JPH02273514A

Agent for removing oxidizable harmful substance and its removal method

Abstract

PURPOSE:To remove oxidizable harmful substances efficiently by bringing gases into contact with a molded clay body containing semiconductor having a forbidden band of a specific range, while ultraviolet rays are being applied to said body. CONSTITUTION:A semiconductor of zinc oxide, tungsten trioxide, etc., which has a forbidden band of 0.5 to 5eV, i.e., a semiconductor which effects photocatalytic reactions, is used. And said semiconductor is added to clay such as kaolin, illite, etc., to form a molded clay body. Gases containing oxidizable harmful substances are brought into contact with the molded clay body thus obtained, while at the same time ultraviolet rays are applied thereto. As a result, the oxidizable harmful substances can be removed efficiently and further activity in removing those substances will not fall over a long period of usage.

Term

Term ended

Projected expiry passed 14 April 2009, 17.4 years ago.

  1. Priority and filed
  2. Published
  3. Projected expiry
  4. Today

2 claims: 2 independent, 0 dependent

  1. 1
    [Claim(s)] 1 A removing method of an oxidizing toxic substance in the gas contacting gas containing an oxidizing toxic substance on a clay fabrication object which added a semiconductor which has a prohibition belt width of 0.5~5 eV, and irradiating it with ultraviolet rays.
  2. 2
    2 An oxidizing toxic substance removal agent which is a forming object consisting of powder and clay of a semiconductor which has a prohibition belt width of 0.5~5 eV.