In-situ spectroscopy for monitoring fabrication of integrated computational elements.
Abstract
Technologies are described for monitoring characteristics of layers of integrated computational elements (ICEs) during fabrication using an in-situ spectrometer operated in step-scan mode in combination with lock-in or time-gated detection. As part of the step-scan mode, a wavelength selecting element of the spectrometer is discretely scanned to provide spectrally different instances of probe-light, such that each of the spectrally different instances of the probe-light is provided for a finite time interval. Additionally, an instance of the probe-light interacted during the finite time interval with the ICE layers includes a modulation that is being detected by the lock-in or time-gated detection over the finite time interval.

Term
No projected expiry on record.
- Priority
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- Granted
- Today
46 claims: 40 independent, 6 dependent
- 1CLAIMS REIVINDICACIONES IMPI MsTlTUTO MEXICANO lHST¿TUAPROPlKVAU IMPI msTlTUTO MEXICANO lHST¿tUAPROPlKVAU Habiéndose descrito la invención como antecede, se reclama como propiedad lo contenido en las siguientes reivindicaciones:Having described the invention as above, the content of the following claims is claimed as property: 1. Un método caracterizado porque comprende: one. A method characterized in that it comprises: receiving, by means of a manufacturing system, an integrated computational element (ICE) design, the ICE design comprises a description of a substrate and a plurality of layers, their respective objective complex refractive indexes and thicknesses, where the refractive indices Adjacent layer complexes are different from each other, and wherein a hypothetical ICE manufactured in accordance with the ICE design is related to a characteristic of a sample;recibir, mediante un sistema de fabricación, un diseño de un elemento computacional integrado (ICE), el diseño de ICE comprende una descripción de un sustrato y una pluralidad de capas, sus espesores e índices de refracción complejos objetivo respectivos, donde los índices de refracción complejos de capas adyacentes son diferentes entre sí, y en donde un ICE hipotético fabricado de conformidad con el diseño de ICE está relacionado con una característica de una muestra;formar, mediante el sistema de fabricación, al menos algunas de las capas de una pluralidad de ICE de conformidad con el diseño de ICE;forming, through the manufacturing system, at least some of the layers of a plurality of ICEs in accordance with the ICE design;Sequentially illuminating, by a measurement system associated with the manufacturing system, the layers formed with probe light instances provided by the measurement system, the instances are spectrally different from each other within a spectral measurement range, so each instance of the probe light illuminates the layers formed during an interval of iluminar de manera secuencial, mediante un sistema de medición asociado con el sistema de fabricación, las capas formadas con instancias de luz de sonda proporcionadas por el sistema de medición, las instancias son espectralmente diferentes entre sí dentro de un intervalo espectral de medición, de manera que cada una de las instancias de la luz de sonda ilumine las capas formadas durante un intervalo de 153 153 IMPI IMPI INSTITUTO MEXICANO tiempo finito;DE detectar, mediante el sistema de medición para rada una de las instancias de la luz de sonda, una modulación de luz de sonda que interactúa con las capas formadas;MEXICAN INSTITUTE finite time;OF detecting, by the rada measurement system, one of the instances of the probe light, a modulation of probe light that interacts with the layers formed;generar, mediante el sistema de medición, un espectro de la luz de sonda que interactuó con las capas formadas en el intervalo de medición espectral a partir de un conjunto de valores de las modulaciones detectadas correspondientes a las instancias de la luz de sonda;y ajustar, mediante el sistema de fabricación, la formación con base en el espectro generado. generating, by means of the measurement system, a spectrum of the probe light that interacted with the layers formed in the spectral measurement interval from a set of values of the detected modulations corresponding to the instances of the probe light;and adjust, through the manufacturing system, the training based on the generated spectrum.
- 2The method according to claim 2. El método de conformidad con la reivindicación 1, caracterizado porque comprende además generar la modulación de las instancias de luz de sonda que interactúa con las capas formadas antes de la iluminación de las capas formadas. 1, characterized in that it further comprises generating the modulation of the probe light instances that interacts with the layers formed before the illumination of the layers formed.
- 3The method according to claim 3. El método de conformidad con la reivindicación 2, caracterizado porque las instancias de la luz de sonda se modulan con un elemento óptico de interrupción. 2, characterized in that the instances of the probe light are modulated with an interrupting optical element.
- 4El método de conformidad con la reivindicación Four. The method according to claim 3, caracterizado porque el elemento óptico de interrupción se coloca dentro de una vía óptica que comienza en una fuente óptica que emite la luz de sonda y termina en las capas formadas. 3, characterized in that the interrupting optical element is placed inside an optical path that begins in an optical source that emits the probe light and ends in the layers formed.
- 5The method according to claim 5. El método de conformidad con la reivindicación 154 154 INSTITUTO MEXICANO DE LA PROPIEDAD MEXICAN INSTITUTE OF PROPERTY 3, caracterizado porque el elemento óptico cíe ' interrupción comprende uno de un obturador o un moduláülór optoacústico. 3, characterized in that the optical element with interruption comprises one of a shutter or an optoacoustic modulator.
- 6The method according to claim 6. El método de conformidad con la reivindicación 2, caracterizado porque comprende además emitir, mediante una fuente óptica que expande el intervalo espectral de medición, la luz de sonda como un tren de pulsos, donde las instancias de la luz de sonda se modulan mediante el tren de pulsos. 2, characterized in that it further comprises emitting, through an optical source that expands the measurement spectral range, the probe light as a pulse train, where the probe light instances are modulated by the pulse train.
- 7The method according to claim 7. El método de conformidad con la reivindicación 2, caracterizado porque las capas formadas están en reposo, mientras se realiza la detección, en relación con una ubicación donde las instancias moduladas de la luz de sonda iluminan las capas formadas. 2, characterized in that the formed layers are at rest, while detection is performed, relative to a location where the modulated instances of the probe light illuminate the formed layers.
- 8The method according to claim 8. El método de conformidad con la reivindicación 2, caracterizado porque comprende además:2, characterized in that it further comprises: receiving, using an interferometer of the measurement system, probe light provided by an optical source that expands the measurement spectral range;and for each optical path difference of a plurality of optical path differences of the interferometer, provide, by the interferometer, an instance of the probe light associated with the optical path difference. recibir, mediante un interferómetro del sistema de medición, luz de sonda proporcionada por una fuente óptica que expande el intervalo espectral de medición;y para cada diferencia de vía óptica de una pluralidad de diferencias de vía óptica del interferómetro, proporcionar, mediante el interferómetro, una instancia de la luz de sonda asociada con la diferencia de vía óptica.
- 9The method according to claim 9. El método de conformidad con la reivindicación 8, caracterizado porque cada una de las diferencias de la vía óptica se mantiene al menos por una duración de intervalo de tiempo finito. 8, characterized in that each of the differences in the optical path is maintained for at least a finite time interval duration. 155 155
- 1010. IMPI IMPI INSTITUTO MEXICANO MEXICAN INSTITUTE El método de conformidad conlLl®)usí}®.iv’Í«3K22etc'ión The method in accordance withlLl®) usí} ®.iv'Í «3K22etc'ión 8, caracterizado porque el sistema de—mad.ix;·jn..a,s^ia.i.iftdQ^£xin el sistema de fabricación comprende un espectrómetro FTIR. 8, characterized in that the system of — mad.ix;· jn..a, s ^ ia.i.iftdQ ^ £ xin the manufacturing system comprises an FTIR spectrometer.
- 11El método de conformidad con la reivindicación eleven. The method according to claim 8, caracterizado porque la detección se sincroniza con la modulación y se realiza mediante el uso de un detector fijo referenciado por la modulación. 8, characterized in that the detection is synchronized with the modulation and is carried out by using a fixed detector referenced by the modulation.
- 12The method according to claim 12. El método de conformidad con la reivindicación 11, caracterizado porque el intervalo de tiempo finito durante el cual se detectan las instancias moduladas comprende una cantidad especificada de constantes de tiempo del detector fijo. 11, characterized in that the finite time interval during which the modulated instances are detected comprises a specified amount of time constants from the fixed detector.
- 13The method according to claim 13. El método de conformidad con la reivindicación 12, caracterizado porque la cantidad especificada de constantes de tiempo del detector fijo está entre cinco y diez. 12, characterized in that the specified amount of time constants of the fixed detector is between five and ten.
- 14The method according to claim 14. El método de conformidad con la reivindicación 11, caracterizado porque comprende además, para cada diferencia de vía óptica de una pluralidad de diferencias de vía óptica del interferómetro, detectar, mediante el detector fijo, la modulación de la instancia de la luz de sonda que interactuó con las capas formadas como una señal de detector fijo que corresponde a la diferencia de vía óptica. 11, characterized in that it further comprises, for each optical path difference of a plurality of optical path differences of the interferometer, detecting, by means of the fixed detector, the modulation of the probe light instance that interacted with the layers formed as a signal fixed detector that corresponds to the optical path difference.
- 15El método de conformidad con la reivindicación fifteen. The method accordin g to claim 14, caracterizado porque la generación del espectro de la luz 14, characterized in that the generation of the light spectrum 156 probe that interacted with 156 de sonda que interactuó con las IM IM INSTITUTO MEXICANO DE LA RRpi'IEDAU layers ΐΝφχαίϋΐα the spectral interval of measurement comprises, .a.jjjñfan ^ un ^^ aoajjjato of values of fixed detector signals corresponding to the plurality of differences of optical path to obtain a dependence of difference of optical path of the detected modulation, and process the optical path difference dependence obtained from the detected probe light to generate the spectrum. INSTITUTO MEXICANO DE LA RRpi’IEDAU capas ΐΝφχαίϋΐα el intervalo espectral de medición comprende,.a.jjjñfan^un^^aoajjjato de valores de señales de detector fijo correspondientes a la pluralidad de diferencias de vía óptica para obtener una dependencia de diferencia de vía óptica de la modulación detectada, y procesar la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada para generar el espectro.
- 16The method according to claim 16. El método de conformidad con la reivindicación 15, caracterizado porque el procesamiento de la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada comprende realizar una transformada de Fourier de la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada. 15, characterized in that the processing of the optical path difference dependence obtained from the detected probe light comprises performing a Fourier transform of the optical path difference dependence obtained from the detected probe light.
- 17The method according to claim 17. El método de conformidad con la reivindicación 2, caracterizado porque comprende además:2, characterized in that i t further comprises: receiving, using a measurement system monochromator, probe light provided by an optical source that expands the measurement spectral range, where the monochromator includes a wavelength selector and an output port;and for each relative orientation of a plurality of relative orientations between the wavelength selector and the monochromator output port, provide, by the monochromator, an instance of the probe light recibir, mediante un monocromador del sistema de medición, luz de sonda proporcionada por una fuente óptica que expande el intervalo espectral de medición, donde el monocromador incluye un selector de longitud de onda y un puerto de salida;y para cada orientación relativa de una pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador, proporcionar, mediante el monocromador, una instancia de la luz de sonda 157 157 IMPI Mexican Institute IMPI instituto mexicana Ot LA FROMECAD asociada con la orientación relativa. inoujimal Ot THE FROMECAD associated with relative orientation. inoujimal
- 18The conformity method ooa ί'ηιΐο · ϊι 18. El método de conformidad ooa ί'ηιΐο·ϊι 17, caracterizado porque cada una de las orientaciones relativas entre el selector de longitud de onda y el puerto de salida de monocromador se mantiene al menos por una duración del intervalo de tiempo finito. 17, characterized in that each of the relative orientations between the wavelength selector and the monochromator output port is maintained for at least a duration of the finite time interval.
- 19The method according to claim 19. El método de conformidad con la reivindicación 17, caracterizado porque la detección se sincroniza con la modulación y se realiza mediante el uso de un detectar fijo referenciado por la modulación, y el método comprende además, para cada orientación relativa de una pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador, detectar, mediante el detector fijo, la modulación de la instancia de la luz de sonda que interactuó con las capas formadas como una señal de detector fijo correspondiente a la orientación relativa. 17, characterized in that detection is synchronized with modulation and is performed by using a fixed detect referenced by modulation, and the method further comprises, for each relative orientation, a plurality of relative orientations between the wavelength selector and the monochromator output port, detect, using the fixed detector, modulating the instance of the probe light that interacted with the layers formed as a fixed detector signal corresponding to the relative orientation.
- 20El método de conformidad con la reivindicación twenty. The method according to claim 19, caracterizado porque la generación del espectro de la luz de sonda que interactuó con las capas formadas en el intervalo espectral de medición comprende ajustar un conjunto de valores de las señales del detector fijo correspondientes a la pluralidad de orientaciones relativas entre el selector de longitud de onda 19, characterized in that the generation of the spectrum of the probe light that interacted with the layers formed in the measurement spectral interval comprises adjusting a set of values of the fixed detector signals corresponding to the plurality of relative orientations between the length selector of wave 158 158 IMPI and the output port of the p®W monochromatorRlAbb have a dependency on the orientation of ~ ηη of -lui'ryi'ri'iK * wave of the detected probe light, and IMPI y el puerto de salida del monocromador p®WRlAbb tener una dependencia de la orientación del ~ηη de -lui’ryi’ri'iK * onda de la luz de sonda detectada, y 20, caracterizado porque el procesamiento comprende correlacionar la pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador con longitudes de onda correspondientes del intervalo espectral de medición. 20, characterized in that the processing comprises correlating the plurality of relative orientations between the wavelength selector and the monochromator output port with corresponding wavelengths of the measurement spectral range.
- 2122. The method according to claim 22. El método de conformidad con la reivindicación 1, caracterizado porque comprende además generar la modulación de las instancias de luz de sonda que interactuaron con las capas formadas mediante el movimiento periódico de las capas formadas hacia adentro y afuera de un punto del haz de las instancias de luz de sonda, de manera que la modulación corresponda a una distribución temporal del movimiento periódico. 1, characterized in that it further comprises generating the modulation of the probe light instances that interacted with the formed layers by periodically moving the formed layers in and out of a point in the beam of the probe light instances, so that modulation corresponds to a temporal distribution of periodic motion.
- 222. 3. The method according to claim 23. El método de conformidad con la reivindicación 22, caracterizado porque comprende además:22, characterized in that it further comprises: receive, by means of an interferometer of the measurement system, probe light provided by an optical source that expands the measurement spectral range, - and recibir, mediante un interferómetro del sistema de medición, luz de sonda proporcionada por una fuente óptica que expande el intervalo espectral de medición,- y 159 for each optical path difference of a plurality of light optical path differences iii Leipheiometer, provide, by means of the interferometer, an instance of the probe light associated with the optical path difference. 159 para cada diferencia de vía óptica de una pluralidad de diferencias de vía óptica lltil iiiLeiféiómetro, proporcionar, mediante el interferómetro, una instancia de la luz de sonda asociada con la diferencia de vía óptica.
- 2324. The method according to claim 24. El método de conformidad con la reivindicación 23, caracterizado porque cada una de las diferencias de vía óptica se mantiene al menos por una duración del intervalo de tiempo finito. 23, characterized in that each of the optical path differences is maintained for at least a duration of the finite time interval.
- 2425. The method according to claim 25. El método de conformidad con la reivindicación 23, caracterizado porque el sistema de medición asociado con el sistema de fabricación comprende un espectrómetro FTIR. 23, characterized in that the measurement system associated with the manufacturing system comprises an FTIR spectrometer.
- 2526. The method according to claim 26. El método de conformidad con la reivindicación 23, caracterizado porque la detección se realiza mediante el uso de un detector restringido por tiempo, temporizado por la modulación. 23, characterized in that detection is carried out by using a time-restricted detector, timed by modulation.
- 2627. The method according to claim 27. El método de conformidad con la reivindicación 26, caracterizado porque un soporte tiene una o más aperturas, donde los ICE están sostenidos en el soporte de manera que al menos dos de los ICE tengan una abertura entre estos, y para cada diferencia de vía óptica de una pluralidad de diferencias de vía óptica del interferómetro, la detección de la modulación de la instancia de la luz de sonda que interactuó con las capas formadas comprende mover el soporte de manera que la instancia de la luz de sonda 26, characterized in that a support has one or more openings, where the ICEs are supported in the support so that at least two of the ICEs have an opening between them, and for each optical path difference of a plurality of optical path differences of the interferometer, detecting the modulation of the probe light instance that interacted with the formed layers comprises moving the support so that the probe light instance 160 collecting, by means of the time-restricted detector, the instance of the probe light transmitted through the current instance of the formed layers illuminated with the instance of the probe light, recording a first detector signal of the light collecting instance of probe transmitted through the current instance of the formed layers when the probe light instance illuminates the current instance of the formed layers, move the bracket so that the probe light instance illuminates an opening in the bracket, pick up, with the detector restricted by time, the probe light instance that passes through the opening without being transmitted through the current instance of the layers formed, record a signal from the reference detector when the probe light instance illuminates the opening, and obtain, by means of the time-restricted detector, a referenced time constrained detector signal corresponding to the optical path difference based on the first detector signal and the reference detector signal. 160 recoger, mediante el detector restringido por tiempo, la instancia de la luz de sonda transmitida a través de la instancia actual de las capas formadas iluminadas con la instancia de la luz de sonda, registrar una primera señal de detector de la instancia recogida de luz de sonda transmitida a través de la instancia a actual de las capas formadas cuando la instancia de la luz de sonda ilumina la instancia actual de las capas formadas, mover el soporte de manera que la instancia de la luz de sonda ilumine una abertura del soporte, recoger, con el detector restringido por tiempo, la instancia de luz de sonda que pasa a través de la abertura sin ser transmitida a través de la instancia actual de las capas formadas, registrar una señal del detector de referencia cuando la instancia de la luz de sonda ilumina la abertura, y obtener, mediante el detector restringido por tiempo, una señal de detector restringido por tiempo referenciada correspondiente a la diferencia de vía óptica con base en la primera señal de detector y la señal de detector de referencia.
- 2728. The method according to claim 28. El método de conformidad con la reivindicación 27, caracterizado porque la generación del espectro de la luz 27, characterized in that the generation of the light spectrum 161 161 INSTITUTO MEXICANO MEXICAN INSTITUTE DE LA de sonda que interactuó con las capas 'formadas en el intervalo espectral de medición comprende ' ’ ajustar un conjunto de valores de señales de detector restringido por tiempo referenciadas correspondientes a la pluralidad de diferencias de vía óptica para obtener una dependencia de diferencia de vía óptica de la modulación detectada, y procesar la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada para generar el espectro. DE of the probe that interacted with the layers' formed in the measurement spectral range comprises' 'adjusting a set of referenced time-restricted detector signal values corresponding to the plurality of optical path differences to obtain a path difference dependency optics of the detected modulation, and process the optical path difference dependence obtained from the detected probe light to generate the spectrum.
- 2829. The method according to claim 29. El método de conformidad con la reivindicación 28, caracterizado porque el procesamiento de la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada comprende realizar una transformada de Fourier de la dependencia de diferencia de vía óptica obtenida de la luz de sonda detectada. 28, characterized in that the processing of the optical path difference dependence obtained from the detected probe light comprises performing a Fourier transform of the optical path difference dependence obtained from the detected probe light.
- 2930. The method according to claim 30. El método de conformidad con la reivindicación 22, caracterizado porque comprende además:22, characterized in that it further comprises: receiving, using a measurement system monochromator, probe light provided by an optical source that expands the measurement spectral range, where the monochromator includes a wavelength selector and an output port;and for each relative orientation of a plurality of relative orientations between the wavelength selector recibir, mediante un monocromador del sistema de medición, luz de sonda proporcionada por una fuente óptica que expande el intervalo espectral de medición, donde el monocromador incluye un selector de longitud de onda y un puerto de salida;y para cada orientación relativa de una pluralidad de orientaciones relativas entre el selector de longitud de onda 162 162 INSTITUTO MEXICANO D £ THE INDUSTRIAL PROPERTY and the output port using the monochromator, of the one monochromator, provide, instance of the probe light associated with the relative orientation. INSTITUTO MEXICANO D£ LA PROPIEDAD INDUSTRIAL y el puerto de salida mediante el monocromador, del una monocromador, proporcionar, instancia de la luz de sonda asociada con la orientación relativa.
- 3031. The method according to claim 31. El método de conformidad con la reivindicación 30, caracterizado porque cada una de las orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador se mantiene al menos por una duración del intervalo de tiempo finito. 30, characterized in that each of the relative orientations between the wavelength selector and the monochromator output port is maintained for at least a duration of the finite time interval. modulación, un soporte tiene una o más aperturas, donde los ICE están sostenidos en el soporte de manera que al menos dos de los ICE tengan una abertura entre éstos, y para cada orientación relativa de una pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador, donde la detección de la modulación de la instancia de la luz de sonda que interactuó con las capas formadas comprende mover el soporte de manera que la instancia de la luz de sonda ilumine una instancia actual de las capas formadas, recoger, mediante el detector restringido por modulation, a bracket has one or more openings, where the ICEs are supported in the bracket so that at least two of the ICEs have an opening between them, and for each relative orientation of a plurality of relative orientations between the length selector of wave and the monochromator output port, where detecting the modulation of the probe light instance that interacted with the formed layers comprises moving the support so that the probe light instance illuminates a current instance of the formed layers, picking up, by means of the detector restricted by 163 weather 163 tiempo IMPI IMPI INSTITUTO MEXICANO DE LA PROPIEDAD INDUSTRIAL la instancia de la luz de sonda transmitida a través — * lili· — I ' I 1 I de la instancia actual de las capas formadas iluminadas con la instancia de la luz de sonda, registrar una primera señal de detector de la instancia recogida de luz de sonda transmitida a través de la instancia a actual de las capas formadas cuando la instancia de la luz de sonda ilumina la instancia actual de las capas formadas, mover el soporte de manera que la instancia de la luz de sonda ilumine una abertura del soporte, recoger, con el detector restringido por tiempo, la instancia de luz de sonda que pasa a través de la abertura sin ser transmitida a través de la instancia actual de las capas formadas, registrar una señal del detector de referencia cuando la instancia de la luz de sonda ilumina la abertura, y obtener, mediante el detector restringido por tiempo, una señal de detector restringido por tiempo referenciada correspondiente a la orientación relativa entre el selector de longitud de onda y el puerto de salida de salida del monocromador con base en la primera señal de detector y la señal de detector de referencia. THE MEXICAN INSTITUTE OF INDUSTRIAL PROPERTY the instance of the probe light transmitted through - * lili · - I 'I 1 I of the current instance of the formed layers illuminated with the probe light instance, record a first detector signal from the collected instance of probe light transmitted through the current instance of the layers formed when the instance of the probe light illuminates the current instance of the formed layers, move the holder so that the probe light instance illuminates an opening in the holder, pick up, with the detector restricted by time, the probe light instance passing through the opening without being transmitted through the current instance of the layers formed, recording a signal from the reference detector when the probe light instance illuminates the opening, and obtaining, by the time-restricted detector, a referenced time constrained detector signal corresponding to the relative orientation between the wavelength selector and the monochromator output output port based on the first detector signal and the reference detector signal. 33. The method according to claim 33. El método de conformidad con la reivindicación
- 3132, caracterizado porque la obtención del espectro de la luz de sonda que interactuó con las capas formadas en el 32, characterized in that obtaining the spectrum of the probe light that interacted with the layers formed in the 164 Measurement spectral range comprises adjusting a set of values of the refereneated time-restricted detector signals corresponding to the plurality of relative orientations between the wavelength selector and the monochromator output port to obtain a dependence on the orientation of the selector of wavelength of the detected probe light, and processing the dependence of the wavelength selector orientation obtained from the detected probe light to generate the spectrum. 164 intervalo espectral de medición comprende ajustar un conjunto de valores de las señales del detector restringido por tiempo refereneiadas correspondientes a la pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador para obtener una dependencia de la orientación del selector de longitud de onda de la luz de sonda detectada, y procesar la dependencia de la orientación del selector de longitud de onda obtenida de la luz de sonda detectada para generar el espectro. 3. 4. The method according to claim 34. El método de conformidad con la reivindicación
- 3233, caracterizado porque el procesamiento comprende correlacionar la pluralidad de orientaciones relativas entre el selector de longitud de onda y el puerto de salida del monocromador con longitudes de onda correspondientes del intervalo espectral de medición. 33, characterized in that the processing comprises correlating the plurality of relative orientations between the wavelength selector and the monochromator output port with corresponding wavelengths of the measurement spectral range.
- 3335. The method according to claim 35. El método de conformidad con la reivindicación 1, caracterizado porque la modulación tiene una frecuencia que está especificada para que sea diferente a las frecuencias o tonos de fuentes que emiten luz dispersada que pueda ser detectada por el sistema de medición, donde las longitudes de onda de la luz dispersada están dentro del intervalo espectral de medición. 1, characterized in that the modulation has a frequency that is specified to be different from the frequencies or tones of sources that emit scattered light that can be detected by the measurement system, where the wavelengths of the scattered light are within the range spectral measurement.
- 3436. The method according to claim 36. El método de conformidad con la reivindicación 165 165 1, caracterizado porque la luz de las capas formadas comprende una 1, characterized in that the light of the layers formed comprises a IMPI industrial transmitted light WíiSSSei probe, light _ | ________ ~ - * ~ *M**>‘, J· '*** -— * scattered or emitted light. IMPI sonda WíiSSSei industrial de luz transmitida, luz _ |________ ~-*~*M**>‘,J·'***-—* dispersada o luz emitida.
- 3537. The method according to claim 37. El método de conformidad con la reivindicación 1, caracterizado porque el ajuste comprende caracterizar las capas formadas con base en el espectro generado. 1, characterized in that the adjustment comprises characterizing the layers formed based on the generated spectrum.
- 3638. The method according to claim 38. El método de conformidad con la reivindicación 37, caracterizado porque comprende además actualizar una velocidad de deposición usada para formar capas que restan por formar con base en resultados de la caracterización de las capas formadas. 37, characterized in that it further comprises updating a deposition rate used to form remaining layers to be formed based on results of the characterization of the formed layers.
- 3739. The method according to claim 39. El método de conformidad con la reivindicación 37, caracterizado porque comprende además modificar índices de refracción de las capas que restan por formar con base en resultados de la caracterización de las capas formadas. 37, characterized in that it further comprises modifying refractive indices of the remaining layers to be formed based on results of the characterization of the layers formed.
- 3840. The method according to claim 40. El método de conformidad con la reivindicación 37, caracterizado porque comprende además modificar espesores objetivo de las capas que restan por formar con base en resultados de la caracterización de las capas formadas. 37, characterized in that it further comprises modifying the target thicknesses of the remaining layers to be formed based on the results of the characterization of the layers formed.
- 3941. The method according to claim 41. El método de conformidad con la reivindicación 37, caracterizado porque el ajuste comprende cambiar una cantidad total de capas especificada por el diseño de ICE a una nueva cantidad total de capas. 37, characterized in that the adjustment comprises changing a total number of layers specified by the ICE design to a new total number of layers.
- 4042. A system characterized in that it comprises:42. Un sistema caracterizado porque comprende: a deposition chamber;una cámara de deposición;166 one or more 166 una o más IMPI IMPI INSTITUTO MEXICANO fuentes de depos icióñELAá^feíiiaá8tsSlí5n‘' la cámara de deposición para proporcionar npa t a r -i a 1 e.q a . part.i.-n de los cuales se forman capas de uno o más elementos computacionales integrados (ICE);MEXICAN INSTITUTE sources of depositTHE Aá ^ feíiiaá8tsSlí5n '' the deposition chamber to provide npa tar -ia 1 eq a. part.i.-n of which layers of one or more integrated computational elements (ICE) are formed;a spectrometer associated with the deposition chamber to measure in si tu one or more spectra of the ICE layers, where the spectra are measured by using a time distribution of a modulation of probe light instances that sequentially interacted with the ICE layers, the instances are spectrally different from each other in a spectral measurement range;and one or more supports arranged within the deposition chamber, at least partially, within one field of view of the deposition source (s) and another field of view of the spectrometer to hold the ICE layers as they are formed and they measure their spectra, respectively;un espectrómetro asociado con la cámara de deposición para medir in si tu uno o más espectros de las capas de los ICE, donde los espectros se miden mediante el uso de una distribución temporal de una modulación de instancias de luz de sonda que interactuaron secuencialmente con las capas de ICE, las instancias son espectralmente diferentes entre sí en un intervalo espectral de medición;y uno o más soportes dispuestos dentro de la cámara de deposición, al menos parcialmente, dentro de un campo visual de la(s) fuente(s) de deposición y otro campo visual del espectrómetro para sostener las capas de ICE mientras se forman y se miden sus espectros, respectivamente;a computer system in communication with at least some of the one or more sources of deposition, the support (s) and the spectrometer, where the computer system comprises one or more hardware processors and a non-transient computer readable medium configured for: un sistema informático en comunicación con al menos algunas de la una o más fuentes de deposición, el (los) soporte(s) y el espectrómetro, donde el sistema informático comprende uno o más procesadores de hardware y un medio legible por computadora no transitorio configurados para: receive an ICE design comprising a description of a substrate and a plurality of layers, their respective target complex refractive indices and thicknesses, where the complex refractive indices of recibir un diseño de ICE que comprende una descripción de un sustrato y una pluralidad de capas, sus espesores e índices de refracción complejos objetivo respectivos, donde los índices de refracción complejos de 167 Adjacent layers are different between hypothetical manufactured in accordance with 4¾ -ICE — cjt-n related to a characteristic of a sample;167 capas adyacentes son diferentes entre hipotético fabricado de conformidad conel 4¾ -ICE—cjt-n relacionado con una característica de una muestra;formar al menos algunas de las capas de una pluralidad de ICE de conformidad con el diseño de ICE;forming at least some of the layers of a plurality of ICEs in accordance with the ICE design;measure, by means of the spectrometer during the formation, spectra of the layers of the ICE;and adjust the formation based on the measured spectra. medir, mediante el espectrómetro durante la formación, espectros de las capas de los ICE;y ajustar la formación con base en los espectros medidos.
Independent claims40
974 paragraphs in 94 sections, as filed
(54) Title: IN SITU SPECTROSCOPY FOR MONITORING THE MANUFACTURE OF INTEGRATED COMPUTATIONAL ELEMENTS.
(54) Title: IN-SITU SPECTROSCOPY FOR MONITORING FABRICATION OF INTEGRATED COMPUTATIONAL ELEMENTS.
(57) Summary
Technologies for monitoring Integrated Computational Element Layer (ICE) characteristics during manufacturing are described using an on-site spectrometer operated in a step analysis mode in combination with time-restricted or fixed detection. As part of the staged analysis mode, a spectrometer wavelength selection element is analyzed separately to provide spectrally different instances of the probe light so that each spectrally different instance of the wave light is provided during a finite time interval. Additionally, an instance of the probe light that interacted during the finite time interval with the ICE layers includes a modulation that is detected by time-restricted or fixed detection during the finite time interval.
(57) Abstract
Technologies are described for monitoring characteristics of layers of integrated computational elements (ICEs) during fabrication using an in-situ spectrometer operated in step-scan mode in combination with lock-in or time-gated detection. As part of the step-scan mode, a wavelength selecting element of the spectrometer is discretely scanned to provide spectrally different instances of probe-light, such that each of the spectrally different instances of the probe-light is provided for a finite time ¡nterval . Additionally, an instance of the probe-light interacted during the finite time inter val with the ICE layers ¡ncludes a modulation that ¡s being detected by the lock-in or time-gated detection over the finite time ¡nterval.
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PATENT TITLE No. 359196
Owner (s): HALLIBURTON ENERGY SERVICES, INC.
Home:
10200 Bellaire Blvd., Houston, Texas, 77072, USA
<td>Denomination:</td><td>IN SITU SPECTROSCOPY FOR MONITORING THE MANUFACTURE OF INTEGRATED COMPUTATIONAL ELEMENTS.</td>
Classification:
CIP:
Inventor (s):
G01N21 / 41; B23B3 / 26; ^ 9D11 / 0Q; E21B49 / 00; G01B11 / 06; G01J3 / 00; G01J3 / 28; GQ1N21 / 31; G0ÍN21 / 84; G02B5 / 28; G05B19 / 4099
B32B3 / 266; B29D11 / 0073; E21B49 / Q0; G01J3 / 08; G01J3 / 12; G01J3 / 28;
G01J3 / 45; G01J3 / 0264; G01J3 / 0286; G01N21 / 31:
G02B5 / 285; G02B5 / a $ 7; G05B4 0/4099; B32B2307 / 40;
B32B2307 / 732> 88202551/00; . G01J2003 / 1226;
00582210/49023
JAMES M.1 * R1C £ 'Aá ^ A'e, NAYAK; il? ÁV llsIS
S0LWTUD; · ·
International Presentation Date:
Ϊ 11 i v. vb% bt 4 i x. x
CPC:
Number:
MX / a / 2016/008957 í'tlAV ......... February 1, 2014 Thousand ».íí i
G01N21 / 8422;
B32B2307 / 418; G01N2021 / 8438;
Validity: Twenty years
Expiration Date: February 14, 2034
Issue Date: September 19, 2018
The reference patent is granted based on articles 1 ", 2 'section V, 6 ° section | ll, and 59 of the Industrial Property Law.
In accordance with article 23 of the Industrial Property Law, this patent has a validity of twenty non-extendable years, counted from the date of filing of the international application and will be subject to $ 1 of the fee to keep the rights in force.
Whoever subscribes to this title does so based on the provisions of articles 6 fractions III and »7 °. bis2 of the Industrial Property Law (Official Gazette of the Federation (DO, F.) 06/27/1991, amended on 02'68 / 1994, 10/25/1998, 12/26/1997, 05/17 / 1999, 01/26/2004, 06/16/2005, 01/25/2006, 05/06/2009, 01/06/2010, 05/18/2010, 06/28/2010, 01/27/2012, 04/09/2012, 01/0672016 and 1 ^ 03/21) 18), articles 1 », 3<sup>or</sup> fraction V subsection a), 4 and 12 fractions I and III of the détlriSStBto Mexican Regulation of ta Prapipdad.Industrial (DOF 14/12/1999, amended on 07/01/2002, 07/15/2004, 07/28/2004 and 09/07/2007); articles Γ, 3 °, 4V5 ° fraction V mciSO ak 16 fractions I and til and 30 of the Organic Statute of the Mexican Institute of Industrial Property (DOF 12/27/1999, amended as of 1Q / 1Ó / 2002, W07 / 2004, 04/08 (2004 and 1g / 09/2007); 1 », 3“ and 5 ° subsection a) of the Agreement that delegates powers to the Deputy Directors General, Coordinator Titular Divisional Directors of the Regional Offices, Divisional Deputy Directors, Departmental Coordinators and other subordinates of the Mqidcand de'taPropiedád fndustrial Institute. (DOF 12/15/1999, amended on 02/04/2000, 07/29/2004, 08/04/2004 and 09/13/2007).
This letter is signed with an advanced electronic signature (FIEL), based on articles 7 BIS 2 of the Industrial Property Law; 3 of its Regulations, and 1 fraction III, 2 fraction V, 26 BIS and 26 TER of the Agreement establishing the guidelines for the use of the Electronic Payment and Services Portal (PASE) of the Mexican Institute of Industrial Property, in the procedures indicated.
THE DIVISIONAL DIRECTOR OF PATENTS
NAHANNY CANAL REYES
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Original string:
NAHANNY MARISOL CANAL REYES | 00001000000403252793 | Administration Service
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L, ι.ϋαα (fe lvtóxic.0 feLfefe.¡fe'OO · «« «. Goí, HixWiiüi
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MX / 2018/78916 i
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<img file="MX359196B_D0004.tif" />
IN SITU SPECTROSCOPY FOR MONITORING D)
INTEGRATED COMPUTATIONAL ELEMENTS
Background of the Invention
In general terms, the object of the present description refers to the manufacture of an integrated computational element (ICE) used in optical analysis tools to analyze a substance of interest, for example, crude oil, gas, water or other fluids from the well. For example, the described ICE fabrication uses in situ spectroscopy performed in a step analysis mode in combination with time-restricted or fixed detection for monitoring ICE fabrication.
Information about a substance can be derived through the interaction of light with the substance. The interaction modifies light characteristics, for example, frequency (and corresponding wavelength), intensity, polarization, and / or direction (for example, through scattering, absorption, reflection, or refraction). It is possible to determine the chemical, thermal, physical, mechanical, optical, or various other characteristics of the substance based on changes in the characteristics of the light that interacts with the substance. As such, in certain applications, it is possible to derive in situ one or
Ref. 267028
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INSTITUTO MEXICANO delafromedal INDUSTRIAL
<img file="MX359196B_D0005.tif" />
more characteristics of crude oil, gas, water or other fluids in the well, for example, at well sites, as a consequence of the interior of the well due to the interaction between these substances and light.
Integrated Computational Elements (ICE) allow the measurement of various chemical or physical characteristics through the use of regression techniques. An ICE, when operating as part of optical analysis tools, selectively weights the light modified by a sample in at least part of an interval so that the weights are of such wavelength related to one or more characteristics of the sample.
A
ICE can be an optical substrate with multiple stacked dielectric layers (eg, between around around layers), where each has a different complex index of refraction than that of adjacent layers.
The specific number of layers, N, the optical properties (for example, the real and imaginary components of complex refractive indices) of the layers, the optical properties of the substrate and the physical thickness of each of the layers that make up the
ICEs are selected so that the light processed by the ICE is related to one or more characteristics of the sample.
Because ICEs passively extract information from light modified by a sample, it can be incorporated into inexpensive and rugged optical analysis tools. By
<img file="MX359196B_D0006.tif" />
Therefore, ICE-based in-hole optical analysis tools can provide a relatively inexpensive, rugged and accurate system for quality control of well fluids, for example.
Errors in manufacturing some constituent layers of an ICE design can degrade ICE's target performance. In most cases, deviations of <0.1%, and even 0.01% or 0.0001%, from the point-by-point design values of the optical characteristics (for example, complex refractive indices) and / or the physical characteristics (eg thickness) of the formed layers of the ICE can reduce the performance of the ICE, in some cases to such an extent that the ICE becomes operationally useless. The complex refractive indices and thicknesses of the ICEs that are manufactured are determined using the in si tu measurement mode during the manufacture of the ICE. The complex refractive indices and the determined layer thicknesses of the formed layers of the ICEs within the manufacturing batch are used to adjust the formation of remaining layers of the ICEs based on comparisons between the determined values of the complex refractive indices and the layer thicknesses of the manufactured ICE layers and their respective target values. Those skilled in the art or those familiar with the art will readily appreciate that the
<img file="MX359196B_D0007.tif" />
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MEXICANC INSTITUTE OF PROPERTY. . π<sub>Ί</sub> . j -> j .INDUSTRIAL ultra high accuracies required by the designs defy the state of the art regarding fine film measurement techniques. On-site measurements used to monitor ICE fabrication include spectroscopy to acquire spectra of the formed ICE layers. Conventionally, spectra are acquired by continuous analysis of a wavelength selection element of a spectrometer to provide spectrally different instances of probe light.
Spectra acquired through the use of conventional acquisition are typically affected by noise from various sources of noise present in the ICE manufacturing environment.
Brief Description of the Figures
Figures 1A-1C show multiple configurations of an example of a well fluid analysis system using a well logging tool that includes an ICE.
Figure 2 is a flowchart showing an example of a process for designing an ICE.
Figures 3A-3G show aspects of an implementation of a system for manufacturing ICE that uses a spectrometer based on an on-site interferometer operating in a step analysis mode, to provide modulated probe light with an interrupting optical element. optical to illuminate witness samples,
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MfXICANO INSTITUTE, in cRSfi ^^ r
<img file="MX359196B_D0008.tif" />
Fixed detection module, which detects the modulation of probe light that interacts with the control samples, to monitor the manufacture of the ICE.
Figure 4 shows aspects of another implementation of the system for manufacturing ICE that uses the spectrometer based on an interferometer in which the probe light is emitted as a pulse modulation.
Figures 5A-5D show aspects of an implementation of another system for manufacturing ICE that uses an on-site monochromator-based spectrometer operating in a step analysis mode, to provide modulated probe light with an optical interrupt optic element. to illuminate core samples, in combination with the fixed detection module, which detects modulation of the probe light that interacts with core samples, to monitor the manufacture of ICEs.
Figure 6 shows aspects of another implementation of the system for manufacturing ICE that uses the spectrometer based on a monochromator in which the probe light is emitted as a pulse modulation.
Figures 7A-7E show aspects of an ICE manufacturing system that uses an on-site interferometer-based spectrometer operating in a step analysis mode to periodically illuminate core samples with unmodulated probe light, restricted detection by in combcl'SÍJE ^^ '^ lg ^ dwÉpLde
INDUSTRIAL time, which detects a modulation of the probe light that interacts with the control samples, where the modulation is caused by periodic illumination, to monitor the manufacture of the ICE.
Figures 8A-8B show aspects of another system for manufacturing ICE that uses a spectrometer based on an in-situ monochromator operating in a step analysis mode, to periodically illuminate control samples with unmodulated probe light, in combination with the time-restricted detection module, which detects the modulation of the probe light that interacts with the control samples, where the modulation is caused by periodic illumination, to monitor the manufacture of ICEs.
Figure 9A is a flow diagram of an ICE manufacturing process that uses in-situ spectroscopy operated in a step analysis mode in combination with fixed or time-restricted detection to generate spectra of the manufactured ICEs.
Figure 9B shows aspects of the ICE manufacturing process of Figure 9A, where in situ spectroscopy operated in case analysis mode is performed on a spectrometer based on an interferometer.
Figure 9C shows aspects of the ICE manufacturing process of Figure 9A, where in situ spectroscopy operated in analysis mode
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INSTITUTO MEXICANO JA by cafiStíá ^^ r ^^^ Mn a spectrometer based on a monochromator.
The same reference symbols in the various figures indicate the same elements.
Detailed description of the invention
Technologies for monitoring ICE characteristics during manufacturing are described using an on-site spectrometer operated in a step analysis mode in combination with time-restricted or fixed detection. As part of the staged analysis mode, a spectrometer wavelength selection element is analyzed separately to provide spectrally different instances of the probe light so that each spectrally different instance of the wave light is provided during a finite time interval. Additionally, an instance of the probe light that interacted during the finite time interval with the ICE layers includes a modulation that is detected by time-restricted or fixed detection during the finite time interval. Notably, probe light represents any type of electromagnetic radiation that has wavelengths from a suitable region of the electromagnetic spectrum.
In some implementations where fixed detection is used, a temporal distribution of the modulation refers to the instance detection of the probe light that is modulated and also the layers
<img file="MX359196B_D0009.tif" />
illuminates the illuminated ICE layers of the ICE are at rest relative to the modulated instance of the probe light beam. For example, the instance where the probe light is modulated with an optical interrupting optical element, eg, encoder disk, shutter, etc., positioned anterior to that of the ICE layers. As another example, a source emits a pulse modulated probe light, which is used to prepare the probe light instance. In this case, the prepared instance of the probe light receives the modulation of the emitted pulse modulated probe light. In other implementations where time-triggered detection is used, the time distribution of the modulation is used to control time-restricted detection. In this case, modulation is provided to an unmodulated instance of the probe light by alternately transmitting the probe through the ICE layers and through an opening in a support that supports the ICE layers. This is accomplished by periodically moving the ICE layers in and out of the probe light beam instance while moving the opening in and out of the probe light beam instance.
Modulations, detected with fixed or time-restricted detection in the
i. · spectral of the probe light that
ICE, are used to generate a spectrum of ICE layers. Because the modulation frequency detected at the spectrally different instances of the probe light that interacted with the ICE layers is chosen to be different from the frequencies or harmonics of noise sources present in the ICE manufacturing environment (for example, IR lamps arranged within a deposition chamber and used to heat the ICE layers to a target manufacturing temperature, a target annealing temperature, etc.), the spectra generated based on the results of the described monitoring techniques are not affected by the mentioned noise sources. This is in contrast to conventional spectroscopy to monitor the manufacture of ICE, which is carried out in a continuous analysis mode, without the use of time-restricted or fixed detection, which typically produces spectra that are affected by noise brought by various sources of noise present in the ICE manufacturing environment.
The spectra generated based on the results of the described monitoring techniques can be used to determine optical properties (eg complex refractive indices) and physical properties (eg thicknesses) of the ICE layers. Complex refractive indices and
IMPI
MEXICAN INSTITUTE. ,. .DE LA-PROHEllAD determined layer thicknesseswssTwae
<img file="MX359196B_D0010.tif" />
Formed from the ICEs of a batch of factories occupied by adjusting the formation of remaining layers of the ICEs based on comparisons between the determined values and their respective target values.
Before describing examples of implementations of the technologies described for ICE manufacturing, the following technologies are described below: in Section (1) - ICE-based optical analysis tools along with examples of their use in oil exploration / gas, and in Section (2) - techniques for designing a
ICE.
(1) ICE-based well fluid analysis
Figures 1A-1C show multiple configurations
100, 100'
100 of an example of a system for analyzing well fluids 13 0, such that the analyzes are generated from measurements taken with a well logging tool 110 configured as an ICE-based optical analysis tool. The described system is also called the well log system.
Each of the configurations 100, 100 ', 100 of the well logging system illustrated in Figures 1A-1C includes a drill rig 14 on surface 102 and a well 38 below ground surface. Well 38 extends from the surface
<img file="MX359196B_D0011.tif" />
DELA INDUSTRIAL PROPERTY
In general terrestrial to earth 101 multiple geological formations, may contain well 130 fluids. Well 130 fluids can be crude oil, mud, water or other substances, and combinations of these. Also, the well fluids 130 can be at rest or can flow to the earth's surface 102, for example. Additionally, surface applications of the well logging tool 110 may include water monitoring and gas and crude oil transportation and processing.
Figure 1A illustrates a configuration 100 of the well logging acquisition system including a tool string 20 attached to a cable 16 which can be inserted into or removed from the well 38 by winch 18. The tool string 20 includes measuring tools and / or logging to generate and record information regarding fluids from well 130 in well 38. In well logging acquisition system configuration 100, information can be generated as a function of a distance (eg, depth) from land surface 102. In the example illustrated in Figure 1A, the tool string 20 includes the well log acquisition tool 110, one or more additional well log acquisition tools and a telemetry transmitter 30. Each of the logging tools «· ν
<img file="MX359196B_D0012.tif" />
MEXICaM INSTITUTE
<img file="MX359196B_D0013.tif" />
measures one or more characteristics of the fl ni fine IflL. In some implementations, the well logging tool 110 determines the values of one or more characteristics in real time and reports these values instantaneously as they occur in the current flowing from the well fluids 13 0, sequentially or simultaneously with other measurement / logging tools 22 of the tool string 20.
Figure IB illustrates another configuration 100 'of the well logging system including a drilling tool 24 attached to a drill string 16'. Drilling tool 24 includes drill bit 26, ICE-based well logging tool 110 configured as a Drilling Measurement (MWD) and / or logging tool during drilling (LWD) and telemetry transmitter 30. Drilling mud to be injected into well 38 is provided through drill string 16 'through ports of drill bit 26. Injected drilling mud flows up into well 3 8 to return to level above surface 102, where it is possible to re-supply the drilling mud to the drill string 16 '(not illustrated in Figure IB). In
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<td>configured</td><td>as MWD / LWD 110 generates and 'jc-eg-io-tra in-fejgtftéÍeAén</td>
<td>Relative to</td><td>well fluids 130 (for example, sludge from</td>
<td>drilling,</td><td>in this case) adjacent to the auger</td>
<td>drilling</td><td>26 in operation.</td>
Figure 1C illustrates yet another configuration 100 of the well logging system including a permanent installation adjacent to well 38. In implementations, the permanent installation is a set of
<td>necklaces</td><td>casing pipes that reinforce the well</td>
38. In this case, a casing pipe collar 28 of the casing pipe collars assembly supports the well logging tool 110 and the telemetry transmitter 30. In this way, the
<td>acquisition</td><td>of well records 110 determines and records</td>
characteristics of well 130 fluids adjacent to the underground location of the casing collar
28.
In each of the above configurations 100, 100 'and 100 of the well logging acquisition system, the values of one or more characteristics measured by the well logging acquisition tool 110 are provided (eg as a signal to detector 165) to the telemetry transmitter 30. The latter communicates the measured values to a telemetry receiver 40 located above the ground surface 102.
telemetry
INSTITUTO MEXICAN · DE LA PROI'IEÜAi The telemetry transmitter 3 0 and<sup>DU</sup>¿<sup>T</sup>l<sup>1AL</sup> can communicate through 'dé 111Γ<sup>1</sup> wireless cable telemetry channel.
In some implementations of the system configurations 100, 100 'illustrated in Figures 1A and IB, for example, in flexible pipe or steel line applications, it is possible to enter the measurement data generated by the logging tool. wells 110 locally in the memory of the well logging tool 110.
The measured values of one or more characteristics of the well fluids 130 received by the telemetry receiver 40 can be acquired and analyzed by a computer system 50 associated with the drilling equipment 14. In this way, the measurement values provided by the Well 110 logging tool can be used to generate physical and chemical information about fluids from well 130 in well 38.
Referring to Figure 1A, the well logging tool 110 includes a light source 120, an ICE 140, and an optical transducer 160. The well logging tool 110 has a frame 112 so that the components are arranged in a cavity 114 thereof. A cross section of the well logging tool 110 in a plane perpendicular to
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MEXICaNG INSTITUTE. , DELA FROPIEDAC Γλ-ζ.-'- Ί page may space available. For example, the log cutter looks real .de ^ -the well logging tool can be circular or rectangular. Well logging tool 110 directs light into sample 130 through optical interface 116, for example, a window in frame 112. Well 110 logging tool is configured to examine sample 130 (for example, stationary or mobile well fluids) in well 38 through optical interface 116 and to determine a quantity (for example, a value ) of a given characteristic (also referred to as a characteristic to be measured) of the examined sample 130. The characteristic to be measured can be any of multiple characteristics of sample 130, including the concentration of a given substance in the sample, a ratio of gas-oil (GOR), the value of pH, density, viscosity , etc.
Light source 120 emits light with a source spectrum in a particular wavelength range, from a minimum wavelength Á<sub>m</sub>± na maximum wavelength Ámax · In some implementations, the source spectrum may have a non-zero intensity in all or most of the wavelength range Ámax - Ámin. In some implementations, the source spectrum is spread across the spectral ranges
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from i5V<sup>to</sup>go! di¿skia '{0 pm) and close IR (0.8 - 2.5 pm). Of-alt-prnativ ^ or additional, the source spectrum extends to the spectral ranges of near IR and mid IR (2.5-25 pm). In some implementations, the source spectrum spans the near IR, mid IR, and far IR (25-100 pm) spectral ranges. In some implementations, it is possible to adjust light source 120 and this is configured in conjunction with the detection and processing of resolved signals in time.
Light source 120 is arranged to direct probe beam 125 of the light source toward optical interface 116 where it illuminates sample 130 at location 127. The light source in probe beam 125 interacts with sample 130 and it is reflected as light modified by sample 130. The light modified by the sample has a modified spectrum I (λ) 135 'in the particular wavelength range. In the reflective configuration of the well 110 logging tool illustrated in Figure 1A (i.e. where the light to be analyzed is reflected at the sample / window interface), the modified spectrum I (λ) 135 'is a reflection spectrum related to sample 130. In a transmission configuration of the well logging tool 110 (not shown in Figure 1A), the probe beam is transmitted through the sample as
<img file="MX359196B_D0014.tif" />
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MfeXiCANü INSTITUTE OF INDUSTRIAL PROPERTY modified light, so that the modified spectrum I (λ) 135 'is a transmission spectrum related to the sample.
In general, the modified spectrum I (λ) 135 'encodes information on multiple characteristics associated with sample 130 and, more specifically, the encoded information refers to current values of the multiple characteristics. In the example illustrated in Figure 1A, the modified spectrum 135 'contains information on one or more characteristics of the fluids in well 130.
Referring to Figure 1A and the Cartesian coordinate system provided herein by reference, the ICE 140 is arranged to receive a beam 13 5 of light modified by the sample and configured to process and generate a beam 155 light processed. The beam 13 5 of light modified by the sample is incident on a first surface of the ICE 140 along the z axis and the beam 155 of processed light exits along the z axis after transmission through the ICE 140. Alternatively or additionally, beam 155 (or additional reflected beam) of processed light may exit after reflecting off the first surface of ICE 140. The ICE 140 is configured to process the light modified by the sample by weighting it according to an optical spectrum w (Á) 150 associated with a characteristic to be measured.
The optical spectrum w (Á) 150 is determined offline
<img file="MX359196B_D0015.tif" />
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<td>set</td><td>of calibration spectra I (λ) of the sample, the</td>
which correspond to the respective known values of the characteristic to be measured. As illustrated by the optical spectrum w (Á) 150, generally, the optical spectra can include multiple maxima (peaks) and local minima (valleys) between Á<sub>ra</sub>i<sub>n</sub> and á<sub>ma</sub>x. The peaks and valleys can have the same amplitudes or different amplitudes. For example, an optical spectrum w (Á) can be determined by regression analysis of N<sub>c</sub> calibration spectra Ij (λ) of a sample, where j = l, ..., N<sub>c</sub>, so that each of the calibration spectra Ij (λ) corresponds to an associated known value of a certain characteristic for the sample. A typical quantity N<sub>c</sub> of calibration spectra Ij (Á) used to determine the optical spectrum w (Á) 150 by regression analysis can be N<sub>c</sub> = 10, 40 or 100, for example. The regression analysis emits, within the N<sub>c</sub> Calibration spectra Ij (λ), a spectral pattern that is specific to the given characteristic. The spectral pattern emitted by the regression analysis corresponds to the optical spectrum w (X) 150. In this way, when a value of the characteristic given for the sample is unknown, a modified spectrum is acquired I<sub>OR</sub>(Á) of the sample by the interaction of probe beam 125 with sample 130, then the modified spectrum I is weighted<sub>OR</sub>(L) with ICE 140 to
<img file="MX359196B_D0016.tif" />
determine a magnitude
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150 on the modified specter I<sub>OR</sub>(TO).
The determined magnitude is proportional to the unknown value of the characteristic given for the sample.
For example, the sample may be a mixture (eg, fluid from well 130) containing substances X, Y, and Z, and the characteristic to be measured for the mixture is the ex-concentration of substance X in the mixture. In this case, N is acquired<sub>c</sub> calibration spectra Ij (λ) for N<sub>c</sub> samples of the mixture with known concentration values s respectively for each of the substances contained in the N<sub>c</sub> samples. By applying regression analysis to N<sub>c</sub> calibration spectra Ij (λ), it is possible to detect a first spectral pattern that is specific to the ex concentration of substance X (recognized), so that the first spectral pattern corresponds to the first optical spectrum Wcx (Á) associated with a first ICE, for example. Similarly, it is also possible to detect second and third spectral patterns that are respectively specific to the concentrations cy and Cz of substances Y and Z, so that the second and third spectral patterns correspond respectively to the second and third optical spectrum w<sub>c</sub>and (á) and Wcz (Á), associated respectively to the second and third ICE. In this way, when a new sample of the mixture (for example, the fluid from well 130) presents a concentration
Unknown Cx of substance X,
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e acquire a modified spectrum I<sub>or</sub>(λ) of the lllllUbLia htaeva by means of the interaction of the probe beam with the mixture, then the modified spectrum Iu (Á) is weighted according to the first ICE to determine a magnitude of the first spectral pattern within the modified spectrum I<sub>OR</sub>(TO). The determined magnitude is proportional to the unknown value of the concentration c<sub>x </sub>of substance X for the new sample.
Referring again to Figure 1A, the ICE 140 includes N layers of materials stacked on one substrate, so that the complex refractive indices of the adjacent layers are distinct from each other. The total number of stacked layers can be between 6 and 50, for example. The substrate material can be BK7, diamond, Ge, ZnSe (or other transparent dielectric material) and can have a thickness in the range of 0.02-2 mm, for example, to ensure the structural integrity of the ICE 140.
Throughout the present description, a complex refractive index (or complex refractive index) n * of a material has a complex value, Re (n *) + ilm (n *). Re (n *) represents a real component of the complex refractive index responsible for the refractive properties of the material, and Im (n *) represents an imaginary component of the complex refractive index (also known as the extinction coefficient k) responsible for the absorption properties of the material.
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In the present description, '' '© QgÉttdi®' it is mentioned that a material has an illdicc —do r ° tr ^<sub>DC</sub>io<sub>n</sub> high complex n * H and other material has a low complex refractive index n * L, the real component Re (η * κ) of the high complex refractive index n * H is larger than the real component Re (n * b) low complex refractive index n * L, Re (n *<sub>H</sub>)> Re (n *<sub>L</sub>). The materials in the adjacent ICE layers are selected to have a high complex refractive index n *<sub>H</sub> (eg Si) and a complex refractive index low n *<sub>L</sub> (for example, S1O2). In this case, Re (n * si) »2.4> Re (n * sio2)“ 1.5. However, for other pairs of materials, the difference between the high complex refractive index n *<sub>H</sub> and the complex refractive index under n * L can be much lower, for example, Re (n * n) »1.6> Re (n * L) <sup>K</sup> 1.5. The use of two materials to make the N layers is chosen for illustrative purposes only. For example, multiple materials can be used that have different complex refractive indices, respectively. In this case, the materials used to build the ICE are chosen to achieve a desired optical spectrum w (Á) 150.
A set of design parameters 145, which includes the total number of stacked layers N, the complex refractive indices n *<sub>H</sub>, n *<sub>L</sub> of the adjacent stacked layers and the thicknesses of the N stacked layers t (l), t (2), ..., t (N1), t (N), from ICE 140 can be chosen (as further described
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INSTITUTO MEXiCANi DE LA PROPIEOAL · INDUSTRIAL
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forth in connection with the spectrally equivalent to the
Figure 2) to be optical spectrum w (Á) 150 associated with the characteristic to be measured. As such, an ICE design includes a set 145 of thicknesses {t (i), i = l, ..., N} of the N layers stacked on the substrate that correspond to the optical spectrum w (Á) 150.
Considering the above, the beam 155 of processed light generated by the ICE 140 has a processed spectrum
P (λ) = w (Á) ®I (Á) 155 'in the wavelength interval Á<sub>raa</sub>x - Amin, so that the processed spectrum 155 'represents the modified spectrum I (λ) 135' weighted by the optical spectrum w (Á) 150 that is associated with the characteristic to be measured.
<td>The</td><td>make</td><td>155 of</td><td colspan="2">light processed</td><td colspan="3">is run from ICE 140</td>
<td>to him</td><td colspan="3">optical transducer</td><td> 160</td><td>, which detects</td><td>the</td><td>light</td>
<td>processed</td><td>and</td><td>generate</td><td>a signal</td><td>of</td><td>optical transducer</td><td> 165 .</td><td>A</td>
value (for example, a voltage) of the signal from the optical transducer 165 constitutes a result of an integration of the processed spectrum 155 'in the particular wavelength range and is proportional to the unknown value c 165' of the characteristic to be measured for sample 130.
In some implementations, the well 110 logging tool may include a second ICE (not shown in Figure 1A) associated with a second ICE design that includes a second set of thicknesses {t '(i), i = l, N '} of a layer, where each has a different complex refractive index than the layers adjacent to it, where the complex refractive indices and the thickness of the
Ν 'layers correspond to a second optical spectrum w<sup>1</sup> (λ).
In this case, the second optical spectrum w '(λ) is associated with a second characteristic of the sample
130 and a second processed spectrum represents the modified spectrum I (λ)
135 'weighted by the second optical spectrum w' (λ), so that a second value of a second detector signal is proportional to a value of the second characteristic for sample 130.
In some implementations, the determined value 165 'of the characteristic to be measured can be acquired together with a measurement time, a geolocation and other metadata, for example. In some implementations, the signal from detector 165, which is proportional to a characteristic to be measured with the well logging tool 110, can be used as a response signal to adjust the characteristic of the sample, to modify the sample, or the conditions of the medium associated with the sample, as desired.
The characteristics of well 130 fluids that can be related to the modified 135 'spectrum through the optical spectra associated with ICE 140 and the others
ICE (not shown in Figure 1A) are
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aromatic compounds, the composition and content of hydrocarbons, the content and composition C1-C6 of the gas of: CO2, H2S, and correlative PVT properties including GOR, bubble point, density, an oil-forming factor, viscosity, a gaseous component of a gaseous phase of oil, the percentage of the total flow of water, gas, oil , solid articles, solid type components, the characterization of oil, the continuity of the deposit, the type of oil and the aqueous elements that include the content and composition of ions, properties of anions, cations, salinity, organic compounds, pH, mixing ratios, trace components, contamination or other hydrocarbons, gases, solids or water.
(2) Aspects of ICE design
The following describes the aspects of a process for designing an ICE associated with a characteristic that you want to measure (for example, one of the characteristics listed above). In this case, an input to the ICE design process is a theoretical optical spectrum w<sub>t</sub>h (Á) associated with the characteristic. An output of the ICE design process is an ICE design that includes description of (1) a substrate and an N quantity of layers to be formed on the substrate, where each layer has a refractive index
<img file="MX359196B_D0022.tif" />
different complex than this one; and (2) refractive indices ya to the substrate and layers corresponding to an objective optical spectrum w<sub>t</sub>(TO). The objective optical spectrum w<sub>t</sub>(X) is different from the theoretical optical spectrum wth (Á) associated with the characteristic, so that the difference between the theoretical and objective optical spectra causes the degradation of a target performance with respect to a theoretical performance of the ICE within a tolerance of objective error. Objective performance represents finite precision with which an ICE having an objective optical spectrum w is expected to<sub>t</sub>(Á) can predict known values of the characteristic corresponding to a set of validation spectra of a sample with a finite error (different from zero). In this case, the predicted values of the characteristic are obtained through the integration of the sample validation spectra weighted respectively by the ICE with the objective optical spectrum Wt (λ). Theoretical performance represents the maximum precision with which the ICE, if it has the theoretical optical spectrum Wth (Á), predicts the known values of the characteristic corresponding to the set of validation spectra of the sample. In this case, the theoretically predicted values of the characteristic are obtained through the integration of the weighted sample validation spectra.
<img file="MX359196B_D0023.tif" />
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Figure 2 is a flow chart of an example of a process 200 to generate an ICE design. One of the inputs to process 200 is a theoretical optical spectrum w<sub>t</sub>h (Á) 205. For example, to design an ICE to measure the concentration of a substance X in a mixture, we access a theoretical optical spectrum wth (Á), associated with the concentration of substance X in the mixture, by example, in a data warehouse. As described earlier in the present description, the theoretical optical spectrum w<sub>t</sub> (λ) that is accessed corresponds to a spectral pattern detected offline, using a quantity N<sub>c</sub> of calibration spectra of the mixture, where each of the N<sub>c</sub> Calibration spectra correspond to a known concentration of substance X in the mixture. An additional entry to process 200 is a description of the materials for an ICE substrate and coatings. Materials that have different complex refractive indices, respectively, are specified such that adjacent ICE layers are formed with materials with different complex refractive indices. For example, a first material (for example, Si) that has a high complex refractive index n * H and a second material (for example, SiO<sub>x</sub>) having a complex refractive index low n * L are specified to form
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alternatively the ICE layers. By way of another example, a layer of high index material (for example, Si) can be made, followed by a layer made of a low index material (for example, SiO<sub>x</sub>), followed by a layer of a different high index material (eg Ge), followed by a layer made of a different low index material (MgF<sub>2</sub>) , etc. The iterative design process 200 is carried out as follows.
In 210, during j.<sup>to</sup> iteration of design process 200, thicknesses (ts (j), t (1; j), t (2; j), ..., t (Nl; j), t (N; j)} of the substrate are iterated and a number N of ICE layers.
At 220, a jth optical spectrum of w (Á; j) of the ICE corresponding to complex refractive index and previously iterated thicknesses {ts (j), t (l; j), t (2; j), is determined. ..., t (Nl; j), t (N; j)} of the substrate and the N layers, where each has a different complex refractive index than its adjacent layers. Iterated substrate thicknesses and N layers are used to determine the corresponding ICE optical spectrum w (Á; j) according to conventional techniques for determining spectra of fine film interference filters.
In 230, the yield of the ICE is obtained, which has the j. Optical spectrum w (Á; j) determined in 220. For this, a set of validation spectra of a sample is accessed, for example, in a data repository. They know each other
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INSTITUTE · _ι the respective values of a character $ wa '<sup>kl</sup>Add ^ ia - ifis for validation spectra. By ajamp 1 e> - cad ^ 'Hñdde los N<sub>v</sub> Validation spectra I (Á; m) corresponds to a value v (m) of the sample characteristic, where m = l, ..., N<sub>v</sub>. In the example illustrated in Figure 2, N is used<sub>v</sub>= 11 validation spectra, corresponding respectively to 11 known values of the characteristic to be measured for the sample.
Graph 235 shows (in circles without filling) the c (m; j) values of the characteristic of the sample prelos by the integration of the validation spectra I (λ, -m) weighted with the ICE, which has j. ° optical spectrum w (Á; j), plotted against the known values v (m) of the sample characteristic corresponding to the characteristic validation spectra are found by substitution, in formulas 165 'of Figure
IA, of (1) the spectrum I (λ) 135 'of the light modified by the sample with the spectra of the objective spectrum w<sub>t</sub> (λ) 150 with the j. optical spectrum w (Á; j). In this example, in terms of a distance-weighted measure from each graph 235 to the one of the unfilled circles on the dotted line bisector between the x and y axes. This weighted measure is called the error of
<img file="MX359196B_D0026.tif" />
standard calibration (SEC)<sup>NST</sup>®rk? ÁsííóX (és)% of the T ^ 2E. industrial
For example, an ICE that has a theoretical spectrum w<sub>t</sub>h (Á) has a theoretical SECth that represents a lower limit for the SEC (j) of the ICE that has the jth spectrum w (Á; j) determined at 220 during j.<sup>to</sup> iteration of design process 200: SEC (j)> SECth.
In the present description, the SEC is chosen as a metric parameter to evaluate the performance of the ICE for simplicity. It should be noted that there are other figures of merit that can be used to assess the performance of the ICE, as known in the art. For example, sensitivity, which is defined as the slope of the characteristic change as a function of signal strength, can also be used to assess the performance of the ICE. As another example, standard prediction error (SEP) can be used to assess the performance of ICE, which is defined in a similar way to SEC except that it uses a different set of validation spectra . Any of the figures of merit known in the art is evaluated in the same general way by comparing the theoretical performance with that actually achieved. The figures of merit or combinations used to evaluate the performance of the ICE are determined by the design of the specific ICE.
The iterative design process 200 continues by iterating at 210 the thickness of the
MEXICAN INSTITUTE OF PROPERTY iteration is performed so that a (jTl'j '·.<sup>and</sup> tíyptyutlTJ 'Óptl'Co w (Á; j + 1), determined in 220 from the newly iterated thicknesses, causes, in 230, an improvement in the performance of the ICE, to obtain SEC (j + l) <SEC (j ). In some implementations, the iterative design process 200 stops when the ICE performance reaches a local maximum or, equivalently, the ICE SEC reaches a local minimum. For example, iterative process 200 can be stopped at (j + 1).<sup>to</sup> iteration when the current SEC (j + 1) is greater than the last SEC (j), SEC (j + l)> SEC (j). In some implementations, the iterative design process 200 stops when, for a specified number of iterations, the ICE performance exceeds a specified threshold performance for a specified number of iterations. For example, the iterative design process 200 can be stopped at j.<sup>to</sup> iteration when three consecutive SEC values decrease monotonically and are less than a specified threshold value: SECo> SEC (j-2)> SEC (jl)> SEC (j).
In either case, an output from iterative process 200 represents a target ICE design 245 that is used to manufacture an ICE 140, such as that described in Figure 1A, for example. The design of ICE 245 includes the description of (1) a substrate and N layers, where each layer has a refractive index as layers adjacent to the complex refractive indices n * s, n *<sub>H</sub>, n * L and the thickness {ts (j).
t (2; j), ..., t (Nl; j), t (N; j)} of the substrate and the
N layers corresponding to j.<sup>to</sup> process iteration
200. The additional components of the ICE design are the spectrum both determined during j.<sup>to</sup> iteration based on the
..., t (Nl; j), t (N; j)}. As the ICE 245 design is used as input for the manufacturing processes described herein, the iterative 200 iteration index j, in which the process annotations used
Thus, the layer thicknesses associated with the design of the ICE 245 substrate and N are indicated {ts,
245 and corresponding to the objective thicknesses is called the objective optical spectrum wt (λ) 150. The SEC associated with the design of ICE 245, obtained according to the objective optical spectrum wt (Á) 150 corresponding to the objective thicknesses, is called objective SECt . In the example illustrated in Figure 2, the ICE 245 design has a total of N = 9 alternate Si and SIO2 layers, with complex refractive indices nsi, nsio2, respectively. The thicknesses of
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(3) Manufacture of ICE monitored with spectroscopy in si tu
As described above with respect to the
Figure 2, an ICE design specifies a number of layers of material, where each has a different complex refractive index than the layers adjacent to it. An ICE manufactured in accordance with the ICE design has (i) an objective optical spectrum w<sub>t</sub>(Á) and (ii) a target performance SECt, where both correspond to the complex refractive indices and target thicknesses of a substrate and a total number of layers specified by the ICE design. The performance of the ICE manufactured in accordance with the ICE design can be very sensitive to the actual values of complex refractive indices and thicknesses obtained during deposition. For multiple reasons, the actual values of complex refractive indices of materials being deposited and / or deposition rates may deviate from a manufacturing batch or between batches, or may be indirectly affected by errors caused by systems of measurement used to control previous manufacturing parameters. For example, the materials used for deposition (Si
SiO<sub>2</sub>) they can
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differently, or they may react differently due to different chamber conditions (eg, pressure or temperature). For some layers of the ICE 245 design, a small error, for example 0.1% or 0.001%, in the thickness of a deposited layer can cause a reduction in the performance of an ICE associated with the ICE 245 design below an acceptable threshold.
The actual values of the complex refractive indices or the thicknesses of the deposited layers may be different from their target values due to deviations in deposition rate (i) during the manufacture of one or more layers of ICE manufactured from a batch or (ii) between lots. For example, deviations in deposition rate can be caused by contamination of the materials used for deposition (Yes, YESO2), or by changes in deposition chamber conditions (eg, pressure or temperature). Changes in deposition rate can lead to changes in the thicknesses and / or complex refractive indices of deposited layers compared to their respective targets, which, in turn, cause performance degradation of manufactured ICEs relative to to a target performance. The above process changes can be completely corrected or avoided by on-site monitoring of the yes
INDUSTRIAL ICE manufacturing.
For example, on-site spectroscopy for monitoring · · ICE fabrication is used to generate a spectrum of one or more of the ICEs that are being manufactured. The generated spectrum is then used to determine optical characteristics (eg, complex refractive indices) or physical characteristics (eg, thicknesses) of the deposited layers of the ICEs. The differences between the complex refractive indices and the determined thicknesses of the layers formed are used to obtain new target thicknesses for the layers that have not yet been deposited. The above stages of these in situ spectroscopic optimizations and measurements are repeated after the deposition of at least some of the layers of the ICEs that are being manufactured.
Typically, an in-situ spectrometer used to monitor deposition of ICE layers has a normal incidence transmission configuration. In this configuration, a source that provides the probe light is typically placed outside of a deposition chamber. For example, the probe light can be provided to the deposition chamber through a sapphire inlet window having a transmission of about 85%. The probe light is directed through the deposition chamber toward a control sample (eg, one or more of the ICEs being manufactured).
<img file="MX359196B_D0028.tif" />
Incident probe over a typical ICE is transmitted by it. The probe light transmitted through the control sample is directed to exit through the bottom of the deposition chamber. For example, the probe light transmitted through the control sample can exit the deposition chamber through a sapphire exit window having about 85% transmission. Once outside the deposition chamber, the probe light transmitted through the control sample can be directed towards a detector using a mirror mount. For example, a reflective surface of the mirror mount may be covered in gold with a reflectance of about 95%.
The noise inputs that can affect a detector signal and therefore the spectrum accuracy generated by the spectrometer based on the detector signal includes a length and quantity / configuration of optical components within the optical path of light probe / transmitted probe light described above.
Other noise inputs that can affect a detector signal, and therefore the accuracy of the spectrum generated by the spectrometer based on the detector signal, includes external IR light sources (or light sources other than the spectrometer light source). ) such as, for example, on-site halogen lamps, sources of
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The deposition chamber can have multiple laialog'giiás lamps to heat the ICE substrates while depositing the ICE layers up to 300 ° C, so that the manufactured ICES can be annealed in situ. If ICE were removed from the deposition chamber without annealing, their optical response would change due to moisture absorption and / or temperature variation. By subjecting the ICEs to annealing in the deposition chamber during manufacturing, the manufactured ICEs will have little or no variation in their optical response during operation.
There are several factors that can contribute to the reduction of the signal-to-noise ratio (S / N) of ICE spectroscopy performed during manufacturing. Factors were addressed in conventional ICE manufacturing systems to mitigate their contribution to overall measurement noise, as follows. For example, a reduction in the path length from the source to the detector causes a reduction in S / N. The current optical path length of a conventional ICE manufacturing system has been reduced as much as possible to approximately 5 '(or 152 cm). By way of another example, the reflection and transmission properties of the individual optical elements along the path of the probe light beam, including the sapphire windows and mirrors of
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example, near IR and IR) for ICE applications. In yet another example, while the ICE substrates are heated to 300 ° C, the lamps arranged within the deposition chamber emit IR radiation. This radioactive source is one of the most influential factors for noise input. To mitigate this, collimated tubes can be attached to the
<td colspan="4">bottom of the deposition chamber in a position</td><td colspan="2">window</td>
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General ICE and / or its thickness will reduce the transmissivity of ICEs and therefore the S / N of conventional in-situ spectroscopy. For an ICE design with a large number of layers and thicknesses, optical monitoring in the visible UV spectral range is less useful than an IR spectroscopic measurement. Improving the S / N of in-situ spectroscopy in the IR spectral range by filtering the input of external IR light to the detector signal would maximize the accuracy of the generated IR spectra. The IR spectra generated in this way could be crucial in accurately determining thickness and thickness.
ICE optical constants with more layers and
To improve the S / N of
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This approach can be used to improve the S / N of a spectrum obtained with a spectrometer operating in a single shot mode. For example, a broadband (white) probe light beam is modulated before illuminating the control sample; the probe light transmitted through the control sample expands spectrally (for example, by
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OF PROPERTY „E i,, INDUSTRIAL (¡• ¿ojii-t * · '., The use of a grid or prism) in the wavelength range of the probe light; and the spectrally expanded transmitted probe light is detected with a photosensitive array, where the elements of the photosensitive array correspond to the wavelength wavelength range of the probe light. The magnitudes of the AC components of the signal output by the photosensitive array elements are measured using fixed detection (referenced by modulating probe light). The measured values of the AC components are proportional to the respective transmissivity values of the control sample at the wavelengths corresponding to the elements of the photosensitive assembly.
The above approach to improve the S / N of a spectrum acquired with a spectrometer operating in a single shot mode should be modified when the spectrum is acquired with an FTIR spectrometer (or with any other spectrometer operating in an analysis mode instead of a single shot mode). The difference in length of the optical path of an FTIr spectrometer interferometer is analyzed to generate broadband IR spectra. Conventionally, this is accomplished by continuously moving a mirror within the interferometer. Typical fast mirror analysis speeds are v = 0.2-1.2 cm / s. This is often expressed as a frequency of
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Fourier, f = 2vv, where v is a wave number of the reference laser (eg 15,800 cnr<sup>1</sup>.) Therefore, the frequency is f 40kHz. Since conventional continuous analysis of the optical path length difference could interfere with the frequency of the interrupting element, the technologies described use an interferometer operating in a separate analysis mode, also referred to as a step analysis mode.
For example, an optical path length difference can be established for a given position of the interferometer mirror to be held fixed while the interrupting element and the fixed amplifier measure the intensity of the interferogram.
Once the intensity for the given optical path length difference has been measured, the mirror can be moved to the next optical path length where it will remain fixed while the interrupting element and fixed amplifier measure the intensity again. This separate analysis could then continue for the full available range of the optical path length. At the end of the analysis, the measured phase-sensitive intensity, as a function of the optical path length difference, can be recombined and transformed by Fourier to obtain the IR spectrum of the probe light transmitted through the control sample in the domain of frequency.
In some implementations, two can be used
<img file="MX359196B_D0032.tif" />
MEXICAN INSTITUTE OF PROPERTY j ·. <sub>Ί</sub> INDUSTRIAL interrupting elements in conjunction with those described. In other SS implementations, a planetary rotational motion of the substrate supports, used to support multiple ICE substrates in a batch, can be used for time-restricted detection. This could replace the need to insert an interrupt element later
<img file="MX359196B_D0033.tif" />
spectrometer.
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some implementations,
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with place
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monochromator
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uses
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<img file="MX359196B_D0041.tif" />
FTIR interferometer.
<img file="MX359196B_D0042.tif" />
In this case, the relative orientation between a wavelength selection element (for example, a grid or a prism) and a slot (also referred to as an output port) of the monochromator is analyzed in a step analysis mode, according with the described technologies. Although slower than conventional spectroscopy performed in a continuous analysis mode without fixed or time-restricted detection, the described phase-sensitive or time-restricted spectroscopy performed in a step analysis mode can filter out noise inputs from the environment manufacturing ICE. Therefore, the described spectroscopies have a higher S / N and, therefore, are more accurate than conventional spectroscopy.
In accordance with the described technologies, in situ spectroscopy of a control sample is performed in a step analysis mode while the control sample
<img file="MX359196B_D0043.tif" />
it is at least relative to the probe light beam and modulation is induced in the probe light that illuminates the control sample, in some implementations. In this case, a modulation time distribution is used to reference the fixed detection. In other implementations, in situ spectroscopy of the control sample is performed in a step analysis mode while the control sample is subjected to periodic motion relative to the probe light beam. In this case, time-restricted detection is based on a temporal distribution of periodic motion. The results of fixed detection or time-restricted detection are used to generate a spectrum of the probe light that interacted with the control sample. In addition, the generated spectrum is used to determine complex refractive indices and thicknesses (and / or other characteristics) of the layers of the current ICE instance in near real time. Throughout the present description, determining a complex refractive index n * of a layer means that both the real component Re (n *) and the imaginary component Im (n *) of the complex refractive index are determined. Complex refractive indices and determined thicknesses of layers in the current ICE instance are used to control the deposition of the current layer and the remaining layers to be formed.
The particular implementations of the technologies
<img file="MX359196B_D0044.tif" />
IMPI <
The MEXICAN INSTITUTE OF INDUSTRIAL PROPERTY described can be configured to obtain one or more of the following potential advantages.
The manufacture of ICEs includes processes that reduce variations in the optical spectrum of the ICE under various conditions, particularly high deposition manufacturing.
Halogens deposit environmental halogens, such as temperature. After the relatively low temperatures stop, a subject to allow
To allow the to heat the layers of the emit form
ICE annealed off-chamber operation to annealed in situ, be an ICE substrate
ICE. However, temperatures use lamps while the lamps are inadvertent radiation in the part
IR optical spectrum
ICE and contribute to background noise in situ during IR spectroscopic measurements in situ. The technologies described using monochromator or FTIR-based spectrometers operating in a step analysis mode in combination with fixed or time-restricted detection allow on-site monitoring of the fabrication of the
ICE in an environment that includes heat sources that emit IR radiation.
In addition, high volume manufacturing of ICE is done in a deposition chamber large enough to accommodate a large number of substrates to manufacture ICE in large quantities. As a result of the use of a large deposition chamber, path length f, by increasing S / N to collect accurate spectra during ICE fabrication. As such, the technologies described using a monochromator or FTIR-based spectrometer operating in a step analysis mode in combination with fixed or time-restricted detection allow for on-site monitoring of ICE fabrication on a large scale, in chambers of large stool.
Furthermore, ion-assisted electron beam deposition offers many advantages, even consistent with thin film properties and rapid thin film growth. However, the advantages obtained with ion-assisted electron beam deposition have the disadvantage that there are more process variables to monitor and control. The variability of the variables of these processes can have an impact on the transmission profile of the ICE, which, in turn, directly affects the performance of the ICE. It is highly desirable to allow accurate monitoring of the transmission profile as it was deposited during manufacturing to help control process variables. The accuracy of IR spectral measurements will greatly improve with higher S / N. As such, the technologies described using spectrometers based on a
<img file="MX359196B_D0045.tif" />
s by
OF THE FKOHEOA
INDUSTRIAL steps in combination with fixed or time-restricted detection allow ion-assisted electron monitoring of
In general, the fabrication and fabrication with beam
ICE.
ICE analysis requires the use of fast and accurate characterization methods to re-optimize inline filter design. Conventional approaches to reducing S / N, such as the joint average of the spectra generated by an analysis monochromator or FTIR spectrometer, would not be useful for the purpose and functionality, as well as the implementation of the described spectroscopies that can filter the contributions. of noise sources from the ICE manufacturing environment without a significant increase in time (data acquisition).
The details of one or more of the foregoing modalities are described below.
(3.1) ICE manufacturing system equipped with an interferometer-based spectrometer in a step analysis mode in combination with fixed detection
A target ICE design can be provided to an ICE manufacturing system in which multiple ICEs are manufactured based on the target ICE design. Onsite monitoring technologies of ICE manufacturing using current instance spectra of
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ICEs being manufactured are described so that the spectra are gonpráAng a nartir.de the results of step analysis spectroscopy performed with a spectrometer based on an interferometer in combination with fixed detection.
Figure 3A shows an example of an ICE 300 manufacturing system. The ICE 300 manufacturing system includes a deposition chamber 301 for manufacturing one or more ICE 306, a spectrometer 304 for acquiring the spectra of the interacting probe light with the formed layers of the ICEs being manufactured, and a computer system 305 to control the manufacture of the ICEs based, at least in part, on the acquired spectra.
The deposition chamber 3 01 includes one or more deposition sources 303 to provide materials with a low complex refractive index n *<sub>L</sub> and a high complex refractive index n * H used for the ICE 306 layers. The substrates on which the ICE 3 06 layers are deposited are placed on a substrate support 3 02, such that the ICE 306 is are within the field of view of the deposition sources 303. The substrates have a thickness ts and a complex refractive index n * s specified by an objective ICE design 307 (eg, ICE design 145 or 245).
For example, various techniques of
IMPI
MEXICAN INSTITUTE physical vapor deposition (PVD, for its ^ usícrebas
<img file="MX359196B_D0046.tif" />
is) to form a stack of layers of each of the ICE 3 06 based on the design of objective ICE 307. According to the PVD techniques, the layers of the ICE are formed by condensation of a vaporized form of materials from the sources 305, while maintaining a vacuum in deposition chamber 301. An example of a PVD technique is electron beam deposition (e-beam), in which a high-energy electron beam is electromagnetically focused on the materials of the deposition sources 303, for example, either Si or SÍO2, to evaporate atomic species. In some cases, electron beam deposition is assisted with ions provided by ion sources (not shown in Figure 3A), to clean or etch ICE substrates; and / or to increase the energies of the evaporated materials, so that they are deposited on the higher density substrates, for example. Other examples of PVD techniques that can be used to form the layer stack of each of the ICE 306s are: cathodic arc deposition, where an electric arc discharged onto the materials of the deposition sources 303 converts some of these to vapor ionized that is deposited on the ICE 306 that are being formed; evaporative deposition, where the materials included in the 303 deposition sources are heated to a high vapor pressure by electrically heating
INSTITUTO MEXICam resistivo; 9
<img file="MX359196B_D0047.tif" />
pulsed, where a laser separates the materials from the 303 deposition sources and converts them into a vapor; or sputter deposition, where a discharge of luminescent plasma (usually located around the deposition sources 3 03 by a magnet; not shown in Figure 3A) bombards the materials in the sources 303 and sprays some of these as vapor to his subsequent deposition.
Relative orientation and spacing between the deposition sources 303 and the substrate support 302 are configured to provide desired deposition rates and spatial uniformity through the ICE 306s arranged in the substrate support 302. Since a spatial distribution of a deposition column provided by the deposition sources 303 is not uniform along at least a first direction, the substrate support 302 periodically moves with respect to the deposition sources 303 along the first address (for example, rotates along an azimuth direction φ about a laterally offset axis of the deposition sources 3 03 passing through the center of the support substrate 302) to obtain reproducibly uniform layer deposition of the ICE 3 06 of a lot. For example, a substrate holder 302 (also
IMPI called platen) which has a diameter <sup>c</sup> 330mm industrial) can hold 66 ICE 306s, each of which has a diameter of 1 (or about 25mm). In some implementations, one or more substrate supports 302 are mounted in an assembly. In cases, the mount rotates with respect to the deposition sources 303 in a first period Ti around the center of the mount, and each substrate support 3 02 rotates with respect to the mount in a second period T<sub>2 </sub>around the center of the substrate support 302.
A heat source 310 provides heat to the current instances of the ICE 306 distributed over the substrate support 302 to maintain their temperature within a target manufacturing temperature range ATfab around a target manufacturing temperature Tfab. The ATfab range and the target manufacturing temperature ATfab depend on whether the ICE 306s are manufactured to be operated in an annealed state or an annealed state. An ICE is irreversibly annealed when heated at least through an upper limit of an annealing temperature range associated with the ICE 307 design.
For example, a finite annealing temperature range (which is not zero) associated with the ICE 3 07 design is limited by such an annealing temperature of a coating material with a low complex refractive index n * UT) and an annealing temperature Tah of an adjacent layer material with a complex refractive index
INSTITUTO MEXICANO '' VA case, ICE constituent material with indirg — Ha complex refraction low / high n * L (T) / n * H (T) irreversibly changes shape from a live state to an annealed state ( with reduced tension) when heated through Tal / Tah annealing temperature. As another example, the aforementioned annealing temperature range becomes a single annealing temperature Ta associated with the design of ICE 3 07 if the stress is reduced (not in the volume of the individual materials of the adjacent ICE layers, but) at the contact surface between adjacent layers having complex refractive indices n * L (T) and π * η (Τ). At this stage the ICE irreversibly changes shape from a contact surface tension state to a contact surface anneal state (with reduced tension) when heated through annealing temperature T *.
The computer system 305 accesses a process parameter 315 that includes the target build temperature Tfab and the target build temperature range ¿Tfab and uses it to monitor the temperature of the current instances of the ICE 306 during the build of the ICEs associated with the design of ICE 307. In some implementations, the heat source 310 includes an IR emitter located remote from the substrate support 302 and focused on at least one the IR emitter for example.
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INDUSTRIAL can be a halogen lamp or an IR laser,
A radiation flux (intensity per unit area) provided by the IR radiation emitter over
<td>the support</td><td>of</td><td>substratum</td><td> 302</td><td>it fits</td><td colspan="2">With</td><td>a</td><td>period</td><td>of</td>
<td colspan="2">rotation of</td><td>support</td><td>of</td><td>substratum</td><td> 302</td><td>for</td><td colspan="2">keep</td><td>the</td>
<td>instances</td><td colspan="2">current of</td><td>the</td><td>ICE 306 a</td><td>the</td><td>long</td><td>of the</td><td>support</td><td>of</td>
substrate 302 at the target manufacturing temperature Tfab.
The energy provided to the sources 303, their arrangement with respect to one or more of the substrate supports 302, etc., are used to control the deposition rates R of the sources 303. For example, if an ICE design specifies that a j.<sup>to</sup> layer L (j) of the N layers of an ICE is a layer of Si with a target thickness t (j), a stack that includes the ICE layers previously formed L (l), ..., L (j1) is exposes a source of Si, among the deposition sources 303, during a period AT (j) = t (j) / Rsi, where Rsí is a deposition rate of the Si source. According to the described technologies, the real complex refractive indices and the real thicknesses of the deposited layers L (l), L (jl), L (j) can be determined when the deposition of the current layer L (j) is interrupted , for example, with 10% remaining of duration T (j), or when the deposition was completed at the end of duration T (j). Complex refractive indices and thicknesses of the formed layers are determined S (Á; j) spectra of light formed layers L (l), ··· 1 spectrometer 304.
The spectrometer
304 includes an optical source (FO) to emit probe light that has a wavelength in the range of Ámin to Á<sub>ma</sub>x, and an interferometer to receive the emitted probe light and to provide spectrally different instances of the probe light corresponding to various optical path differences of the interferometer. In this case, the interferometer operates in a step analysis mode, so that each of the probe light instances is provided for a finite (non-zero) time interval. Since in this example the interferometer operates in a step analysis mode, it will also be referred to as a step analysis interferometer (SSI). In addition, spectrometer 304 includes an interrupting optical element 340 to modulate the probe light instances during the finite time interval with 345 modulation. The modulated instances of the probe light are provided through an input port associated with the spectrometer 304 into the deposition chamber 301 to illuminate a core sample 309. In this case, core sample 309 is held on the substrate holder 302 ivi r
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<img file="MX359196B_D0048.tif" />
along with the ICE 306s that are being manufactured in the deposition chamber 301, so that the control sample 309 experiences the same periodic movement with respect to the deposition sources 303 as the ICE 306s during the deposition. In the implementation example illustrated in Figure 3A, the substrate support 302, and therefore the control sample 309, is held at rest while the spectrometer 304 acquires an S spectrum (Á; j). Modulated instances of probe light transmitted through control sample 309 exit deposition chamber 301 through an output port associated with the spectrometer.
In addition, spectrometer 304 includes an optical detector (DO) to collect light leaving the deposition chamber through the exit port, where the collected light includes modulated instances of probe light transmitted through the control sample. 309, and light emitted by various noise sources, for example, the heat source 310 of the deposition chamber 310 or elsewhere in the environment of the ICE 300 manufacturing system. The DO detector converts the collected light into a detector signal 312. Additionally, the spectrometer 304 includes a fixed detection module 350 synchronized with the modulation 345 induced by the interrupting element 340 at the instances of the probe light to process the sign of 'ftr ·
<img file="MX359196B_D0049.tif" />
detector 312. A fixed signal 315 from module _ __________ _i
350 (also referred to as measurement signal 31b) proportional to a spectral amplitude of detector signal 312 at a modulation frequency 345. Thus, measurement signal 315 represents an average amplitude of the transmitted probe light instances. through control sample 309 for at least part of the finite time interval.
The computer system 305 uses a set of values of the measurement signal 315 corresponding to the different spectral instances of the probe light to generate an S (Á; j) spectrum of the probe light transmitted through the formed layers L ( l), L (jl), L (j) of the control sample 309. The generated spectrum S (A; j), in the wavelength interval between Á<sub>m</sub>in and Á<sub>ma</sub>x, can be used by computer system 305 to determine the complex refractive indices and thicknesses of each of the layers formed in the stack: n * 'si, n *' sio2, t '(l), t' ( 2), ..., t '(jl), t' (j). Computer system 305 makes this determination by solving Fresnel equations to propagate the interacting probe light through the layers formed in the stack.
Spectrometer 304 can use layers formed from any one or more of the current instances of ICEs
306 as a control sample to monitor the deposition of ICE layer in the deposition chamber
IMPI
INDUSTRIAL core sample 309 is placed at predetermined locations of substrate support 302 between ICE 306 being manufactured in deposition chamber 301 to move relative to deposition chamber 303 along a trajectory-like path of the ICE 306s, the control sample 309 experiences similar deposition conditions in the deposition chamber 301 as the ICE 306s, so that the properties of the control sample 309 (for example, Complex refractive indices and thickness of the layers of the control sample) are similar to the corresponding properties of the manufactured ICE 306s.
In some implementations, an area of core samples 309 may be larger than the area of the other ICE 306s, eg, P times larger. In such cases, at the end of ICE manufacturing, control sample 309 can be cut into (up to) P pieces to use the resulting P ICEs, along with other ICE 306s from the same manufacturing batch, on logging tools. For example, ICE 3 06s have a diameter of 1 (about 2.5mm) while each control sample 309 placed on a substrate holder 302 has a diameter of 3 (about 76mm). In this case P = 9. When the deposition of the N layers of the ICE design is completed, the control sample of 3 can be cut into 9 ICEs that are similar in size to the size of the manufactured ICEs 306.
In
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MEXICAN INSTITUTE.! >
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INDUSTRIAL '' -¿jii-bí ·· other implementations, any one or more of them can be used as one or more of the control samples 309.
Various components of Spectrometer 304 and their corresponding functions are now described in detail.
Figure 3B shows a part of the optical path of the above spectrometer 304 in relation to the control sample.
309. It should be noted that the part illustrated in Figure
3B represents
The corresponding part of Figure 3A.
<td>source fo</td><td colspan="2">spectrometer 304</td><td colspan="2">produces</td><td>the</td><td colspan="2">light of</td><td>probe</td><td> 370</td>
<td colspan="3">in the length range</td><td colspan="2">cool</td><td>of</td><td colspan="2">Amin to</td><td>Amax</td><td>The</td>
<td>interval</td><td colspan="2">wavelength</td><td>[Amin,</td><td>Amax]</td><td>of</td><td>the</td><td>light</td><td colspan="2">probe</td>
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<td>measurement. The</td><td>interferometer</td><td colspan="2">It includes</td><td>a</td><td colspan="2">divider</td><td>of</td><td>you do</td><td> 362</td>
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first fixed mirror 364 which interferometer further includes a reflects the first part of the probe light 370 back towards the beam splitter 362.
An optical pathway
363 of the first part of the probe light 370, along which the first part propagates from the beam splitter 362 to the first mirror 364 and back to the beam splitter 362 is referred to as a fixed arm 363 of the interferometer. In addition, the interferometer includes a second
<td></td><td>IMPI MEXICAN INSTITUTE J</td>
<td>mirror 366 mounted</td><td>> in a stage of tra ^ ^ ST ^ fUL 3 ^ i¿Í2íitfede</td>
Varying a position za lo Ί dp the - translation stage 368 of the second mirror 366 in a fractional manner, for example, in increments ± Δζ. The second mirror 366 reflects the second part of the probe light 370 back to the splitter 362. An optical path 365 of the second part of probe light 370, along which the second part propagates from beam splitter 362 to second mirror 366 and back to beam splitter 362 is mentioned as a Interferometer Variable Arm 365.
The first and second parts of the probe light impacting the beamsplitter 362 after propagation respectively along the fixed 363 and variable 365 arm of the interferometer have wavelengths spanning the spectral measurement range [Á<sub>m</sub>i<sub>n</sub>, TO<sub>m</sub>ax] - In addition, beamsplitter 362 combines the first and second parts of the probe light impacting beamsplitter 362 into a combined light 372 that includes a subset of the wavelengths of the measurement spectral range [Á<sub>m</sub>in, Á<sub>ma</sub>x] Specifically, the combined light 372 includes the wavelengths of the measurement spectral range [Á<sub>m</sub>in, A max] that constructively interfere with a current optical path difference between the fixed arm 363 and variable 365 of the interferometer, and lacks the wavelengths of the
MEXICAK INSTITUTE ·
PROPERTY v ¿7
INDUSTRIAL interfering current optical path. He mentions it as a measured spectral interval [Á<sub>m</sub>in i Amax] destructively with the combined light difference 372 represents (and instantiates the probe light 370 generated by the interferometer for the current optical path difference. In this manner, a plurality of spectrally different instances 372 of the probe light corresponding to a plurality of various differences in the optical path of the interferometer can be provided by separately analyzing the location of the second mirror 366 along the translation stage. 368. When the difference in the optical path is zero (or equivalently, when the fixed arm 363 and variable 365 of the interferometer are equal), the interferometer provides a 372-0 instance of the probe light that has the same wavelengths as probe light 370. When the difference in the optical path is + Δζ (or equivalently, when the fixed arm 363 is longer than the variable arm 365 a distance Δζ), the interferometer provides a first instance 372-1 of the probe light which is spectrally different than probe light 370. When the optical path difference is + 2Δζ (or equivalently, when the fixed arm 3 63 is longer than the variable arm 365 a distance 2Δζ), the interferometer provides a second instance 372-2 of the probe light that it is spectrally different than the 370 probe light and the
IMPI
<td></td><td>INSTITUTO MEXICAH ·: '-' OF INDUSTRIAL PROPERTY</td>
<td>first</td><td>instance 372-1 of the probe light. By way of</td>
Hereinafter, the interferometer provides other 372m instances of the probe light that are spectrally different from each other for corresponding optical path differences of + maz, where m = 0, ± 1, ..., ± m<sub>max</sub>.
Each instance 372 of the probe light provided by the interferometer is modulated with the interrupting optical element 340. The interrupting optical element 340 can be an optomechanical shutter, a coding disk, an optoacoustic modulator, or any other optical modulator. The interrupting optical element 340 imparts a modulation 345 to each instance 372 of the probe light and generates a modulated instance 374 of the probe light. Modulation 345 may be an amplitude modulation (eg, the interrupting optical element may alternatively block or pass each instance 372 of probe light 370, or may periodically attenuate each instance 372 of probe light) . In other implementations, modulation 345 can be a frequency or phase modulation. A time distribution of modulation 345 is used as a reference signal by fixed detection module 350, as described in more detail below.
Figures 3B and 3C show that each modulated instance 3 74 of the probe light is directed into the deposition chamber 3 01 through an input port associated with the spectrometer.
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304 (n¿T<sup>1D</sup>^<sup>1 TO 1</sup>shown in Figures 3B-3C) to illuminate the -rrrue ^ trra.Tébtigo TU 9 supported by the substrate support 302, which is at rest in this example. Each modulated instance of the probe light transmitted through control sample 309, referenced as 376, is directed out of deposition chamber 301 through an output port associated with spectrometer 304 (not shown in Figures 3B-3C) to be collected by the DO detector.
Figure 3C shows an optical path of posterior spectrometer 304 relative to control sample 309. It should be noted that the part illustrated in Figure 3C represents a corresponding part of Figure 3A. In addition to the modulated instance of probe light transmitted through control sample 309, referenced as 376, the DO detector collects light emitted by noise sources within the deposition chamber (eg, heat sources 310 described above ) or elsewhere within the ICE 300 manufacturing system environment. For example, a first part 382 of the light emitted by the noise sources is collected by the DO detector after direct propagation from the noise sources. As another example, a second part 384 of the light emitted by the noise sources is collected by the DO detector after propagation from the noise sources by transmission through
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<img file="MX359196B_D0051.tif" />
ΡΤ jt. Λ
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INDUSTRIAL control sample 309. As another example, a third part 386 of the light emitted by the noise sources is collected by the DO detector after propagation from the noise sources by its reflection from the control sample 309.
The light collected by the DO detector, including modulated light 376 and noise light 378, 384 or 386, is converted to detector signal 312. Detection module 350 is referenced by a temporal distribution of modulation 345 and receives as input the detector signal 312. For a current optical path difference mAz, where m is one of 0, ± 1, + 2, ..., ± m<sub>ma</sub>x, the variation in intensity of detector signal 312 may include modulation 345 of the modulated instance of probe light transmitted through core sample 309, referenced as 376, and changes in intensity of noise light 382 , 384, or 386. A modulation frequency 345 is selected to be different from the frequencies and tones at which noise light changes 382, 384, and 386 may occur. The modulation frequency 345 can be on the order of 100 Hz, 1 kHz, or 10 kHz, for example. Furthermore, in the current optical path difference, the amplitude of modulation 345 of the modulated instance of probe light transmitted through control sample 309, referenced as 376, is constant for a constant emission of probe light 370 by the fountain
FO. As fixed 315
INSTITUTO mÉxÍcaw · '-' p
OF PROPERTY V, (also <sup>1</sup> onnada'c orno measurement 315) spectral of the detector signal 312 at a frequency of the reference signal 345. In this way, the measurement signal
315 represents an average over multiple modulation periods of the intensity of the modulated instance of probe light transmitted through control sample 309, referenced as 376.
Figure 3D shows a graph 320 illustrating an example of a fixed detection module reference signal 350 corresponding to modulation 345 imparted by interrupting element 340 to each instance 372 of the probe light. In this case, modulation 345 is a square on / off signal. The modulation period 345 can be on the order of 0.1 ms, 1 ms, or 10 ms, for example. Rectangular on / off modulations (which have different duty cycles of 50% -50%) can also be used to modulate each instance 372 of the probe light. Figure 3E shows a graph 322 illustrating detector signal 312 for a finite time interval 0-t3 during which the optical path difference mAz is kept constant, where m is one of 0, +1, +2,. .., ± m<sub>ma</sub>x. Although a noise input level of 3 82, 3 84, or 3 86 decreases before you, it remains constant at a low level between you and t2, and jumps to a higher level after t2, the amplitude of the modulation of the modulated instance
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<img file="MX359196B_D0052.tif" />
transmitted through the t-pstwjn sample?<sup>n</sup>% T- <af <ar<sub>TO</sub>nqi ada as 376, it remains relatively constant during the entire time interval 0-t3 during which the light is collected by the DO detector, for the difference of the current optical path mAz of the interferometer. As such, the measurement signal V (mAz) 315 for the interferometer current optical path difference mAz, which is proportional to the amplitude of the spectral component of detector signal 312 at the frequency of modulation 345, is approximately constant during the 0-t measurement time interval<sub>3</sub>.
In order to obtain a new measurement signal V ((m + l) Az) 315 for a posterior optical path difference (m + l) Az of the interferometer, the second mirror 366 of the interferometer is translated in the translation stage 368 to a location posterior zo + (m + l) Az to change the difference of the optical path of the interferometer by an amount Az in relation to the difference of previous optical path mAz that was maintained during the previous measurement point. The new optical path difference (m + l) Az corresponds to a new instance 3 72 of the probe light generated by the interferometer that is spectrally different from the instance used to take the previous measurement point. The new instance 372 of the probe light is modulated with the breaker element 340 to obtain the new modulated instance 374 of the probe light that illuminates
IMPIOS, _. MEXICAN INSTITUTE νν + '- ί ·,:, · ^ JA during the intervefl ^ r'o ^ g * ^ the the control sample 309 finite measurement, by modulating the probe light transmitted through control sample 309, referenced as 376, collected with the DO detector, together with the noise light 382, to the new interferometer difference. The new one for the difference interferometer is the one referenced by that of the detector pathway 312
384 or 386, and the optical measurement path is corresponding (m + 1) Δζ
V ((m + 1) Δζ) output of the fixed distribution detection module
3. 4. 5 shown in the figure amplitude of the spectral component at the measurement time frequency
Through the
315 of the
350, modulation time
3D modulation
3. 4. 5 analysis mode computer system 305 records an mmaxAz),
V (+ ΤΠτπ3χΔζ)}
304 for instances represent ν (-Δζ), V (0) and is proportional to detector 312 during the stepwise set of, ν (+ Δζ), sets 315 generated by the interval of above, the values {V (spectrometer amplitudes of modulation of the modulated probe light transmitted through control sample 309, referenced as 376, for the corresponding optical path differences {-rn<sub>ma</sub>xAz, ..., -2Δζ,
-Δζ, 0, + Δζ, + 2Δζ, ..., + mtnaxAz} of the interferometer. The figure
3F shows a graph 324 in which the recorded set of values {ν (τηΔζ), m = 0, + 1, + 2, + m<sub>m</sub>ax} circles without filling in function of optics (by using units
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Mexican INSTITUTE
OE LA EROPIEDAIj is rd ^ 'S ^ n
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Ή HirTitncia .. d ° normalized for the optical path difference, adjusts the set of values represented in the graph
305
324 to obtain the amplitude V (z), represented as a solid line, of the modulation of the modulated instances of the probe light transmitted through the control sample 309, referenced as 376, as a function of the optical path difference of the interferometer . For example, the fit V (z) is obtained by interpolating the recorded finite set of values {V (-m<sub>m</sub>axúz), ..., ν (-2Δζ), ν (-Δζ), V (0), ν (+ Δζ), ν (+ 2Δζ), ..., V (+ mm<sub>ax</sub>Az)} for the differences in optical path z between [-m<sub>ma</sub>xúz, + rn<sub>ma</sub>xAz], and extrapolation of the values recorded for the differences in optical path z <mmaxAz yz> + m<sub>Tnax</sub>Az.
Computer system 305 can perform a Fourier transform on the obtained fit V (z) to generate a spectrum B (k) in the wave number domain (also referred to as the spatial frequency domain) for the probe light, with the wavelengths in the spectral measurement range [Á<sub>m</sub>in, Á<sub>m</sub>ax], transmitted through control sample 309. Figure 3G shows a graph 326 in which the generated spectrum B (k) is represented as a solid line only between a minimum wave number k<sub>m</sub>in
2π / λ, max maximum kmax
2n / Xmin corresponding corresponding maximum of the interval [Atnin, Ámax]. The generated spectrum is expressed as a function of the length of the spectrum S (λ; j) of light
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<img file="MX359196B_D0054.tif" />
to a limit ΙΤΓΪΉΙΐΐΐυ and spectral measurement
B (k) can also wave to obtain probe transmitted through formed layers
L (j) of the control sample
Additionally, computer system 305 can be used to obtain spectrum S (Á; j), in the wavelength range of Á<sub>m</sub>i<sub>n</sub> a Á<sub>m</sub>ax, together with Fresnel equations to propagate the probe light throughout the formed layers to determine the complex refractive indices and the thicknesses of each of the formed layers: n * 'yes, n *' si02, t ' (1), t '(2), ..., t' (jl), t '(j).
The in situ spectroscopies described above in connection with Figures 3A-3B use an interferometer that operates in a step analysis mode in combination with fixed detection to detect modulation of spectrally different instances 372 of probe light transmitted through a Witness sample.
In this case, modulation is imparted to the instances
372 of the probe light after the interferometer, but before the control sample 309.
Other ways of imparting modulation to the probe light are described below.
Pulse modulated emission of
INDUSTRIAL as interferometer input
Figure 4 shows a part of the optical path of the above spectrometer 304 in relation to the control sample 309. It should be noted that the part illustrated in Figure 4 represents a modified version of the corresponding part of Figure 3Ά. For example, the interrupting optical element 34 0 shown in Figure 3A is removed from the part of the optical path shown in Figure 4. Instead, the FO source produces probe light 3 71 modulated in the wavelength range of λπιίη Η λπΐΗχ. In some implementations, a modulation 345 is imparted to the probe light 371 by the energy pulse provided by the FO source to emit pulse modulated probe light 371. In other implementations, the probe light is emitted by the FO source continuously and is modulated internally, eg, with a shutter, to generate the 371 modulated probe light. As an alternative to the amplitude modulation of probe light 371 described above, modulation 345 may be a phase or frequency modulation. A time distribution of modulation 345 is used as a reference signal by fixed detection module 350, as described above in connection with Figures 3C-3D.
The modulated 371 probe light generated by the FO source is received by the interferometer.
<img file="MX359196B_D0055.tif" />
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The diviSK®®sT «de
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transmitting a first part of mod. probe-mon. 21 modulated and reflecting a second part of 371 modulated probe light. The first and second part of the modulated probe light impacting the beamsplitter 362 after propagation respectively along the fixed arm 363 and variable 365 of the interferometer have wavelengths spanning the measurement spectral range [Á<sub>m</sub>in, A<sub>m</sub>ax]. In addition, beam splitter 362 combines the first and second portions of the modulated probe light impacting beam splitter 362 into a combined modulated light 374 that includes a subset of the wavelengths of the measurement spectral range [X<sub>m</sub>in, Max] · Specifically, the modulated combined light 374 includes the wavelengths of the measurement spectral range [A<sub>m</sub>in, A<sub>m</sub>ax] that constructively interfere with a current optical path difference between the fixed 363 and variable 365 arms of the interferometer, and lacks the wavelengths of the measured spectral interval [Á<sub>m</sub>i<sub>n</sub>,TO<sub>m</sub>ax] that destructively interfere with the current optical pathway difference. The 374 modulated combined light represents (and is mentioned as) a modulated instance
374 of the probe light generated by the interferometer for the current optical path difference. In this way, a plurality of modulated instances 374 of the probe light can be provided corresponding to a plurality of differences from the separate analysis of the location of the second mirror 366 along the translation step 368.
Figures and 3C show that each modulated instance
74 The probe light is directed into the deposition chamber 301 through an inlet port associated with the spectrometer 304 (not shown in Figures 4 and 3C) to illuminate the control sample 309 held by the substrate 302, which is at rest in this example. Each modulated instance of the probe light transmitted through control sample 309, referenced as 376, is directed out of deposition chamber 301 through an output port associated with spectrometer 304 (not shown in Figures 4 and 3C) to be collected by the DO detector. All other aspects of the disclosed technologies described in connection with Figures 3C-3G can be applied in conjunction with the aspects described above in connection with the
Figure 4.
The in situ spectroscopies described above in connection with Figures 3Ά-3Β and 4 use fixed detection to detect a modulation of spectrally different instances 376 of probe light transmitted through a control sample. In this case, the spectrally different instances of probe light 374 are provided by the
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<td>use</td><td>FROM THE MOWEDAi? · of an interferometer that works on a tWd'0 '<sup>TO</sup>of ^ amrrísis</td>
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providing the spectrally different instances 374 of probe light.
(3.2) ICE manufacturing system equipped with a monochromator-based spectrometer in a step analysis mode in combination with fixed detection
On-site monitoring technologies of ICE manufacturing using the spectra of current instances of ICEs being manufactured are described below, so that the spectra are generated from the results of step analysis spectroscopy performed with a spectrometer based on a monochromator in combination with fixed detection.
Figure 5A shows an example of an ICE 500 manufacturing system. The ICE 500 manufacturing system includes a deposition chamber 301 for manufacturing one or more ICE 306, a 504 spectrometer for acquiring the spectra of the interacting probe light with the formed layers of the ICEs being manufactured, and a computer system 305 to control the manufacture of the ICEs based, at least in part, on the acquired spectra.
The deposition chamber 3 01 includes one or more deposition sources 303 to provide materials with a low complex refractive index n * t and a high complex refractive index n *<sub>H</sub> Used for the substrates on which the layers of Tós ~ ”TCE 3 06 are deposited are placed on a substrate support 3 02, such that the ICE 306 are within the field of view of the sources of deposition 303. The substrates have a thickness ts and a complex refractive index n * s specified by an objective ICE design 307 (for example, ICE design 145 or
245) .
A heat source 310 provides heat to the current instances of the ICE 306 distributed over the substrate support 302 to maintain their temperature within a target manufacturing temperature range ATfab around a target manufacturing temperature Tf<sub>to</sub>b. The computer system 305 accesses a process parameter 315 that includes the target build temperature Tfab and the target build temperature range ATfab and uses it to monitor the temperature of the current instances of ICE 306 during the build of the associated ICEs with the ICE 307 design.
As described above in connection with Figure 3A, the energy provided to the sources 303, their arrangement relative to one or more of the substrate supports 302, etc., are used to control the deposition rates R of the sources 303. The real complex refractive indices and the real thicknesses of the layers
IMPI.
INSTITUTO MEXiCArlC i _ DELA RKOPIEDAD 'can stop®nnKn.ars®-.LCow the deposition of the c example is interrupted, with 10% of the duration T (j) remaining, or when the deposition was completed at the end of the duration
T (j). The complex refractive indices and the thicknesses of the formed layers are determined almost in real time from the probe light that interacted with the formed layers L (l), ··· I
L (jl), L (j) acquired by the 504 spectrometer.
The spectrometer
504 includes one for emitting probe light that has a wavelength in the range of Á<sub>m</sub>in a
Amax, Y A monochromator to receive the probe light and to provide spectrally different instances of the probe light corresponding to various relative orientations of a wavelength selector and a monochromator output slot. In this case, the monochromator operates in a step analysis mode, so that each of the probe light instances is provided for a finite (non-zero) time interval. Since in this example the monochromator works in a step analysis mode, it will also be referred to as a step analysis monochromator (SSM). In addition, spectrometer 504 includes an interrupting optical element 340 to modulate the probe light instances during the finite time interval with 345 modulation.
<img file="MX359196B_D0057.tif" />
are provided through a port of—, ςρρ the spectrometer 504 in the deposition chamber 3 01 to illuminate a control sample 309. In this case, the control sample 309 is held on the substrate holder 302 together with the ICE 3 06 that are being formed in deposition chamber 301 so that control sample 309 experiences the same periodic motion with respect to deposition sources 303 as ICEs 306 during deposition. Spectrometer 504 can use layers formed from any one or more of the current instances of ICE 306 as a control sample to monitor deposition of ICE layer in deposition chamber 301. In the implementation example illustrated in Figure 5A, the substrate support 302, and therefore the control sample 309, is kept at rest while the spectrometer 504 acquires an S spectrum (A; j). Modulated instances of probe light transmitted through control sample 309 exit deposition chamber 301 through an output port associated with spectrometer 504.
In addition, the spectrometer 504 includes an optical detector (DO) to collect light leaving the deposition chamber through the exit port, where the collected light includes modulated instances of the probe light transmitted to
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<img file="MX359196B_D0058.tif" />
through core sample 309, and light emitted by various noise sources, for example, heat source 310 from deposition chamber 310 or elsewhere in the environment of the ICE 500 manufacturing system. The DO detector converts the light collected in a detector signal 512. Additionally, spectrometer 504 includes a fixed detection module 350 synchronized with modulation 345 induced by interrupting element 340 in the probe light instances to process detector signal 512. A fixed signal 515 from detection module Fixed 350 (also referred to as measurement signal 515) is proportional to a spectral amplitude of detector signal 512 at a frequency of modulation 345. In this way, the measurement signal 515 represents an average of the amplitudes of the probe light instances transmitted through the control sample 309 during at least a part of the finite time interval.
The computer system 305 uses a set of values of the measurement signal 515 corresponding to the different spectral instances of the probe light to generate a spectrum S (Á; j) of the probe light transmitted through the formed layers L ( l), ..., L (jl), L (j) of the control sample 309. The generated spectrum S (j; Á), in the wavelength interval between λπιίη and Amax, can be used by the computer system 305 to determine complex refractive indices and
IMP
MEXICAN INSTITUTE thicknesses of each
<img file="MX359196B_D0059.tif" />
<img file="MX359196B_D0060.tif" />
formed on the stack: n * 'si, n *' sio2, t '(l) t' (j). Computer system 305 makes this determination by solving Fresnel equations to propagate the interacting probe light through the layers formed in the stack.
Various components of the 504 spectrometer and their corresponding functions are now described in detail.
Figure 5B shows a part of the optical path of the above spectrometer 504 in relation to the control sample 309. It should be noted that the part illustrated in Figure 5B represents a corresponding part of Figure 5A. The FO source of spectrometer 504 produces probe light 370 in a measurement spectral range [Amin, Á<sub>m</sub>ax]. The monochromator includes a diffraction element 365 mounted in a rotation stage 369. The diffraction element 365, for example a grid, angularly separates the probe light 370 at its constituent wavelengths of λπιίη 3- Ámax · En In other implementations, another wavelength selector can be used to angularly separate the probe light 370 into its constituent wavelengths, such as a scattering element, eg, a prism. An output slot 367 (also referred to as an output port) is positioned in the path of the angled spaced probe light to allow a quasi part to pass
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<img file="MX359196B_D0061.tif" />
Monochromatic 572 of the angled spaced probe light and to block out the rest of the angled spaced probe light. The quasi-monochromatic part 572 of the angularly spaced probe light passing through the outlet slot 367 has wavelengths centered on a wavelength corresponding to a relative angular orientation ΔΘ between the diffraction element 365 and the outlet slot 3 67, and a narrow wavelength range Δλ, for example, 5, 10, or 20 nm in the visible range, or 1, 2, or 5 μ in the IR range. Furthermore, the quasi-monochromatic portion 572 of the angularly spaced probe light passing through the output slot 367 represents (and is referred to as) a probe light instance 370 generated by the monochromator for the current relative angular orientation ΔΘ between the diffraction element 365 and the outlet slot 367.
In this way, a plurality of spectrally different instances 572 of the probe light corresponding to a plurality of relative angular orientations between the diffraction element 365 and the outlet groove 367 can be provided by separate analysis throughout the rotation stage. 369 of the relative angle ΔΘ between the diffraction element 365 and the outlet groove 367. When the relative angle is Δθ = 0, an instance 572-0 of the probe light that has a center of wavelength λο is is + ΔΘ (or diffraction
365 rotates an angular increment + ΔΘ relative to the output slot 367), the monochromator provides a first instance 572-1 of the probe light having a center of wavelength λι different from λο. When the relative angle is + 2ΔΘ (or equivalently, when the diffraction element 365 rotates a distance + 2ΔΘ relative to the exit slot 367), the monochromator provides a second instance 572-2 of the probe light that has a center of wavelength Á2 different from λο and λι. Successively, the monochromator provides other 572-m instances of the probe light that are spectrally different from each other for corresponding relative angles of + ιηΔθ, where m = 0, ± 1 ,, ± m<sub>ma</sub>x.
Each instance 572 of the probe light provided by the monochromator is modulated with the interrupting optical element 340. The interrupting optical element 340 imparts 345 modulation to each instance 572 of the probe light and generates a modulated instance 574 of the probe light. A time distribution of modulation 345 is used as a reference signal by fixed detection module 350, as described in more detail below.
Figures 5B and 3C show that each modulated instance 574 of the probe light is directed into the deposition chamber 3 01
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input associated with spectrometer 504 (not shown in Figures 5B and 3C) to illuminate control sample 309 held by substrate support 302, which is at rest in this example. Each modulated instance of probe light transmitted through control sample 309, referenced as 576, is directed out of deposition chamber 301 through an output port associated with spectrometer 504 (not shown in Figures 5B and 3C) to be collected by the DO detector.
Referring again to Figure 3C, which shows an optical path of the posterior spectrometer 504 relative to control sample 309, it should be noted that the part illustrated in Figure 3C represents a corresponding part of Figure 5A. In addition to the modulated instance of probe light transmitted through control sample 309, referenced as 576, the DO detector collects light 382, 384, or 386 emitted by noise sources within the deposition chamber (for example, the sources heat pump 310 described above) or elsewhere within the ICE 500 manufacturing system environment.
The collected light modulated 576 and the light in detector signal by the DO detector, noise 382, 384 and
512. Module including light
386, becomes detection 350 is referenced by a temporal distribution of modulation
<img file="MX359196B_D0064.tif" />
IMPI
5 and receives as input the INDUSTRIAL det signal current relative orientation τηΔΘ between the diffraction element 365 and the output slot 367, where m is one of 0, ± 1, +2, ..., ± m<sub>max</sub>, the variation in intensity of detector signal 512 may include modulation 345 of the modulated instance of probe light transmitted through core sample 309, referenced as 576, and changes in intensity of noise light 382, 384 or 386. Furthermore, at the current relative orientation τηΔθ between the diffraction element 365 and the output slot 367, the amplitude of modulation 345 of the modulated instance of probe light transmitted through core sample 309, referenced as 576, is constant for a constant emission of light from probe 370 through the FO source. As such, the fixed signal 515 (also referred to as measurement signal 515) is proportional to a spectral amplitude of detector signal 512 at a frequency of reference signal 345. Thus, measurement signal 515 represents an average during multiple modulation periods of the intensity of the modulated instance of probe light transmitted through control sample 309, referenced as 576.
Figure 3D shows a graph 320 illustrating an example of a fixed detection module reference signal 350 corresponding to modulation 345 imparted by interrupting element 340 to each instance 572 of light
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probe. Figure 3E shows a graph 52 ^} $ ^ iiáESÉCar * the detector signal 512 for a finino time interval— during which the relative orientation ιηΔθ between the diffraction element 365 and the outlet slot 367 is kept constant, where m is one of 0, +1, ± 2, ..., ± m<sub>max</sub>. Although a noise input level of 3 82, 3 84, or 3 86 decreases before you, it remains constant at a low level between you and t2, and jumps to a higher level after t2, the amplitude of the modulation of the Modulated instance of the probe light transmitted through control sample 309, referenced as 576, remains relatively constant throughout the entire time interval 0-t3 during which the light is collected by the DO detector, for the current relative orientation mAO between the diffraction element 365 and the output slot 367. As such, the measurement signal ν (πιΔθ) 515 for the current relative orientation τηΔθ between the diffraction element 365 and the output slot 367, which is proportional to the amplitude of the spectral component of the detector signal 512 at the modulation frequency 345, is approximately constant during the 0-t3 measurement time interval.
To obtain a new measurement signal ν ((πι + 1) Δθ) 515 for a posterior relative orientation (τη + 1) Δθ between the diffraction element 365 and the outlet slot 367, the diffraction element 365 of the monochromator is made rotate in
<img file="MX359196B_D0065.tif" />
IMPI
MEXICAN INSTITUTE OF INDUSTRIAL PROPERTY the stage of rotation 369 to a posterior relative angular orientation (τη + 1) ΔΘ to change the relative orientation between the diffraction element 365 and the outlet groove 367 a distance ΔΘ in relation to the previous relative orientation πιΔθ held during the previous measurement point. The new relative orientation (m + l) A0 corresponds to a new instance 572 of the probe light generated by the monochromator that is spectrally different from the instance used to take the previous measurement point. The new instance 572 of the probe light is modulated with the interrupting element 340 to obtain the new modulated instance 574 of the probe light that illuminates the control sample 309 during the finite measurement time interval, for example 0-ti .
The new modulated instance of the probe light transmitted through control sample 309, referenced as 576, is collected with the DO detector, along with noise light 382, 384, or 3 86, and converted to a new signal of detector 512 corresponding to the new relative orientation (πι + 1) Δθ between the diffraction element 365 and the outlet slot 367. The new measurement signal ν ((τη + 1) ΔΘ) 515 for the current relative orientation (πι + 1) ΔΘ between the diffraction element 365 and the output slot 367 is the output of the fixed detection module 350, referenced by the temporal distribution of modulation 345 shown in Figure 3D, and is proportional to the amplitude of the spectral component of the
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INSTITUTE ΜΕΧΚΛΝΓ
DE LA EHOKIEDA'T detector signal 512
UL LA rnvrltL / A '' at the frequency of n ^ dÜl ^ c 10 ^ - 3 ^ 5 during the measurement time interval'U'-tá ......
Using the above step analysis mode, the computer system 305 records a set of values {V (e<sub>m</sub>in), · .., ν (-2ΔΘ), ν (-ΔΘ), V (0), ν (+ Δθ), V (+ 2ΔΘ), ...,
V (9max)} of the fixed signal 515 generated by the spectrometer 304 to represent amplitudes of the modulation of the modulated instances of the probe light transmitted through the control sample 309, referenced as 576, for the corresponding relative orientations {9<sub>m</sub>in, ..., -2ΔΘ, -ΔΘ, 0, + ΔΘ, + 2ΔΘ, ..., -i-Qmax} between the diffraction element 365 and the outlet slot 367. Figure 5C shows a graph 524 in which a set of registered values {v (9<sub>m</sub>i<sub>n</sub>), ..., V (2ΔΘ), ν (-ΔΘ), V (0), ν (+ Δθ), ν (+ 2Δθ), ..., V (9<sub>ma</sub>x)} is represented as filled circles as a function of the relative orientation between the diffraction element 365 and the outlet groove 367 (by using standard units for relative orientation, Θ / ΔΘ.) The computer system 305 adjusts the set of values represented in graph 524 to obtain the amplitude V (9), represented as a solid line, of the modulation of the modulated instances of the probe light transmitted through the control sample 309, referenced as 576, depending on the relative orientation between the diffraction element 365 and the outlet groove 367. For example, the adjustment V (9) is obtained by interpolation of the finite set
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OF REGISTERED INDUSTRIAL PROPERTY
<img file="MX359196B_D0066.tif" />
{V (Qmin), ..., ν (-2ΔΘ), ν (-ΔΘ), V (0), ν (+ ΔΘ), \ Γ ('+ 2Δ9) 7
V (9max)} for the relative orientation between [0<sub>m</sub>in, Qmaxl, and the extrapolation of the values recorded for the relative orientations Θ <© min, and Θ> Qmax ·
The computer system 305 can correlate angles of the angular interval [Qmin, © maxl of the described step analysis with wavelengths of the measurement spectral interval [Amin, A<sub>ma</sub>x], and apply scale, normalize, etc., as appropriate, the adjustment ν (θ) obtained to generate a spectrum S (A; j) of probe light through the formed layers L (l), ... , L (j) of control sample 309. Figure 5D shows a graph 526 in which the generated spectrum S (A; j) is represented with a solid line in the measurement spectral interval [A<sub>m</sub>in, Amax]. As mentioned above, computer system 305 can be used to generate the spectrum S (A; j), illustrated in Figure 5D, along with Fresnel equations to spread the probe light across the formed layers to determine the indices. of refraction complexes and the thickness of each of the layers formed: n * 'si, n *' sio2, t '(l), t' (2), t '(jl), t' (j).
The in si tu spectroscopies described above in connection with Figures 5A-5B use a monochromator that operates in a step analysis mode in combination with fixed detection to detect modulation of spectrally different instances 576 from a control sample, is imparted to the instances
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In this · Βαο &, - Ίθ 'modulooiém ^ »
572 of the probe light after the monochromator, but before the control sample
309. Other ways of imparting modulation to the probe light are described below.
Pulse modulated emission of probe light used as input to the monochromator
Figure 6 shows a part of the optical path of the above 504 spectrometer in relation to the control sample 3 09. It should be noted that the part illustrated in Figure 6 represents a modified version of the corresponding part of Figure 5A. For example, the interrupting optical element 340 shown in Figure 5A is removed from the portion of the optical path shown in Figure 6. Instead, source FO produces the probe light 371 modulated in the Atnin to Amax wavelength range · A temporal distribution of modulation 345 is used as a reference signal by the fixed detection module 350, as described above in connection with
Figures 3C-3D.
The modulated probe light 371 generated by the FO source is received by the monochromator. Diffraction element 365 angularly separates probe light 371 at its constituent wavelengths from Amin to Á<sub>max</sub>, and the
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MEXICAN INSTITUTE INDUSTR OF INDUSTRIAL PROPERTY outlet slot 367 passes only the quasi-monochromatic modulated part 574 of the angled spaced probe light into the current relative orientation ΔΘ between the diffraction element 365 and outlet slot 367. The quasi-monochromatic modulated portion 574 of the angularly spaced probe light passing through outlet slot 367 represents (and is referred to as) a modulated instance 574 of probe light generated by the monochromator for the current relative orientation ΔΘ between the diffraction element 365 and outlet slot 367.
In this way.
A plurality of modulated instances 574 of the probe light corresponding to a plurality of relative angular orientations between the diffraction element 365 and the outlet groove 367 may be provided by separate analysis of the angular coordinate of the diffraction element 365 thereto.
<td>length of</td><td>The phase</td><td>of</td><td>rotation</td><td> 369 .</td><td></td><td></td>
<td>The</td><td>Figures</td><td> 6</td><td colspan="2">and 3C show</td><td>that each</td><td>instance</td>
<td>modulated</td><td>574 of</td><td>the</td><td>light of</td><td>probe</td><td>it is directed</td><td>to him</td>
inside deposition chamber 301 through an inlet port associated with spectrometer 504 (not shown in Figures 6 and 3C) to illuminate core sample 309 held by substrate holder 302, which is at rest in this example. Each modulated instance of the probe light transmitted through control sample 309, referenced outside deposition chamber 3 I heard through.
of an output port associated with the 504 spectrometer (not shown in Figures 6 and 3C) to be collected by the DO detector. All other aspects of the disclosed technologies described in connection with Figures 3C-3D and 5C-5D can be applied in conjunction with the aspects described above in connection with the
Figure 6.
The in situ spectroscopies described above in connection with Figures 3A-3B, 4, 5A-5B, 6, 3C-3E and
5C-5D use an interferometer or monochromator, where both operate in a step analysis mode in combination with fixed detection to detect 345 modulation of 376 or 576 spectrally different instances of probe light transmitted through a control sample. In this case, modulated probe light 371 is emitted by the FO source or modulation 345 is imparted to instances 372 or 572 of the probe light after the interferometer or monochromator, but before the control sample 309. More are described. Other ways of imparting modulation to spectrally different instances 272 of probe light transmitted through control sample 309 and to detect modulation imparted differently are ahead.
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<img file="MX359196B_D0069.tif" />
(3.3) ICE manufacturing system equipped with an interferometer-based spectrometer in a step analysis mode in combination with time-restricted detection
On-site monitoring technologies of ICE manufacturing using the spectra of current instances of ICEs being manufactured are described below, so that the spectra are generated from the results of step analysis spectroscopy performed with an interferometer-based spectrometer in combination with time-restricted detection.
Figure 7A shows an example of an ICE 700 manufacturing system. The ICE 700 manufacturing system includes a deposition chamber 301 for manufacturing one or more ICE 306, a spectrometer 304 for acquiring the spectra of the interacting probe light with the layers formed of the
ICE while manufactured, and a 305 computer system to monitor the manufacture of ICEs based, at least in part, on purchased spectra.
The deposition chamber 301 includes one or more deposition sources 303 to provide materials with a low complex refractive index n * L and a high complex refractive index n * n used for the ICE 3 06 layers. The substrates on which ICE layers are deposited
306 they are placed on a substrate support 302 in such a way
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INDUSTRIAL - = i -----— that the ICE 306 are within the field of view of the deposition sources 303. The substrates have a thickness ts and a complex refractive index n * s specified by the objective ICE 307 design A relative orientation and spacing between deposition sources 303 and substrate support 302 are configured to provide desired deposition rates and spatial uniformity through ICE 306s arranged in substrate support 3 02. Since a spatial distribution of a deposition column provided by the deposition sources 303 is not uniform along at least a first direction, the substrate support 302 periodically moves with respect to the deposition sources 3 03 along from the first address (for example, rotates along an azimuth direction φ about a laterally offset axis of the deposition sources 303 passing through the center of the support substrate 302) to obtain a reproducibly uniform layer deposition of the ICE 3 06 of a lot.
A heat source 310 provides heat to the current instances of the ICE 306 distributed over the substrate support 302 to maintain their temperature within a target manufacturing temperature range ATfab around a target manufacturing temperature Tfab - Computer system 305 accesses to a process parameter 315 r ..- ·> + ·
IΜ PI
MEXICAN INSTITUTE I ·.
DELA FROPIEDAlj 'CV- V í' INDUSTRIAL which includes the target manufacturing temperature Tfab and target manufacturing temperature range ÓTfab and uses it to monitor the temperature of current instances of ICE 3 06 during the manufacturing of ICEs associated with the ICE 307 design.
As described above in connection with Figures 3A and 5A, the energy provided to the deposition sources 303, their arrangement relative to one or more of the substrate supports 302, etc., are used to control the deposition rates R from sources 303. The real complex refractive indices and the real thicknesses of the deposited layers L (l), ..., L (jl), L (j) can be determined when the deposition of the current layer L (j) is interrupted, for example , with 10% remaining of the duration T (j), or when the deposition was completed at the end of the duration T (j). The complex refractive indices and thicknesses of the layers formed are determined almost in real time from the S (Á; j) spectra of the probe light that interacted with the formed layers L (l), ..., L (jl), L (j) acquired by spectrometer 304.
Spectrometer 304 includes an optical source (FO) to emit probe light that has a wavelength in the range of Á<sub>m</sub>in a Á<sub>ma</sub>x, y an interferometer to receive the probe light and to provide spectrally different instances of the probe light corresponding to various
<img file="MX359196B_D0070.tif" />
Ut LA PKUHhDAD i ✓ - and optical path differences of the interferometer. <sup>l</sup>'T ^ ™ fest'<sup>!</sup>ft<sup>or</sup>l £ 5éHSo, the inter-erometer operates in a dtfaná 1 i & ia per ·· mode so that each of the probe light instances is provided for a finite (non-zero) time interval. Thus, the 03 04 spectrometer provides unmodulated instances of the probe light through an input port associated with the spectrometer 304 in the deposition chamber 301 to illuminate a control sample 309. In this case, the control sample 309 is held on the substrate support 302 together with the ICE 306 that are being formed in the deposition chamber 3 01, so that the control sample 309 experiences the same periodic movement with respect to the sources Deposition 303 than ICE 306 during deposition. In the implementation example illustrated in Figure 7A, the periodic movement of the substrate support 302, and thus the control sample 309, is held while the spectrometer 304 acquires an S spectrum (Á; j). Additionally in this example, at least one opening 325 is provided in the support substrate 302, separate from the control sample 309. In the example illustrated in Figure 7A, opening 325 is the same size as core sample 309 and is arranged at 12 o'clock on stage 302, while core sample 309 is arranged at 6 o'clock on stage 302, in the same radius as opening 325. In this way, a
<img file="MX359196B_D0071.tif" />
current instance of
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- - <sub>n</sub> - INDUSTRIAL —..--- the probe light provided by spectrometer 304 in deposition chamber 301 alternately illuminates opening 325 and control sample 309.
As such, modulation is imparted to the current instance of the probe light that propagates to a position posterior to the substrate support.
302. The temporal distribution of the modulation is based on the periodic movement of opening 325 and core sample 309, and the amplitude of modulation of the current instance of probe light transmitted through core sample 309. Each of the instances of the probe light that passed through aperture 325 and was alternately transmitted through control sample 309 exits deposition chamber 301 through an output port associated with spectrometer 304 .
In addition, spectrometer 304 includes an optical detector (DO) to collect light that leaves the deposition chamber through the exit port. The collected light includes the current instance of the probe light that alternately passed through opening 325 and was transmitted through core 309, and light emitted by various noise sources, for example the source of heat 310 from deposition chamber 310 or elsewhere in the environment of the ICE 700 manufacturing system. The DO detector converts the collected light to a detector signal 712.
Additionally, Spectrometer 304 includes a detection module restricted by
<img file="MX359196B_D0072.tif" />
INSTITUTO MF.X times * ^ the temporal distribution of the mnvi nri at t-.n pat-i ah opening 325 and the control sample 309, to control (or limit) the detector signal 712. For example, the restricted detection module Time 760 limits detector signal 712 to parts of the period of periodic movement of aperture 325 and core sample 309 when the current instance of the probe light alternately illuminates gap 325 in motion and core sample 309 in motion . The temporal distribution of the periodic movement of the opening 325 and the control sample 309 used by the time-restricted detection module 760 to time-restrict the detection signal 712 is a function of at least the following parameters: a quantity K 2 1 of pairs of opening 325 and control sample 309 on substrate support 302 (in Figure 7A, K = 1), a period To in which substrate support 3 02 moves relative to deposition sources 303, a size of aperture 325 and core sample 309, and a radius of substrate supports 302 where aperture 325 and core sample 309 are located.
Once the detector signal 712 is time restricted by the time restricted detection module 760 according to the interval of periodic movement of the opening 325 and the control sample 309, the
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. . ,, PROPERTY time-restricted detector signal is pBMS ^ se'saaa -'- by time-restricted detection module 760 'to generate a measurement signal 715. Processing of the time constrained detector signal includes performing one or more sampling and holding between consecutive time constraints, finding peaks during each time constraint, adjusting the signal peaks found when the probe light instances illuminate the aperture 325 to get a first surround signal, and adjusting the other signal peaks found when the probe light instances illuminate control sample 309 to obtain a second enveloping signal, and the like. For an individual opening pair 325 and core sample 309 (K = 1), the above adjustments are made for a number of periods of periodic movement, for example, for 5 periods. For a quantity K> 2 opening pairs 325 and core sample 309 (not shown in Figure 7A), adjustments are made for the K pairs during a single period of periodic motion. In either of the above cases, the measurement signal 715 generated by the time constrained detection module 760 is proportional to the amplitude of the modulation of the current instance of the probe light collected by the DO detector. In this way, the measurement signal 715 represents the attenuation of the current instance of the probe light due to transmission through control sample 309.
IMPI
<img file="MX359196B_D0073.tif" />
The computer system
305 uses
INSTITUTO MEXíCANCDE LA PROPIEDAD
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of the measurement signal 715 corresponding to the different spectral instances of the probe light to generate a spectrum S (Á; j) of the probe light transmitted through the layers formed L (l), L (jl), L (j) of control sample 309. The generated spectrum S (j; Á), in the wavelength interval between Amin and Ámax / can be used by the computer system 305 to determine the complex refractive indices and the thickness of each one of the layers formed in the stack: n * 'yes, n *' sío2, t '(l), t' (2), ..., t '(jl), t' (j). Computer system 305 makes this determination by solving Fresnel equations to propagate the interacting probe light through the layers formed in the stack.
Various components of Spectrometer 304 and their corresponding functions are now described in detail.
Figure 7B shows a part of the optical path of the above spectrometer 304 in relation to the control sample
309. It should be noted that the part illustrated in Figure 7B represents a corresponding part of Figure 7A. The FO source and the interferometer of the 3 04 spectrometer have been described in detail in connection with Figures 3A-3B and 4. A plurality of 372-m spectrally different instances of the probe light can be provided corresponding to a plurality of various differences in the optical path + mAz of the interface,<sup>C</sup> ~ INDUSTRIAL mirror 366 throughout translation stage 368. The
Figures 7B and 7C show that each instance 372 of the probe light is directed into the deposition chamber.
301 through an input port associated with the spectrometer 304 (not shown in Figures 7B-7C) to alternately illuminate the control sample 309 held by the support of this modality, the periodically (by substrate 302 support ex.
<td>and the</td><td>opening</td><td> 325</td><td>from e</td>
<td>of</td><td>substratum</td><td> 302</td><td>I know</td>
<td>tour</td><td>around</td><td>of</td><td>a</td>
moves axis to it. Through the center so that each instance 3 72 of the substrate light alternately illuminates core sample 309 and aperture 325 based on a temporal distribution 765.
The temporal distribution
765 it is used as a time constraint by the time constrained detection module 760, as described in more detail below.
In this way, a modulation, which has a temporal distribution
765 and an amplitude representing the attenuation of each instance 372 of the probe light transmitted through control sample 309, is imparted to instance 3 72 of the probe light that propagates in a posterior position relative to the support of substrate 302 to form a modulated 776 instance of the probe light. Each modulated 776 instance of the probe light is
IMPI
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OF THE FROPIEDAL ·
INDUSTRIAL directs towards the outside of the chamber
<img file="MX359196B_D0075.tif" />
deposition 301
-. . - * .- &. · »» »Through an output port associated with the spectrometer
304 (not shown in Figures 7B-7C) to be collected by DO detector.
Figure 7C shows an optical path of the spectrometer
304 posterior relative to control sample 309. It should be noted that the part illustrated in Figure 7C represents a corresponding part of Figure 7A. In addition to the modulated instance 776 of the probe light, the DO detector collects light 382, 384, or 386 emitted by noise sources within the deposition chamber (for example, heat sources
310 described above) or elsewhere within the ICE 700 manufacturing system environment, as described above in connection with Figures 3C and 5C. The light collected by the DO detector, including modulated light 776 and noise light 382, 384, and 386, is converted to detector signal 712. Thus, the detector signal 712 includes a modulation having the time distribution 765 and an amplitude proportional to the attenuation of the instance 776 of the probe light transmitted through the control sample 309.
The time restricted detection module 760 is temporarily restricted based on the temporal distribution 765 of the periodic movement of the control sample 309 and the opening 325, and receives as input the detector signal 712.
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For a current optical path difference τπΔζ, where m is one of 0, ± 1, ± 2, ± m<sub>m</sub>ax, the intensity variation of the detector signal 712 may include the temporal distribution modulation 765 of the modulated instance 776 of the probe light, and the intensity changes of the noise light 382, 384 or 386. One is selected. frequency of the temporal distribution 765 to be different from the frequencies and tones at which changes in noise light intensity 382, 384 and 386 may occur. Additionally, a time constraint is chosen to be much less (eg, less than 10%) than a time scale during which changes in noise light intensity 382, 384, and 386 can occur. The frequency of the temporal distribution 765 may be on the order of 0.1Hz, 1Hz, or 10Hz, for example. Furthermore, for the current optical path difference, the amplitude of the modulation of the modulated instance 77 6 of the probe light is constant for a constant emission of probe light 370 by the FO source. As such, the output signal 715 of the time-restricted detection module 760 (also referred to as the measurement signal 715) is a value of the amplitude of the modulation of the detection signal 712 having the time distribution 765. In some implementations, the measurement signal 715, for the actual optical path difference more than the interferometer, represents an average over multiple periods of
IMP
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<img file="MX359196B_D0078.tif" />
modulation of the implementations of the current modulated instance 776 of the probe light collected by the DO detector.
Figure 7D shows a graph 722 illustrating an example of a lighting timing distribution 765 of core 309 and aperture 325. As described above, lighting timing distribution 765 is used as a time constraint (the latter also referenced as 765) by time constrained detection module 760. In this case, time constraint 765 is a train of K 1 pairs of on / off pulses. A period To of time constraint 765 represents a time interval between two consecutive illuminations of control sample 309. Period T<sub>or</sub> it can be of the order of 0.1 s, 1 s or 10 s, for example. A width Tg of the pulses of time constraint 765 is not greater than a time during which probe instance 372 illuminates core 309 or opening 325. A value of width T<sub>G</sub> of of time constraint 765 is a fraction of a value of period To of time constraint 765, for example, 20% or 10% of To. In this example (K = 1), time constraint 765 has a pulse pair of width T<sub>G</sub> during a period T<sub>or</sub>: one pulse corresponds to a part of To when the current instance of the probe light is transmitted through control sample 309, and the other pulse corresponds to another part of T<sub>or</sub> when the current instance of the probe light passes through opening 325.
IMPI;
<img file="MX359196B_D0079.tif" />
The
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Figure 7E shows a graph 724 illustrating detector signal 712 for a finite time interval 0-t3 (also referred to as the measurement time) during which the optical path difference maz of the interferometer is kept constant, where m is one 0, ± 1, +2, ..., + m<sub>ma</sub>x.
It should be noted that the detector signal 712 (represented as a solid line) is limited to parts of the To period when time constraint 765 is open or, equivalently, when the current instance of the probe light is transmitted through the core 309 or pass through opening 325. In this example, the time constrained detection module 760 uses sample and hold periods for parts of the To period when time constraint 765 is closed. Detector signal 712 that corresponds to the sampling and holding values is represented by a dotted line. Additionally, time-restricted detection module 760 determines a maximum of detector signal 712 for each of the pulses corresponding to the times when the current instance of the probe light passes through aperture 325 and for each one of the pulses corresponding to the moments where the current instance of the probe light is transmitted through the control sample 309. A first envelope 726 (represented as a dotted line) generated by the module
100 time-restricted detection
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set of the maxima of the detector signal 712 corresponding to the moments where the current instance of the probe light passes through the opening 325. A second envelope 728 (represented as a dotted line) generated by the detection module constrained by Time 760 adjusts a second set of detector signal maxima 712 corresponding to the moments where the current instance of the probe light is transmitted through core sample 309.
The measurement signal 715 generated by the time-restricted detection module 760, for the current optical path difference mAz of the interferometer, is the amplitude of the modulation of the detector signal 712 determined as the difference between the first 726 and the second 728 envelope.
Therefore, the measurement signal 715 is a measurement of the modulation amplitude having the time distribution 765 of the current modulated instance of the probe light collected by the DO detector. Although in the example illustrated in Figure 7E a noise light input level 382, 384 or 386 remains around a first level before you, decreases to a second lower level between you and t2, and increases to a different third level after t2, the amplitude of modulation of the current modulated instance of the probe light collected by the DO detector remains relatively constant
101 during the entire interval
INSTITUTO MEXICANA 'medie ^ <«® 3 as opposed to the current optical path τηΔζ of the inter-erometer. —As such, the measurement signal ν (τηΔζ) 715 for the current optical path difference ιηΔζ of the inter-erometer, which is proportional to the amplitude of the modulation of the detector signal 712 is approximately constant during the measurement time interval 0-t3.
To obtain a new measurement signal V ((m + l) Az)
715 For a posterior optical path difference (τη + 1) Δζ of the interferometer, the second mirror 366 of the interferometer is translated in the translation stage 368 to a posterior location zo + (m + l) Az to change the difference of the optical path of the interferometer a quantity Δζ in relation to the difference of previous optical path πιΔζ that was maintained during the previous measurement point. The new optical path difference (m + l) Az corresponds to a new instance 372 of the probe light generated by the interferometer that is spectrally different from the instance used to take the previous measurement point. The new probe light instance 372 alternately passes through opening 325 and through control sample 309 and forms a new modulated probe light instance 776, which has a modulation having the same time distribution 765 but a different amplitude in relation to the modulation of the modulated instance used to take the
102 previous measurement point.
How
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Modulated 776 probe light is collected with the detector
DO, together with noise light 382,
384 or 386, and it becomes a new detector signal 712 corresponding to the new optical path difference (m + 1) Δζ of the interferometer. The new measurement signal V ((m + l) ñz)
715 for the current optical path difference (m + l) ñz of the interferometer is the output of the time-restricted detection module 760, temporarily restricted by time restriction 765 shown in Figure 7D, and is proportional to the amplitude of the modulation of the detector signal 712 during the measurement time interval 0-t3.
Using the previous step analysis mode, the
<td colspan="3">computer system 305</td><td>records a</td><td>set of</td><td colspan="2">values</td>
<td>{V (- ΓΠπιβχΔ Z), ...,</td><td>V (-</td><td>2Δζ),</td><td>ν (-Δζ), V (0),</td><td colspan="2">ν (+ Δζ), ν (+ 2Δζ),</td><td> ··· 1</td>
<td>V (+ rn<sub>m</sub>axAz)} of</td><td>the</td><td>signal</td><td>measurement</td><td>715 generated</td><td>by</td><td>the</td>
<td>spectrometer</td><td> 304</td><td>for</td><td>represent</td><td>amplitudes</td><td>of</td><td>the</td>
<td>modulation of</td><td>the</td><td colspan="3">776-m modulated instances of the</td><td>light</td><td>of</td>
<td>collected probe</td><td>by</td><td colspan="4">the DO detector, for the differences</td><td>of</td>
corresponding optical path {-rnmaxñz, ..., -2Δζ, -Δζ, 0, + Δζ, + 2Δζ, ..., + m<sub>m</sub>axAz} of the interface. Figure 3F shows a graph 324 in which the recorded set of values {v (mñz), m = 0, +1, +2, ..., ± m<sub>ma</sub>x} is represented as unfilled circles based on the track difference
103 Optical MPGglgl (using units the optical path difference, ζ / Δζ.) The computer system 305 adjusts the set of values represented in graph 324 to obtain the amplitude V (z), represented as a
<td>continuous line,</td><td>of</td><td>modulation of</td><td>the</td><td>instances</td>
<td>modulated 776de</td><td>the 1</td><td>pickup probe uz</td><td>by</td><td>the detector</td>
<td>DO, depending</td><td>of</td><td>The difference of</td><td>via</td><td>optics</td>
<td>interferometer.</td><td>By</td><td>example setting</td><td>V (z)</td><td>is obtained</td>
by interpolating the recorded finite set of values {V (-γΠπιηχΔζ), ..., ν (-2Δζ), ν (-Δζ), V (0), ν (+ Δζ), ν (+ 2Δζ),. .., V (+ m<sub>ma</sub>xAz)} for the optical path differences between [-m<sub>max</sub>Az, + m<sub>m</sub>axAz], and the extrapolation of the values recorded for the differences in the optical path z <-rrimaxAz yz> + m<sub>ma</sub>xóz.
The computer system 305 can perform a Fourier transform at the fit V (z) obtained to generate, in space k (where k is the wave number), a spectrum B (k) for the probe light, with the lengths waveform in the spectral measurement range [Á<sub>m</sub>in, Á<sub>m</sub>ax], transmitted through control sample 309. Figure 3G shows a graph 326 in which the generated spectrum B (k) is represented as a solid line only between a minimum wave number k<sub>m</sub>in = 2n / Á<sub>ma</sub>x and a maximum wave number k<sub>m</sub>ax = 2n / Á<sub>m</sub>ín corresponding to a corresponding minimum and maximum limit of the spectral measurement range
104 [Atnin, 7kmax] ·
The generated spectrum
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B (^^ M'toi ^ YES ^ can be expressed as a function of wavelength for ..... oh ^ -erua / r the spectrum S (Á; j) of the probe light transmitted through the layers formed L (l),
L (j) of the control sample
Additionally, computer system 305 can be used to obtain spectrum S (Á; j), in the wavelength range of Á<sub>m</sub>in a Á<sub>ma</sub>x, together with Fresnel equations to propagate the probe light throughout the formed layers to determine the complex refractive indices and the thicknesses of each of the formed layers: n * 'si, n *'<sub>S</sub>i02, t '(l), t' (2), t '(jl), t' (j).
The in situ spectroscopies described above in connection with Figures 7A-7B use time-restricted detection to measure the amplitudes of modulation imparted to spectrally different instances 372 of the probe light, so that, for each instance of the probe light , modulation is imparted by alternately passing the probe light instance through opening 325 or through control sample 309. In this case, the spectrally different instances
372 Probe light is provided through the use of an interferometer that operates in a step analysis mode. Other ways to provide the spectrally different instances are described below.
372
105 probe light.
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MEXICAN INSTITUTE OF INDUSTRIAL PROPERTY
<img file="MX359196B_D0082.tif" />
(3.4) ICE manufacturing system equipped with a monochromator-based spectrometer in a step analysis mode in combination with time-restricted detection
On-site monitoring technologies of ICE manufacturing using the spectra of current instances of the ICE being manufactured are described below, so that the spectra are generated from the results of the step analysis spectroscopy performed with a monochromator-based spectrometer in combination with time-restricted detection.
Figure 8A shows an example of an ICE 800 manufacturing system. The ICE 800 manufacturing system includes a deposition chamber 301 for manufacturing one or more ICE 306, a 504 spectrometer for acquiring the spectra of the interacting probe light with the formed layers of the ICEs being manufactured, and a computer system 305 to control the manufacture of the ICEs based, at least in part, on the acquired spectra.
The deposition chamber 3 01 includes one or more deposition sources 303 to provide materials with a low complex refractive index n * L and a high complex refractive index n *<sub>H</sub> Used for ICE 306 layers. The substrates on which the ICE layers are deposited
106
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that ICE 3 06s are within range viiiwal · .da., the sources of deposition 303. The substrates have a thickness ts and a complex refractive index n * s specified by an objective ICE design 307 (for example, ICE 145 design or
245). Substrate support 302 periodically moves relative to deposition sources 303 (eg, rotates along an azimuth direction φ about an axis
<td colspan="3">laterally offset from</td><td>the</td><td>sources</td><td>of</td><td colspan="2">deposition 303 which</td>
<td>pass to</td><td>through</td><td>from the center</td><td>of the</td><td>substratum</td><td>of</td><td>support 302)</td><td>for</td>
<td>obtain</td><td>a</td><td>deposition</td><td>of</td><td>layers</td><td colspan="2">uniform of</td><td>shape</td>
reproducible from ICE 306s in a batch. A heat source 310 provides heat to the current instances of the ICE 306 distributed over the substrate support 302 to maintain their temperature within a target manufacturing temperature range ATfab around a target manufacturing temperature Tfab. The computer system 305 accesses a process parameter 315 that includes the target build temperature Tfab and the target build temperature range áTfab and uses it to monitor the temperature of the current instances of ICE 3 06 during the build of the ICEs associated with the design of ICE 307.
As described above in connection with the
Figure 5A, the energy provided to sources 303, their
107 provision regarding
INSTITUTO MEXICANO to one or more of the substrate 302, etc., are used to control the deposition rates R of the sources 303. The real complex refractive indices and the real thickness of the deposited layers L (l), ... , L (jl), L (j) can be determined when the deposition of the current layer L (j) is interrupted, for example with the remaining 10% of the duration T (j), or when the deposition was completed at the end of the duration T (j). The complex refractive indices and thicknesses of the layers formed are determined almost in real time from the S (Á; j) spectra of the probe light that interacted with the formed layers L (l), ..., L (jl), L (j) acquired by the 504 spectrometer.
Spectrometer 504 includes an optical source (FO) to emit probe light that has a wavelength in the range of Á<sub>m</sub>in a Á<sub>m</sub>ax, and a monochromator to receive the probe light and to provide spectrally different instances of the probe light corresponding to various relative orientations of a wavelength selector and monochromator output slot. In this case, the monochromator works in a step analysis mode, so that each of the probe light instances is provided for a finite (non-zero) time interval. In this way, spectrometer 504 provides unmodulated instances of the probe light through a
108 input port associated with deposition chamber 3 01 to illuminate a Μΐοοίτί g ^
309 supported by the substrate support 302. In the example illustrated in Figure 8A, as in Figure 7A, the periodic movement of the substrate support 302 and, therefore, the control sample 309 is maintained while the spectrometer 304 acquires a spectrum S (Á; j). In analogy with Figure 7A, at least one opening 325 is provided in the support substrate 302, separated from the control sample 309. In this way, a current instance of the probe light provided by spectrometer 504 in deposition chamber 301 alternately illuminates aperture 325 and core sample 309. As such, modulation is imparted to the current instance of light. probe that propagates to a position posterior to substrate support 302. The temporal distribution of the modulation is based on the periodic movement of opening 325 and core sample 309, and the amplitude of modulation of the current instance of probe light transmitted through core sample 309. Each of the instances of the probe light that alternately passed through opening 325 and was transmitted through control sample 309 exits deposition chamber 301 through an output port associated with spectrometer 504. .
In addition, the 504 spectrometer includes an optical detector
109 ί'ί
IMPI τ, <sub>Ί</sub> J 'INDUSTRIAL that leaves the deposition chamber (DO) to collect light through the current instance port of the alternate through
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OF THE OUTPUT PROPERTY. The light collected ^ includes ^ probe light that passed through the opening 325 and was transmitted to the control sample
309, and light emitted by various noise sources, for example, the heat source
310 of the deposition chamber
310 or elsewhere in the environment of the ICE 800 manufacturing system. The detector
DO converts the collected light to a detector signal 812. Additionally, spectrometer 504 includes a time-restricted detection module 760, which uses the temporal distribution of periodic motion of aperture 325 and control sample 309, to control (or limit) the detector signal 812. For example, time-restricted detection module 760 limits detector signal 812 to parts of the period of periodic movement of opening 325 and core sample 309 when the current instance of the probe light alternately illuminates opening 325 in movement and the control sample 309 in movement. Once the detector signal 812 is time restricted by the time restricted detection module 760 according to the interval of periodic movement of the opening 325 and core sample 309, the time restricted detector signal is processed by the 760 time-restricted detection module to generate a signal
110 815.
The examples of
<img file="MX359196B_D0084.tif" />
performed by the time-restricted detection module
760 about the time restricted detector signal were described above in connection with Figure 7A. Furthermore, the measurement signal 815 generated by the time-restricted detection module 760 is proportional to the amplitude of the modulation of the current instance of the probe light collected by the DO detector. In this way, the measurement signal 815 represents the attenuation of the current instance of the probe light due to transmission through control sample 309.
The computer system 305 uses a set of values of the measurement signal 815 corresponding to the different spectral instances of the probe light to generate a spectrum S (Á; j) of the probe light transmitted through the formed layers L ( l), ..., L (jl), L (j) of the control sample 309. The generated spectrum S (j; Á), in the wavelength interval between Atnin and Amax, can be used by the computer system 305 to determine the complex refractive indices and the thicknesses of each of the layers formed in the stack: n * 'si, n *' sio2, t '(l), t' (2), ..., t '(jl), t' (j). Computer system 305 makes this determination by solving Fresnel equations to propagate the interacting probe light through the layers formed in the stack.
111
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MFXICANÍ INSTITUTE OF PROmOAD
Various details are now described in detail.
<img file="MX359196B_D0085.tif" />
504 spectrometer and its corresponding functions ·: -
Figure 8B shows a part of the optical path of the above 504 spectrometer in relation to the control sample
309. It should be noted that the part illustrated in Figure 8B
<img file="MX359196B_D0086.tif" />
correspondent
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<img file="MX359196B_D0088.tif" />
Figure
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<img file="MX359196B_D0090.tif" />
represents a
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monochromator
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spectrometer 504
<img file="MX359196B_D0093.tif" />
<img file="MX359196B_D0094.tif" />
<img file="MX359196B_D0095.tif" />
one with
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Figure
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described
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Connection
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spectrally different instances 572-m of the probe light corresponding to a plurality of relative angular orientations ± τηΔΘ between the diffraction element 365 and the outlet slot 367 for m = 0, ± 1, ..., ± rn<sub>m</sub>ax, by separate analysis along the rotation stage 369 of the relative angle ΔΘ between the diffraction element 365 and the outlet groove 367. Figures 8B and 7C show that each instance 572 of the probe light is directed into the deposition chamber 301 through an input port associated with spectrometer 304 (not shown in Figures 8B and 7C) to alternately illuminating the control sample 309 held by the substrate support 302 and its opening 325. In this embodiment, the substrate support 3 02 is periodically moved (for example, it rotates about an axis through the center of the substrate support 302), so that each instance 572 of the substrate light illuminates so
112
IMPI
<img file="MX359196B_D0100.tif" />
<img file="MX359196B_D0101.tif" />
tX LA MtOHEOAU 2 and f alternated control sample 309 and opening'S ^ 'B' ^ ba'S'-áhdeiSe in a temporal distribution 765. D or eart-a<sup>1</sup> 'modulation r' - ™ ', which has a time distribution 765 and an amplitude representing the attenuation of each instance 572 of probe light transmitted through core sample 309, is imparted to instance 572 of the probe that propagates posteriorly relative to substrate support 302 to form a modulated instance 876 of the probe light. Each modulated instance 876 of the probe light is directed out of the deposition chamber 301 through an output port associated with the 3 04 spectrometer (not shown in Figures 8B and 7C) to be collected by the detector DO.
Figure 7C shows an optical path of the posterior spectrometer 504 relative to control sample 309. It should be noted that the part illustrated in Figure 7C represents a corresponding part of Figure 8A. In addition to the modulated instance 876 of the probe light, the DO detector collects light 382, 384, or 386 emitted by noise sources within the deposition chamber (eg, heat sources 310 described above) or elsewhere within from the ICE 800 manufacturing system environment, as described above in connection with Figures 3C and 5C. Light collected by DO detector, including modulated light
876 and the noise light 382, 384 and 386, is converted into a signal
113 of detector 812. In this way
<img file="MX359196B_D0102.tif" />
includes a modulation that has the temporal distribution 765 and an amplitude proportional to the attenuation of the instance
572 of the probe light transmitted through the control sample 309.
The time constrained detection module 760 is temporarily constrained based on the temporal distribution 765 of the periodic motion of core sample 309 and aperture 325, and receives detector signal 812 as input. For a current relative orientation πιΔΘ between the diffraction 365 and the output slot 367, where m is one of 0, ± 1 / ± 2, ..., ± m<sub>m</sub>ax, the intensity variation of the detector signal 812 may include the temporal distribution modulation 765 of the modulated instance 876 of the probe light, and the intensity changes of the noise light 382, 384 or 386. In addition, for the current relative orientation between the diffraction element 365 and the output slot 367, the amplitude of the modulation of the modulated instance 876 of the probe light is constant for a constant emission of probe light 370 by the FO source. As such, the output signal 815 of the time-restricted detection module 760 (also referred to as the measurement signal 815) is a value of the modulation amplitude of the detection signal 812 having the time distribution 765. In some implementations, the measurement signal 815, for the
114 Relative current orientation ιηΔθ diffraction 365 and exit slot 3 ~ b), fépre'seFTta -— ^ un. Average over multiple modulation periods of implementations of the current modulated instance 876 of the probe light collected by the DO detector.
Figure 7D shows a graph 722 illustrating an example of a lighting timing distribution 765 of core 309 and aperture 325. As described above, lighting timing distribution 765 is used as a time constraint by the modulus of time constrained detection 760. In this case, time constraint 765 is a train of K 2 i pairs of on / off pulses. A period T<sub>or</sub> of time constraint 765 represents a time interval between two consecutive illuminations of control sample 309. A pulse width Tg of time constraint 765 is not greater than a time during which instance 572 of the probe light illuminates the sample Token 309 or opening 325. In this example, time constraint 765 has a pair of pulses of width Tg for a period T<sub>or</sub>: one pulse corresponds to a part of To when the current instance of the probe light is transmitted through core 309, and the other pulse corresponds to another part of To when the current instance of the probe light passes through from opening 325.
Figure 7E shows a graph 724 illustrating the
115
<img file="MX359196B_D0103.tif" />
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OF THE PROPERTY
INDUSTRIAL detector signal 812 for the measurement time 0-t3 during which the relative orientation mAQ between the diffraction element 365 and the output slot 367 is kept constant, where m is one of 0, ± 1, ± 2, ± m<sub>m</sub>ax · It should be noted that the detector signal 812 (represented as a solid line) is limited to parts of the To period when time constraint 765 is open or, equivalently, when the current instance of the probe light is transmitted through of control sample 309 or passes through opening 325. In this example, time-restricted detection module 760 determines a maximum of detector signal 812 for each of the pulses corresponding to the times when the current instance of the probe light passes through aperture 325 and for each one of the pulses corresponding to the moments where the current instance of the probe light is transmitted through the control sample 309. A first envelope 726 (represented as a dotted line) generated by the time-restricted detection module 760 adjusts a first set of detector signal maxima 812 corresponding to the moments when the current instance of the probe light passes through from opening 325. A second envelope 728 (represented as a dotted line) generated by the time-restricted detection module 760 adjusts a second set of detector signal maxima 812
116 corresponding probe light
IMPI 68 ^ 1
MEXICAN INSTITUTE Gf__LJÍi?
,, give it eacpiEDAP VjU.— to the moments where the insta®R2<sup>:</sup>l<sup>¡</sup>to/'<sup>L</sup> current of is transmitted through df¡ ,,, 1 to
309.
The measurement signal 815 generated by the time-restricted detection module 760, for the current relative orientation τηΔθ between the diffraction element 365 and the output slot 367, is the amplitude of the modulation of the detector signal 812 determined as the difference between the first 726 and the second 728 surround. Therefore, the measurement signal 815 is a measurement of the modulation amplitude having the time distribution 765 of the current modulated instance of the probe light collected by the DO detector. Although in the example illustrated in Figure 7E a noise light input level 382, 384 or 386 remains around a first level before you, decreases to a second lower level between you and t2, and increases to a different third level after t2, the modulation amplitude of the current modulated instance of the probe light collected by the DO detector remains relatively constant throughout the entire 0-t3 measurement interval, for the current relative orientation γπΔΘ between the diffraction element 365 and the output slot 367. As such, the measurement signal ν (τηΔΘ) 815 for the current relative orientation τηΔθ between the diffraction element 365 and the output slot 367, which is proportional to the amplitude of the modulation
117 0-t3 measurement time.
To obtain a new measurement signal ν ((τη + 1) ΔΘ) 815 for a posterior relative orientation ιηΔθ between the diffraction element
365 and outlet slot 367, the diffraction element
365 the monochromator is rotated in the rotation stage
369 up to a posterior angular orientation to change the relative orientation between the diffraction element
365 and the exit slot
367 a distance ΔΘ in relation to the previous relative orientation ιηΔθ maintained during the previous measurement point.
The new relative orientation γπΔΘ corresponds to a new instance
572 of the probe light generated by the monochromator which is spectrally different from the instance used to take the previous measurement point. The new probe light instance 572 alternately passes through opening 325 and through control sample 309 and forms a new modulated instance 876 of the probe light, which has a modulation having the same time distribution 765 but a different amplitude relative to the modulation of the modulated instance used to take the previous measurement point.
As such, the new modulated instance 876 of the probe light is collected with the DO detector, along with noise light 382, 384, or 3 86, and converted to a new detector signal 812 corresponding to the new relative orientation.
118 (ιη + 1) Δθ between the element of
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output 367. The new measurement signal ^ 4 · 4πη1 ·) ΆΘ) current relative orientation (ιη + 1) Δθ between the diffraction element 365 and the output slot 367 is the output of the time-restricted detection module 760, restricted temporarily by time constraint 765 shown in Figure 7D, and is proportional to the amplitude of modulation of detector signal 812 during the 0-t3 measurement time interval.
Using the above stepwise analysis mode, the computer system 305 records a set of values {v (mmaxáe), ..., ν (-2ΔΘ), ν (-ΔΘ), V (0), ν (+ Δθ) , V (+ 2ΔΘ), ...,
V (+ m<sub>m</sub>axñ0)} of the measurement signal 815 generated by the spectrometer 504 to represent amplitudes of the modulation of the modulated instances 876-m of the probe light collected by the DO detector, for the corresponding relative orientations {-m<sub>max</sub>á9, ..., -2ΔΘ, -ΔΘ, 0, + ΔΘ, + 2ΔΘ, ..., + m<sub>m</sub>axñ0} between the diffraction element 365 and the exit slot 367. Figure 5C shows a graph 524 in which a set of recorded values {V (9<sub>m</sub>in), V (
2ΔΘ), ν (-Δθ), V (0), V (+ ΔΘ), V (+ 2ΔΘ), ..., V (0<sub>ma</sub>x)} is represented as filled circles as a function of the relative orientation between the diffraction element 365 and the outlet groove 367 (by using standard units for relative orientation, Θ / ΔΘ.) The computer system 305
119
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<img file="MX359196B_D0106.tif" />
To obtain the amplitude V (©), represent 3 ^ '' or how ~ 'a' 'continuous line, of the modulation of the modulated instances 876 of the probe light collected by the DO detector as a function of the relative orientation between the element of diffraction 365 and output slot 367. For example, the adjustment V (0) is obtained by interpolating the recorded finite set of values {v (0<sub>ra</sub>in), ..., ν (-2ΔΘ), ν (-ΔΘ), V (0), ν (+ ΔΘ), ν (+ 2ΔΘ), ..., ν (θτη<sub>3χ</sub>)} for the relative orientation between [0<sub>m</sub>in, 0<sub>ma</sub>x], and extrapolation of the values recorded for the relative orientations Θ <0<sub>m</sub>in, and Θ> 0<sub>m</sub>ax.
The computer system 305 can correlate angles of the angular interval [0min, © max] of the described step analysis with wavelengths of the measurement spectral interval [Á<sub>m</sub>in, Ámax], and apply scale, normalize, etc., as appropriate, the adjustment V (0) obtained to generate a spectrum S (Á; j) of probe light through the formed layers L (l),. .., L (j) of the control sample 309. Figure 5D shows a graph 526 in which the generated spectrum S (Á; j) is represented with a solid line in the spectral measurement interval [Á<sub>m</sub>in, Max]. As mentioned above, computer system 305 can be used to generate the spectrum S (Á; j), illustrated in Figure 5D, along with Fresnel equations to propagate the probe light throughout the layers formed to determine the indices. complex refraction
120 and the thickness of each
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Now referring to any of Figures 3A, 5A,
7A or 8A, computer system 305 includes one or more hardware and memory processors. The memory encodes instructions that, when executed by one or more of the processors, cause the manufacturing systems 300, 500, 700, or 800 to perform processes to manufacture the ICE 306s. Examples of the processes in connection with the processes are described below. Figures 9A-9C. Computer system 305 also includes or is communicatively coupled with a storage system that stores one or more ICE 3 07 designs, depositional aspects, and other information. Stored ICE designs can be organized into design libraries with various criteria, for example ICE designs used to manufacture ICE to determine values of a specific characteristic of many substances (for example the GOR ratio of crude oil, refined hydrocarbons, mud, etc.), or ICE designs used to manufacture ICE to determine values for many properties of a given substance (eg, viscosity, GOR, density, etc., of crude oil). Thus, upon receipt of an instruction to manufacture an ICE to measure a particular characteristic of a substance, the computer system 305 accesses the library.
121 layouts and retrieve a layout
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MEXICAN INSTITUTE
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The recovered ICE design 307 includes a description of a substrate and a total number N of layers that form in the deposition chamber 301 on the substrate; description of a substrate index, example index, a complex refractive index n * s of a refractive index material
Yes and yes<sub>2</sub>) different adjacencies;
k = lN} of the explicit, refraction description complex complex low n * L of the high n *<sub>H</sub> and a materials (by to form the N layers that have refractive indices and substrate description and the N of a characteristic that represents the complex layers with objective thicknesses {t<sub>s</sub>, t (k), layers. Of
307 also implicit objective optical spectrum or may include the wt (Á) associated with dada; and the description of an expected performance target SECt of an ICE associated with recovered 307. The above details of the determined, prior to manufacturing the ICE 306, according to the design process of
ICE 200 described above in connection with the
In some include one for errors
Figure implementations, the indication of manufacturing SECmax. Maximum design may merit different from the target SECt in ICE allowed
307 may be caused to include figures of recovered 307, eg SEP, ICE sensitivity,
122
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INDUSTRIAL etc.
<img file="MX359196B_D0107.tif" />
The refractive indices homnlpj ns— • target espeWf ^ s {t (k), k = lN} of the N layers, as specified by the recovered ICE design 307, are used by the computer system 305, along with aspects of Deposition layers from any of the ICE 300, 500, 700 or 800 manufacturing systems, to control the deposition rates of the deposition sources 303 and the respective deposition times to form the multiple layers
ICE. In this case the layers of the ICEs that are formed are illuminated sequentially with instances of the probe light provided by measurement system 304 associated with manufacturing systems 300 or 700, or alternatively by measurement system 504 associated with 500 or 800 manufacturing systems. In this case, the probe light instances provided by each of the measurement systems 304 or 504 are spectrally different from each other within a spectral measurement range. Since each of the measurement systems 304 and 504 is operated by the computer system 305 in a step analysis mode, each of the probe light instances illuminates the formed layers of the ICE for a finite (distinct) time interval. from scratch). For each of the probe light instances, the measurement system detects a modulation of the probe light that interacts with the formed ICE layers (for example,
123
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OF THE PROPERTY 'trans industrial transmits through them). The computer system 305 generates a spectrum of the probe light that interacted with the layers formed of ICE in the spectral measurement range from a set of values of the detected modulations corresponding to the instances of the probe light. If necessary, computer system 305 then instructs ICE manufacturing system 300, 500, 700, or 800 to adjust the formation of the remaining ICE layers to form based on the generated spectrum.
(3.5) Monitoring-assisted ICE fabrication techniques based on step analysis spectroscopy in combination with time-based detection of the probe light monitor that interacted with the ICEs being manufactured
Figure 9A is a flow chart of an ICE 900 manufacturing process that uses spectroscopy in a step analysis mode in combination with time restricted detection to generate spectra of the ICEs that are being manufactured. Process 900 can be implemented in conjunction with any of the ICE 300 manufacturing systems,
500, 700 or 800. In this context, process 900 can be implemented as encoded instructions in the memory of the computer system 305, so that the execution of the instructions, through one or more hardware processors of the computer system 305, cause the system
124
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In 910, an ICE design is received. The design of the received ICE includes the description of a substrate and N layers L (l), L (2), ..., L (N), where each one has a different complex refractive index than its adjacent layers, and the description of complex target refractive indices and thickness ts, t (l), t (2), ..., t (N). Thus, an ICE manufactured in accordance with the received ICE design selectively weights, when operated, light in at least part of a wavelength range in different amounts. The different weighted quantities in the wavelength range correspond to an objective optical spectrum wt (A) of the ICE and are related to a characteristic of a sample. For example, in connection with Figure 2, a design process was previously described to determine (1) the specified substrate and the number N of ICE layers, where each has a different complex refractive index than layers adjacent to it, and (2) the complex refractive indices and the thickness of the substrate and the N layers corresponding to the objective optical spectrum w<sub>t</sub>(Á) from ICE. In some implementations, the received ICE design may also include SECt as an indication of an objective ICE performance. Target performance represents an accuracy with which ICE predicts,
125 when operated, the characteristics corresponding to
IMPI
MEXICAN INSTITUTE OF THE PROm'OAD values
<img file="MX359196B_D0108.tif" />
The code or toyegr-validation of the sample. In this case, the predicted values of the characteristic are obtained when the validation spectra weighted by the ICE are respectively integrated. In some implementations, the received ICE design may also include an indication of the maximum allowable SECmax
<td colspan="7">caused by manufacturing errors.</td>
<td>I know</td><td>Use a</td><td>loop</td><td colspan="2">915 to make one or</td><td>plus</td><td>ICE</td>
<td>basing</td><td>at</td><td>design</td><td>from ICE received.</td><td colspan="2">Each iteration</td><td>Η ΐ H</td>
<td colspan="3">of loop 915 is used</td><td>to form a</td><td>layer L (i)</td><td>of</td><td>a</td>
<td>quantity</td><td>total N</td><td colspan="2">of layers. In this case,</td><td>the amount</td><td colspan="2">total N</td>
<td>of layers</td><td>can</td><td>to be</td><td>specified in</td><td>design</td><td>of</td><td>ICE</td>
received or updated during ICE manufacturing. Updates to the received ICE design are made when necessary to prevent the performance of the manufactured ICE from degrading below a threshold value.
At 920, the layer L (i) with a target thickness t (i) is formed while the ICEs manufactured with respect to a deposition source are periodically moved. The target thickness t (i) of layer L (i) can be specified by the received or updated ICE design based on optimizations carried out after the formation of one or more of the above ICE layers. One or more of the ICEs that are manufactured can be used as a control sample.
126
<img file="MX359196B_D0109.tif" />
In some implementations, the mo<sup>1</sup> the control sample (and the ICE that s <
or of
<img file="MX359196B_D0110.tif" />
interrupts after completion of at least one sublayer of layer L (i). In this case, the attenuation of the probe light that interacted with the control sample is measured at 930 and 940 using fixed detection.
At 930, the control sample, which includes layers formed L (l), ..., L (i), is illuminated sequentially with instances of the probe light, such that the control sample is illuminated by a single instance of probe light at a time and stand relative to a beam of the probe light instance that illuminates the control sample. The instances of the probe light, provided by either an interferometer or a monochromator, are spectrally different from each other. While the interferometer or monochromator operates in a step analysis mode to generate the probe light instances, each probe light instance illuminates the control sample for a finite time interval. In addition, a modulation is imparted to the probe light instances in a position prior to a point of incidence with the control sample. In this way, the control sample is illuminated with modulated instances of the probe light.
In 940, for each of the modulated probe light instances, the probe light that interacted with the layers
127 L (1) formed,
L (i) of the
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MEXICAN INSTITUTE shows
<img file="MX359196B_D0111.tif" />
by using fixed detection referenced by modulation. Examples of fixed detection of modulated instances of the probe light provided were described above, either with a step interferometer or with a step monochromator, in connection with Figure 3C. An example of a modulation time distribution that was used as the reference signal by fixed detection was described above in connection with Figure 3D. The attenuation of each instance of the probe light is proportional to a modulation amplitude value of the probe light instance detected with the fixed detection after interaction with the control sample, as described above in connection with the Figure 3E. A set of modulation amplitude values corresponding to the instances of the probe light that interacted with the control sample is recorded for use to generate a spectrum of the layers formed L (l), ..., L (i) of the control sample.
In other implementations, the periodic movement of the control sample (and of the ICEs that are being manufactured) is maintained after the completion of at least one L (i) layer sublayer. In this case, the attenuation of the probe light that interacted with the control sample is measured at 935 and 945 by using time-restricted detection.
128
<img file="MX359196B_D0112.tif" />
At 935, the control sample, ^ apas formed L (l) ··· / is illuminated sequentially with instances of the probe light, so that the control sample is illuminated by a single instance of the probe light at a time and periodically move relative to a beam of the probe light instance that illuminates the control sample. The instances of the probe light, provided by either an interferometer or a monochromator, are spectrally different from each other. While the interferometer or monochromator operates in a step analysis mode to generate the probe light instances, each probe light instance illuminates the control sample
<td>during</td><td>a</td><td>interval</td><td>of</td><td>finite time.</td><td>In</td><td colspan="2">this case, it</td>
<td>impart</td><td>a</td><td>modulation</td><td>to</td><td>each instance</td><td>of</td><td>the light of</td><td>probe</td>
<td>through</td><td>to the</td><td>to transmit</td><td>of</td><td colspan="2">alternately the</td><td>instance</td><td>of the</td>
probe light through the control sample and passing it through the control sample. The attenuation of each light instance is proportional to a modulation amplitude value of the generated probe light instance as described above.
In 945, for each of the probe light instances, the probe light modulated by interaction with the formed layers L (l), ..., L (i) of the control sample is detected by using time-restricted detection based on the temporal distribution of periodic motion. I know
129 previously described examples
IMP
MEXICAN INSTITUTE Uc OF INDUSTRIAL Muwiety
<img file="MX359196B_D0113.tif" />
Time-restricted of the modulated instances of the probe light provided, either with a step interferometer or with a step monochromator, after being modulated by transmission through the control sample, in connection with Figure 7C. An example of a temporal distribution of periodic motion that was used as a temporal constraint by time constrained detection was described above in connection with Figure 7D. A modulation amplitude value of the probe light instance is generated by fixed detection, as described above in connection with Figure 7E. A set of values of the modulation amplitudes imparted to the probe light instances is recorded by interacting with the control sample for use to generate a spectrum of the formed layers L (l), L (i) of the sample witness.
At 950, a probe light spectrum was generated that interacted with the formed layers L (l), ..., L (i) of the control sample in the wavelength range from a set of values of the Probe light detected corresponding to the probe light instances. The generated spectrum is also referred to as the spectrum of the layers formed. In this case, the value set is recorded to either 940 after using spectroscopy of
130 analysis after using joint analysis spectroscopy with time-restricted detection. In implementations where the probe light instances to which the recorded values correspond are provided by the use of an interferometer, the spectrum of the probe light that interacted with the control sample is generated as described above in connection with the Figures 3E-3F. In implementations where the probe light instances to which the recorded values correspond are provided by the use of a monochromator, the spectrum of the probe light that interacted with the control sample is generated as previously described in connection with Figures 5C-5D.
Aspects of step analysis specroscopy performed with an interferometer based spectrometer are described below in connection with Figure 9B and aspects of step analysis specroscopy performed with a monochromator based spectrometer are described more forward in connection with Figure 9C.
Step analysis spectroscopy based on Interferometer
Figure 9B is a flow chart of operations performed as part of any of the sequences {930,
940, 950} or {935, 945, 950} of the ICE manufacturing process
131
900 .
<img file="MX359196B_D0114.tif" />
Industrial manufacturing system can be implemented in conjunction with any of the ICE 300 or 700, for example.
A 935 'loop is used to perform step analysis spectroscopy, after step 920 of the ICE 900 manufacturing process, using an interferometer-based spectrometer. Loop 935 'comprises either the {930, 940} or {935, 945} sequences.
In some implementations, loop 935 '(corresponding to sequence {930, 940}) can be performed as a sequence of operations {931', 933 ', 942'}. The examples of implementations were described above in connection with Figures 3B, 3C, 3D and 3E.
As part of the j.<sup>to</sup> loop iteration 935 ', where j = 1 at mmax 2, at 931', a probe light with a wavelength interval (eg, the spectral measurement interval [Amin, Max]) is received by the interferometer of the spectrometer. Additionally, a j.<sup>to</sup> Instance of the zonda light corresponding to an optical path difference Az (j) of the interferometer is provided by the interferometer. The J .<sup>to</sup> Provided instance of the probe light includes wavelengths of the measurement spectral range [Amin, A<sub>ma</sub>x] that constructively interferes with the difference of the optical path Az (j), and excludes wavelengths from the spectral range of measurement
132 [λ mi η, Timax] difference
Figure 3B, the probe light generated by the FO source in the spectral range of and j.<sup>to</sup> measurement instance [Á<sub>m</sub>in / Á<sub>m</sub>ax] is indicated as 37 0, the probe light provided by the interferometer is indicated as 372.
At 933 ', the j.<sup>to</sup> instance of the probe light modulated with an interrupting optical element before illuminating layers L (l), ..., L (i) of the control sample formed at 920. In the examples illustrated in Figures 3B-3C, the J.<sup>to </sup>Modulated instance of the probe light is indicated as 374.
At 942 ', the j.<sup>to</sup> Modulated instance of the probe light that interacts with the formed layers L (l), ..., L (i) of the control sample is detected in a finite time interval by using fixed detection. An output V (j) of the fixed detection is proportional to the amplitude of the amplitude of j.<sup>to</sup> Detected modulated instance of the probe light interacting with the control sample. In this way, the output V (j) corresponding to the optical path difference úz (j). In the examples illustrated in Figures 3C-3E, the j,<sup>to </sup>modulated instance of the probe light interacting with the control sample is indicated as 376; the J.<sup>to</sup> modulated instance of the probe light that interacts with the control sample, which includes modulation 345, is indicated as 312; and the output V (j) corresponding to the optical path difference
133
Az (j) is indicated as 315.
In other implementations,
<img file="MX359196B_D0115.tif" />
loop 935 '(corresponding to sequence {930, 940}) can be performed as a sequence of operations {932', 934 ', 942'}. The examples of implementations were described above in connection with Figures 4, 3C, 3D and 3E.
At 932 ', a modulated probe light having a wavelength range is provided to the spectrometer interferometer. In the example illustrated in Figure 4, the modulated probe light generated by the FO source in the measurement spectral range [Á<sub>m</sub>in, Á<sub>m</sub>ax] is indicated as 371.
As part of the j.<sup>to</sup> loop iteration 935 ', where j = 1 a rn<sub>ma</sub>x -2, at 934 ', the modulated probe light is received by the interferometer. Additionally, a j.<sup>to</sup> Instance of modulated zonda light corresponding to an optical path difference Az (j) of the interferometer is provided by the interferometer. As previously described, j.<sup>to</sup> provided instance of the modulated probe light includes wavelengths of the measurement spectral range [Á<sub>m</sub>in, Á<sub>m</sub>ax] that constructively interferes with the difference of the optical path Az (j), and excludes the wavelengths of the spectral measurement interval [Á<sub>m</sub>in, Á<sub>m</sub>ax] that destructively interfere with the optical path difference Az (j). In the example illustrated in Figure 4, j.<sup>to</sup> instance of the modulated probe light
134 provided by the interferometer
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MEXICAN INSTITUTE.
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At 942 ', the j.<sup>to</sup> light instance of sonH ^ τηηφιίΑήΒ that interacts with the layers formed L (l), ..., L (i) of the control sample is detected in a finite time interval by using fixed detection. An output V (j) of the fixed detection is proportional to the amplitude of the amplitude of j.<sup>to</sup> detected instance of the modulated probe light interacting with the control sample. In this way, the output V (j) corresponding to the optical path difference Az (j). In the examples illustrated in Figures 3C-3E, j.<sup>to </sup>instance of the modulated probe light that interacts with the control sample is indicated as 376; the J.<sup>to</sup> instance of the modulated probe light that interacts with the control sample, which includes modulation 345, is indicated as 312; and the output V (j) corresponding to the optical path difference úz (j) is indicated as 315.
In some other implementations, loop 935 '(corresponding to sequence {935, 945}) may be carried out as a sequence of operations {931', 937 ', 947'}. The examples of implementations were described above in connection with Figures 7B, 7C, 7D, and 7E.
As part of the j.<sup>to</sup> loop iteration 935 ', where j = 1 at irimax ^ 2, at 931', a probe light with a wavelength interval is received (eg the measurement spectral interval [Á<sub>m</sub>in, Á<sub>m</sub>ax]) using the interferometer
135
<img file="MX359196B_D0117.tif" />
of the spectrometer.
zonda light
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MEXICAN INSTITUTE OF PROPERTY __ ____
Additionally, a statement that corresponds to a <sup>1</sup> Interferometer pathway dlféténc'ia is provided by the interferometer. The J.<sup>to</sup> proportionate instance of the light of the measurement spectral range [A<sub>m</sub>in, A<sub>m</sub>ax] that constructively interferes with the difference of the optical pathway
Az (j), and excludes wavelengths from the measurement spectral interval [Amin i Amax] that destructively interfere with the optical path difference Az (j). In the examples illustrated in Figure
7B, the probe light generated by the FO source in the measurement spectral range [A<sub>m</sub>i<sub>n</sub>,TO<sub>m</sub>ax] is indicated as 370, instance of the probe light provided by the interferometer is indicated as 372.
At 937 ', a control sample that includes the layers formed is illuminated with j.<sup>to</sup> instance of probe light corresponding to the optical path difference Az (j) of the interferometer by using the temporal distribution of the periodic movement of the control sample. In this way, a modulation is imparted to the j.<sup>to</sup> instance of the probe light by alternately transmitting the
j.<sup>to</sup> Instance of the probe light through the control sample and passing it through the control sample. The attenuation of the j.<sup>to</sup> instance of light is proportional to an amplitude value of the modulation of j.<sup>to</sup> light instance
136
<img file="MX359196B_D0118.tif" />
probe generated as described above. In the examples illustrated in Figures 7B-7C, the modulated probe light is indicated as 776 and a time distribution of its modulator is indicated as 765.
At 947 ', the j.<sup>to</sup> Instance of probe light that interacts with layers that move periodically is detected in a finite time interval by using time-restricted detection. An output V (j) of time-restricted detection is proportional to an amplitude of the amplitude of j.<sup>to</sup> detected instance of the modulated probe light interacting with the control sample. In this way, an output V (j) of the time-restricted detection corresponds to the difference in optical path Az (j). In the examples illustrated in Figures 7C-7E, j.<sup>to </sup>instance of the probe light that interacts with the control sample is indicated as 776; the J .<sup>to</sup> instance of the probe light that interacts with the control sample, which includes time distribution modulation 765, is indicated as 712; and the output V (j) corresponding to the optical path difference Δ (j) is indicated as 715.
In general, subsequent iterations of the 935 'loop will generate outputs V (j + 1), V (m<sub>ma</sub>x) of fixed or time-restricted detection corresponding to posterior optical path differences áz (j + l), ..., Δζ (rn<sub>m</sub>ax) - As the set of values {v (j), j = l-mmax} are acquired or when
137
<img file="MX359196B_D0119.tif" />
completes your acquisition the values
<img file="MX359196B_D0120.tif" />
rnmax} can be represented in graphs 32 4 ... i 111 st.rada_ in Figure 3F. Once the entire set of values {V (l), V (rn<sub>m</sub>ax)} that corresponds to all the optical path differences Δζ (1), ..., Δζ (m<sub>ma</sub>x) is registered, operations 950 of process 900 can be performed.
At 952, a set of the detection outputs {V (l),. .., V (rn<sub>m</sub>ax)} that correspond to the differences of optical path
Δζ (1), ..., Δζ (rnmax) is adjusted to obtain a dependence on the optical path difference of the probe light that interacts with the formed layers of the ICE. In the example illustrated in Figure 3F, the dependence of the optical path difference obtained from the detected probe light interacting with the formed layers is indicated as V (z), where z is the difference of the optical path.
In 954, the dependence obtained from the optical path difference of the detected probe light that interacts with the formed layers is transformed by Fourier to generate the spectrum of the probe light that interacts with the formed layers. In the example illustrated in Figure 3G, as the first stage of the Fouirer transform, a B (k) spectrum of the layers formed in the wave number space is generated. A wave number is defined as k = 2π / λ. As a later stage, the spectrum B (k) can be transformed into the desired spectrum S (Á; i) of the layers formed L (l), ...,
L (i)
138
<img file="MX359196B_D0121.tif" />
The spectrum generated in 954, - g ~ ™ ^ result of the step analysis spectroscopy modality using a spectrometer based on an inter-erometer, is provided by providing 90 0 as input to one or more operations to be performed on 960. Before describing the operations carried out in 960, the generation of the spectrum of the formed layers of the control sample as a result of step analysis spectroscopy using a spectrometer based on a monochromator is described below.
Monochromator-based step analysis spectroscopy
Figure 9C is a flow chart of operations performed as part of any of the {930, 940, 950} or {935, 945, 950} sequences of the ICE 900 manufacturing process. The operations described in connection with Figure 9C they can be implemented in conjunction with any of the ICE 500 or 800 manufacturing systems, for example.
A 935 loop is used to perform step analysis spectroscopy, after step 920 of the ICE 900 manufacturing process, using a monochromator-based spectrometer. Loop 93 5 comprises either the {930, 940} or {935, 945} sequences.
In some implementations, the 935 loop
139
IMPI (corresponding to sequence {930, performed as a sequence of operations {931, 933, 942}. The examples of implementations were described above in connection with Figures 5B, 3C, 3D and 3E.
As part of the j.<sup>to</sup> Loop 935 iteration, where j = 1 to nwx 2, at 931, a probe light with a wavelength range (eg, the spectral measurement range [Amin, Max]) is received by the spectrometer monochromator. Additionally, a j is provided.<sup>to </sup>instance of the probe light corresponding to a relative orientation A0 (j) between a diffraction element and an exit slot using the monochromator. The J.<sup>to </sup>proportionate instance of the probe light is quasi-monochromatic, because it includes wavelengths centered on a particular wavelength of the measurement spectral range [Ámin, Á<sub>ma</sub>x] corresponding to a relative angular orientation A6 (j) between a diffraction element and the exit slot, and a narrow wavelength interval, Δλ << | TO<sub>ma</sub>for<sub>m</sub>in | . In the examples illustrated in Figure 5B, the probe light generated by the FO source in the measurement spectral range [Á<sub>m</sub>in, Á<sub>ma</sub>x] is denoted as 370, and j.<sup>to</sup> Instance of the probe light provided by the monochromator is indicated as 572.
In 933, the j.<sup>to</sup> instance of the probe light modulated with an interrupting optical element before illuminating the
140 L layers (1),
..., L (i) shows the examples illustrated in the
Figures 5B and 3C,
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<img file="MX359196B_D0122.tif" />
Modulated instance of the probe light is indicated as 574.
In 942, the j.<sup>to</sup> Modulated instance of the probe light that interacts with the formed layers L (l), ..., L (i) of the control sample is detected in a finite time interval by using fixed detection. An output V (j) of the fixed detection is proportional to the amplitude of the amplitude of j.<sup>to</sup> Detected modulated instance of the probe light interacting with the control sample. In this way, the output V (j) corresponds to the relative orientation A0 (j) between the diffraction element and the output slot. In the examples illustrated in Figures 3C-3E, j.<sup>to</sup> Modulated instance of the probe light that interacts with the control sample is indicated as 576; the J.<sup>to</sup> modulated instance of the probe light that interacts with the control sample, which includes modulation 345, is indicated as 512; and the output V (j) corresponding to relative orientation A0 (j) between a diffraction element and an output slot is indicated as 515.
In other implementations, the loop
5 carried out as a sequence of operations {932,
934, 942}.
The examples of implementations were described above in connection with Figures 6, 3C,
3D and 3E.
141
IMPI
INSTITUTE * ^ S | in ad
At 932, a scfiWi ^ s? »® £ light is provided
<img file="MX359196B_D0123.tif" />
have a wavelength interval at the moqgrrnniiinlor ~~ Π8Τ spectrometer. In the example illustrated in Figure 6, the modulated probe light generated by the FO source in the measurement spectral range [Á<sub>m</sub>in, Maxl is indicated as 3 71.
As part of the j.<sup>to</sup> loop iteration 935, where j = 1 at mmax ^ 2, at 934, the modulated probe light is received by the monochromator. Additionally, a j is provided.<sup>to</sup> instance of the modulated probe light corresponding to a relative orientation Ú0 (j) between a diffraction element and an exit slot using the monochromator.
As previously described, j.<sup>to</sup> proportionate instance of the modulated probe light is quasi-monochromatic, because it includes wavelengths centered on a particular wavelength of the measurement spectral range [Á<sub>m</sub>in, Á<sub>m</sub>ax] corresponding to a current relative angular orientation Ú0 (j) between a diffraction element and the exit slot, and a narrow wavelength interval, Δλ << | TO<sub>max</sub> - TO<sub>m</sub>i<sub>n</sub>| . In the example illustrated in Figure 6, j.<sup>to</sup> Instance of the modulated probe light provided by the monochromator is indicated as 574.
In 942, the j.<sup>to</sup> instance of the modulated probe light that interacts with the formed layers L (l), ..., L (i) of the control sample is detected in a finite time interval
142 by using fixed detection.
IMPI
MEXICAN INSTITUTE
An I »»
<img file="MX359196B_D0124.tif" />
Fixed detection is proportional to the amplitude of the amplitude of the j.<sup>to</sup> detected instance of the modulated probe light interacting with the control sample.
V (j) corresponds to the orientation
In this way, the relative output Ú0 (j) between the diffraction element and the output slot. In the examples illustrated in Figures 3C-3E, j.<sup>to</sup> instance of the modulated probe light that interacts with the control sample is indicated as 576; the J.<sup>to</sup> instance of the modulated probe light that interacts with the control sample, which includes modulation 345, is indicated as 512; and the output V (j) corresponding to relative orientation A9 (j) between a diffraction element and an output slot is indicated as 515.
In some other implementations, loop 935 (corresponding to sequence {935, 945}) can be performed as a sequence of operations {931, 937, 947}. Examples of implementations were described above in connection with Figures 8B, 7C, 7D, and 7E.
As part of the j.<sup>to</sup> loop iteration 935, where j = 1 a rn<sub>m</sub>ax-2, at 931, a probe light with a wavelength range is received (eg, the measurement spectral range [Á<sub>m</sub>j<sub>n</sub>, TO<sub>m</sub>ax]) using the spectrometer monochromator. Additionally, a j is provided.<sup>to </sup>instance of the probe light corresponding to a
143
IMPI Mexican institute relative orientation A0 (j) between an element iNÍ ^ iíft & i
<img file="MX359196B_D0125.tif" />
and an exit slot using the -mr.-nnr »Tr, madnr. The J.<sup>to</sup> Proportioned instance of the probe light is quasi-monochromatic, because it includes wavelengths centered on a particular wavelength of the measurement spectral interval [Atnin, Amax] corresponding to the relative angular orientation A0 (j) between an element of diffraction and the output slot, and a narrow wavelength interval, ΔΑ << | TO<sub>ma</sub>x - x<sub>m</sub>in | In the examples illustrated in Figure 8B, the probe light generated by the FO source in the measurement spectral range [A<sub>m</sub>in, A<sub>m</sub>ax] is denoted as 370, and j.<sup>to</sup> Instance of the probe light provided by the monochromator is indicated as 572.
At 937, a control sample that includes the layers formed is illuminated with j.<sup>to</sup> instance of probe light corresponding to the relative orientation AB (j) between a diffraction element and an exit slot by using the time distribution of the periodic movement of the control sample. In this way, a modulation is imparted to the j.<sup>to</sup> instance of the probe light by alternately transmitting the j.<sup>to</sup> Instance of the probe light through the control sample and passing it through the control sample. The attenuation of the j.<sup>to</sup> instance of light is proportional to an amplitude value of the modulation of j.<sup>to</sup> instance of probe light generated as described
144
IMPI
MEXICAN INSTITUTE previously. In the illustrated examples<sup>AND</sup>l ^ ftS $ | ^
<img file="MX359196B_D0126.tif" />
8Β and
7C, the modulated probe light is indicated as 876 and a time distribution of its modulator is indicated as 765.
probe light which instance of the
In 947, the j.<sup>to</sup>
<td>interact</td><td>with layers</td><td>than</td><td colspan="2">move from</td><td colspan="2">periodically</td>
<td>detects in</td><td>an interval</td><td>of</td><td>weather</td><td>finite</td><td>Through the</td><td>use</td>
<td>detection</td><td colspan="2">constrained by</td><td>weather.</td><td>A</td><td>output V (j)</td><td>of</td>
<td>detection</td><td>restricted</td><td>by</td><td>weather</td><td colspan="2">is proportional</td><td>to</td>
the amplitude of the detected instance amplitude j is given.<sup>to</sup> of the modulated probe light that interacts with the control sample.
In this way, one output per time corresponds to the relative orientation A6 (j) between the diffraction element and the output slot. In the examples illustrated in Figures 7C-7E, j.<sup>to</sup> instance of the probe light that interacts with the control sample is indicated as 876;
the J.<sup>to</sup> instance of the probe light that interacts with the control sample, which includes time-constrained modulation 765, denoted 812;
between the diffraction element and the exit slot is indicated as 815.
In general, subsequent iterations of the 935 loop will generate outputs
V (j + 1), ··· /
V (m<sub>ma</sub>x) of fixed or time-restricted detection corresponding subsequent relative orientations A0 (j + 1), ..., ΔΘ (m<sub>m</sub>ax). in the messure that
145 acquire the set of values {v (j) is
INDUSTRIAL completes its acquisition, the acquired values {v (j), j = lm<sub>m</sub>ax} can be represented in graphs 524 illustrated in Figure 5C. Once the entire set of values {v (l), ..., V (rn<sub>ma</sub>x)} that corresponds to all the differences of optical path Δθ (1), ..., ΔΘ (rn<sub>m</sub>ax) is registered, operations 950 of process 900 can be performed.
In 956, a set of the detection outputs (V (l), ..., V (mmax)} corresponding to the relative orientations Δθ (1), ..., Ú0 (m<sub>raax</sub>) is adjusted to obtain a dependence on the relative orientation of the probe light that interacts with the formed layers of the ICE. In the example illustrated in
Figure 5C, the dependence of the relative orientation obtained from the detected probe light that interacts with the layers
<td>formed</td><td colspan="2">indicated</td><td>like V (Θ),</td><td>where Θ is the</td><td>orientation</td>
<td>relative</td><td>between</td><td>the</td><td>element of</td><td>diffraction and the</td><td>slot</td>
<td>departure.</td><td></td><td></td><td></td><td></td><td></td>
<td>In</td><td> 958,</td><td>the</td><td>dependence</td><td>obtained from the</td><td>orientation</td>
<td>relative</td><td>of the</td><td>light</td><td colspan="3">probe detected that interacts with</td>
Layers formed from the control sample are processed to generate the spectrum of the probe light that interacted with the layers formed. The processing of the dependency obtained on the relative orientation of the detected probe light that interacts with the control sample includes the correlation of relative orientations of the interval [Δθ (1), Δθ (M)] with
146 interval wavelengths
<img file="MX359196B_D0127.tif" />
[Ámin / Ámax], in conjunction with appropriately applying ,, agc.al · a / normalίjhw- * the dependence of the relative orientation of the detected probe light that interacts with the control sample. A result of the processing performed in 958 on the dependence of the grid angle obtained from the detected probe light that interacts with the control sample is represented in graph 526 (illustrated in Figure 5D) as an S (A; i) spectrum of the layers formed L (l), ..., L (i) of the control sample in the measurement spectral interval [Atnin, Amax].
The spectrum generated in 958 as a result of the step analysis spectroscopy mode using a monochromator-based spectrometer, or in 954 as a result of the step analysis spectroscopy mode using a base spectrometer in an interferometer, it is provided by providing 900 as input to one or more operations to be performed on 960.
Referring again to Figure 9A, at 960, the layers L (l), L (2), ..., L (il) formed during previous and current iterations of loop 915 are characterized based on the light spectrum of Interacting probe generated in 950. The characterization of the layers of the control sample is carried out almost in real time. For example, the spectrum of the interacting probe light (generated at 950) is used to
147 determine refractive indices
IMPI®
MEXi'-ÁNu INSTITUTE 7
DE LA MOHEDAL) comple j'®S<sup>STR!</sup>ff * <sup>1</sup> hn * 'ly ··· /
L (2), ··· /
L (il), L (i) formed in previous and current iterations of loop 915.
In
970, the deposition of
... of the ICEs that are manufactured together with the control sample, if necessary, based on the complex refractive indices determined n *<sup>1</sup> h, n * <sup>1</sup> l and the thickness t '(1), t' (2), ..., t '(il), t' (i) of the layers formed L (l), L (2), ..., L ( il), L (i). For example, a deposition rate used to form the layer L (i) currently in formation and other layers L (i + 1), L (i + 2), ... that have not yet formed can be adjusted in time real based on a comparison between complex refractive index values and layer thicknesses of the current ICE instance and their respective target values. Alternatively or additionally, complex refractive indices corresponding to the layer L (i) currently in formation and other layers L (i + 1), L (i + 2), ... that have not yet formed can be adjust in real time based on a comparison between complex refractive index values and layer thicknesses of the current ICE instance and their respective target values.
Furthermore, to determine if the target thickness of
148 layers L (i + 1), L (i + 2)
<img file="MX359196B_D0128.tif" />
they must be updated, the following verification is done when the deposition of the current layer L (i) is completed. An SEC (i) of the ICE is expected to represent the performance of the ICE if the ICE is completed to have the layers formed L (l), L (2), L (i) with the determined thicknesses t '(1), t '(2), ..., t' (i), and the layers L (i + 1), L (i + 2), ..., L (N) that have not yet been formed with the target thicknesses t (i), t (i), t (N). Here, the predicted SEC (i) of the ICE is caused by the deviations of the complex refractive indices and the determined thicknesses of the layers formed from their respective target complex refractive indices and the thicknesses specified by the current ICE design. If the predicted SEC (i) does not exceed a maximum allowed SECmax,, SEC (i) <
SECmax, a next iteration of loop 915 is activated to form the next layer L (i + 1) with its target thickness t (i + 1).
However, if the predicted SEC (i; N) exceeds the maximum allowed SECmax, SEC (i; N)> SECmax, the target thicknesses of the layers L (i + 1), L (i + 2), ... , L (N) that have not yet been formed are modified based on the complex refractive indices and the determined thicknesses of the layers formed L (l), L (2), ..., L (i). This optimization can change the total number of ICE layers from the specified total number N of layers to a new total number cantidad 'of
149 layers but limits the thickness of
<img file="MX359196B_D0129.tif" />
τ γτ?) _íu — .loo oep'GBeire'S
L (i) (of the current instance of the given t '(l), t' (2), t '(i). In this way, the optimization obtains, in analogy with the process 200 described above in connection with Figure 2, new target thicknesses t (i + 1), t (N ') of the layers L (i + 1), .. ., L (N ') that have not yet been formed, so that a new ICE target SEC't (i; N'), for the ICE that has the first layers L (l), L (2), L (i) formed with the determined thicknesses t '(l), t' (2), ..., t '(i), and the layers L (i + 1), L (N') that have not yet been have formed with the new target thickness t (i + 1), ..., t (N '), is minimal and does not exceed the maximum allowed SECmax,
SEC't (i; N ') <SECmax.
Once the previous instance of the ICE design is updated with the description of the new total number of layers Ν 'and the new target thickness t (i + 1), t (N'), which are used to form the remaining layers L (i + 1), ..., L (N ') and correspond to the new target SEC't (i; N'), a next iteration of loop 915 is activated to form the next layer L (i + 1) from the new total number of layers Ν 'with its new target thickness t (i + 1). In this way, the remaining layers of the ICE are formed according to the updated ICE design, at least until another update is made.
Some modalities were described in detail
150 previously and several are possible
IMPI
INSTITUTO MEXIC ^ NU DE LA PROPIEDAD j _c. INDUSTRIAL modifications
<img file="MX359196B_D0130.tif" />
This description contains many specific details, they should not be interpreted as limiting the scope of what can be claimed, but as descriptions of the specific characteristics of particular modalities. Certain features that are described in the present disclosure in the context of separate modalities can also be implemented in combination in a single modality. Instead, various features that are described in the context of a single modality can also be implemented in multiple modalities separately or in any suitable subcombination. Also, although features have previously been described in certain combinations and even initially claimed in such a manner, in some cases it is possible to remove one or more features from a claimed combination and it is possible to target the claimed combination to a subcombination or variation of a subcombination.
Similarly, although the operations are illustrated in the figures in a particular order, it should not be understood that the operations need to be carried out in the particular illustrated or serial order, or that all the operations need to be performed. illustrated, for desirable results. In certain circumstances, the simultaneous modality of multiple tasks and the
151
<img file="MX359196B_D0131.tif" />
separation of various components
<img file="MX359196B_D0132.tif" />
being modalities described above should not be construed as necessary in all modalities.
Other modalities are within the scope of the following claims.
It is noted that in relation to this date, the best method known by the applicant to put the aforementioned invention into practice is the one that is clear from the present description of the invention.
152
Contents94
154 sheets
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8 members in 5 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 2014016603 | United States of America | W | |
| 2014016603 | United States of America | W | |
| PCTUS2014016603 | – | – | – |
| WO2014US16603 | – | – | – |
Members8
| Document | Office | Kind | |
|---|---|---|---|
| WO2015122923A1 | World Intellectual Property Organization (WIPO) | A1 | |
| EP2946197A1 | European Patent Office (EPO) | A1 | |
| US2016224016A1 | United States of America | A1 | |
| MX2016008957A | Mexico | A | |
| EP2946197A4 | European Patent Office (EPO) | A4 | |
| BR112016015543A2 | Brazil | A2 | |
| US9727052B2 | United States of America | B2 | |
| MX359196BThis record | Mexico | B |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Grant or registrationFG | FG |
Numbers
- Publication
- 359196
- Publication, DOCDB
- 359196
- Publication, EPODOC
- MX359196
- Application
- 2016008957
- Application, DOCDB
- 2016008957
- Application, EPODOC
- MX20160008957
Titles2
- English
- IN-SITU SPECTROSCOPY FOR MONITORING FABRICATION OF INTEGRATED COMPUTATIONAL ELEMENTS.
- Spanish
- ESPECTROSCOPIA IN SITU PARA EL MONITOREO DE LA FABRICACION DE ELEMENTOS COMPUTACIONALES INTEGRADOS.
Classification
- CPC, 20
- G05B19/4099
- G01J3/28
- B29D11/0073
- G01N21/31
- B32B3/266
- B32B2307/40
- G01N21/8422
- B32B2307/418
- G02B5/285
- B32B2307/732
- G02B5/287
- B32B2551/00
- G01J3/0264
- G01N2021/8438
- G01J3/0286
- G01J3/08
- G01J3/12
- G01J3/45
- G01J2003/1226
- G05B2219/49023
- IPC, 11
- G01N21 41
- B23B3 26
- B29D11 00
- E21B49 00
- G01B11 06
- G01J3 00
- G01J3 28
- G01N21 31
- G01N21 84
- G02B5 28
- G05B19 4099