JPS5070040A
Reducing the reflectance of surfaces to radiation
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 10 May 1994, 32.4 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| US8541049B2 | Cited by | United States of America | Applicant |
| US8163333B2 | Cited by | United States of America | Applicant |
| JP2010513961A | Cited by | Japan | Search report |
| US9354359B2 | Cited by | United States of America | Applicant |
| EP2644661A1 | Cited by | European Patent Office (EPO) | Applicant |
| US7811684B2 | Cited by | United States of America | Applicant |
| KR20150037746A | Cited by | Republic of Korea | Applicant |
| JPWO2005109042A1 | Cited by | Japan | Search report |
| WO2009145049A1 | Cited by | World Intellectual Property Organization (WIPO) | Applicant |
| JP2010513961A | Cited by | Japan | Examiner |
| EP2390229A1 | Cited by | European Patent Office (EPO) | Applicant |
| JPH01252902A | Cited by | Japan | Search report |
| EP2977794A1 | Cited by | European Patent Office (EPO) | Applicant |
| EP2653453A1 | Cited by | European Patent Office (EPO) | Applicant |
| EP1972968A2 | Cited by | European Patent Office (EPO) | Applicant |
| US9442222B2 | Cited by | United States of America | Applicant |
| KR20150039710A | Cited by | Republic of Korea | Applicant |
| US8034437B2 | Cited by | United States of America | Applicant |
| US9678248B2 | Cited by | United States of America | Applicant |
| US8501270B2 | Cited by | United States of America | Applicant |
| US7771832B2 | Cited by | United States of America | Applicant |
| WO2008102902A1 | Cited by | World Intellectual Property Organization (WIPO) | Applicant |
| WO2012153686A1 | Cited by | World Intellectual Property Organization (WIPO) | International search |
| US7859768B2 | Cited by | United States of America | Applicant |
| JP2001525269A | Cited by | Japan | Examiner |
| US8226250B2 | Cited by | United States of America | Applicant |
| US7931936B2 | Cited by | United States of America | Applicant |
| US8084082B2 | Cited by | United States of America | Applicant |
| US8580026B2 | Cited by | United States of America | Applicant |
| JP2009042472A | Cited by | Japan | Examiner |
| JP2007264594A | Cited by | Japan | Examiner |
| JP2014522251A | Cited by | Japan | Examiner |
| WO2010125690A1 | Cited by | World Intellectual Property Organization (WIPO) | Applicant |
| US9579191B2 | Cited by | United States of America | Applicant |
7 members in 6 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 2228473 | United Kingdom | A | |
| 46735474 | United States of America | A | |
| 65675776 | United States of America | A |
Members7
| Document | Office | Kind | |
|---|---|---|---|
| DE2422298A1 | Germany | A1 | |
| FR2228630A1 | France | A1 | |
| JPS5070040AThis record | Japan | A | |
| AU6879874A | Australia | A | |
| GB1462618A | United Kingdom | A | |
| US4013465A | United States of America | A | |
| FR2228630B1 | France | B1 |
Numbers
- Application
- 5217974
Classification
- CPC, 7
- G02B1/118
- C03C15/00
- G02B1/113
- G02B1/12
- G03F7/001
- H10F77/70
- Y02E10/50
- IPC, 6
- G02B5 18
- C03C15 00
- G02B1 11
- G02B1 12
- G03F7 00
- H01L31 0236