Imprint method and imprint apparatus

0001The present invention relates to an imprinting method and an imprinting apparatus.

0002In the manufacture of electronic devices or magnetic recording media with a fine structure such as semiconductor devices, MEMS (Micro Electro Mechanical System) devices and magnetic recording devices, as a technology for forming fine patterns with high productivity, on a substrate The imprint method that transfers the mold of the original plate is drawing attention.

0003In the imprint method, the template having the pattern to be transferred and the transfer material on the substrate are brought into contact with each other, the recesses of the template are filled with the transfer material, and the transfer material is cured to cure the transfer material on the substrate. The template pattern is transferred to.

0004In the conventional imprint method, it takes a long time to fill the concave portion of the template with the transfer material without any defect, which hinders the improvement of productivity.

0005Although Patent Document 1 discloses a method of observing an alignment mark using an observation device in the imprint method, the filling time of the transfer material cannot be shortened.

<p num="0006"><patcit num="1"><text>Special Table 2006-516065</text></patcit></p>

<p num="0007"> The present invention provides an imprinting method and an imprinting apparatus in which the filling time of the transfer material into the recess of the template is shortened and the productivity is improved.</p>

<p num="0008"> According to one aspect of the present invention, a step of dropping a transfer material onto a main surface of a substrate to be treated to form a droplet of the transfer material having a volume larger than a predetermined reference volume, and the above-mentioned step. The step of volatilizing the droplets to reduce the volume of the droplets from the reference volume, and the step of reducing the volume of the droplets from the reference volume to the above-mentioned template in which the transfer surface is provided with a recess. Provided is an imprint method comprising a step of bringing the transfer material into contact with the transfer surface and filling the recess with the transfer material.</p><p num="0009"> According to another aspect of the present invention, a substrate stage on which the substrate to be processed is placed, a template holding portion for holding a template having a recess on the transfer surface, and the subject placed on the substrate stage. A dropping portion that drops a transfer material onto the main surface of the processed substrate to form droplets of the transfer material having a volume larger than a predetermined reference volume, and the main surface of the substrate to be processed. A distance control unit that changes the distance between the transfer surface of the template held by the template holding unit, brings the droplets into contact with the transfer surface, and fills the concave portion of the template with the transfer material. The control unit includes a control unit that controls the distance control unit, and the control unit volatilizes the droplet after the dropping unit forms the droplet, and the volume of the droplet is larger than the reference volume. There is provided an imprinting apparatus characterized in that the distance control unit is made to bring the droplet whose volume is smaller than the reference volume into contact with the transfer surface after the reduction.</p>

<p num="0010"> According to the present invention, there is provided an imprinting method and an imprinting apparatus in which the filling time of the transfer material into the recess of the template is shortened and the productivity is improved.</p>

0011<figref num="1">It is a flowchart which illustrates the imprint method which concerns on 1st Embodiment.</figref><figref num="2">It is a schematic side view which illustrates the structure of the imprint apparatus used in the imprint method which concerns on 1st Embodiment.</figref><figref num="3">It is a process order schematic cross-sectional view which illustrates the imprint method which concerns on 1st Embodiment.</figref><figref num="4">It is a schematic diagram which illustrates the characteristic in the imprint method which concerns on 1st Embodiment.</figref><figref num="5">It is a graph which illustrates the characteristic in the imprint method which concerns on 1st Embodiment.</figref><figref num="6">It is a flowchart which illustrates another imprint method which concerns on 1st Embodiment.</figref><figref num="7">It is a flowchart which illustrates the imprint method of 1st Example.</figref><figref num="8">It is a flowchart which illustrates another imprint method which concerns on 1st Embodiment.</figref><figref num="9">It is a photographic figure which illustrates the droplet in another imprint method which concerns on 1st Embodiment.</figref><figref num="10">It is a flowchart which illustrates the imprint method of 2nd Example.</figref>

0012Hereinafter, embodiments of the present invention will be described with reference to the drawings. The drawings are schematic or conceptual, and the relationship between the thickness and width of each part, the ratio coefficient of the size between the parts, and the like are not necessarily the same as those in reality. Further, even when the same part is represented, the dimensions and ratio coefficients may be represented differently depending on the drawings. Further, in the present specification and each figure, the same elements as those described above with respect to the above-mentioned figures are designated by the same reference numerals, and detailed description thereof will be omitted as appropriate.

0013(First Embodiment) FIG. 1 is a flowchart illustrating an imprint method according to the first embodiment of the present invention. FIG. 2 is a schematic side view illustrating the configuration of the imprinting apparatus used in the imprinting method according to the first embodiment of the present invention. FIG. 3 is a schematic cross-sectional view in order of steps illustrating the imprinting method according to the first embodiment of the present invention.

0014First, an example of an imprinting apparatus used in the imprinting method according to the present embodiment will be described with reference to FIG.

0015As shown in FIG. 2, the imprinting apparatus 210 includes a substrate stage 120 on which the substrate 20 to be processed is placed, a template holding unit 110 that holds the template 10, and a substrate to be processed mounted on the substrate stage 120. The distance between the dropping portion 130 for forming droplets of the transfer material by dropping the transfer material on the main surface 20a of 20 and the main surface 20a of the substrate 20 to be processed and the transfer surface 10a of the template 10 is changed. A distance control unit 140 for contacting the droplets with the transfer surface 10a to fill the recess 12b of the template 10 with the transfer material, and a control unit 150 for controlling the distance control unit 140 are provided.

0016In this specific example, the imprinting apparatus 210 further includes a measuring unit 170 for measuring the diameter of the droplet formed on the main surface 20a of the substrate 20 to be processed. Further, in this specific example, the imprint device 210 further includes a light irradiation unit 160 for curing the transfer material filled in the recess 12b of the template 10. The measuring unit 170 and the light irradiation unit 160 may be provided as needed, and may be omitted. For example, the measurement unit 170 and the light irradiation unit 160 may be provided separately from the imprint device 210.

0017As the substrate 20 to be processed, for example, an arbitrary substrate such as a semiconductor substrate (wafer), an insulating substrate provided with a semiconductor layer or a conductive layer, or a substrate provided with a hard mask layer can be used. For example, quartz is used for the template 10. As the transfer material, for example, a photocurable resin or the like is used.

0018Here, the direction from the surface on which the substrate 20 to be processed of the substrate stage 120 is placed toward the template 10 held by the template holding portion 110 is defined as the Z-axis direction. The positive direction of the Z axis is the upward direction, and the negative direction is the downward direction. One direction perpendicular to the Z-axis direction is the X-axis direction. The direction perpendicular to the Z-axis direction and the X-axis direction is defined as the Y-axis direction.

0019The substrate stage 120 is provided on the stage surface plate 123 and can move along the X-axis direction, for example. The substrate stage 120 is provided with a substrate adsorption portion 121, the substrate 20 to be processed is placed on the substrate adsorption portion 121, and the substrate 20 to be processed is fixed on the substrate stage 120 by the substrate adsorption portion 121. The substrate stage 120 is provided with a reference mark base 122 for controlling the position of the substrate stage 120.

0020For example, the substrate stage 120 moves along the X-axis direction, the substrate 20 to be processed is arranged below the dropping portion 130, and the transfer material is dropped onto the main surface 20a of the substrate 20 to be processed. For the dropping portion 130, for example, a dropping device such as an inkjet method using a piezo element or the like can be used.

0021The substrate stage 120 returns to its original position along the X-axis direction, and the main surface 20a of the substrate 20 to be processed faces the transfer surface 10a of the template 10 held by the template holding portion 110.

0022The template holding unit 110 is connected to the base 111, and the base 111 is connected to the distance control unit 140. For example, the distance control unit 140 moves the template holding unit 110 in the Z-axis direction to change the distance between the main surface 20a of the substrate 20 to be processed and the transfer surface 10a of the template 10, and changes the distance between the droplet and the transfer surface 10a. To make contact with. It is sufficient that the relative positions of the main surface 20a of the substrate 20 to be processed and the transfer surface 10a of the template 10 can be changed, and the distance control unit 140 Z at least one of the template holding unit 110 and the substrate stage 120. Move along the axial direction.

0023An alignment sensor 112 is attached to the base 111, and the positions of the substrate stage 120 to be processed and the template holding portion 110 in the XY plane are appropriately controlled. As a result, the substrate 20 to be processed and the template 10 are subjected to each other. The position in the XY plane is properly controlled.

0024The transfer material on the substrate 20 to be processed is filled in the recess 12b of the template 10, and the transfer material is deformed along the uneven pattern of the template 10, and light is emitted from the light irradiation unit 160 to form the template 10. The transfer material is irradiated with light through the transfer material to cure the transfer material. Then, the transfer material is released from the template 10. As a result, the uneven shape of the template 10 is transferred to the transfer material.

0025The measurement unit 170 can include an image pickup unit 171 for imaging droplets provided on the substrate 20 to be processed, and an image processing unit 172 for processing the image captured by the image pickup unit 171. The measuring unit 170 has a function of measuring the diameter of the droplet formed on the main surface 20a of the substrate 20 to be processed, and aligns the substrate 20 to be processed and the template 10 for alignment. It can also be used for mark recognition. For example, a CCD camera or the like can be used for the image pickup unit 171.

0026A specific example of the imprinting method implemented using such an apparatus will be described. As shown in FIG. 3A, the transfer surface 10a of the template 10 is provided with the unevenness 12. The unevenness 12 includes a concave portion 12b and a convex portion 12a. For example, when the transfer surface 10a is provided with the concave portion 12b, the portion other than the concave portion 12b is regarded as the convex portion 12a, and when the transfer surface 10a is provided with the convex portion 12a, the portion other than the convex portion 12a is regarded as the concave portion 12b. Be considered. That is, the concave portion 12b and the convex portion 12a are relative to each other. As described above, the transfer surface 10a of the template 10 is provided with the recess 12b.

0027For example, the direction perpendicular to the transfer surface 10a of the template 10 corresponds to the Z-axis direction. The template holding portion 110 arranges the transfer surface 10a of the template 10 parallel to the XY plane.

0028In the template 10, the recess 12b is a portion recessed from the transfer surface 10a along the Z-axis direction.

0029The unevenness 12 of the template 10 has a shape to be transferred to the transfer material 30. The shape (including depth) of the unevenness 12 is arbitrary. The planar shape (pattern shape when viewed from the Z-axis direction) of the concave portion 12b (and the convex portion 12a) of the unevenness 12 may be, for example, a groove (trench) extending in one direction, a rectangle or a square, and a flat shape. It may be circular or circular, or it may be any polygonal shape, and it is arbitrary.

0030As shown in FIG. 3 (b), the transfer surface 10a (the surface provided with the recess 12b) of the template 10 faces the transfer material 30 provided on the main surface 20a of the substrate 20 to be processed. Template 10 is placed so that it does. In this state, the transfer material 30 is a liquid.

0031Then, as shown in FIG. 3C, the distance between the substrate 20 to be processed and the template 10 is shortened, and the transfer surface 10a of the template 10 and the transfer material 30 are brought into contact with each other. Since the transfer material 30 is a liquid, for example, due to a capillary phenomenon, the transfer material 30 enters the recess 12b, and the recess 12b is filled with the transfer material 30. As a result, the shape of the transfer material 30 changes to a shape that follows the shape of the concave portion 12b (and the convex portion 12a), and in that state, the transfer material 30 is cured to form a pattern of the concave portion 12b on the transfer material 30 (and the convex portion 12a). The pattern shape of the unevenness 12 of the template 10) is transferred. For example, when the transfer material 30 is a photocurable resin, it is irradiated with light 36 in which curing proceeds. As the light 36, for example, ultraviolet light having a wavelength of about 300 nm to 400 nm can be used.

0032As a result, the transfer curing layer 31 in which the liquid transfer material 30 is cured is formed, and the shape of the recess 12b of the template 10 is transferred to the surface of the transfer curing layer 31.

0033Then, as shown in FIG. 3D, the distance between the substrate 20 to be processed and the template 10 is increased, and the transfer curing layer 31 and the template 10 are separated from each other. As a result, the shape of the unevenness 12 of the template 10 is transferred to the transfer material 30 (transfer curing layer 31).

0034In the process illustrated in FIG. 3C, the convex portion 12a of the template 10 and the substrate 20 to be processed do not completely contact each other, and the transfer material 30 is formed between the template 10 and the substrate 20 to be processed. It exists, and the transfer curing layer 31 may also be formed in the portion between the template 10 and the substrate 20 to be processed, and a residual film may be formed.

0035In this case, as shown in FIG. 3 (e), the entire transfer-cured layer 31 can be etched back by, for example, anisotropic RIE (Reactive Ion Etching) to remove the residual film. it can. In this way, the imprinting step of transferring the pattern of the recess 12b to the transfer material 30 is completed.

0036In the above-mentioned imprinting method, the inventor describes the size of the droplet (droplet volume) of the transfer material 30 formed on the main surface 20a of the substrate 20 to be processed and the transfer material 30 as the template 10. An experiment was conducted on the relationship with the time until the recess 12b was filled. This experiment will be described below.

0037In this experiment, the volume of the droplets of the transfer material 30 to be dropped is changed by controlling the nozzle of the dropping portion 130 (for example, an inkjet device) until the transfer material 30 is completely filled in the recess 12b of the template 10. Time was measured. When the transfer material 30 comes into contact with the transfer surface 10a of the template 10, there are air bubbles in the recess 12b, and the transfer material 30 is not completely filled in the recess 12b. Is completely filled with the transfer material 30. The filling time Ts is the time from when the transfer material 30 and the transfer surface 10a of the template 10 are brought into contact with each other until the bubbles disappear and the recess 12b is completely filled by the transfer material 30.

0038FIG. 4 is a schematic diagram illustrating the characteristics of the imprint method according to the first embodiment of the present invention. That is, FIG. 4A is a graph illustrating the results of this experiment, the horizontal axis is the volume of one droplet of the transfer material 30 (droplet volume Vd), and the vertical axis is the filling time Ts. Is. The filling time Ts is expressed as a ratio to the filling time when the droplet volume Vd is 6 pl (picolitre). In this experiment, three types of droplet volume Vd of the transfer material 30 were used: 1pl, 3pl and 6pl.

00394 (b), 4 (c) and 4 (d) are schematic plan views illustrating the arrangement state of the droplets when the droplet volumes Vd are 1 pl, 3 pl and 6 pl, respectively. That is, these figures are schematic views when the substrate 20 to be processed and the droplet 30d are viewed from the Z-axis direction.

0040As shown in FIGS. 4 (b), 4 (c) and 4 (d), the amount (volume) of the transfer material 30 per unit area of the main surface 20a of the substrate 20 to be processed is constant. , The placement density of the droplets was changed according to the change of the droplet volume Vd. That is, when the droplet volume Vd is small, the droplet placement density is set high, and when the droplet volume Vd is large, the droplet placement density is set low.

0041As shown in Fig. 4 (a), it was clarified that the filling time Ts became shorter as the droplet volume Vd became smaller. That is, even if the volume per transfer unit product of the transfer material 30 provided on the main surface 20a of the substrate 20 to be processed is the same, it is better to reduce the volume of one droplet 30d and increase the arrangement density of the droplet 30d. The filling time Ts can be shorter than when the volume of one droplet 30d is large and the arrangement density of the droplet 30d is low. The present invention has been made based on a phenomenon newly discovered in an experiment.

0042When the volume (size) of one droplet 30d is reduced, the variation in the volume (size) of the droplet 30d becomes large. That is, in, for example, an inkjet device used as the dropping portion 130, if the droplet 30d is made small, there arises a problem that the opening of the inkjet head on which the transfer material 30 is discharged is easily clogged. Therefore, it is desirable that the size of the droplet 30d dropped from the dropping portion 130 is larger because the controllability of the volume (size) of the droplet 30d is improved.

0043On the other hand, the volume of the droplet 30d can be reduced by volatilizing the droplet 30d dropped on the main surface 20a of the substrate 20 to be processed. The imprint method of the present embodiment applies this phenomenon. That is, the volume of the droplet 30d dropped from the dropping portion 130 is set large, and then the droplet 30d dropped on the main surface 20a of the substrate 20 to be processed is volatilized to reduce the volume of the droplet 30d. , The reduced volume droplet 30d is brought into contact with the transfer surface 10a of the template 10. Thereby, the filling time Ts can be shortened.

0044That is, as shown in FIG. 1, in the imprint method according to the present embodiment, the transfer material 30 is dropped onto the main surface 20a of the substrate 20 to be processed to generate a volume larger than a predetermined reference volume. A step of forming a droplet 30d of the transfer material 30 having the transfer material 30 (step S110), a step of volatilizing the droplet 30d to reduce the volume of the droplet 30d from the reference volume (step S120), and a volume larger than the reference volume. A step (step S130) of bringing the reduced droplet 30d into contact with the transfer surface 10a of the template 10 provided with the recess 12b on the transfer surface 10a and filling the recess 12b with the transfer material 30 is provided.

0045For example, in the characteristics illustrated in FIG. 4, the above reference volume is 4 pl. Then, in step S110, the volume of the droplet 30d (droplet volume Vd) of the transfer material 30 is set to, for example, 6pl. When the volume of the droplet 30d (droplet volume Vd) of the transfer material 30 is as large as 6pl, stable dropping is possible, and the uniformity of the droplet volume Vd of the droplet 30d is high.

0046Then, in step S120, the droplet 30d is volatilized to reduce the volume of the droplet 30d from the reference volume, for example, to make the droplet volume Vd of the droplet 30d 1pl.

0047Then, in step S130, the droplet volume Vd is reduced, and the 1pl droplet 30d is brought into contact with the transfer surface 10a of the template 10, and the recess 12b is filled with the transfer material 30.

0048As a result, as illustrated in FIG. 4, filling can be completed in about half the filling time Ts as compared with the case where the droplet volume Vd is 6pl. As described above, according to the imprint method according to the present embodiment, it is possible to provide an imprint method in which the filling time Ts of the transfer material 30 into the recess 12b of the template 10 is shortened and the productivity is improved.

0049FIG. 5 is a graph illustrating the characteristics of the imprint method according to the first embodiment of the present invention. That is, the horizontal axis in the figure is the elapsed time Tp after the transfer material 30 is dropped on the main surface 20a of the substrate 20 to be processed, and the vertical axis is the droplet volume Vd of the droplet 30d. The droplet volume Vd is displayed as a ratio to the value when the transfer material 30 is brought into contact with the transfer surface 10a of the template 10. The droplet volume Vd is obtained by measuring the diameter of the droplet 30d and obtaining it from the shape of the droplet 30d.

0050As shown in FIG. 5, the droplet volume Vd of the droplet 30d dropped on the main surface 20a of the substrate 20 to be processed decreases with the passage of time. This is because the transfer material 30 of the droplet 30d volatilizes over time.

0051As described above, in the embodiment of the present invention, the phenomenon described for the first time in FIG. 4 that the filling time Ts is shortened when the droplet volume Vd is small and the transfer material illustrated in FIG. 5 are illustrated. It is based on the phenomenon that 30 volatilizes and the volume of the droplet 30d of the transfer material 30 decreases.

0052When the transfer material 30 is dropped, the transfer material 30 is dropped in a volume that is larger than a predetermined reference volume (for example, the first reference volume) and can be dropped stably (first volume), and then the transfer material 30 is dropped. To reduce the volume and bring the droplet 30d of the transfer material 30 into contact with the transfer surface 10a of the template 10 in a state of a volume (second volume) smaller than a predetermined reference volume (for example, a second reference volume). Therefore, the filling time Ts is shortened.

0053The reference volume used when dropping the transfer material 30 (for example, the first reference volume) and the reference volume when the droplet 30d of the transfer material 30 is brought into contact with the transfer surface 10a of the template 10 (for example, the second reference volume). ) And may be different. However, the second reference volume is equal to or less than the first reference volume. In this specific example, the first reference volume can be, for example, 5 pl, and the second reference volume can be, for example, 3 pl.

0054Therefore, in step S110, the transfer material 30 is dropped onto the main surface 20a of the substrate 20 to be processed to form the droplet 30d of the transfer material 30 having a volume larger than the predetermined first reference volume. be able to. Then, in step S120, the droplet 30d can be volatilized to reduce the volume of the droplet 30d from the second reference volume equal to or less than the first reference volume. Then, in step S130, the droplet 30d whose volume is smaller than the second reference volume is brought into contact with the transfer surface 10a of the template 10 provided with the recess 12b on the transfer surface 10a, and the transfer material is brought into the recess 12b. 30 can be filled.

0055In a general imprinting method, after the transfer material 30 is dropped onto the main surface 20a of the substrate 20 to be processed, it volatilizes to reduce the volume of the droplet 30d, and the transfer is performed in that state. There is. In that case, in order to drop the transfer material 30 with a certain amount, even if the reference volume (for example, the first reference volume) at the time of dropping the transfer material 30 (step S110) is provided, the transfer is performed. The reference volume (for example, the second reference volume) of the time (step S130) is not provided. That is, after the transfer material 30 is dropped, a reference value regarding a change in the volume of the transfer material 30 is not set.

0056On the other hand, in the present embodiment, a reference volume (for example, a second reference volume) is set as a reference value in step S130, and the step S130 is carried out using the droplet 30d in a state smaller than the reference volume. To. As a result, the filling time Ts can be shortened. That is, by providing the reference volume in step S110, stable dropping is realized, and by providing the reference volume in step S130, the filling time Ts is shortened.

0057In the present embodiment, the volume (or the value corresponding to the volume) of the droplet 30d provided on the main surface 20a of the substrate 20 to be processed can be measured, and step S130 can be performed based on the measurement result. Further, the standby time can be controlled and step S130 can be performed based on the data regarding the change in the volume of the droplet 30d after the transfer material 30 is dropped on the main surface 20a of the substrate 20 to be processed. In the following, the latter method will be described first.

0058As described with respect to FIG. 5, the droplet volume Vd of the droplet 30d dropped on the main surface 20a of the substrate 20 to be processed decreases with the passage of time. Based on this data, a certain waiting time can be provided after being dropped on the main surface 20a of the substrate 20 to be processed, and then step S130 can be carried out.

0059That is, the filling step (step S130) was preset based on the time dependence of the decrease in the volume of the droplet 30d due to volatilization after the step of forming the droplet 30d (step S110) was performed. It can be executed after the set waiting time has elapsed.

0060FIG. 6 is a flowchart illustrating another imprinting method according to the first embodiment of the present invention. In this specific example, the main surface 20a of the substrate 20 to be processed has a plurality of regions, and imprint processing is performed on each of the plurality of regions.

0061As shown in FIG. 6, a droplet 30d is formed in the i-th region (i is an integer of 1 or more) (step S110i). Then, in the i-th region, the volume of the droplet 30d is reduced (step S120i). Then, in the i-th region, the elapsed time since the execution of step S110i is compared with the preset waiting time (step S125i). Then, if the elapsed time is less than or equal to the set waiting time, another process is performed (step S140i). In this other process, for example, the (i + j) th droplet 30d may be formed (j is an integer greater than or equal to 1). Further, in this other process, any process can be performed.

0062Then, when the elapsed time exceeds the preset waiting time, the i-th filling is performed (step S130i).

0063By repeating this, the imprinting process can be efficiently performed on a plurality of regions of the main surface 20a of the substrate 20 to be processed in a short time.

0064(First Example) Hereinafter, the imprint method of the first embodiment of the first embodiment will be described. In the imprint method of the first embodiment, the method illustrated in FIG. 6 is performed.

0065FIG. 7 is a flowchart illustrating an imprint method according to a first embodiment of the present invention. As shown in FIG. 7, first, the template 10 is loaded and set in the template holding unit 110 (step S101). Then, the substrate 20 to be processed (for example, a wafer) is loaded and set on the substrate stage 120 (step S102). Then, the substrate 20 to be processed is aligned (step S103). Then, the substrate stage 120 is moved (step S104), and the substrate 20 to be processed is arranged below the dropping portion 130. Then, the transfer material 30 is dropped to form the droplet 30d on the main surface 20a of the substrate 20 to be processed (step S110). At this time, as described above, the volume of the droplet 30d is set to be larger than the predetermined reference volume (for example, the first reference volume).

0066Then, the substrate stage 120 is moved (step S121), the template 10 is aligned (step S122), and the substrate stage 120 is moved (step S123). At this time, the droplet 30d is volatilized to reduce the volume of the droplet 30d from the reference volume (step S120). Then, it waits as needed (step S125). During this waiting time, as another process (step S140i) described with respect to FIG. 6, the formation of droplets in another region may be performed. The above-mentioned standby (step S125) includes step S125 (comparison between the elapsed time since the execution of step S110i and the preset standby time) described with reference to FIG.

0067Then, the reduced volume droplet 30d is brought into contact with the transfer surface 10a of the template 10 to fill the recess 12b of the template 10 with the transfer material 30 (step S130). Then, in that state, the transfer material 30 is cured (step S150). Then, the template 10 is released (step S160).

0068Then, it is determined whether the above processing has been performed on the entire area of the substrate 20 to be processed (whether all shots have been completed) (step S171), and if not, the process returns to step S104 and the above steps are repeated. Then, when completed, the substrate 20 to be processed is unloaded (step S172), and the process ends.

0069According to the imprint method of this specific example, since the droplet 30d having a volume larger than the reference volume is formed in step S110, a droplet 30d having a stable volume can be formed, and the droplet 30d having a stable volume is also formed in step S130, which is smaller than the reference volume. Since the transfer is performed with the droplet 30d, the filling time Ts can be shortened.

0070Hereinafter, a method of measuring the volume (or a value corresponding to the volume) of the droplet 30d provided on the main surface 20a of the substrate 20 to be processed and performing step S130 based on the measurement result will be described. In this specific example, the diameter of the droplet 30d is measured as a value corresponding to the volume of the droplet 30d.

0071FIG. 8 is a flowchart illustrating another imprinting method according to the first embodiment of the present invention. As shown in FIG. 8, the imprint method of this specific example further includes a step of measuring the diameter of the droplet 30d (step S180) in addition to the method described with respect to FIG. The measurement of the droplet 30d is performed, for example, by the measuring unit 170 described with respect to FIG.

0072Then, the filling step (step S130) is performed when the diameter of the droplet 30d measured in the measuring step (step S180) is smaller than the reference diameter determined based on the reference volume.

0073For example, step S130 is performed when the diameter of the measured droplet 30d is compared to the reference diameter (step S181) and the diameter of the measured droplet 30d is smaller than the reference diameter.

0074Then, when the measured diameter of the droplet 30d is equal to or larger than the reference diameter, for example, after a certain period of time elapses, the volume of the droplet 30d is reduced, the diameter of the droplet 30d is reduced, and step S180 is performed. Go back and measure the diameter of the droplet 30d again. The above steps can be repeated.

0075As a result, the diameter of the droplet 30d when step S130 is carried out can be surely made smaller than the reference diameter. That is, step S130 can be performed in a state where the volume of the droplet 30d is definitely smaller than the reference volume. As a result, the filling time Ts can be reliably shortened.

0076FIG. 9 is a photographic diagram illustrating droplets in another imprinting method according to the first embodiment of the present invention. That is, the figure is a photographic view of the droplet 30d taken by the imaging unit 171 of the measuring unit 170 from above the droplet 30d (from the direction along the Z-axis direction).

0077As illustrated in FIG. 9, a substantially circular droplet 30d is formed on the substrate 20 to be processed. In the figure, interference fringes based on the thickness of the droplet 30d are observed. The diameter Dd of the droplet 30d correlates with the droplet volume Vd of the droplet 30d. The contact angle of the transfer material 30 on the main surface 20a of the substrate 20 to be processed changes depending on the relationship between the surface energy of the transfer material 30 and the surface energy of the main surface 20a of the substrate 20 to be processed. Therefore, for example, in the combination of the transfer material 30 and the substrate 20 to be processed, the relationship between the droplet volume Vd of the droplet 30d of the transfer material 30 and the diameter Dd of the droplet 30d is obtained in advance. This relationship may be derived experimentally or by theoretical calculation. Using the relationship between the droplet volume Vd and the diameter Dd of the droplet 30d obtained in this way, a reference diameter corresponding to the reference volume can be set.

0078Using this reference diameter, the above step S181 can be carried out and step S130 can be carried out.

0079(Second Example) Hereinafter, the imprint method of the second embodiment of the first embodiment will be described. In the imprint method of the second embodiment, the method illustrated in FIG. 8 is performed.

0080FIG. 10 is a flowchart illustrating an imprint method according to a second embodiment of the present invention. In the following, the parts of the second embodiment that are different from those of the first embodiment will be described. As shown in FIG. 10, after performing step S120, the diameter Dd of the droplet 30d is measured (step S180).

0081The diameter Dd of the measured droplet 30d is compared with the reference diameter (step S181), and step S130 is performed when the diameter Dd of the measured droplet 30d becomes smaller than the reference diameter.

0082Then, when the diameter Dd of the measured droplet 30d is equal to or larger than the reference diameter, the process returns to step S125. Then, for example, after a certain period of time elapses, the volume of the droplet 30d is reduced, the diameter Dd of the droplet 30d is reduced, the process returns to step S180, and the diameter Dd of the droplet 30d is measured again. The above steps can be repeated.

0083Thereby, step S130 can be carried out in a state where the diameter Dd of the droplet 30d when step S130 is carried out is surely smaller than the reference diameter, that is, the volume of the droplet 30d is surely smaller than the reference volume. .. As a result, the filling time Ts can be reliably shortened.

0084The above step S125 may be provided if necessary, and may be omitted. For example, the droplet 30d on the main surface 20a of the substrate 20 to be processed may be constantly imaged by the imaging unit 171, the diameter Dd of the droplet 30d may be constantly measured, and step S180 may be performed using the measurement result.

0085In this case as well, another process (step S140i) described with reference to FIG. 6 may be performed between step S120 and step S130.

0086(Second embodiment) A second embodiment of the present invention is an imprinting device 210. An example of the configuration of the imprint device 210 has already been described with respect to FIG. That is, the imprint device 210 according to the present embodiment includes a substrate stage 120 on which the substrate 20 to be processed is placed, a template holding portion 110 that holds a template 10 having a recess 12b provided on the transfer surface 10a, and a substrate stage. Dropping portion 130 that drops the transfer material 30 onto the main surface 20a of the substrate 20 to be processed placed on the 120 to form the droplet 30d of the transfer material 30 having a volume larger than a predetermined reference volume. The transfer material 30 is brought into contact with the droplet 30d and the transfer surface 10a by changing the distance between the main surface 20a of the substrate 20 to be processed and the transfer surface 10a of the template 10 held by the template holding portion 110. A distance control unit 140 for filling the recess 12b of the template 10 and a control unit 150 for controlling the distance control unit 140 are provided.

0087The control unit 150 produces the droplet 30d whose volume is reduced from the reference volume after the droplet 30d is volatilized and the volume of the droplet 30d is reduced from the reference volume after the dropping portion 130 forms the droplet 30d. The distance control unit 140 is made to come into contact with the transfer surface 10a.

0088According to this imprint device 210, since the droplet 30d having a volume larger than the reference volume (for example, the first reference volume) is formed, a droplet 30d having a stable volume can be formed and the reference volume (for example, the first reference volume) can be formed. Since the transfer is performed with a droplet 30d smaller than the volume (which may be a second reference volume smaller than the volume), the filling time Ts can be shortened. That is, it is possible to provide an imprinting apparatus in which the filling time Ts of the transfer material 30 into the recess 12b of the template 10 is shortened and the productivity is improved.

0089Then, as described above, the control unit 150 sets a preset waiting time based on the data on the time dependence of the decrease in the volume of the droplet 30d due to volatilization after the dropping unit 130 forms the droplet 30d. After that, the distance control unit 140 can be made to bring the reduced volume droplet 30d into contact with the transfer surface 10a.

0090Further, the imprinting apparatus 210 can further include a measuring unit 170 for measuring the diameter Dd of the droplet 30d on the main surface 20a of the substrate 20 to be processed. Then, when the diameter Dd of the droplet 30d measured by the measuring unit 170 is smaller than the reference diameter determined based on the reference volume, the control unit 150 transfers the droplet 30d whose diameter Dd is reduced to the transfer surface 10a. Can be made to be brought into contact with the distance control unit 140.

0091As a result, the diameter Dd of the droplet 30d when the step S130 for bringing the droplet 30d into contact with the transfer surface 10a is carried out can be surely made smaller than the reference diameter. That is, step S130 can be performed in a state where the volume of the droplet 30d is definitely smaller than the reference volume. As a result, the filling time Ts can be reliably shortened.

0092Further, by using the imprinting method and the imprinting apparatus according to the embodiment, in addition to shortening the filling time Ts, there is also an effect that the thickness of the residual film can be controlled with high accuracy. ) Has the effect of improving the pattern accuracy.

0093In the specification of the present application, "vertical" and "parallel" include not only strict vertical and strict parallel, but also variations in the manufacturing process, for example, and may be substantially vertical and substantially parallel. is good.

0094The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, a template used in an imprint method, a substrate to be processed, a transfer material, etc., and a substrate stage, a template holding unit, a dropping unit, a distance control unit, a control unit, a measurement unit, a light irradiation unit, etc. included in the imprint device. As for the specific constitution of each element, the present invention is similarly carried out by appropriately selecting from a range known to those skilled in the art, and is included in the scope of the present invention as long as the same effect can be obtained. Further, a combination of any two or more elements of each specific example to the extent technically possible is also included in the scope of the present invention as long as the gist of the present invention is included.

0095In addition, all imprinting methods and imprinting devices that can be implemented by those skilled in the art with appropriate design changes based on the imprinting method and imprinting device described above as embodiments of the present invention also provide the gist of the present invention. As far as it is included, it belongs to the scope of the present invention.

0096In addition, within the scope of the idea of the present invention, those skilled in the art can come up with various modified examples and modified examples, and it is understood that these modified examples and modified examples also belong to the scope of the present invention. .. For example, those skilled in the art appropriately adding, deleting, or changing the design of each of the above-described embodiments, or adding, omitting, or changing the conditions of the process are also gist of the present invention. As long as it is provided, it is included in the scope of the present invention.

009710 ... template, 10a ... transfer surface, 12 ... unevenness, 12a ... convex part, 12b ... concave part, 20 ... substrate to be processed, 20a ... main surface, 30 .. Transfer material, 30d ... droplets, 31 ... transfer hardening layer, 36 ... light, 110 ... template holder, 111 ... base, 112 ... alignment sensor, 120 ... Board stage, 121 ... Board suction part, 122 ... Reference mark stand, 123 ... Stage template, 130 ... Drop part, 140 ... Distance control part, 150 ... Control part, 160 ... light irradiation unit, 170 ... measurement unit, 171 ... imaging unit, 172 ... image processing unit, 210 ... imprint device, Dd ... diameter, Tp ... elapsed time, Ts ... filling time, Vd ... droplet volume