Optoelectronic semiconductor component
7 claims: 1 independent, 6 dependent
- 1・接続用支持体(2)と ・前記接続用支持体(2)の実装面(22)に配置されたオプトエレクトロニクス半導体チップ(1)と、 ・前記オプトエレクトロニクス半導体チップ(1)を包囲する透光体(3)と を有するオプトエレクトロニクス半導体素子であって、 前記透光体(3)は、前記接続用支持体(2)に対向しない前記オプトエレクトロニクス半導体チップ(1)の外側面を形状接続的に被覆するように設けられており、 前記透光体(3)はシリコーンを含み、 前記透光体(3)は、該透光体(3)が角錐台の形状を有するよう、いずれも前記実装面(22)との間に角度(β)<90°を成す4つの側面(30)を有し、 該側面(30)は、前記接続用支持体(2)の前記実装面(22)に対し垂直ではなく、 前記側面(30)はダイシング工程の跡を有し、 前記4つの側面(30)の各々はすべて、斜行するソーイング工程によって形成されており、前記透光体(3)の前記4つの側面(30)の各々に平坦化層(5)が設けられている、 ことを特徴とする、オプトエレクトロニクス半導体素子。
- 2前記透光体(3)は、少なくとも局所的に前記実装面(22)との間に60°〜70°の間の角度(β)を成す少なくとも1つの側面(30)を有し、 前記少なくとも1つの側面(30)はダイシング工程によって形成されている、請求項1記載のオプトエレクトロニクス半導体素子。
- 3前記透光体(3)は、それぞれ少なくとも局所的に前記実装面(22)との間に60°〜70°の間の角度(β)を成す少なくとも2つの側面(30)を有し、 前記少なくとも2つの側面(30)はダイシング工程によって形成されている、請求項1記載のオプトエレクトロニクス半導体素子。
- 4前記透光体(3)は前記接続用支持体(2)の前記実装面(22)に直接接する、請求項1から3までのいずれか1項記載のオプトエレクトロニクス半導体素子。
- 5前記接続用支持体(2)は、セラミック材料によって形成されたボディ(20)を有し、 前記ボディ(20)の厚さ(D)は最大250μmである、請求項1から4までのいずれか1項記載のオプトエレクトロニクス半導体素子。
- 6請求項1から5までのいずれか1項記載のオプトエレクトロニクス半導体素子の製造方法であって、 ・接続用支持体(2)を設けるステップと、 ・オプトエレクトロニクス半導体チップ(1)を前記接続用支持体(2)の実装面(22)に固定して電気的にコンタクトするステップと、 ・前記オプトエレクトロニクス半導体チップ(1)を包囲するように透光体(3)を形成するステップと、 ・前記接続用支持体(2)の前記実装面(22)との間で角度<90°を成すように前記透光体(3)の4つの側面(30)各々をすべてソーイングして、該透光体(3)の側面(30)を形成するステップ とを有することを特徴とする、製造方法。
- 7ソーイングによって形成された前記透光体(3)の前記側面(30)に平坦化層(5)をスプレー成膜法によって設ける、請求項6記載の製造方法。
Independent claims7
45 paragraphs, as filed
The present invention relates to optoelectronic semiconductor devices.
According to at least one embodiment of the optoelectronic semiconductor device, the optoelectronic semiconductor device has a connecting support. The connecting support is, for example, a printed circuit board containing a substrate made of an electrically insulating material. Electrical terminal rails and conductor paths can be patterned on the surface and / or within the substrate.
According to at least one embodiment of the optoelectronic semiconductor device, the optoelectronic semiconductor device has an optoelectronic semiconductor chip. The optoelectronics semiconductor chip is a light emitting semiconductor chip or a semiconductor light receiving chip, for example, a light emitting diode chip. That is, the optoelectronics semiconductor chip is formed by a light emitting diode chip or a laser diode chip. The optoelectronic semiconductor chip is arranged on the mounting surface of the connecting support, and the optoelectronic semiconductor chip can be mechanically fixed to the mounting surface and electrically contacted.
According to at least one embodiment of the optoelectronic semiconductor device, the optoelectronic semiconductor device has a translucent body that surrounds the semiconductor chip. This translucent body is, for example, a casting encapsulant made of a casting encapsulating material for encapsulating a semiconductor chip. Advantageously, this translucent body covers the semiconductor chip in a shape-connected manner. That is, the semiconductor chip is embedded in the material of the translucent body, and is surrounded by the material of the translucent body in a shape-connecting manner on a surface that does not face the connecting support. For example, the translucent body directly contacts the semiconductor chip on a surface that does not face the connecting support. This translucent body is at least transparent to some of the electromagnetic radiation generated during operation by the semiconductor chip.
According to at least one embodiment of the optoelectronic semiconductor device, the translucent body contains silicone and the translucent body can be formed from silicone. Further, particles of another material such as diffuser particles, light absorbing particles or particles of a light emitting conversion material can be embedded in the translucent body. Further, the translucent body may be a translucent body made of a silicone epoxy mixed material. This translucent body contains, for example, 50% epoxide material and 50% silicone.
In at least one embodiment of an optoelectronic semiconductor device, the translucent body has at least one side surface with an angle of at least locally less than 90 ° to the mounting surface. That is, this side surface is not perpendicular to the connecting support and this side surface is not perpendicular to the mounting surface of the connecting support. Rather, at least a portion of this aspect forms an angle of less than 90 ° with the mounting surface. The fact that the side surface and the mounting surface of the connecting support form an angle of less than 90 ° also means that the side edge angle of the side surface exceeds 0 °. This side edge angle is the angle between the surface normal and the side surface with respect to the mounting surface of the connecting support.
The advantage here is that the sides are substantially flat and the angle between the sides and the mounting surface of the connecting support is less than 90 ° across the sides. By "substantially flat" is meant that the sides can have a rough surface portion, but the sides are macroscopically flat or smooth.
That is, as a whole, in at least one embodiment, the optoelectronic semiconductor device has a translucent body having at least one inclined or beveled side surface. That is, the translucent body is not formed into a parallelepiped, but has at least one sloping side surface.
In at least one embodiment, the flanks are formed by a dicing step (Vereinzelungsprozess). That is, instead of forming the side surfaces using a mold by a casting sealing method, the inclined or oblique side surfaces are formed by a dicing step. This also means that the sides have dicing marks, for example, the sides have marks of material removal. Therefore, the matter that the side surface is "formed by the dicing process" is a characteristic as a thing that can be recognized by the dicing trace remaining on the completed optoelectronic semiconductor element after manufacturing. The roughness of such sides formed by the dicing process depends on the material of the translucent body and the dicing means used-for example, the saw blades used.
In at least one embodiment, the optelectronics semiconductor device includes a connecting support, an optelectronics semiconductor chip arranged on a mounting surface of the connecting support, and a translucent body surrounding the optelectronics semiconductor chip. However, the translucent body contains silicone, and the translucent body has at least one side surface at least locally forming an angle of less than 90 ° with the mounting surface, and the at least one side surface is dicing. Formed by the process.
The optoelectronic semiconductor devices according to the invention are based in particular on the following recognition: Conventionally, translucent encapsulants have been molded into the desired shape by a casting encapsulation step. In such a casting encapsulation step, the encapsulant must be aligned with the optoelectronic semiconductor chip. Aligning the enclosure in this way with respect to the optoelectronic semiconductor chip is cumbersome. To make matters worse, the connecting supports must be manufactured with small required tolerances. The shape of the translucent body is particularly easily defined by forming the sides of the translucent body by a dicing step after casting and sealing, that is, by defining the optical shape of the translucent body for the first time after casting and sealing. It can be modified to fit the actual position where the optelectronic semiconductor chip is located on the mounting surface of the connecting support. To do so, for example, an alignment mark can be provided on the mounting surface of the connecting support. Thereby, the inclined side surface of the translucent body can be formed particularly accurately. Furthermore, it has been found that the skewing or tilting of the side surface of the translucent body increases the output coupling efficiency when the electromagnetic radiation generated in the semiconductor chip is emitted from the optoelectronic semiconductor element through the translucent body. doing.
In at least one embodiment of an optoelectronic semiconductor chip, at least locally the at least one side surface at an angle of less than 90 ° to the mounting surface is formed by a sewing step. That is, the side surface has a sewing mark. The sides can have, for example, a groove, which is formed by the saw blade used to form the side.
In at least one embodiment of the optoelectronic semiconductor device, the translucent body has at least one side surface with an angle of at least locally between 60 ° and 70 ° with the mounting surface, which side surface is Formed by the dicing process. The angle between the inclined side surface and the mounting surface in the angular region between 60 ° and 70 ° has been found to be optimal for the output coupling of electromagnetic radiation from the translucent body and is a support for connection. The output coupling efficiency can be increased by up to 13% compared to the side surface at an angle of 90 ° to the mounting surface of the body.
In at least one embodiment of the optoelectronic semiconductor device, the translucent body has at least two sides, each of which is at least locally less than 90 ° at an angle to the mounting surface, and each of these at least two. The sides are formed by a dicing process. Advantageously, the angle between these at least two sides and the mounting surface is between 60 ° and 70 °.
Particularly advantageous, the angle between the four sides of the translucent body and the mounting surface is between 60 ° and 70 °, which is formed by the dicing process. These four sides are formed substantially in a plane. That is, the side surface is flat except for the dicing process trace remaining on the side surface.
This means that the translucent body is formed in a pyramidal trapezoidal shape. The sides of this pyramid stand are formed by a dicing process, especially by a sewing process. These sides preferably form an angle of less than 90 ° with the mounting surface of the connecting support, and particularly advantageously form an angle between 60 ° and 70 °. The bottom surface of this pyramid is, for example, a rectangle, for example, a square. In at least one embodiment, the translucent body is in direct contact with the mounting surface of the connecting support. That is, the translucent body is in direct contact with the mounting surface of the connecting support. Further, at least one layer that improves adhesion between the translucent body and the connecting support can be arranged between the translucent body and the connecting support, for example, at least one that improves adhesion. Membranes can be placed. Such a layer can be, for example, a silicone film.
In at least one embodiment, the connecting support is made of a ceramic material. The connecting support can have, for example, a body made of a ceramic material such as aluminum nitride or aluminum oxide. The body can be patterned with electrical terminal rails and / or conductor paths on the mounting surface of the connecting support. The electrical terminal rails and conductor paths can be formed, for example, by metallizing, which is either deposited on the body or otherwise provided on the body.
Further, the body of the connecting support has at least two connection points on the surface opposite to the mounting surface for electrically contacting the semiconductor chip of the optoelectronic semiconductor element. In this case, the optoelectronic semiconductor device is configured in a surface mount format. This connection may be conductively connected to the connection and conductor path on the mounting surface of the connection support by an opening in the body of the connection support, or may extend along the side surface of the connection support. Conductive connections can be made via metallizing.
In at least one embodiment of the optoelectronic semiconductor device, a flattening layer is provided on at least one side surface of the translucent body formed by the dicing step. When the side surface is formed by a dicing step, the side surface has a dicing mark, and the emitted light is optically blocked by such a dicing mark. For example, in such a dicing mark, the side surface is emitted through the side surface. Light is undesirably refracted or scattered. In order to prevent such refraction or scattering, a flattening layer for smoothing the unevenness of the dicing trace can be provided on the side surface, and for example, a layer made of silicone is formed on the side surface by a spray film forming method.
The present invention also relates to a method for manufacturing an optoelectronic semiconductor device. The manufacturing method of the present invention advantageously manufactures optoelectronic semiconductor devices similar to those described with respect to at least one of the above embodiments. That is, all the features disclosed regarding the optoelectronic semiconductor device are also the disclosure contents regarding the manufacturing method.
The manufacturing method of the present invention advantageously comprises the following steps: . Step to provide a support for connection -The step of fixing the optoelectronic semiconductor chip to the mounting surface of the connection support and making electrical contact. -The step of forming a translucent body so as to surround the optoelectronics semiconductor chip, A step of sewing the translucent body at an angle of less than 90 ° with respect to the mounting surface to form the side surface of the translucent body at least locally.
The optical shape of the translucent body is defined by the dicing process-for example, by the sewing process. Since the saw blades of different shapes can be replaced quickly and easily, the shape of the translucent body can be easily changed. In conventional casting encapsulation techniques, this has led to significantly higher costs for tool modification or manufacturing. Moreover, in conventional casting encapsulation techniques, very small tolerances must be observed during the manufacture of the connecting support in order to keep the relative position of the optical system, that is, the translucent body and the chip, within reasonable limits. Alternatively, additional cumbersome processing steps, such as alignment steps, had to be performed. The cost of a connecting support with such a small tolerance is extremely high. In the manufacturing method of the present invention, for example, in the conventional manufacturing method, the sewing mark provided on the connecting support for use only in the sewing step for dicing each element also has a relative position of the optical system with respect to the semiconductor chip. Define.
In at least one embodiment of the manufacturing method of the present invention, the translucent body is subjected to a compression molding method, a liquid transfer molding method, a liquid injection molding method, or a casting method. Formed by. In that case, the connecting support can form a part of the casting mold. The pressure molding method is an efficient method for forming a cast encapsulant of a semiconductor chip. In such a technique, the material for the casting encapsulant is placed in a mold and the connecting support is pressed against the material in the mold.
In one form of the pressure molding method, a granular solid material can also be used, for example a silicone epoxy hybrid resin material can be used. In that case, the granular solid material can also be provided on the connecting support and the semiconductor chip before closing the mold. For example, a sealing membrane can be used to seal between the connecting support and the casting mold. This sealing film is removed after the pressure molding step.
For example, when a solid material pressure-molded into tablets, such as a hybrid material, is used, the cast encapsulant can also be formed by the transfer molding method.
For example, WO2005 / 017995A1 describes the manufacture of semiconductor devices by the liquid injection molding method. EP1589569A1 describes the casting of semiconductor devices, and US2002 / 0153637A1 describes the manufacture of semiconductor integrated circuits by the liquid transfer mold method. The description of the method of manufacturing these publications is expressly included in the disclosure of the present invention by reference. In at least one embodiment of the manufacturing method of the present invention, after the side surface of the translucent body is formed by sewing, a flattening layer is formed on the side surface of the sewing by a spray film forming method. This flattening layer flattens the dicing traces remaining on the translucent body.
Hereinafter, the optoelectronic semiconductor device according to the present invention will be described in detail with reference to Examples and the accompanying drawings.
<figref num="1A">It is the schematic which shows the cross section of the optoelectronics semiconductor element of the 1st Example of this invention.</figref><figref num="1B">It is an enlarged view of a part of the optoelectronics semiconductor element of the 2nd Example of this invention.</figref><figref num="1C">It is the figure which approximately plotted the output coupling efficiency in the case of one Example of the optoelectronics semiconductor element of this invention, depending on the surface scattering.</figref><figref num="2">It is the schematic perspective view of the optoelectronics semiconductor element of this invention by another Example.</figref><figref num="3">It is a figure which shows the simulation result which depends on the side edge angle of the output coupling efficiency of one Example of the optoelectronics semiconductor element of this invention.</figref><figref num="4">It is a figure which shows the simulation result which depends on the thickness of the body of the connecting support for the output coupling efficiency of one Example of the optoelectronic semiconductor element of this invention.</figref>
In the drawings, the same, similar, or functional components are labeled with the same reference symbols. It should be noted that the size ratio between each figure and the elements shown is different from the actual size. Rather, individual elements may be over-enlarged and illustrated for ease of understanding and / or explanation.
FIG. 1A is a schematic view showing a cross section of an optoelectronic semiconductor device according to a first embodiment of the present invention. This semiconductor element has an optoelectronic semiconductor chip 1. In the figure, the optoelectronics semiconductor chip 1 is a light emitting diode formed of a thin film. For example, WO02 / 13281A1 and EP0905797A2 describe light emitting diode chips in thin film form. The description of the thin film form of the light emitting diode in these publications is expressly included in the disclosure of the present application by reference. The optoelectronics semiconductor chip 1 is provided on the mounting surface 22 of the connecting support 2. The connecting support 2 further has a body 20, which body 20 is here made of a ceramic material. An electrical connection portion 21 used for surface mounting an optoelectronic semiconductor element is provided on the lower surface of the body 20 of the connection support 2 on the side opposite to the mounting surface 22. The optoelectronics semiconductor chip 1 is cast-sealed by the translucent body 3.
The translucent body 3 covers the optoelectronic semiconductor chip 1 in a shape-connected manner. The translucent body 3 is made of silicone here. The translucent body 3 is in direct contact with the mounting surface 22 of the connecting support 2. The translucent body 3 has a side surface 30, and the side surface 30 extends in a plane up to the dicing mark 31. These dicing traces 31 are shown excessively large in FIG. 1A for the sake of clarity. The angle β between the side surface 30 and the mounting surface 22 of the connecting support 2 is less than 90 °. That is, the side edge angle α formed by the surface normal line 23 and the side surface 30 with respect to the mounting surface 22 exceeds 0 °.
The side surface 30 is formed by a sewing process. The dicing mark 31 is a groove of the saw, or another defect such as a recess formed by "peeling" the material of the translucent body 3 by sewing. The optoelectronics semiconductor chip 1 can be arranged centered on the translucent body 3 and the connecting support 2. That is, the optical axis 4 passing through the center of the light emitting surface 10 of the optoelectronics semiconductor chip 1 is the axis of symmetry of the optoelectronics semiconductor element. In particular, it is desirable to perform the above-mentioned centering for symmetrical radiation, but a configuration without centering is also possible.
In order to align the optoelectronic semiconductor chip 1 relative to the translucent body 3, for example, an alignment mark (not shown in the drawing) is used on the mounting surface 22 of the connection support 2 in the dicing step. To do.
FIG. 1B is an enlarged view of a part of an optoelectronic semiconductor device according to a second embodiment of the present invention. In this embodiment, the flattening layer 5 is provided on the side surface 30 formed by the dicing step, as a difference from the embodiment described with reference to FIG. 1A. In this embodiment, the flattening layer 5 is provided on the side surface 30 by a spray film forming method. The flattening layer 5 is here made of silicone. The flattening layer 5 smoothes the unevenness formed on the side surface 30 by the dicing trace 31.
Here, FIG. 1C schematically plots the output coupling efficiency when the side edge angle α is 25 °, depending on the surface scattering in the translucent body 3. Here, as a precondition, the translucent body is made of silicone, and the height H of the translucent body is 400 μm. The body 20 of the connecting support 2 is made of a ceramic material and has a thickness D of 200 μm. From FIG. 1C, it can be understood that the output coupling efficiency decreases as the surface scattering increases on the side surface 30 of the translucent body 3. The unevenness of the side surface 30 of the translucent body causes an increase in surface scattering. From this, it is proved that the flattening layer 5 is particularly advantageous in terms of output coupling efficiency.
The optoelectronic semiconductor device of another embodiment of the present invention will be described in detail with reference to the schematic perspective view of FIG.
FIG. 2 shows that the translucent body 3 is formed in the shape of a pyramidal platform, which has four inclined side surfaces 30 by a dicing process-here sewing. -Formed by.
The connecting support 2 has a body 20 made of a ceramic material, and the thickness D of the body 20 is advantageously at least 0.2 mm, maximum 0.5 mm, for example 0.4 mm. The height H of the translucent body 3 is preferably between 0.55 mm and 0.25 mm, for example 0.35 mm. The sum of the thickness of the body 20 of the translucent body 3 and the height H is advantageously between 0.7 mm and 0.8 mm, for example 0.75 mm. The side edge angle α is, for example, 25 °. The area of the top surface 32 of the translucent body is advantageously 2.0 to 2.5 mm.<sup>2</sup>For example, 2.3 mm<sup>2</sup>Is.
The bottom surface of the connecting support 2 is, for example, 2.04 mm × 1.64 mm.
The optoelectronics semiconductor chip 1 has a light emitting surface 10, and the area of the light emitting surface 10 is 500 μm.<sup>2</sup>~ 1.5mm<sup>2</sup>For example, 1.0 mm<sup>2</sup>Is. Here, the light emitting surface 10 can be made square.
FIG. 3 shows a simulation result of the output coupling efficiency of the optoelectronic semiconductor device similar to that shown in FIG.
As can be seen from FIG. 3, this output coupling efficiency is maximized at the side edge angle α = 25 °. In that case, the output coupling efficiency is increased by about 13% as compared with the configuration in which the side edge angle = 0 °. Since the maximum output coupling efficiency is relatively flat around a side edge angle of 25 °, the angle tolerance region where optimum output coupling can be achieved is as large as ± 5 °, and a wide processing window can be used in mass production of optoelectronic semiconductor devices. Can be used. Therefore, the advantageous angular region of the lateral edge angle is between 20 ° and 30 °, preferably about 25 °. However, since such an optimum angle also depends on the size of the bottom surface of the connecting support 2, the optimum angle changes as the configuration becomes larger. Importantly, the translucent body has at least one side surface 30 at least locally at an angle β <90 ° with the mounting surface 22.
FIG. 4 shows a simulation result of the output coupling efficiency of the optoelectronic semiconductor device similar to that shown in FIG. In the figure, the output coupling efficiency with respect to the thickness D of the body 20 of the connecting support 2 is plotted. The height H of the translucent body 3 is selected so that the sum of the thickness D and the height H is 750 μm. From the figure, it can be seen that the thinner the connecting support, the higher the output coupling efficiency. Therefore, it is advantageous that the body thickness D has a maximum of 250 μm.
The present invention is not limited to the above-described examples. Rather, the present invention includes all novel features as well as any combination of those features, especially any combination of features described in the claims. This is true even if such features or such combinations themselves are not explicitly stated in the claims or examples.
The present application claims the priority of Patent Application No. 102008035255.1 of the Federal Republic of Germany, the disclosure of which is incorporated by reference into the disclosure of the present application.
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| Document | Relation | Office |
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| WO2005043637A1 | Cites | World Intellectual Property Organization (WIPO) |
| JP2001160629A | Cites | Japan |
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| JP2004235337A | Cites | Japan |
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| WO2010012264A1 | World Intellectual Property Organization (WIPO) | A1 | |
| DE102008035255A1 | Germany | A1 | |
| KR20110036130A | Republic of Korea | A | |
| EP2308105A1 | European Patent Office (EPO) | A1 | |
| CN102106005A | China | A | |
| JP2011529628A | Japan | A | |
| US2011297999A1 | United States of America | A1 | |
| JP5599397B2This record | Japan | B2 | |
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| US9831394B2 | United States of America | B2 | |
| US2018040781A1 | United States of America | A1 | |
| EP2308105B1 | European Patent Office (EPO) | B1 | |
| US10580941B2 | United States of America | B2 | |
| DE102008035255B4 | Germany | B4 |
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Numbers
- Publication
- 5599397
- Application
- 2011520320
Titles2
- Japanese
- オプトエレクトロニクス半導体素子およびその製造方法
- English
- An opto-electronics semiconductor device and a manufacturing method for the same
Classification
- CPC, 9
- H10H20/84
- H10H20/853
- H10H20/8506
- H10H20/882
- H10H20/034
- H10H20/0362
- H10H20/80
- H10H20/85
- H10H20/036
- IPC, 2
- H01L33 54
- H01L33 56
