumentOfficeKind
WO8404334A1World Intellectual Property Organization (WIPO)A1
NO844985LThis recordNorwayL
DK620984D0DenmarkD0
KR840009176ARepublic of KoreaA
EP0142495A1European Patent Office (EPO)A1
JPS60501234AJapanA
CA1209330ACanadaA
EP0142495B1European Patent Office (EPO)B1
DE3367627D1GermanyD1
IL71376AIsraelA
US4732110AUnited States of AmericaA
IT1214395BItalyB
IT8448099A0ItalyA0
KR900001658B1Republic of KoreaB1
JPH0231490B2JapanB2