Agent for removing oxidizable harmful substance and its removal method
Abstract
PURPOSE:To remove oxidizable harmful substances efficiently by bringing gases into contact with a molded clay body containing semiconductor having a forbidden band of a specific range, while ultraviolet rays are being applied to said body. CONSTITUTION:A semiconductor of zinc oxide, tungsten trioxide, etc., which has a forbidden band of 0.5 to 5eV, i.e., a semiconductor which effects photocatalytic reactions, is used. And said semiconductor is added to clay such as kaolin, illite, etc., to form a molded clay body. Gases containing oxidizable harmful substances are brought into contact with the molded clay body thus obtained, while at the same time ultraviolet rays are applied thereto. As a result, the oxidizable harmful substances can be removed efficiently and further activity in removing those substances will not fall over a long period of usage.
Term
Term ended
Projected expiry passed 14 April 2009, 17.4 years ago.
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- Published
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- Today
2 claims: 2 independent, 0 dependent
- 1[Claim(s)] 1 A removing method of an oxidizing toxic substance in the gas contacting gas containing an oxidizing toxic substance on a clay fabrication object which added a semiconductor which has a prohibition belt width of 0.5~5 eV, and irradiating it with ultraviolet rays.
- 22 An oxidizing toxic substance removal agent which is a forming object consisting of powder and clay of a semiconductor which has a prohibition belt width of 0.5~5 eV.
Independent claims2
6 paragraphs, as filed
[Detailed Description of the Invention]
[Industrial Application] The present invention relates to the method of removing oxidizing toxic substances, such as a growth promotion ingredient harmful to preservation of the bad smell ingredient or the stimulative ingredient and garden stuff in gas, or flowering plants, and the removal agent of the toxic substance.
[Description of the Prior Art] In recent years, the bad smell and the stimulative ingredient which occur at the time of the waste in the bad smell, not only a stimulative ingredient but the home, and restaurant which occur industrially, or cooking are posing a problem with improvement in a life level, or upgrading of food taste. Since commodity value is reduced, it is not preferred the garden stuff of the degree of maturing always fresh or optimal about garden stuff or petals on the other hand or that maturing advances in a distribution process in new garden stuff or flowering plants seasonally or geographically. The main ingredients of these toxic substances are as a ■ bad smell ingredient, There are hydrogen sulfide, ammonia, mercaptan, amine, aldehyde, etc., as a ■ stimulativeness ingredient, there are aldehyde, ozone, etc., such as formaldehyde and Acrolein, and there are ethylene etc. which are plant growth hormone about preservation of ■ garden stuff or flowering plants. In order to remove these detrimental constituents, it is activated carbon about ■ detrimental constituent conventionally, the method of making it sticking to porous material, such as alumina, silica gel, and zeolite, the method of neutralizing the detrimental constituent of ■ acidity (base) by a basic (acidity) substance, and ■ detrimental constituent -- "C, such as permanganic acid Cali Lamb and a chlorine dioxide, -- the method of oxidizing chemically, etc. are known. However, the method of kneading is not necessarily b thing in satisfaction. That is, in the method of ■, they are basic substances, such as Ann-T': and A : - r - It is prodigal and the adsorption ability of > is - (' there is nothing) enough. ": It is, when last A 1' damage ingredient is restricted to the compound which the problem that tand1, and Sucking fish are restricted uses for 1 dust and the method of Q by removal by -], and there is a - fault, and the method of ■ has the fault that removal speed is slow. In ff damage substance removal agent of This tt and others, the ff'16 adsorption capability and oxidization capability although there are also many filter-ized L 'r' and examples currently used, or since it is not revitalized, removal ability j surely has a fault in which short 1 This saturation point appears. 1 boat-fishing ''r In the case of filter-izing, that of 1 This fixation *zeta To, such as non-Purification, .. and 2 Cut, and Like support, is although it is at by; and A -, such as toxic substance removal agent 1, >7 Panox, organic system Viscosity, an adhesive, and water glass, There is a fault which these binders cover and carry out the surface of a suicide substance removal agent, and cannot be demonstrated in removal ability wall 10 minutes with sufficient 1.
The object of the subject 1 present invention which carries out [invention 4. and De solution 141 When, ' obtaining -- 1 inside-of-the-body fX:Including J:J''l To omega and wabi -- hydrogen and Ann- -- 2 gamma and melt A pig / gamma Min And (Evil moxa ingredient and Holum ("), such as /'r J Reso i Bouto) '' roux F l Nido, stimulative ingredients, such as bitter taste rl l and an inn, and ozone, -- and -- Eto(ing) -- oxidizing toxic substances, such as a A island and which plant growth hormone, -- simultaneous 1.- quick -- efficient -- Removal -- 112, -, or Chi and use 1'': -- removal -- it is in whether it is active and providing 1rho power tA[ fall ] ■ and the removal agent of the toxic substance.
Useless means 1 to solve [R title these artificers are lines about research wholeheartedly that this object should be achieved -- a result -- a specific compound -- a content 1. Clay fabrication object -- ultraviolet rays -- glaring -- while -- this -- the inside of gas -- Including 1 -- contacting or passing the worn oxidizing toxic substance, It is :' even if the oxidizing toxic substance of This il(s) uses [ whether it is also 1- or ] it in removal efficiently for a long time, oxidizing One:suicide lumber room [ of the compound of straw ] I: -- a person -- Removal activity 11 (it is based on the knowledge of To and Is out 171.- that - does not fall, and it is Reached t-0, i.e., the present invention, for completing the present invention) to -t carry out It is on a Including'h-;-Clay fabrication object about the semiconductor which has a prohibition belt width of 0.5~5 eV, acid A 1 and sex tI damage animal matter 4-8'-4" -- Gas -- contact -- it is an offer-Condone thing about a removal ("4and5 feature and Great finance * method of oxidizing toxic substance in the gas and using A and irradiation 4 To [ Purple line ] for kneading 2) agent. 'r with present invention smell 1+r Jl, l Need t] To 0, 5~5-eV Prohibition", and belt width : About f-conductor, A photocatalytic reaction is with a Beef cattle semiconductor, and it is a prohibition belt width 4 Possession ''' thing of AJ and L, < li, and 1-3 e V, and is specific one of -ll Nehru of the prohibition belt width of semiconductor 1-A, with 7J-, From 5-irradiation 4 To and one lot:, J To, and a Price A belt to conducting zone: ... 1. / Electricity, -1 excitation or raw 1 *, valence electron Coast 1 electron hole, conducting zone (- Electricity is '4-To complete.) the electron hole of Naturally l J and '[and others, Electricity, and a child -- semiconductor l (it is a photocatalytic reaction of 1-m [, such as diffusion, ], J:person expression J"l, gaseous phase, and liquid phase-C to a field fi'') -- things -- ' (Jl et al. [ 4t /] ]: be .. *'), considering it as y4 body which present-invention 1." Adventure 1" is -- coming out -- Park 1 of s with an operation of 1-6 account, and ' restrictions -- there is nothing -- use ' Be empty -- 41-1 (Si and~ (The)), Tin Oxide"--A and acid (E, zinc 22' oxidization evening) Kukuno"A-, - titanium oxide, f9 A acid barium and oxidization the 9', Iron example Maid style-ized help of H"+7 metal-oxide-, A bell, Conversion cadmium, a lead sulfide, S 1- and A-ized zinc, and selenium-ized power ] * Mi west l Which metal power Luke GenaiI! The ■ Family matter:, for example, Gallium phosphates, such as;, for example, Solini"1 A, and -'I Ru, Four conductors can be used by how many set semiconductor and those other, such as III -V fellows compound semiconductor [, such as gallium arsenide, A>, Zymolin, ]:, for example, polyacetylene, Bolivi iJ, -, l7, and Polythio 7 dish >', poly aniline, and Boris nil carbazole. : t f:, with" - the quoted semiconductor -- impurities, such as arsenic, Lynn, aluminum Nium, boron, f-h Rium, and Ha 1 Huge! - The carries out and it can do [ Ri(ing) - using t-thing similarly or ]. A from 1 (it To 1- uses and they are zinc oxide, and ':T oxidization evening: and Getsten at 5-'t' conductor and 17) book especially a metal oxide and its mix crystal things, such as lower 7 Drunk-ized titanium and cerium oxide, being preferred, and measuring support Sly 5 Nino:i This 5L To and Toward" 2 of a catalytic effect for the precious metals, such as platinum, on the semiconductor surface of p Uz soil and iI'i -- last . . adsorbent [, such as activated carbon, oxidization white -, etc.", ] ';" : (I -- it may take 'f1.) As clay of the clay fabrication object used in the present invention, the clay currently used in a fire-resistant thing, pottery, paper manufacture industry, rubber industry, etc. can be used, for example, and anything can be used, if the water of an adequate amount is mixed and kneaded, reversibility is shown, it dries and rigidity is shown. The thing covering the shape of fine sand [ colloid ] in particle diameter can be conveniently used for the clay used for the present invention, for example, including the argillite which consists of hydrous silicates, such as kaolin, Smeg tightness, illite, chlorite, and Allophane, one or more kinds. Since reversibility comes out with little water in these, the clay containing many kaolin, illite, and chlorite can be used conveniently. Other deodorants, adsorbent, etc. can be used for clay with a semiconductor, mixing them. Since an active point is not deactivated as an advantage using a clay fabrication object unlike support-object-closing water supply condensation objects, such as other binders, such as latex, an organic system adhesive, and water glass, gypsum, cement, and using them, Original toxic substance removal ability of a semiconductor is not dropped, but it is in making a contrary carry out considerable improvement rather. Such a remarkable desirable operation takes place, In the case of a clay fabrication object, in that the binder itself, water, etc. do not cover the semiconductor surface like [ in the case of using other binders ], or the amount of said-semiconductors, it can distribute from the case where a semiconductor is used with powder, to a nearby large area, and can presume because irradiation area of light can be enlarged. the content rate of the semiconductor of the clay fabrication inside of the body used in the present invention -- If thick from performance -- it is so good that it is large. However, in order to maintain the original reversibility of clay, and fabrication nature, 80% or less of the content of a semiconductor is desirable, and in order to give especially mechanical strength, 70% or less is preferred. The circumference of a light source is equipped with a base material, and this is pasted, or the clay fabrication object which added the semiconductor used in the present invention is fixed with a screw, a bolt, etc. The clay fabrication object itself can also be installed in the circumference of a direct light source. As shape of the filter used in the present invention, although a porous flat film type, a honeycomb type, the restoration type in the filter style dead body, etc. are mentioned, it is not limited to these. Although the ultraviolet rays used in the present invention have preferred Near ultraviolet whose wavelength is 400~200 nm from a point of reaction efficiency, even if vacuum ultraviolet rays of 200 nm or less other than this range are included, they do not interfere. Although these ultraviolet rays may generate an ultrahigh pressure mercury lamp, xenon light, and a low-pressure mercury lamp by independent or using together, It is improved so that it may have the wavelength distribution characteristic which made the third ingredient, mercury, gallium other than rare gas, thallium, etc., live together in a discharge tube, and agreed for the object, and t; light source may be used. Of course, the thing containing light other than ultraviolet rays, for example, visible light, can also be used. If possible, a filter is the neighborhood and it can install the ultraviolet-rays lamp used for irradiation of a filter in the present invention in the inflow direction and/or the outflow direction of gas or a fluid. It may be installed in the inside of a filter. Since the dirt on the surface of a lamp is prevented, it can install towards the outflow direction preferably especially. The method of the present invention may introduce processed gas into a specific reaction machine, and may carry it out by the batch method or a continuation method method, and it may install and carry out continuous processing to a circulation system etc. An open system or a sealing system may be sufficient as the reaction machine used in the present invention, and the ventilation system which uses a fan for a reaction machine and ventilates it may be sufficient as it. The amount of the semiconductor used changes with the kinds of oxidizing toxic substance, the composition and the mixture ratio, and the kinds and the amount of the electric power used of the light source used used as the filter made to constitute from a clay fabrication object used in the present invention, and the clay fabrication object, and the size shape of the passage before and behind that and an object, and is not restricted in particular. The oxidization removal reactions by the filter and - of the present invention are SOx and nitrogen oxide, media, such as various toxic substances, such as a hydrocarbon compound and a halogenated compound, water, and an organic solvent, -- Engineering1zetaAi': 1., -Ci, and" -- 1-, and the Wash away method of the toxic substance with which it came out and the removal reaction of performance is stable in # (very r [ i since he is absorbed ]) and () without Also disturbing ':5 Re. The example (J) of '!!! Application a following 5. Do invention -- an example -- J persons -- further -- detailed -- explanation phi 61 -- J-] The part in * and an example, and ? and 6! It is the amount standard of L. Example 1, comparative example 1 The titanium dioxide of the quantity shown 1st table 17, and Kasaoka ViscosityJ - water 109 -- Ssuke[-- adding, after kneading 1 and -9 town plasticity have come out by Miki One -, an aperture uses Mi and - A f" saliva- of the decimal of 3~ and 4upsilon -- What of a clay kneading thing -- [ .. preparing Tuto -- , -- 2 . this What 127j- is dried between IIl? by 100 degreeC, in j and the back, JLf3 about 11 Flu sorts out, and it is * Flu i-Remaining - let a thing be a sample -- t and ::. 7 describing 5 g of obtained samples 80 mQ - Ile 7 TASS -- Gang -- "l, and Made - and an angle" -- it acted as a government official into Lascaux, the inside of a 22 angle flask was replaced with the air containing Engineering f-1- with a concentration of 85 ppm and *, and it sealed with> To and] Rubber cork after t *. Next, 1 to 12 angle 73-Soe and :"0 (it is - ultrahigh pressure mercury lamp (illumination I Q m W) about front Place and Facial expression J*1 to 14 Dissolution of :m) /'Cm= and main e'A 365 n m are irradiated with J:Lyot angle flask, and it is a variation per hour of the concentration of Engineering 'gL-A in a container with gas chromatography! Addition741. It is Showt to the 1st table about -1 Connection psi. (Following space) The result of the 1st table shows that the clay fabrication object of the present invention is excellent in ethylene removal performance compared with the case where Knee-ized titanium or a clay fabrication object is used by Nest German. Example 2~5 By the same method as Example 1, the sample which kneaded and prepared the 2nd table j This semiconductor by Kasaoka clay and l versus l was changed into the thing of the display of the kind of detrimental constituent in the air, and the removal experiment was conducted. The result was shown in the 2nd table. Comparative example 2~5 Corresponding to Example 2~5, in the state where there is no semiconductor, the quality assessment experiment was conducted by same operation, and the result was shown in the 2nd table. The result of the 2nd table shows that the clay fabrication object of the present invention shows a remarkable removing effect to various toxic substances, even if it changes the kind of semiconductor. (Following space) Example 6 It prepares like Example 1 from an equivalent amount of 2 oxidization f-Tarr 2-, and clay, and is t:Viscosity 1. - Whati -- / r 109 The air which inserts with the rubber plug made of Silico> rubber which filled up with 14 mm in inside diameter in the glass tube made from by mu-? Kusugasu of length locm, and made the both ends of 1 and this pipe penetrate a thin glass tube, creates a filter, and contains the detrimental constituent of the first concentration of the 3rd table of j- Ah is generated with a gas generator, a cylinder, etc., It is made to flow from one thin Ga ' Tess pipe, flows out of another side, and is Seriously. It That and is measurement 11. It was at all the concentration Gas chromatograph"? prickle Rough Eee of the detrimental constituent in the air of the population of a The filter, and an exit. In that case, a filter part is irradiation 1. It was from a glass tube about ultraviolet rays to 20-cm distance by more than two installation To ht ultrahigh pressure mercury lamp illumination lO1'nW/cm and dominant wavelength 365nrn. The result of the 3rd table shows that various kinds of 14 damage substances are efficiently removable by passing a restoration l5t-filter for the clay fabrication object of the present invention. (With, 1zeta space) Example 7~8, comparative example 6~7 In order to compare the difference in the removal ability by the forming process or the support method, be shown in the 4th table, ■ Titanium dioxide powder (made by Japanese Aerosil) ■ titanium dioxide honeycomb fabrication object (made by KYOCERA CORP.) ■ titanium dioxide support gypsum ■ titanium dioxide support cement of clay Vered ■ marketing which kneaded and prepared a titanium dioxide and Kasaoka clay by 1 to 1 ■ On the case where he has no commercial porous polyurethane (made by PRIDISON) ■ support, the removal experiment of the ethylene using the Erlenmeyer flask of 80txl and methyl mercaptan was conducted like Example 1. The result was shown in the 4th table. Beforehand, gypsum and cement added and fityfl(ed) water in the predetermined size (section 3x3CIIl!, length 4 cm), and while the surface was still soft, they support a titanium dioxide in the specified quantity, and carried out natural seasoning, and it made them into the sample. Porous urethane used the urethane system adhesive (Asahi electrification company) for the porous polyurethane honeycomb, supported the titanium dioxide in the specified quantity, carried out it, and was taken as the sample. (Following space) 3x5x0.5 cl is cut to 13. The result of the 4th table shows that others make a titanium dioxide support carrier 17, and the clay fabrication object of the present invention excels t'' and a case in the removal performance of a Na 1 damage substance. Example 9 and comparative example 9 '# Geometry example -- putting Titanium dioxide support Clay 1. Tent for 2''r experiment l * into triangular 7 Russ Nico of 30+u! like Example 1 ultraviolet exposure Nana started L21 after adding generating Sensei t-talent Zon with a commercial ozone generating device so that it may be set to around one 100ppn, and detecting tube N0181 by a gas tic company -- it came out and investigated the variation per hour of J Singh concentration. The result was shown in the 5th table. In that case, the time base range of a detecting tube is narrow (0, 1ppn.). By that [ ~31rm ], it diluted and measured 16 times. Comparative experiments performed similarly ? quality assessment which receives ozone using the removal agent of a display. A 5th table 1 Ha result shows having the performance which was [ but ] excellent in Viscosity-4- of the present invention, and a forming object to ozone removal. Example 10 the same clay fabrication object 5g as having used in Example 2A -- by 1/Socks glass triangular A flask 1, and - supplying and carrying out -- the inside of an Erlenmeyer flask -- the nib of 10OOOpprn -- it replaces continuously with the air containing j/A. Like [ after Gothic l / A i[in Flask are stabilized in 1o00oppin ] Example 11, start j, It was and A book, and ethylene concentration close an ultraviolet exposure, and reduction I7 is half ML a 2 hours after and It was. on the other hand, the experiment same about activated carbon / '-Nicam fabrication object -- To go I- and time -- the start -- several100p p n' -- the concentration fall of one -- Mira#1 -- but -- 1 hour after -- almost - and a law -- reaching a value -- it -- In -- concentration -- low -- 1 : + -- there was nothing. Potassium permanganate (even if attached two, in ethylene concentration, Going t- hardly decreased the same experiment.) As for Viscosity A, -, itl of the present invention, and a form, from these results, toxic substance removal activity is Samurai(ed) by the ultraviolet exposure FfDecember1. '. When is known.
[Effect of the Invention] According to the present invention, it compares with conventional technology, and they are hydrogen sulfide, Ammonia, and Merca Buta, - amine and the gas which Alde and contains Ethi 1-A harmful to preservation of stimulative ingredients, such as bad smell ingredients, such as Do, formaldehyde, Acrolein, garden stuff, and flowering plants etc. -- the kind of toxic substance -- not related -- simultaneous -- quick -- efficient -- To remove -- it can But and, moreover, removal activity does not fall. The method of the present invention has high safety and is large in the range of an applicable toxic substance, [ of safety ] Since a removal reaction occurs without being blocked, even if media, such as various toxic substances, such as SOx, nitrogen oxide, a hydrocarbon compound, and a halogen-containing compound, water, and an organic solvent, moreover live together, the performance is extremely stable, and there is systematization in an easy advantage. Applicant for a patent! 1 Zeon stock meeting nail
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| JPH07171408A | Cited by | Japan | Search report |
| US6277346B1 | Cited by | United States of America | Applicant |
| US6498000B2 | Cited by | United States of America | Applicant |
| JPH09225396A | Cited by | Japan | Search report |
| JP2007289955A | Cited by | Japan | Examiner |
| JPS60187322A | Cites | Japan | Search report |
| JPS6380833A | Cites | Japan | Search report |
| JPS6411622A | Cites | Japan | Search report |
3 priority claims, no other members on record
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 9588789 | Japan | A | |
| 1095887 | – | – | – |
| JP19890095887 | – | – | – |
4 legal events, as the office reported them to INPADOC
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| Cancellation because of no payment of annual feesLAPS | LAPS | |
| Renewal fee payment (event date is renewal date of database)FPAY | FPAY | |
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| Written request for registration of change of domicileJAPANESE INTERMEDIATE CODE: R313531S531 | S531 |
Numbers
- Publication
- 2-273514
- Publication, DOCDB
- H02273514
- Publication, EPODOC
- JPH02273514
- Application
- 1095887
- Application, DOCDB
- 9588789
- Application, EPODOC
- JP19890095887
Titles2
- Japanese
- 【発明の名称】被酸化性有害物質の除去剤及び除去方法
- English
- AGENT FOR REMOVING OXIDIZABLE HARMFUL SUBSTANCE AND ITS REMOVAL METHOD
Classification
- IPC, 5
- B01D53 34
- B01D53 38
- B01D53 86
- B01J35 02
- A61L9 20