Abrasive article having a non-uniform distribution of openings
11 claims: 11 independent, 0 dependent
- 1アパーチャパターンに配置された複数のアパーチャを有する被覆研磨材を含み、アパーチャパターンは、 いくつかの時計回り螺旋、およびいくつかの反時計回り螺旋を有し、時計回り螺旋の数および反時計回り螺旋の数は、フィボナッチ数、またはフィボナッチ数の倍数である 、研磨物品。
- 2時計回り螺旋の数および反時計回り螺旋の数は、黄金比に収束する比である、請求項 1 に記載の研磨物品。
- 3アパーチャパターンは、以下の式による極座標において記載され:式中: nは、アパーチャパターンの中心から外側に数えた、アパーチャの順次番号であり;φは、リファレンス方向と、アパーチャパターンの中心にて始まる極座標系における第n番目のアパーチャの位置ベクトルとの間の角度であり、任意の連続する2つのアパーチャの位置ベクトル間の開度は一定の角度αであり;rは、アパーチャパターンの中心から第n番目のアパーチャの中心までの距離であり;cは、一定のスケーリングファクタである、請求 項1 に記載の研磨物品。
- 4アパーチャの少なくとも約51%、少なくとも約70%、少なくとも約85%は、式1と一致する、請求 項3 に記載の研磨物品。
- 5アパーチャパターンは、極座標において、開度が約100°から約170°に及ぶ、請求 項3 に記載の研磨物品。
- 6アパーチャパターンは、開度が137.508°である、請求 項3 に記載の研磨物品。
- 7総アパーチャ面積の少なくとも約80%、少なくとも約85%、少なくとも約90%は、式1と一致する、請求 項3 に記載の研磨物品。
- 8アパーチャは、研磨表面の最長寸法の約0.25%から約5%に及ぶサイズを有する、請求 項1 に記載の研磨物品。
- 9第1主要面および第2主要面を有するバッキング層と;第1主要面に配置される研磨層であって、バインダおよび複数の研磨粒を含む研磨層と;バッキング層および研磨層を突き通る複数のアパーチャであって、 いくつかの時計回り螺旋、およびいくつかの反時計回り螺旋を有し、時計回り螺旋の数および反時計回り螺旋の数は、フィボナッチ数、またはフィボナッチ数の倍数である アパーチャパターンに配置される、複数のアパーチャとを含む被覆研磨物品。
- 10バッキング上に研磨層を配置する工程と;研磨層およびバッキングを突き通して複数のアパーチャを生じさせる工程とを含み、 アパーチャは、 いくつかの時計回り螺旋、およびいくつかの反時計回り螺旋を有し、時計回り螺旋の数および反時計回り螺旋の数は、フィボナッチ数、またはフィボナッチ数の倍数である アパーチャパターンに配置される、研磨物品を製造する方法。
- 11被覆研磨材と; バックアップパッドと:を含む研磨系であって、 被覆研磨材は、アパーチャの分布が いくつかの時計回り螺旋、およびいくつかの反時計回り螺旋を有し、時計回り螺旋の数および反時計回り螺旋の数は、フィボナッチ数、またはフィボナッチ数の倍数である パターンを含み、 バックアップパッドは、被覆研磨材のアパーチャと対応するように構成されたパターンに配置された、複数のエアフロー経路を含む、研磨系。
Independent claims11
83 paragraphs, as filed
The present disclosure relates to abrasives in general, especially abrasive articles having a pattern of openings, the pattern of which is a non-uniformly distributed pattern.
Polished articles (such as coated abrasive articles) are used in various industries to polish workpieces by hand or by mechanical processes (such as by wrapping, grinding or polishing). Machining with polished goods ranges from the optical industry, automotive paint repair and metal manufacturing industries to construction and carpentry, for a wide range of industrial and consumer applications. Machining (such as by hand or by using commonly available tools (such as by using orbital polishers (both random and fixed shafts), and belt and vibrating sanders)) is also used by consumers for home use. It is commonly done in. In each of these examples, the use of abrasives removes surface material from the polished surface and affects surface properties (eg, flatness, surface roughness, gloss). In addition, different types of automated processing systems have been developed to polish articles of different compositions and configurations.
Surface properties include, among other things, brilliance, texture, luster, surface roughness, and uniformity. In particular, surface properties such as roughness and gloss are measured to determine quality. For example, when coating or painting a surface, certain imperfections or surface imperfections can occur during the application or curing process. Such surface imperfections or surface imperfections may include pock marks, "orange peel" textures, "fish eyes", or enclosed air bubbles, and dust imperfections. Usually, such defects on the painted surface are achieved by sanding first with a coarse-grained abrasive and then with a finer-grained abrasive, and the desired smoothness is achieved. Is removed by further buffing with a wool or foam pad. Therefore, the properties of the polished article used will generally affect the surface quality.
In addition to surface properties, industry players are sensitive to the costs associated with the polishing operation. Factors that affect operating costs include the rate at which the surface can be prepared and the cost of the materials used to prepare the surface. Industry professionals are usually looking for cost-effective materials with high material removal rates.
However, abrasives that exhibit high removal rates often exhibit poor performance to achieve the desired surface properties. Conversely, abrasives that provide the desired surface properties often have a low material removal rate. For this reason, surface preparation is often a multi-step process using various grades of polishing sheets. Surface scratches (eg, scratches) introduced by one step are usually repaired (eg, removed) in one or more subsequent steps with a finer grain abrasive. Therefore, abrasives that introduce scratches and surface scratches result in increased time, effort and material expenditure in subsequent processing steps, as well as an overall increase in total processing costs.
A further factor affecting material removal rate and surface quality is "swarf", the "loading" of the abrasive with material polished from the surface of the workpiece. This material tends to accumulate on the surface of the abrasive particles and between the abrasive particles. Loading is not desired. This is because it can have a negative impact on surface properties, usually by reducing the effectiveness of the ground product and also by increasing the likelihood of scratch defects.
Various efforts to reduce the accumulation of shavings (introduction of fluid on the surface of the workpiece to wash away shavings, application of a vacuum system to carry away shavings as they are generated, etc.) Although done, there continues to be a demand for improved, cost-effective polishing articles, processes and systems that facilitate efficient polishing and improved surface properties.
The present disclosure may be well understood by those skilled in the art by reference to the accompanying drawings, and many features and effects thereof may become apparent.
<figref num="1">FIG. 5 is a diagram of an exemplary embodiment of a coated polishing disc having an aperture pattern in which the distribution of apertures according to the present invention is non-uniformly adjusted.</figref><figref num="2">FIG. 3 is an explanatory diagram of a phyllotactic helix pattern with clockwise and counterclockwise diagonal rows according to the present invention.</figref><figref num="3">FIG. 3 is another explanatory view of a leafy spiral pattern with clockwise and counterclockwise diagonal rows according to the present invention.</figref><figref num="4">It is explanatory drawing of the Vogel model according to this invention.</figref><figref num="5">5A to 5C are explanatory views of a leafy spiral pattern that matches the Vogel model having a different opening according to the present invention.</figref><figref num="6">6A to 6F are explanatory views of an exemplary embodiment of an aperture slit shape according to the present invention.</figref><figref num="7">It is explanatory drawing of the cross-section part of the exemplary embodiment of the coated polished article according to this invention.</figref><figref num="8">It is a graphic image of an exemplary embodiment of an aperture pattern having 148 apertures according to the present invention.</figref><figref num="9">FIG. 5 is an explanatory diagram of an exemplary embodiment of the transposition of the aperture pattern of FIG. 8 according to the present invention.</figref><figref num="10">FIG. 5 is an explanatory diagram of an exemplary embodiment according to the present invention of a backup pad that cooperates with the aperture pattern of FIG.</figref><figref num="11">It is a graphic image of an exemplary embodiment of an aperture pattern having 246 apertures according to the present invention.</figref><figref num="12">FIG. 5 is an explanatory diagram of an exemplary embodiment of the transposition of the aperture pattern of FIG. 11 according to the present invention.</figref><figref num="13">FIG. 5 is an explanatory diagram of an exemplary embodiment according to the present invention of a backup pad that cooperates with the aperture pattern of FIG.</figref><figref num="14">It is a graphic image of an exemplary embodiment of an aperture pattern having 344 apertures according to the present invention.</figref><figref num="15">FIG. 6 is an explanatory diagram of an exemplary embodiment of the transposition of the aperture pattern of FIG. 14 according to the present invention.</figref><figref num="16">FIG. 6 is an explanatory diagram of an exemplary embodiment according to the present invention of a backup pad that cooperates with the aperture pattern of FIG.</figref><figref num="17">17A to 17D are graphs of aperture coverage during orbital rotation of a given aperture pattern. 17B to 17D are graphs of aperture coverage during orbital rotation of a given aperture pattern, which are exemplary embodiments according to the present invention.</figref><figref num="18">18A-18D are graphs of aperture coverage during orbital rotation of a given aperture pattern. 18B-18D are graphs of aperture coverage during orbital rotation of a given aperture pattern, which is an exemplary embodiment according to the present invention.</figref><figref num="19">It is a chart comparing the polishing performance of an exemplary aperture pattern according to the present invention with the aperture pattern of the highest technical level.</figref><figref num="20">It is a chart comparing the polishing performance of an exemplary aperture pattern according to the present invention with the aperture pattern of the highest technical level.</figref><figref num="21">It is a chart comparing the polishing performance of an exemplary aperture pattern according to the present invention with the aperture pattern of the highest technical level.</figref><figref num="22">It is a chart comparing the polishing performance of an exemplary aperture pattern according to the present invention with the aperture pattern of the highest technical level.</figref><figref num="23">It is a graph which compared the polishing performance of the exemplary aperture pattern and collaborative backup pad according to the present invention with the highest technical level aperture pattern and the highest technical level backup pad.</figref><figref num="24">It is a graph comparing the polishing performance of a pair of an exemplary coated abrasive disc and backup pad according to the present invention with the combination of the highest technical level coated abrasive and backup pad.</figref><figref num="25">It is a graph which calculated the time to polish 10,000 square feet of a vehicle panel using an exemplary coated abrasive disc and backup pad according to the present invention, and compared it with a combination of the highest technical level coated abrasive and backup pad.</figref><figref num="26">It is a graph comparing the cutting efficiency for a vehicle panel with the combination of the coating abrasive and the backup pad of the highest technical level using an exemplary coated abrasive disc and backup pad according to the present invention.</figref><figref num="27">Another graph comparing the cutting efficiency for a vehicle panel with a combination of top-of-the-line coated abrasives and backup pads using other exemplary coated abrasive discs and backup pads according to the present invention.</figref><figref num="28">FIG. 5 is an explanatory diagram of an embodiment of a backup pad having a pattern of spiral paths (34 outer spiral paths and 8 inner spiral paths according to the present invention). The back pad pattern corresponds to a Vogel pattern with 151 apertures.</figref><figref num="29">It is explanatory drawing of another embodiment of the backup pad which has the pattern of the spiral path (34 outer spiral path and 8 inner spiral path) according to the present invention. The back pad pattern corresponds to a Vogel pattern with 251 apertures.</figref><figref num="30">It is explanatory drawing of another embodiment of the backup pad which has the pattern of the spiral path (34 outer spiral path and 8 inner spiral path) according to the present invention. The backpad pattern corresponds to a Vogel pattern with 351 apertures.</figref><figref num="31">It is explanatory drawing of the Embodiment of the backup pad which has the pattern of the spiral path (34 outer spiral path and 8 inner spiral path) according to the present invention. The backpad pattern corresponds to a Vogel pattern with 247 apertures.</figref><figref num="32">It is explanatory drawing of the Embodiment of the backup pad which has the pattern of the spiral path (34 outer spiral path and 8 inner spiral path) according to the present invention. The backpad pattern corresponds to a Vogel pattern with 346 apertures.</figref><figref num="33">It is explanatory drawing of the Embodiment of the backup pad which has the pattern of the spiral path (34 outer spiral path and 8 inner spiral path) according to the present invention. The back pad pattern corresponds to a Vogel pattern with 442 apertures.</figref><figref num="34">It is explanatory drawing of the polishing surface of embodiment of the coating abrasive which has 151 apertures (150 apertures surround a central aperture) according to this invention.</figref><figref num="35">It is explanatory drawing of the back surface of the same embodiment as shown in FIG. 34.</figref><figref num="36">It is explanatory drawing of the polishing surface of embodiment of the coating abrasive which has 247 apertures (246 apertures surround a central aperture) according to this invention.</figref><figref num="37">It is explanatory drawing of the back surface of the same embodiment as shown in FIG.</figref><figref num="38">It is explanatory drawing of the polishing surface of embodiment of the coating abrasive which has 251 apertures (250 apertures surround a central aperture) according to the present invention.</figref><figref num="39">It is explanatory drawing of the back surface of the same embodiment as shown in FIG. 38.</figref><figref num="40">It is explanatory drawing of the polishing surface of the embodiment of the coating abrasive which has 346 apertures (the 345 aperture surrounds the central aperture) according to this invention.</figref><figref num="41">It is explanatory drawing of the back surface of the same embodiment as shown in FIG. 40.</figref><figref num="42">It is explanatory drawing of the polishing surface of embodiment of the coating abrasive which has 351 apertures (350 apertures surround a central aperture) according to the present invention.</figref><figref num="43">It is explanatory drawing of the back surface of the same embodiment as shown in FIG. 42.</figref><figref num="44">It is explanatory drawing of the polishing surface of the embodiment of the coating abrasive which has 442 apertures (the 441 aperture surrounds the central aperture) according to this invention.</figref><figref num="45">It is explanatory drawing of the back surface of the same embodiment as shown in FIG. 44.</figref><figref num="46">FIG. 5 is an explanatory diagram of an embodiment of a single alignment (also referred to as double alignment) backup pad having 34 outer spiral paths and 8 inner spiral paths according to the present invention.</figref><figref num="47">It is explanatory drawing of the embodiment of the double alignment (also called quadruple alignment) backup pad which has 68 outer spiral paths and 8 inner spiral paths according to the present invention.</figref><figref num="48">FIG. 46 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the single alignment backup pad of FIG. 46, wherein the coated abrasive is 90 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="49">FIG. 46 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the single alignment backup pad of FIG. 46, wherein the coated abrasive is 180 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref><figref num="50">FIG. 46 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the single alignment backup pad of FIG. 46, wherein the coated abrasive is 270 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="51">FIG. 46 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the single alignment backup pad of FIG. 46, wherein the coated abrasive is 0 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref><figref num="52">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 45 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="53">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 90 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref><figref num="54">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 135 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="55">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 180 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref><figref num="56">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 225 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="57">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 270 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref><figref num="58">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 315 degrees from the backup phase. Rotating, the covering abrasive aperture does not correspond to any of the outer spirals of the backup pad.</figref><figref num="59">FIG. 47 is an explanatory view of an embodiment of a coated abrasive having 442 apertures (441 surrounding the central aperture) according to the Vogel equation covering the dual alignment backup pad of FIG. 47, wherein the coated abrasive is 0 degrees from the backup phase. In rotation, almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad.</figref>
The use of the same reference numerals in different drawings indicates that the members are similar or the same.
In embodiments, the abrasive article comprises a coated abrasive having a plurality of holes (hereinafter also also referred to as "pertures" or "apertures") arranged in a non-uniformly distributed pattern. The aperture pattern may be any pattern whose distribution is non-uniformly adjusted, including radial patterns, helical patterns, foliar patterns, asymmetric patterns, or combinations thereof. The pattern may be partially, substantially or completely, asymmetric. The pattern may cover the entire polished article (ie, distributed throughout), may substantially cover the entire polished article (ie, greater than 50% but less than 100%), and may be large in the abrasive article. It may cover a portion or only a portion of the polished article.
"Distribution is non-uniformly adjusted" means that the aperture pattern is asymmetrically adjusted (ie, randomly adjusted). This is such that the aperture distribution can be explained or predicted, for example, by the equations of radiation, helix, and leaf order, but the aperture pattern still shows at least partial asymmetry to complete asymmetry.
The asymmetry adjustment may be mirror asymmetry (also called mirror symmetry, line symmetry and left-right symmetry) adjustment, rotational asymmetry adjustment, translational symmetry adjustment, projection symmetry adjustment, or a combination thereof. Examples of non-uniform distribution can be demonstrated for rotational symmetry on the order of 1 for radial, helical, or foliar aperture patterns. This means that such an aperture pattern does not have rotational symmetry (because the aperture pattern repeats itself only once while rotating 360 ° around its center). In other words, if two copies of the same exact pattern directly overlap each other, and one copy is retained unchanged, while the second copy rotates 360 ° around its center, the openings in both copies. Everything will be aligned only once during the 360 ° rotation.
Normally, all apertures of an aperture pattern (ie, all patterns) will be adjusted asymmetrically. However, as an aperture pattern according to the present embodiment, it is considered that an aperture pattern in which only a part of the total number of apertures of the aperture pattern (that is, a part of the pattern) is asymmetrically adjusted can be mentioned. Such may occur, for example, by combining or substituting parts of a uniformly distributed pattern, or a completely random pattern, the pattern being adjusted to be non-uniformly distributed. Only a part of the aperture of the aperture pattern is adjusted to have a non-uniform distribution. A portion of the total aperture that is non-uniformly adjusted may be quantified as a discrete number or as a fraction, percentage or ratio of the total number of apertures in the aperture pattern. In embodiments, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least of the aperture of the aperture pattern. 97%, at least 98%, at least 99%, at least 99.5%, at least 99.9% are asymmetrically adjusted. A portion of the aperture of the asymmetrically adjusted aperture pattern may be within a range that includes any pair of upper and lower limits. In certain embodiments, about 50% to about 99.9%, about 60% to about 99.5%, and about 75% to about 99% of aperture patterns are adjusted to be non-uniformly distributed.
In another embodiment, the aperture pattern is asymmetric over at least about 5 apertures, at least about 10 apertures, at least about 15 apertures, at least about 20 apertures, at least about 25 apertures, or at least about 50 apertures. It has been adjusted. In another embodiment, the aperture pattern is about 100,000 or less apertures, about 10,000 apertures or less, about 5,000 apertures or less, about 2,500 apertures or less, about 1,000 apertures or less, about 750 apertures or less, or about 500 apertures. It is asymmetrically adjusted below the aperture. The number of asymmetrically adjusted apertures may be within a range that includes any pair of upper and lower limits.
As described above, the aperture pattern of the present embodiment may be any pattern in which the distribution is non-uniformly adjusted, and includes a radial pattern, a spiral pattern, a foliar pattern, an asymmetric pattern, or a combination thereof. The radiation pattern can be any pattern that appears to radiate from the center point (spokes from the wheel hub, etc.).
In embodiments, the spiral pattern may be any curve, or set of curves, starting from a center point on the polished article and extending further away as it rotates around the center point. The center point may be positioned at or near the center of the polished article, or instead, it may be positioned away from the center of the polished article. It may be a single helix or multiple helices (ie, multiple helices). The helix may be discrete, continuous, separated or combined. Separated helices may start from different center points (ie, each helix has its own center point) or from a common center point (ie, each helix has its own center point). It may be a combination of these (sharing a center point). Spiral patterns include: Archimedes spirals; Euler spirals, Cornu spirals or clothoids; Fermat spirals; Duplex spirals; Richus; Logistic spirals; Fibonacci spirals; Golden spirals; or combinations thereof.
In embodiments, the pattern may be a foliar pattern. As used herein, "leaf inflorescence pattern" means a pattern associated with inflorescence. The inflorescence is the arrangement of lateral organs (leaves, flowers, scales, florets and seeds, etc.) in many plant species. Many leaflet patterns are characterized by eye-catching patterns (with arcs, spirals and swirls) of naturally occurring phenomena. Seed patterns in sunflower flower heads are an example of this phenomenon. As shown in FIGS. 2 and 3, a large number of arcs or helices (also called diagonal rows) have their origin at the center point (C) and travel outwards, while other helices occur. , The gap left by the inner spiral may be filled. Jean's Phyllotaxis A Systemic Study in Plant See Morphogenesis (p.17). Often, the spiral pattern arrangement can be seen to radiate outward in both clockwise and counterclockwise directions. As shown in FIG. 3, in these types of patterns, visibly opposed diagonal pairs can be represented by (m, n). Here, the number of spirals or arcs radiating clockwise away from the center point is "m", and the number of spirals or arcs radiating counterclockwise is "n". Furthermore, the angle between two consecutive spirals or arcs at their center is called the opening "d". Surprisingly, the inventors have found that the inflorescence pattern is useful for producing new aperture patterns for polished articles, especially coated polished articles.
In embodiments, the aperture pattern has some clockwise spirals, and some counterclockwise spirals, the number of clockwise spirals and the number of counterclockwise spirals being the Fibonacci number, or a multiple of the Fibonacci number. is there. In certain embodiments, the number of clockwise and counterclockwise spirals is the number of pairs (m, n): (3, 5), (5, 8), (8, 13), (13, 21). , (21, 34), (34, 55), (55, 89), (89, 144), or a multiple of such a pair. In another embodiment, the number of clockwise and counterclockwise spirals is the number of Lucas or a multiple of the number of Lucas. In certain embodiments, the number of clockwise and counterclockwise spirals is the number of pairs (m, n): (3,4), (4,7), (7,11), (11,18). , (18, 29), (29, 47), (47, 76) or (76, 123), or a multiple of such a pair. In another embodiment, the number of clockwise and counterclockwise spirals is any number of ratios that converge to the golden ratio, which is the sum of the square roots of 1 plus 5 divided by two. Equal to (1 + 5) / 2, approximately equal to 1.6180339887. In certain embodiments, the ratio of the clockwise spiral to the counterclockwise spiral is approximately equal to the golden ratio.
As already mentioned above, it has been observed in nature that the seeds of sunflower plants are arranged in a spiral lobe pattern. In an embodiment, the aperture pattern is a sunflower pattern.
The sunflower pattern has been represented by Vogel's model (a kind of "Fibonacci spiral", or a fixed Fibonacci angle (equal to 137.508 °) in which the opening between consecutive points is close to the golden angle). It was.
Figure 4 illustrates the Vogel model, which is:<maths num="1"><img id="000002" he="7" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></maths> And during the ceremony: n is the sequential number of florets counting from the center to the outside; φ is the angle between the reference direction and the position vector of the nth florets in the polar coordinate system starting at the center of the head, and the opening α between the position vectors of any two consecutive florets is constant. And with respect to the sunflower pattern, it is 137.508 °; r is the distance from the center of the head to the center of the nth floret; c is a constant scaling factor.
In embodiments, the aperture pattern is represented by a Vogel model, or a variant of the Vogel model. In certain embodiments, the aperture pattern is represented by the Vogel model: n is the sequential number of the aperture, counting outward from the center of the aperture pattern; φ is the angle between the reference direction and the position vector of the nth aperture in the polar coordinate system starting at the center of the aperture pattern, and the opening between the position vectors of any two consecutive apertures is constant. The angle is α; r is the distance from the center of the aperture pattern to the center of the nth aperture; c is a constant scaling factor.
As mentioned above, all, substantially all, or part of the aperture of the aperture pattern will be represented by the Vogel model (ie, consistent with the Vogel model). In embodiments, the entire aperture of the aperture pattern is represented by the Vogel model. In another embodiment, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99% of apertures are represented by the Vogel model.
The inventors have surprisingly found that the inflorescence pattern is useful for producing new aperture patterns that improve the performance of abrasive articles, such as fixed abrasive articles (such as bond abrasive articles and coated abrasive articles). I found that. In particular, the foliar pattern is useful for creating new aperture patterns for coated polished articles. The foliar aperture pattern achieves a high removal rate of surface material while still achieving acceptable surface quality, reducing the amount of shavings loaded on the polished surface, and the high durability and long service life of the abrasive. Helps solve the conflicting problem of maintaining. This is, in part, surprising, at least in the following ways: First, the inflorescence aperture pattern of the present embodiment unexpectedly has the highest technical level abrasive aperture pattern, even when the total aperture area is less than the total aperture area of the highest technical level abrasive pattern. In comparison, it provides a better shavings removal coverage, and the distribution of shavings extraction sites (ie, apertures) over the surface of the abrasive is more complete. Second, the inflorescence aperture pattern of this embodiment is unexpectedly the best technique in the presence and absence of vacuum application, even when the total polished area is less than that of the highest technology level aperture pattern. Achieves better polishing performance (eg, cumulative material cut), at least comparable to standard aperture patterns. Thirdly, the inflorescence pattern of the present embodiment unexpectedly realizes an increase in the polishing area as compared with the aperture pattern of the highest technical level, but still more than that of the aperture pattern of the highest technical level. A complete aperture coverage can be provided. Moreover, as discussed in more detail later in the application, the effectiveness and performance of this embodiment can be further enhanced when combined with collaborative backup pads and vacuum systems.
Not surprisingly, an important embodiment of aperture pattern design for coated polished articles is the percentage of total polished surface area, the percentage of total area specific to the aperture (ie, the aperture area); the ratio of the polished surface area to the aperture area, Predicted aperture area coverage, scaling factor, number of apertures, opening between apertures, apertures during the use of abrasive objects (eg, rotation on an orbital sander, oscillation on a sheet sander, continuous lateral movement on a belt sander). Size, the distance between adjacent apertures, and the distance between the outermost aperture and the edge of the coated polished article.
Abrasive disc size Abrasives are commonly used by industrial and commercial consumers and come in a variety of sizes, typically ranging from a few inches in diameter to feet in diameter. This aperture pattern is suitable for use with almost any size abrasive, including a variety of standard size abrasive discs (eg, 3 "to 20"). In embodiments, the polished article is a circular disc having a diameter of at least about 0.25 inches, at least about 0.5 inches, at least about 1.0 inches, at least about 1.5 inches, at least about 2.0 inches, at least about 2.5 inches, or at least about 3.0 inches. .. In another embodiment, the polished article has a diameter of about 72 inches or less, about 60 inches or less, about 48 inches or less, about 36 inches or less, about 24 inches or less, about 20 inches or less, about 18 inches or less, about 12 inches. Below, it is a circular disc of about 10 inches or less, about 9 inches or less, about 8 inches or less, about 7 inches or less, and about 6 inches or less. In another embodiment, the polished article ranges in size from a diameter of about 0.5 inches to a diameter of about 48 inches, a diameter of about 1.0 inches to a diameter of about 20 inches, and a diameter of about 1.5 inches to a diameter of about 12 inches. Is.
Total potential surface area The size and shape of the polished article determines the total potential surface area of the polished article. For example, a 1-inch diameter polished disc has a total potential surface area of 0.7854 in.<sup>2</sup>Is. As another example, a rectangular polishing sheet measuring 2 inches x 3 inches has a total potential surface area of 6 inches.<sup>2</sup>Will.
Total aperture area The total aperture area affects the amount of shavings extracted. Generally, as the amount of aperture area increases, the amount of shavings extracted increases, which tends to maintain or occasionally improve the material removal rate (ie, "cut" rate) of the abrasive article in use. However, increasing the amount of aperture area also directly reduces the amount of polishing area available and, at some point, lowers the material removal rate. In embodiments, the total aperture area is equal to the sum of the total aperture areas on the surface of the polished article. In embodiments, the total aperture area is at most about 0.5%, at least about 0.75%, at least about 1.0%, at least about 1.25%, at least about 1.5%, at least about 1.75%, at least about about the total potential surface area of the polished article. 2.0%, at least about 2.25%, at least about 2.5%, or at least about 3.0%. In another embodiment, the total aperture area is about 50% or less, about 45% or less, about 40% or less, about 35% or less, about 30% or less, about 25% or less, about 20% or less, about 15% or less. , Or about 12% or less. The amount of total aperture area may be in the range including any pair of upper and lower limits. In another embodiment, the total aperture area ranges from about 0.5% to about 35%, about 1.0% to about 25%, about 1.5% to about 15%, or about 2.0% to about 10%. In certain embodiments, the amount of total aperture area is in the range of about 2.5% to about 10%. The total aperture can be thought of as a discrete quantity instead of a percentage. For example, a polished 5-inch disc has a total aperture area of about 0.0982 in.<sup>2</sup>From about 9.8175in<sup>2</sup>May reach.
Total polished surface area The total polished surface area affects the amount of surface material removed. Generally, as the amount of total polished surface area increases, so does the amount of surface material removed. Also, usually, as the amount of surface material removed increases, the tendency for shavings to build-up increases and the surface roughness tends to increase. In embodiments, the total polished surface area of the coated abrasive is equal to the total potential surface of the polished article (ie, the polished surface area if there is no aperture) minus the total aperture area (ie, the sum of the total aperture areas). Thus, the amount of total polished surface area may range from about 50% to about 99.5% of the total potential surface area, which depends on the amount of desired aperture area. For example, a 5-inch disc has a total polished surface area of about 9.8175in.<sup>2</sup>From about 19.5368in<sup>2</sup>May reach.
Ratio of total aperture area to total polished surface area In embodiments, the ratio of total aperture area to total polished surface area is at least about 1:199, at least about 1:99, at least about 1: 65.7; at least about 1:49, or at least about 1:39. In another embodiment, the ratio of total aperture area to total polished area is about 1: 1.9 or less, about 1: 2.0 or less, about 1: 2.3 or less, about 1: 3.0 or less, about 1: 3.5 or less, about 1. : 4.0 or less, about 1: 5.7 or less, or about 1: 9.0 or less. The ratio of the total aperture area to the total polished area may be within the range including any pair of upper and lower limits. In another embodiment, the ratio of total aperture area to total polished area is about 1:99 to about 1: 1.9, about 1: 65.7 to about 1: 2.0, about 1: 39.0 to about 1: 3.0, or about. It ranges from 1: 32.3 to about 1: 5.7. In certain embodiments, the ratio of total aperture area to total polished surface area is in the range of about 1: 65.7 to 1: 9.0.
Number of apertures The number of apertures affects the total amount of aperture area and the total amount of polished area. In addition, the number of apertures affects the density and distribution of aperture coverage on the surface of the polished article, which in turn directly affects the shavings extraction efficiency of the polished article. In embodiments, the number of apertures is at least about 5, at least about 10, at least about 15; at least about 18, or at least about 21. In another embodiment, the number of apertures is about 100,000 or less; about 50,000 or less; about 10,000 or less; about 1,000 or less; about 800 or less; about 750 or less; about 600 or less; or about 550 or less. The number of apertures may be in the range including any pair of upper and lower limits. In another embodiment, the number of apertures ranges from about 21 to about 10,000; about 25 to about 1,000; about 30 to about 750; or about 35 to about 550. In certain embodiments, the number of apertures ranges from about 21 to about 550.
Opening Increasing or decreasing the opening α affects how the aperture is placed within the pattern and shape of the clockwise and counterclockwise spirals. Since the opening degree is equal to 360 ° divided by a constant value or a variable value, the opening degree may be a constant value or may change. It was observed that small changes in opening could significantly change the aperture pattern. 5a, 5b and 5c show leaf leaflet patterns with slightly different opening values. The opening degree in FIG. 5a is 137.3 °. The opening degree in FIG. 5b is 137.5 °. The opening degree in FIG. 5c is 137.6 °. In embodiments, the opening is at least about 30 °, at least about 45 °, at least about 60 °; at least about 90 °, or at least about 120 °. In another embodiment, the opening degree is less than 180 °, such as about 150 ° or less. The opening degree may be within a range including any pair of the upper and lower limits. In another embodiment, the opening ranges from about 90 ° to about 179 °, from about 120 ° to about 150 °, from about 130 ° to about 140 °, or from about 135 ° to about 139 °. In an embodiment, the opening degree is determined by dividing 360 ° by an irrational number. In certain embodiments, the opening degree is determined by dividing 360 ° by the golden ratio. In certain embodiments, the opening is in the range of about 137 ° to about 138 ° (about 137.5 ° to about 137.6 °, about 137.50 ° to about 137.51 °, etc.). In certain embodiments, the opening degree is 137.508 °.
Distance to the edge of the abrasive The overall dimensions of the aperture pattern may be determined according to the geometry of the polished article and its intended use. The distance from the center of the pattern to the outermost aperture may extend to the distance that borders the edge of the polished article. Therefore, the edge of the outermost aperture may extend to the edge of the polished article or may intersect the edge of the polished article. Alternatively, the distance from the center of the pattern to the outermost aperture may be extended so that the amount of space between the edge of the outermost aperture and the edge of the polished article is the distance to eliminate the aperture. The minimum distance from the edge of the outermost aperture may be specified as desired (can). specified). In embodiments, the minimum distance from the outermost edge of the aperture to the outer edge of the polished article is a particular distance, either as a discrete length or the length of the surface of the polished article where the aperture pattern appears. Identified as a percentage of. In embodiments, the minimum distance from the edge of the outermost aperture to the outer edge of the polished article may be at least about zero (ie, the edge of the outermost aperture is with the edge of the polished article. It spans approximately 15% of the surface length of the abrasive article, intersecting or co-terminus with the edge of the abrasive article.
Aperture size The size of the aperture is determined, at least in part, by the total area of aperture desired for the polished article. The size of the aperture may be constant throughout the pattern or may vary within the pattern. In embodiments, the size of the aperture is constant. In another embodiment, the size of the aperture varies with the distance of the aperture from the center of the pattern.
Scaling factor The scaling factor affects the overall size and dimensions of the aperture pattern. The scaling factor may be adjusted so that the outermost edge of the aperture is within the desired distance of the outer edge of the polished article.
Distance between the closest adjacent apertures With consideration for the number and size of apertures, the distance between the centers of the closest adjacent apertures may be determined. The distance between the centers of any two apertures is a function that takes into account other aperture designs. In embodiments, the shortest distance between the centers of any two apertures is never reproduced (ie, the distance between holes is never the same exact distance). This type of spacing is also an example of regulated asymmetry.
Aperture pattern coverage-acceptable variant amount It will be clear that the aperture pattern does not need to be applied to the polished article, either globally or continuously. A portion of the aperture pattern may be applied or omitted so that there is no complete aperture pattern in the various compartments or areas of the surface of the polished article. In embodiments, one-half, one-third, one-quarter, one-fifth, one-sixth, one-eighth, and one-tenth of the aperture pattern may be omitted. In another embodiment, the aperture pattern may be applied to only one or more concentric annular regions of the polished article. In another embodiment, it is possible to omit one or more apertures that would normally appear in the aperture series along the individual arcs or spiral arms of the aperture pattern. In embodiments, the aperture may be omitted every nth or every multiple of the nth aperture. In another embodiment, individual apertures, aperture groups, or apertures that follow a certain number of series may be omitted. Conversely, it is possible to include a certain amount of additional apertures in the aperture pattern. The addition or decrease of apertures can be considered as variants to the aperture pattern, and some variant amount to the pattern can be acceptable, either positive or negative. In embodiments, the acceptable amount of variant for the aperture pattern may range from 0.1% to 10% of the total aperture area of the polished article.
Aperture shape The amount of coverage may be influenced by the shape of the aperture. The shape of the aperture may be regular or irregular. In embodiments, the shape of the aperture may be in the form of a slit, a regular polygon, an irregular polygon, an ellipse, a circle, an arc, a spiral, a channel, or a combination thereof. In certain embodiments, the aperture is circular in shape. In another embodiment, the shape of the aperture may be in the form of one or more slits, with the plurality of slits intersecting. 6A-6F show examples of such slit-shaped apertures. The slit bends the flaps provided by the slit back when a vacuum is applied to the back of the polished article (bend). back) is configured to produce a polygon-like open aperture that can have a slightly more precise end. It is believed that the removal of shavings will be facilitated by the rearward bending of the flaps. This prevents the shavings from being guided directly into the vacuum system and drawing into any open fiber layer (such as hook and loop material layers that may be attached to the back of the abrasive article). This is because it will be done.
Manufacturing method-Aperture Apertures may be produced by standard conversion techniques, including stamping, die-cutting, laser cutting, or a combination thereof. In the embodiment, the aperture is punched out. In another embodiment, the aperture is laser cut.
Shape of polished article The shape of the polished article may be any shape that accommodates the desired aperture pattern and will be determined by the intended polishing process and manufacturing material. In an embodiment, the polished article is a combined polished article. In another embodiment, the polished article is a coated polished article. In certain embodiments, the polished article is one of a sheet, belt or circular disc.
FIG. 1 shows a plan view of an embodiment of a coated polished article 100 having a plurality of apertures 101 arranged in a non-uniformly distributed pattern. The coated abrasive is in the form of a substantially flat (ie, substantially flat) circular disc.
FIG. 7 shows a side view of a coated polished article 700 including a backing 701 having a first main surface 703 and a second main surface 705. Polishing layer 707 is located on the first main surface of the backing. The polishing layer may include a plurality of layers, including a binder layer 709 (also referred to as a make coat). A plurality of abrasive grains 711 may be dispersed in the binder layer, may penetrate into the binder layer, may be placed on the binder layer, or may be combined. The pattern of aperture 713 (ie, the hole) penetrates all layers of the polished article. The size coat 715 is optional and may be placed on the binder layer. An oversized coat (not shown) may be placed over the size coat. The backcoat 717 may be placed on the second main surface (ie, back) of the backing layer. The fastener layer 719 may be placed over the backcoat or directly on the second main surface of the backing. In certain embodiments, the coated abrasive article 700 may optionally be attached to a backup pad (not shown) or a vacuum system.
backing The backing 701 may be flexible or rigid. The backing may be manufactured from any number of different materials, including those conventionally used as backing in the manufacture of coated abrasives. Examples of flexible backing are polymer films (eg, primed films) (polyurethane films (eg, polypropylene, including biaxially stretched polypropylene), polyester films (eg, polyethylene terephthalates), polyamide films. , Or cellulose ester film, etc.); Metal foil; Mesh; Foam (eg, natural sponge material or polyurethane foam); Cloth (eg, fiber or yams) (polyester, nylon, silk, cotton, polypropylene or Cloths made from) (including rayon); paper; vulnerable paper; vulnerable rubber; sulfide fibers; non-woven fabric materials; combinations thereof; or processed products thereof. The crossbacking may be knitted or stitch bonded. In certain embodiments, the backing is selected from the group consisting of paper, polymer films, cloth, cotton, poly-wat, rayon, polyester, poly-nylon, vulcanized rubber, vulcanized fibers, metal foils, and combinations thereof. Will be done. In other examples, backing includes polypropylene film or polyethylene terephthalate (PET) film.
The backing 701 may optionally have at least one of a saturating agent, a pre-sized layer or a back-sized layer. The purpose of these layers is generally to seal the backing or to protect the backing yarn or fibers. If the backing is a cloth material, at least one of these layers is commonly used. The addition of a pre-sized or back-sized layer can additionally provide a "smooth" surface on either the front or back side of the backing. Any other layer known in the art may be used (eg, Thai layer; see US Pat. No. 5,700,302 (Stoetzel et al.) (This disclosure is incorporated by reference)).
An antistatic material may be included in the cloth treated material. The addition of antistatic material can reduce the tendency of the coated polished article to accumulate static electricity when sanding wood or wood-like materials. Further details regarding antistatic backing and backing treatment are available, for example, in US Pat. No. 5,108,463 (Buchanan et al.); US Pat. No. 5,137,542 (Buchanan et al.); US Pat. No. 5,328,716 (Buchanan). ); And can be found in US Pat. No. 5,560,753 (Buchanan et al.) (These disclosures are incorporated herein by reference).
The backing may be a fibrous thermoplastic reinforced plastic (eg, as described in US Pat. No. 5,417,726 (Stout et al.)), Or an endless spliceless belt (eg, US Pat. No. 5,573,619). It may be as described in Benedict et al.) (These disclosures are incorporated herein by reference). Similarly, the backing may be a polymeric substrate with a protruding hooking stem (eg, as described in US Pat. No. 5,505,747 (Chesley et al.)) (This disclosure is herein by reference. (Built in). Similarly, the backing may be a loop fabric (eg, as described in US Pat. No. 5,565,511 (Follett et al.)) (This disclosure is incorporated herein by reference).
Abrasive layer The polishing layer 707 may be formed from one or more coatings and a plurality of abrasive grains. For example, the polishing layer may include a make coat 709 and optionally a size coat 715 or an oversized coat. The polishing layer usually contains abrasive grains 711 placed on the binder, embedded in the binder, dispersed in the binder, or a combination thereof.
Abrasive grains The abrasive grains 711 can essentially include single-phase inorganic materials (alumina, silicon carbide, silica, ceria, etc.) and harder, higher performance ultra-abrasive grains (such as cubic boron nitride and diamond). In addition, the abrasive grains may include a composite fine particle material. Such materials may include aggregates, which may be formed through a slurry processing pathway. This pathway involves the removal of liquid carriers by volatilization or evaporation, which leaves green agglomerates, optionally followed by high temperature treatment (ie, burning) to form usable calcined agglomerates. In addition, the polishing area may include abrasives designed to include macrostructures and specific three-dimensional structures.
In an exemplary embodiment, the abrasive grains are mixed with a binder formulation to form an abrasive slurry. Alternatively, the abrasive grains are applied to cover the binder formulation after the binder formulation has been coated on the backing. Optionally, a functional powder may be applied to cover the polished area to prevent the polished area from sticking to the patterning tooling. Alternatively, a pattern may be formed in the polished area without the functional powder.
Abrasive grains are silica, alumina (melted or sintered), zirconia, zirconia oxide / alumina, silicon carbide, garnet, diamond, cubic boron nitride, silicon nitride, ceria, titanium dioxide, titanium diboride, boron carbide, tin oxide. , Tungsten Carbide, Titanium Carbide, Iron Oxide, Chromia, Flint, Emery, may be formed from any one or a combination thereof. For example, the abrasive grains are silica, alumina, zirconia, silicon carbide, silicon nitride, boron nitride, garnet, diamond, co-molten alumina zirconia, ceria, titanium diboride, boron carbide, flint, emery, alumina nitride, and these. It may be selected from the group consisting of mixtures. Certain embodiments have arisen using high density abrasive grains composed primarily of alpha-alumina.
The abrasive grains may also have a particular shape. Examples of such shapes include rods, triangles, pyramids, cones, solid spheres, hollow spheres and the like. Alternatively, the abrasive grains may have a random shape.
In embodiments, the abrasive grains may have an average grain size of 800 microns or less, such as about 700 microns or less, 500 microns or less, 200 microns or less, or 100 microns or less. In another embodiment, the abrasive grain size is at least 0.1 micron, at least 0.25 micron, or at least 0.5 micron. In another embodiment, the abrasive grain size is from about 0.1 micron to about 200 microns, more generally from about 0.1 micron to about 150 microns, or from about 1 micron to about 100 microns. The grain size of the abrasive grains is usually specified as the longest dimension of the abrasive grains. There is usually a range distribution of grain sizes. In some cases, the particle size distribution is tightly regulated.
Makeup Coat-Binder The make coat or size coat binder may be formed from a single polymer or a mixture of polymers. For example, the binder may be formed from an epoxy, an acrylic polymer, or a combination thereof. The binder may also contain a filler (such as a nano-sized filler or a combination of a nano-sized filler and a micron-sized filler). In a particular embodiment, the binder is a colloidal binder, and the pharmaceutical product that is cured to form a binder is a colloidal suspension containing a fine particle filler. Alternatively, or in addition, the binder may be a nanocomposite binder containing a submicron microparticle filler.
Binders, if present, usually contain a polymer matrix, which allows the abrasive grains to bind to the backing or compliant coat. Usually, the binder is formed from a cured binder formulation. In one exemplary embodiment, the binder formulation comprises a polymeric component and a dispersed phase.
The binder formulation may contain one or more reaction components, or polymer components for polymer preparation. Polymer components may include monomer molecules, polymer molecules, or combinations thereof. The binder formulation is further selected from the group consisting of solvents, plasticizers, chain transfer agents, catalysts, stabilizers, dispersants, hardeners, reaction mediators, and agents for affecting the fluidity of the dispersion system. May include.
Polymer components may form thermoplastics or thermosettings. As an example, the polymer components are polyurethane, polyurea, polymerized epoxy, polyester, polyimide, polysiloxane (silicon), polymerized alkyd, styrene-butadiene rubber, acrylonitrile-butadiene rubber, monomers and resins for the formation of polybutadiene, or generally. , Reactive resins for the production of thermosetting polymers may be included. Another example is an acrylate or methacrylate polymer component. The precursor polymer component is usually a curable organic material (ie, immediately exposed to heat or a source of other energy (electron beam, ultraviolet light, visible light, etc.), or cures or polymerizes the polymer. Polymer monomers or materials that can be polymerized or crosslinked over time with the addition of chemical catalysts, water or other agents). Examples of precursor polymer components include reactive components for the formation of aminopolymers or aminoplast polymers (alkylated urea-formaldehyde polymers, melamine-formaldehyde polymers, and alkylated benzoguanamine-formaldehyde polymers; acrylate polymers ( Acrylic and methacrylate polymers, alkyl acrylates, acrylic epoxy, acrylic urethane, acrylic polyester, acrylic polyether, vinyl ether, acrylic oil, or acrylicized silicon); alkyd polymers (such as urethane alkyd polymers); polyesters Polymers; Reactive Urethane Polymers; Phenolic Polymers (Resol and Novolac Polymers, etc.); Phenol / Latex Polymers; Epoxy Polymers (Bisphenol Epoxy Polymers, etc.); Or reactive vinyl polymer etc.). The binder preparation may contain a monomer, an oligomer, a polymer or a combination thereof. In certain embodiments, the binder formulation comprises at least two types of polymeric monomers that can be crosslinked when cured. For example, the binder formulation may include epoxy and acrylic components that form an epoxy / acrylic polymer when cured.
Additives-Grinding Auxiliary The polishing layer may further contain a grinding aid to increase grinding efficiency and cutting rate. Useful grinding aids may be inorganic, such as halide salts (eg, sodium cryolite and potassium tetrafluoroborate); or organic, such as chlorinated wax (eg, polyvinyl chloride). Certain embodiments include cryolite and potassium tetrafluoroborate having particle sizes ranging from 1 micron to 80 microns, most commonly 5 to 30 microns. The oversized coat may be a polymer layer applied to cover the abrasive grains in order to impart anti-glazing and anti-loading properties.
Back coat-adaptive coat The coated polished article may optionally include an adaptive coat and a back coat (not shown). These coats may function as described above and may be formed from a binder composition.
Backup pad In embodiments, the backup pad may include multiple airflow paths arranged in the pattern. The pattern of the airflow path may include regular polygons, irregular polygons, ellipses, arcs, helices, foliar patterns or combinations thereof. The pattern of the airflow path may include an arcurate path, a radial spiral path, or a combination thereof. The pattern of the airflow path may include a combination of an inner radiating spiral path and an outer radiating spiral path. The pattern of the airflow path may include a combination of a clockwise radiating spiral path and a counterclockwise radiating spiral path. The airflow paths may be discrete or discontinuous with each other. Alternatively, one or more airflow paths may be fluidly connected.
The number of radial arc paths (arcs), radial spiral paths or combinations thereof may vary. In embodiments, the number of radial arc paths, radial spiral paths or combinations thereof may be 1000 or less, such as 750 or less, 500 or less, 250 or less, 100 or less, 90 or less, 80 or less, or 75 or less. .. In embodiments, the number of radial arc paths, radial spiral paths, or combinations thereof may be 2 or more, such as 3 or more, 5 or more, 7 or more, 9 or more, 11 or more, 15 or more, or 20 or more. is there. In embodiments, the number of radial arc paths, radial spiral paths, or combinations thereof may be from 2 to 500, from 2 to 100, and so on.
In another embodiment, the backup pad may have an airflow path pattern that further includes an annular airflow path that intersects the airflow path. In certain embodiments, the annular airflow path may intersect a radial arc path, a radial spiral path, or a combination thereof.
The width of the airflow path may vary. The width of the airflow path may be constant or variable, or a combination of these. In embodiments, the width of the airflow path may be within a fixed length range. In embodiments, the width of the airflow path may vary from 0.1 mm to 10 cm. In another embodiment, the width of the airflow path will be related to the size of the aperture of the coated abrasive in which the backup pad is used. In embodiments, the width of the airflow path is greater than or equal to 1/10 of the size of the coated abrasive aperture and 1/8, 1/6, 1/5, 1/4, 1 of the size of the coated abrasive aperture. / 3, or 1/2 or more, etc. In embodiments, the width of the airflow path is 10 times or less the size of the coated abrasive aperture and 8 times or less, 6 times or less, 5 times or less, 4 times or less, 3 times the size of the coated abrasive aperture. Below, it is twice or less. In embodiments, the width of the airflow path is approximately equal to the size of the aperture of the coated abrasive.
The airflow path may have one or more cavities, orifices, passages, holes, openings, or a combination thereof that are located along or within the airflow path (branch of the airflow path). Etc.), these spread throughout the body of the backup pad. In an embodiment, each airflow path will have at least one hole that is located within the airflow path that extends throughout the body of the backup pad.
Not surprisingly, backup pads designed to accommodate non-uniformly adjusted coating abrasives have conventional coated abrasives and specific coated abrasives with non-uniformly adjusted aperture distribution. Can be used successfully with materials. Surprisingly, the inventors have discovered that a backup pad embodiment can achieve better shavings removal and can facilitate improvements in the polishing performance of conventional abrasives.
In embodiments, the backup pad may have an airflow path pattern configured to work with a coated abrasive having a pattern with a non-uniformly adjusted distribution. As mentioned earlier, such backups can be used in conjunction with conventional coated abrasives with perforated holes to facilitate shavings removal and polishing performance.
In embodiments, the backup pad may include an airflow path pattern, which results from the x and y coordinates of a non-uniformly distributed pattern. The non-uniformly distributed pattern used to generate the backup pad airflow pattern may be the same as or different from the aperture pattern of the coated abrasive in which the backup pad is used. In the embodiment, the pattern in which the distribution is non-uniformly adjusted is the same as the aperture pattern of the coated abrasive in which the backup pad is used. In another embodiment, the non-uniformly adjusted pattern differs from the aperture pattern of the coated abrasive in which the backup pad is used.
In embodiments, the backup pad may be configured to work with a coated abrasive having a foliar pattern according to the embodiments of the coated abrasive described herein. The backup pad, if the backup pad contains multiple openings, multiple cavities, multiple channels, multiple passages, or a combination thereof, to work with a coating abrasive with a foliar pattern. These are constructed in a pattern designed to facilitate suction and shavings removal from the work surface through the aperture of the coated abrasive with the inflorescence pattern during the polishing process. An opening, a cavity, a channel, a passage, or a combination thereof may define an airflow path that is positioned along the backup pad, within the backup pad, or through the backup pad, or a combination thereof. The airflow path facilitates improved suction and shavings removal from the workpiece surface during the polishing process through the coating abrasive aperture. In embodiments, the pattern of openings, cavities, channels, passages, or combinations thereof may be in the form of regular polygons, irregular polygons, ellipses, arcs, spirals, foliar patterns, or combinations thereof. .. In another embodiment, the airflow path may be in the form of a regular polygon, an irregular polygon, an ellipse, an arc, a helix, a foliar pattern, or a combination thereof.
In embodiments, a suitable spiral or leaflet pattern may arise from the x and y coordinates of any leaflet aperture pattern of any of the abrasive article embodiments described above. In an embodiment, the x and y coordinates of the spiral or inflorescence pattern are transposed and rotated according to the following equation to determine the x'and y'coordinates of the spiral or inflorescence backup airflow pattern, where θ is , Equal to π / n in radians, where n is any integer:<maths num="2"><img id="000003" he="23" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></maths>
The resulting transposed rotating coordinates (x'and y') may be plotted, such as by using computer-aided drawing (CAD) software, to produce an appropriate airflow pattern (such as a spiral or inflorescence pattern). Specific embodiments of the transposed foliar pattern are shown in FIGS. 9, 12, and 15.
The pattern may subsequently be used to define radiated accuracy and radiated spiral channels, as well as annular channels that may intersect arc and spiral channels, or combinations thereof. Subsequently, annular channels, arc channels, spiral channels, or combinations of these channels are cut into suitable materials (grooves, cavities, orifices, passages or other path forms, etc.) to form collaborative backup pads. It's okay. Specific embodiments of channel patterns based on transposed foliar patterns are shown in FIGS. 10, 13, and 16. Further embodiments of the backup pad based on the transposed foliar pattern are shown in FIGS. 28, 29, 30, 31, 31, 32, 33, 46 and 47.
In certain embodiments, the backup pad airflow path will partially or completely match the aperture of the coated abrasive. It will be appreciated that an airflow path matches an aperture if at least a portion of the area of the aperture coincides with or is aligned with a portion of the airflow path. In embodiments, the corresponding backup pad airflow path will match at least 5%, at least 10%, at least 15%, at least 20%, and at least 25% of the aperture. In embodiments, the corresponding backup pad airflow path is at least 5%, at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40% of the coating abrasive aperture. At least 55%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, or at least 100% May match.
Not surprisingly, some backup pad helices and inflorescence airflow patterns provide a consistent quality alignment with the coated abrasive aperture pattern, especially if the airflow pattern is based on the transposition and rotation of the coated abrasive aperture coordinates. It will be shown. In embodiments, the airflow pattern of the backup pad will match the majority or almost all coated abrasive apertures when the backup pad is at a particular phase or rotation angle with respect to the coated abrasive. The backup pad is a backup pad where the backup is rotated 90 ° or 180 ° compared to the coating abrasive and the majority to almost all apertures of the coating abrasive match the at least one airflow path of the backup pad. If the airflow path of is matched with the aperture of the coated abrasive, it is said to be a single alignment (also called double alignment) backup pad. FIG. 46 illustrates an embodiment of a single alignment backup pad. 48-51 illustrate an embodiment of a coated abrasive with 442 apertures (441 surrounding the central aperture) covering the single alignment backup pad of FIG. 46, according to the Vogel equation, and coated abrasive. The material is rotated 90 °, 180 °, 270 ° and 0 ° from the phase of the backup pad so that the covering abrasive aperture moves back and forth between the covering abrasive apertures that do not correspond to any of the outer spirals of the backup pad. Almost all apertures of the coated abrasive correspond to at least one outer spiral of the backup pad. A double alignment (also called 4x alignment) backup pad is illustrated in Figure 47. 52-59 illustrate an embodiment of a coating abrasive with 442 apertures (441 surrounding the central aperture) covering the dual alignment backup pad of FIG. 47, according to the Vogel equation, coating polishing. The material is 45 °, 90 °, 135 °, 180 °, 225 °, 270 ° from the phase of the backup pad. , 315 ° and 0 ° rotation. Again, the coated abrasive aperture moves back and forth between the coated abrasive apertures that do not correspond to any of the outer spirals (45 °, 135 °, 225 ° and 315 °) of the backup pad, and almost all of the coated abrasive. Apertures have been shown to correspond to at least one outer spiral (90 °, 180 °, 270 ° and 0 °) of the backup pad.
In embodiments, the backup pad may include or be configured to include an alignment indicator. The alignment indicator may be a mark, device, notch, attachment, collar, protrusion, or a combination thereof for indicating the degree of alignment of the backup pad with the coating abrasive. In certain embodiments, the alignment indicator may be a mark.
Such backup pads are described as working with embodiments of the abrasive article described herein, but may also be used with standard, state-of-the-art, perforated coating abrasives. Good. Unexpectedly, backup pads with multiple openings, multiple cavities, multiple channels, or a combination of these forming the appropriate spiral or foliar pattern airflow path improve shavings removal and abrasive cut performance, It has also been found that it can extend the polishing life of both standard, state-of-the-art, perforated coated abrasives and coated abrasives with perforated leaflet patterns.
The backup pad may be flexible or rigid. The backup pad may be manufactured from any number of different materials or combinations of materials, including those conventionally used in the manufacture of backup pads. The backup pad may be manufactured from a single piece, single piece structure, or multi-piece structure (multilayer structure, concentric layer structure, etc.). The backup pad is preferably an elastic material (soft foam, etc.). Suitable foams include polyurethane, polyester, polyester-urethane, polyether urethane; natural or artificial rubber (polybutadiene, polyisoprene, EPDM polymer, polyvinyl chloride (PVC), polychroloprene or styrene / butadiene copolymer; or There can be a combination of these, etc.). The foam may be an open cell or a closed cell. Additives (coupling agent, strengthening agent, curing agent, antioxidant, reinforcing agent, etc.) and the like may be added to the foam preparation in order to achieve the desired properties. Dyes, pigments, fillers, antistatic agents, flame retardants and scrims may be added to the foam or other elastic material used to make the backup pad.
Particularly useful foams include TDI (toluene diisocyanate) / polyester and MDI (methylene diphenyl diisocyanate) / polyester foam. In embodiments, the backup pad is made from an elastic open cell polyurethane foam (formed as a reaction product of a polyether polyol and an aromatic polyisocyanate). In another embodiment, the backup pad may be foam, vulcanized rubber, or any combination thereof.
Manufacturing method-Coating and polishing articles Focusing on the method of producing a coated polished article having an aperture pattern, the backing may be dispensed from the roll and the backing may be coated with a binder formulation dispensed from the coating device. Exemplary covering devices include drop die coaters, knife coaters, curtain coaters, vacuum die coaters, or die coaters. The coating methodology may include either a contact method or a non-contact method. Such methods include 2-roll, 3-roll reverse, knife overroll, slot die, gravure, extrusion, or spray coating application.
In an embodiment, the binder formulation may be provided in a slurry containing the formulation and abrasive grains. In another embodiment, the binder formulation may be dispensed separately from the abrasive grains. The abrasive grains may be given after coating with the backing binder, after partial curing of the binder formulation, after patterning of the binder formulation (if any), or after complete curing of the binder formulation. Abrasive grains may be applied by techniques such as electrostatic coating, drop coating, or mechanical projection.
In another embodiment, the backing (coated with binder and abrasive grains) may be stamped, punched, laser cut, or combined to form an aperture pattern. The aperture may be virtually free of backing material, binders and abrasive grains.
In another embodiment, the backing may be selectively covered with a binder, leaving an uncovered area, which is then cut to form an aperture. For example, the binder may be printed on the backing by screen printing, offset printing, flexographic printing, or the like. In another embodiment, the binder may be selectively coated using a gravure coating, a slot die coating, a masked spray coating, or the like. Alternatively, a photoresist or UV curable mask may be applied to the backing and developed by photolithography or the like to mask a portion of the backing. In another embodiment, the dewetting compound may be applied to the backing before the binder may be applied.
Focusing on the method of polishing the workpiece, the workpiece may come into contact with the coating abrasive. The coated abrasive may rotate with respect to the workpiece. For example, the coated abrasive may be attached to an orbital sander and in contact with the workpiece. While polishing the workpiece, the material polished from the workpiece can accumulate in the aperture. Accumulated material can be expelled from the aperture by the movement of the coated abrasive in use. Alternatively, a vacuum system may be fitted to the polished article, which may include a backup pad configured to work in conjunction with the polished article.
<p num="0083"><u style="single">Example 1-Shavings extraction efficiency</u> Quantifying the potential shavings extraction efficiency of the abrasive disc aperture pattern by determining the average distance from the aperture at any point on the conceptual surface defined by the rotation of the abrasive disc in the selected orbital. Can be done. The polished surfaces (ie, polishing disc patterns) of Comparative Sample 1 (FIG. 20A) and Samples 1 to 3 of the present invention (FIGS. 20B to 20D) are shown in the upper portion of FIGS. 20A to 20D. The average distance from the aperture was determined using simulation software at any point on the conceptual surface defined by the rotation of the abrasive disc. An orbital equivalent to the standard orbital of a powered handheld orbital sander was used. The average distance of each polishing pattern was plotted as shown in the central part of FIGS. 20A to 20D. The average distance from the aperture was graphed from Figure 20A to the lower part of Figure 20D as a function of radius, and the area under the curve was integrated and the values of each aperture pattern were compared. The lower the integral, the better the aperture coverage and therefore the better the shavings extraction efficiency. All of the aperture patterns of the present invention had lower integral values, and therefore the shavings extraction efficiency was superior to that of the comparative sample. This was surprising given that all samples have approximately equal amounts of aperture area. This indicates that the aperture distribution is better on the surface of the polished disc. Sample 3 of the present invention, in particular, had a dramatically lower integral (93% reduction).</p><p num="0084"> Comparative Sample 1 was a 5 MultiAir polished disc pattern with 125 holes and an aperture area (ie, removed area) of 10.5%. Maximum average distance from the aperture at any point. Was in the range of 3 to 4 mm. The integral of the average distance from the aperture was 49 mm.<sup>2</sup>Met.</p><p num="0085"> Sample 1 was a 5 Vogel sunflower polished disc pattern with 150 holes and an aperture area (ie, removed area) of 10.7%. The maximum average distance from the aperture at any point. Was in the range of 2 to 3 mm. The integral of the average distance from the aperture was 33 mm.<sup>2</sup>(32% decrease).</p><p num="0086"> Sample 2 was a 5 Vogel sunflower polished disc pattern with 250 holes and an aperture area (ie, removed area) of 10.8%. Maximum average distance from the aperture at any point. Was in the range of 1 to 2 mm. The integral of the average distance from the aperture was 11 mm.<sup>2</sup>(77% decrease).</p><p num="0087"> Sample 3 was a 5 Vogel sunflower polished disc pattern with 350 holes and an aperture area (ie, removed area) of 10.7%. The maximum average distance from the aperture at any point. Was in the range of 1 to 2 mm. The integral of the average distance from the aperture was 3 mm.<sup>2</sup>It was (a decrease of 93%).</p><p num="0088"><tables num="1"><img id="000004" he="51" wi="158" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0089"><u style="single">Example 2-Improvement of extraction efficiency by increasing the polishing area</u> Further, the polishing aperture pattern of the present invention was investigated with respect to potential shavings extraction efficiency using the same procedure as described above. The polished disc patterns of Comparative Sample 1 (FIG. 21A) and Samples 1 to 3 of the present invention (FIGS. 21B to 21D) are shown in the upper portion of FIGS. 21A to 21D. The average distance of each polishing pattern was plotted as shown in the central part of FIGS. 21A to 21D. The average distance from the aperture is graphed as a function of radius and shown in the lower part of Figures 20A to 20D. The area under the curve was integrated and the values of each aperture pattern were compared. Surprisingly, all the samples of the present invention achieved an integral value comparable to a better integral value, although the aperture area was 2.7% to 6.3% lower than that of the comparative sample. This indicates that the distribution of apertures is desirable on the surface of the polishing disc of the present invention. Trough Unomo, simultaneously polishing the area available amount is increased, because the very high shavings extraction efficiency can be maintained. Sample 3 of the present invention had the lowest integral value, but the largest available polishing area.</p><p num="0090"> Comparative Sample 1 was a 5 MultiAir polished disc pattern with 125 holes and an aperture area (ie, removed area) of 10.5%. Maximum average distance from the aperture at any point. Was in the range of 3 to 4 mm. The integral of the average distance from the aperture was 49 mm.<sup>2</sup>Met.</p><p num="0091"> Sample 1 was a 5 Vogel sunflower polished disc pattern with 148 holes and an aperture area (ie, removed area) of 7.8% (polished area increased by 2.7%). For points, the maximum average distance from the aperture was in the range of 2-3 mm. The integral of the average distance from the aperture was 51 mm.<sup>2</sup>(4% increase).</p><p num="0092"> Sample 2 was a 5 Vogel sunflower polished disc pattern with 246 holes and an aperture area (ie, removed area) of 5.0% (polished area increased by 5.5%). For points, the maximum average distance from the aperture was in the range of 2-3 mm. The integral of the average distance from the aperture was 32 mm.<sup>2</sup>It was (34% decrease).</p><p num="0093"> Sample 3 was a 5 Vogel sunflower polished disc pattern with 344 holes and an aperture area (ie, removed area) of 3.7%. The maximum average distance from the aperture at any point. Was in the range of 1 to 2 mm. The integral of the average distance from the aperture was 22 mm.<sup>2</sup>It was (55% decrease).</p><p num="0094"><tables num="2"><img id="000005" he="50" wi="158" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0095"><u style="single">Example 3-polishing performance-with vacuum non-specific backup pad</u> A 5-inch coated polishing disc was tested by polishing the cast acrylic panel with a handheld orbital sander. Each coated polishing disc was moved in a straight line over the entire length of the cast acrylic panel. The amount of material removed was determined by weighing the cast acrylic panel using a scale before and after each grinding cycle. The average material removed was determined by summing the weight losses of the 6 grinds. Average material removal was determined by averaging 3 trials.</p><p num="0096"> The surface closing price (Rz) of the cast acrylic panel was measured after the first grind at three points along the entire length of the cut. I took the average Rz of 3 trials.</p><p num="0097"> FIG. 22 shows a chart comparing cumulative cuts and surface closing prices of Comparative Sample 1 and 3 samples of the present invention.</p><p num="0098"> A comparison of coated polishing discs with a grain size of P1500 (average polishing grit size of about 12.6 microns) was compared. Each grind of the test was evacuated for 30 seconds unless otherwise stated. Dynabrade 54-Hole backup pads (hard pads) were used for all samples.</p><p num="0099"> Comparative Sample 1 was a Norton MultiAir 5 diameter disc with a P1500 grit size and a grid pattern with 125 holes distributed. The total aperture area was 10.5% of the disc.</p><p num="0100"> Sample 1 was a 5 diameter abrasive disc, P1500 grit size, and the inflorescence aperture pattern was based on the Vogel formula. The number of apertures was 150. The total aperture area was 10.5%. It was.</p><p num="0101"> Sample 2 was the same as Sample 1 except that it had 250 apertures. The total aperture area was 10.8%.</p><p num="0102"> Sample 3 was the same as Sample 1 except that the number of apertures was 350. The total aperture area was 10.7%.</p><p num="0103"><tables num="3"><img id="000006" he="50" wi="158" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0104"><u style="single">Example 4-polishing performance-with vacuum non-specific backup pad</u> FIG. 23 shows a chart comparing cumulative cuts and surface closing prices of Comparative Sample 1 and 3 samples of the present invention.</p><p num="0105"> The polishing performance test was performed in the same manner as in Example 3 above, except that the Norton Multi-Air 125 hole backup pad (soft pad) was used for all samples.</p><p num="0106"> Comparative Sample 1 and Samples 1 to 3 of the present invention were the same as in Example 3 above.</p><p num="0107"><tables num="4"><img id="000007" he="50" wi="158" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0108"><u style="single">Example 5-polishing performance-with vacuum non-specific backup pad</u> FIG. 24 shows a chart comparing cumulative cuts and surface closing prices of Comparative Sample 1 and 3 samples of the present invention.</p><p num="0109"> The polishing performance test was carried out in the same manner as in Example 3 above, except that each of the 6 grind cycles was 2 minutes.</p><p num="0110"> Comparative Sample 1 and Samples 1 to 3 of the present invention were the same as in Example 3 above, except that the polishing grit size of P80 (average abrasive grain size of about 201 microns) was used for all samples.</p><p num="0111"><tables num="5"><img id="000008" he="47" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0112"><u style="single">Example 6-polishing performance-with vacuum non-specific backup pad</u> FIG. 25 shows a chart comparing cumulative cuts and surface closing prices of Comparative Sample 1 and 3 samples of the present invention.</p><p num="0113"> The polishing performance test was carried out in the same manner as in Example 4 above, except that each of the 6 grind cycles was 2 minutes.</p><p num="0114"> Comparative Sample 1 and Samples 1 to 3 of the present invention were the same as in Example 4 above, except that the polishing grit size of P80 (average abrasive grain size of about 201 microns) was used for all samples.</p><p num="0115"><tables num="6"><img id="000009" he="47" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0116"> Example 7-polishing performance-with vacuum collaborative backup pad FIG. 26 shows a graph of substances cut at progressive time intervals for Comparative Sample 1 and 2 samples of the present invention.</p><p num="0117"> The polishing performance test was carried out in the same manner as in Example 1 above, using 6 grind cycles of 30 seconds each. Three iterations were performed and the average value was recorded.</p><p num="0118"> Comparative Sample 1 was a Norton MultiAir 5 diameter disc, P1500 grit size, and a grid pattern with 125 holes distributed. Together with a collaborative MultiAir backup pad (soft pad). Using. The total aperture area was 10.5% of the disc.</p><p num="0119"> Sample 1 is a 5 diameter abrasive disc, P1500 grit size, and the inflorescence aperture pattern is based on the Vogel formula. The number of apertures is 246, and the cooperation is based on the transposed image of the 246 Vogel aperture patterns. A working backup pad (a "soft" pad) was also used. The total aperture area of the polished disc was 5%.</p><p num="0120"> Sample 2 is a 5 diameter abrasive disc, P1500 grit size, and the inflorescence aperture pattern is based on the Vogel formula. The number of apertures is 344, and the cooperation is based on the transposed image of the Vogel aperture pattern of 344. A working backup pad (a "soft" pad) was also used. The total aperture area of the polished disc was 3.7%.</p><p num="0121"> As can be seen in the graph, the first cut (first cycle) was slightly lower, but the reduction rate of the cut was significantly improved compared to the control Multi-Air pattern. The rate of decline is a sign of disk loading. The higher the loading, the faster the cut rate drops. This improvement in reduced cut loss is a clear indication that the sample aperture patterns of the present invention are improved over the comparative aperture patterns. Moreover, the sample of the present invention has a higher cumulative cut rate than the comparative sample. The increased percentage of cumulative cuts in Sample 1 (+ 14.75%) and Sample 2 (+ 27.81) disproportionately outweigh the larger abrasive area amounts in Sample 1 (+ 5%) and Sample 2 (+6.8). This appears to show a synergistic polishing performance effect due to the increased efficiency of shavings removal of the aperture pattern of the present invention and the use of collaborative backup pads. Moreover, the surface closing values of the samples of the present invention are the same as or better than those of the comparative samples (lower values indicate lower average roughness).</p><p num="0122"><tables num="7"><img id="000010" he="41" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0123"><tables num="8"><img id="000011" he="41" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0124"><u style="single">Example 8-Grinding performance test-Vacuum and compatible backup pad available</u> A polishing performance test was performed on the vehicle side panel. The side panels were fiberglass and were electrodeposited with a primer. The vehicle side panels were polished using a handheld orbital sander equipped with a 6-inch polishing disc, backup pad, and vacuum attachment. Two samples of the control and three samples of the invention were tested. The combination of polishing disc and backup pad for the control sample and the sample of the present invention is shown in Table_, which is described in more detail below.</p><p num="0125"> For all tests, the vehicle side panel was polished using lateral motion covering a continuous row over the entire surface of the vehicle side panel. Multiple runs were performed for each combination of polishing disc and backup pad. The average life of the polishing disc and the average surface area polished during the life of the polishing disc were measured. FIG. 24 shows a chart comparing the life expectancy and the average area polished during life for each sample of the control and the present invention.</p><p num="0126"> The average lifespan of each sample and the average area polished during its lifespan were used to estimate and compare the time required to polish 10,000 square feet of vehicle panels. The calculation assumes that the polishing disc changes in a time of 45 seconds. FIG. 25 shows a chart comparing the time (hours) required to polish 10,000 square feet of vehicle panels for the controls and the samples of the invention.</p><p num="0127"> Control Sample 1 is a Norton MultiAir 6 diameter polished disc (covered with size P320 aluminum oxide grit and 181 punched apertures (one in the center of the disc, 7.8 mm radius aperture, plus 180, 1.65 mm). Has an aperture of (which surrounds the central aperture) and has a distributed grid pattern) (hereafter referred to as the "punched MultiAir disc"). The total area of aperture was approximately 10% of the total area of the disc. The corresponding Norton MultiAir 6 diameter backup pad (hereafter referred to as the MultiAir backup pad ) was manufactured from polyurethane foam and had an aperture of 181 in the same pattern as the punched MultiAir disc, which was used during the test. ..</p><p num="0128"> The control sample 2 used the same Norton MultiAir 6 coated polishing disk as the control sample 1 except that the aperture of the coating polishing disk was a laser cut aperture (hereinafter referred to as laser cut MultiAir disk ). The same MultiAir backup pad as in Control Sample 1 was used.</p><p num="0129"> For sample 1 of the present invention, the same laser-cut MultiAir polishing disk as in control sample 2 was used. The 6 diameter backup pad of the present invention based on the Vogel-type transposition of the spiral airflow channel was used (hereinafter referred to as sunflower backup pad ). The sunflower backup pad was configured so that the two-fold symmetric and helical pattern corresponded to a Vogel pattern with a total aperture of 247. The spiral pattern contained 34 outer spirals and 8 inner spirals, each with a width of 1.3 mm. The inner and outer helices were discrete with each other. Each spiral contained a channel for the flow of air, which passed through the body of the backup pad through the aperture of the abrasive disc, along the channel, and through at least one aperture placed within the channel. See Figures 36 and 46.</p><p num="0130"> Sample 2 of the present invention has a 6 diameter abrasive disc (with a P320 aluminum oxide abrasive grit and a total of 247 apertures in a Vogel-following foliar aperture pattern (one in the center of the disc, with a radius). There is a 7.8mm aperture, plus 246, 1.3mm aperture, which surrounds the central aperture)) (hereinafter referred to as the sunflower polishing disc). The total aperture area of the sunflower disc is the total disc area. It was about 8%. The same MultiAir backup pad as in Control Sample 1 was used.</p><p num="0131"> Sample 3 of the present invention has a 6 diameter abrasive disc (with a P320 aluminum oxide abrasive grit and a total of 247 apertures in a Vogel-following foliar aperture pattern (one in the center of the disc, with a radius). There is a 7.8mm aperture, plus 246, 1.3mm aperture, which surrounds the central aperture)) (hereinafter referred to as the sunflower polishing disc). The total aperture area of the sunflower disc is the total disc area. It was about 8%. The sunflower backup pad corresponding to that in sample 1 of the present invention was used.</p><p num="0132"><tables num="9"><img id="000012" he="164" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0133"> Sample 1 shows that the sunflower backup pad was usable with the highest state of the art MultiAir discs, and that the sunflower backup pad chips had a larger total surface area polishing compared to controls 1 and 2. Demonstrate that it contributed to a longer polishing disc life. The amount of time required to polish 10,000 square feet of panel has been reduced by 13%.</p><p num="0134"> Sample 2 shows that the sunflower polishing disc could be used with the highest technology MultiAir backup pad, and that the chips of the sunflower polishing disc had a larger total surface area polishing compared to Control 1 and Control 2. And demonstrate that it contributed to longer polishing disc life. The amount of time required to polish 10,000 square feet of panel has been reduced by 3%.</p><p num="0135"> Sample 3 demonstrates that the sunflower polishing disc and sunflower backup pad pair contributed to larger total surface area polishing and longer polishing disc life compared to the MultiAir disc and MultiAir backup pad pair. In addition, the sunflower polishing disc and sunflower backup pad pair achieved the highest total surface area polishing of all test combinations. The amount of time required to polish 10,000 square feet of panel has been reduced by 24%. The 24% reduction seems to be synergistic. This is because this reduction is greater than the sum of sample 1 reduction (sunflower backup pad-13% reduction) plus sample 2 reduction (sunflower polishing disc-3% reduction). It is also pointed out that it achieves a smaller aperture area for shavings removal as well as higher polishing performance of sunflower polishing discs.</p><p num="0136"><u style="single">Example 9-Cut efficiency test</u> Polishing performance tests were performed on the vehicle side panels to estimate the cutting efficiency of various combinations of polishing discs and backup pads. The vehicle side panel was fiberglass and electrodeposited with a primer, as described above in Example 8. As in Example 8, the vehicle side panel was polished using a handheld orbital sander equipped with a 6-inch polishing disc, backup pad, and vacuum attachment. Three samples of the invention and one sample of the control were tested. The MultiAir and sunflower polishing discs were the same as described above for Example 8 except that the polishing grit was aluminum oxide of size p80. The combinations of polishing discs and backup pads for the control sample and the sample of the present invention are shown in Table 10 and are described in more detail below.</p><p num="0137"> For all tests, the panel was polished using lateral motion covering a continuous row over the entire surface of the vehicle side panel, as described above in Example 8. A single polishing disc was used to adjust the polishing of the panel until the end of the disc's life was reached. The time to reach the end of the life of the polishing disc and the total polishing area were recorded. The cut efficiency (total polishing area / life) was calculated. FIG. 26 shows a chart comparing the calculated cut efficiencies of the controls and the samples of the invention.</p><p num="0138"><tables num="10"><img id="000013" he="105" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0139"> Samples 1 and 2 demonstrated improved cutting efficiency and total polished area compared to Control 1. Sample 1 had a 12% improvement in cutting efficiency compared to Control 1, and Sample 2 had a 9% improvement in cutting efficiency compared to Control 1.</p><p num="0140"><u style="single">Example 10-Cut efficiency test</u> Polishing performance tests were performed on the vehicle side panels to estimate the cutting efficiency of various combinations of polishing discs and backup pads. The vehicle side panel was fiberglass and electrodeposited with a primer, as described above in Example 9. As in Example 9, the vehicle side panel was polished using a handheld orbital sander equipped with a 6-inch polishing disc, backup pad, and vacuum attachment. Three samples of the invention and one sample of the control were tested. The MultiAir and sunflower polishing discs were the same as described above for Example 9, except that the polishing grit was a mixture of p80 size ceramic aluminum oxide and sol-gel aluminum oxide. The combination of polishing discs and backup pads for the control sample and the sample of the present invention is shown in Table 6_ and is described in more detail below.</p><p num="0141"> For all tests, the panel was polished using lateral motion covering a continuous row over the entire surface of the vehicle side panel, as described above in Example 9. A single polishing disc was used to adjust the polishing of the panel until the end of the disc's life was reached. The time to reach the end of the life of the polishing disc and the total polishing area were recorded. The cut efficiency (total polishing area / life) was calculated. FIG. 27 shows a chart comparing the calculated cut efficiencies of the control and the sample of the present invention.</p><p num="0142"><tables num="11"><img id="000014" he="99" wi="159" file="JP5779727B2_D0001.tif" img-format="tif" img-content="drawing" /></tables></p><p num="0143"> Samples 1 and 2 demonstrated improved cutting efficiency and total polished area compared to Control 1. Sample 1 had a 16% improvement in cutting efficiency compared to Control 1, and Sample 2 had a 55% improvement in cutting efficiency compared to Control 1.</p><p num="0144"> Not all of the activities described above in the overview or examples are required, some specific activities may not be required, and one or more additional activities are described. It should be noted that it may be performed in addition to the ones. Moreover, the order in which activities are described is not necessarily the order in which they are performed.</p><p num="0145"> In the above specification, the concept is described with reference to a specific embodiment. However, it can be understood that a person having ordinary knowledge of the art may make various modifications and changes without departing from the scope of the present invention described in the claims. Therefore, the specification and figures should be viewed in an exemplary sense rather than in a restrictive sense, and all modifications thereof are intended to be within the scope of the present invention.</p><p num="0146"> As used herein, the terms "comprises," "comprising," "includes," "including," and "has." , "Having", or any other variant of these, is intended to cover non-exclusive inclusions. For example, a process, method, article or device containing a list of features is not necessarily limited to those features and is not explicitly described or described in such process, method, article or device. It may include other features that are not unique. Furthermore, "or (or)" refers to an inclusive or rather than an exclusive or, unless explicitly stated in the opposite direction. For example, condition A or B is satisfied by one of the following: A is true (or exists), B is false (or does not exist), and A is false (or does not exist). ), And B is true (or exists), and A and B are both true (or exist).</p><p num="0147"> Also, the use of "a" or "an" is used to describe the elements and components described herein. This is done solely for convenience and is to give a broad sense of the scope of the invention. This statement should be read as including one or at least one, and the singular also includes the plural unless it is clear that it means otherwise.</p><p num="0148"> Benefits, other benefits, and solutions to the challenges have been described above for a particular embodiment. However, any benefit, benefit, solution to a problem, and any feature that can cause any benefit, benefit or solution to occur or become more prominent is in any or all claims. It does not have to be interpreted as a definitive, required or essential feature.</p><p num="0149"> After reading the specification, one of ordinary skill in the art will give that certain features are described herein in the light of separate embodiments, and in combination in a single embodiment, for clarity. You will understand that you may be. Conversely, for brevity, the various features described in the light of a single embodiment may be given separately or in any partial combination. In addition, references to the values mentioned in the range include each and every value within that range.</p>
73 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11 Sheet 12 Sheet 13 Sheet 14 Sheet 15 Sheet 16 Sheet 17 Sheet 18 Sheet 19 Sheet 20 Sheet 21 Sheet 22 Sheet 23 Sheet 24 Sheet 25 Sheet 26 Sheet 27 Sheet 28 Sheet 29 Sheet 30 Sheet 31 Sheet 32 Sheet 33 Sheet 34 Sheet 35 Sheet 36 Sheet 37 Sheet 38 Sheet 39 Sheet 40 Sheet 41 Sheet 42 Sheet 43 Sheet 44 Sheet 45 Sheet 46 Sheet 47 Sheet 48 Sheet 49 Sheet 50 Sheet 51 Sheet 52 Sheet 53 Sheet 54 Sheet 55 Sheet 56 Sheet 57 Sheet 58 Sheet 59 Sheet 60 Sheet 61 Sheet 62 Sheet 63 Sheet 64 Sheet 65 Sheet 66 Sheet 67 Sheet 68 Sheet 69 Sheet 70 Sheet 71 Sheet 72 Sheet 73
Every citation, both ways
| Document | Relation | Office |
|---|---|---|
| JP2010520078A | Cites | Japan |
| JP2007283426A | Cites | Japan |
| JP2008290197A | Cites | Japan |
| JP10249710A | Cites | Japan |
| JP11239979A | Cites | Japan |
| US20080216413A1 | Cites | United States of America |
| US20080293332A1 | Cites | United States of America |
| JP2008087082A | Cites | Japan |
| US20030003856A1 | Cites | United States of America |
| JP2004071985A | Cites | Japan |
| JP08039423A | Cites | Japan |
| JP2004514827A | Cites | Japan |
45 members in 14 offices
Priority claims9
| Document | Office | Kind | Date |
|---|---|---|---|
| 201161582308 | United States of America | P | |
| 201161582308 | United States of America | P | |
| 61582308 | United States of America | – | |
| 2012072304 | United States of America | W | |
| 2012072304 | United States of America | W | |
| 61582308 | – | – | – |
| US201161582308P | – | – | – |
| US2012072304 | – | – | – |
| WO2012US72304 | – | – | – |
Members45
| Document | Office | Kind | |
|---|---|---|---|
| CA2862388A1 | Canada | A1 | |
| CA2973965A1 | Canada | A1 | |
| WO2013102206A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW201336621A | Taiwan Province of China | A | |
| US2013260656A1 | United States of America | A1 | |
| DE212012000041U1 | Germany | U1 | |
| CH706386B1 | Switzerland | B1 | |
| AU2012362116A1 | Australia | A1 | |
| MX2014007883A | Mexico | A | |
| MX2014007883A | Mexico | A | |
| KR20140121407A | Republic of Korea | A | |
| CN104125876A | China | A | |
| EP2797714A1 | European Patent Office (EPO) | A1 | |
| JP2015503464A | Japan | A | |
| CH708721B1 | Switzerland | B1 | |
| EP2797714A4 | European Patent Office (EPO) | A4 | |
| JP5779727B2This record | Japan | B2 | |
| CH709387B1 | Switzerland | B1 | |
| JP2015171759A | Japan | A | |
| CH709583B1 | Switzerland | B1 | |
| CH709387B8 | Switzerland | B8 | |
| RU2014130168A | Russian Federation | A | |
| RU2014130168A | Russian Federation | A | |
| TWI523732B | Taiwan Province of China | B | |
| AU2012362116B2 | Australia | B2 | |
| EP3072639A1 | European Patent Office (EPO) | A1 | |
| CN106002638A | China | A | |
| JP6018260B2 | Japan | B2 | |
| KR101671708B1 | Republic of Korea | B1 | |
| RU2603747C2 | Russian Federation | C2 | |
| US9656366B2 | United States of America | B2 | |
| BR112014016015A2 | Brazil | A2 | |
| BR112014016015A8 | Brazil | A8 | |
| US2017209981A1 | United States of America | A1 | |
| CA2862388C | Canada | C | |
| MX356390B | Mexico | B | |
| CN104125876B | China | B | |
| US10076820B2 | United States of America | B2 | |
| US2019001464A1 | United States of America | A1 | |
| CN106002638B | China | B | |
| EP2797714B1 | European Patent Office (EPO) | B1 | |
| EP3072639B1 | European Patent Office (EPO) | B1 | |
| EP3613540A1 | European Patent Office (EPO) | A1 | |
| BR112014016015B1 | Brazil | B1 | |
| US11504822B2 | United States of America | B2 |
15 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Certificate of patent or registration of utility modelJAPANESE INTERMEDIATE CODE: R150R150 | R150 | |
| First payment of annual fees (during grant procedure)JAPANESE INTERMEDIATE CODE: A61A61 | A61 | |
| Written decision to grant a patent or to grant a registration (utility model)JAPANESE INTERMEDIATE CODE: A01A01 | A01 | |
| Decision of grant or rejection writtenTRDD | TRDD | |
| Request for written amendment filedJAPANESE INTERMEDIATE CODE: A523A521 | A521 | |
| Report on retrievalJAPANESE INTERMEDIATE CODE: A971007A977 | A977 | |
| Notification of reasons for refusalJAPANESE INTERMEDIATE CODE: A131A131 | A131 | |
| Notification of resignation of power of attorneyJAPANESE INTERMEDIATE CODE: A7424RD04 | RD04 |
Numbers
- Publication
- 5779727
- Publication, DOCDB
- 5779727
- Publication, EPODOC
- JP5779727B
- Application
- 2014550540
- Application, DOCDB
- 2014550540
- Application, EPODOC
- JP20140550540
Titles2
- Japanese
- 開口部の分布が非均一な研磨物品
- English
- Polished article with non-uniform distribution of openings
Classification
- CPC, 11
- B24B55/102
- B24D11/00
- C09K3/1409
- B24B55/105
- B24D9/08
- C09K3/1436
- B24D2203/00
- B24B37/26
- C09G1/02
- B24B55/10
- B24B55/06
- IPC, 2
- B24D11 00
- B24D3 00
