High speed sputtering apparatus for ferromagnetic body

[Detailed Description of the Invention]

The present invention is Fe, Co, Fe-nickel, Co-Cr, a Co-R alloy, and Fe.₃O₄BaO-Fe₂O₃It is related with the high-speed sputter device of other ferromagnetics. Conventionally, the substraight which countered other Fe and ferromagnetic target and the ferromagnetic target of cathode potential is provided in a vacuum processing chamber as this seed device, Although the thing provides a magnetic field generator behind the target further, and makes the surface of the target generate a disclosure magnetic field, and it made it raise plasma density by this is known, In this case, the thickness of the target is thinly restricted to obtaining about 200-gauss parallel magnetic field required for high-speed sputtering on the surface of the target, and the magnetic field beyond that magnetic saturation value must be given to the target with the magnetic field generator, The inconvenience to which consumption of a Together this target is rash to this, and the life falls is produced, and it is a victory. For example, a barium ferrite magnet is used for the magnetic field generator, and these are contacted at a ferromagnetic target at Mutually using the tabular target of Fe, For obtaining about 200-gauss disclosure magnetic field on the surface of the target, the thickness of the Fe target must be 1.4 mm or less, the very short-life target which must set that thickness to 0.7 mm or less if the backing plate made from Cu which reinforces this is provided behind the Fe target in this case -- an intermediary -- it is not desirable. They are also the object and the bottom about the present invention providing this inconvenient high-speed sputter device that is not, The substraight which countered the ferromagnetic target and the ferromagnetic target of cathode potential is provided in a vacuum processing chamber, In what provided the magnetic field generator behind the ferromagnetic target, The small interval of 3 mm or less which crosses the direction of a magnetic field of the magnetic field generator for the ferromagnetic target of each other at least is constituted from plurality of the ferromagnetic of the small unit arranged by consisting, and a disclosure magnetic field is generated and made to the space area near the surface opposite to the above-mentioned substraight of the ferromagnetic target. The target consisting of Fe and other ferromagnetics which 1 counters with a substraight in a vacuum processing chamber in the Drawings 1 and 2 for explaining a drawing, and are provided in one example of a present invention device, The backing plate of the non-ferromagnetic which 2 provided in the back of the target 1, and 3 are the barium ferrite magnet and other magnetic field generators of the plate 2 which were provided further back, and, in illustration, a magnetic field generates them between the N pole and the S pole. The water-cooled tank consisting of the non-ferromagnetic in which 4 stored the cooling water which cools the backing plate 2, and 3a show a yoke, if cathode potential is impressed to the target, sputtering of the target will be carried out and the atom will deposit in a substraight. It constitutes by consisting and arranging small interval 5 of 3 mm or less which crosses [ the ferromagnetic target 1 of each other ] the magnetic field of magnetic field generator 3 for two or more ferromagnetics 1a of a small unit at least in the thing of the present invention, although there are in particular no conventional thing and change, and, in the 1st and 2nd illustration, the above composition is, It formed in the ring formation which has a rectangular section whose width b is 5 mm about the ferromagnetic 1a, and small interval 5 of 1 mm is consisted and it was made to carry out attachment fixation of the plurality on backing plate 2. As a result of having provided magnetic field generator 3 of the barium ferrite magnet behind target 1 which consists of Fe of this size shape, having changed thickness t of the target 1, being 3 mm in height and measuring the horizontal magnetic field of point c of a magnetic pole Manaka [ Shin ] position from that surface, it is Ivy like curve A of Drawing 3. On the other hand, the result which changed the thickness of the target which consists of a series of conventional plate-like Fe(s), and was measured on the same conditions is a next door as shown in curve B of the figure, Strength G of a magnetic field is all less than curve A except [ of 0 mm in thickness, i.e., backing plate 2, ] a case, For obtaining disclosure magnetic field of about 200 gausses or more required for sputtering, a target must be made into a thickness of 0.7 mm or less, in a 2 mm or more-thick target, magnetic saturation is not carried out but a disclosure magnetic field is no longer obtained on the surface. By the thing of the present invention, magnetic field generator 3 which about 200-gauss disclosure magnetic field is obtained with a target a little less than 5 mm thick as for Then, can be equal to prolonged sputtering since the thickness is comparatively large, and has a magnetic field below a magnetic saturation value can be used, carrying out a deer. If ferromagnetic 1a and small interval 5 between 1a are not much large, plasma will invade to the inside, Although sputtering of the backing plate 2 is carried out, this adheres to a substraight as a foreign substance and it is not desirable, Plasma does not invade in this small interval 5, without being influenced by argon gas pressure, if this small interval 5 shall be about 3 mm or less so that it may be seen to field C of Drawing 4, therefore sputtering of the backing plate 2 is not carried out. Field D of the illustration shows the range which has invasion of plasma in this small interval 5. It turns out that a next door and high discharge current peculiar to high-speed sputtering are acquired as the electric discharge characteristic when ferromagnetic 1a is made into 5 mm in thickness and a 5-mm-wide square and small interval 5 is 1 mm is shown in curves E thru/or J of Drawing 5. In this, the argon gas pressure of curve E is 1x10.^-2(Torr) and F are 7x10.^-3G is 5x10.^-3H is 3x10.^-3I is 1x10.^-3J is 5x10.^-4The case of (Torr) was shown and, in the case of curve G, 6100A/mm precipitation speed was obtained by 630V and 8A. After carrying out bonding of the plate-like ferromagnetic target to a backing plate as a means to form small interval 5, Constituting target 1 which cuts only the target like Drawing 6 or the 7th illustration, forms small interval 5, and consists of ferromagnetic 1a of a small unit as much as possible is also considered, In this case, although small interval 5 does not intersect perpendicularly to a magnetic field in the direction of X-X, and the direction of Y-Y, since the magnetic field equivalent to the vectorial sum of the disclosure magnetic field from a plurality of small intervals 5 which cross a magnetic field occurs, there is no practical trouble. Magnetic field generator 3 is arranged in the direction of an axis at the center, and ferromagnetic 1a which surrounds the circumference and has small interval 5 may be provided, and it may be considered as a cartridge like the 8th illustration, and may constitute at ferromagnetic target 1 suitable for a same axle type sputter device. The magnetic field from magnetic field generator 3 which acts from behind ferromagnetic target 1 for explaining the operation produces the disclosure effect comparatively strong against the surface by constituting small interval 5 of 3 mm or less which crosses a magnetic field for the target 1 from two or more ferromagnetics 1a of the small unit arranged by consisting, When impressing and carrying out sputtering of the cathode potential to the target 1 and a substraight, plasma density is raised by the disclosure magnetic field, and sputtering of the ferromagnetic 1a is carried out at high speed. Since it constituted from two or more ferromagnetics of the small unit which consisted and has arranged the small interval of 3 mm or less which crosses the magnetic field of a magnetic field generator for the ferromagnetic target of each other at least when based on the present invention in this way The magnetic field of the magnetic field generator of the target in back may make the surface on which Then also countered the substraight of the target below with the magnetic saturation value of the target produce a comparatively big disclosure magnetic field. Since a cheap magnetic field generator with a comparatively weak magnetic field can be used and thickness of a target can be increased 5~7 times compared with the conventional series tabular target, the endurance may be raised, There are effects, like sputtering of a ferromagnetic can be performed, without moreover making a foreign substance mix well continuously.

[Brief Description of the Drawings]

Drawing 1 -- the cutting side view of one example of a present invention device, and Drawing 2 -- the -- a part -- a cutting perspective view, In the diagram and Drawing 5 in which Drawing 3 shows the characteristic curve figure of a disclosure magnetic field, and Drawing 4 shows the relation between a small interval and plasma invasion, the characteristic curve figure and Drawings 6 and 7 of discharge current show the top view of other examples of a present invention device, respectively, and Drawing 8 is a cutting side view of one example of further others of a present invention device. 1 ...... ferromagnetic target, 1 a ...... ferromagnetic, 3 ...... magnetic field generator, 5 ...... smallness interval.