JPH04241237A

Stamper for high-density recording disk and production thereof

Abstract

PURPOSE:To provide a specific pit width and length by etching resist films of signal patterns formed by a prescribed method on a glass plate as a mask to a prescribed depth. CONSTITUTION:The photoresist 11 is applied uniformly at a prescribed thickness on the surface of the glass substrate 10 polished to a high density and is prebaked under prescribed conditions. Guide grooves are then recorded by a prescribed laser beam 12 to crosslink exposed parts 13; thereafter, the entire surface is simultaneously exposed and the parts 11A not subjected to the laser exposing are dissolved by an alkali, by which projecting patterns are obtd. The remaining photoresists are removed by dry etching the resists as the mask. The stamper having the min. pit width ranging 0.15 to 1.00mum is obtd.

Term

Term ended

Projected expiry passed 11 January 2011, 15.7 years ago.

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2 claims: 2 independent, 0 dependent

  1. 1
    [Claim(s)] 【特許請求の範囲】 [Claim 1] In forming La Stampa of a high-density-recording disk which creates an information carrier which has the information pattern by making a resin material counter the La Stampa surface which has a reversal pattern of an information signal pattern, and making it harden, La Stampa for high-density-recording disks which is a range whose width of the minimum pit is 0.15 micrometer ~ 1.00 micrometers, and is characterized by the quality of the material consisting of glass. 【請求項1】情報信号パターンの反転パターンを有するスタンパ表面に樹脂材料を対向させ、硬化させることにより該情報パターンを有する情報担体を作成する高密度記録ディスクの成形スタンパにおいて、最小ピットの幅が0.15μm~1.00μmの範囲であり、材質がガラスよりなることを特徴とする高密度記録ディスク用スタンパ。
  2. 2
    [Claim 2] A manufacturing method of La Stampa for high-density-recording disks characterized by comprising the following, A process of applying a positive-resist film which induces irradiation of a beam on a flat glass board, A process of irradiating with the beam modulated by the positive-resist film according to an information signal pattern, A process which carries out reverse bake, A process of carrying out package exposure of the whole surface containing the portion by which reverse bake was carried out, A process of removing the resist film of a portion which is not irradiated with the beam by developing the positive-resist film, and forming the resist film of a pattern according to the information signal pattern, A process of etching the glass board to the predetermined depth by using the resist pattern as a mask, A process of removing the positive-resist film. 【請求項2】平坦なガラス板上にビームの照射に感応するポジレジスト膜を塗布する工程と、該ポジレジスト膜に情報信号パターンに応じて変調された該ビームを照射する工程と、リバースベークする工程と、該リバースベークされた部分を含む全面を一括露光する工程と、該ポジレジスト膜を現像することにより、該ビームが照射されていない部分の該レジスト膜を除去し、該情報信号パターンに応じたパターンの該レジスト膜を形成する工程と、該レジストパターンをマスクとして該ガラス板を所定の深さまでエッチングする工程と、該ポジレジスト膜を除去する工程とからなることを特徴とする高密度記録ディスク用スタンパの製造方法。